TWI414475B - Substrate handling device - Google Patents
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- TWI414475B TWI414475B TW97114611A TW97114611A TWI414475B TW I414475 B TWI414475 B TW I414475B TW 97114611 A TW97114611 A TW 97114611A TW 97114611 A TW97114611 A TW 97114611A TW I414475 B TWI414475 B TW I414475B
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Abstract
Description
本發明係有關於一種將電子電路基板等的基板進行預備位置決定(pre－alignment)且從搬入台搬運至曝光台的基板搬運裝置。The present invention relates to a substrate transfer device that performs pre-alignment of a substrate such as an electronic circuit board and transports it from the carry-in stage to the exposure stage.
習知，在電子電路基板等的基板曝光所定的圖案時，藉由曝光裝置將基板從搬入位置(搬入台)搬運至曝光位置(曝光台)時，例如，以下所示般的搬運裝置被使用(例如，專利文獻1)。此搬運裝置係，將被載置於搬入位置的基板的上面藉由吸著保持部吸著保持，將吸著保持部沿著移動軌道移動至曝光位置，藉由交付被保持在吸著保持部的基板至曝光位置，而進行基板的搬運。When a substrate such as an electronic circuit board is exposed to a predetermined pattern, when the substrate is transported from the loading position (loading station) to the exposure position (exposure table) by the exposure device, for example, the following conveying device is used. (for example, Patent Document 1). In the transport device, the upper surface of the substrate placed on the loading position is sucked and held by the absorbing holding portion, and the absorbing holding portion is moved to the exposure position along the moving rail, and is held in the absorbing holding portion by delivery. The substrate is transported to the exposure position.
又，基板被投入至搬入位置後，對此基板進行預備位置決定(預對準[pre－alignment])的搬運裝置被揭露(例如，專利文獻2)。此搬運裝置係包括：搬運滾子，載置基板而在搬運方向移動；以及定心單元，在上述搬運滾子之間，具有將該搬運滾子上的基板的端面押動於X方向和Y方向的銷。In addition, after the substrate is placed in the loading position, a conveyance device that performs preliminary position determination (pre-alignment) on the substrate is disclosed (for example, Patent Document 2). The transport device includes: a transport roller that moves the substrate in a transport direction; and a centering unit that has an end surface of the substrate on the transport roller in the X direction and the Y between the transport rollers Direction of the pin.
又，有關對於被搬運至曝光位置的基板進行預備位置決定的裝置也被提出(例如，專利文獻3)。此裝置係包括：曝光桌，將基板在曝光位置載置；光學感測器，量測被載置於此曝光桌上的基板的位置；驅動機構，基於藉由此光 學感測器被量測的基板的位置，將上述曝光桌在和光罩整合之前移動至整合位置。因此，在進行基板預備位置決定時，基板不和其他構件接觸摩擦。Moreover, an apparatus for determining the position of the substrate to be transported to the exposure position has also been proposed (for example, Patent Document 3). The device comprises: an exposure table for placing the substrate at the exposure position; an optical sensor for measuring the position of the substrate placed on the exposure table; and a driving mechanism based on the light The position of the substrate on which the sensor is measured is moved to the integrated position prior to integration with the reticle. Therefore, when the substrate preparation position is determined, the substrate does not come into contact with other members.
[專利文獻1]日本特開平06－345279號公報 [專利文獻2]日本特開平06－348025號公報 [專利文獻3]日本特開平05－326361號公報[Patent Document 1] Japanese Patent Publication No. 06-345279 [Patent Document 2] Japanese Patent Laid-Open No. Hei 06-348025 [Patent Document 3] Japanese Laid-Open Patent Publication No. 05-326361
然而，有關在習知的搬入台和曝光台中的基板的搬運路徑中、將預備位置決定和搬運一同進行的上述技術，存在以下所示般的問題點。However, the above-described technique in which the preparatory position determination and transportation are performed together in the conveyance path of the substrate in the conventional loading table and the exposure stage has the following problems.
將基板的預備位置決定在曝光台進行的構成中，由於基板的位置不在容許範圍的話無法進行下一作業，所以在搬入台側進行係所希望。When the preparatory position of the substrate is determined by the exposure stage, if the position of the substrate is not within the allowable range, the next operation cannot be performed. Therefore, it is desirable to perform the system on the loading stage.
又，在搬入台進行基板的預備位置決定的構成中，由於被設置為在搬運滾子下方設置的銷從搬運滾子之間突出的預備位置決定機構的構成，對應於基板將基板押動的銷的設置位置的調整是費事的。In the configuration in which the loading position of the substrate is determined by the loading station, the configuration of the preliminary position determining mechanism that protrudes between the transport rollers is provided by the pin provided under the transport roller, and the substrate is pushed in accordance with the substrate. The adjustment of the setting position of the pin is troublesome.
本發明係有鑑於上述問題點而提案，提供一種基板搬運裝置，不用將基板的預備位置決定機構設置於搬入台或曝光台，卻可在搬運至曝光台之前進行基板的預備位置決定，且銷的設置位置調整也簡化作為課題。The present invention has been made in view of the above problems, and it is proposed to provide a substrate transfer device which can determine a preparatory position of a substrate before being transported to an exposure table without placing the preliminary position determining mechanism of the substrate on the transfer table or the exposure table. The setting of the position adjustment is also simplified as a problem.
為了解決上述課題，有關本發明的基板搬運裝置係為從被搬入至搬入台的基板的上方下降而進行預備位置決定、且保持上述基板而搬運至曝光台的基板搬運裝置，其構成包括：預備位置決定機構，押動被載置於上述搬入台上的基板的端面，進行預備位置決定；以及搬運機構，將此預備位置決定機構藉由支持本體支持，且將完成預備位置決定的基板吸著保持而搬運至上述曝光台；其中上述預備位置決定機構係具有被支持在上述支持本體的驅動裝置、以及藉由此驅動裝置驅動而押動上述基板的端面的押動裝置；上述押動裝置係，具有分別抵接在上述基板的相互對面的一端面以及另一端面的第一抵接銷以及第二抵接銷、以及分別支持此第一抵接銷以及第二抵接銷的第一支持體以及第二支持體；上述驅動裝置係，具有圓筒形的磁性軸體、將此磁性軸體在軸周圍轉動的轉動裝置、以及與藉由此轉動裝置轉動的磁性軸體的周面相對而設置的直線狀的第一縱長磁性體和第二縱長磁性體；上述第一縱長磁性體支持上述第一支持體，上述第二縱長磁性體支持上述第二支持體。In order to solve the problem, the substrate transfer device according to the present invention is a substrate transfer device that is lowered from above the substrate that is carried into the transfer table to determine the preliminary position, and that holds the substrate and transports the substrate to the exposure table. a position determining mechanism that locks an end surface of the substrate placed on the loading table to determine a preliminary position; and a transport mechanism that supports the main body by the support body and sucks the substrate that determines the preparatory position And being carried to the exposure stage; wherein the preliminary position determining mechanism has a driving device supported by the supporting body, and a latching device that is driven by the driving device to push an end surface of the substrate; the latching device is a first abutting pin and a second abutting pin respectively abutting an opposite end surface and the other end surface of the substrate, and first support for supporting the first abutting pin and the second abutting pin respectively And a second support; the driving device has a cylindrical magnetic shaft body, and the magnetic shaft body is on the shaft a linear rotating first device and a second elongated magnetic body disposed opposite to a circumferential surface of the magnetic shaft body rotated by the rotating device; the first elongated magnetic body supporting In the first support, the second elongated magnetic body supports the second support.
