TWI445110B - 分析半導體積體電路裝置之錯誤的方法及其系統 - Google Patents
分析半導體積體電路裝置之錯誤的方法及其系統 Download PDFInfo
- Publication number
- TWI445110B TWI445110B TW096136266A TW96136266A TWI445110B TW I445110 B TWI445110 B TW I445110B TW 096136266 A TW096136266 A TW 096136266A TW 96136266 A TW96136266 A TW 96136266A TW I445110 B TWI445110 B TW I445110B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- defect
- error
- analogy
- characteristic
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 43
- 239000004065 semiconductor Substances 0.000 title claims description 39
- 230000007547 defect Effects 0.000 claims description 136
- 238000012360 testing method Methods 0.000 claims description 40
- 230000002950 deficient Effects 0.000 claims description 25
- 238000004519 manufacturing process Methods 0.000 claims description 24
- 238000001514 detection method Methods 0.000 claims description 22
- 238000005259 measurement Methods 0.000 claims description 18
- 238000004458 analytical method Methods 0.000 claims description 16
- 239000013078 crystal Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 66
- 238000010586 diagram Methods 0.000 description 7
- 230000007812 deficiency Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000004940 physical analysis method Methods 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229940034880 tencon Drugs 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2894—Aspects of quality control [QC]
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/006—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation at wafer scale level, i.e. wafer scale integration [WSI]
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
- G11C29/50—Marginal testing, e.g. race, voltage or current testing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/56—External testing equipment for static stores, e.g. automatic test equipment [ATE]; Interfaces therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/56—External testing equipment for static stores, e.g. automatic test equipment [ATE]; Interfaces therefor
- G11C29/56008—Error analysis, representation of errors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
- G11C2029/0403—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals during or with feedback to manufacture
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
- G11C29/08—Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
- G11C29/12—Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
- G11C29/38—Response verification devices
- G11C29/40—Response verification devices using compression techniques
- G11C2029/4002—Comparison of products, i.e. test results of chips or with golden chip
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
- G11C29/50—Marginal testing, e.g. race, voltage or current testing
- G11C2029/5002—Characteristic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/56—External testing equipment for static stores, e.g. automatic test equipment [ATE]; Interfaces therefor
- G11C2029/5606—Error catch memory
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- For Increasing The Reliability Of Semiconductor Memories (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Static Random-Access Memory (AREA)
- Semiconductor Integrated Circuits (AREA)
- Tests Of Electronic Circuits (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060096065A KR100827440B1 (ko) | 2006-09-29 | 2006-09-29 | 반도체 집적 회로 장치의 불량 분석 방법 및 시스템 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200822261A TW200822261A (en) | 2008-05-16 |
| TWI445110B true TWI445110B (zh) | 2014-07-11 |
Family
ID=39260994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096136266A TWI445110B (zh) | 2006-09-29 | 2007-09-28 | 分析半導體積體電路裝置之錯誤的方法及其系統 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7733719B2 (enExample) |
| JP (1) | JP5393965B2 (enExample) |
| KR (1) | KR100827440B1 (enExample) |
| TW (1) | TWI445110B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7552762B2 (en) * | 2003-08-05 | 2009-06-30 | Stream-Flo Industries Ltd. | Method and apparatus to provide electrical connection in a wellhead for a downhole electrical device |
| KR100809340B1 (ko) * | 2007-01-15 | 2008-03-07 | 삼성전자주식회사 | 반도체 집적 회로 장치의 불량 분석 방법 및 시스템 |
| KR101529880B1 (ko) * | 2008-10-31 | 2015-06-19 | 삼성전자주식회사 | 에러 추정 방법 및 정정 방법 |
| JP2012018052A (ja) * | 2010-07-07 | 2012-01-26 | Toshiba Corp | 半導体装置の不良解析システム及び方法 |
| CN102385843A (zh) * | 2011-08-11 | 2012-03-21 | 上海华碧检测技术有限公司 | 一种液晶面板显示驱动芯片的电性分析方法 |
| US9277186B2 (en) | 2012-01-18 | 2016-03-01 | Kla-Tencor Corp. | Generating a wafer inspection process using bit failures and virtual inspection |
| TWI606531B (zh) | 2017-03-30 | 2017-11-21 | 義守大學 | 適用於三維晶片的缺陷測試方法及系統 |
| KR102589004B1 (ko) * | 2018-06-18 | 2023-10-16 | 삼성전자주식회사 | 반도체 불량 분석 장치 및 그것의 불량 분석 방법 |
| US11934094B2 (en) * | 2021-03-23 | 2024-03-19 | International Business Machines Corporation | Mask fingerprint using mask sensitive circuit |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6009545A (en) * | 1995-04-25 | 1999-12-28 | Mitsubishi Denki Kabushiki Kaisha | System for analyzing a failure in a semiconductor wafer by calculating correlation coefficient between collated data of defects per prescribed unit and failures per prescribed unit |
| JP3639636B2 (ja) * | 1995-04-25 | 2005-04-20 | 株式会社ルネサステクノロジ | 半導体ウェハの不良解析装置及び不良解析方法 |
| JP2734416B2 (ja) * | 1995-07-24 | 1998-03-30 | 日本電気株式会社 | 故障モードの特定方法及び装置 |
| TW461008B (en) | 1997-01-13 | 2001-10-21 | Schlumberger Technologies Inc | Method and apparatus for detecting defects in wafers |
| JP3995768B2 (ja) * | 1997-10-02 | 2007-10-24 | 株式会社ルネサステクノロジ | 不良解析方法及びその装置 |
| US6185707B1 (en) | 1998-11-13 | 2001-02-06 | Knights Technology, Inc. | IC test software system for mapping logical functional test data of logic integrated circuits to physical representation |
| US6553521B1 (en) * | 2000-02-24 | 2003-04-22 | Infineon Technologies, Richmond L.P. | Method for efficient analysis semiconductor failures |
| JP2002183554A (ja) * | 2000-12-14 | 2002-06-28 | Mitsubishi Electric Corp | メモリデバイス販売装置、およびメモリデバイス販売方法 |
| US6610550B1 (en) * | 2002-04-03 | 2003-08-26 | Advanced Micro Devices | Method and apparatus for correlating error model with defect data |
| JP2003315415A (ja) | 2002-04-23 | 2003-11-06 | Mitsubishi Electric Corp | 半導体デバイス解析システム |
| KR20050020012A (ko) * | 2003-08-20 | 2005-03-04 | 삼성전자주식회사 | 웨이퍼 검사 장치 및 검사 방법 |
| KR100748552B1 (ko) * | 2004-12-07 | 2007-08-10 | 삼성전자주식회사 | 반도체 장치의 불량 분석을 위한 분석 구조체 및 이를이용한 불량 분석 방법 |
-
2006
- 2006-09-29 KR KR1020060096065A patent/KR100827440B1/ko not_active Expired - Fee Related
-
2007
- 2007-09-19 JP JP2007242656A patent/JP5393965B2/ja not_active Expired - Fee Related
- 2007-09-21 US US11/902,413 patent/US7733719B2/en not_active Expired - Fee Related
- 2007-09-28 TW TW096136266A patent/TWI445110B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP5393965B2 (ja) | 2014-01-22 |
| US20080080277A1 (en) | 2008-04-03 |
| JP2008091902A (ja) | 2008-04-17 |
| KR100827440B1 (ko) | 2008-05-06 |
| KR20080029532A (ko) | 2008-04-03 |
| US7733719B2 (en) | 2010-06-08 |
| TW200822261A (en) | 2008-05-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |