TWI358611B - Radiation sensitive composition for color filter, - Google Patents

Radiation sensitive composition for color filter, Download PDF

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TWI358611B
TWI358611B TW094109806A TW94109806A TWI358611B TW I358611 B TWI358611 B TW I358611B TW 094109806 A TW094109806 A TW 094109806A TW 94109806 A TW94109806 A TW 94109806A TW I358611 B TWI358611 B TW I358611B
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meth
acrylate
acid
weight
pigment
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TW094109806A
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TW200540566A (en
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Jun Numata
Kazuhiro Kobayashi
Satoshi Morishita
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Jsr Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Description

1358611 (1) 九、發明說明 【發明所屬之技術領域】 本發明係關於一種彩色濾光器用輻射敏感性組合物、 彩色濾光器、及彩色液晶顯示器。更明確地，本發明係關 * 於一種彩色濾光器用輻射敏感性組合物，其可用於生產彩 色濾光器而使用在透明或反射彩色液晶顯示器、彩色影像 收集管元件及其類似者，用此組合物所形成的彩色濾光器 φ ，及加入此彩色濾光器的彩色液晶顯示器。 【先前技術】 爲製作彩色濾光器而使用彩色輻射敏感性組合物，一 般已知的方法包括下列步驟：在基材上或表面已事先形成 所需要圖案之阻光層的基材上形成彩色輻射敏感性組合物 的塗層膜，經由具有所需要之圖案的光罩將.此基材曝光於 輻射線（以下稱爲"曝光"），將此膜顯影以溶解且移除未曝 • 光部分，且經使用淸潔的烤箱或熱板將殘留膜作後烘烤， 以形成各種顏色的像素圖案（參考JP-A 2-144502(如在此使 用的術語"JP-A”意指”未審查而公開的日本專利申請案"）及 JP-A 3 -5 3 20 1 )。然而，用此方法，當顯影時在基材上未曝 光部分或在阻光層上可能會造成殘留物或汙染，特別當在 此彩色輻射敏感性組合物中含有高濃度顏料。 爲避免產生該殘留物及汙染，有效的方式爲增加顯影 劑的排放壓力。然而，其也將導致不良之效應，造成圖案 的碎屑化或剝離。如此，已漸增地需求一種彩色輻射敏感 -5- (2) 1358611 性組合物，其可顯示卓越的對基材的黏合，且不會有碎屑 或剝離的圖案，甚至當顯影劑排放壓力增加時亦然。 此外，近年來，液晶顯示器的尺寸正在增加中，且形 / 成彩色濾光器的基材已增大尺寸。據此，在形成彩色濾光 '* 器的曝光步驟中，已使用一種稱爲"分區曝光"的方法而進 行數次曝光。然而，另一方面，曝光需要的總時間也已增 加。因此，基於改良產率之觀點，已需求甚至在較短的曝 Φ 光時間之中可形成圖元素圖案的彩色輻射敏感性組合物。 然而，當在短曝光時間之中形成圖元素圖案，慣常的 彩色輻射敏感性組合物在顯影中可能會有圖案的碎屑或剝 離，即帶有低曝光劑量且因此不能必然地令人滿意。此外 ，在低曝光劑量下，彩色輻射敏感性組合物塗覆膜不充分 的熟化，將明顯地損害圖案的表面平滑度，而發生令人不 滿意的液晶定向》此外，慣常的彩色輻射敏感性組合物的 問題在於其一般傾向於黏度會隨時間而增加，且因此於製 • 備之後不能長期間保存。 如此，已強烈地需要發展彩色濾光器用輻射敏感性組 合物，使其顯示卓越的對基材的黏合，甚至在低曝光劑量 下也具有充分的顯影性及圖案表面平滑度，且具有卓越的 貯存穩定性》 【發明內容】 本發明目的之一在提供一種彩色濾光器用輻射敏感性 組合物，其可顯示卓越的對基材的黏合，甚至在低曝光劑 -6 - (3) 1358611 量下也具有充分的顯影性及圖案表面平滑度，且具有卓越 的貯存穩定性。 本發明另一項目的在提供一種由上述本發明組合物所 Φ 形成的彩色濾光器 ' 而本發明另一項目的在提供一種具有上述本發明彩色 濾光器的液晶顯示器。 由以下描述，本發明之其它目標及優點將變得明顯。 φ 依據本發明，首先，要達成上述本發明之目的，可使 用一種彩色濾光器用輻射敏感性組合物，其包含（A)顏料 、（B)分散劑、（C)鹼可溶的樹脂，此鹼可溶的樹脂含有下 列各項之共聚物：（cl)含有羧基基團的不飽和單體且包括（ 甲基）丙烯酸，（c2)N-位置經取代的順式丁烯二醯亞胺，及 (c3)由下列各者所組成的類群中所選出的至少一種：苯乙 烯、甲基苯乙烯、對-羥基-α-甲基苯乙烯、（甲基）丙 烯酸.甲酯、（甲基）丙烯酸正丁酯、（甲基）丙烯酸2-乙基己 φ 酯、（甲基）丙烯酸2-羥乙酯、（甲基）丙烯酸烯丙酯、（甲基 )丙烯酸苄酯、甘油單（甲基）丙烯酸酯、聚苯乙烯巨單體及 聚甲基丙烯酸甲酯巨單體，（D)多官能基單體、（Ε)光聚合 起始劑及（F)溶劑，該分散劑（Β)包含經由活性陰離子聚合 所得到的丙烯酸系共聚物，且此丙烯酸系共聚物的胺値（ 單位：mgKOH/g)高於0、酸値（單位：mgK0H/g)高於 其次’依據本發明’爲達成上述本發明之目的可使用 一種彩色滤光器用幅射敏感性組合物其包含（a)顏料、 (B)分散劑、（C)鹼可溶的樹脂，（D)多官能基單體、（£)光 (4) 1358611 . 聚合起始劑及（F)溶劑，該分散劑（B)包含經由活性陰離子 聚合所得到的丙烯酸系共聚物，且此丙烯酸系共聚物的胺 • 値（單位：mgKOH/g)高於〇、酸値（單位·· mgKOH/g)高於0 •, ，且將該顏料（A)預先分散在含有分散劑（B)、鹼可溶的樹 脂（C)及溶劑（F)的介質之中。 第三’依據本發明，可經由自上述彩色濾光器用輻射 敏感性組合物所形成的彩色濾光器，達成上述本發明之目 • 的。 第四，依據本發明，經由一種具有上述彩色濾光器之 液晶顯示器，可達成上述本發明之目的。 依據本發明之彩色濾光器用輻射敏感性組合物，可顯示卓 越的對基材的黏合，甚至在低曝光劑量下也具有充分的顯 影性及圖案表面平滑度，且具有卓越的貯存穩定性。 因此，依據本發明的彩色濾光器用輻射敏感性組合物 可非常適用於形成各種彩色濾光器，包括在電子工業上彩 Φ 色液晶顯示器用的彩色濾光器。 【實施方式】 以下，將進一步的記述本發明。 彩色濾光器用輻射敏感性組合物 -(A)顏料· 在本發明中的顏料未特別地限制’且可爲有機顏料或 無機顔料。在此類之中，有機顏料爲特別較佳的，因爲彩 (5)1358611 色濾光器需要高純度與高透明度著色及耐熱性。 上述有機顏料的說明性實施例包括在色彩指數（C.I.; 由 The Society of Dyers and Colourists 發表）中分類爲顏 料的化合物。其特定實施例包括以下帶有色彩指數（C . I.) 數字的化合物’即C.I.顏料黃色12、C_I_顏料黃色13、 C.I.顏料黃色14、C.I.顏料黃色17.、C_I.顏料黃色20、 C.I.顔料黃色24'c.I.顏料黃色31、c.i.顏料黃色55、 C.I·顏料黃色83'c.〗·顏料黃色93 CI顏料黃色1〇9、 c·1.顏料黃色110、c」·顏料黃色U8、c」顏料黃色139、 C」·顏料黃色15〇、C·!•顔料黃色153、c [顔料黃色丨54、 C·1·顏料黃色155、C.I·顏料黃色166、CI顏料黃色ι681358611 (1) Description of the Invention [Technical Field] The present invention relates to a radiation-sensitive composition for a color filter, a color filter, and a color liquid crystal display. More specifically, the present invention relates to a radiation-sensitive composition for a color filter that can be used to produce a color filter for use in a transparent or reflective color liquid crystal display, a color image collection tube element, and the like. The color filter φ formed by the composition and the color liquid crystal display incorporating the color filter. [Prior Art] A color radiation-sensitive composition is used for the production of a color filter, and a generally known method includes the steps of forming a color on a substrate or a substrate whose surface has previously formed a light-blocking layer of a desired pattern. The coating film of the radiation-sensitive composition is exposed to radiation (hereinafter referred to as "exposure") via a photomask having a desired pattern, and the film is developed to dissolve and remove unexposed • Light portion, and the residual film is post-baked using a clean oven or hot plate to form pixel patterns of various colors (refer to JP-A 2-144502 (as used herein, the term "JP-A" It means "unexamined and published Japanese Patent Application" and JP-A 3 - 5 3 20 1 ). However, in this way, residues or contamination may be caused on the unexposed portion of the substrate or on the light blocking layer during development, particularly when the color radiation sensitive composition contains a high concentration of pigment. In order to avoid this residue and contamination, an effective way is to increase the discharge pressure of the developer. However, it will also cause undesirable effects, causing chipping or peeling of the pattern. Thus, there has been a growing need for a color radiation-sensitive-5-(2) 1358611 composition that exhibits excellent adhesion to substrates without debris or peeling patterns, even when developer discharge pressure The same is true when adding. Further, in recent years, the size of liquid crystal displays is increasing, and the substrate of the color filter is increased in size. Accordingly, in the exposure step of forming a color filter '*, a number of exposures have been performed using a method called "partition exposure". However, on the other hand, the total time required for exposure has also increased. Therefore, based on the viewpoint of improved yield, it has been demanded to form a color radiation-sensitive composition of a pattern element pattern even in a short exposure time. However, when the pattern element pattern is formed in a short exposure time, the conventional color radiation-sensitive composition may have chipping or peeling of the pattern in development, i.e., with a low exposure dose and thus cannot be necessarily satisfactory. In addition, under low exposure doses, insufficient curing of the color radiation-sensitive composition coating film will significantly impair the surface smoothness of the pattern, resulting in unsatisfactory liquid crystal orientation. In addition, conventional color radiation sensitivity A problem with the composition is that it generally tends to increase in viscosity over time and therefore cannot be preserved for long periods of time after preparation. Thus, there is a strong need to develop a radiation-sensitive composition for a color filter that exhibits excellent adhesion to a substrate, and has sufficient developability and pattern surface smoothness even at low exposure doses, and is excellent. Storage Stability [Invention] It is an object of the present invention to provide a radiation-sensitive composition for a color filter which exhibits excellent adhesion to a substrate even at low exposure agents -6 - (3) 1358611 It also has sufficient developability and smoothness of the surface of the pattern, and has excellent storage stability. Another object of the present invention is to provide a color filter formed by the above-described composition of the present invention, and another object of the present invention is to provide a liquid crystal display having the above-described color filter of the present invention. Other objects and advantages of the invention will be apparent from the description. According to the present invention, first, in order to achieve the object of the present invention, a radiation-sensitive composition for a color filter comprising (A) a pigment, (B) a dispersant, and (C) an alkali-soluble resin may be used. The alkali-soluble resin contains a copolymer of (cl) a carboxyl group-containing unsaturated monomer and includes (meth)acrylic acid, (c2) N-position substituted cis-butenylene An amine, and (c3) at least one selected from the group consisting of styrene, methylstyrene, p-hydroxy-α-methylstyrene, (meth)acrylic acid methyl ester, ( N-butyl methacrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, glycerin Mono (meth) acrylate, polystyrene macromonomer and polymethyl methacrylate macromonomer, (D) polyfunctional monomer, (fluorene) photopolymerization initiator and (F) solvent, the dispersion The agent (Β) comprises an acrylic copolymer obtained by living anionic polymerization, and the acrylic copolymer値 (unit: mgKOH/g) higher than 0, acid strontium (unit: mgK0H/g) higher than the second 'in accordance with the present invention'. For the purpose of achieving the above-mentioned invention, a radiation sensitive composition for a color filter can be used. Containing (a) a pigment, (B) a dispersant, (C) an alkali-soluble resin, (D) a polyfunctional monomer, (£) light (4) 1358611. a polymerization initiator and (F) a solvent, The dispersing agent (B) contains an acrylic copolymer obtained by living anionic polymerization, and the amine copolymer of the acrylic copolymer (unit: mgKOH/g) is higher than strontium and acid strontium (unit·mgKOH/g). The pigment (A) is previously dispersed in a medium containing a dispersing agent (B), an alkali-soluble resin (C), and a solvent (F). Thirdly, according to the present invention, the object of the present invention described above can be achieved by a color filter formed of a radiation-sensitive composition from the above color filter. Fourth, according to the present invention, the object of the present invention described above can be attained by a liquid crystal display having the above color filter. The radiation-sensitive composition for a color filter according to the present invention exhibits excellent adhesion to a substrate, has sufficient developability at a low exposure dose, and has a smooth surface texture, and has excellent storage stability. Therefore, the radiation-sensitive composition for a color filter according to the present invention is very suitable for forming various color filters, including color filters for color CMOS liquid crystal displays in the electronics industry. [Embodiment] Hereinafter, the present invention will be further described. Radiation-sensitive composition for color filter - (A) Pigment · The pigment in the present invention is not particularly limited' and may be an organic pigment or an inorganic pigment. Among such, organic pigments are particularly preferred because the color (5) 1358611 color filter requires high purity and high transparency coloring and heat resistance. Illustrative examples of the above organic pigments include compounds classified as pigments in the color index (C.I.; published by The Society of Dyers and Colourists). Specific examples thereof include the following compounds having a color index (C.I.) number, i.e., CI Pigment Yellow 12, C_I_Pigment Yellow 13, CI Pigment Yellow 14, CI Pigment Yellow 17., C_I. Pigment Yellow 20, CI Pigment yellow 24'cI pigment yellow 31, ci pigment yellow 55, CI·pigment yellow 83'c.〗 Pigment yellow 93 CI pigment yellow 1〇9, c·1. Pigment yellow 110, c”·Pigment yellow U8, c "Pigment Yellow 139, C"·Pigment Yellow 15〇, C·!•Pigment Yellow 153,c [Pigment Yellow 丨54, C·1·Pigment Yellow 155, CI·Pigment Yellow 166, CI Pigment Yellow ι68