藉由此構成，基板搬運裝置係，基板被搬入至搬入台的話，搬運機構藉由具備的升降機構下降至基板側，將驅動裝置的磁性軸體藉由轉動裝置在一方向旋轉，將第一縱長磁性體和第二縱長磁性體在直線方向移動。基板搬運裝置係，藉由兩縱長磁性體移動，被支持在兩支持體的第一抵接銷和第二抵接銷押動基板的端面，進行基板的預備位 置決定。基板搬運裝置係，完成了基板的預備位置決定的話，將基板吸著保持而藉由升降機構上升，沿著搬運軌道，從搬入台移動至曝光台，將保持的基板搬運至曝光台。According to this configuration, when the substrate is transported to the loading table by the substrate transfer device, the transport mechanism is lowered to the substrate side by the elevating mechanism, and the magnetic shaft of the drive device is rotated in one direction by the rotating device. The elongated magnetic body and the second elongated magnetic body move in a linear direction. The substrate transfer device is configured to support the first abutting pin and the second abutting pin of the two supporting bodies to move the end faces of the substrate by moving the two longitudinal magnetic bodies to perform the preparatory position of the substrate Set the decision. In the substrate transfer device, when the preparation position of the substrate is determined, the substrate is sucked and held, and the lift mechanism is lifted up, moved along the transport path from the transfer table to the exposure table, and the held substrate is transported to the exposure table.
又，在上述基板搬運裝置中，上述第一支持體和上述第二支持體的構成係包括：移動機構，將上述第一抵接銷和上述第二抵接銷，從與上述基板的端面高度相同或比上述基板的端面下方的高度，移動至比上述基板端面上方的高度。Further, in the above-described board conveying device, the first support body and the second support body include a moving mechanism that heights the first abutting pin and the second abutting pin from an end surface of the substrate The height equal to or lower than the end surface of the substrate is moved to a height above the end surface of the substrate.
藉由此構成，基板搬運裝置係，將基板W交付於曝光台時，第一抵接銷和第二抵接銷的下端(前端)位於比保持搬運機構的基板的面上方，可平順地載置基板於曝光台上。According to this configuration, when the substrate W is delivered to the exposure stage, the lower end (front end) of the first abutting pin and the second abutting pin is positioned above the surface of the substrate holding the transport mechanism, and can be smoothly carried. Place the substrate on the exposure stage.
又，在上述基板搬運裝置中，上述搬運機構係被購成為，具有將設置於上述支持本體下方的藉由吸著墊吸著保持上述基板的吸著保持板、以及從此吸著保持板相對的端面向中央以直線狀的所定長度的缺口而形成的缺口溝；上述第一抵接銷及上述第二抵接銷沿著上述缺口溝移動。Further, in the above-described substrate transfer device, the transport mechanism is obtained by absorbing and holding a absorbing and holding plate that holds the substrate by a suction pad provided under the support body, and the absorbing and holding plate is opposed thereto. The end surface faces the center of the notch formed by a straight-shaped notch of a predetermined length; and the first abutting pin and the second abutting pin move along the notch.
藉由此構成，基板搬運裝置係，不論工件的尺寸大或小，第一抵接銷和上述第二抵接銷沿著吸著保持板的缺口溝移動，押動基板的端面，可進行預備位置決定。According to this configuration, in the substrate transfer device, regardless of whether the size of the workpiece is large or small, the first abutting pin and the second abutting pin move along the notch groove of the absorbing holding plate, and the end surface of the substrate can be pushed to prepare Location decision.
又，在上述基板搬運裝置中，上述第一縱長磁性體和上述第二縱長磁性體係被構成為，將上述磁性軸體作為中央而被配置在其一方和另一方，藉由上述磁性軸體的旋轉，分別向相反方向直線地移動。Further, in the above-described substrate transfer device, the first elongated magnetic body and the second elongated magnetic system are configured such that the magnetic shaft body is disposed at one of the other and the other magnetic center body, and the magnetic shaft The rotation of the body moves linearly in opposite directions.
藉由此構成，基板搬運裝置係，藉由磁性軸體的轉動， 可將上述第一縱長磁性體和上述第二縱長磁性體直線地往復移動。With this configuration, the substrate transfer device is rotated by the magnetic shaft body. The first elongated magnetic body and the second elongated magnetic body may be linearly reciprocated.
又，在上述基板搬運裝置中，上述驅動裝置係被構成為，在上述第一縱長磁性體和上述第二縱長磁性體，具有分別平行地設置的從動軸；上述第一支持體係，藉由上述第一縱長磁性體和上述從動軸被支持而往復移動；上述第二支持體係，藉由上述第二縱長磁性體和上述從動軸被支持而往復移動。Further, in the above-described board conveying device, the driving device is configured such that the first elongated magnetic body and the second elongated magnetic body have driven shafts that are respectively provided in parallel; the first support system The first longitudinal magnetic body and the driven shaft are supported to reciprocately move, and the second support system is reciprocated by the second elongated magnetic body and the driven shaft being supported.
藉由此構成，基板搬運裝置係，可進行安定的往復移動動作。According to this configuration, the substrate transfer device can perform a stable reciprocating operation.
有關本發明的基板搬運裝置係達到以下所示的優良效果。The substrate transfer device according to the present invention achieves the excellent effects described below.
基板搬運裝置係，不會使搬入台的構成複雜化，在將基板搬運至曝光台之前，可進行預備位置決定，又，在進行預備位置決定時，由於驅動機構係藉由磁性軸體和第一縱長磁性體、第二縱長磁性體而為非接觸，不使塵埃等的垃圾落下至基板上。In the substrate transfer device, the configuration of the loading table is not complicated, and the preparatory position can be determined before the substrate is transported to the exposure stage, and when the preparatory position is determined, the drive mechanism is made of the magnetic shaft body and the The longitudinal magnetic body and the second elongated magnetic material are non-contact, and dust such as dust is not dropped onto the substrate.
