TWI383861B - Chemical polishing apparatus and manufacturing method of thin glass substrate - Google Patents

Chemical polishing apparatus and manufacturing method of thin glass substrate Download PDF

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Publication number
TWI383861B
TWI383861B TW95123870A TW95123870A TWI383861B TW I383861 B TWI383861 B TW I383861B TW 95123870 A TW95123870 A TW 95123870A TW 95123870 A TW95123870 A TW 95123870A TW I383861 B TWI383861 B TW I383861B
Authority
TW
Taiwan
Prior art keywords
chemical polishing
bubble
glass substrate
container holder
opening
Prior art date
Application number
TW95123870A
Other languages
English (en)
Chinese (zh)
Other versions
TW200722228A (en
Inventor
Tomohiro Nishiyama
Original Assignee
Nishiyama Stainless Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nishiyama Stainless Chemical Co Ltd filed Critical Nishiyama Stainless Chemical Co Ltd
Publication of TW200722228A publication Critical patent/TW200722228A/zh
Application granted granted Critical
Publication of TWI383861B publication Critical patent/TWI383861B/zh

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  • Surface Treatment Of Glass (AREA)
  • Liquid Crystal (AREA)
TW95123870A 2005-12-02 2006-06-30 Chemical polishing apparatus and manufacturing method of thin glass substrate TWI383861B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005349712 2005-12-02
JP2006108238A JP3981393B2 (ja) 2005-12-02 2006-04-11 化学研磨装置及びガラス基板の製造方法

Publications (2)

Publication Number Publication Date
TW200722228A TW200722228A (en) 2007-06-16
TWI383861B true TWI383861B (zh) 2013-02-01

Family

ID=38302317

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95123870A TWI383861B (zh) 2005-12-02 2006-06-30 Chemical polishing apparatus and manufacturing method of thin glass substrate

Country Status (2)

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JP (1) JP3981393B2 (ja)
TW (1) TWI383861B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009007183A (ja) * 2007-06-26 2009-01-15 Nishiyama Stainless Chem Kk 化学研磨装置及びそのガラス基板
US8876978B2 (en) 2008-02-14 2014-11-04 Mitsubishi Heavy Industries, Ltd. Method for regenerating gas turbine blade and gas turbine blade regenerating apparatus
JP5334216B2 (ja) * 2011-10-28 2013-11-06 株式会社Ｎｓｃ ガラス基板の製造方法
JP2013155057A (ja) * 2012-01-26 2013-08-15 Sanwa Frost Industry Co Ltd Ｌｃｄガラス基板のエッチング方法およびその装置
CN113582553B (zh) * 2021-08-11 2023-03-28 芜湖东信光电科技有限公司 一种超薄玻璃盖板加工工艺

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000147474A (ja) * 1998-11-02 2000-05-26 System Technology Inc 薄膜トランジスタ液晶ディスプレイ用ガラスの自動エッチング装置
JP2003020255A (ja) * 2001-04-12 2003-01-24 Nishiyama Stainless Chem Kk ガラス基板の化学加工方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000147474A (ja) * 1998-11-02 2000-05-26 System Technology Inc 薄膜トランジスタ液晶ディスプレイ用ガラスの自動エッチング装置
JP2003020255A (ja) * 2001-04-12 2003-01-24 Nishiyama Stainless Chem Kk ガラス基板の化学加工方法

Also Published As

Publication number Publication date
JP2007176780A (ja) 2007-07-12
TW200722228A (en) 2007-06-16
JP3981393B2 (ja) 2007-09-26

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