JP4338577B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4338577B2
JP4338577B2 JP2004134440A JP2004134440A JP4338577B2 JP 4338577 B2 JP4338577 B2 JP 4338577B2 JP 2004134440 A JP2004134440 A JP 2004134440A JP 2004134440 A JP2004134440 A JP 2004134440A JP 4338577 B2 JP4338577 B2 JP 4338577B2
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JP
Japan
Prior art keywords
exposed
exposure
light beam
imaging
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004134440A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005316166A (ja
JP2005316166A5 (https=
Inventor
三好 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Priority to JP2004134440A priority Critical patent/JP4338577B2/ja
Priority to TW94113744A priority patent/TWI394007B/zh
Priority to PCT/JP2005/008114 priority patent/WO2005106590A1/ja
Publication of JP2005316166A publication Critical patent/JP2005316166A/ja
Publication of JP2005316166A5 publication Critical patent/JP2005316166A5/ja
Application granted granted Critical
Publication of JP4338577B2 publication Critical patent/JP4338577B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004134440A 2004-04-28 2004-04-28 露光装置 Expired - Fee Related JP4338577B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004134440A JP4338577B2 (ja) 2004-04-28 2004-04-28 露光装置
TW94113744A TWI394007B (zh) 2004-04-28 2005-04-28 曝光裝置
PCT/JP2005/008114 WO2005106590A1 (ja) 2004-04-28 2005-04-28 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004134440A JP4338577B2 (ja) 2004-04-28 2004-04-28 露光装置

Publications (3)

Publication Number Publication Date
JP2005316166A JP2005316166A (ja) 2005-11-10
JP2005316166A5 JP2005316166A5 (https=) 2007-05-24
JP4338577B2 true JP4338577B2 (ja) 2009-10-07

Family

ID=35241829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004134440A Expired - Fee Related JP4338577B2 (ja) 2004-04-28 2004-04-28 露光装置

Country Status (3)

Country Link
JP (1) JP4338577B2 (https=)
TW (1) TWI394007B (https=)
WO (1) WO2005106590A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI386762B (zh) * 2005-05-24 2013-02-21 V Technology Co Ltd 曝光裝置及圖形形成方法
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
US8055099B2 (en) 2006-04-05 2011-11-08 Sharp Kabushiki Kaisha Exposure method and exposure device
JP2008076709A (ja) * 2006-09-21 2008-04-03 V Technology Co Ltd 露光装置
JP4997908B2 (ja) * 2006-10-11 2012-08-15 大日本印刷株式会社 カラーフィルタの製造装置および製造方法
JP2009188012A (ja) * 2008-02-04 2009-08-20 Nsk Ltd 露光装置
JP5489050B2 (ja) * 2008-02-04 2014-05-14 日本精工株式会社 露光装置
JP2009251290A (ja) * 2008-04-07 2009-10-29 V Technology Co Ltd 露光装置
TWI444674B (zh) 2008-05-28 2014-07-11 Toppan Printing Co Ltd 彩色濾光片之製法、附圖案之基板之製法及小型光罩
CN109478018B (zh) * 2015-12-17 2020-11-24 株式会社尼康 图案描绘装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09320939A (ja) * 1996-05-29 1997-12-12 Nikon Corp 位置検出方法及び装置
FR2800565B1 (fr) * 1999-11-03 2002-10-25 Automa Tech Sa Dispositif de mesure d'erreur de position relative
BR0002187A (pt) * 2000-03-30 2001-11-13 Brasil Compressores Sa Processo de formação de pacote anelar delâminas metálicas de estator de motor linear e opacote anelar de lâminas metálicas formado
JP2002040669A (ja) * 2000-07-19 2002-02-06 Toray Eng Co Ltd 描画装置
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Also Published As

Publication number Publication date
JP2005316166A (ja) 2005-11-10
TW200537257A (en) 2005-11-16
WO2005106590A1 (ja) 2005-11-10
TWI394007B (zh) 2013-04-21

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