CN103153420B - 纯化硅烷的方法和系统 - Google Patents

纯化硅烷的方法和系统 Download PDF

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Publication number
CN103153420B
CN103153420B CN201180048451.7A CN201180048451A CN103153420B CN 103153420 B CN103153420 B CN 103153420B CN 201180048451 A CN201180048451 A CN 201180048451A CN 103153420 B CN103153420 B CN 103153420B
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CN
China
Prior art keywords
silane
poor
rich
destilling tower
overhead fraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201180048451.7A
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English (en)
Chinese (zh)
Other versions
CN103153420A (zh
Inventor
T·D·特鲁昂
Z·谷
P·古普塔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Zhongneng Polysilicon Technology Development Co ltd
Original Assignee
SunEdison Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/898,487 external-priority patent/US8524044B2/en
Priority claimed from US12/898,494 external-priority patent/US8524048B2/en
Application filed by SunEdison Inc filed Critical SunEdison Inc
Publication of CN103153420A publication Critical patent/CN103153420A/zh
Application granted granted Critical
Publication of CN103153420B publication Critical patent/CN103153420B/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/14—Fractional distillation or use of a fractionation or rectification column
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/14—Fractional distillation or use of a fractionation or rectification column
    • B01D3/143—Fractional distillation or use of a fractionation or rectification column by two or more of a fractionation, separation or rectification step
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C01B33/046—Purification

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CN201180048451.7A 2010-10-05 2011-09-21 纯化硅烷的方法和系统 Active CN103153420B (zh)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US39007510P 2010-10-05 2010-10-05
US39007810P 2010-10-05 2010-10-05
US12/898,487 US8524044B2 (en) 2010-10-05 2010-10-05 Systems for recovering silane from heavy-ends separation operations
US61/390,078 2010-10-05
US61/390,075 2010-10-05
US12/898,487 2010-10-05
US12/898,494 2010-10-05
US12/898,494 US8524048B2 (en) 2010-10-05 2010-10-05 Processes for recovering silane from heavy-ends separation operations
PCT/US2011/052588 WO2012047522A2 (en) 2010-10-05 2011-09-21 Processes and systems for purifying silane

Publications (2)

Publication Number Publication Date
CN103153420A CN103153420A (zh) 2013-06-12
CN103153420B true CN103153420B (zh) 2015-06-17

Family

ID=44720191

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180048451.7A Active CN103153420B (zh) 2010-10-05 2011-09-21 纯化硅烷的方法和系统

Country Status (6)

Country Link
EP (2) EP2624929B1 (enExample)
JP (1) JP5826854B2 (enExample)
KR (1) KR101752949B1 (enExample)
CN (1) CN103153420B (enExample)
TW (1) TWI466826B (enExample)
WO (1) WO2012047522A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015111886A1 (ko) 2014-01-24 2015-07-30 한화케미칼 주식회사 폐가스의 정제방법 및 정제장치
US10252916B2 (en) * 2014-09-04 2019-04-09 Corner Star Limited Methods for separating halosilanes
CN108079608A (zh) * 2017-12-22 2018-05-29 天津科创复兴科技咨询有限公司 一种有氮气保护的高效的蒸馏提纯设备
CN108751201A (zh) * 2018-08-09 2018-11-06 洛阳中硅高科技有限公司 乙硅烷的制备装置
CN115092934A (zh) * 2022-06-21 2022-09-23 云南通威高纯晶硅有限公司 一种控制精制三氯氢硅中二氯氢硅含量的方法及系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4554141A (en) * 1984-05-14 1985-11-19 Ethyl Corporation Gas stream purification
CN1046729A (zh) * 1989-04-05 1990-11-07 美孚公司 气体混合物的低温分离
CN1172685A (zh) * 1996-06-07 1998-02-11 波克股份有限公司 纯化物质的方法及装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4632816A (en) 1982-12-13 1986-12-30 Ethyl Corporation Process for production of silane
US5206004A (en) 1990-04-30 1993-04-27 Ethyl Corporation Silane compositions and process
US5211931A (en) * 1992-03-27 1993-05-18 Ethyl Corporation Removal of ethylene from silane using a distillation step after separation using a zeolite molecular sieve
ITRM20040570A1 (it) * 2004-11-19 2005-02-19 Memc Electronic Materials Procedimento e impianto di purificazione di triclorosilano e di tetracloruro di silicio.
CN101817527B (zh) * 2010-04-16 2012-01-25 浙江中宁硅业有限公司 一种多晶硅生产过程中的电子级硅烷精制提纯的方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4554141A (en) * 1984-05-14 1985-11-19 Ethyl Corporation Gas stream purification
CN1046729A (zh) * 1989-04-05 1990-11-07 美孚公司 气体混合物的低温分离
CN1172685A (zh) * 1996-06-07 1998-02-11 波克股份有限公司 纯化物质的方法及装置

Also Published As

Publication number Publication date
WO2012047522A3 (en) 2012-11-29
EP2993157A3 (en) 2016-06-22
KR20130124323A (ko) 2013-11-13
EP2624929B1 (en) 2015-07-22
WO2012047522A2 (en) 2012-04-12
TW201219304A (en) 2012-05-16
KR101752949B1 (ko) 2017-07-03
JP5826854B2 (ja) 2015-12-02
TWI466826B (zh) 2015-01-01
EP2993157A2 (en) 2016-03-09
CN103153420A (zh) 2013-06-12
JP2013542163A (ja) 2013-11-21
EP2624929A2 (en) 2013-08-14

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder

Address after: American Missouri

Patentee after: SUNEDISON, Inc.

Address before: American Missouri

Patentee before: MEMC Electronic Materials, Inc.

CP01 Change in the name or title of a patent holder
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20181213

Address after: 17th Floor, Global Trade Plaza, 1 West Austin Road, Kowloon, China

Patentee after: SUNEDISON, Inc.

Address before: American Missouri

Patentee before: SUNEDISON, Inc.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20230804

Address after: Room 205, West Zone, 2nd Floor, No. 707 Zhangyang Road, China (Shanghai) Pilot Free Trade Zone, Pudong New Area, Shanghai

Patentee after: GCL New (Shanghai) Photovoltaic Technology Co.,Ltd.

Address before: 17th Floor, Global Trade Plaza, 1 West Austin Road, Kowloon, China

Patentee before: SUNEDISON, Inc.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20231024

Address after: 221000 No. 66, Yangshan Road, Xuzhou Economic and Technological Development Zone, Xuzhou City, Jiangsu Province

Patentee after: JIANGSU ZHONGNENG POLYSILICON TECHNOLOGY DEVELOPMENT Co.,Ltd.

Address before: Room 205, West District, 2nd floor, no.707 Zhangyang Road, China (Shanghai) pilot Free Trade Zone, Pudong New Area, Shanghai, 200120

Patentee before: GCL New (Shanghai) Photovoltaic Technology Co.,Ltd.