TWI369589B - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing methodInfo
- Publication number
- TWI369589B TWI369589B TW096124514A TW96124514A TWI369589B TW I369589 B TWI369589 B TW I369589B TW 096124514 A TW096124514 A TW 096124514A TW 96124514 A TW96124514 A TW 96124514A TW I369589 B TWI369589 B TW I369589B
- Authority
- TW
- Taiwan
- Prior art keywords
- device manufacturing
- lithographic apparatus
- lithographic
- manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/486,379 US7675607B2 (en) | 2006-07-14 | 2006-07-14 | Lithographic apparatus and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200813652A TW200813652A (en) | 2008-03-16 |
TWI369589B true TWI369589B (en) | 2012-08-01 |
Family
ID=38948921
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096124514A TWI369589B (en) | 2006-07-14 | 2007-07-05 | Lithographic apparatus and device manufacturing method |
Country Status (5)
Country | Link |
---|---|
US (1) | US7675607B2 (zh) |
JP (1) | JP4791421B2 (zh) |
KR (1) | KR100918248B1 (zh) |
CN (1) | CN101105640B (zh) |
TW (1) | TWI369589B (zh) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008041287A1 (de) * | 2007-08-24 | 2009-02-26 | Carl Zeiss Smt Ag | Kraftaktuator |
NL2003673A (en) * | 2008-11-21 | 2010-05-25 | Asml Netherlands Bv | Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determing the effect of thermal loads on a patterning device. |
NL2006190A (en) * | 2010-03-11 | 2011-09-13 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
TWI542952B (zh) * | 2010-12-02 | 2016-07-21 | Asml控股公司 | 圖案化裝置支撐件 |
KR101962487B1 (ko) * | 2011-02-22 | 2019-07-17 | 가부시키가이샤 니콘 | 유지 장치, 노광 장치, 및 디바이스의 제조 방법 |
KR20130028165A (ko) * | 2011-06-21 | 2013-03-19 | 삼성디스플레이 주식회사 | 마스크 유닛 |
DE102011086513A1 (de) | 2011-11-16 | 2013-05-16 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie |
US9910368B2 (en) | 2012-10-23 | 2018-03-06 | Asml Netherlands B.V. | Patterning device manipulating system and lithographic apparatuses |
DE102012111114B4 (de) * | 2012-11-19 | 2018-10-04 | Ev Group E. Thallner Gmbh | Halbleiterbearbeitungsvorrichtung und -verfahren |
US10289007B2 (en) * | 2014-07-10 | 2019-05-14 | Nikon Corporation | Lithography tool having a reticle stage capable of dynamic reticle bending to compensate for distortion |
CN104977815B (zh) * | 2015-07-03 | 2018-02-23 | 苏州微影激光技术有限公司 | 直写式曝光系统中的扫描台 |
DE102018220565A1 (de) * | 2018-11-29 | 2020-06-04 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem semiaktiven Abstandshalter und Verfahren zur Verwendung des semiaktiven Abstandshalters |
CN113324894A (zh) * | 2021-05-31 | 2021-08-31 | 海南大学 | 一种用于研究塑料光降解的实验装置 |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2584824B1 (fr) * | 1985-07-10 | 1987-09-25 | Commissariat Energie Atomique | Miroir deformable |
US4711438A (en) * | 1986-05-08 | 1987-12-08 | Micrion Limited Partnership | Mask holding |
JPH02310912A (ja) * | 1989-05-26 | 1990-12-26 | Hitachi Ltd | 露光方法及びその装置 |
JPH04158364A (ja) * | 1990-10-23 | 1992-06-01 | Fujitsu Ltd | 投影露光装置 |
JPH06130344A (ja) * | 1992-10-22 | 1994-05-13 | Toshiba Corp | マスク描画用基板の保持装置 |
JPH07263316A (ja) * | 1994-03-25 | 1995-10-13 | Toshiba Corp | X線露光装置 |
JPH07297118A (ja) * | 1994-04-27 | 1995-11-10 | Canon Inc | 基板および基板保持方法ならびにその装置 |
JPH088173A (ja) * | 1994-06-16 | 1996-01-12 | Nikon Corp | 露光装置及び露光システム |
JPH0982606A (ja) * | 1995-09-13 | 1997-03-28 | Nikon Corp | レチクルホルダ |
JP3305188B2 (ja) * | 1996-02-07 | 2002-07-22 | キヤノン株式会社 | 原版、原版保持装置およびこれを用いた露光装置ならびにディバイス製造方法 |
JP3648847B2 (ja) * | 1996-05-20 | 2005-05-18 | 株式会社ニコン | マスクの支持機構及びこれを用いた露光装置 |
JPH10214780A (ja) * | 1997-01-28 | 1998-08-11 | Nikon Corp | 投影露光装置 |
JP3634539B2 (ja) * | 1997-02-28 | 2005-03-30 | キヤノン株式会社 | マスク保持装置、露光装置、デバイス製造方法、及びマスク構造体 |
JP2001023886A (ja) * | 1999-07-08 | 2001-01-26 | Nikon Corp | 試料保持装置及び露光装置 |
JP2001148335A (ja) * | 1999-11-18 | 2001-05-29 | Canon Inc | 露光装置およびデバイス製造方法 |
TW504605B (en) * | 1999-12-03 | 2002-10-01 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the same, the device and mask |
TW508653B (en) * | 2000-03-24 | 2002-11-01 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit manufacturing method |
EP1139176B1 (en) * | 2000-03-24 | 2006-05-10 | ASML Netherlands B.V. | Lithographic apparatus and mask table |
US6398373B1 (en) * | 2000-08-09 | 2002-06-04 | Asml Us, Inc. | Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems |
US6947195B2 (en) * | 2001-01-18 | 2005-09-20 | Ricoh Company, Ltd. | Optical modulator, optical modulator manufacturing method, light information processing apparatus including optical modulator, image formation apparatus including optical modulator, and image projection and display apparatus including optical modulator |
WO2002065519A1 (fr) * | 2001-02-13 | 2002-08-22 | Nikon Corporation | Dispositif de support, procede de support, dispositif d'exposition et procede de production des dispositifs |
JP2003133233A (ja) * | 2001-10-23 | 2003-05-09 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP3713479B2 (ja) * | 2001-11-09 | 2005-11-09 | エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ | 平板投影装置および素子製造方法 |
US6806943B2 (en) * | 2002-08-09 | 2004-10-19 | International Business Machines Corporation | Mask clamping device |
JP2004153122A (ja) * | 2002-10-31 | 2004-05-27 | Nikon Corp | 露光装置 |
CN1311301C (zh) * | 2002-12-23 | 2007-04-18 | Asml荷兰有限公司 | 一种光刻投影装置 |
TWI340406B (en) * | 2003-06-04 | 2011-04-11 | Nikon Corp | Stage apparatus, fixing method , expose apparatus, exposing method and method for manufacturing device |
KR100603326B1 (ko) * | 2003-12-09 | 2006-07-20 | 삼성에스디아이 주식회사 | 마스크 및 마스크 프레임 조립 장치 및 조립 방법 |
US7019816B2 (en) * | 2003-12-17 | 2006-03-28 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7119884B2 (en) * | 2003-12-24 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2006178318A (ja) * | 2004-12-24 | 2006-07-06 | Nsk Ltd | 露光装置 |
US7436484B2 (en) * | 2004-12-28 | 2008-10-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7459701B2 (en) * | 2005-06-08 | 2008-12-02 | Asml Netherlands B.V. | Stage apparatus, lithographic apparatus and device manufacturing method |
US7239376B2 (en) * | 2005-07-27 | 2007-07-03 | International Business Machines Corporation | Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices |
US7884919B2 (en) * | 2006-02-09 | 2011-02-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2006
- 2006-07-14 US US11/486,379 patent/US7675607B2/en active Active
-
2007
- 2007-07-05 TW TW096124514A patent/TWI369589B/zh not_active IP Right Cessation
- 2007-07-06 JP JP2007177947A patent/JP4791421B2/ja not_active Expired - Fee Related
- 2007-07-11 CN CN2007101290834A patent/CN101105640B/zh active Active
- 2007-07-13 KR KR1020070070809A patent/KR100918248B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20080007185A (ko) | 2008-01-17 |
US7675607B2 (en) | 2010-03-09 |
US20080013068A1 (en) | 2008-01-17 |
JP4791421B2 (ja) | 2011-10-12 |
JP2008021997A (ja) | 2008-01-31 |
CN101105640B (zh) | 2010-12-29 |
TW200813652A (en) | 2008-03-16 |
KR100918248B1 (ko) | 2009-09-21 |
CN101105640A (zh) | 2008-01-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |