TWI448720B - Antireflection material and electronic image display apparatus having the antireflection material - Google Patents

Antireflection material and electronic image display apparatus having the antireflection material Download PDF

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TWI448720B
TWI448720B TW098108980A TW98108980A TWI448720B TW I448720 B TWI448720 B TW I448720B TW 098108980 A TW098108980 A TW 098108980A TW 98108980 A TW98108980 A TW 98108980A TW I448720 B TWI448720 B TW I448720B
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layer
refractive index
optical interference
reflectance
mass
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TW200941034A (en
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Takayuki Nojima
Hirofumi Yano
Masaki Yamamoto
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Nof Corp
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Description

減反射材料及具備該減反射材料之電子圖像顯示裝置Anti-reflection material and electronic image display device having the same

本發明係關於一種減反射材料及具備該減反射材料之電子圖像顯示裝置,該減反射材料可使視感度波長範圍(光線波長500~650nm)內之反射率固定(以下,稱為反射率之平緩化),抑制塗佈層之膜厚變動引發的著色不均。The present invention relates to an anti-reflection material and an electronic image display device including the same, which can fix a reflectance in a wavelength range of light sensitivity (wavelength of 500 to 650 nm) (hereinafter, referred to as reflectance) In order to reduce the color unevenness caused by the variation in the film thickness of the coating layer.

近年來,電子顯示器被廣泛用於電視、監視器。尤其是,顯示器進一步薄型化、大型化,電漿顯示器(PD)、液晶顯示器(LCD)、有機EL顯示器(OELD)等倍受矚目。為提高視認性而對該等大型顯示器實施防反射處理的同時,為解決色彩重現性問題還需要採用著色少之減反射材料。In recent years, electronic displays have been widely used in televisions and monitors. In particular, the display has been further reduced in size and size, and plasma display (PD), liquid crystal display (LCD), and organic EL display (OELD) have attracted attention. In order to improve visibility, anti-reflection treatment is applied to these large displays, and in order to solve the problem of color reproducibility, it is necessary to use an anti-reflection material with less coloration.

例如,提議有可顯示無多餘影像及著色、高畫質之診斷圖像的醫療用顯示器(例如,參照專利文獻1)。該醫療用顯示器所採用之防反射膜具有透明支持體、設置於其上之保護層以及設置於該保護層上之防反射層,該防反射層由3層形成,自透明支持體側開始,依次為中折射率層、高可撓性層及低可撓性層。CIE標準光源D65下正反射光之色彩度(a*值、b*值)等被設定於特定範圍內。For example, a medical display capable of displaying a diagnostic image having no unnecessary image and color and high image quality has been proposed (for example, refer to Patent Document 1). The antireflection film used in the medical display has a transparent support, a protective layer disposed thereon, and an antireflection layer disposed on the protective layer. The antireflection layer is formed of three layers, starting from the side of the transparent support. The medium refractive index layer, the high flexible layer and the low flexible layer are in this order. The color degree (a* value, b* value) of the specular reflected light under the CIE standard light source D65 is set within a specific range.

再者,本專利申請人提議有如下減反射材料,即於透明樹脂薄膜上設置保護層,再於該保護層上設置減反射層(例如,參照專利文獻2)。若採用該減反射材料,光線波長500~650nm之反射率振幅之差的最大值被設定為1%以下,CIE標準光源D65下視感度反射率被設定為2%以下,CIE標準光源D65下ab色度Cab*={(a*)2 +(b*)2 }1/2被設定為10以下。Furthermore, the applicant of the present application proposes an antireflection material in which a protective layer is provided on a transparent resin film, and an antireflection layer is provided on the protective layer (for example, refer to Patent Document 2). When the antireflection material is used, the maximum value of the difference between the reflectance amplitudes of the light wavelengths of 500 to 650 nm is set to 1% or less, and the apparent reflectance of the CIE standard light source D65 is set to 2% or less, and the CIE standard light source D65 is ab. The chromaticity Cab*={(a*) 2 +(b*) 2 }1/2 is set to 10 or less.

[專利文獻1]日本特開2004-295055號公報(第2頁、第5頁及第18頁)[Patent Document 1] Japanese Laid-Open Patent Publication No. 2004-295055 (pages 2, 5, and 18)

[專利文獻2]日本特開2006-116754號公報(第2頁、第3頁及第12頁)[Patent Document 2] JP-A-2006-116754 (Pages 2, 3, and 12)

然而,專利文獻1所揭示之防反射膜中,防反射層(減反射層)為3層結構,減反射特性優秀,但視感度波長範圍內反射率變化較大,不固定(平緩)。即,防反射層易發生膜厚變動,該膜厚變動會造成著色不均,無法充分發揮減少著色之效果。However, in the antireflection film disclosed in Patent Document 1, the antireflection layer (antireflection layer) has a three-layer structure and is excellent in anti-reflection characteristics, but the reflectance changes greatly in the wavelength range of the sensitivity, and is not fixed (smooth). In other words, the antireflection layer is liable to change in film thickness, and this film thickness variation causes color unevenness, and the effect of reducing coloration cannot be sufficiently exhibited.

又,專利文獻2所記載之減反射材料中,減反射層由高折射率層與低折射率層構成時,兩者膜厚比為1.0~1.1(專利文獻2之實施例4及實施例7)。因此,若採用專利文獻2之減反射材料,視感度波長範圍內光線波長對應之反射率的光譜變動變大,難以使反射率固定。由於此種差異,導致無法抑制減反射材料之著色不均。Further, in the antireflection material described in Patent Document 2, when the antireflection layer is composed of a high refractive index layer and a low refractive index layer, the film thickness ratio is 1.0 to 1.1 (Examples 4 and 7 of Patent Document 2) ). Therefore, when the antireflection material of Patent Document 2 is used, the spectral fluctuation of the reflectance corresponding to the wavelength of the light in the wavelength range of the sensitivity becomes large, and it is difficult to fix the reflectance. Due to such a difference, color unevenness of the antireflection material cannot be suppressed.

因此,本發明之目的在於提供一種減反射材料及具備該減反射材料之電子圖像顯示裝置,該減反射材料可使視感度波長範圍內之反射率固定,抑制塗佈層之膜厚變動引發的著色不均。Accordingly, it is an object of the present invention to provide an antireflection material and an electronic image display apparatus including the same, which can fix a reflectance in a wavelength range of visibility and suppress a variation in film thickness of a coating layer. The color is uneven.

本發明中,第1發明之減反射材料係於透明樹脂薄膜上至少依次疊層有保護層、第1光學干涉層、第2光學干涉層者。其特徵在於:上述第1光學干涉層之折射率高於保護層之折射率,兩者折射率之差為0.01~0.05,且第2光學干涉層之折射率低於第1光學干涉層之折射率,第1光學干涉層之膜厚/第2光學干涉層之膜厚的比率為1.6~1.8。In the present invention, the antireflection material of the first aspect of the invention is characterized in that at least a protective layer, a first optical interference layer, and a second optical interference layer are laminated on the transparent resin film. The refractive index of the first optical interference layer is higher than the refractive index of the protective layer, the difference between the refractive indices of the two optical interference layers is 0.01 to 0.05, and the refractive index of the second optical interference layer is lower than the refractive index of the first optical interference layer. The ratio of the film thickness of the first optical interference layer to the film thickness of the second optical interference layer is 1.6 to 1.8.

根據第1發明,第2發明之減反射材料特徵在於:光線波長500~650nm區域之反射率振幅之差的最大值為1%以下,且基於JIS Z8720之CIE標準光源D65下,基於JIS Z8729之ab色度Cab*={(a*)2 +(b*)2 }1/2為5以下。According to the first aspect of the invention, the antireflection material according to the second aspect of the invention is characterized in that the maximum value of the difference in reflectance amplitude in the region of the light wavelength of 500 to 650 nm is 1% or less, and based on JIS Z8729, the CIE standard light source D65 is based on JIS Z8729. Ab chromaticity Cab*={(a*) 2 +(b*) 2 }1/2 is 5 or less.

根據第1或第2發明,第3發明之減反射材料特徵在於:基於JIS Z8720之CIE標準光源D65下,基於JIS Z8701之視感度反射率Y為1.5%以下。According to the first or second aspect of the invention, the antireflection material according to the third aspect of the invention is characterized in that the luminosity reflectance Y based on JIS Z8701 is 1.5% or less under the CIE standard light source D65 of JIS Z8720.

第4發明之電子圖像顯示裝置係於顯示器前面具備申請專利範圍第1至3項中任一項所述之減反射材料。The electronic image display device according to the fourth aspect of the invention is characterized in that the antireflection material according to any one of claims 1 to 3 is provided in front of the display.

根據本發明,可發揮如下效果。According to the present invention, the following effects can be exhibited.

根據第1發明之減反射材料,第1光學干涉層之折射率高於保護層之折射率,兩者折射率之差為0.01~0.05,且第2光學干涉層之折射率被設定為低於第1光學干涉層之折射率,第1光學干涉層之膜厚/第2光學干涉層之膜厚的比率被設定為1.6~1.8。因此,可使視感度波長範圍內減反射材料之反射率(反射光譜)接近固定(平緩化),抑制光線波長對應之反射光譜的變動。從而可使視感度波長範圍內之反射率固定,抑制塗佈層之膜厚變動引發的著色不均。According to the antireflection material of the first aspect of the invention, the refractive index of the first optical interference layer is higher than the refractive index of the protective layer, and the difference in refractive index between the two is 0.01 to 0.05, and the refractive index of the second optical interference layer is set lower than The refractive index of the first optical interference layer, the ratio of the film thickness of the first optical interference layer to the film thickness of the second optical interference layer is set to 1.6 to 1.8. Therefore, the reflectance (reflection spectrum) of the antireflection material in the wavelength range of visibility can be made close to a fixed (flattening), and the fluctuation of the reflection spectrum corresponding to the wavelength of the light can be suppressed. Therefore, the reflectance in the illuminance wavelength range can be fixed, and the color unevenness caused by the variation in the film thickness of the coating layer can be suppressed.

根據第2發明之減反射材料,光線波長500~650nm區域之反射率振幅之差的最大值為1%以下,且基於JIS Z8720之CIE標準光源D65下,基於JIS Z8729之ab色度Cab*={(a*)2 +(b* )2 }1/2為5以下。因此,除具備第1發明之效果外,還可有效抑制透明樹脂薄膜與保護層之折射率差引發的干涉不均,並可抑制由包含第1光學干涉層及第2光學干涉層之減反射層之結構帶來的著色。According to the antireflection material of the second aspect of the invention, the maximum value of the difference in reflectance amplitude between the wavelengths of 500 to 650 nm is 1% or less, and based on the CIS standard light source D65 of JIS Z8720, the ab color of the JIS Z8729 is Cab*= {(a*) 2 + (b * ) 2 } 1/2 is 5 or less. Therefore, in addition to the effects of the first invention, it is possible to effectively suppress the interference unevenness caused by the difference in refractive index between the transparent resin film and the protective layer, and to suppress the reflection reduction by the first optical interference layer and the second optical interference layer. The color of the structure of the layer.

根據第3發明之減反射材料,基於JIS Z8720之CIE標準光源D65下,基於JIS Z8701之視感度反射率Y為1.5%以下。因此,除具備第1或第2發明之效果外,由於視感度反射率低,故可提供可視性更優秀之減反射材料。According to the antireflection material of the third invention, the apparent reflectance Y based on JIS Z8701 is 1.5% or less based on JIS Z8720's CIE standard light source D65. Therefore, in addition to the effects of the first or second invention, since the reflectance of the sensibility is low, an antireflection material having better visibility can be provided.

第4發明之電子圖像顯示裝置係於顯示器前面具備上述減反射材料者。因此,可於電子圖像顯示裝置中發揮第1至第3發明中任一發明之減反射材料的效果。An electronic image display device according to a fourth aspect of the invention is the one in which the antireflection material is provided on the front surface of the display. Therefore, the effect of the antireflection material of any of the first to third inventions can be exhibited in the electronic image display device.

以下,詳述本發明最佳之實施形態。Hereinafter, the best mode for carrying out the invention will be described in detail.

[減反射材料][anti-reflective material]

如圖1所示,本實施形態之減反射材料10係於透明樹脂薄膜11上至少依次疊層有保護層12、作爲減反射層13之第1光學干涉層13a、同樣作爲減反射層13之第2光學干涉層13b者。第1光學干涉層13a之折射率高於保護層12之折射率,兩者折射率之差為0.01~0.05,且第2光學干涉層13b之折射率低於第1光學干涉層13a之折射率,第1光學干涉層13a之膜厚/第2光學干涉層13b之膜厚的比率為1.6~1.8。As shown in FIG. 1, the antireflection material 10 of the present embodiment is formed by laminating at least a protective layer 12, a first optical interference layer 13a as an antireflection layer 13, and an antireflection layer 13 on the transparent resin film 11. The second optical interference layer 13b. The refractive index of the first optical interference layer 13a is higher than the refractive index of the protective layer 12, and the difference in refractive index between the two is 0.01 to 0.05, and the refractive index of the second optical interference layer 13b is lower than that of the first optical interference layer 13a. The ratio of the film thickness of the first optical interference layer 13a to the film thickness of the second optical interference layer 13b is 1.6 to 1.8.

使第1光學干涉層13a之折射率高於保護層12之折射率,將兩者折射率之差設定為0.01~0.05,且使第2光學干涉層13b之折射率低於第1光學干涉層13a之折射率,將第1光學干涉層13a之膜厚/第2光學干涉層13b之膜厚的比率設定為1.6~1.8。藉由相關之結構,可抑制反射率之變動,實現反射率之平緩化,抑制著色不均。從而可有效抑制膜厚變動引發的著色不均。The refractive index of the first optical interference layer 13a is higher than the refractive index of the protective layer 12, the difference in refractive index between the two is set to 0.01 to 0.05, and the refractive index of the second optical interference layer 13b is made lower than that of the first optical interference layer. The refractive index of 13a is set to 1.6 to 1.8 by the ratio of the film thickness of the first optical interference layer 13a to the film thickness of the second optical interference layer 13b. According to the related structure, the fluctuation of the reflectance can be suppressed, the reflectance can be flattened, and the unevenness in coloring can be suppressed. Therefore, it is possible to effectively suppress color unevenness caused by variations in film thickness.

