TWI407565B - 功率場效電晶體 - Google Patents

功率場效電晶體 Download PDF

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Publication number
TWI407565B
TWI407565B TW098115682A TW98115682A TWI407565B TW I407565 B TWI407565 B TW I407565B TW 098115682 A TW098115682 A TW 098115682A TW 98115682 A TW98115682 A TW 98115682A TW I407565 B TWI407565 B TW I407565B
Authority
TW
Taiwan
Prior art keywords
mosfet
accumulation
accumulation mosfet
jfet
gate
Prior art date
Application number
TW098115682A
Other languages
English (en)
Chinese (zh)
Other versions
TW201007944A (en
Inventor
Jian Li
King Owyang
Original Assignee
Vishay Siliconix
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vishay Siliconix filed Critical Vishay Siliconix
Publication of TW201007944A publication Critical patent/TW201007944A/zh
Application granted granted Critical
Publication of TWI407565B publication Critical patent/TWI407565B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/63—Vertical IGFETs
    • H10D30/635—Vertical IGFETs having no inversion channels, e.g. vertical accumulation channel FETs [ACCUFET] or normally-on vertical IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/83—FETs having PN junction gate electrodes
    • H10D30/831—Vertical FETs having PN junction gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • H10D62/107—Buried supplementary regions, e.g. buried guard rings 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/111—Field plates
    • H10D64/117—Recessed field plates, e.g. trench field plates or buried field plates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251—Source or drain electrodes for field-effect devices
    • H10D64/256—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are recessed in semiconductor bodies
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/514—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers
    • H10D64/516—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers the thicknesses being non-uniform
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/64—Electrodes comprising a Schottky barrier to a semiconductor

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Bipolar Integrated Circuits (AREA)
TW098115682A 2008-05-12 2009-05-12 功率場效電晶體 TWI407565B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/119,367 US8269263B2 (en) 2008-05-12 2008-05-12 High current density power field effect transistor

Publications (2)

Publication Number Publication Date
TW201007944A TW201007944A (en) 2010-02-16
TWI407565B true TWI407565B (zh) 2013-09-01

Family

ID=41266162

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098115682A TWI407565B (zh) 2008-05-12 2009-05-12 功率場效電晶體

Country Status (7)

Country Link
US (1) US8269263B2 (enExample)
EP (1) EP2279525A4 (enExample)
JP (1) JP5529854B2 (enExample)
KR (1) KR101388821B1 (enExample)
CN (1) CN102057490B (enExample)
TW (1) TWI407565B (enExample)
WO (1) WO2009140224A2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10026835B2 (en) 2009-10-28 2018-07-17 Vishay-Siliconix Field boosted metal-oxide-semiconductor field effect transistor
US8669613B2 (en) * 2010-09-29 2014-03-11 Alpha & Omega Semiconductor, Inc. Semiconductor device die with integrated MOSFET and low forward voltage diode-connected enhancement mode JFET and method
CN102931191B (zh) * 2012-10-31 2016-03-02 成都芯源系统有限公司 半导体器件及其制造方法
US9559198B2 (en) 2013-08-27 2017-01-31 Nxp Usa, Inc. Semiconductor device and method of manufacture therefor
US9837526B2 (en) 2014-12-08 2017-12-05 Nxp Usa, Inc. Semiconductor device wtih an interconnecting semiconductor electrode between first and second semiconductor electrodes and method of manufacture therefor
US9443845B1 (en) 2015-02-23 2016-09-13 Freescale Semiconductor, Inc. Transistor body control circuit and an integrated circuit
US9472662B2 (en) * 2015-02-23 2016-10-18 Freescale Semiconductor, Inc. Bidirectional power transistor with shallow body trench
US10348295B2 (en) 2015-11-19 2019-07-09 Nxp Usa, Inc. Packaged unidirectional power transistor and control circuit therefore
CN109216440B (zh) * 2018-09-17 2021-08-17 电子科技大学 具有双向电平传输的凹槽型漏极结构的mosfet器件
CN109244135B (zh) * 2018-09-17 2021-03-30 电子科技大学 基于沟槽工艺的超结型双向阻断mos器件及制备方法
CN112820775A (zh) * 2021-01-07 2021-05-18 重庆邮电大学 一种具有电子积累效应的soi-ldmos器件
CN113097310B (zh) * 2021-04-02 2023-03-24 重庆邮电大学 一种具有电子积累效应的鳍式EAFin-LDMOS器件

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040232450A1 (en) * 2002-12-20 2004-11-25 Hamza Yilmaz Self-aligned trench MOS junction field-effect transistor for high-frequency applications
US20060267090A1 (en) * 2005-04-06 2006-11-30 Steven Sapp Trenched-gate field effect transistors and methods of forming the same
US20070045727A1 (en) * 2005-08-25 2007-03-01 Masaki Shiraishi DMOSFET and planar type MOSFET

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JP2606404B2 (ja) * 1990-04-06 1997-05-07 日産自動車株式会社 半導体装置
US5396085A (en) * 1993-12-28 1995-03-07 North Carolina State University Silicon carbide switching device with rectifying-gate
US5581100A (en) 1994-08-30 1996-12-03 International Rectifier Corporation Trench depletion MOSFET
US5844273A (en) 1994-12-09 1998-12-01 Fuji Electric Co. Vertical semiconductor device and method of manufacturing the same
US5661322A (en) * 1995-06-02 1997-08-26 Siliconix Incorporated Bidirectional blocking accumulation-mode trench power MOSFET
US5637898A (en) * 1995-12-22 1997-06-10 North Carolina State University Vertical field effect transistors having improved breakdown voltage capability and low on-state resistance
US6351018B1 (en) * 1999-02-26 2002-02-26 Fairchild Semiconductor Corporation Monolithically integrated trench MOSFET and Schottky diode
EP1170803A3 (en) 2000-06-08 2002-10-09 Siliconix Incorporated Trench gate MOSFET and method of making the same
US6426541B2 (en) * 2000-07-20 2002-07-30 Apd Semiconductor, Inc. Schottky diode having increased forward current with improved reverse bias characteristics and method of fabrication
JP2002270840A (ja) * 2001-03-09 2002-09-20 Toshiba Corp パワーｍｏｓｆｅｔ
JP4839548B2 (ja) * 2001-08-29 2011-12-21 株式会社デンソー 炭化珪素半導体装置及びその製造方法
US6878994B2 (en) * 2002-08-22 2005-04-12 International Rectifier Corporation MOSgated device with accumulated channel region and Schottky contact
JP4265234B2 (ja) * 2003-02-13 2009-05-20 株式会社デンソー 炭化珪素半導体装置およびその製造方法
JP2007503108A (ja) * 2003-08-21 2007-02-15 フルテック プロプリエタリー リミテッド 集積化電子切断回路、方法およびシステム
US7417266B1 (en) * 2004-06-10 2008-08-26 Qspeed Semiconductor Inc. MOSFET having a JFET embedded as a body diode
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JP2006147700A (ja) * 2004-11-17 2006-06-08 Sanyo Electric Co Ltd 半導体装置
US7285822B2 (en) * 2005-02-11 2007-10-23 Alpha & Omega Semiconductor, Inc. Power MOS device
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Publication number Priority date Publication date Assignee Title
US20040232450A1 (en) * 2002-12-20 2004-11-25 Hamza Yilmaz Self-aligned trench MOS junction field-effect transistor for high-frequency applications
US20060267090A1 (en) * 2005-04-06 2006-11-30 Steven Sapp Trenched-gate field effect transistors and methods of forming the same
US20070045727A1 (en) * 2005-08-25 2007-03-01 Masaki Shiraishi DMOSFET and planar type MOSFET

Also Published As

Publication number Publication date
JP5529854B2 (ja) 2014-06-25
CN102057490A (zh) 2011-05-11
CN102057490B (zh) 2013-10-30
EP2279525A2 (en) 2011-02-02
US20090278176A1 (en) 2009-11-12
KR101388821B1 (ko) 2014-04-23
KR20110009218A (ko) 2011-01-27
WO2009140224A2 (en) 2009-11-19
JP2011522402A (ja) 2011-07-28
WO2009140224A3 (en) 2010-02-18
TW201007944A (en) 2010-02-16
EP2279525A4 (en) 2013-12-18
US8269263B2 (en) 2012-09-18

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