TWI359880B - Method to electrodeposit metals using ionic liquid - Google Patents

Method to electrodeposit metals using ionic liquid Download PDF

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Publication number
TWI359880B
TWI359880B TW097129448A TW97129448A TWI359880B TW I359880 B TWI359880 B TW I359880B TW 097129448 A TW097129448 A TW 097129448A TW 97129448 A TW97129448 A TW 97129448A TW I359880 B TWI359880 B TW I359880B
Authority
TW
Taiwan
Prior art keywords
group
chlorinated
metal
ammonium
chloride
Prior art date
Application number
TW097129448A
Other languages
English (en)
Chinese (zh)
Other versions
TW200925334A (en
Inventor
Boris Kuzmanovic
Lamberdine Johanna Willemina Maria Nabuurs-Willems
Strien Cornelis Johannes Govardus Van
Franz Winfried Welter
Johanna Christina Speelman
Original Assignee
Akzo Nobel Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akzo Nobel Nv filed Critical Akzo Nobel Nv
Publication of TW200925334A publication Critical patent/TW200925334A/zh
Application granted granted Critical
Publication of TWI359880B publication Critical patent/TWI359880B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/66Electroplating: Baths therefor from melts
    • C25D3/665Electroplating: Baths therefor from melts from ionic liquids
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electrolytic Production Of Metals (AREA)
TW097129448A 2007-08-02 2008-08-01 Method to electrodeposit metals using ionic liquid TWI359880B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP07113717 2007-08-02

Publications (2)

Publication Number Publication Date
TW200925334A TW200925334A (en) 2009-06-16
TWI359880B true TWI359880B (en) 2012-03-11

Family

ID=38870310

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097129448A TWI359880B (en) 2007-08-02 2008-08-01 Method to electrodeposit metals using ionic liquid

Country Status (12)

Country Link
US (1) US20100252446A1 (pl)
EP (1) EP2171131B1 (pl)
JP (1) JP2010535283A (pl)
CN (1) CN101765681B (pl)
AT (1) ATE493523T1 (pl)
CA (1) CA2695488A1 (pl)
DE (1) DE602008004255D1 (pl)
ES (1) ES2358967T3 (pl)
HK (1) HK1143194A1 (pl)
PL (1) PL2171131T3 (pl)
TW (1) TWI359880B (pl)
WO (1) WO2009016189A1 (pl)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9580772B2 (en) * 2009-03-17 2017-02-28 Commonwealth Scientific And Industrial Research Organisation Electrorecovery of metals
DE102009035660A1 (de) * 2009-07-30 2011-02-03 Ewald Dörken Ag Verfahren zur elektrochemischen Beschichtung eines Werkstücks
US20120189778A1 (en) * 2011-01-26 2012-07-26 Riewe Curtis H Coating method using ionic liquid
CN102888630B (zh) * 2011-07-20 2015-11-18 中国科学院过程工程研究所 一种离子液体/添加剂体系低温电沉积制备纳米铝或纳米铝镀层的方法
US9758884B2 (en) * 2012-02-16 2017-09-12 Stacey Hingley Color control of trivalent chromium deposits
DE102012104707A1 (de) * 2012-05-31 2013-12-05 Benteler Automobiltechnik Gmbh Verfahren zum Herstellen eines Abgaswärmetauschers
WO2013182631A1 (en) 2012-06-08 2013-12-12 Onderzoekscentrum Voor Aanwending Van Staal N.V. Method for producing a metal coating
CN102839403B (zh) * 2012-09-10 2015-02-25 太原理工大学 一种离子液体中电镀铝的方法
CN103484900A (zh) * 2013-09-18 2014-01-01 湖南工业大学 一种离子液体中直接电沉积晶态纳米晶无微裂纹铬镀层的方法
WO2015088859A2 (en) 2013-12-10 2015-06-18 Lei Chen Electrodeposited nickel-chromium alloy
EP3080338B1 (en) 2013-12-10 2018-10-03 Lei Chen Nickel-chromium-aluminum composite by electrodeposition
US10378118B2 (en) * 2013-12-11 2019-08-13 United Technologies Corporation Electroformed nickel-chromium alloy
CN104294327B (zh) * 2014-10-20 2016-07-13 中国科学院过程工程研究所 一种离子液体电解液及用该电解液制备光亮铝镀层的方法
CN105220216B (zh) * 2015-09-28 2017-08-25 中国科学院兰州化学物理研究所 一种铝或铝合金电化学抛光方法
TWI662162B (zh) * 2016-11-15 2019-06-11 財團法人工業技術研究院 一種電鍍方法及其系統
JP7072796B2 (ja) * 2018-02-19 2022-05-23 国立大学法人 名古屋工業大学 調光部材
US20210156041A1 (en) * 2019-11-22 2021-05-27 Hamilton Sundstrand Corporation Metallic coating and method of application

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265120A (en) * 1975-11-26 1977-05-30 Sony Corp Electro plating method of aluminium or aluminium alloy
JPH01132571A (ja) * 1987-11-18 1989-05-25 Aguro Kanesho Kk 農園芸用殺菌剤
GB0023708D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Hydrated salt mixtures
GB0023706D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Ionic liquids
US6552843B1 (en) * 2002-01-31 2003-04-22 Innovative Technology Licensing Llc Reversible electrodeposition device with ionic liquid electrolyte
US20050205425A1 (en) * 2002-06-25 2005-09-22 Integran Technologies Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents
US6721080B1 (en) * 2002-09-27 2004-04-13 D Morgan Tench Optimum switching of a reversible electrochemical mirror device
US6798556B2 (en) * 2003-01-31 2004-09-28 Rockwell Scientific Licensing, Llc. Locally-switched reversible electrodeposition optical modulator
DE102004059520A1 (de) * 2004-12-10 2006-06-14 Merck Patent Gmbh Elektrochemische Abscheidung von Tantal und/oder Kupfer in ionischen Flüssigkeiten
US7320832B2 (en) * 2004-12-17 2008-01-22 Integran Technologies Inc. Fine-grained metallic coatings having the coefficient of thermal expansion matched to the one of the substrate
JP2007070698A (ja) * 2005-09-07 2007-03-22 Kyoto Univ 金属の電析方法
CA2642427C (en) * 2006-02-15 2014-03-25 Akzo Nobel N.V. Method to electrodeposit metals using ionic liquids

Also Published As

Publication number Publication date
HK1143194A1 (en) 2010-12-24
DE602008004255D1 (de) 2011-02-10
TW200925334A (en) 2009-06-16
CA2695488A1 (en) 2009-02-05
US20100252446A1 (en) 2010-10-07
PL2171131T3 (pl) 2011-05-31
JP2010535283A (ja) 2010-11-18
EP2171131B1 (en) 2010-12-29
ATE493523T1 (de) 2011-01-15
WO2009016189A1 (en) 2009-02-05
EP2171131A1 (en) 2010-04-07
CN101765681B (zh) 2013-03-20
CN101765681A (zh) 2010-06-30
ES2358967T3 (es) 2011-05-17

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