及C.I.顔料黃色21 1 ; C.I 顔料橙色36' C.I.顔料橙色43 C·1.顏料橙色51、C.I.顏料卢A Γ τ扣 C 檀色61及C.1.類料橙色71 ; 顏料紅色9、顏料紅色97、c丄顏料紅色123、c. 411 ^ 122 '颂料紅色149，C〇Tt168' C.I·顏料紅色176、。顏料紅色 18°、C.I.顏料紅色185、CI顏二:工：177、C.1·顔料紅色 ^、^.顏料紅色心^ ^-顔料紅色 m .1.顏料紅色215、Γτ&, 224、C·1，顏料紅色242、Ct # C·!.顏料紅色 色.1.顏料紅色 ,C.I.顏料紫色丨9 ' 丄顏料紅 色29: C ‘顏料紫色23及（：1顔蚪嗖 C.1.顔料藍15 ' C丨.1.顏枓窠 、C . I細， .1.顏料藍0 0、C . I ·顏糾、 _料藍15 : 4及c r 顯枓藍15 : 3 、（：· I _ ••顔料藍 1 5 ·· 6 ; c I gg 4•類料綠色36、C.I.顧. ··顏料綠色7And CI Pigment Yellow 21 1 ; CI Pigment Orange 36' CI Pigment Orange 43 C·1. Pigment Orange 51, CI Pigment Lu A Γ τ Buck C Sandal Color 61 and C.1. Class Orange 71 ; Pigment Red 9, Pigment Red 97, c 丄 pigment red 123, c. 411 ^ 122 '颂 red 149, C 〇 Tt168' CI · pigment red 176. Pigment red 18°, CI pigment red 185, CI 颜二:工: 177, C.1·Pigment red ^, ^. Pigment red heart ^ ^-Pigment red m .1. Pigment red 215, Γτ &, 224, C · 1, pigment red 242, Ct # C·!. pigment red color. 1. pigment red, CI pigment purple 丨 9 ' 丄 pigment red 29: C 'pigment purple 23 and (: 1 蚪嗖 C.1. pigment Blue 15 'C丨.1. Yan Yan, C. I fine, .1. Pigment Blue 0 0, C . I · Yan Jing, _Material Blue 15 : 4 and cr 枓 Indigo 15 : 3 , (:· I _ ••Pigment Blue 1 5 ·· 6 ; c I gg 4•Class Green 36, CI Gu. ··Pig Green 7

:及C •I·顏料掠色23及=綠色136及C·1·輯料綠色⑴ -1-顏料棕色25 -9- (6) 1358611 _ 此類有機顏料可單獨使用或以二或更多者之摻合物使 用。 *· 本發明中，有機顏料可經由再結晶方法、再沈澱方法 ·· • 、溶劑淸洗方法、昇華方法、真空加熱方法作純化，且可 * 組合此類方法然後作純化。 同時，無機顏料之說明性實施例包括氧化鈦、硫酸鋇 、碳酸鈣、氧化鋅、硫酸鉛、鉛黃、鋅黃、紅氧化鐵（III) Φ 、鎘紅、群青、普魯士藍 '氧化鉻綠 '鈷綠，琥珀色，鈦 黑，合成的鐵黑，及碳黑。 此類無機顏料可單獨使用或以二或更多者之摻合物使 用。 此外，在本發明中，在一些案例中，一或更多染料及 天然著色物質可與上述顏料合併使用。 本發明中，視需要可使用聚合物將顏料微粒之表面作 改良。改良顏料微粒表面的聚合物之說明性實施例包括敘 φ 述於JP-A 8 -2 5 9 8 76的聚合物，與針對分散顏料的各種商 業聚合物或寡聚物。 -(B)分散劑- 在本發明中的分散劑含有經由活性陰離子聚合所得到 的丙烯酸系共聚物（以下稱爲”丙烯酸系分散劑（B1)")，且 此丙烯酸系共聚物的胺値（單位：mgKOH/g:此單位也適 用於以下敘述）與酸値（單位：mgKOH/g ;此單位也適用於 以下描述）高於〇。 -10- (7) 1358611 -丙烯酸系分散劑（B1)的胺値宜在ι〇至1〇〇，更佳爲 15至50。此外’丙烯酸系分散劑（B1)的酸値宜在5至5〇 . ’更佳爲10至3〇。在此案例中，當丙烯酸系分散劑（B1) 的胺値爲0，所得到組合物之貯存穩定性易於劣化β此外 龜 ’當丙烯酸系分散劑（Β1)的酸値爲0，對基材的黏合將易 於劣化。 丙烯酸系分散劑（Β1)之商業產物的實施例爲 _ Disperbyk-2001(胺値=29，酸値=19，Byk-Chemie 公司之 產物）。 本發明中’丙烯酸系分散劑（B1)可單獨使用或以二或 更多者之摻合物使用。 本發明中，可將其它分散劑與丙烯酸系分散劑（B1)合 倂使用。: and C • I·Pig glaze 23 and = green 136 and C·1· arranging green (1) -1-pigment brown 25 -9- (6) 1358611 _ These organic pigments can be used alone or in two or more The blend is used. *· In the present invention, the organic pigment can be purified by a recrystallization method, a reprecipitation method, a solvent washing method, a sublimation method, a vacuum heating method, and the like can be combined and then purified. Meanwhile, illustrative examples of inorganic pigments include titanium oxide, barium sulfate, calcium carbonate, zinc oxide, lead sulfate, lead yellow, zinc yellow, red iron oxide (III) Φ, cadmium red, ultramarine blue, Prussian blue 'chromia green 'Cobalt green, amber, titanium black, synthetic iron black, and carbon black. Such inorganic pigments may be used singly or in combination of two or more. Further, in the present invention, in some cases, one or more dyes and natural coloring matters may be used in combination with the above pigments. In the present invention, the surface of the pigment fine particles can be modified using a polymer as needed. Illustrative examples of polymers that modify the surface of pigment particles include those described in JP-A 8 -2 5 9 8 76, and various commercial polymers or oligomers for dispersing pigments. - (B) Dispersant - The dispersant in the present invention contains an acrylic copolymer obtained by living anionic polymerization (hereinafter referred to as "acrylic dispersant (B1) "), and an amine of the acrylic copolymer値 (unit: mgKOH/g: this unit is also applicable to the following description) and acid bismuth (unit: mgKOH/g; this unit is also applicable to the following description) higher than 〇. -10- (7) 1358611 - Acrylic dispersant The amine of (B1) is preferably from 1 to 10, more preferably from 15 to 50. Further, the acid of the acrylic dispersant (B1) is preferably from 5 to 5 Å. More preferably from 10 to 3 Å. In this case, when the amine oxime of the acrylic dispersant (B1) is 0, the storage stability of the resulting composition is liable to be deteriorated. Further, the turtle's acid enthalpy of the acrylic dispersant (Β1) is 0, on the substrate. The adhesion will be easily deteriorated. An example of a commercial product of an acrylic dispersant (Β1) is _ Disperbyk-2001 (amine 値 = 29, acid 値 = 19, product of Byk-Chemie Company). In the present invention, 'acrylic dispersion The agent (B1) may be used singly or in combination of two or more. In the present invention, other Powder with the acrylic dispersing agent (B1) Merger use.

