TWI372942B - Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern - Google Patents

Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern

Info

Publication number
TWI372942B
TWI372942B TW097129604A TW97129604A TWI372942B TW I372942 B TWI372942 B TW I372942B TW 097129604 A TW097129604 A TW 097129604A TW 97129604 A TW97129604 A TW 97129604A TW I372942 B TWI372942 B TW I372942B
Authority
TW
Taiwan
Prior art keywords
fluorine
containing compound
immersion exposure
resist pattern
resist composition
Prior art date
Application number
TW097129604A
Other languages
English (en)
Other versions
TW200923574A (en
Inventor
Sanae Furuya
Takayoshi Mori
Takahiro Dazai
Ryoichi Takasu
Tomoyuki Hirano
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200923574A publication Critical patent/TW200923574A/zh
Application granted granted Critical
Publication of TWI372942B publication Critical patent/TWI372942B/zh

Links

TW097129604A 2007-08-03 2008-08-01 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern TWI372942B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007203177 2007-08-03
JP2007293145 2007-11-12
JP2008080695A JP5150327B2 (ja) 2007-08-03 2008-03-26 液浸露光用レジスト組成物およびレジストパターン形成方法

Publications (2)

Publication Number Publication Date
TW200923574A TW200923574A (en) 2009-06-01
TWI372942B true TWI372942B (en) 2012-09-21

Family

ID=40870530

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097129604A TWI372942B (en) 2007-08-03 2008-08-01 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern

Country Status (2)

Country Link
JP (2) JP5150327B2 (zh)
TW (1) TWI372942B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9023578B2 (en) 2009-07-07 2015-05-05 Mitsubishi Rayon Co., Ltd. Copolymer for lithography and method for evaluating the same
KR101432395B1 (ko) 2009-07-07 2014-08-20 미츠비시 레이온 가부시키가이샤 중합체의 제조 방법, 리소그라피용 중합체, 레지스트 조성물, 및 기판의 제조 방법
WO2011034176A1 (ja) * 2009-09-18 2011-03-24 Jsr株式会社 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び重合性化合物
US9040221B2 (en) 2010-05-20 2015-05-26 Jsr Corporation Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound
US8580480B2 (en) * 2010-07-27 2013-11-12 Jsr Corporation Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound
JP5729114B2 (ja) 2010-08-19 2015-06-03 Jsr株式会社 感放射線性樹脂組成物、パターン形成方法、重合体及び化合物
JP5856441B2 (ja) 2011-11-09 2016-02-09 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法及び高分子化合物
JP5764480B2 (ja) 2011-11-25 2015-08-19 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法及び高分子化合物
KR101882369B1 (ko) * 2014-09-30 2018-07-26 주식회사 엘지화학 고분자막

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0690546B2 (ja) * 1986-03-14 1994-11-14 富士写真フイルム株式会社 電子写真式平版印刷用原版
JPH0796574B2 (ja) * 1988-03-17 1995-10-18 株式会社日立製作所 熱硬化性樹脂組成物及びその硬化物
JPH04198939A (ja) * 1990-11-29 1992-07-20 Fuji Photo Film Co Ltd 平版印刷用原版
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom
DE10124481A1 (de) * 2000-06-28 2002-01-10 Merck Patent Gmbh Cyclohexan-Derivate und flüssigkristallines Medium
ATE399775T1 (de) * 2003-10-08 2008-07-15 Smithkline Beecham Corp Triphenylethyleneverbindungen als selektive modulatoren des östrogenrezeptors
JP4871549B2 (ja) * 2005-08-29 2012-02-08 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4671035B2 (ja) * 2005-10-14 2011-04-13 信越化学工業株式会社 化学増幅型レジスト材料及びパターン形成方法
JP5331308B2 (ja) * 2007-03-26 2013-10-30 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法

Also Published As

Publication number Publication date
TW200923574A (en) 2009-06-01
JP2012255170A (ja) 2012-12-27
JP5150327B2 (ja) 2013-02-20
JP5613738B2 (ja) 2014-10-29
JP2009139909A (ja) 2009-06-25

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