TWI406107B - 曝光設備和半導體裝置製造方法 - Google Patents

曝光設備和半導體裝置製造方法 Download PDF

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Publication number
TWI406107B
TWI406107B TW097113964A TW97113964A TWI406107B TW I406107 B TWI406107 B TW I406107B TW 097113964 A TW097113964 A TW 097113964A TW 97113964 A TW97113964 A TW 97113964A TW I406107 B TWI406107 B TW I406107B
Authority
TW
Taiwan
Prior art keywords
light
polarization
unit
optical system
exposure apparatus
Prior art date
Application number
TW097113964A
Other languages
English (en)
Chinese (zh)
Other versions
TW200907604A (en
Inventor
篠田健一郎
Original Assignee
佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 佳能股份有限公司 filed Critical 佳能股份有限公司
Publication of TW200907604A publication Critical patent/TW200907604A/zh
Application granted granted Critical
Publication of TWI406107B publication Critical patent/TWI406107B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW097113964A 2007-04-20 2008-04-17 曝光設備和半導體裝置製造方法 TWI406107B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007112290A JP4966724B2 (ja) 2007-04-20 2007-04-20 露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
TW200907604A TW200907604A (en) 2009-02-16
TWI406107B true TWI406107B (zh) 2013-08-21

Family

ID=40049668

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097113964A TWI406107B (zh) 2007-04-20 2008-04-17 曝光設備和半導體裝置製造方法

Country Status (4)

Country Link
US (1) US8208126B2 (enExample)
JP (1) JP4966724B2 (enExample)
KR (1) KR100997577B1 (enExample)
TW (1) TWI406107B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007043958B4 (de) * 2007-09-14 2011-08-25 Carl Zeiss SMT GmbH, 73447 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
JP2009093020A (ja) * 2007-10-10 2009-04-30 Olympus Corp 光学装置及びその光学装置を用いた撮像装置
JP5185727B2 (ja) * 2008-08-22 2013-04-17 ギガフォトン株式会社 偏光純度制御装置及びそれを備えたガスレーザ装置
WO2010073794A1 (ja) * 2008-12-24 2010-07-01 株式会社 ニコン 照明光学系、露光装置及びデバイスの製造方法
TWI408511B (zh) * 2009-04-24 2013-09-11 E Way Technology Co Ltd Exposure machine and its exposure method
EP2622411B1 (en) * 2010-09-28 2015-11-04 Carl Zeiss SMT GmbH Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
JP6020834B2 (ja) 2011-06-07 2016-11-02 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP6044062B2 (ja) * 2011-11-09 2016-12-14 岩崎電気株式会社 照射装置
KR102678955B1 (ko) * 2015-05-19 2024-06-26 케이엘에이 코포레이션 오버레이 측정을 위한 지형 위상 제어
CN108121163B (zh) 2016-11-29 2019-10-25 上海微电子装备（集团）股份有限公司 一种光源曝光剂量控制系统及控制方法
CN117075449B (zh) * 2023-10-16 2024-02-13 广州市艾佛光通科技有限公司 曝光调试装置、系统及方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030095580A1 (en) * 1999-02-12 2003-05-22 Govorkov Sergei V. Beam delivery system for lithographic exposure radiation source
WO2005078774A1 (ja) * 2004-02-13 2005-08-25 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
US20050270608A1 (en) * 2004-06-04 2005-12-08 Takahisa Shiozawa Illumination optical system and exposure apparatus
US20070046921A1 (en) * 2005-07-22 2007-03-01 Kazuhiro Takahashi Exposure apparatus and method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3620612B2 (ja) * 1996-03-29 2005-02-16 株式会社ニコン 露光量制御装置
JP2001284236A (ja) 2000-03-31 2001-10-12 Canon Inc 投影露光装置及び露光方法
JPWO2002052624A1 (ja) * 2000-12-27 2004-04-30 株式会社ニコン 露光装置、光学部材装着部材、光学部材脱着ジグ及びデバイスの製造方法
JP2004235461A (ja) * 2003-01-30 2004-08-19 Nikon Corp 露光システム
JP2007027658A (ja) * 2005-07-21 2007-02-01 Nikon Corp 照明光学装置、露光装置及びマイクロデバイスの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030095580A1 (en) * 1999-02-12 2003-05-22 Govorkov Sergei V. Beam delivery system for lithographic exposure radiation source
WO2005078774A1 (ja) * 2004-02-13 2005-08-25 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
US20050270608A1 (en) * 2004-06-04 2005-12-08 Takahisa Shiozawa Illumination optical system and exposure apparatus
US20070046921A1 (en) * 2005-07-22 2007-03-01 Kazuhiro Takahashi Exposure apparatus and method

Also Published As

Publication number Publication date
US20090002673A1 (en) 2009-01-01
KR20080094594A (ko) 2008-10-23
US8208126B2 (en) 2012-06-26
JP2008270565A (ja) 2008-11-06
TW200907604A (en) 2009-02-16
KR100997577B1 (ko) 2010-11-30
JP4966724B2 (ja) 2012-07-04

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