上述其它分散劑的說明性實施例包括聚氧伸乙基烷基 醚類如聚氧伸乙基月桂基醚、聚氧伸乙基硬脂基醚及聚氧 % 伸乙基油醯醚；聚氧伸乙基烷基苯基醚類如聚氧伸乙基正 辛基苯基醚及聚氧伸乙基正壬基苯基醚；聚乙二醇二酯如 聚乙二醇二月桂酸鹽及聚乙二醇二硬脂酸鹽；山梨醇脂肪 酸酯類；脂肪酸改良的聚酯；三級胺改良的聚胺基甲酸酯 :聚乙烯亞胺類；（如以下提及的商品名 ）KP(Shin-EtsuChemical 公司之產物），P 0 L Y F L 0 W ( Κ Υ Ο EI S H A Chemical 公司之產物），EFTOP(TOCHEM PRODUCTS 公司 之產物），MEGAFAC(DAINIPPON INK AND CHEMICALS ’公司之產物），FLORAD(Sumitomo 3M 之產物），ASAHI -11 - (8) 1358611 4Illustrative examples of the above other dispersing agents include polyoxyethylene ethyl ethers such as polyoxyethylidene ethyl ether, polyoxyethylene ethyl stearyl ether, and polyoxyl ethyl ether ether; Oxyethylene phenyl ethers such as polyoxyethylidene phenyl ether and polyoxyethylidene phenyl ether; polyethylene glycol diesters such as polyethylene glycol dilaurate And polyethylene glycol distearate; sorbitan fatty acid esters; fatty acid modified polyester; tertiary amine modified polyurethane: polyethyleneimine; (as mentioned below) KP (product of Shin-Etsu Chemical), P 0 LYFL 0 W (product of EI Υ EI EI SHA Chemical), EFTOP (product of TOCHEM PRODUCTS), MEGAFAC (product of DAINIPPON INK AND CHEMICALS 'company), FLORAD ( Product of Sumitomo 3M), ASAHI -11 - (8) 1358611 4

GUARD 及 SURFLON(AS AHI GL ASGUARD and SURFLON (AS AHI GL AS

Disperbyk-101 、 Disperbyk-110 、 Disperbyk-130 、 Disperbyk-162 、 Di sperbyk-165 、Disperbyk-101, Disperbyk-110, Disperbyk-130, Disperbyk-162, Di sperbyk-165,

Disperbyk-103 、 Disperbyk-1 1 1 、 Disperbyk-160 ' Disperbyk-163 、 Disperbyk-166 、Disperbyk-103, Disperbyk-1 1 1 , Disperbyk-160 ' Disperbyk-163 , Disperbyk-166 ,

Di sperbyk-180 、 Disperbyk-182 及 公司之產物）， Disperbyk-107 、 Disperbyk-115 、 Disperbyk- 1 61 、 Disperbyk-164 、 Disperbyk-170 ' Disperbyk-2000(Byk-Di sperbyk-180, Disperbyk-182 and the company's products), Disperbyk-107, Disperbyk-115, Disperbyk-1 61, Disperbyk-164, Disperbyk-170 'Disperbyk-2000(Byk-

Chemie 公司之產物），SOLSP ARS E S 5 000、S O LS P ARS E 5 1 2000 、 SOLSP ARSE 5 1 3240、 SOLSP ARSE 5 1 3940、 SOLSPARSE 517000、 SOLSPARSE 520000、 SOLSPARSE 522000、SOLSPARSE 524000、S O L S P AR S E S 2 4 0 0 0 G R ' SOLSPARSE 526000、SOLSPARSE 527000 及 SOLSPARSE 52 8000(Avecia 公司之產物），EFKA46、EFKA47、 EFKA48、EFKA745、EFKA4540、EFKA4550、EFKA675 0 、EFKA LP4008 、 EFKA LP4009 、 EFKA LP4010 、 EFKA • LP4015 、 EFKA LP4050 、 EFKA LP4055 、 EFKA LP4560 、 EFKA LP4800、EFKA 聚合物 400、EFKA 聚合物 401、 EFKA聚合物402、EFKA聚合物403、EFKA聚合物450、 EFKA 聚合物 451 及 EFKA 聚合物 45 3 (EFKA CHEMICALS 公司之產物）；及 AJISPER-PB-822(Ajinomoto-Fine-Techno 公司之產物）。 此類其它分散劑可單獨使用或以二或更多者之摻合物 使用。 此其它分散劑含量宜在0至75 wt%，更佳爲〇至50 -12- (9) 1358611Products of Chemie), SOLSP ARS ES 5 000, SO LS P ARS E 5 1 2000, SOLSP ARSE 5 1 3240, SOLSP ARSE 5 1 3940, SOLSPARSE 517000, SOLSPARSE 520000, SOLSPARSE 522000, SOLSPARSE 524000, SOLSP AR SES 2 4 0 0 0 GR ' SOLSPARSE 526000, SOLSPARSE 527000 and SOLSPARSE 52 8000 (product of Avecia), EFKA46, EFKA47, EFKA48, EFKA745, EFKA4540, EFKA4550, EFKA675 0, EFKA LP4008, EFKA LP4009, EFKA LP4010, EFKA • LP4015, EFKA LP4050, EFKA LP4055, EFKA LP4560, EFKA LP4800, EFKA Polymer 400, EFKA Polymer 401, EFKA Polymer 402, EFKA Polymer 403, EFKA Polymer 450, EFKA Polymer 451 and EFKA Polymer 45 3 (EFKA CHEMICALS The product); and AJISPER-PB-822 (product of Ajinomoto-Fine-Techno). Such other dispersing agents may be used singly or as a blend of two or more. The content of the other dispersant is preferably from 0 to 75 wt%, more preferably from 50 -12 to (9) 1358611.