再者,減反射材料10於視感度波長範圍(光線波長500~650nm)之區域內反射率振幅之差的最大值較好的是1%以下,更好的是0.5%以下。若該最大值大於1%,則由透明樹脂薄膜11與保護層12之折射率差所產生的干涉不均明顯,難以抑制著色不均,故不理想。另外,相關最大值之下限值為0.1%左右。且,基於JIS Z8720之CIE標準光源D65下,基於JIS Z8729之ab色度Cab*={(a*)2 +(b*)2 }1/2較好的是5以下,更好的是4以下。若該值超過5,則難以抑制著色不均,故不理想。另外,該值的下限值為0.1左右。Further, the maximum value of the difference in reflectance amplitude between the anti-reflection material 10 in the region of the luminosity wavelength range (light ray wavelength of 500 to 650 nm) is preferably 1% or less, more preferably 0.5% or less. When the maximum value is more than 1%, the interference unevenness caused by the difference in refractive index between the transparent resin film 11 and the protective layer 12 is remarkable, and it is difficult to suppress uneven coloring, which is not preferable. In addition, the lower limit of the relevant maximum value is about 0.1%. Further, based on JIS Z8720's CIE standard light source D65, ab chromaticity Cab*={(a*) 2 +(b*) 2 } 1/2 based on JIS Z8729 is preferably 5 or less, more preferably 4 the following. If the value exceeds 5, it is difficult to suppress uneven coloring, which is not preferable. In addition, the lower limit of the value is about 0.1.

此外,基於JIS Z8720之CIE標準光源D65下,減反射材料10基於JIS Z8701之視感度反射率Y較好的是1.5%以下,更好的是1.0%以下。若視感度反射率Y超過1.5%,則反射變大,電子圖像顯示裝置之圖像可視性降低,故不理想。另外,視感度反射率Y之下限值為0.1%左右。Further, in the CIE standard light source D65 based on JIS Z8720, the opacity reflectance Y of the antireflection material 10 based on JIS Z8701 is preferably 1.5% or less, more preferably 1.0% or less. When the visual reflectance Y exceeds 1.5%, the reflection becomes large, and the image visibility of the electronic image display device is lowered, which is not preferable. Further, the lower limit of the visual sensitivity reflectance Y is about 0.1%.

如圖2所示,作爲減反射材料10,亦可為於透明樹脂薄膜11與保護層12之間設有黏著層14之結構。As shown in FIG. 2, the anti-reflection material 10 may have a structure in which an adhesive layer 14 is provided between the transparent resin film 11 and the protective layer 12.

(透明樹脂薄膜11)(Transparent Resin Film 11)

首先,針對透明樹脂薄膜11進行說明。該透明樹脂薄膜11較好的是折射率(n)於1.45~1.70範圍內者。作爲形成折射率稍低(1.45~1.55)之透明樹脂薄膜11的透明樹脂基材,可列舉出例如三醋酸纖維素(TAC、n=1.48)等醋酸纖維素(乙酸纖維素)、丙烯酸樹脂(AC、n=1.50)等。又,作爲折射率稍高(1.55~1.70)之透明樹脂基材,可列舉出例如聚對苯二甲酸乙二酯(PET、n=1.65)等聚酯樹脂、聚碳酸酯(PC、n=1.59)、聚芳酯(PAR、n=1.60)及聚醚碸(PES、n=1.65)等。其中,自成形容易性及獲取容易性方面考慮,作爲折射率稍低之透明樹脂薄膜11,較好的是TAC薄膜,作爲折射率稍高之透明樹脂薄膜11,較好的是PET薄膜。First, the transparent resin film 11 will be described. The transparent resin film 11 preferably has a refractive index (n) in the range of 1.45 to 1.70. Examples of the transparent resin substrate forming the transparent resin film 11 having a slightly lower refractive index (1.45 to 1.55) include cellulose acetate (cellulose acetate) such as cellulose triacetate (TAC, n=1.48), and acrylic resin (for example). AC, n = 1.50), etc. Further, examples of the transparent resin substrate having a slightly higher refractive index (1.55 to 1.70) include a polyester resin such as polyethylene terephthalate (PET, n = 1.65), and polycarbonate (PC, n = 1.59), polyarylate (PAR, n = 1.60) and polyether oxime (PES, n = 1.65). Among them, the transparent resin film 11 having a slightly lower refractive index is preferably a TAC film, and the transparent resin film 11 having a slightly higher refractive index is preferably a PET film, from the viewpoints of ease of formation and ease of availability.

又,透明樹脂薄膜11之膜厚較好的是25~400μm,更好的是40~200μm。若其膜厚低於25μm或超過400μm,則於製造及使用減反射材料10時,使用性降低,故不理想。上述透明樹脂薄膜11中可含有各種添加劑。作爲相關添加劑,例如可列舉出紫外線吸收劑、抗靜電劑、穩定劑、可塑劑、潤滑劑、阻燃劑等。Further, the film thickness of the transparent resin film 11 is preferably from 25 to 400 μm, more preferably from 40 to 200 μm. When the film thickness is less than 25 μm or exceeds 400 μm, the use property is lowered when the antireflection material 10 is manufactured and used, which is not preferable. The transparent resin film 11 may contain various additives. Examples of the related additives include an ultraviolet absorber, an antistatic agent, a stabilizer, a plasticizer, a lubricant, a flame retardant, and the like.

(保護層12)(protection layer 12)

繼而,針對保護層12進行說明。保護層12之折射率較好的是於1.45~1.70範圍內。若保護層12之折射率低於1.45或超過1.70,則由透明樹脂薄膜11與保護層12之折射率差所產生的干涉不均會顯著顯現出來,故不理想。又,保護層12之膜厚較好的是1~10μm。若保護層12之膜厚低於1μm,則無法獲得充分之表面強度,故不理想。另一方面,若膜厚超過10μm,會產生保護層12之耐撓性降低等問題,故不理想。Next, the protective layer 12 will be described. The refractive index of the protective layer 12 is preferably in the range of 1.45 to 1.70. If the refractive index of the protective layer 12 is less than 1.45 or exceeds 1.70, the unevenness of the interference caused by the difference in refractive index between the transparent resin film 11 and the protective layer 12 is remarkably exhibited, which is not preferable. Further, the film thickness of the protective layer 12 is preferably from 1 to 10 μm. If the film thickness of the protective layer 12 is less than 1 μm, sufficient surface strength cannot be obtained, which is not preferable. On the other hand, when the film thickness exceeds 10 μm, problems such as a decrease in the flexibility of the protective layer 12 occur, which is not preferable.

上述保護層12之折射率及膜厚若於上述範圍內,則無特別限制。作爲形成保護層12之材料,例如可列舉出單官能(甲基)丙烯酸酯、多官能(甲基)丙烯酸酯、四乙氧基矽烷等反應性矽化合物等的硬化物。在此,(甲基)丙烯酸酯包括丙烯酸酯與甲基丙烯酸酯兩者。以下,即便化合物發生變化,同樣包括兩者。其中,自兼顧生產性及硬度之觀點考慮,尤其好的是含有紫外線硬化性多官能丙烯酸酯之組合物的聚合硬化物。The refractive index and film thickness of the protective layer 12 are not particularly limited as long as they are within the above range. The material for forming the protective layer 12 is, for example, a cured product such as a monofunctional (meth)acrylate, a polyfunctional (meth)acrylate, or a reactive anthracene compound such as tetraethoxysilane. Here, the (meth) acrylate includes both acrylate and methacrylate. Hereinafter, even if the compound changes, the same is included. Among them, a polymer cured product containing a composition of an ultraviolet curable multifunctional acrylate is particularly preferable from the viewpoint of both productivity and hardness.

作爲含有紫外線硬化性多官能丙烯酸酯之組合物,並無特別限制。例如可列舉出二季戊四醇六丙烯酸酯、四羥甲基甲烷四丙烯酸酯、四羥甲基甲烷三丙烯酸酯、三羥甲基丙烷三丙烯酸酯、1,6-己二醇二丙烯酸酯、1,6-雙(3-丙烯醯氧基-2-羥基丙氧基)己烷等多官能醇之丙烯酸系衍生物、聚乙二醇二丙烯酸酯、聚氨酯丙烯酸酯、及市場上銷售之作爲紫外線硬化性保護材料者等。The composition containing the ultraviolet curable multifunctional acrylate is not particularly limited. For example, dipentaerythritol hexaacrylate, tetramethylol methane tetraacrylate, tetramethylol methane triacrylate, trimethylolpropane triacrylate, 1,6-hexanediol diacrylate, 1, Acrylic derivatives of polyfunctional alcohols such as 6-bis(3-propenyloxy-2-hydroxypropoxy)hexane, polyethylene glycol diacrylate, urethane acrylate, and commercially available ultraviolet curing Sexual protection materials, etc.

含有紫外線硬化性多官能丙烯酸酯之組合物中通常還包含其他成分,相關其他成分並無特別限制。作爲其他成分,例如可列舉出無機或有機微粒狀填充劑、無機或有機微粒狀顏料以及其他無機或有機微粒、聚合物、聚合引發劑、聚合禁止劑、氧化防止劑、分散劑、界面活性劑、光穩定劑及均染劑等添加劑等。又,濕式塗佈法中,若於成膜後實施乾燥處理,則可添加任意量之溶媒。The composition containing the ultraviolet curable multifunctional acrylate usually contains other components, and the other components are not particularly limited. Examples of the other component include inorganic or organic particulate fillers, inorganic or organic particulate pigments, and other inorganic or organic fine particles, polymers, polymerization initiators, polymerization inhibitors, oxidation inhibitors, dispersants, and surfactants. Additives such as light stabilizers and leveling agents. Further, in the wet coating method, if a drying treatment is performed after film formation, an arbitrary amount of a solvent can be added.

保護層12之形成方法並無特別限制,使用有機材料時,可藉由滾筒式塗佈法或擠壓式塗佈法等常用之濕式塗佈法而形成。所形成之層可根據需要,藉由加熱或紫外線、電子束等活性能量線之照射,進行硬化反應。The method for forming the protective layer 12 is not particularly limited, and when an organic material is used, it can be formed by a usual wet coating method such as a roll coating method or a squeeze coating method. The layer formed may be subjected to a hardening reaction by heating or irradiation with an active energy ray such as an ultraviolet ray or an electron beam as needed.

減反射材料10可藉由調整(控制)第1光學干涉層13a與第2光學干涉層13b之折射率及膜厚,實現反射率之平緩化,較好的是進一步將波長500~650nm區域之反射率振幅之差的最大值設為1%以下。藉此,可減少由透明樹脂薄膜11與保護層12之折射率差所產生之干涉不均,從而可進一步發揮本發明之效果,即,可抑制塗佈層之膜厚變動引發的著色不均。爲此,較好的是進而滿足以下要件。在此,針對作爲代表性透明樹脂薄膜11之TAC薄膜與PET薄膜之情形進行說明。使用TAC薄膜時,重要的是保護層12之折射率應於(TAC薄膜之折射率)±0.03範圍內。更好的是,保護層12之折射率於(TAC薄膜之折射率)±0.02範圍內。若保護層12之折射率超過(透明樹脂薄膜11之折射率)±0.03,則干涉不均較明顯,故不理想。The anti-reflection material 10 can adjust the refractive index and the film thickness of the first optical interference layer 13a and the second optical interference layer 13b to adjust the reflectance, and it is preferable to further increase the wavelength of 500 to 650 nm. The maximum value of the difference in reflectance amplitude is set to 1% or less. Thereby, the interference unevenness caused by the difference in refractive index between the transparent resin film 11 and the protective layer 12 can be reduced, and the effect of the present invention can be further exerted, that is, the color unevenness caused by the variation in the film thickness of the coating layer can be suppressed. . For this reason, it is preferable to further satisfy the following requirements. Here, the case of the TAC film and the PET film as the representative transparent resin film 11 will be described. When a TAC film is used, it is important that the refractive index of the protective layer 12 is within ±0.03 of the (refractive index of the TAC film). More preferably, the refractive index of the protective layer 12 is within the range of ± 0.02 of the refractive index of the TAC film. If the refractive index of the protective layer 12 exceeds (the refractive index of the transparent resin film 11) ± 0.03, the interference unevenness is remarkable, which is not preferable.

利用濕式塗佈法於TAC薄膜上形成保護層12時,若單獨使用或於任意溶媒中混合使用會侵蝕TAC薄膜表面之溶媒,例如甲基乙基酮、乙酸甲酯、乙酸乙酯等時,TAC薄膜與保護層12之界面混亂,TAC薄膜與保護層12之界面的干涉效果被抑制。因此,除上述折射率差之效果外,可更有效地抑制干涉不均。When the protective layer 12 is formed on the TAC film by a wet coating method, if it is used alone or in combination with any solvent, the solvent of the surface of the TAC film, such as methyl ethyl ketone, methyl acetate, ethyl acetate, etc., may be eroded. The interface between the TAC film and the protective layer 12 is disordered, and the interference effect of the interface between the TAC film and the protective layer 12 is suppressed. Therefore, in addition to the above effect of the refractive index difference, interference unevenness can be more effectively suppressed.

