TWI459538B - 並聯電容器及具有並聯電容器之射頻功率電晶體 - Google Patents

並聯電容器及具有並聯電容器之射頻功率電晶體 Download PDF

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Publication number
TWI459538B
TWI459538B TW096121169A TW96121169A TWI459538B TW I459538 B TWI459538 B TW I459538B TW 096121169 A TW096121169 A TW 096121169A TW 96121169 A TW96121169 A TW 96121169A TW I459538 B TWI459538 B TW I459538B
Authority
TW
Taiwan
Prior art keywords
capacitor
metal
shunt capacitor
shunt
unit cell
Prior art date
Application number
TW096121169A
Other languages
English (en)
Chinese (zh)
Other versions
TW200812067A (en
Inventor
任 蕭衛
拉梅 丹尼爾J
Original Assignee
飛思卡爾半導體公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 飛思卡爾半導體公司 filed Critical 飛思卡爾半導體公司
Publication of TW200812067A publication Critical patent/TW200812067A/zh
Application granted granted Critical
Publication of TWI459538B publication Critical patent/TWI459538B/zh

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/811Combinations of field-effect devices and one or more diodes, capacitors or resistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222Capacitive arrangements or effects of, or between wiring layers
    • H01L23/5225Shielding layers formed together with wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/642Capacitive arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/62Capacitors having potential barriers
    • H10D1/66Conductor-insulator-semiconductor capacitors, e.g. MOS capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/68Capacitors having no potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/68Capacitors having no potential barriers
    • H10D1/692Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/257Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are characterised by top-view geometrical layouts, e.g. interdigitated, semi-circular, annular or L-shaped electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/10Integrated device layouts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6644Packaging aspects of high-frequency amplifiers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
TW096121169A 2006-06-12 2007-06-12 並聯電容器及具有並聯電容器之射頻功率電晶體 TWI459538B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US80452606P 2006-06-12 2006-06-12
US11/760,775 US7508021B2 (en) 2006-06-12 2007-06-10 RF power transistor device with high performance shunt capacitor and method thereof

Publications (2)

Publication Number Publication Date
TW200812067A TW200812067A (en) 2008-03-01
TWI459538B true TWI459538B (zh) 2014-11-01

Family

ID=38832761

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096121169A TWI459538B (zh) 2006-06-12 2007-06-12 並聯電容器及具有並聯電容器之射頻功率電晶體

Country Status (5)

Country Link
US (1) US7508021B2 (enExample)
JP (1) JP2009540620A (enExample)
KR (1) KR101298425B1 (enExample)
TW (1) TWI459538B (enExample)
WO (1) WO2007146899A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102169895A (zh) * 2010-02-25 2011-08-31 上海北京大学微电子研究院 射频金属-氧化物-半导体场效应晶体管
US9502886B2 (en) * 2013-03-15 2016-11-22 Taiwan Semiconductor Manufacturing Company Limited MiM capacitor
US9899967B1 (en) * 2017-02-01 2018-02-20 Infineon Technologies Ag Embedded harmonic termination on high power RF transistor
US11929317B2 (en) 2020-12-07 2024-03-12 Macom Technology Solutions Holdings, Inc. Capacitor networks for harmonic control in power devices
US12230614B2 (en) 2021-12-17 2025-02-18 Macom Technology Solutions Holdings, Inc. Multi-typed integrated passive device (IPD) components and devices and processes implementing the same
US12183669B2 (en) * 2021-12-17 2024-12-31 Macom Technology Solutions Holdings, Inc. Configurable metal—insulator—metal capacitor and devices
US12417966B2 (en) 2021-12-17 2025-09-16 Macom Technology Solutions Holdings, Inc. IPD components having SiC substrates and devices and processes implementing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6218239B1 (en) * 1998-11-17 2001-04-17 United Microelectronics Corp. Manufacturing method of a bottom plate
US20030020107A1 (en) * 2001-07-25 2003-01-30 Motorola, Inc. Structure and method for fabricating semiconductor capacitor structures utilizing the formation of a compliant structure

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5351163A (en) * 1992-12-30 1994-09-27 Westinghouse Electric Corporation High Q monolithic MIM capacitor
JPH0864764A (ja) * 1994-08-25 1996-03-08 Nippon Motorola Ltd ユニットキャパシタ
JP3874210B2 (ja) * 1996-09-11 2007-01-31 株式会社デンソー モノリシックマイクロ波集積回路
US6208500B1 (en) * 1998-11-25 2001-03-27 Microchip Technology Incorporated High quality factor capacitor
US6181200B1 (en) * 1999-04-09 2001-01-30 Integra Technologies, Inc. Radio frequency power device
JP2004221317A (ja) * 2003-01-15 2004-08-05 Renesas Technology Corp 半導体装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6218239B1 (en) * 1998-11-17 2001-04-17 United Microelectronics Corp. Manufacturing method of a bottom plate
US20030020107A1 (en) * 2001-07-25 2003-01-30 Motorola, Inc. Structure and method for fabricating semiconductor capacitor structures utilizing the formation of a compliant structure

Also Published As

Publication number Publication date
JP2009540620A (ja) 2009-11-19
TW200812067A (en) 2008-03-01
KR20090028519A (ko) 2009-03-18
WO2007146899A2 (en) 2007-12-21
US20070297120A1 (en) 2007-12-27
KR101298425B1 (ko) 2013-08-20
US7508021B2 (en) 2009-03-24
WO2007146899A3 (en) 2008-07-24

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