Wt%，此係基於丙烯酸系分散劑（B1)與其它分散劑的總量 計。在此案例中，當其它分散劑含量大於7 5 w t %，可能 \ 無法確保在顯影性、表面平滑度及貯存穩定性之間的良好 ‘ 平衡。 a 在本發明中丙烯酸系分散劑（B1)含量（就固含量而言） 宜在1至50重量份，更佳爲3至30重量份，此係基於 1〇〇重量份的顏料（A)計。在此案例中，當丙烯酸系.分散劑 φ (B1)含量小於1重量份時，所得到組合物之貯存穩定性易 於劣化，而當其大於50重量份時，易於有殘餘物留在基 質上。 -(C)鹼可溶的樹脂- 在本發明中鹼可溶的樹脂未特別地限制，只要其可作 用在顏料（A)上作爲黏著劑且具有在顯影劑之中的溶解度 ’特佳爲在生產彩色濾光器顯影步驟之中所使用的鹼性顯 φ 影劑。在以上所有中，較佳爲具有羧基基團之鹼可溶的樹 脂’且特別較佳者爲在分子中具有至少一個羧基基團的乙 嫌_ 不飽和單體（ethylenically unsatgrated mononer )(以 下稱爲"含有羧基基團的不飽和單體’·），與其它可共聚合的 乙烯屬不飽和單體（以下稱爲，，可共聚合的不飽和單體"）之 共聚物（以下稱爲”含有羧基基團的共聚物"）。 含有羧基基團的不飽和單體之說明性實施例包括： 不飽和單羧酸如（甲基）丙烯酸、巴豆酸、α-氯丙烯酸 及肉桂酸： -13- 1358611 酐酸 酸檬 二檸 烯餾 丁 蒸 順 、 、 肝 酸酸 二頭 烯烏 丁解 順分 如、 肝 酸 其頭 或烏 酸解 羧分 二、 和酸 0)飽二 0 不烯 丁 反 ‘蒸餾檸檬酸酐及甲基反丁烯二酸； 具有三或更多羧基基團的不飽和多元羧酸其或其酐： * 帶有二或更多羧基基團之多元羧酸之單[(甲基）丙烯醯 基氧基烷基]酯類如琥珀酸單[2-(甲基）丙烯醯基氧基乙酯] 及酞酸單[2-(甲基）丙烯醯基氧基乙]酯： φ 及在兩端帶有羧基基團與羥基基團的聚合物之單（甲 基）丙烯酸酯如ω-羧基聚己內酯單（甲基）丙烯酸酯。 在此類含有羧基基團的不飽和單體之中，單（2-丙烯醯 基氧基乙基）酞酸酯係可商購者，商品名 爲 Μ-5400(Toagosei公司之產物）》 上述含有羧基基團的不飽和單體可單獨使用或以二或 更多者之摻合物使用。 同時，可共聚合的不飽和單體之說明性實施例包括： # 順式丁烯二醯亞胺；N-位置經取代的順式丁烯二醯亞胺如 N-苯基順式丁烯二醯亞胺、N-鄰羥基苯基順式丁烯二醯亞 胺' N-間羥基苯基順式丁烯二醯亞胺、N-對羥基苯基順式 丁烯二醯亞胺、N-苄基順式丁烯二醯亞胺' N-環己基順式 丁烯二醯亞胺、N-琥珀醯亞胺-3-順式丁烯二醯亞胺苯甲 酸鹽’ N-琥珀醯亞胺-4-順式丁烯二醯亞胺丁酸鹽，N-琥 拍_亞胺-6-順式丁嫌—酿亞胺己酸醋' N -號拍酿亞胺- 3-順式丁烯二醯亞胺丙.酸酯及N-(丙烯二基）順式丁烯二醯亞 胺：芳族乙烯基化合物如苯乙烯、α -甲基苯乙烯、鄰-乙 -14- (11) 1358611 . 烯基甲苯、間-乙烯基甲苯，對-乙烯基甲苯，對·氯苯乙烯 、鄰-甲氧基苯乙烯、間-甲氧基苯乙烯、對·甲氧基苯乙烯 % 、對-羥基甲基苯乙烯、鄰-乙烯基爷基甲基醚，間·乙 « •烯基苄基甲基醚，對-乙烯基苄基甲基醚，鄰-乙烯基苄基 • 甘油基醚，間-乙烯基苄基甘油基醚及對-乙烯基苄基甘油 基醚；茚烯類如茚烯及1-甲基茚烯；不飽和羧酸酯類如( 甲基）丙烯酸甲酯、（甲基）丙烯酸乙酯、（甲基）丙烯酸正丙 φ 酯、（甲基）丙烯酸異丙酯、（甲基）丙烯酸正丁酯 '(甲基） 丙烯酸異丁酯、第二（甲基）丙烯酸丁酯、（甲基）丙烯酸第 三丁酯、（甲基）丙烯酸2-乙基己酯、（甲基）丙烯酸2-羥乙 酯、（甲基）丙烯酸2-羥丙酯、（甲基）丙烯酸3-羥丙酯、（甲 基）丙烯酸2-羥基丁酯、（甲基）丙烯酸3-羥基丁酯、（甲基） 丙烯酸4-羥基丁酯、（甲基）丙烯酸烯丙酯、（甲基）丙烯酸 苄酯、（甲基）丙烯酸環己酯、（甲基）丙烯酸苯酯、（甲基） 丙烯酸2-甲氧基乙酯、（甲基）丙烯酸2-苯氧基乙酯、甲氧 • 基二甘醇（甲基）丙烯酸酯、甲氧基三甘醇（甲基）丙烯酸酯 、甲氧基丙二醇（甲基）丙烯酸酯、甲氧基二（甲基）丙烯酸 丙二醇酯、（甲基）丙烯酸異冰片酯、三環[5.2.1.02、6]癸 烷-8-基（甲基）丙烯酸酯、（甲基）丙烯酸2-羥基-3-苯氧基丙 酯及甘油單（甲基）丙烯酸酯：不飽和羧基胺基烷酯類如（甲 基）丙烯酸2-胺基乙酯、（甲基）丙烯酸2-二甲胺基乙酯、（ 甲基）丙烯酸2-胺基丙酯、2-二甲胺基（甲基）丙烯酸丙酯、 (甲基）丙烯酸3·胺基丙酯及3-二甲胺基（甲基）丙烯酸丙酯 :不飽和羧基甘油酯類如甘油基（甲基）丙烯酸酯；羧基乙 -15- (12) 1358611 . 烯酯類如乙酸乙烯酯 '丙酸乙烯酯、丁酸乙烯酯及苯甲酸 * 乙烯酯；不飽和醚類如乙烯基甲基醚、乙烯基乙醚及烯丙 '•基甘油基醚；乙烯基氰化物化合物如（甲基）丙烯腈、α -氯 .丙烯腈及亞乙烯基氰化物：不飽和醯胺如（甲基）丙烯醯胺 " 、α -氯丙烯醯胺及Ν-2·羥乙基（甲基）丙烯醯胺；脂肪族 共軛二烯如1,3-丁二烯、異戊間二烯及氯丁二烯；及在聚 合物分子鏈末端帶有單（甲基）丙烯醯基基團的巨單體如聚 φ 苯乙烯、聚（甲基）丙烯酸甲酯、聚·（甲基）丙烯酸正丁酯及 聚矽氧烷。 此類可共聚合的不飽和單體可單獨使用或以二或更多 者之摻合物使用。 作爲在本發明中含有羧基基團的共聚物，較佳者爲一 種共聚物（以下稱爲"含有羧基基團的共聚物（C1)")，其中 包含下列三種單體：（cl)含有羧基基團的不飽和單體含有（ 甲基）丙烯酸作爲實質上成分與視需要的單[2·(甲基）丙烯 • 醯基氧基艺基]琥珀酸酯及/或ω-羧基聚己內酯單（甲基）丙 烯酸酯’（c2)N-位置經取代的順式丁烯二醯亞胺及（c3)至 :少一種由下列各者所組成的類群所選出其它可共聚合的不 飽和單體：苯乙烯、α -甲基苯乙烯、對-羥基·α -甲基苯 乙烯，（甲基）丙烯酸甲酯、（甲基）丙烯酸正丁酯、（甲基） 丙烯酸2·乙基己酯、（甲基）丙烯酸2_羥乙酯、（甲基）丙烯 酸烯丙酯、（甲基）丙烯酸苄酯、甘油單（甲基）丙稀酸醋、 聚苯乙烯巨單體及聚甲基丙烯酸甲酯巨單體》 含有竣基基團的共聚物（C1)的較佳特定實施例包括：（ -16- (13) 1358611 ：甲基）丙烯酸/N'苯基順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯 ；酸苄酯共聚物、（甲基）丙烯酸/N•間羥基苯基順式丁烯二醯 *亞胺/苯乙烯/(甲基）丙烯酸苄酯共聚物、（甲基）丙烯酸/N-\對經基苯基順式丁燦二醯亞胺/苯乙烧/(甲基）丙煤酸节醋 共聚物、（甲基）丙烯酸/N-環己基順式丁烯二醯亞胺/苯乙 烯/(甲基）丙烯酸；酯共聚物、（甲基）丙烯酸/N_苯基順式丁 烯一醯亞胺/ 〇:.甲基苯乙烯/ (甲基）丙烯酸苄酯共聚物、（甲 Φ 基）丙烯酸/Ν·苯基順式丁烯二醯亞胺/苯乙烯:/(甲基）丙烯酸 正丁酯共聚物 '(甲基）丙烯酸/Ν_苯基順式丁烯二醯亞胺, 本乙嫌/(甲基）丙烯酸2 -乙基己酯共聚物、（甲基）丙烯酸 /Ν-苯基順式丁烯二醯亞胺/對-羥基-α -甲基苯乙烯/ (甲基） 丙烯酸苄酯共聚物、（甲基）丙烯酸/Ν_苯基順式丁烯二醯亞 胺/苯乙烯/(甲基）丙烯酸正丁酯共聚物、（甲基）丙烯酸/Ν. 