(黏著層14)(adhesive layer 14)

使用PET薄膜時,較好的是於PET薄膜上,自透明樹脂薄膜11側開始依次疊層黏著層14及保護層12,藉此減少干涉不均。較好的是PET薄膜、黏著層14及保護層12之折射率滿足如下關係:PET薄膜之折射率>黏著層14之折射率>保護層12之折射率。此時,較好的是依據所用保護層12之折射率,調整黏著層14之折射率及膜厚。保護層12之折射率為1.45~1.60時,黏著層14之折射率於{(PET薄膜之折射率)×(保護層12之折射率)}1/2±0.03範圍內調整,且膜厚於70~130nm範圍內調整。黏著層14之折射率較好的是於上述範圍內,更好的是於{(PET薄膜之折射率)×(保護層12之折射率)}1/2±0.02範圍內。黏著層14之折射率為{(PET薄膜之折射率)×(保護層12之折射率)}1/2時,最適宜減少干涉不均。When a PET film is used, it is preferred to laminate the adhesive layer 14 and the protective layer 12 in this order from the side of the transparent resin film 11 on the PET film, thereby reducing interference unevenness. It is preferred that the refractive indices of the PET film, the adhesive layer 14 and the protective layer 12 satisfy the following relationship: refractive index of the PET film > refractive index of the adhesive layer 14 > refractive index of the protective layer 12. At this time, it is preferred to adjust the refractive index and film thickness of the adhesive layer 14 in accordance with the refractive index of the protective layer 12 to be used. When the refractive index of the protective layer 12 is 1.45 to 1.60, the refractive index of the adhesive layer 14 is adjusted within a range of {(refractive index of the PET film) × (refractive index of the protective layer 12) 1/2 ± 0.03, and the film thickness is Adjust within the range of 70 to 130 nm. The refractive index of the adhesive layer 14 is preferably in the above range, and more preferably in the range of {(refractive index of the PET film) × (refractive index of the protective layer 12) 1/2 ± 0.02. When the refractive index of the adhesive layer 14 is {(the refractive index of the PET film) × (the refractive index of the protective layer 12) 1/2, it is most preferable to reduce the interference unevenness.

又,保護層12之折射率為1.61~1.70時,較好的是使黏著層14之膜厚為20nm以下。黏著層14之膜厚更好的是10nm以下。若黏著層14之膜厚超過20nm,干涉不均明顯,故不理想。Further, when the refractive index of the protective layer 12 is from 1.61 to 1.70, it is preferred that the thickness of the adhesive layer 14 be 20 nm or less. The film thickness of the adhesive layer 14 is more preferably 10 nm or less. If the film thickness of the adhesive layer 14 exceeds 20 nm, the interference unevenness is remarkable, which is not preferable.

上述黏著層14含有高分子黏合劑與微粒。自賦予良好之黏著性的觀點考慮,高分子黏合劑較好的是聚酯樹脂及含有噁唑啉基與聚烷醚鏈之丙烯酸樹脂的混合體。高分子黏合劑較好的是可溶或可分散於水中者,亦可使用可溶於含有少許有機溶劑之水中者。構成黏著層14之高分子黏合劑的聚酯樹脂於黏著層14中之含有比例較好的是5~95質量%,更好的是50~90質量%。構成黏著層14之高分子黏合劑、含有噁唑啉基與聚烷醚鏈之丙烯酸樹脂於黏著層14中之含有比例較好的是5~95質量%,更好的是10~50質量%。The adhesive layer 14 contains a polymer binder and fine particles. From the viewpoint of imparting good adhesion, the polymer binder is preferably a mixture of a polyester resin and an acrylic resin containing an oxazoline group and a polyalkyl ether chain. The polymer binder is preferably soluble or dispersible in water, and may be used in water which is soluble in a little organic solvent. The content of the polyester resin constituting the polymer binder of the adhesive layer 14 in the adhesive layer 14 is preferably from 5 to 95% by mass, more preferably from 50 to 90% by mass. The polymer binder constituting the adhesive layer 14 and the acrylic resin containing the oxazoline group and the polyalkyl ether chain are preferably contained in the adhesive layer 14 in an amount of 5 to 95% by mass, more preferably 10 to 50% by mass. .

若聚酯樹脂超過95質量%,或含有噁唑啉基與聚烷醚鏈之丙烯酸樹脂低於5質量%,則黏著層14之凝集力降低,與保護層12之黏著性或黏著層14之黏著力顯現不充分,故不理想。若含有噁唑啉基與聚烷醚鏈之丙烯酸樹脂超過95質量%,或聚酯樹脂低於5質量%,則與聚酯薄膜之密著性降低,與保護層12之黏著性不充分,或黏著層14之黏著力顯現不充分。If the polyester resin exceeds 95% by mass, or the acrylic resin containing the oxazoline group and the polyalkyl ether chain is less than 5% by mass, the cohesive force of the adhesive layer 14 is lowered, and the adhesion to the protective layer 12 or the adhesive layer 14 is Adhesion is not sufficient, so it is not ideal. When the acrylic resin containing the oxazoline group and the polyalkyl ether chain exceeds 95% by mass, or the polyester resin is less than 5% by mass, the adhesion to the polyester film is lowered, and the adhesion to the protective layer 12 is insufficient. Or the adhesion of the adhesive layer 14 is insufficient.

作爲構成上述黏著層14之微粒,較好的是使用二氧化矽與二氧化鈦之複合無機粒子。該二氧化矽與二氧化鈦之複合無機粒子可任意調整折射率,且容易調整折射率。黏著層14之高分子黏合劑與微粒的折射率之差較好的是於0.02以內,更好的是於0.01以內。若該折射率之差超過0.02,則光線會因高分子黏合劑與微粒之邊界處折射率之差而大幅度地發生散射,黏著層14之濁度變高,透明性變差,故不理想。As the fine particles constituting the above-mentioned adhesive layer 14, composite inorganic particles of cerium oxide and titanium oxide are preferably used. The composite inorganic particles of cerium oxide and titanium dioxide can be arbitrarily adjusted in refractive index, and the refractive index can be easily adjusted. The difference in refractive index between the polymer binder of the adhesive layer 14 and the fine particles is preferably within 0.02, more preferably within 0.01. When the difference in refractive index exceeds 0.02, the light is largely scattered by the difference in refractive index between the polymer binder and the fine particles, and the turbidity of the adhesive layer 14 becomes high, and the transparency is deteriorated, which is not preferable. .

微粒之平均粒徑較好的是40~120nm範圍。該平均粒徑大於120nm時,微粒易發生脫落,另一方面,平均粒徑小於40nm時,有可能無法獲得充分之潤滑性及耐損傷性,故不理想。黏著層14中微粒之含量較好的是0.1~10質量%。若該含量低於0.1質量%,則無法獲得充分之潤滑性及耐損傷性,另一方面,若超過10質量%,則黏著層14之凝集力降低,黏著性降低,故不理想。The average particle diameter of the fine particles is preferably in the range of 40 to 120 nm. When the average particle diameter is more than 120 nm, the fine particles are liable to fall off. On the other hand, when the average particle diameter is less than 40 nm, sufficient lubricity and scratch resistance may not be obtained, which is not preferable. The content of the fine particles in the adhesive layer 14 is preferably from 0.1 to 10% by mass. When the content is less than 0.1% by mass, sufficient lubricity and scratch resistance are not obtained. On the other hand, when the content is more than 10% by mass, the cohesive force of the adhesive layer 14 is lowered, and the adhesiveness is lowered, which is not preferable.

黏著層14中較好的是含有脂肪族蠟,其含量較好的是0.5~30質量%,更好的是1~10質量%。若其含量少於0.5質量%,則黏著層14之表面有可能無法獲得潤滑性,故不理想。若多於30質量%,則與透明樹脂薄膜11或保護層12之黏著性有可能不充分,故不理想。作爲脂肪族蠟之具體例,較好的是巴西棕櫚蠟、堪地里拉蠟、米糠蠟、木蠟、棕櫚蠟、褐煤蠟、地蠟、白蠟、石蠟、聚乙二醇、聚丙二醇等水分散性或水溶性蠟類。The adhesive layer 14 preferably contains an aliphatic wax, and the content thereof is preferably from 0.5 to 30% by mass, more preferably from 1 to 10% by mass. If the content is less than 0.5% by mass, the surface of the adhesive layer 14 may not have lubricity, which is not preferable. If it is more than 30% by mass, the adhesion to the transparent resin film 11 or the protective layer 12 may be insufficient, which is not preferable. As a specific example of the aliphatic wax, water dispersion such as carnauba wax, canary lilac wax, rice bran wax, wood wax, palm wax, montan wax, ceresin wax, white wax, paraffin wax, polyethylene glycol, or polypropylene glycol is preferred. Sexual or water soluble waxes.

對透明樹脂薄膜11之單面或雙面上塗佈上述塗佈液,從而將黏著層14設置於透明樹脂薄膜11上。可於任意階段實施塗佈,但較好的是於透明樹脂薄膜11之製造過程中實施,效率較好。作爲塗佈方法,可採用衆所周知之任意塗佈法。例如可列舉出凹版印刷塗佈法、滾動清刷法、噴塗法、氣動刮刀塗法、線棒塗法、浸漬塗佈法等。The coating liquid is applied to one surface or both surfaces of the transparent resin film 11 to provide the adhesive layer 14 on the transparent resin film 11. The coating can be carried out at any stage, but it is preferably carried out in the production process of the transparent resin film 11, and the efficiency is good. As the coating method, any well-known coating method can be employed. For example, a gravure coating method, a rolling cleaning method, a spray coating method, a pneumatic blade coating method, a wire bar coating method, a dip coating method, and the like can be given.

(減反射層13)(anti-reflection layer 13)

繼而,針對減反射層13進行說明。相關減反射層13由第1光學干涉層13a與第2光學干涉層13b構成。第1光學干涉層13a之折射率被設定為高於保護層12及第2光學干涉層13b,且第1光學干涉層13a與保護層12之折射率差被設定為0.01~0.05。該折射率差較好的是0.01~0.03。若該折射率差小於0.01,則保護層12與第1光學干涉層13a之界面的反射光過弱,故不理想。另一方面,若折射率差大於0.05,則保護層12與第1光學干涉層13a之界面的反射光過強,無法實現反射率之平緩化,故不理想。Next, the anti-reflection layer 13 will be described. The related anti-reflection layer 13 is composed of a first optical interference layer 13a and a second optical interference layer 13b. The refractive index of the first optical interference layer 13a is set to be higher than that of the protective layer 12 and the second optical interference layer 13b, and the refractive index difference between the first optical interference layer 13a and the protective layer 12 is set to 0.01 to 0.05. The difference in refractive index is preferably from 0.01 to 0.03. When the refractive index difference is less than 0.01, the reflected light at the interface between the protective layer 12 and the first optical interference layer 13a is too weak, which is not preferable. On the other hand, when the refractive index difference is more than 0.05, the reflected light at the interface between the protective layer 12 and the first optical interference layer 13a is too strong, and the reflectance cannot be flattened, which is not preferable.

進而,第2光學干涉層13b之折射率被設定為低於第1光學干涉層13a之折射率,其折射率較好的是1.28~1.45。若該折射率低於1.28,則難以充分地形成硬層,另一方面,若折射率超過1.45,則尤其是在使用濕式塗佈法時難以獲得充分之減反射效果。Further, the refractive index of the second optical interference layer 13b is set to be lower than the refractive index of the first optical interference layer 13a, and the refractive index thereof is preferably 1.28 to 1.45. When the refractive index is less than 1.28, it is difficult to sufficiently form a hard layer. On the other hand, when the refractive index exceeds 1.45, it is difficult to obtain a sufficient antireflection effect especially when a wet coating method is used.

繼而,第1光學干涉層13a之膜厚與第2光學干涉層13b之膜厚的比率被設定為第1光學干涉層13a之膜厚/第2光學干涉層13b之膜厚=1.6~1.8。若該膜厚之比率低於1.6及超過1.8,則膜厚變動引發的反射光譜之變化變大,無法實現反射率之平緩化,故不理想。Then, the ratio of the film thickness of the first optical interference layer 13a to the film thickness of the second optical interference layer 13b is set to be the film thickness of the first optical interference layer 13a/the thickness of the second optical interference layer 13b = 1.6 to 1.8. When the ratio of the film thickness is less than 1.6 and exceeds 1.8, the change in the reflection spectrum due to the variation in the film thickness becomes large, and the reflectance is not flattened, which is not preferable.

減反射層13之形成方法並無特別限制,可採用例如乾式塗佈法、濕式塗佈法等方法。該等方法中,自生產性及生產成本方面考慮,特別好的是濕式塗佈法。可採用衆所周知之濕式塗佈法,可列舉出例如滾筒式塗佈法、旋轉塗佈法及浸漬塗佈法等代表性方法。其中,自生產性方面考慮,更好的是滾筒式塗佈法等可連續地形成減反射層13之方法。The method of forming the anti-reflection layer 13 is not particularly limited, and methods such as a dry coating method and a wet coating method can be employed. Among these methods, a wet coating method is particularly preferable in terms of productivity and production cost. A well-known wet coating method can be employed, and examples thereof include a representative method such as a drum coating method, a spin coating method, and a dip coating method. Among them, from the viewpoint of productivity, a method of continuously forming the anti-reflection layer 13 such as a drum coating method is preferable.

構成第1光學干涉層13a之材料並無特別限制,可使用無機材料或有機材料。作爲無機材料,可列舉出例如氧化鋅、氧化鈦、氧化鈰、氧化鋁、氧化鉭、氧化釔、氧化鐿、氧化鋯、氧化銦錫、含銻氧化錫等微粒。特別好的是氧化銦錫、含銻氧化錫等導電性微粒,可降低表面電阻率,並可賦予抗靜電功能。另一方面,作爲有機材料,可使用例如將含有聚合性單體之組合物聚合硬化者等,且該聚合性單體具有茀骨架。The material constituting the first optical interference layer 13a is not particularly limited, and an inorganic material or an organic material can be used. Examples of the inorganic material include fine particles such as zinc oxide, titanium oxide, cerium oxide, aluminum oxide, cerium oxide, cerium oxide, cerium oxide, zirconium oxide, indium tin oxide, and antimony-containing tin oxide. Particularly preferred are conductive particles such as indium tin oxide and antimony-containing tin oxide, which can lower the surface resistivity and impart an antistatic function. On the other hand, as the organic material, for example, a composition in which a polymerizable monomer is polymerized and cured can be used, and the polymerizable monomer has an anthracene skeleton.

作爲構成第2光學干涉層13b之材料,可使用氧化矽、氟化鑭、氟化鎂、氟化鈰等無機物、含氟有機化合物或其混合物、或者含有含氟有機化合物之聚合物的組合物。又,可將不含氟之單體(簡稱非氟系單體)或聚合物用作黏合劑。其中,特別好的是氧化矽系微粒、尤其是中空氧化矽系微粒或含氟有機化合物,其折射率低。As a material constituting the second optical interference layer 13b, an inorganic substance such as cerium oxide, cesium fluoride, magnesium fluoride or cesium fluoride, a fluorine-containing organic compound or a mixture thereof, or a composition containing a polymer containing a fluorine-containing organic compound can be used. . Further, a fluorine-free monomer (abbreviated as a non-fluorine-based monomer) or a polymer can be used as the binder. Among them, particularly preferred are cerium oxide-based fine particles, particularly hollow cerium oxide-based fine particles or fluorine-containing organic compounds, which have a low refractive index.

作爲中空氧化矽系微粒,可列舉出例如外殼內部具有空洞者、多孔質二氧化矽微粒。微粒之平均粒徑較好的是不要過多地超過第2光學干涉層13b之膜厚,特別好的是0.1μm以下。若平均粒徑變大,會發生散射,濁度上升,不適宜用作減反射材料10。又,可根據需要,利用各種偶合劑等對微粒表面進行修飾。作爲各種偶合劑,例如可列舉出經有機取代之矽化合物、鋁、鈦、鋯、銻等金屬烷氧化物、有機酸鹽等。尤其是,可藉由(甲基)丙烯醯基等反應性基對表面進行修飾,形成高硬度膜。Examples of the hollow cerium oxide-based fine particles include those having voids inside the outer casing and porous cerium oxide fine particles. The average particle diameter of the fine particles is preferably not excessively larger than the thickness of the second optical interference layer 13b, and particularly preferably 0.1 μm or less. When the average particle diameter becomes large, scattering occurs and the turbidity increases, which is unsuitable as the antireflection material 10. Further, the surface of the fine particles may be modified by various coupling agents or the like as needed. Examples of the various coupling agents include an organically substituted anthracene compound, a metal alkoxide such as aluminum, titanium, zirconium or hafnium, an organic acid salt or the like. In particular, the surface can be modified by a reactive group such as a (meth) acrylonitrile group to form a high-hardness film.

上述含氟有機化合物並無特別限制,可列舉出例如含氟單官能(甲基)丙烯酸酯、含氟多官能(甲基)丙烯酸酯、含氟衣康酸酯、含氟馬來酸酯、含氟矽化合物等單體及該等之聚合物等。其中,自反應性觀點考慮,較好的是含氟(甲基)丙烯酸酯,自硬度及折射率方面考慮,最好的是含氟多官能(甲基)丙烯酸酯。藉由使該等含氟有機化合物硬化,即可形成低折射率且高硬度之第2光學干涉層13b。The fluorine-containing organic compound is not particularly limited, and examples thereof include fluorine-containing monofunctional (meth)acrylate, fluorine-containing polyfunctional (meth)acrylate, fluorine-containing itaconate, and fluorine-containing maleate. A monomer such as a fluorine-containing cerium compound, a polymer such as these, or the like. Among them, a fluorine-containing (meth) acrylate is preferred from the viewpoint of reactivity, and a fluorine-containing polyfunctional (meth) acrylate is preferable in terms of hardness and refractive index. By curing the fluorine-containing organic compound, the second optical interference layer 13b having a low refractive index and a high hardness can be formed.

作爲含氟單官能(甲基)丙烯酸酯,可列舉出例如1-(甲基)丙烯醯氧基-1-全氟烷基甲烷、1-(甲基)丙烯醯氧基-2-全氟烷基乙烷等。全氟烷基可列舉出碳數1~8之直鏈狀、分支狀或環狀者。The fluorine-containing monofunctional (meth) acrylate may, for example, be 1-(methyl)propenyloxy-1-perfluoroalkylmethane or 1-(meth)acryloxy-2-perfluoro Alkyl ethane and the like. Examples of the perfluoroalkyl group include a linear one having a carbon number of 1 to 8, a branched shape, or a ring shape.

作爲含氟多官能(甲基)丙烯酸酯,較好的是含氟2官能(甲基)丙烯酸酯、含氟3官能(甲基)丙烯酸酯及含氟4官能(甲基)丙烯酸酯。作爲含氟2官能(甲基)丙烯酸酯,可列舉出例如1,2-二(甲基)丙烯醯氧基-3-全氟烷基丁烷、2-羥基-1H,1H,2H,3H,3H-全氟烷基-2',2'-雙{(甲基)丙烯醯氧甲基}丙酸酯、α,ω-二(甲基)丙烯醯氧甲基全氟鏈烷等。全氟烷基為碳數1~11之直鏈狀、分支狀或環狀者,全氟烷基較好的是直鏈狀者。使用時,該等含氟2官能(甲基)丙烯酸酯可單獨使用或作爲混合物使用。As the fluorine-containing polyfunctional (meth) acrylate, a fluorine-containing bifunctional (meth) acrylate, a fluorine-containing trifunctional (meth) acrylate, and a fluorine-containing tetrafunctional (meth) acrylate are preferable. Examples of the fluorine-containing bifunctional (meth) acrylate include 1,2-bis(methyl)propenyloxy-3-perfluoroalkylbutane, 2-hydroxy-1H, 1H, 2H, 3H. 3H-perfluoroalkyl-2', 2'-bis{(meth)acrylomethoxymethyl}propionate, α,ω-di(meth)acrylomethoxymethyl perfluoroalkane, and the like. The perfluoroalkyl group is a linear, branched or cyclic carbon number of 1 to 11, and a perfluoroalkyl group is preferably a linear one. When used, the fluorine-containing bifunctional (meth) acrylates may be used singly or as a mixture.

作爲含氟3官能(甲基)丙烯酸酯之例,例如可列舉出2-(甲基)丙烯醯氧基-1H,1H,2H,3H,3H-全氟烷基-2',2'-雙{(甲基)丙烯醯氧甲基}丙酸酯等。全氟烷基較好的是碳數1~11之直鏈狀、分支狀或環狀者。Examples of the fluorine-containing trifunctional (meth) acrylate include 2-(meth)acryloxy-1H, 1H, 2H, 3H, 3H-perfluoroalkyl-2', 2'-. Double {(meth)acrylomethoxymethyl}propionate and the like. The perfluoroalkyl group is preferably a linear, branched or cyclic carbon number of 1 to 11.

作爲含氟4官能(甲基)丙烯酸酯之例,較好的是α,β,ψ,ω-四{(甲基)丙烯醯氧基}-αH,αH,βH,γH,γH,χH,χH,ψH,ωH,ωH-全氟鏈烷等。全氟鏈烷基較好的是碳數1~14之直鏈狀者。使用時,含氟4官能(甲基)丙烯酸酯可單獨使用或作爲混合物使用。As an example of the fluorine-containing tetrafunctional (meth) acrylate, α, β, ψ, ω-tetra{(meth) propylene oxime}-αH, αH, βH, γH, γH, χH, are preferable. χH, ψH, ωH, ωH-perfluoroalkane, and the like. The perfluoroalkyl group is preferably a linear one having a carbon number of 1 to 14. When used, the fluorine-containing tetrafunctional (meth) acrylate may be used singly or as a mixture.

作爲含氟矽化合物之具體例,較好的是(1H,1H,2H,2H-全氟烷基)三甲氧基矽烷等。全氟烷基較好的是碳數1~10之直鏈狀、分支狀或環狀者。作爲上述含氟有機化合物之聚合物或其他含氟系單體之聚合物,可列舉出上述含氟單體之均聚物、共聚物或與非氟系單體之共聚物等直鏈狀聚合物、鏈中包含碳環或雜環之聚合物、環狀聚合物、梳型聚合物等。作爲上述非氟系單體,可使用先前衆所周知者。例如,可列舉出單官能或多官能(甲基)丙烯酸酯或四乙氧基矽烷等矽化合物等。Specific examples of the fluorine-containing cerium compound are (1H, 1H, 2H, 2H-perfluoroalkyl)trimethoxynonane and the like. The perfluoroalkyl group is preferably a linear, branched or cyclic carbon number of 1 to 10. The polymer of the fluorine-containing organic compound or the polymer of another fluorine-containing monomer may, for example, be a linear polymerization of a homopolymer or a copolymer of the above fluorine-containing monomer or a copolymer with a non-fluorine-based monomer. A polymer having a carbocyclic or heterocyclic ring, a cyclic polymer, a comb polymer, or the like in the chain or the chain. As the above non-fluorine-based monomer, those previously known can be used. For example, an anthracene compound such as a monofunctional or polyfunctional (meth) acrylate or tetraethoxy decane may, for example, be mentioned.

除上述化合物以外,於不影響本發明效果之範圍內,亦可於減反射層13中含有其他成分。其他成分並無特別限制,可列舉出例如無機或有機顏料、聚合物、聚合引發劑、光聚合引發劑、聚合禁止劑、氧化防止劑、分散劑、界面活性劑、光穩定劑、均染劑等添加劑等。又,濕式塗佈法中,若於成膜後實施乾燥處理,則可添加任意量之溶媒。藉由濕式塗佈成膜後,可根據需要進行紫外線、電子束等活性能量線之照射或加熱,進行硬化反應,從而形成減反射層13。藉由活性能量線進行之硬化反應較好的是於氮、氬等惰性氣體環境下進行。In addition to the above compounds, other components may be contained in the anti-reflection layer 13 within a range that does not impair the effects of the present invention. The other components are not particularly limited, and examples thereof include inorganic or organic pigments, polymers, polymerization initiators, photopolymerization initiators, polymerization inhibitors, oxidation inhibitors, dispersants, surfactants, light stabilizers, and leveling agents. Such as additives. Further, in the wet coating method, if a drying treatment is performed after film formation, an arbitrary amount of a solvent can be added. After the film is formed by wet coating, the active energy ray such as ultraviolet rays or electron beams may be irradiated or heated as needed to perform a curing reaction to form the antireflection layer 13. The hardening reaction by the active energy ray is preferably carried out under an inert gas atmosphere such as nitrogen or argon.

減反射材料10可於透明樹脂薄膜11之與上述保護層12及減反射層13相反側之面上形成黏著層。該黏著層所用之材料並無特別限制,可列舉出例如丙烯酸樹脂系黏著劑、聚矽氧系黏著劑、紫外線硬化型黏著劑、熱硬化型黏著劑等。可對該黏著層賦予特定波長區之光線遮斷、對比度提高、色調校正等功能中的一種以上。例如,當減反射材料10之透射光帶黃色等,不理想時,可添加色素等進行色調校正。The anti-reflection material 10 can form an adhesive layer on the surface of the transparent resin film 11 opposite to the protective layer 12 and the anti-reflection layer 13. The material to be used for the adhesive layer is not particularly limited, and examples thereof include an acrylic resin adhesive, a polyoxynoxy adhesive, an ultraviolet curable adhesive, and a thermosetting adhesive. The adhesive layer may be provided with one or more of light blocking, contrast improvement, and color tone correction in a specific wavelength region. For example, when the transmitted light of the anti-reflective material 10 is yellow or the like, it is not preferable, and a coloring matter or the like may be added to perform color tone correction.

[電子圖像顯示裝置][Electronic image display device]

本實施形態之減反射材料10適宜用於需要具備提高色彩重現性之效果、抑制光線干涉不均之效果、以及減反射效果的用途。尤其是,可用於電子圖像顯示裝置之顯示器前面。作爲電子圖像顯示裝置,可列舉出例如電漿顯示器、液晶顯示器、陰極射線管等。減反射材料10可於該顯示器(畫面)表面直接使用或於顯示器前面所配置之板上介由黏著層密著使用。The anti-reflection material 10 of the present embodiment is suitably used for applications requiring an effect of improving color reproducibility, an effect of suppressing uneven light interference, and an anti-reflection effect. In particular, it can be used in front of a display of an electronic image display device. Examples of the electronic image display device include a plasma display, a liquid crystal display, and a cathode ray tube. The anti-reflective material 10 can be used directly on the surface of the display (picture) or on the board disposed on the front of the display via an adhesive layer.

[實施形態之作用及效果總結][Summary of the role and effect of the embodiment]

‧ 根據本實施形態之減反射材料10,第1光學干涉層13a之折射率高於保護層12之折射率,兩者之折射率差為0.01~0.05,且第2光學干涉層13b之折射率被設定為低於第1光學干涉層13a之折射率,第1光學干涉層13a之膜厚/第2光學干涉層13b之膜厚的比率被設定為1.6~1.8。因此,可實現減反射材料10於視感度波長範圍內反射率的平緩化。平緩波長範圍內的顏色望之混雜,看上去不像經著色發白。另外,若反射光譜呈V字形,則可看見V字底部波長之補色的顏色。因此,伴隨第1光學干涉層13a及第2光學干涉層13b之膜厚變動,反射光譜亦發生變動,其V字底部波長發生偏移,由此,有可能會看見各種顏色,產生著色不均之現象。因此,採用減反射材料10,可使視感度波長範圍內之反射率固定,抑制塗佈層之膜厚變動引發的著色不均。‧ According to the anti-reflection material 10 of the present embodiment, the refractive index of the first optical interference layer 13a is higher than the refractive index of the protective layer 12, and the refractive index difference between the two is 0.01 to 0.05, and the refractive index of the second optical interference layer 13b The ratio of the film thickness of the first optical interference layer 13a to the film thickness of the second optical interference layer 13b is set to be 1.6 to 1.8, which is set to be lower than the refractive index of the first optical interference layer 13a. Therefore, the smoothing of the reflectance of the anti-reflective material 10 in the wavelength range of the sensibility can be achieved. The colors in the flat wavelength range are mixed and look like they are not colored and whitened. Further, if the reflection spectrum is V-shaped, the color of the complementary color of the bottom wavelength of the V word can be seen. Therefore, as the film thickness of the first optical interference layer 13a and the second optical interference layer 13b fluctuates, the reflection spectrum also fluctuates, and the V-shaped bottom wavelength shifts, whereby various colors may be observed and uneven coloration may occur. The phenomenon. Therefore, by using the anti-reflection material 10, the reflectance in the wavelength range of the sensibility can be fixed, and the color unevenness caused by the variation in the film thickness of the coating layer can be suppressed.

‧ 又,根據減反射材料10,光線波長500~650nm區域之反射率振幅之差的最大值為1%以下,且基於JIS Z8720之CIE標準光源D65下,基於JIS Z8729之ab色度Cab*={(a*)2 +(b*)2 }1/2為5以下。因此,可有效抑制透明樹脂薄膜11與保護層12之折射率差造成的干涉不均,並可抑制由包含第1光學干涉層13a及第2光學干涉層13b之減反射層13之結構帶來的著色。‧ In addition, according to the anti-reflection material 10, the maximum value of the difference in reflectance amplitude in the region of the light wavelength of 500 to 650 nm is 1% or less, and based on the CIS standard light source D65 of JIS Z8720, the ab chromaticity Cab* based on JIS Z8729 {(a*) 2 + (b*) 2 } 1/2 is 5 or less. Therefore, interference unevenness due to the difference in refractive index between the transparent resin film 11 and the protective layer 12 can be effectively suppressed, and the structure of the anti-reflection layer 13 including the first optical interference layer 13a and the second optical interference layer 13b can be suppressed. Coloring.

‧ 再者,根據減反射材料10,基於JIS Z8720之CIE標準光源D65下,基於JIS Z8701之視感度反射率Y為1.5%以下。由於視感度反射率較低,因此可提供可視性更優秀之減反射材料10。‧ According to JIS Z8720, the CIE standard light source D65 based on the anti-reflection material 10 has a luminosity reflectance Y of 1.5% or less based on JIS Z8701. Since the reflectance of the sensibility is low, the antireflection material 10 having better visibility can be provided.

‧ 電子圖像顯示裝置係於顯示器前面具備上述減反射材料10者。因此,於電子圖像顯示裝置中,可發揮上述減反射材料10之效果。故適宜將減反射材料10用於電漿顯示器、液晶顯示器中。‧ The electronic image display device is provided with the above-mentioned anti-reflection material 10 on the front of the display. Therefore, in the electronic image display device, the effect of the above-described antireflection material 10 can be exhibited. Therefore, it is suitable to use the anti-reflection material 10 in a plasma display or a liquid crystal display.

[實施例][Examples]

以下,列舉製造例、實施例及比較例,進一步具體地說明上述實施形態,但本發明並不僅限於該等實施例之範圍。另外,製造例所調製之減反射層13用塗液之硬化物的折射率由以下所示方法測定。Hereinafter, the above-described embodiments will be specifically described by way of production examples, examples, and comparative examples, but the present invention is not limited to the scope of the examples. Further, the refractive index of the cured product of the coating liquid for the antireflection layer 13 prepared in the production example was measured by the method shown below.

(1)於折射率1.49之丙烯酸樹脂板[商品名:「DELAGLAS A」、旭化成化學(株)製]上,藉由浸漬塗佈機[(株)杉山元醫理器製]分別塗佈減反射層13用塗液,並調整層厚,以使乾燥之光學膜厚為550nm左右。(1) Applying anti-reflection to each of the acrylic resin sheets having a refractive index of 1.49 (product name: "DELAGLAS A", manufactured by Asahi Kasei Chemicals Co., Ltd.) by a dip coating machine [manufactured by Sugiyama Pharmaceutical Co., Ltd.] The layer 13 was coated with a liquid, and the layer thickness was adjusted so that the dried optical film thickness was about 550 nm.

(2)溶媒乾燥後,根據需要,使用紫外線照射裝置[岩崎電氣(株)製],於氮氣環境下使用120W高壓水銀燈,照射400mJ之紫外線,使減反射層13用塗液硬化。(2) After the solvent was dried, an ultraviolet ray irradiation device (manufactured by Iwasaki Electric Co., Ltd.) was used, and a 120 W high-pressure mercury lamp was used in a nitrogen atmosphere to irradiate ultraviolet rays of 400 mJ to cure the anti-reflection layer 13 with a coating liquid.

(3)用砂紙磨擦丙烯酸樹脂板背面使之粗糙,全部塗上黑色塗料,用分光光度計[「U-Best V560」、日本分光(株)製]測定其於400~650nm區域之5°、-5°正反射率,讀取其反射率的極小值或極大值。(3) The back surface of the acrylic resin plate was rubbed with a sandpaper to make it rough, and all of the black paint was applied, and it was measured by a spectrophotometer ["U-Best V560", manufactured by JASCO Corporation] at 5 ° in the region of 400 to 650 nm. -5° positive reflectance, reading the minimum or maximum value of its reflectivity.

(4)根據反射率之極值,並利用以下公式,計算折射率。(4) Calculate the refractive index based on the extreme value of the reflectance and using the following formula.

按照以下方法評價所得之減反射材料10之物性。The physical properties of the obtained antireflection material 10 were evaluated in the following manner.

1)分光反射率:用砂紙磨擦減反射材料10之背面(透明樹脂薄膜11之背面)使之粗糙,全部塗上黑色塗料,用分光光度計[「U-Best V560」、日本分光(株)製]測定其於光線波長380~780nm區域之5°、-5°正反射光譜。藉此,可測定減反射層13之反射光譜。1) Spectral reflectance: The back surface of the anti-reflective material 10 (the back surface of the transparent resin film 11) is rubbed with a sandpaper to make it rough, and all of the black paint is applied, and a spectrophotometer is used ["U-Best V560", Japan Spectroscopic Co., Ltd. The system measures the 5° and -5° specular reflection spectra in the region of the 380-780 nm wavelength of light. Thereby, the reflection spectrum of the anti-reflection layer 13 can be measured.

2)視感度反射率Y:使用上述測定之光線波長380~780nm區域之分光反射率與基於JIS Z8720之CIE標準光源D65的相對分光分佈,計算JIS Z8701規定之XYZ表色系統中反射之物體色的三刺激值Y(%)。2) Vision reflectance Y: The object color of the XYZ color system specified in JIS Z8701 is calculated by using the spectral reflectance of the 380-780 nm region of the measured light wavelength and the relative spectral distribution of the CIE standard light source D65 based on JIS Z8720. The tristimulus value Y (%).

3)光線波長500~650nm區域之反射率振幅之差的最大值:根據藉由上述分光反射率測定所獲得之反射光譜,讀取光線波長500~650nm區域之反射率(%)振幅之差的最大值。3) Maximum value of difference in reflectance amplitude in a region of a light wavelength of 500 to 650 nm: reading a difference in reflectance (%) amplitude of a region of a light beam having a wavelength of 500 to 650 nm based on a reflection spectrum obtained by measuring the spectral reflectance. Maximum value.

4)ab色度Cab*:使用由上述1)所測定之光線波長380~780nm區域之分光反射率與基於JIS Z8720之CIE標準光源D65的相對分光分佈,計算JIS Z8729規定之色空間CIE1976L*a*b*表色系統,根據計算出的a*值、b*值,計算ab色度Cab*={(a*)2 +(b*)2 }1/2。4) ab chromaticity Cab*: Calculate the color space CIE1976L*a prescribed by JIS Z8729 using the spectral reflectance of the wavelength range of 380 to 780 nm measured by the above 1) and the relative spectral distribution of the CIE standard light source D65 based on JIS Z8720. The *b* color system calculates ab chromaticity Cab*={(a*) 2 +(b*) 2 }1/2 based on the calculated a* value and b* value.

5)著色抑制效果:於大小為縱10cm、橫10cm之玻璃板的單面上使用丙烯酸樹脂系黏著片,粘貼減反射膜,於另一面上粘貼黑色膜,製作樣品。於非三波長螢光燈之螢光燈[例如,松下電器產業(株)製Palook(FL20SSD/18)]下觀察該樣品,評價塗佈層之膜厚變動引發的著色不均之情形,並於三波長螢光燈[例如,松下電器產業(株)製Palook(FL20SS EX-N/18)]下觀察該樣品,評價干涉不均之情形。作爲評價基準,以既未發現干涉不均亦未發現著色不均之情形為◎,以發現干涉不均但未發現著色不均之情形為○,以無論有無發現干涉不均皆發現著色不均之情形為×,進行評價。5) Coloring suppressing effect: An acrylic resin-based pressure-sensitive adhesive sheet was used on one surface of a glass plate having a size of 10 cm in length and 10 cm in width, and an anti-reflection film was attached thereto, and a black film was stuck on the other surface to prepare a sample. The sample was observed under a fluorescent lamp of a non-three-wavelength fluorescent lamp (for example, Palook (FL20SSD/18) manufactured by Matsushita Electric Industrial Co., Ltd.), and the uneven coloring caused by the variation in the thickness of the coating layer was evaluated. The sample was observed under a three-wavelength fluorescent lamp (for example, Palook (FL20SS EX-N/18) manufactured by Matsushita Electric Industrial Co., Ltd.) to evaluate the unevenness of the interference. As a basis for the evaluation, the case where the unevenness of the unevenness was not observed and the unevenness of the coloring was not observed was ◎, and the unevenness of the interference was observed, but the unevenness of the coloration was found to be ○, and the uneven coloration was found regardless of the presence or absence of the interference unevenness. The case is ×, and evaluation is performed.

[製造例1、形成黏著層14之塗佈液(以下,稱爲黏著層塗佈液)的調製][Manufacturing Example 1, Preparation of Coating Liquid Forming Adhesive Layer 14 (hereinafter referred to as Adhesive Layer Coating Liquid)]

(1)聚酯1之合成(1) Synthesis of polyester 1

將對苯二甲酸二甲酯47質量份、間苯二甲酸二甲酯9質量份、間苯二甲酸二甲酯5-磺酸鈉5質量份、乙二醇36質量份、二乙二醇3質量份裝入反應器中,並添加四丁氧基鈦0.05質量份,於氮氣環境下將溫度調整為230℃並加熱,餾去生成之甲醇,進行酯交換反應。繼而,將反應系溫度緩慢上升至255℃,對系內減壓133Pa(1mmHg),進行縮聚反應,獲得聚酯1(Tg=71℃、質量平均分子量16000)。47 parts by mass of dimethyl terephthalate, 9 parts by mass of dimethyl isophthalate, 5 parts by mass of dimethyl isophthalate 5-sulfonate, 36 parts by mass of ethylene glycol, diethylene glycol 3 parts by mass was charged into the reactor, and 0.05 parts by mass of tetrabutoxytitanium was added, and the temperature was adjusted to 230 ° C under a nitrogen atmosphere and heated, and the produced methanol was distilled off to carry out a transesterification reaction. Then, the temperature of the reaction system was gradually increased to 255 ° C, and the internal pressure was reduced to 133 Pa (1 mmHg) to carry out a polycondensation reaction to obtain a polyester 1 (Tg = 71 ° C, mass average molecular weight: 16,000).

(2)丙烯酸樹脂水分散體之合成(2) Synthesis of acrylic resin aqueous dispersion

向四口燒瓶中裝入離子交換水302質量份,於氮氣流中升溫至60℃,接著添加過硫酸銨0.5質量份、亞硝酸氫鈉0.2質量份作爲聚合引發劑,再用3小時滴入甲基丙烯酸甲酯23.3質量份、2-異丙烯基-2-噁唑啉22.6質量份、聚氧化乙烯(n=10)甲基丙烯酸酯40.7質量份、丙烯醯胺13.3質量份的混合物作爲單體,同時調整液溫至60~70℃。滴加結束後,於該溫度範圍內保持2小時,並攪拌,使之繼續進行反應,繼而冷卻,獲得固體成分為25質量%的丙烯酸樹脂之水分散體(Tg=50℃)。302 parts by mass of ion-exchanged water was placed in a four-necked flask, and the temperature was raised to 60 ° C in a nitrogen stream, and then 0.5 parts by mass of ammonium persulfate and 0.2 parts by mass of sodium hydrogen nitrite were added as a polymerization initiator, and then dropped for 3 hours. 23.3 parts by mass of methyl methacrylate, 22.6 parts by mass of 2-isopropenyl-2-oxazoline, 40.7 parts by mass of polyethylene oxide (n=10) methacrylate, and 13.3 parts by mass of acrylamide as a single Body, while adjusting the liquid temperature to 60 ~ 70 ° C. After completion of the dropwise addition, the mixture was kept at this temperature for 2 hours, stirred, and the reaction was continued, followed by cooling to obtain an aqueous dispersion of an acrylic resin having a solid content of 25% by mass (Tg = 50 ° C).

(3)二氧化矽及二氧化鈦之複合無機粒子的合成(3) Synthesis of composite inorganic particles of cerium oxide and titanium dioxide

向帶攪拌葉、內容積為4升之玻璃製反應容器中裝入甲醇140質量份、異丙醇260質量份及氨水(25質量%)100質量份,調製反應液,將反應液的溫度保持為40℃並進行攪拌。接著,向3升之三角燒瓶中裝入四甲氧基矽[Si(OMe)4、COLCOAT(株)、商品名;甲基矽酸酯39]542質量份,攪拌並添加甲醇195質量份與0.1質量%鹽酸水溶液[用水將35質量%鹽酸、和光純藥工業(株)稀釋為1/1000]28質量份,攪拌約10分鐘。140 parts by mass of methanol, 260 parts by mass of isopropyl alcohol, and 100 parts by mass of ammonia water (25 mass%) were placed in a reaction vessel made of glass with a stirring blade and an internal volume of 4 liters to prepare a reaction liquid, and the temperature of the reaction liquid was maintained. At 40 ° C and stirring. Next, 434 parts by mass of tetramethoxy fluorene [Si(OMe) 4, COLCOAT Co., Ltd., trade name; methyl phthalate 39] was placed in a 3-liter Erlenmeyer flask, and 195 parts by mass of methanol was added thereto while stirring. A mass% of 0.1% by mass of hydrochloric acid [35% by mass of hydrochloric acid and Wako Pure Chemical Industries, Ltd. diluted to 1/1000] was 28 parts by mass, and stirred for about 10 minutes.

