TWI403830B - 光罩修復裝置及方法 - Google Patents

光罩修復裝置及方法 Download PDF

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Publication number
TWI403830B
TWI403830B TW098109125A TW98109125A TWI403830B TW I403830 B TWI403830 B TW I403830B TW 098109125 A TW098109125 A TW 098109125A TW 98109125 A TW98109125 A TW 98109125A TW I403830 B TWI403830 B TW I403830B
Authority
TW
Taiwan
Prior art keywords
foreign matter
reticle
needle
laser
repairing
Prior art date
Application number
TW098109125A
Other languages
English (en)
Chinese (zh)
Other versions
TW201013303A (en
Inventor
Jong Sup Yeom
Jae Yong Lee
Jeong Bok Yang
Jang Ho Jo
Jun Rae Kim
Keun Haeng Lee
Gyu Sung Shin
Jin Chul Park
Ki Wan Kim
Sok Yong Hong
Hee Chang Yang
Noh Heon Park
Sung Hwan Cho
Hyun Jung Kim
Original Assignee
Charm & Ci Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Charm & Ci Co Ltd filed Critical Charm & Ci Co Ltd
Publication of TW201013303A publication Critical patent/TW201013303A/zh
Application granted granted Critical
Publication of TWI403830B publication Critical patent/TWI403830B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laser Beam Processing (AREA)
TW098109125A 2008-09-26 2009-03-20 光罩修復裝置及方法 TWI403830B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080094937A KR101053450B1 (ko) 2008-09-26 2008-09-26 마스크 리페어 장치 및 방법

Publications (2)

Publication Number Publication Date
TW201013303A TW201013303A (en) 2010-04-01
TWI403830B true TWI403830B (zh) 2013-08-01

Family

ID=42213383

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098109125A TWI403830B (zh) 2008-09-26 2009-03-20 光罩修復裝置及方法

Country Status (2)

Country Link
KR (1) KR101053450B1 (ko)
TW (1) TWI403830B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI461838B (zh) * 2010-04-16 2014-11-21 Cowindst Co Ltd 用於修復半色調遮罩之方法及系統
CN105506548B (zh) * 2016-03-01 2018-05-25 京东方科技集团股份有限公司 一种掩膜板修复装置、修复方法及蒸镀系统
KR101856653B1 (ko) 2016-10-17 2018-06-20 주식회사 이오테크닉스 기압을 이용한 마스크 고정모듈
CN112764309A (zh) * 2021-02-07 2021-05-07 泉芯集成电路制造(济南)有限公司 一种光罩的缺陷去除方法及装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5634230A (en) * 1994-12-27 1997-06-03 Siemens Aktiengesellschaft Apparatus and method for cleaning photomasks
US20040175631A1 (en) * 2002-10-21 2004-09-09 Nanoink, Inc. Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications
US20050110985A1 (en) * 2002-11-12 2005-05-26 David Yogev Advanced mask cleaning and handling

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005005291A (ja) * 2003-06-09 2005-01-06 Matsushita Electric Ind Co Ltd 露光装置および露光装置におけるパーティクル除去方法
KR20050055465A (ko) * 2003-12-08 2005-06-13 주식회사 하이닉스반도체 반도체 소자의 제조공정에 따른 이물질 제거 방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5634230A (en) * 1994-12-27 1997-06-03 Siemens Aktiengesellschaft Apparatus and method for cleaning photomasks
US20040175631A1 (en) * 2002-10-21 2004-09-09 Nanoink, Inc. Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications
US20050110985A1 (en) * 2002-11-12 2005-05-26 David Yogev Advanced mask cleaning and handling

Also Published As

Publication number Publication date
KR20100035512A (ko) 2010-04-05
KR101053450B1 (ko) 2011-08-03
TW201013303A (en) 2010-04-01

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