TWI398735B - 曝光用光源裝置 - Google Patents

曝光用光源裝置 Download PDF

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Publication number
TWI398735B
TWI398735B TW094127517A TW94127517A TWI398735B TW I398735 B TWI398735 B TW I398735B TW 094127517 A TW094127517 A TW 094127517A TW 94127517 A TW94127517 A TW 94127517A TW I398735 B TWI398735 B TW I398735B
Authority
TW
Taiwan
Prior art keywords
light
exposure
planar
light source
lens
Prior art date
Application number
TW094127517A
Other languages
English (en)
Chinese (zh)
Other versions
TW200619862A (en
Inventor
Miyake Ken
Original Assignee
Sanei Giken Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanei Giken Co Ltd filed Critical Sanei Giken Co Ltd
Publication of TW200619862A publication Critical patent/TW200619862A/zh
Application granted granted Critical
Publication of TWI398735B publication Critical patent/TWI398735B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094127517A 2004-09-03 2005-08-12 曝光用光源裝置 TWI398735B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004257578 2004-09-03
JP2004314314 2004-10-28
JP2005176278 2005-06-16
JP2005229706A JP4328320B2 (ja) 2004-09-03 2005-08-08 露光用光源

Publications (2)

Publication Number Publication Date
TW200619862A TW200619862A (en) 2006-06-16
TWI398735B true TWI398735B (zh) 2013-06-11

Family

ID=37150046

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094127517A TWI398735B (zh) 2004-09-03 2005-08-12 曝光用光源裝置

Country Status (3)

Country Link
JP (1) JP4328320B2 (ko)
KR (1) KR101110516B1 (ko)
TW (1) TWI398735B (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009038255A (ja) * 2007-08-02 2009-02-19 San Ei Giken Inc 光源
TWI408511B (zh) * 2009-04-24 2013-09-11 E Way Technology Co Ltd Exposure machine and its exposure method
JP5355261B2 (ja) * 2009-07-07 2013-11-27 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の露光光形成方法、及び表示用パネル基板の製造方法
JPWO2011096365A1 (ja) * 2010-02-05 2013-06-10 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
JP6057072B2 (ja) * 2013-03-22 2017-01-11 ウシオ電機株式会社 光源装置
JP2019101361A (ja) * 2017-12-07 2019-06-24 株式会社ユメックス スキャン式露光装置
JP2023009810A (ja) * 2021-07-08 2023-01-20 ウシオ電機株式会社 照明光学系および露光装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05249688A (ja) * 1992-03-09 1993-09-28 Asahi Optical Co Ltd 原版露光装置及び該装置の原版検査方法
JPH11233427A (ja) * 1998-02-10 1999-08-27 Canon Inc 近接場光リソグラフィー装置および方法
JP2002131921A (ja) * 2000-10-19 2002-05-09 Orc Mfg Co Ltd 照射光振分機構およびそれを有する露光装置
JP2004207343A (ja) * 2002-12-24 2004-07-22 Nikon Corp 照明光源、照明装置、露光装置及び露光方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4355384B2 (ja) * 1999-01-14 2009-10-28 キヤノン株式会社 パターン露光方法、露光装置、核酸アレイの形成方法及びペプチドアレイの形成方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05249688A (ja) * 1992-03-09 1993-09-28 Asahi Optical Co Ltd 原版露光装置及び該装置の原版検査方法
JPH11233427A (ja) * 1998-02-10 1999-08-27 Canon Inc 近接場光リソグラフィー装置および方法
JP2002131921A (ja) * 2000-10-19 2002-05-09 Orc Mfg Co Ltd 照射光振分機構およびそれを有する露光装置
JP2004207343A (ja) * 2002-12-24 2004-07-22 Nikon Corp 照明光源、照明装置、露光装置及び露光方法

Also Published As

Publication number Publication date
TW200619862A (en) 2006-06-16
JP2007025613A (ja) 2007-02-01
KR20060050911A (ko) 2006-05-19
JP4328320B2 (ja) 2009-09-09
KR101110516B1 (ko) 2012-01-31

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