苯基順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯酸2_乙基己醋 共聚物、（甲基）丙烯酸/Ν-苯基順式丁烯二醯亞胺/苯乙烯 # 甲基）丙烯酸2-羥乙酯/(甲基）丙烯酸苄酯共聚物、（甲基） 丙烯酸/Ν -苯基順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯酸苄 酯/甘油單（甲基）丙烯酸酯共聚物、（甲基）丙烯酸/Ν·對羥基 苯基順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯酸苄酯/甘油單（ 甲基）丙烯酸酯共聚物、（甲基）丙烯酸/Ν-苯基順式丁烯二 醯亞胺/苯乙烯/(甲基）丙烯酸苯酯/(甲基）丙烯酸2-羥乙酯/ 聚苯乙烯巨單體共聚物、（甲基）丙烯酸/Ν-苯基順式丁烯二 醯亞胺/苯乙烯/(甲基）丙烯酸苯酯/(甲基）丙烯酸2-羥乙酯/ 聚甲基丙烯酸甲酯巨單體共聚物、（甲基）丙烯酸/單[2-(甲 -17- (14) 1358611 . 基）丙烯醯基氧基乙基]琥珀酸酯/ N -苯基順式丁烯二醯亞 .胺/苯乙烯/(甲基）丙烯酸苄酯共聚物、（甲基）丙烯酸/單[2-( \ 甲基）丙烯醯基氧基乙基]琥珀酸酯/N-對羥基苯基順式丁烯 •二醯亞胺/苯乙烯/(甲基）丙烯酸苄酯共聚物、（甲基）丙烯酸 轟 /單[2-(甲基）丙烯醯基氧基乙基]琥珀酸酯/ N-苯基順式丁 烧二醯亞胺/苯乙烯/(甲基）丙烯酸烯丙酯共聚物、（甲基）丙 烯酸/單[2-(甲基）丙烯醯基氧基乙基]琥珀酸酯/N_環己基 φ 順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯酸烯丙酯共聚物，（ 甲基）丙烯酸/單[2-(甲基）丙烯醯基氧基.乙基]琥珀酸酯/ N-環己基順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯酸苄酯共聚 物、（甲基）丙烯酸/ ω-羧基聚己內酯單（甲基）丙烯酸酯/N-間羥基苯基順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯酸苄酯 共聚物、（甲基）丙烯酸/ ω·羧基聚己內酯單（甲基）丙烯酸酯 /Ν-對羥基苯基順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯酸苄 酯共聚物、（甲基）丙烯酸/ ω-羧基聚己內酯單（甲基）丙烯酸 # 酯/Ν·苯基順式丁烯二醯亞胺/苯乙烯/(甲基）丙烯酸笮酯/甘 油單（甲基）丙烯酸酯共聚物、及（甲基）丙烯酸/ ω-羧基聚己 內酯單（甲基）丙烯酸酯/Ν-對羥基苯基順式丁烯二醯亞胺/ 苯乙烯/(甲基）丙烯酸苄酯/甘油單（甲基）丙烯酸酯共聚物。 同時，除了含有羧基基團的共聚物（C1)之外的含有羧 基基團的共聚物之特定實施例包括：（甲基）丙烯酸/(甲基 )丙烯酸甲酯共聚物、（甲基）丙烯酸/(甲基）丙烯酸苄酯共聚 物、（甲基）丙烯酸/(甲基）丙烯酸2·羥乙酯/(甲基）丙烯酸苄 酯共聚物、（甲基）丙烯酸/(甲基）丙烯酸甲酯/聚苯乙烯巨單 -18- (15) 1358611 .體共聚物、（甲基）丙烯酸/(甲基）丙烯酸甲酯/聚甲基丙烯酸 ~ 甲酯巨單體共聚物、（甲基）丙烯酸/(甲基）丙烯酸苄酯/聚苯 乙烯巨單體共聚物、（甲基）丙烯酸/(甲基）丙烯酸苄酯/聚甲 基丙烯酸甲酯巨單體共聚物、（甲基）丙烯酸/(甲基）丙烯酸 • 2-羥乙酯/(甲基）丙烯酸苄酯/聚苯乙烯巨單體共聚物、及（ 甲基）丙烯酸/(甲基）丙烯酸2-羥乙酯/(甲基）丙烯酸苄酯/聚 甲基丙烯酸甲酯巨單體共聚物。 φ 在含有羧基基團的共聚物中，被共聚合之含有羧基基 團的不飽和單體之含量宜在5至50 wt%，更佳爲1〇至40 wt%。在此案例中，當共聚合量小於5 wt°/〇，所得到的轄 射敏感性組合物在鹼性顯影劑中之溶解度易於劣化，而當 含量大於50 wt%，在鹼性顯影劑中的溶解度變得太高， 而於使用鹼性顯影劑的顯影期間，易於發生像素自基材上 脫落或像素有粗糙的表面。 經由凝膠滲透層析法（GPC，沖提溶劑：四氫呋喃）所 % 測量鹼可溶的樹脂之Mw宜在3,000至300,000，更佳爲 5,000 Μ 100,000 〇 同時，經由凝膠滲透層析法（GPC，沖提溶劑：四氫呋 喃）所測量鹼可溶的樹脂宜之Μη在3，000至60,000，更佳 爲 5,000 至 25,000 。 此外，驗可溶的樹脂之Mw對Μη的比例（Mw/Mn) 宜在1至5，更佳爲1至4。 本發明中，經由使用具有該特定Mw及Μη的鹼可溶 的樹脂，可得到具有卓越顯影性的輻射敏感性組合物，從 -19- (16) 1358611 . 而可形成其具有鮮明圖案邊緣的像素圖案，且保持在基質 " 上未曝光部分與當顯影時在阻光層上較不會發生殘餘物， ~ 浮渣、膜及其類似者。 •本發明中，鹼可溶的樹脂可單獨使用或以二或更多者 * 之摻合物使用。 本發明中，鹼可溶的樹脂含量宜在10至1,000重量 份，更佳爲20至5 00重量份，此係以1〇〇重量份的顏料 φ (A)計。在此案例中，當鹼可溶的樹脂含量小於10重量份 ，則鹼顯影性可能會例如劣化或可能發生浮渣，或膜可能 留在基質上未曝光部分與阻光層上。同時，當含量大於 1 ,.〇 〇 〇重量份時，顔料之濃度相對地減低’而使得可能變 得難於達成作爲薄膜所需要之色彩濃度。 -(D)多官能基單體- 在本發明中的多官能基單體爲具有二或更多可聚合不 # 飽和鍵結之單體。 多官能基單體的說明性實施例包括： 伸烷基二醇如乙二醇或丙二醇的二（甲基）丙烯酸酯； 聚伸烷基二醇如聚乙二醇或聚丙二醇的二（甲基）丙烯 酸酯； 具有三或更多羥基基團的多元醇如甘油、三羥甲基丙 烷、季戊四醇或二季戊四醇之聚（甲基）丙烯酸酯，及經由 二羧酸改良的聚（甲基）丙烯酸酯： 寡（甲基）丙烯酸酯如聚酯、環氧樹脂’胺基甲酸酯樹 -20- (17) 1358611 . 脂、醇酸樹脂、矽酮樹脂或螺烷樹脂； 兩端羥基化聚合物如兩端羥基聚-1,3-丁二烯、兩端羥 ~ 基聚異戊間二烯或兩端羥基聚己內酯的的二（甲基）丙烯酸 •酯；及 * 三[2-(甲基）丙烯醯基氧基乙基]磷酸酯。 在此類多官能基單體之中，較佳爲具有三或更多羥基 基團的多元醇之聚（甲基）丙烯酸酯及經由二羧酸改良的聚（ φ 甲基）丙烯酸酯，即三（甲基）丙烯酸三羥甲基丙烷酯、三（ 甲基）丙烯酸季戊四醇酯、四（甲基）丙烯酸季戊四醇酯、五 (甲基）丙烯酸二季戊四醇酯、六（甲基）丙烯酸二季戊四醇 醋及其類似者。特別較佳爲三羥甲基丙烷三丙烯酸酯、三 丙烯酸季戊四醇酯及六丙烯酸二季戊四醇酯，因爲像素具 有卓越的強度與表面平滑度，且因爲浮渣難以發生且膜難 以保持在基材未曝光部分上與阻光層上。 上述多官能基單體可單獨使用或以二或更多者之摻合 .· ^ 物使用。 本發明中，多官能基單體用量宜在5至500重量份， 更佳爲20至300重量份’此係基於1〇〇重量份的鹼可溶 的樹脂（C)計。在此案例中，當多官能基單體含量小於5 重量份時，像素的強度及表面平滑度會易於劣化，而當其 大於500重量份時，鹼顯影性易於劣化或浮渣易於發生或 膜易於留在基材未曝光部分上與阻光層上。 此外，在本發明中，可用帶有一個可聚合的不飽和鍵 結之單官能基單體取代部分的多官能基單體。 -21 - (18) 」 1358611 .上述單官能基單體之說明性實施例包括相同的含有羧 基基團的不飽和單體與如那些針對鹼可溶的樹脂（C)舉例 '的可共聚合的不飽和單體、N-(甲基）丙烯醯基嗎福啉、N-乙烯基吡咯烷酮、N -乙烯基-e-己內醯胺、及商業產物如 φ 商品名 M-5600(Toag〇sei公司之產物）。 此類單官能基單體可單獨使用或以二或更多者之摻合 物使用。 本發明中，單官能基單體用量較佳不大於90 wt°/。， 更佳不大於50 wt%，此係基於多官能基單體與單官能基 單體的總量計。在此案例中，當單官能基單體的含量大於 9 0 wt%，則像素的強度及表面平滑度可能變得令人不滿意 的。 本發明中，多官能基單體與單官能基單體的總量宜在 5至500重量份，更佳.爲20至3 00重量份，此係基於100 重量份的鹼可溶的樹脂（C)計。在此案例中，例如，當此 # 總量小於5重量份，則像素的強度及表面平滑度會易於劣 化’而當其大於5 00重量份，則鹼顯影性易於劣化或浮渣 易於發生或膜易於留在基材未曝光部分上與阻光層上。 -(E)光聚合起始劑_ 在本發明中的光聚合起始劑，爲經由曝光於輻射線如 可見光’紫外線照射，遠紫外線照射，電子束或χ_射線 能產生活化的物種化合物，此活化的物種可起始上述多官 能基單體（D)的聚合，且可起始在—些案例中使用的單官 -22- (19) 1358611 . 能基單體。 . 該光聚合起始劑的說明性實施例包括乙醯苯酮爲主的 • 化合物、二咪唑爲主的化合物、三嗪爲主的化合物 '二苯 •乙二酮爲主的化合物、苯甲酮爲主的化合物' α-二酮爲 m 主的化合物、多環（聚核）·醌爲主的化合物、兩苯駢辰嘮爲 主的化合物、及重氮基爲主的化合物。 本發明中’光聚合起始劑可單獨使用或以二或更多者 φ 之摻合物使用。作爲在本發明中的光聚合起始劑，較佳爲 由下列各者所組成的類群中所選出的至少一種：乙醯苯酮 爲主的化合物、二咪唑爲主的化合物及三嗪爲主的化合物 〇 在本發明較佳的光聚合起始劑中，乙醯苯酮爲主的化 合物之特定實施例包括2-羥基-2-甲基-1-苯基丙酮-〗，2·甲 基-1-(.4-甲基_吩基）-2-嗎福啉基丙酮_1，2-卡基-2-二甲胺 基-1-(4-嗎福啉基苯基）丁酮-i，i-羥基環己基·苯基酮，及 • 2,2-二甲氧基-1，2-聯苯基乙酮-1。 在此類乙醯苯酮爲主的化合物之中，特別較佳爲2_甲 基-1-(4 -甲基噻吩基）-2 -嗎福啉基丙酮·ι，2-;基-2-二甲胺 基·1·(4 -嗎福琳基苯基）丁嗣·1〇 上述乙醯苯酮爲主的化合物可單獨使用或以二或更多 者之摻合物使用。 本發明中’當以乙醯苯酮爲主的化合物用作爲光聚合 起始劑’其含量宜在〇·〇1至100重量份，更佳爲1至80 重量份，又更佳者在5至60重量份，此係基於1〇〇重量Wt%, based on the total amount of the acrylic dispersant (B1) and other dispersants. In this case, when the other dispersant content is more than 75 wt%, it may not be possible to ensure a good balance between developability, surface smoothness and storage stability. a The content of the acrylic dispersant (B1) (in terms of solid content) in the present invention is preferably from 1 to 50 parts by weight, more preferably from 3 to 30 parts by weight, based on 1 part by weight of the pigment (A) meter. In this case, when the content of the acrylic-based dispersant φ (B1) is less than 1 part by weight, the storage stability of the resulting composition is liable to be deteriorated, and when it is more than 50 parts by weight, the residue is liable to remain on the substrate. . - (C) alkali-soluble resin - The alkali-soluble resin in the present invention is not particularly limited as long as it acts on the pigment (A) as an adhesive and has a solubility in the developer' The basic φ toner used in the development of the color filter development step. In all of the above, an alkali-soluble resin having a carboxyl group is preferred, and particularly preferably an ethylenically unsatgrated mononer having at least one carboxyl group in the molecule (hereinafter referred to as Copolymer of "carboxyl group-containing unsaturated monomer '·) with other copolymerizable ethylenically unsaturated monomer (hereinafter referred to as copolymerizable unsaturated monomer ") It is referred to as "carboxyl group-containing copolymer". An illustrative example of a carboxyl group-containing unsaturated monomer includes: an unsaturated monocarboxylic acid such as (meth)acrylic acid, crotonic acid, alpha-chloroacrylic acid, and Cinnamate: -13- 1358611 Anhydrous acid citric acid dihydrogenated distillate, cis, liver acid acid dipentene, Udine