繼而,添加用異丙醇634質量份對四異丙氧基鈦[Ti(O-i-Pr)4、日本曹達(株)、商品名;A-1(TPT)]300質量份進行稀釋之稀釋液,獲得透明、均勻的溶液(四烷氧基矽與四烷氧基鈦之共聚物)。分別用2小時將上述均勻溶液1699質量份與氨水(25質量%)480質量份同時滴入上述反應液中,使開始時的滴加速度緩慢,然後緩慢加快速度直至滴加結束。滴加結束後,過濾所獲得之共水解產物,於50℃下乾燥有機溶媒,之後,使其分散於水中,獲得濃度10質量%、折射率1.56之二氧化矽及二氧化鈦的複合無機粒子(平均粒徑:100nm)。Then, a diluent diluted with 300 parts by mass of titanium isopropoxide [Ti(Oi-Pr) 4 , Japan Soda Co., Ltd., trade name; A-1 (TPT)] was added with 634 parts by mass of isopropyl alcohol. A clear, homogeneous solution (copolymer of tetraalkoxyquinone and tetraalkoxy titanium) is obtained. 1699 parts by mass of the above homogeneous solution and 480 parts by mass of aqueous ammonia (25% by mass) were simultaneously dropped into the above reaction liquid over 2 hours, so that the drip acceleration at the beginning was slow, and then the speed was slowly increased until the completion of the dropwise addition. After completion of the dropwise addition, the obtained cohydrolyzed product was filtered, and the organic solvent was dried at 50 ° C, and then dispersed in water to obtain a composite inorganic particle having a concentration of 10% by mass and a refractive index of 1.56 of cerium oxide and titanium oxide (average Particle size: 100 nm).

(4)黏著層塗佈液之調製(4) Preparation of adhesive layer coating solution

對聚酯167質量份、丙烯酸樹脂水分散體20質量份、二氧化矽及二氧化鈦複合無機粒子3質量份、作爲添加劑之巴西棕櫚蠟[中京油脂(株)製商品名Serozol 524]5質量份以及作爲濕潤劑之聚氧乙烯(n=7)月桂基醚[三洋化成工業(株)製、商品名Naroacty N-70]5質量份進行混合,獲得黏著層塗佈液。167 parts by mass of a polyester, 20 parts by mass of an aqueous acrylic resin dispersion, 3 parts by mass of cerium oxide and titanium dioxide composite inorganic particles, and 5 parts by mass of carnauba wax (product name Serozol 524, manufactured by Nakagisa Oil & Fat Co., Ltd.) as an additive and 5 parts by mass of polyoxyethylene (n=7) lauryl ether (manufactured by Sanyo Chemical Industries, Ltd., trade name Naroacty N-70) was mixed as a wetting agent to obtain an adhesive layer coating liquid.

[製造例2、塗液(N-1)之調製][Manufacturing Example 2, Preparation of Coating Liquid (N-1)]

對二季戊四醇六丙烯酸酯70質量份、1,6-雙(3-丙烯醯氧基-2-羥基丙氧基)己烷30質量份、光聚合引發劑[產品名「IRGACURE184」、日本汽巴(株)製]4質量份及異丙醇100質量份混合,調製塗液(N-1)。該塗液(N-1)之聚合硬化物(於氮氣環境下利用400mJ/cm2之紫外線硬化)的折射率為1.52。70 parts by mass of dipentaerythritol hexaacrylate and 30 parts by mass of 1,6-bis(3-propenyloxy-2-hydroxypropoxy)hexane, photopolymerization initiator [product name "IRGACURE 184", Japan Ciba 4 parts by mass and 100 parts by mass of isopropyl alcohol were mixed to prepare a coating liquid (N-1). The polymer cured product of the coating liquid (N-1) (cured by ultraviolet rays of 400 mJ/cm 2 in a nitrogen atmosphere) had a refractive index of 1.52.

[製造例3、塗液(N-2)之調製][Manufacturing Example 3, Preparation of Coating Liquid (N-2)]

對二季戊四醇六丙烯酸酯50質量份、二氧化矽有機溶膠[商品名:「IPA-ST」、日產化學工業(株)製]166質量份、甲基乙基酮20質量份及光聚合引發劑[商品名:「IRGACURE184」、日本汽巴(株)製]4質量份混合,調製塗液(N-2)。該塗液(N-2)之聚合硬化物(於氮氣環境下利用400mJ/cm2之紫外線硬化)的折射率為1.49。50 parts by mass of dipentaerythritol hexaacrylate, cerium oxide organosol [trade name: "IPA-ST", manufactured by Nissan Chemical Industries Co., Ltd.), 166 parts by mass, methyl ethyl ketone 20 parts by mass, and photopolymerization initiator [Product name: "IRGACURE 184", manufactured by Nippon Ciba Co., Ltd.] 4 parts by mass was mixed to prepare a coating liquid (N-2). The polymer cured product of the coating liquid (N-2) (cured by ultraviolet rays of 400 mJ/cm 2 in a nitrogen atmosphere) had a refractive index of 1.49.

[製造例4、塗液(N-3)之調製][Manufacturing Example 4, Preparation of Coating Liquid (N-3)]

對摻雜銻於二氧化錫之30質量%甲基乙基酮分散液[商品名:「SNS-10M」、石原產業(株)製]233質量份、二季戊四醇六丙烯酸酯30質量份及光聚合引發劑[商品名:「IRGACURE184」、日本汽巴(株)製]5質量份混合,調製塗液(N-3)。該塗液(N-3)之聚合硬化物(於氮氣環境下利用400mJ/cm2之紫外線硬化)的折射率為1.64。233 parts by mass of a 30% by mass methyl ethyl ketone dispersion (trade name: "SNS-10M", manufactured by Ishihara Sangyo Co., Ltd.), 30 parts by mass of dipentaerythritol hexaacrylate, and light. 5 parts by mass of a polymerization initiator [trade name: "IRGACURE 184", manufactured by Nippon Ciba Co., Ltd.] was mixed to prepare a coating liquid (N-3). The polymer cured product of the coating liquid (N-3) (cured by ultraviolet rays of 400 mJ/cm 2 in a nitrogen atmosphere) had a refractive index of 1.64.

[製造例5、塗液(N-4)之調製][Manufacturing Example 5, Preparation of Coating Liquid (N-4)]

對摻雜銻於二氧化錫之30質量%甲基乙基酮分散液[商品名:「SNS-10M」、石原產業(株)製]100質量份、四羥甲基甲烷三丙烯酸酯70質量份、光聚合引發劑[商品名:「KAYACURE BMS」、日本化藥(株)製]5質量份及丁醇830質量份混合,調製塗液(N-4)。該塗液(N-4)之聚合硬化物(於氮氣環境下利用400mJ/cm2之紫外線硬化)的折射率為1.54。30 mass% methyl ethyl ketone dispersion doped with tin oxide (product name: "SNS-10M", manufactured by Ishihara Sangyo Co., Ltd.) 100 parts by mass, tetramethylol methane triacrylate 70 mass 5 parts by mass of a photopolymerization initiator [product name: "KAYACURE BMS", manufactured by Nippon Kayaku Co., Ltd.) and 830 parts by mass of butanol were mixed to prepare a coating liquid (N-4). The polymer cured product of the coating liquid (N-4) (cured by ultraviolet rays of 400 mJ/cm 2 under a nitrogen atmosphere) had a refractive index of 1.54.

[製造例6、塗液(N-5)之調製][Manufacturing Example 6, Preparation of Coating Liquid (N-5)]

對氧化鋯[商品名:「Nano Use ZR-30AL」、日產化學工業(株)製]283質量份、四羥甲基甲烷三丙烯酸酯15質量份、光聚合引發劑[商品名:「KAYACURE BMS」、日本化藥(株)製]5質量份及丁醇702質量份混合,調製塗液(N-5)。該塗液(N-5)之聚合硬化物(於氮氣環境下利用400mJ/cm2之紫外線硬化)的折射率為1.68。283 parts by mass of zirconia [product name: "Nano Use ZR-30AL", manufactured by Nissan Chemical Co., Ltd.), 15 parts by mass of tetramethylol methane triacrylate, and photopolymerization initiator [product name: "KAYACURE BMS" 5 parts by mass of Nippon Chemical Co., Ltd. and 702 parts by mass of butanol were mixed to prepare a coating liquid (N-5). The polymer cured product of the coating liquid (N-5) (cured by ultraviolet rays of 400 mJ/cm 2 in a nitrogen atmosphere) had a refractive index of 1.68.

[製造例7、塗液(N-6)之調製][Manufacturing Example 7, Preparation of Coating Liquid (N-6)]

對二季戊四醇六丙烯酸酯40質量份、中空二氧化矽溶膠[商品名:「NY-1016SIV」、固體成分濃度20質量%、平均粒徑60nm、觸媒化成工業(株)製]300質量份、光聚合引發劑[商品名:「KAYACURE BMS」、日本化藥(株)製]5質量份混合,調製塗液(N-6)。該塗液(N-6)之聚合硬化物(於氮氣環境下利用400mJ/cm2之紫外線硬化)的折射率為1.35。40 parts by mass of dipentaerythritol hexaacrylate, 300 parts by mass of hollow cerium oxide sol [trade name: "NY-1016SIV", solid content concentration: 20% by mass, average particle diameter: 60 nm, manufactured by Catalyst Chemical Co., Ltd.) 5 parts by mass of a photopolymerization initiator [product name: "KAYACURE BMS", manufactured by Nippon Kayaku Co., Ltd.) was mixed to prepare a coating liquid (N-6). The polymer cured product of the coating liquid (N-6) (cured by ultraviolet rays of 400 mJ/cm 2 in a nitrogen atmosphere) had a refractive index of 1.35.

[製造例8、塗液[N-7)之調製][Manufacturing Example 8, Preparation of Coating Liquid [N-7]]

對1,10-二丙烯醯氧基-2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9-十六氟癸烷40質量份、中空二氧化矽溶膠[商品名:「NY-1016SIV」、固體成分濃度20質量%、平均粒徑60nm、觸媒化成工業(株)製]300質量份、光聚合引發劑[商品名:「KAYACURE BMS」、日本化藥(株)製]5質量份混合,調製塗液(N-7)。該塗液(N-7)之聚合硬化物(於氮氣環境下利用400mJ/cm2之紫外線硬化)的折射率為1.32。For the mass of 1,10-dipropenyloxy-2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9-hexadecafluorodecane Part, hollow cerium oxide sol [trade name: "NY-1016SIV", solid content concentration: 20% by mass, average particle diameter: 60 nm, manufactured by Catalyst Chemical Co., Ltd.), 300 parts by mass, photopolymerization initiator [product name: 5 parts by mass of "KAYACURE BMS" and manufactured by Nippon Kayaku Co., Ltd. were mixed to prepare a coating liquid (N-7). The polymer cured product of the coating liquid (N-7) (cured by ultraviolet rays of 400 mJ/cm 2 under a nitrogen atmosphere) had a refractive index of 1.32.

(實施例1)(Example 1)

於膜厚為100μm之聚對苯二甲酸乙二酯(PET)薄膜[商品名:「A4100」、東洋紡織(株)製]中未形成易黏著層之面上,利用凹版印刷塗佈法塗佈製造例1之黏著層塗佈液,並調整層厚,使黏著層14之膜厚為40nm。The surface of the polyethylene terephthalate (PET) film having a thickness of 100 μm (trade name: "A4100", manufactured by Toyobo Co., Ltd.) is not formed on the surface of the easy-adhesion layer, and is coated by gravure coating. The adhesive layer coating liquid of Example 1 was prepared, and the layer thickness was adjusted so that the thickness of the adhesive layer 14 was 40 nm.

利用線棒塗佈機於其上塗佈上述塗液(N-1),並調整層厚,使膜厚為3μm,乾燥後,於大氣下利用400mJ/cm2之紫外線硬化,獲得保護層。接著,於該保護層12上製作第1光學干涉層13a,即利用旋轉塗佈機塗佈塗液(N-4),並調整層厚,使膜厚為170nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化。The coating liquid (N-1) was applied thereon by a bar coater, and the layer thickness was adjusted to have a film thickness of 3 μm. After drying, it was cured by ultraviolet rays of 400 mJ/cm 2 in the air to obtain a protective layer. Next, the first optical interference layer 13a was formed on the protective layer 12, that is, the coating liquid (N-4) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 170 nm. After drying, the atmosphere was exposed to nitrogen. It is hardened by ultraviolet rays of 400 mJ/cm2.

進而,於其上製作第2光學干涉層13b,即利用旋轉塗佈機塗佈塗液(N-6),並調整層厚,使膜厚為100nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化,製作出減反射材料10。所獲得之減反射材料10如圖1所示,於透明樹脂薄膜11上設有保護層12,於該保護層12之表面設有作爲減反射層13之第1光學干涉層13a及第2光學干涉層13b。Further, the second optical interference layer 13b was formed thereon, that is, the coating liquid (N-6) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 100 nm. After drying, the coating liquid was used in a nitrogen atmosphere at 400 mJ/ The ultraviolet light of cm2 is hardened to produce an antireflection material 10. As shown in FIG. 1, the obtained anti-reflection material 10 is provided with a protective layer 12 on the transparent resin film 11, and a first optical interference layer 13a and a second optical layer as the anti-reflection layer 13 are provided on the surface of the protective layer 12. Interference layer 13b.

所獲得之減反射材料10的視感度反射率、光線波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(a)所示。圖3(a)中,反射率振幅之差的最大值表示為X。又,圖3(a)中,表示反射率光譜之波浪中心的連線用虛線表示,根據該虛線判斷平緩化程度。其結果如圖3(a)所示,可知於視感度波長範圍(光線波長500~650nm)內,與比較例1[圖3(b)所示]相比,本實施例1之光譜中心線非常平緩。The results of evaluation of the difference between the sensitivity reflectance of the obtained antireflection material 10 and the reflectance amplitude of the region of the light ray wavelength of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppression effect are shown in Table 1, respectively. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(a). In Fig. 3(a), the maximum value of the difference in reflectance amplitude is represented by X. Further, in Fig. 3(a), the line connecting the wave center of the reflectance spectrum is indicated by a broken line, and the degree of smoothing is determined based on the broken line. As a result, as shown in FIG. 3(a), it is understood that the spectral center line of the first embodiment is larger than the comparative example 1 [shown in FIG. 3(b)] in the luminosity wavelength range (light ray wavelength of 500 to 650 nm). Very gentle.

(實施例2)(Example 2)

於膜厚為100μm之聚對苯二甲酸乙二酯(PET)薄膜[商品名:「A4100」、東洋紡織(株)製]中未形成易黏著層之面上,利用凹版印刷塗佈法塗佈製造例1之黏著層塗佈液,並調整層厚,使膜厚為85nm。The surface of the polyethylene terephthalate (PET) film having a thickness of 100 μm (trade name: "A4100", manufactured by Toyobo Co., Ltd.) is not formed on the surface of the easy-adhesion layer, and is coated by gravure coating. The adhesive layer coating liquid of Example 1 was prepared, and the layer thickness was adjusted so that the film thickness was 85 nm.

利用線棒塗佈機於其上塗佈塗液(N-1),並調整層厚,使膜厚為3μm,乾燥後,於大氣下利用400mJ/cm2之紫外線硬化,獲得保護層12。接著,於該保護層12上製作第1光學干涉層13a,即利用旋轉塗佈機塗佈塗液(N-4),並調整層厚,使膜厚為170nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化。進而,於其上製作第2光學干涉層13b,即利用旋轉塗佈機塗佈塗液(N-7),並調整層厚,使膜厚為100nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化,製作出減反射材料10。所獲得之減反射材料10如圖2所示,於透明樹脂薄膜11上,介由黏著層14設有保護層12,於該保護層12之表面設有作爲減反射層13之第1光學干涉層13a及第2光學干涉層13b。The coating liquid (N-1) was applied thereon by a bar coater, and the layer thickness was adjusted to have a film thickness of 3 μm. After drying, it was cured by ultraviolet rays of 400 mJ/cm 2 in the atmosphere to obtain a protective layer 12. Next, the first optical interference layer 13a was formed on the protective layer 12, that is, the coating liquid (N-4) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 170 nm. After drying, the atmosphere was exposed to nitrogen. It is hardened by ultraviolet rays of 400 mJ/cm2. Further, the second optical interference layer 13b was formed thereon, that is, the coating liquid (N-7) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 100 nm. After drying, the coating liquid was used in a nitrogen atmosphere at 400 mJ/ The ultraviolet light of cm2 is hardened to produce an antireflection material 10. As shown in FIG. 2, the obtained anti-reflection material 10 is provided with a protective layer 12 on the transparent resin film 11 via the adhesive layer 14, and a first optical interference as the anti-reflection layer 13 is provided on the surface of the protective layer 12. Layer 13a and second optical interference layer 13b.

所獲得之減反射材料10的視感度反射率、光線波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(c)所示。圖3(c)中,反射率振幅之差的最大值表示為X。如圖3(c)所示,可知於視感度波長範圍內,與比較例2[圖3(d)所示]相比,實施例2之光譜中心線非常平緩。The results of evaluation of the difference between the sensitivity reflectance of the obtained antireflection material 10 and the reflectance amplitude of the region of the light ray wavelength of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppression effect are shown in Table 1, respectively. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(c). In Fig. 3(c), the maximum value of the difference in reflectance amplitude is represented by X. As shown in FIG. 3(c), it is understood that the spectral center line of the second embodiment is very gentle compared to the comparative example 2 [shown in FIG. 3(d)] in the luminosity wavelength range.

(實施例3)(Example 3)

於膜厚為80μm之三醋酸纖維素(TAC)薄膜[商品名:「KC8UY」、Konica Minolta Opto(株)製]上,利用線棒塗佈機塗佈塗液(N-2),並調整層厚,使膜厚為3μm,利用400mJ/cm2之紫外線硬化,獲得保護層12。接著,於該保護層12上製作第1光學干涉層13a,即利用旋轉塗佈機塗佈塗液(N-4),並調整層厚,使膜厚為160nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化。進而,於其上製作第2光學干涉層13b,即利用旋轉塗佈機塗佈塗液(N-6),並調整層厚,使膜厚為95nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化,製作出減反射材料10。所獲得之減反射材料10的視感度反射率、波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(e)所示。如圖3(e)所示,可知於視感度波長範圍內,與比較例3[圖3(f)所示]或比較例4[圖3(h)所示]相比,實施例3之光譜中心線更加平緩。The coating liquid (N-2) was applied by a bar coater on a cellulose triacetate (TAC) film having a thickness of 80 μm (trade name: "KC8UY", manufactured by Konica Minolta Opto Co., Ltd.), and adjusted. The layer thickness was such that the film thickness was 3 μm, and it was cured by ultraviolet rays of 400 mJ/cm 2 to obtain a protective layer 12. Next, the first optical interference layer 13a was formed on the protective layer 12, that is, the coating liquid (N-4) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 160 nm, and dried under a nitrogen atmosphere. It is hardened by ultraviolet rays of 400 mJ/cm2. Further, the second optical interference layer 13b was formed thereon, that is, the coating liquid (N-6) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 95 nm. After drying, the coating liquid was used in a nitrogen atmosphere at 400 mJ/ The ultraviolet light of cm2 is hardened to produce an antireflection material 10. Table 1 shows the evaluation results of the difference between the visual reflectance of the obtained antireflection material 10 and the maximum value of the reflectance amplitude of the region in the wavelength range of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppressing effect. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(e). As shown in FIG. 3(e), it can be seen that in the luminosity wavelength range, compared with Comparative Example 3 [shown in FIG. 3(f)] or Comparative Example 4 [shown in FIG. 3(h)], Example 3 The spectral centerline is more gradual.

(實施例4)(Example 4)

除使用塗液(N-7)作爲第2光學干涉層13b以外,其他均與實施例3一樣,製作減反射材料10。所獲得之減反射材料10的視感度反射率、波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(g)所示。如圖3(g)所示,可知於視感度波長範圍(光線波長500~650nm)內,與比較例4[圖3(h)所示]相比,實施例4之光譜中心線更加平緩。The antireflection material 10 was produced in the same manner as in Example 3 except that the coating liquid (N-7) was used as the second optical interference layer 13b. Table 1 shows the evaluation results of the difference between the visual reflectance of the obtained antireflection material 10 and the maximum value of the reflectance amplitude of the region in the wavelength range of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppressing effect. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(g). As shown in Fig. 3(g), it is understood that the spectral center line of the fourth embodiment is more gradual than the comparative example 4 [shown in Fig. 3(h)) in the luminosity wavelength range (light ray wavelength of 500 to 650 nm).

(實施例5)(Example 5)

於膜厚為100μm之聚對苯二甲酸乙二酯(PET)薄膜[商品名:「A4100」、東洋紡織(株)製]中未形成易黏著層之面上,利用凹版印刷塗佈法塗佈黏著層塗佈液,並調整層厚,使膜厚為10nm。The surface of the polyethylene terephthalate (PET) film having a thickness of 100 μm (trade name: "A4100", manufactured by Toyobo Co., Ltd.) is not formed on the surface of the easy-adhesion layer, and is coated by gravure coating. The cloth was adhered to the coating liquid, and the layer thickness was adjusted to have a film thickness of 10 nm.

利用線棒塗佈機於其上塗佈塗液(N-3),並調整層厚,使膜厚為3μm,乾燥後,於大氣下利用400mJ/cm2之紫外線硬化,獲得保護層12。接著,於該保護層12上製作第1光學干涉層13a,即利用旋轉塗佈機塗佈塗液(N-5),並調整層厚,使膜厚為155nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化。進而,於其上製作第2光學干涉層13b,即利用旋轉塗佈機塗佈塗液(N-7),並調整層厚,使膜厚為96nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化,製作出減反射材料10。所獲得之減反射材料10的視感度反射率、波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(i)所示。如圖3(i)所示,可知於視感度波長範圍(光線波長500~650nm)內,與比較例5[圖3(j)所示]相比,實施例5之光譜中心線良好地實現了平緩化。The coating liquid (N-3) was applied thereon by a bar coater, and the layer thickness was adjusted to have a film thickness of 3 μm. After drying, it was cured by ultraviolet rays of 400 mJ/cm 2 in the atmosphere to obtain a protective layer 12. Next, the first optical interference layer 13a was formed on the protective layer 12, that is, the coating liquid (N-5) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 155 nm. After drying, the atmosphere was exposed to nitrogen. It is hardened by ultraviolet rays of 400 mJ/cm2. Further, the second optical interference layer 13b was formed thereon, that is, the coating liquid (N-7) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 96 nm. After drying, the coating liquid was used in a nitrogen atmosphere at 400 mJ/ The ultraviolet light of cm2 is hardened to produce an antireflection material 10. Table 1 shows the evaluation results of the difference between the visual reflectance of the obtained antireflection material 10 and the maximum value of the reflectance amplitude of the region in the wavelength range of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppressing effect. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(i). As shown in Fig. 3(i), it can be seen that the spectral center line of Example 5 is well realized in the luminosity wavelength range (light wavelength of 500 to 650 nm) as compared with Comparative Example 5 [shown in Fig. 3(j)]. Smoothed down.

(比較例1)(Comparative Example 1)

於膜厚為100μm之聚對苯二甲酸乙二酯(PET)薄膜[商品名:「A4100」、東洋紡織(株)製]中未形成易黏著層之面上,利用線棒塗佈機塗佈塗液(N-2),並調整層厚,使膜厚為3μm,乾燥後,於大氣下利用400mJ/cm2之紫外線硬化,獲得保護層12。接著,於該保護層12上製作第1光學干涉層13a,即利用旋轉塗佈機塗佈塗液(N-4),並調整層厚,使膜厚為100nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化。In a polyethylene terephthalate (PET) film having a thickness of 100 μm (trade name: "A4100", manufactured by Toyobo Co., Ltd.), the surface of the easy-adhesion layer is not formed, and it is coated by a wire bar coater. The coating liquid (N-2) was adjusted to have a thickness of 3 μm, dried, and then cured by ultraviolet rays of 400 mJ/cm 2 in the atmosphere to obtain a protective layer 12. Next, the first optical interference layer 13a is formed on the protective layer 12, that is, the coating liquid (N-4) is applied by a spin coater, and the layer thickness is adjusted to have a film thickness of 100 nm. After drying, the atmosphere is exposed to nitrogen. It is hardened by ultraviolet rays of 400 mJ/cm2.

進而,於其上製作第2光學干涉層13b,即利用旋轉塗佈機塗佈塗液(N-6),並調整層厚,使膜厚為100nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化,製作出減反射材料10。所獲得之減反射材料10的視感度反射率、波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(b)所示。Further, the second optical interference layer 13b was formed thereon, that is, the coating liquid (N-6) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 100 nm. After drying, the coating liquid was used in a nitrogen atmosphere at 400 mJ/ The ultraviolet light of cm2 is hardened to produce an antireflection material 10. Table 1 shows the evaluation results of the difference between the visual reflectance of the obtained antireflection material 10 and the maximum value of the reflectance amplitude of the region in the wavelength range of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppressing effect. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(b).

(比較例2)(Comparative Example 2)

除使用塗液(N-2)作爲第1光學干涉層13a之塗液以外,其他均與實施例2一樣,製作減反射材料10。所獲得之減反射材料10的視感度反射率、波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(d)所示。The antireflection material 10 was produced in the same manner as in Example 2 except that the coating liquid (N-2) was used as the coating liquid of the first optical interference layer 13a. Table 1 shows the evaluation results of the difference between the visual reflectance of the obtained antireflection material 10 and the maximum value of the reflectance amplitude of the region in the wavelength range of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppressing effect. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(d).

(比較例3)(Comparative Example 3)

除塗佈時調整層之膜厚,使第1光學干涉層13a之膜厚為100nm以外,其他均與實施例3一樣,製作減反射材料10。所獲得之減反射材料10的視感度反射率、波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(f)所示。The antireflection material 10 was produced in the same manner as in Example 3 except that the film thickness of the layer was adjusted at the time of coating, and the film thickness of the first optical interference layer 13a was changed to 100 nm. Table 1 shows the evaluation results of the difference between the visual reflectance of the obtained antireflection material 10 and the maximum value of the reflectance amplitude of the region in the wavelength range of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppressing effect. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(f).

(比較例4)(Comparative Example 4)

除塗佈時調整層之膜厚,使第1光學干涉層13a之膜厚為260nm以外,其他均與實施例3一樣,製作減反射材料10。所獲得之減反射材料10的視感度反射率、波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率如圖3(h)所示。The antireflection material 10 was produced in the same manner as in Example 3 except that the film thickness of the layer was adjusted at the time of coating, and the film thickness of the first optical interference layer 13a was 260 nm. Table 1 shows the evaluation results of the difference between the visual reflectance of the obtained antireflection material 10 and the maximum value of the reflectance amplitude of the region in the wavelength range of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppressing effect. The spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(h).