又，基板搬運裝置係，由於預備位置決定機構的驅動裝置為由S極和N極交互連續的磁性軸體、第一縱長磁性體和第二縱長磁性體所構成的非接觸式構成，變更移動範圍係容易的，即使基板大小變化，可簡單地調整第一抵接銷和第二抵接銷的移動範圍。Further, in the substrate transfer device, the drive device of the preparatory position determining means is a non-contact type constituted by a magnetic shaft body in which the S pole and the N pole are alternately continuous, the first elongated magnetic body, and the second elongated magnetic body. It is easy to change the movement range, and the movement range of the first abutment pin and the second abutment pin can be easily adjusted even if the substrate size changes.
基板搬運裝置係，在從支持本體的中央朝兩端側的相 對向的位置，設置押動裝置的第一抵接銷和第二抵接銷的話即可，預備位置決定機構的設置位置的調整成為容易。The substrate transfer device is in the phase from the center of the support body toward the both end sides The first abutment pin and the second abutment pin of the urging device may be provided at the opposing position, and the adjustment of the installation position of the preparatory position determining mechanism may be facilitated.
有關本發明的基板搬運裝置的實施例，參考圖示詳細說明。The embodiment of the substrate carrying device of the present invention will be described in detail with reference to the drawings.
第1圖係模式化地表示設置於曝光裝置的基板搬運裝置的側面圖，第2圖係表示基板搬運裝置的全體的立體圖，第3圖係模式化地表示從基板搬運裝置的下方向上看的狀態的立體圖，第4(a)圖係為省略基板搬運裝置的一部分而表示的平面圖，第4(b)圖係為將基板搬運裝置的剖面模式化地表示的剖面圖，第5圖係模式化地表示基板搬運裝置的驅動裝置的構成的模式圖。1 is a side view schematically showing a substrate transfer device provided in an exposure apparatus, and FIG. 2 is a perspective view showing the entire substrate transfer device, and FIG. 3 is a schematic view showing the upper side of the substrate transfer device. In the perspective view of the state, the fourth (a) is a plan view showing a part of the substrate transfer device, and the fourth (b) is a cross-sectional view schematically showing the cross section of the substrate transfer device. A schematic diagram showing the configuration of the drive device of the substrate transfer device.
如第1圖所示般，曝光裝置A係主要包括：基板的搬入台30；基板搬運裝置1，將被搬入至此搬入台30的基板W預備地決定位置而搬運；曝光台40，為了載置且曝光藉由上述基板搬運裝置1被搬運的基板W而整合基板；曝光光學系統50，用以朝被載置於此曝光台40的基板W照射來自光源51的光，將光罩M的圖案曝光於基板W；以及搬出台60，用以搬出被曝光的基板W。As shown in Fig. 1, the exposure apparatus A mainly includes a substrate loading table 30. The substrate transfer device 1 transports the substrate W loaded into the loading table 30 to a predetermined position and conveys it. The exposure table 40 is placed for mounting. The substrate is integrated by the substrate W conveyed by the substrate transfer device 1, and the exposure optical system 50 is configured to illuminate the substrate W placed on the exposure stage 40 with light from the light source 51 to pattern the mask M. Exposure to the substrate W; and the unloading stage 60 for carrying out the exposed substrate W.
搬入台30係，從裝置外接收基板W、經由搬運滾子31移動基板W至所定的位置。此搬入台30係，如第2圖所示般，搬運滾子31係被設置為，在軸線方向適當分割的長度，排列在移動方向上，以使後述的預備位置決定機構2 的作業適當地進行。The loading table 30 is configured to receive the substrate W from outside the device and move the substrate W to a predetermined position via the transport roller 31. In the loading table 30, as shown in Fig. 2, the transport roller 31 is provided so as to be appropriately divided in the axial direction, and arranged in the moving direction so that the preparatory position determining mechanism 2 to be described later is provided. The work is done properly.
曝光台40係，將基板W從基板搬運裝置1接收保持，進行和光罩M的整合作業，在將光罩M和基板W整合之後，將基板W固定而將光罩M的圖案曝光。此曝光台40係，將基板W保持在桌面而上升，和保持光罩M的框架F合作而形成真空空間，將光罩的圖案曝光在基板W。The exposure stage 40 is configured to receive and hold the substrate W from the substrate transfer device 1 and integrate it with the mask M. After the mask M and the substrate W are integrated, the substrate W is fixed and the pattern of the mask M is exposed. The exposure stage 40 is configured to hold the substrate W on the table top and rise, and cooperate with the frame F holding the mask M to form a vacuum space, and expose the pattern of the mask to the substrate W.
曝光光學系統50係，由燈52和橢圓反射鏡53構成的光源51、以及形成用於將來自此光源51的光照射至基板W的光路的光學系統所構成。此曝光光學系統50係，在作為平行光將光照射至基板W的情形中，將反射鏡和稜鏡複合的平行光光學系統被使用，又，在作為散射光將光照射至基板W的情形中，將照射的光散射的鏡子等的散射光光學系統被使用。The exposure optical system 50 is composed of a light source 51 composed of a lamp 52 and an elliptical mirror 53, and an optical system that forms an optical path for irradiating light from the light source 51 to the substrate W. In the case of the exposure optical system 50, in the case where the light is irradiated to the substrate W as the parallel light, the parallel optical system in which the mirror and the iridium are combined is used, and the light is irradiated to the substrate W as the scattered light. Among them, a scattered light optical system such as a mirror that scatters the irradiated light is used.
搬出台60係，將在曝光台40曝光完成的基板W或異常的基板W由未圖示的搬運裝置接收而搬出至裝置外。在此搬出台60，藉由傳送滾子61將基板W搬出至裝置外。The substrate 60 that has been exposed to the exposure table 40 and the abnormal substrate W are received by a transport device (not shown) and carried out to the outside of the device. Here, the loading table 60 is carried out, and the substrate W is carried out to the outside of the apparatus by the transfer roller 61.
其次，說明基板搬運裝置1。Next, the substrate transfer device 1 will be described.
如第1圖和第2圖所示般，基板搬運裝置1係包括：預備位置決定機構2，進行基板W的預備位置決定；搬運機構20，支持此預備位置決定機構2，吸著預備位置決定完成的基板W，從搬入台30搬運至曝光台40。As shown in Fig. 1 and Fig. 2, the substrate transfer device 1 includes a preliminary position determining mechanism 2 for determining the preparatory position of the substrate W, and the transport mechanism 20 supports the preparatory position determining mechanism 2 to determine the suction preparatory position. The completed substrate W is transported from the loading table 30 to the exposure stage 40.
