TWI427413B - 用於電子紙顯示裝置中之彩色濾光片的光敏阻劑組成物 - Google Patents

用於電子紙顯示裝置中之彩色濾光片的光敏阻劑組成物 Download PDF

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Publication number
TWI427413B
TWI427413B TW96111040A TW96111040A TWI427413B TW I427413 B TWI427413 B TW I427413B TW 96111040 A TW96111040 A TW 96111040A TW 96111040 A TW96111040 A TW 96111040A TW I427413 B TWI427413 B TW I427413B
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TW
Taiwan
Prior art keywords
meth
acrylate
copolymer
acrylic acid
methyl
Prior art date
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TW96111040A
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English (en)
Chinese (zh)
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TW200745752A (en
Inventor
Daniel Holzle
Keyzer Gerardus De
Liliana Craciun
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Ciba Sc Holding Ag
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Publication of TW200745752A publication Critical patent/TW200745752A/zh
Application granted granted Critical
Publication of TWI427413B publication Critical patent/TWI427413B/zh

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Optical Filters (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
TW96111040A 2006-03-30 2007-03-29 用於電子紙顯示裝置中之彩色濾光片的光敏阻劑組成物 TWI427413B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06111989 2006-03-30
EP06119172 2006-08-18

Publications (2)

Publication Number Publication Date
TW200745752A TW200745752A (en) 2007-12-16
TWI427413B true TWI427413B (zh) 2014-02-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW96111040A TWI427413B (zh) 2006-03-30 2007-03-29 用於電子紙顯示裝置中之彩色濾光片的光敏阻劑組成物

Country Status (6)

Country Link
US (1) US8927182B2 (https=)
EP (1) EP1999514B1 (https=)
JP (1) JP5015231B2 (https=)
KR (1) KR101311818B1 (https=)
TW (1) TWI427413B (https=)
WO (1) WO2007113107A1 (https=)

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TWI368765B (en) * 2007-06-13 2012-07-21 Chimei Innolux Corp Color photo-resist with gold nano-particles and color filters made thereby
JP5284833B2 (ja) * 2008-03-31 2013-09-11 富士フイルム株式会社 フォトスペーサーの製造方法
CN102282215B (zh) 2009-01-19 2016-03-16 巴斯夫欧洲公司 滤色器用黑色基体
EP2567284B1 (en) 2010-05-03 2016-08-31 Basf Se Color filter for low temperature applications
JP6406824B2 (ja) 2010-06-24 2018-10-17 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 改良された電流オン/オフ比及び制御可能な閾値変動を有する有機電界効果トランジスタ
WO2012089516A1 (en) 2010-12-30 2012-07-05 Basf Se Surface-modified pigment preparations
EP2780409A4 (en) 2011-11-15 2015-09-16 Basf Se ORGANIC SEMICONDUCTOR COMPONENT AND MANUFACTURING METHOD THEREFOR
WO2013083507A1 (en) 2011-12-07 2013-06-13 Basf Se An organic field effect transistor
JP6029679B2 (ja) 2011-12-07 2016-11-24 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 有機半導体デバイスにおいて使用するためのジケトピロロピロールポリマー
PL397479A1 (pl) 2011-12-21 2013-06-24 Instytut Chemii Organicznej Polskiej Akademii Nauk Nowe, fluorescencyjne barwniki heterocykliczne i sposób ich otrzymywania
JP6157602B2 (ja) 2012-06-01 2017-07-05 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 黒色着色剤混合物
KR101986763B1 (ko) * 2012-09-28 2019-06-07 롬엔드하스전자재료코리아유한회사 고내열성, 고해상도의 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
TWI489212B (zh) 2013-03-29 2015-06-21 Chi Mei Corp Photosensitive resin composition and its application
WO2014206863A1 (en) 2013-06-24 2014-12-31 Basf Se Polymers based on fused diketopyrrolopyrroles
KR102134633B1 (ko) * 2016-11-25 2020-07-16 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
JP7223693B2 (ja) 2016-12-23 2023-02-16 スリーエム イノベイティブ プロパティズ カンパニー ポリマー及び重合性成分を含むプリント可能な組成物、物品、並びにそれから物品を製造する方法
TWI666518B (zh) * 2016-12-30 2019-07-21 奇美實業股份有限公司 感光性樹脂組成物及其應用
KR102806570B1 (ko) 2018-06-25 2025-05-14 썬 케미칼 비.브이. 컬러 필터용 적색 안료 조성물
CN113031395A (zh) * 2019-12-24 2021-06-25 罗门哈斯电子材料韩国有限公司 着色的光敏树脂组合物和由其制备的黑色矩阵
KR102950537B1 (ko) 2024-02-14 2026-04-09 고려대학교 세종산학협력단 컬러필터 조성물, 그를 이용한 제조 방법 및 디스플레이 디바이스

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CN1584631A (zh) * 2003-08-21 2005-02-23 日产化学工业株式会社 含有染料的抗蚀剂组合物以及使用其的滤色器
EP1577090A2 (en) * 2004-03-19 2005-09-21 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor

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CN1584631A (zh) * 2003-08-21 2005-02-23 日产化学工业株式会社 含有染料的抗蚀剂组合物以及使用其的滤色器
EP1577090A2 (en) * 2004-03-19 2005-09-21 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor

Also Published As

Publication number Publication date
TW200745752A (en) 2007-12-16
WO2007113107A1 (en) 2007-10-11
US20100164911A1 (en) 2010-07-01
JP2009531727A (ja) 2009-09-03
US8927182B2 (en) 2015-01-06
KR20080108594A (ko) 2008-12-15
EP1999514B1 (en) 2018-10-03
JP5015231B2 (ja) 2012-08-29
KR101311818B1 (ko) 2013-09-30
EP1999514A1 (en) 2008-12-10

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