(比較例5)(Comparative Example 5)

於膜厚為80μm之三醋酸纖維素(TAC)薄膜[商品名:「KC8UY」、Konica Minolta Opto(株)製]上,利用線棒塗佈機塗佈塗液(N-1),並調整層厚,使膜厚為3μm,利用400mJ/cm2之紫外線硬化,獲得保護層12。接著,於該保護層12上製作第1光學干涉層13a,即利用旋轉塗佈機塗佈塗液(N-3),並調整層厚,使膜厚為100nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化。進而,於其上製作第2光學干涉層13b,即利用旋轉塗佈機塗佈塗液(N-6),並調整層厚,使膜厚為100nm,乾燥後,於氮氣環境下利用400mJ/cm2之紫外線硬化,製作出減反射材料10。所獲得之減反射材料10的視感度反射率、波長500~650nm區域之反射率振幅之差的最大值、ab色度Cab*及著色抑制效果的評價結果分別如表1所示。減反射材料10之分光反射率之光譜如圖3(j)所示。The coating liquid (N-1) was applied by a bar coater on a cellulose triacetate (TAC) film having a thickness of 80 μm (trade name: "KC8UY", manufactured by Konica Minolta Opto Co., Ltd.), and adjusted. The layer thickness was such that the film thickness was 3 μm, and it was cured by ultraviolet rays of 400 mJ/cm 2 to obtain a protective layer 12. Next, the first optical interference layer 13a was formed on the protective layer 12, that is, the coating liquid (N-3) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 100 nm. After drying, the atmosphere was exposed to nitrogen. It is hardened by ultraviolet rays of 400 mJ/cm2. Further, the second optical interference layer 13b was formed thereon, that is, the coating liquid (N-6) was applied by a spin coater, and the layer thickness was adjusted to have a film thickness of 100 nm. After drying, the coating liquid was used in a nitrogen atmosphere at 400 mJ/ The ultraviolet light of cm2 is hardened to produce an antireflection material 10. Table 1 shows the evaluation results of the difference between the visual reflectance of the obtained antireflection material 10 and the maximum value of the reflectance amplitude of the region in the wavelength range of 500 to 650 nm, the ab chromaticity Cab*, and the coloring suppressing effect. The spectrum of the spectral reflectance of the anti-reflective material 10 is shown in Fig. 3(j).

表1所示之結果表明,實施例1所製作之減反射材料10藉由控制保護層12、第1光學干涉層13a及第2光學干涉層13b之折射率與膜厚,而使視感度波長範圍內之反射率固定,塗佈層之膜厚變動引發的著色不均不明顯。再者,實施例2及5中,設置有折射率及膜厚適當之黏著層14及保護層12,又,實施例3及4中,使用了折射率為(TAC薄膜之折射率)±0.02以內的保護層12。因此,光線波長500~650nm之反射率振幅之差的最大值為0.5%以下,除反射率之平緩化以外,亦可減少干涉不均,更有效地減少塗佈層之膜厚變動引發的著色不均。又,任一減反射材料於CIE標準光源D65下的ab色度Cab*為5以下,視感度反射率Y為1.5%以下,兼具優秀之外觀與低反射率。The results shown in Table 1 indicate that the anti-reflection material 10 produced in Example 1 has a viewing wavelength by controlling the refractive index and film thickness of the protective layer 12, the first optical interference layer 13a, and the second optical interference layer 13b. The reflectance in the range is fixed, and the color unevenness caused by the variation in the film thickness of the coating layer is not remarkable. Further, in Examples 2 and 5, the adhesive layer 14 and the protective layer 12 having a proper refractive index and film thickness were provided, and in Examples 3 and 4, the refractive index (refractive index of the TAC film) ± 0.02 was used. Protective layer 12 within. Therefore, the maximum value of the difference in the reflectance amplitude of the light wavelength of 500 to 650 nm is 0.5% or less, and in addition to the smoothing of the reflectance, the interference unevenness can be reduced, and the coloring caused by the film thickness variation of the coating layer can be more effectively reduced. Uneven. Further, the ab chromaticity Cab* of any of the antireflection materials under the CIE standard light source D65 is 5 or less, and the visual reflectance Y is 1.5% or less, and has both excellent appearance and low reflectance.

與此相對,比較例2中,第1光學干涉層13a之折射率低於保護層12,比較例1及比較例3~5中,第1光學干涉層13a之膜厚/第2光學干涉層13b之膜厚的比率在1.6~1.8範圍之外,故視感度波長範圍內光譜不平緩,ab色度Cab*值亦超過5。此外,比較例1中無黏著層14,故光線波長500~650nm之反射率振幅之差的最大值超過1.0%,保護層12之干涉不均較多,減反射層13表面出現浮油狀模樣。進而,任一比較例中,塗佈層之膜厚變動引發的著色不均明顯。On the other hand, in Comparative Example 2, the refractive index of the first optical interference layer 13a was lower than that of the protective layer 12, and in the comparative example 1 and the comparative examples 3 to 5, the film thickness of the first optical interference layer 13a / the second optical interference layer The ratio of the film thickness of 13b is outside the range of 1.6 to 1.8, so the spectrum is not smooth in the wavelength range of the visual sensitivity, and the Ab* value of the ab color is also more than 5. Further, in Comparative Example 1, the adhesive layer 14 was absent, so that the maximum value of the difference in reflectance amplitude of the light wavelength of 500 to 650 nm exceeded 1.0%, the interference unevenness of the protective layer 12 was large, and the oil-repellent appearance appeared on the surface of the anti-reflection layer 13. . Further, in any of the comparative examples, the color unevenness caused by the variation in the film thickness of the coating layer was remarkable.

另外,亦可將上述實施形態進行如下變更並實施。Further, the above embodiment can be modified and implemented as follows.

‧ 亦可如下構成:於形成上述保護層12之組合物中添加具有羧基、胺基等之單體,提高保護層12與透明樹脂薄膜11之密著性。‧ A monomer having a carboxyl group, an amine group or the like is added to the composition forming the protective layer 12 to improve the adhesion between the protective layer 12 and the transparent resin film 11.

‧ 亦可使保護層形成用組合物中含有近紅外線吸收劑、紫外線吸收劑等,使保護層12發揮近紅外線吸收效果或紫外線吸收效果,或者使透明樹脂薄膜11中含有近紅外線吸收劑、紫外線吸收劑等,使其發揮近紅外線吸收效果或紫外線吸收效果。‧ The protective layer-forming composition may contain a near-infrared ray absorbing agent, an ultraviolet ray absorbing agent, or the like, and the protective layer 12 may exhibit a near-infrared absorbing effect or an ultraviolet absorbing effect, or the transparent resin film 11 may contain a near-infrared absorbing agent or ultraviolet ray. An absorbent or the like is used to exert a near-infrared absorption effect or an ultraviolet absorption effect.

再者,由上述實施形態可獲得之技術思想如下所述。Furthermore, the technical idea obtained by the above embodiment is as follows.

○ 申請專利範圍第1至3項中任一項所述之減反射材料之特徵在於:上述透明樹脂薄膜由聚酯樹脂或醋酸纖維素形成。若採用此種結構,除具備申請專利範圍第1至3項中任一項之發明效果外,成形容易且亦容易獲得,並且可將透明樹脂薄膜設定為高或低折射率。The antireflection material according to any one of claims 1 to 3, wherein the transparent resin film is formed of a polyester resin or cellulose acetate. According to this configuration, in addition to the effects of the invention of any one of claims 1 to 3, the molding is easy and easy to obtain, and the transparent resin film can be set to have a high or low refractive index.

○ 申請專利範圍第1至3項中任一項所述之減反射材料之特徵在於:上述透明樹脂薄膜與保護層之間形成有黏著層。若採用此種結構,除具備申請專利範圍第1至3項中任一項之發明效果外,亦可提高透明樹脂薄膜與保護層之間之密著性,並且可減少減反射材料之干涉不均。The antireflection material according to any one of claims 1 to 3, wherein an adhesive layer is formed between the transparent resin film and the protective layer. According to the structure of any one of the first to third aspects of the patent application, the adhesion between the transparent resin film and the protective layer can be improved, and the interference of the anti-reflection material can be reduced. All.

○ 申請專利範圍第1至3項中任一項所述之減反射材料之特徵在於:上述保護層為含有紫外線硬化性多官能丙烯酸酯之單體的聚合硬化物。若採用此種結構,除具備申請專利範圍第1至3項中任一項之發明效果外,亦可提高保護層之硬度,並且可提高減反射材料之生產性。The antireflection material according to any one of claims 1 to 3, wherein the protective layer is a polymer cured product of a monomer containing an ultraviolet curable multifunctional acrylate. According to this configuration, in addition to the effects of the invention of any one of claims 1 to 3, the hardness of the protective layer can be improved, and the productivity of the antireflection material can be improved.

○ 申請專利範圍第1至3項中任一項所述之減反射材料之特徵在於:上述第2光學干涉層之折射率為1.28~1.45。若採用此種結構,除具備申請專利範圍第1至3項中任一項之發明效果外,亦可使第2光學干涉層為充分硬之層,並且可獲得充分之減反射效果。The antireflection material according to any one of claims 1 to 3, wherein the second optical interference layer has a refractive index of 1.28 to 1.45. According to this configuration, in addition to the effects of the invention of any one of claims 1 to 3, the second optical interference layer can be made into a sufficiently hard layer, and a sufficient anti-reflection effect can be obtained.

10...減反射材料10. . . Anti-reflective material

11...透明樹脂薄膜11. . . Transparent resin film

12...保護層12. . . The protective layer

13...減反射層13. . . Antireflection layer

13a...第1光學干涉層13a. . . First optical interference layer

13b...第2光學干涉層13b. . . Second optical interference layer

第1圖係表示實施形態之減反射材料之結構的概要剖面圖。Fig. 1 is a schematic cross-sectional view showing the structure of an antireflection material of an embodiment.

第2圖係表示減反射材料之其他形態的概要剖面圖。Fig. 2 is a schematic cross-sectional view showing another form of the antireflection material.

第3圖(a)係表示實施例1之光線波長與反射率之關係的光譜圖,第3圖(b)係表示比較例1之光線波長與反射率之關係的光譜圖,第3圖(c)係表示實施例2之光線波長與反射率之關係的光譜圖,第3圖(d)係表示比較例2之光線波長與反射率之關係的光譜圖,第3圖(e)係表示實施例3之光線波長與反射率之關係的光譜圖,第3圖(f)係表示比較例3之光線波長與反射率之關係的光譜圖,第3圖(g)係表示實施例4之光線波長與反射率之關係的光譜圖,第3圖(h)係表示比較例4之光線波長與反射率之關係的光譜圖,第3圖(i)係表示實施例5之光線波長與反射率之關係的光譜圖,第3圖(j)係表示比較例5之光線波長與反射率之關係的光譜圖。Fig. 3(a) is a spectrum diagram showing the relationship between the wavelength of light of the first embodiment and the reflectance, and Fig. 3(b) is a spectrum diagram showing the relationship between the wavelength of the light of the comparative example 1 and the reflectance, Fig. 3 (Fig. 3) c) is a spectrum diagram showing the relationship between the wavelength of light of the second embodiment and the reflectance, and Fig. 3(d) is a spectrum diagram showing the relationship between the wavelength of the light of Comparative Example 2 and the reflectance, and Fig. 3(e) shows Fig. 3 is a spectrum diagram showing the relationship between the wavelength of light and the reflectance in the third embodiment, Fig. 3(f) is a spectrum diagram showing the relationship between the wavelength of the light of Comparative Example 3 and the reflectance, and Fig. 3(g) is a diagram showing the relationship of the fourth embodiment. A spectrum of the relationship between the wavelength of the light and the reflectance, Fig. 3(h) is a spectrum showing the relationship between the wavelength of the light of Comparative Example 4 and the reflectance, and Fig. 3(i) is a diagram showing the wavelength and reflection of the light of Example 5. The spectrum of the relationship of the rate, Fig. 3 (j) shows the spectrum of the relationship between the wavelength of the light of Comparative Example 5 and the reflectance.

10...減反射材料10. . . Anti-reflective material

11...透明樹脂薄膜11. . . Transparent resin film

12...保護層12. . . The protective layer

13...減反射層13. . . Antireflection layer

13a...第1光學干涉層13a. . . First optical interference layer

13b...第2光學干涉層13b. . . Second optical interference layer

Claims (4)

一種減反射材料,於透明樹脂薄膜上至少依次疊層有保護層、第1光學干涉層、第2光學干涉層,其特徵在於:上述第1光學干涉層之折射率高於保護層之折射率,兩者折射率之差為0.01~0.05,且第2光學干涉層之折射率低於第1光學干涉層之折射率,第1光學干涉層之膜厚/第2光學干涉層之膜厚的比率為1.6~1.8。An antireflection material having at least a protective layer, a first optical interference layer, and a second optical interference layer laminated on a transparent resin film, wherein a refractive index of the first optical interference layer is higher than a refractive index of the protective layer The difference between the refractive indices of the two is 0.01 to 0.05, and the refractive index of the second optical interference layer is lower than the refractive index of the first optical interference layer, and the film thickness of the first optical interference layer and the film thickness of the second optical interference layer are The ratio is 1.6 to 1.8. 如申請專利範圍第1項所述之減反射材料,其中,光線波長500~650nm區域之反射率振幅之差的最大值為1%以下,且基於JIS Z8720之CIE標準光源D65下,基於JIS Z8729之ab色度Cab*={(a*)2 +(b*)2 }1/2 為5以下。The anti-reflection material according to claim 1, wherein a maximum value of a difference in reflectance amplitude of a region of a light wavelength of 500 to 650 nm is 1% or less, and based on a CIS standard light source D65 of JIS Z8720, based on JIS Z8729 The ab chromaticity Cab*={(a*) 2 +(b*) 2 } 1/2 is 5 or less. 如申請專利範圍第1或2項所述之減反射材料,其中,基於JIS Z8720之CIE標準光源D65下,基於JIS Z8701之視感度反射率Y為1.5%以下。The antireflection material according to the first or second aspect of the invention, wherein the sensibility reflectance Y based on JIS Z8701 is 1.5% or less under the CIS standard light source D65 of JIS Z8720. 一種電子圖像顯示裝置,其中於顯示器前面具備申請專利範圍第1至3項中任一項所述之減反射材料。An electronic image display device comprising the antireflection material according to any one of claims 1 to 3 in front of the display.
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