搬運機構20係包括：左右的移動軌道21，從搬入台30橫跨至曝光台40而被設置；支持構件17，與此移動軌道21、21正交且橫跨在移動軌道之間而被支持；升降機構 18，被支持在此支持構件17；支持本體12，被支持在此升降機構18的下方；吸著保持板13，吸著保持基板W設置於此支持本體12下方。又，後述的預備位置決定機構2係被支持在支持本體12的上方(上面側)(參考第4圖)。The transport mechanism 20 includes left and right moving rails 21 that are provided across the loading platform 30 to the exposure table 40. The support members 17 are supported by the moving rails 21 and 21 and are spanned between the moving rails. Lifting mechanism 18, supported by the support member 17; the support body 12 is supported under the lifting mechanism 18; the holding plate 13 is sucked, and the absorbing and holding substrate W is disposed below the support body 12. Further, the preparatory position determining means 2 to be described later is supported above (upper side) the support body 12 (refer to FIG. 4).
移動軌道21係，被設置在支持本體12的左右，例如，線性導件等被使用。此移動軌道21係，儘可能使支持本體12在直線方向往復移動，並不特別限定其構成。The moving rail 21 is disposed on the left and right of the support body 12, for example, a linear guide or the like is used. This moving rail 21 is configured such that the support body 12 reciprocates in a linear direction as much as possible, and the configuration is not particularly limited.
升降機構18係，在進行基板W的交付時，進行升降吸著保持板13的動作(參考第3圖和第4圖)。此升降機構18係，被連接在支持本體12的支持板12c，只有可將吸著保持板13升降即可，例如，LM導件等的滑動機構和馬達和傳送螺絲，或根據汽缸的驅動機構也可。又，升降機構18係，在進行預備位置決定作業和基板W的吸著保持的作業時，為了在不同高度進行兩作業，可為以兩階段的作動進行動作的構成，或為了在相同高度進行兩作業，，也可為以一階段的作動進行動作的構成。The elevating mechanism 18 performs an operation of lifting and lowering the holding plate 13 when the substrate W is delivered (refer to FIGS. 3 and 4). The lifting mechanism 18 is connected to the support plate 12c of the support body 12, and only the absorbing and holding plate 13 can be lifted and lowered, for example, a sliding mechanism of the LM guide or the like, a motor and a transfer screw, or a drive mechanism according to the cylinder. also may. Further, the elevating mechanism 18 is configured to operate in two stages in order to perform two operations at different heights when performing the preparatory position determining operation and the suction holding operation of the substrate W, or to perform the operation at the same height. The two operations can also be configured to operate in a one-stage operation.
如第2圖、第3圖和第4圖所示般，支持本體12係，經由升降機構18被支持在被架設在左右的移動軌道21的支持構件17。此支持本體12係，包括：矩形板狀的本體部12a；安裝片12b、12b，從此本體部12a相對的兩邊突出至側方而設置；以及支持板12c，經由分別從上述安裝片12b、12b朝上方立設的構件而被設置。在这里，支持板12c被支持在升降機構18的下端。As shown in FIGS. 2, 3, and 4, the support body 12 is supported by the support member 17 that is mounted on the left and right moving rails 21 via the elevating mechanism 18. The support body 12 includes: a rectangular plate-shaped body portion 12a; mounting pieces 12b, 12b protruding from opposite sides of the body portion 12a to the side; and a support plate 12c via the mounting pieces 12b, 12b, respectively It is set up with members that stand upright. Here, the support plate 12c is supported at the lower end of the elevating mechanism 18.
此支持本體12係，在下面側支持面積比基板W大的吸 著保持板13，且在上面側支持後述的預備位置決定機構2。又，在支持本體12的本體部12a，配合對應於後述的缺口溝13b的位置，同樣地形成缺口部12d。藉由形成此缺口部12d，可使本體部12a的面積變大，可使後述的預備位置決定機構2的設置面變大。This support body 12 system has a larger suction area on the lower side than the substrate W. The holding plate 13 is supported, and the preparatory position determining mechanism 2 to be described later is supported on the upper side. Further, the main body portion 12a of the support main body 12 is formed with the notch portion 12d in the same manner as the position corresponding to the notch groove 13b to be described later. By forming the notch portion 12d, the area of the main body portion 12a can be increased, and the installation surface of the preliminary position determining mechanism 2 to be described later can be increased.
如第2圖和第3圖所示般，吸著保持板13係，例如，包括：矩形板狀的吸著部本體13a；缺口溝13b，從上述吸著部本體13a的四邊的端部向中央以直線狀缺口的狀態形成；以及複數個吸著墊13c，用以在吸著部本體13a的下面側吸著基板W而設置。As shown in FIGS. 2 and 3, the absorbing holding plate 13 includes, for example, a rectangular plate-shaped absorbing portion main body 13a, and a notch groove 13b extending from the four end portions of the absorbing portion main body 13a. The center is formed in a state of a linear notch, and a plurality of suction pads 13c are provided to suck the substrate W on the lower surface side of the absorbing part body 13a.
又，缺口溝13b係，為了後述的預備位置決定機構2的第一抵接銷3a1 、3a1 以及第二抵接銷3b1 、3b1 移動而被形成。又，吸著保持板13係，雖然未圖示，對應於基板W的大小而適當切換吸引的區域般被構成。此吸著保持板13係，只要可將基板W藉由未圖示的真空幫浦的作動而吸著保持的話，並不限定於此構成。Further, the notch groove 13b is formed to move the first abutment pins 3a 1 and 3a 1 and the second abutment pins 3b 1 and 3b 1 of the preliminary position determining mechanism 2 to be described later. In addition, the suction holding plate 13 is configured to be appropriately switched in accordance with the size of the substrate W in accordance with the size of the substrate W. The absorbing holding plate 13 is not limited to this as long as the substrate W can be sucked and held by the operation of a vacuum pump (not shown).
如第2圖和第3圖所示般，預備位置決定機構2係，被設置在支持本體12的上面側，進行基板W的預備位置決定的機構。此預備位置決定機構2係，具有抵接於基板W的端面而押動的押動裝置3、以及使此押動裝置3進行直線往復移動的驅動裝置6。As shown in FIG. 2 and FIG. 3, the preparatory position determining means 2 is provided on the upper surface side of the support main body 12, and the mechanism for determining the preparatory position of the substrate W is performed. The preliminary position determining mechanism 2 has a biasing device 3 that is abutted against the end surface of the substrate W, and a driving device 6 that linearly reciprocates the latching device 3.
如第2圖所示般，押動裝置3係，具有在相對向的兩邊設置的押動部3A、3B，由於為相同構成，因此，將一方的押動部3A的構成作為代表說明。As shown in Fig. 2, the urging device 3 has the urging portions 3A and 3B provided on the opposite sides, and since the same configuration is adopted, the configuration of one of the urging portions 3A will be described as a representative.
押動部3A係，包括：第一抵接銷3a1 、3a1 ，抵接於基板W的端面；滑動部3a2 、3a2 ，支持此第一抵接銷3a1 、3a1 ；第一支持體3a3 ，支持此滑動部3a2 、3a2 ；連接板3a5 ，橫跨第一抵接銷3a1 、3a1 而被配置，連接第一抵接銷3a1 、3a1 ；以及驅動部3a4 ，用以將此連接板3a5 上下動。The latching portion 3A includes: a first abutting pin 3a 1 , 3a 1 abutting against an end surface of the substrate W; and sliding portions 3a 2 and 3a 2 supporting the first abutting pin 3a 1 , 3a 1 ; The support body 3a 3 supports the sliding portions 3a 2 and 3a 2 ; the connecting plate 3a 5 is disposed across the first abutting pins 3a 1 and 3a 1 , and connects the first abutting pins 3a 1 and 3a 1 ; The portion 3a 4 is for moving the connecting plate 3a 5 up and down.
又，在押動部3A，例如，將驅動部3a4 以汽缸構成，藉由空氣的注入，汽缸的活塞(未圖示)突出至上方，藉由連接於此活塞的連接板3a5 上下，沿著滑動部3a2 、3a2 ，將第一抵接銷3a1 、3a1 上下動。又，作為將第一抵接銷3a1 、3a1 移動於上下方向的移動機構，在此，將滑動部3a2 、3a2 作為例子說明，但其構成並不限定於此。Further, in the urging portion 3A, for example, the driving portion 3a 4 is constituted by a cylinder, and the piston (not shown) of the cylinder protrudes upward by the injection of air, and is connected up and down by the connecting plate 3a 5 connected to the piston. The sliding portions 3a 2 and 3a 2 are moved up and down, and the first abutting pins 3a 1 and 3a 1 are moved up and down. Further, as the moving mechanism for moving the first abutting pins 3a 1 and 3a 1 in the vertical direction, the sliding portions 3a 2 and 3a 2 will be described as an example, but the configuration is not limited thereto.
此押動部3A係，被連接於後述的驅動裝置6，藉由在水平方向直線地往復移動，押動基板W的端面。又，抵接於基板W的端面的第一抵接銷3a1 、3a1 的前端係，在其銷軸的軸周圍方向旋轉自如地被形成，在押動基板W的端面時，減輕施加在基板W的負荷。The urging portion 3A is connected to a drive device 6 to be described later, and reciprocates linearly in the horizontal direction to erect the end surface of the substrate W. Further, the front ends of the first abutting pins 3a 1 and 3a 1 that are in contact with the end faces of the substrate W are rotatably formed around the axis of the pin shaft, and are damped to the substrate when the end faces of the substrate W are pushed. W load.
如第2圖和第4圖所示般，驅動裝置6係，包括：磁性軸體7，以在支持本體12的中央旋轉自如地設置的圓筒體或圓柱體形成；轉動裝置8，將此磁性軸體7作為軸心轉動；第一縱長磁性體9A和第二縱長磁性體9B，與藉由此轉動裝置8轉動的磁性軸體7的周面相對，與該磁性軸體7以非接觸狀態被設置；第一從動軸10A和第二從動軸10B，以和第一縱長磁性體9A和第二縱長磁性體9B成為平行的方式被配置；以及導引部11，將此第一從動軸10A和 第二從動軸10B以及第一縱長磁性體9A和第二縱長磁性體9B在磁性軸體7側導引。又，驅動裝置6係，在第一縱長磁性體9A和第二縱長磁性體9B以及第一從動軸10A和第二從動軸10B的個別的一端側，連接押動部3A的第一支持體3a3 以及押動部3B的第二支持體3b3 。As shown in FIGS. 2 and 4, the driving device 6 includes a magnetic shaft body 7 formed of a cylindrical body or a cylindrical body that is rotatably provided in the center of the support body 12, and a rotating device 8 The magnetic shaft body 7 is rotated as a shaft center; the first elongated magnetic body 9A and the second elongated magnetic body 9B are opposed to the circumferential surface of the magnetic shaft body 7 rotated by the rotating device 8, and the magnetic shaft body 7 is The non-contact state is provided; the first driven shaft 10A and the second driven shaft 10B are disposed in parallel with the first elongated magnetic body 9A and the second elongated magnetic body 9B; and the guiding portion 11, The first driven shaft 10A and the second driven shaft 10B, and the first elongated magnetic body 9A and the second elongated magnetic body 9B are guided on the magnetic shaft body 7 side. Further, the drive device 6 is connected to the first longitudinal side of the first elongated magnetic body 9A and the second elongated magnetic body 9B and the first driven shaft 10A and the second driven shaft 10B. A support 3a 3 and a second support 3b 3 of the urging portion 3B.
如第5圖所示般，驅動裝置6的磁性軸體7係包括：相反的磁極的S極和N極在圓周上交互地配置的磁性部7a、以及抵接於此磁性部7a的周面而設置的不銹鋼製的圓筒蓋7b。圓筒蓋7b係，保護磁性部7a的表面，較佳為由金屬等構成。又，第一縱長磁性體9A和第二縱長磁性體9B係被構成為，在直線方向移動時，對面於磁性軸體7的位置，S極和N極成連續。As shown in Fig. 5, the magnetic shaft body 7 of the drive unit 6 includes a magnetic portion 7a in which the S pole and the N pole of the opposite magnetic pole are alternately arranged on the circumference, and a circumferential surface abutting on the magnetic portion 7a. A stainless steel cylinder cover 7b is provided. The cylindrical cover 7b protects the surface of the magnetic portion 7a, and is preferably made of metal or the like. Further, the first elongated magnetic body 9A and the second elongated magnetic body 9B are configured such that when moving in the linear direction, the S pole and the N pole are continuous with respect to the position of the magnetic shaft body 7.
此驅動裝置6係，藉由從轉動裝置8被傳達的旋轉力，磁性軸體7轉動時，伴隨此磁性軸體7的轉動，第一縱長磁性體9A和第二縱長磁性體9B在相反的磁極中，暫時交互地受到S極和N極的影響。因此，第一縱長磁性體9A和第二縱長磁性體9B係，從靜止狀態在磁極排斥的直線方向移動。又，同時，第一從動軸10A和第二從動軸10B係在直線方向從動而移動。因此，預備位置決定機構2係，藉由驅動裝置6驅動押動裝置3，藉由第一抵接銷3a1 、3a1 和第二抵接銷3b1 、3b1 押動基板W的端面，可進行基板W的預備位置決定。The driving device 6 is configured such that when the magnetic shaft body 7 is rotated by the rotational force transmitted from the rotating device 8, the first elongated magnetic body 9A and the second elongated magnetic body 9B are accompanied by the rotation of the magnetic shaft body 7 The opposite poles are temporarily interacted with by the S and N poles. Therefore, the first elongated magnetic body 9A and the second elongated magnetic body 9B move in a linear direction in which the magnetic pole repels from a stationary state. At the same time, the first driven shaft 10A and the second driven shaft 10B move in a linear direction. Therefore, the preparatory position determining mechanism 2 drives the latching device 3 by the driving device 6, and the end faces of the substrate W are pushed by the first abutting pins 3a 1 and 3a 1 and the second abutting pins 3b 1 and 3b 1 . The preliminary position determination of the substrate W can be performed.
又，磁性軸體7、與第一縱長磁性體9A和第二縱長磁性體9B的配置關係為，異物不被夾持，且以保持相互的磁 力影響的間隔而對峙係所希望的。又也可為，經由傳達裝置被連結於作為轉動裝置8的馬達等的驅動軸，藉由作為轉動裝置8的馬達的旋轉，磁性軸體7旋轉的構成。Moreover, the arrangement relationship between the magnetic shaft body 7 and the first elongated magnetic body 9A and the second elongated magnetic body 9B is such that foreign matter is not clamped and magnetic waves are held to each other. The interval of force influence is desirable for the shackles. Further, the drive shaft that is connected to the motor or the like as the rotation device 8 via the transmission device may be configured to rotate the magnetic shaft body 7 by the rotation of the motor as the rotation device 8.
其次，參考第1圖和第6圖，有關曝光裝置A，主要以將基板W從搬入台30搬運至曝光台40的動作，說明基板W從被搬入到被搬出的動作。Next, with reference to FIGS. 1 and 6, the exposure apparatus A mainly performs an operation of transporting the substrate W from the loading table 30 to the exposure stage 40, and explains an operation of the substrate W from being carried in and out.
如第1圖和第6(a)圖所示般，基板W從裝置外被搬入至搬入台30的話，基板W係，籍由搬運滾子31的旋轉而被傳送至所定位置而停止。As shown in Fig. 1 and Fig. 6(a), when the substrate W is carried out from the outside of the apparatus to the loading table 30, the substrate W is stopped by the rotation of the transport roller 31 to a predetermined position.
基板W移動至搬運滾子31的所定位置時，如第6(b)圖所示般，基板搬運裝置1藉由升降機構18下降至下方，直至第一抵接銷3a1 、3a1 和第二抵接銷3b1 、3b1 的前端抵接於基板W的端面的高度的位置。又，預備位置決定機構2係，藉由驅動裝置6的轉動裝置8，將磁性軸體7向一方向旋轉(例如，右旋轉)，藉由將第一縱長磁性體9A和第二縱長磁性體9B往收納於導引部11的方向移動，第一抵接銷3a1 、3a1 和第二抵接銷3b1 、3b1 的前端押動基板W的端面而進行預備位置決定。When the substrate W is moved to a predetermined position of the transport roller 31, as shown in Fig. 6(b), the substrate transfer device 1 is lowered to the lower side by the elevating mechanism 18 until the first abutment pins 3a 1 , 3a 1 and The front ends of the two abutting pins 3b 1 and 3b 1 abut against the height of the end surface of the substrate W. Further, the preparatory position determining means 2 rotates the magnetic shaft body 7 in one direction (for example, right rotation) by the turning device 8 of the driving device 6, by the first elongated magnetic body 9A and the second longitudinal length The magnetic body 9B moves in the direction in which the guide portion 11 is accommodated, and the distal ends of the first abutment pins 3a 1 and 3a 1 and the second abutment pins 3b 1 and 3b 1 press the end faces of the substrate W to determine the preparatory position.
又，進行預備位置決定時的吸著保持板13的高度位置係，被調整到接近基板W的上面藉由吸著墊13c吸引而可保持的位置的話，由於可將預備位置決定和吸著保持的兩作業可通過升降機構18一次的下降動作而完成,所以較好。當然，在進行預備位置決定的情形，和在進行基板W的吸著保持的情形，吸著保持板13的吸著墊13c中的下面 的高度位置不同般，進行升降機構18的兩階段的下降動作也可。Further, when the height position of the absorbing holding plate 13 at the time of determining the preliminary position is adjusted to a position close to the upper surface of the substrate W by suction by the absorbing pad 13c, the preliminary position determination and the absorbing hold can be maintained. The two jobs can be completed by the lowering action of the lifting mechanism 18, which is preferable. Of course, in the case where the preliminary position determination is performed, and in the case where the suction holding of the substrate W is performed, the lower side of the suction pad 13c of the holding plate 13 is sucked. The two-stage lowering operation of the elevating mechanism 18 may be performed in a different height position.
如第6(c)圖所示般，基板W的預備位置決定完成的話，藉由驅動裝置6的轉動裝置8，將磁性軸體7向另一方向旋轉(例如，左旋轉)，藉由將第一縱長磁性體9A和第二縱長磁性體9B從導引部11突出的方向移動，將第一抵接銷3a1 、3a1 和第二抵接銷3b1 、3b1 從基板W的端面離開。與此同時，經由升降機構18，基板搬運裝置1係，使吸著保持板13下降，使其藉由吸著墊13c抵接或接近於基板W的狀態吸著保持該基板W。As shown in FIG. 6(c), when the preparatory position determination of the substrate W is completed, the magnetic shaft body 7 is rotated in the other direction (for example, left rotation) by the rotation device 8 of the drive device 6 by The first elongated magnetic body 9A and the second elongated magnetic body 9B move in a direction in which the guiding portion 11 protrudes, and the first abutting pins 3a 1 and 3a 1 and the second abutting pins 3b 1 and 3b 1 are removed from the substrate W. The end face leaves. At the same time, the substrate transfer device 1 lowers the absorbing holding plate 13 via the elevating mechanism 18, and sucks and holds the substrate W in a state in which the absorbing pad 13c abuts or approaches the substrate W.
又，在基板搬運裝置1，在藉由第一抵接銷3a1 、3a1 和第二抵接銷3b1 、3b1 進行預備位置決定的情形，由於驅動裝置6的磁性軸體7、與第一縱長磁性體9A和第二縱長磁性體9B為非接觸，塵埃等的垃圾不會落下到基板W側。Further, in the board conveying device 1, when the preliminary position is determined by the first abutting pins 3a 1 and 3a 1 and the second abutting pins 3b 1 and 3b 1 , the magnetic shaft body 7 of the driving device 6 and The first elongated magnetic body 9A and the second elongated magnetic body 9B are non-contact, and dust such as dust does not fall to the side of the substrate W.
基板搬運裝置1係，吸著保持基板W後，藉由升降機構18上升使基板W從搬入台30離開，沿著移動軌道21移動至曝光台40，將基板W搬運至曝光台40。又也可為，吸著保持基板W後，藉由驅動驅動部3a4 和驅動部3b4 ，將連接板3a5 和連接板3b5 移動至上方，使第一抵接銷3a1 、3a1 和第二抵接銷3b1 、3b1 的下端位於比吸著保持板13的吸著墊13c的下面上方。In the substrate transfer device 1 , after the substrate W is sucked and held, the substrate W is lifted by the elevating mechanism 18 to move away from the loading table 30 , and moved to the exposure table 40 along the moving rail 21 to transport the substrate W to the exposure table 40 . Alternatively, after the substrate W is sucked and held, the driving plate 3a 4 and the driving portion 3b 4 are driven to move the connecting plate 3a 5 and the connecting plate 3b 5 upward, so that the first abutting pins 3a 1 and 3a 1 The lower ends of the second abutting pins 3b 1 and 3b 1 are located above the lower surface of the absorbing pad 13c of the absorbing holding plate 13.
