TWI394007B - 曝光裝置 - Google Patents
曝光裝置 Download PDFInfo
- Publication number
- TWI394007B TWI394007B TW94113744A TW94113744A TWI394007B TW I394007 B TWI394007 B TW I394007B TW 94113744 A TW94113744 A TW 94113744A TW 94113744 A TW94113744 A TW 94113744A TW I394007 B TWI394007 B TW I394007B
- Authority
- TW
- Taiwan
- Prior art keywords
- exposed
- exposure
- scanning
- illumination
- photographing
- Prior art date
Links
- 230000007246 mechanism Effects 0.000 claims description 115
- 230000003287 optical effect Effects 0.000 claims description 67
- 238000005286 illumination Methods 0.000 claims description 60
- 239000000758 substrate Substances 0.000 claims description 51
- 230000007723 transport mechanism Effects 0.000 claims description 21
- 238000003384 imaging method Methods 0.000 claims description 16
- 230000032258 transport Effects 0.000 claims description 14
- 239000011521 glass Substances 0.000 description 43
- 230000015654 memory Effects 0.000 description 28
- 239000011159 matrix material Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000037406 food intake Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004134440A JP4338577B2 (ja) | 2004-04-28 | 2004-04-28 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200537257A TW200537257A (en) | 2005-11-16 |
| TWI394007B true TWI394007B (zh) | 2013-04-21 |
Family
ID=35241829
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94113744A TWI394007B (zh) | 2004-04-28 | 2005-04-28 | 曝光裝置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4338577B2 (https=) |
| TW (1) | TWI394007B (https=) |
| WO (1) | WO2005106590A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI386762B (zh) * | 2005-05-24 | 2013-02-21 | V Technology Co Ltd | 曝光裝置及圖形形成方法 |
| DE102006014380A1 (de) * | 2006-03-27 | 2007-10-11 | Carl Zeiss Smt Ag | Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille |
| US8055099B2 (en) | 2006-04-05 | 2011-11-08 | Sharp Kabushiki Kaisha | Exposure method and exposure device |
| JP2008076709A (ja) * | 2006-09-21 | 2008-04-03 | V Technology Co Ltd | 露光装置 |
| JP4997908B2 (ja) * | 2006-10-11 | 2012-08-15 | 大日本印刷株式会社 | カラーフィルタの製造装置および製造方法 |
| JP2009188012A (ja) * | 2008-02-04 | 2009-08-20 | Nsk Ltd | 露光装置 |
| JP5489050B2 (ja) * | 2008-02-04 | 2014-05-14 | 日本精工株式会社 | 露光装置 |
| JP2009251290A (ja) * | 2008-04-07 | 2009-10-29 | V Technology Co Ltd | 露光装置 |
| TWI444674B (zh) | 2008-05-28 | 2014-07-11 | Toppan Printing Co Ltd | 彩色濾光片之製法、附圖案之基板之製法及小型光罩 |
| CN109478018B (zh) * | 2015-12-17 | 2020-11-24 | 株式会社尼康 | 图案描绘装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002040669A (ja) * | 2000-07-19 | 2002-02-06 | Toray Eng Co Ltd | 描画装置 |
| US20040000833A1 (en) * | 2000-03-30 | 2004-01-01 | Lilie Dietmar Erich Bernhard | Process for forming an annular stack of metallic laminations for the stator of a linear motor and an annular stack of metallic laminations |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09320939A (ja) * | 1996-05-29 | 1997-12-12 | Nikon Corp | 位置検出方法及び装置 |
| FR2800565B1 (fr) * | 1999-11-03 | 2002-10-25 | Automa Tech Sa | Dispositif de mesure d'erreur de position relative |
| JP2004012903A (ja) * | 2002-06-07 | 2004-01-15 | Fuji Photo Film Co Ltd | 露光装置 |
-
2004
- 2004-04-28 JP JP2004134440A patent/JP4338577B2/ja not_active Expired - Fee Related
-
2005
- 2005-04-28 WO PCT/JP2005/008114 patent/WO2005106590A1/ja not_active Ceased
- 2005-04-28 TW TW94113744A patent/TWI394007B/zh not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040000833A1 (en) * | 2000-03-30 | 2004-01-01 | Lilie Dietmar Erich Bernhard | Process for forming an annular stack of metallic laminations for the stator of a linear motor and an annular stack of metallic laminations |
| JP2002040669A (ja) * | 2000-07-19 | 2002-02-06 | Toray Eng Co Ltd | 描画装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005316166A (ja) | 2005-11-10 |
| TW200537257A (en) | 2005-11-16 |
| WO2005106590A1 (ja) | 2005-11-10 |
| JP4338577B2 (ja) | 2009-10-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7812920B2 (en) | Production method of substrate for liquid crystal display using image-capturing and reference position detection at corner of pixel present in TFT substrate | |
| TWI394007B (zh) | 曝光裝置 | |
| CN101238416B (zh) | 曝光装置及被曝光体 | |
| CN100483258C (zh) | 曝光图案形成方法 | |
| CN1947069B (zh) | 曝光装置 | |
| JP4338628B2 (ja) | 露光装置 | |
| JP4235584B2 (ja) | 露光装置及びパターン形成方法 | |
| JP4613098B2 (ja) | 露光装置 | |
| JP4951036B2 (ja) | 露光装置 | |
| TWI386762B (zh) | 曝光裝置及圖形形成方法 | |
| KR101098729B1 (ko) | 노광 장치 및 패턴 형성 방법 | |
| JP4195413B2 (ja) | 露光装置及びパターン形成方法 | |
| TWI901967B (zh) | 模板生成裝置、描繪系統、模板生成方法以及電腦可讀取的程式 | |
| CN101840162B (zh) | 曝光装置及图形形成方法 | |
| CN1885167B (zh) | 曝光装置及图形形成方法 | |
| JP4914043B2 (ja) | 露光装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |