TWI459538B - 並聯電容器及具有並聯電容器之射頻功率電晶體 - Google Patents
並聯電容器及具有並聯電容器之射頻功率電晶體 Download PDFInfo
- Publication number
- TWI459538B TWI459538B TW096121169A TW96121169A TWI459538B TW I459538 B TWI459538 B TW I459538B TW 096121169 A TW096121169 A TW 096121169A TW 96121169 A TW96121169 A TW 96121169A TW I459538 B TWI459538 B TW I459538B
- Authority
- TW
- Taiwan
- Prior art keywords
- capacitor
- metal
- shunt capacitor
- shunt
- unit cell
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/811—Combinations of field-effect devices and one or more diodes, capacitors or resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5225—Shielding layers formed together with wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/642—Capacitive arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/62—Capacitors having potential barriers
- H10D1/66—Conductor-insulator-semiconductor capacitors, e.g. MOS capacitors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/692—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/257—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are characterised by top-view geometrical layouts, e.g. interdigitated, semi-circular, annular or L-shaped electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/10—Integrated device layouts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/58—Structural electrical arrangements for semiconductor devices not otherwise provided for
- H01L2223/64—Impedance arrangements
- H01L2223/66—High-frequency adaptations
- H01L2223/6644—Packaging aspects of high-frequency amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US80452606P | 2006-06-12 | 2006-06-12 | |
| US11/760,775 US7508021B2 (en) | 2006-06-12 | 2007-06-10 | RF power transistor device with high performance shunt capacitor and method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200812067A TW200812067A (en) | 2008-03-01 |
| TWI459538B true TWI459538B (zh) | 2014-11-01 |
Family
ID=38832761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096121169A TWI459538B (zh) | 2006-06-12 | 2007-06-12 | 並聯電容器及具有並聯電容器之射頻功率電晶體 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7508021B2 (enExample) |
| JP (1) | JP2009540620A (enExample) |
| KR (1) | KR101298425B1 (enExample) |
| TW (1) | TWI459538B (enExample) |
| WO (1) | WO2007146899A2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102169895A (zh) * | 2010-02-25 | 2011-08-31 | 上海北京大学微电子研究院 | 射频金属-氧化物-半导体场效应晶体管 |
| US9502886B2 (en) * | 2013-03-15 | 2016-11-22 | Taiwan Semiconductor Manufacturing Company Limited | MiM capacitor |
| US9899967B1 (en) * | 2017-02-01 | 2018-02-20 | Infineon Technologies Ag | Embedded harmonic termination on high power RF transistor |
| US11929317B2 (en) | 2020-12-07 | 2024-03-12 | Macom Technology Solutions Holdings, Inc. | Capacitor networks for harmonic control in power devices |
| US12230614B2 (en) | 2021-12-17 | 2025-02-18 | Macom Technology Solutions Holdings, Inc. | Multi-typed integrated passive device (IPD) components and devices and processes implementing the same |
| US12183669B2 (en) * | 2021-12-17 | 2024-12-31 | Macom Technology Solutions Holdings, Inc. | Configurable metal—insulator—metal capacitor and devices |
| US12417966B2 (en) | 2021-12-17 | 2025-09-16 | Macom Technology Solutions Holdings, Inc. | IPD components having SiC substrates and devices and processes implementing the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6218239B1 (en) * | 1998-11-17 | 2001-04-17 | United Microelectronics Corp. | Manufacturing method of a bottom plate |
| US20030020107A1 (en) * | 2001-07-25 | 2003-01-30 | Motorola, Inc. | Structure and method for fabricating semiconductor capacitor structures utilizing the formation of a compliant structure |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5351163A (en) * | 1992-12-30 | 1994-09-27 | Westinghouse Electric Corporation | High Q monolithic MIM capacitor |
| JPH0864764A (ja) * | 1994-08-25 | 1996-03-08 | Nippon Motorola Ltd | ユニットキャパシタ |
| JP3874210B2 (ja) * | 1996-09-11 | 2007-01-31 | 株式会社デンソー | モノリシックマイクロ波集積回路 |
| US6208500B1 (en) * | 1998-11-25 | 2001-03-27 | Microchip Technology Incorporated | High quality factor capacitor |
| US6181200B1 (en) * | 1999-04-09 | 2001-01-30 | Integra Technologies, Inc. | Radio frequency power device |
| JP2004221317A (ja) * | 2003-01-15 | 2004-08-05 | Renesas Technology Corp | 半導体装置 |
-
2007
- 2007-06-10 US US11/760,775 patent/US7508021B2/en active Active
- 2007-06-12 KR KR1020087030225A patent/KR101298425B1/ko active Active
- 2007-06-12 JP JP2009515598A patent/JP2009540620A/ja active Pending
- 2007-06-12 TW TW096121169A patent/TWI459538B/zh active
- 2007-06-12 WO PCT/US2007/070930 patent/WO2007146899A2/en not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6218239B1 (en) * | 1998-11-17 | 2001-04-17 | United Microelectronics Corp. | Manufacturing method of a bottom plate |
| US20030020107A1 (en) * | 2001-07-25 | 2003-01-30 | Motorola, Inc. | Structure and method for fabricating semiconductor capacitor structures utilizing the formation of a compliant structure |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009540620A (ja) | 2009-11-19 |
| TW200812067A (en) | 2008-03-01 |
| KR20090028519A (ko) | 2009-03-18 |
| WO2007146899A2 (en) | 2007-12-21 |
| US20070297120A1 (en) | 2007-12-27 |
| KR101298425B1 (ko) | 2013-08-20 |
| US7508021B2 (en) | 2009-03-24 |
| WO2007146899A3 (en) | 2008-07-24 |
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