又，如第1圖所示般，在基板W被搬運的曝光台40，和光罩M的整合作業被進行，經由曝光光學系統50光被照射至基板W，曝光作業被進行。又，在曝光裝置A，曝光作 業完成的基板W係，藉由未圖示的搬運裝置，從曝光台40被搬運至搬出台60而被搬出至裝置外。Further, as shown in Fig. 1, the integration work of the exposure table 40 on which the substrate W is transported and the mask M is performed, and the light is irradiated to the substrate W via the exposure optical system 50, and the exposure operation is performed. Also, in the exposure device A, exposure is made The substrate W that has been completed is transported from the exposure stage 40 to the carry-out table 60 by a transport device (not shown) and carried out to the outside of the apparatus.
以上如說明般，基板搬運裝置1係，從基板W的上方進行預備位置決定，吸著保持預備位置決定完成的基板W，從搬入台30搬運至曝光台40。As described above, the substrate transfer apparatus 1 determines the preparation position from the upper side of the substrate W, and sucks and holds the substrate W whose preparation position is completed, and transports it from the loading table 30 to the exposure stage 40.
又，基板搬運裝置1係，藉由沿著基板W的搬運方向(假設為X方向)，押動部3A、3B係直線地往復移動，進行基板W的預備位置決定為例子而說明，但也可為，藉由在與基板W的搬運方向正交的方向(假設為Y方向)，將押動部3A、3B直線地往復移動而移動，進行基板W的預備位置決定的構成。In addition, the substrate transfer device 1 is described by taking the position of the substrate W in a straight line by reciprocatingly moving the pad portions 3A and 3B along the transport direction of the substrate W (assumed to be the X direction). The urging portions 3A and 3B are linearly reciprocated and moved in a direction orthogonal to the conveyance direction of the substrate W (assuming the Y direction), and the preliminary position of the substrate W is determined.
又，基板搬運裝置1係，從X方向和Y方向的兩方押動基板W的端面而進行預備位置決定的構成也可。在從X方向和Y方向押動基板W的端面方面，例如，使磁性軸體7在軸線方向增長，可藉由將X方向的驅動裝置6和Y方向的驅動裝置6配置在不同高度。當然，在X方向和Y方向分別設置磁性軸體7的構成也可。Further, the substrate transfer device 1 may be configured such that the end faces of the substrate W are pushed from both the X direction and the Y direction to determine the preliminary position. In terms of urging the end surface of the substrate W from the X direction and the Y direction, for example, the magnetic shaft body 7 is increased in the axial direction, and the driving device 6 in the X direction and the driving device 6 in the Y direction can be disposed at different heights. Of course, the configuration of the magnetic shaft body 7 may be provided in the X direction and the Y direction, respectively.
又，基板搬運裝置1係，改變處理的基板W的種類時，也有基板W的大小變化的情形，此時作為驅動裝置6的調整，藉由改變第一縱長磁性體9A和第二縱長磁性體9B的移動始點終點的位址，可容易地對應。Further, in the substrate transfer device 1, when the type of the processed substrate W is changed, the size of the substrate W may change. In this case, the first elongated magnetic body 9A and the second elongated length are changed as the adjustment of the drive device 6. The address of the end point of the movement start point of the magnetic body 9B can be easily matched.
1‧‧‧基板搬運裝置1‧‧‧Substrate handling device
2‧‧‧預備位置決定機構2‧‧‧Preparation location decision-making body
3a1 ‧‧‧第一抵接銷3a 1 ‧‧‧First Auxiliary
3b1 ‧‧‧第二抵接銷3b 1 ‧‧‧Secondary
3‧‧‧押動機構3‧‧‧ escrow agency
3a2 (3b2 )‧‧‧滑動部(移動機構)3a 2 (3b 2 )‧‧‧Sliding parts (moving mechanism)
3a4 (3b4 )‧‧‧驅動部3a 4 (3b 4 )‧‧‧Driver
3a5 (3b5 )‧‧‧連接板(移動機構)3a 5 (3b 5 )‧‧‧Connecting plate (moving mechanism)
3A‧‧‧押動部3A‧‧‧Deportation Department
3B‧‧‧押動部3B‧‧‧Deportation Department
6‧‧‧驅動裝置6‧‧‧ drive
7‧‧‧磁性軸體7‧‧‧Magnetic shaft
7a‧‧‧磁性部7a‧‧ Magnetic Department
7b‧‧‧圓筒蓋7b‧‧‧Cylinder cover
8‧‧‧轉動裝置8‧‧‧Rotating device
9A‧‧‧第一縱長磁性體9A‧‧‧First longitudinal magnetic body
9B‧‧‧第二縱長磁性體9B‧‧‧Second longitudinal magnetic body
10A‧‧‧第一從動軸10A‧‧‧First driven shaft
10B‧‧‧第二從動軸10B‧‧‧Second slave axis
11‧‧‧導引部11‧‧‧ Guidance Department
12‧‧‧支持本體12‧‧‧Support ontology
12a‧‧‧本體部12a‧‧‧ Body Department
12b‧‧‧安裝片12b‧‧‧Installation
12c‧‧‧支持板12c‧‧‧Support board
12d‧‧‧缺口部12d‧‧‧Gap section
13‧‧‧吸著保持板13‧‧‧Sucking holding plate
13a‧‧‧吸著部本體13a‧‧‧Sucking body
13b‧‧‧缺口溝13b‧‧‧ gap trench
13c‧‧‧吸著墊13c‧‧‧Sucking pad
17‧‧‧支持構件17‧‧‧Support components
18‧‧‧升降機構18‧‧‧ Lifting mechanism
20‧‧‧搬運機構20‧‧‧Transportation agencies
21‧‧‧移動軌道21‧‧‧Mobile track
30‧‧‧搬入台30‧‧‧ Moving into the station
31‧‧‧搬運滾子31‧‧‧ Carrying rollers
40‧‧‧曝光台40‧‧‧ exposure station
50‧‧‧曝光光學系統50‧‧‧Exposure optical system
51‧‧‧光源51‧‧‧Light source
52‧‧‧燈52‧‧‧ lights
53‧‧‧橢圓反射鏡53‧‧‧Oval mirror
60‧‧‧搬出台60‧‧‧ moved out
61‧‧‧滾子61‧‧‧Roller
A‧‧‧曝光裝置A‧‧‧Exposure device
M‧‧‧光罩M‧‧‧Photo Mask
W‧‧‧基板W‧‧‧Substrate
3a3 (3b3 )‧‧‧第一支持體(第二支持體)3a 3 (3b 3 )‧‧‧First support (second support)
第1圖係從側面模式化地表示利用有關本發明的基板 搬運裝置的曝光裝置的全體的模式圖；第2圖係模式化地表示有關本發明的基板搬運裝置的全體的立體圖；第3圖係模式化地表示從下方向上看有關本發明的基板搬運裝置的狀態的立體圖；第4(a)圖係為省略有關本發明的基板搬運裝置的一部分而表示的平面圖，第4(b)圖係為將有關本發明的基板搬運裝置作為剖面而模式化地表示的剖面圖；第5圖係模式化地表示有關本發明的基板搬運裝置的驅動裝置的構成的模式圖；以及第6(a)~(d)圖係分別模式化地表示有關本發明的基板搬運裝置的動作狀態的側面圖。Figure 1 is a schematic representation of a substrate utilizing the present invention from the side FIG. 2 is a perspective view schematically showing the entire substrate transfer device according to the present invention; and FIG. 3 is a schematic view showing the substrate transfer device according to the present invention as seen from the bottom. FIG. 4(a) is a plan view showing a part of the substrate transfer device according to the present invention, and FIG. 4(b) is a schematic view showing the substrate transfer device according to the present invention as a cross section. FIG. 5 is a schematic view showing a configuration of a driving device of a substrate transfer device according to the present invention; and FIGS. 6(a) to 6(d) are diagrammatically showing the present invention in a schematic manner. Side view of the operating state of the substrate transfer device.
