TW200508648A - Antireflection coating, antireflection film, polar plate, image display device and hard-coat treated article - Google Patents
Antireflection coating, antireflection film, polar plate, image display device and hard-coat treated articleInfo
- Publication number
- TW200508648A TW200508648A TW093119047A TW93119047A TW200508648A TW 200508648 A TW200508648 A TW 200508648A TW 093119047 A TW093119047 A TW 093119047A TW 93119047 A TW93119047 A TW 93119047A TW 200508648 A TW200508648 A TW 200508648A
- Authority
- TW
- Taiwan
- Prior art keywords
- antireflection
- hard
- display device
- image display
- coating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/46—Antireflective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
Abstract
To provide a coating type antireflection coating suitable for mass production, an antireflection coating having lower reflectivity and excellent scratching resistance, an antireflection film comprising the antireflection coating provided on a transparent support, as well as provide an image display device having a surface with excellent scratching resistance and refection resistance, and a hard-coat treated article. The antireflection coating having a cured coating formed from a curing composition consisting of a copolymer (P) comprising a polymerization unit of a fluorine-containing monmer and a polymerization unit having an ethylene-based unsaturated group on the side chain and only a carbon atom on the main chain, and a curing resin comprising 2 or more ethylene-based unsaturated groups within the same molecule; as well as an antireflection film comprising the antireflection coating provided on a transparent support, an image display device composed of the antireflection film, and a hard-coat treated article.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003279009A JP2005043749A (en) | 2003-07-24 | 2003-07-24 | Antireflection coating, antireflection film, polarizing plate, image display device and hard-coated article |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200508648A true TW200508648A (en) | 2005-03-01 |
Family
ID=34265250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093119047A TW200508648A (en) | 2003-07-24 | 2004-06-29 | Antireflection coating, antireflection film, polar plate, image display device and hard-coat treated article |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2005043749A (en) |
KR (1) | KR20050012148A (en) |
TW (1) | TW200508648A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI407159B (en) * | 2005-04-15 | 2013-09-01 | Nitto Denko Corp | Uv-absorbing layer for polarizer plate |
TWI421864B (en) * | 2007-12-27 | 2014-01-01 | Taiyo Yuden Kk | Information recording media and its manufacturing method |
TWI448720B (en) * | 2008-03-31 | 2014-08-11 | Nof Corp | Antireflection material and electronic image display apparatus having the antireflection material |
TWI628456B (en) * | 2012-03-23 | 2018-07-01 | 凸版印刷股份有限公司 | Antireflective film |
TWI718535B (en) * | 2018-05-18 | 2021-02-11 | 南韓商Lg化學股份有限公司 | Anti-reflective film, polarizing plate, and display apparatus |
CN112941922A (en) * | 2021-01-29 | 2021-06-11 | 广州新莱福新材料股份有限公司 | Projection cloth and preparation method thereof |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006328341A (en) * | 2005-04-28 | 2006-12-07 | Jsr Corp | Ethylenically unsaturated group-containing fluorine-containing polymer having high fluorine content, and method for producing the same |
JP2007052282A (en) * | 2005-08-18 | 2007-03-01 | Bridgestone Corp | Film for plasma display |
US7553543B2 (en) * | 2005-12-16 | 2009-06-30 | E. I. Du Pont De Nemours And Company | Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking |
JP2007277504A (en) * | 2006-03-15 | 2007-10-25 | Jsr Corp | Curable resin composition and antireflection film |
JP2007262202A (en) * | 2006-03-28 | 2007-10-11 | Jsr Corp | Curable resin composition, cured film and anti-reflection film |
JP4740184B2 (en) | 2006-05-16 | 2011-08-03 | 日東電工株式会社 | Polarizing plate and image display device using the same |
BRPI0807481A2 (en) | 2007-02-09 | 2014-05-13 | Mitsubishi Rayon Co | TRANSPARENT MOLD BODY AND ARTICLE AVOIDING REFLECTION USING THE SAME |
JP2009221474A (en) * | 2008-02-21 | 2009-10-01 | Nippon Shokubai Co Ltd | Curable resin composition and cured product |
JP2009221475A (en) * | 2008-02-21 | 2009-10-01 | Nippon Shokubai Co Ltd | Curable resin composition and cured product |
JP2011048000A (en) * | 2009-08-25 | 2011-03-10 | Dainippon Printing Co Ltd | Antireflection film, polarizing plate, and display device |
JP5817059B2 (en) | 2011-09-06 | 2015-11-18 | 株式会社ミマキエンジニアリング | UV ink printing method |
JP2015024498A (en) * | 2013-06-17 | 2015-02-05 | 富士フイルム株式会社 | Substrate with decorative material pattern and method for producing the same, multilayer material for forming decorative material, and decorative material pattern-containing multilayer material for forming decorative material |
CN105325056B (en) * | 2013-06-18 | 2017-09-08 | 柯尼卡美能达株式会社 | Organic illuminating element |
JP2016156844A (en) * | 2013-07-01 | 2016-09-01 | 旭硝子株式会社 | Fluorine-containing polymer, hard coat layer formation composition and article having hard coat layer |
JP2016045230A (en) * | 2014-08-20 | 2016-04-04 | 大日本印刷株式会社 | Front plate for display device and manufacturing method of the same |
JP2018183877A (en) * | 2015-09-24 | 2018-11-22 | 日本製紙株式会社 | Hard coat film |
JP6707966B2 (en) * | 2016-04-18 | 2020-06-10 | 日本電気硝子株式会社 | Shading plate |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003026732A (en) * | 2001-04-13 | 2003-01-29 | Fuji Photo Film Co Ltd | Fluorinated copolymer, film-forming composition, reflection-preventive membrane, reflection-preventive film and image display device |
-
2003
- 2003-07-24 JP JP2003279009A patent/JP2005043749A/en active Pending
-
2004
- 2004-06-29 TW TW093119047A patent/TW200508648A/en unknown
- 2004-07-22 KR KR1020040057104A patent/KR20050012148A/en not_active Application Discontinuation
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI407159B (en) * | 2005-04-15 | 2013-09-01 | Nitto Denko Corp | Uv-absorbing layer for polarizer plate |
US8709192B2 (en) | 2005-04-15 | 2014-04-29 | Nitto Denko Corporation | Protective cover sheet comprising a UV-absorbing layer for a polarizer plate and method of making the same |
TWI421864B (en) * | 2007-12-27 | 2014-01-01 | Taiyo Yuden Kk | Information recording media and its manufacturing method |
TWI448720B (en) * | 2008-03-31 | 2014-08-11 | Nof Corp | Antireflection material and electronic image display apparatus having the antireflection material |
TWI628456B (en) * | 2012-03-23 | 2018-07-01 | 凸版印刷股份有限公司 | Antireflective film |
TWI718535B (en) * | 2018-05-18 | 2021-02-11 | 南韓商Lg化學股份有限公司 | Anti-reflective film, polarizing plate, and display apparatus |
US11732142B2 (en) | 2018-05-18 | 2023-08-22 | Lg Chem, Ltd. | Anti-reflective film, polarizing plate, and display apparatus |
CN112941922A (en) * | 2021-01-29 | 2021-06-11 | 广州新莱福新材料股份有限公司 | Projection cloth and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
KR20050012148A (en) | 2005-01-31 |
JP2005043749A (en) | 2005-02-17 |
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