1‧‧‧基板搬運裝置1‧‧‧Substrate handling device
2‧‧‧預備位置決定機構2‧‧‧Preparation location decision-making body
3a1 ‧‧‧第一抵接銷3a 1 ‧‧‧First Auxiliary
3b1 ‧‧‧第二抵接銷3b 1 ‧‧‧Secondary
3‧‧‧押動機構3‧‧‧ escrow agency
3a2 (3b2 )‧‧‧滑動部(移動機構)3a 2 (3b 2 )‧‧‧Sliding parts (moving mechanism)
3a4 ‧‧‧驅動部3a 4 ‧‧‧Driving Department
3a5 (3b5 )‧‧‧連接板(移動機構)3a 5 (3b 5 )‧‧‧Connecting plate (moving mechanism)
3A‧‧‧押動部3A‧‧‧Deportation Department
3B‧‧‧押動部3B‧‧‧Deportation Department
6‧‧‧驅動裝置6‧‧‧ drive
7‧‧‧磁性軸體7‧‧‧Magnetic shaft
8‧‧‧轉動裝置8‧‧‧Rotating device
9A‧‧‧第一縱長磁性體9A‧‧‧First longitudinal magnetic body
9B‧‧‧第二縱長磁性體9B‧‧‧Second longitudinal magnetic body
10A‧‧‧第一從動軸10A‧‧‧First driven shaft
10B‧‧‧第二從動軸10B‧‧‧Second slave axis
11‧‧‧導引部11‧‧‧ Guidance Department
12‧‧‧支持本體12‧‧‧Support ontology
12a‧‧‧本體部12a‧‧‧ Body Department
12b‧‧‧安裝片12b‧‧‧Installation
12d‧‧‧缺口部12d‧‧‧Gap section
13‧‧‧吸著保持板13‧‧‧Sucking holding plate
13b‧‧‧缺口溝13b‧‧‧ gap trench
30‧‧‧搬入台30‧‧‧ Moving into the station
31‧‧‧搬運滾子31‧‧‧ Carrying rollers
40‧‧‧曝光台40‧‧‧ exposure station
W‧‧‧基板W‧‧‧Substrate
3a3 (3b3 )‧‧‧第一支持體(第二支持體)3a 3 (3b 3 )‧‧‧First support (second support)
Claims (5)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007141492A JP4976922B2 (en) | 2007-05-29 | 2007-05-29 | Substrate transfer device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200846267A TW200846267A (en) | 2008-12-01 |
| TWI414475B true TWI414475B (en) | 2013-11-11 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW97114611A TWI414475B (en) | 2007-05-29 | 2008-04-22 | Substrate handling device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4976922B2 (en) |
| CN (1) | CN101315524B (en) |
| TW (1) | TWI414475B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6429017B2 (en) * | 2012-11-30 | 2018-11-28 | 株式会社ニコン | Carry-in method, transport system, exposure apparatus, and device manufacturing method |
| CN109078863B (en) * | 2018-07-27 | 2024-04-16 | 苏州精濑光电有限公司 | Optical detection equipment |
| CN114615816B (en) * | 2022-04-12 | 2022-12-23 | 苏州天准科技股份有限公司 | Plate exposure equipment |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05326361A (en) * | 1992-05-22 | 1993-12-10 | Dainippon Screen Mfg Co Ltd | Prealignment device for proximity aligner |
| CN1912748A (en) * | 2005-08-12 | 2007-02-14 | 株式会社Orc制作所 | Exposure device and exposure method |
| TW200715357A (en) * | 2005-07-21 | 2007-04-16 | Sumitomo Heavy Industries | Stage device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07147315A (en) * | 1993-11-26 | 1995-06-06 | Nikon Corp | Substrate transfer equipment |
| JP3414491B2 (en) * | 1994-05-12 | 2003-06-09 | オリンパス光学工業株式会社 | Board holding member and board appearance inspection apparatus using the same |
| JP3563851B2 (en) * | 1995-12-05 | 2004-09-08 | 大日本スクリーン製造株式会社 | Substrate transfer device |
| JP2002313884A (en) * | 2001-04-10 | 2002-10-25 | Jeol Ltd | Alignment mechanism of position of planar body |
| JP4234964B2 (en) * | 2002-09-10 | 2009-03-04 | 株式会社オーク製作所 | Exposure equipment |
-
2007
- 2007-05-29 JP JP2007141492A patent/JP4976922B2/en not_active Expired - Fee Related
-
2008
- 2008-04-22 TW TW97114611A patent/TWI414475B/en not_active IP Right Cessation
- 2008-05-29 CN CN2008101088599A patent/CN101315524B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05326361A (en) * | 1992-05-22 | 1993-12-10 | Dainippon Screen Mfg Co Ltd | Prealignment device for proximity aligner |
| TW200715357A (en) * | 2005-07-21 | 2007-04-16 | Sumitomo Heavy Industries | Stage device |
| CN1912748A (en) * | 2005-08-12 | 2007-02-14 | 株式会社Orc制作所 | Exposure device and exposure method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008300389A (en) | 2008-12-11 |
| CN101315524B (en) | 2012-07-04 |
| CN101315524A (en) | 2008-12-03 |
| TW200846267A (en) | 2008-12-01 |
| JP4976922B2 (en) | 2012-07-18 |
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