solution, such as, liver acid, head or uric acid, decarboxylation, and acid 0) saturating Non-butene reverse' distillation of citric acid anhydride and methyl fumaric acid; unsaturated polycarboxylic acid having three or more carboxyl groups or its anhydride: * polycarboxylic acid having two or more carboxyl groups Single [(methyl) propylene decyloxyalkyl] Such as succinic acid mono [2-(methyl) propylene decyloxyethyl ester] and decanoic acid mono [2-(methyl) propylene decyloxyethyl] ester: φ and carboxyl groups at both ends Mono (meth) acrylate of a polymer with a hydroxyl group such as ω-carboxypolycaprolactone mono(meth) acrylate. Among such unsaturated groups containing a carboxyl group, single (2- Acrylyloxyethyl) phthalate is commercially available under the trade name of Μ-5400 (product of Toagosei). The above carboxyl group-containing unsaturated monomer may be used alone or in two or more. The blends are used. Meanwhile, illustrative examples of copolymerizable unsaturated monomers include: # cis butadiene imine; N-position substituted cis-butenedimide such as N- Phenyl cis-butenylene imine, N-o-hydroxyphenyl cis-butenylene imine 'N-m-hydroxyphenyl cis-butenylene diimide, N-p-hydroxyphenyl cis-butyl Equinone imine, N-benzyl cis-butenylene imine 'N-cyclohexyl cis-butenylene diimide, N-succinimide-3-cis-butenylene diimide benzene Formate ' N-succinimide-4- Butene diimide butyrate, N-sodium sulphate _ imine-6-cis butyl sulphate - brewed imine hexanoic acid vinegar 'N - smelt imine - 3-cis butadiene Aminopropionate and N-(propylenediyl)cis-butenediamine: an aromatic vinyl compound such as styrene, α-methylstyrene, o-ethyl-14-(11) 1358611. Toluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene%, p-hydroxyl Styrene, o-vinyl aryl methyl ether, m-ethyl enyl benzyl methyl ether, p-vinylbenzyl methyl ether, o-vinyl benzyl glyceryl ether, m- Vinyl benzyl glyceryl ether and p-vinyl benzyl glyceryl ether; terpenes such as decene and 1-methyl decene; unsaturated carboxylic acid esters such as methyl (meth) acrylate, (methyl Ethyl acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate (isobutyl methacrylate), dibutyl (meth) acrylate Ester, third (meth)acrylate Ester, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, (methyl) ) 2-hydroxybutyl acrylate, 3-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, (methyl) Cyclohexyl acrylate, phenyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, methoxy diglycol (methyl) Acrylate, methoxytriethylene glycol (meth) acrylate, methoxypropylene glycol (meth) acrylate, propylene di(meth) acrylate, isobornyl (meth) acrylate, three Ring [5.2.1.02, 6] decane-8-yl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate and glycerol mono (meth) acrylate: unsaturated carboxyl group Aminoalkyl esters such as 2-aminoethyl (meth)acrylate, 2-dimethylaminoethyl (meth)acrylate, 2-aminopropyl (meth)acrylate , 2-dimethylaminopropyl (meth) acrylate, (meth)acrylic acid 3 · aminopropyl acrylate and 3-dimethylamino ( meth) acrylate : unsaturated carboxy glycerides such as glyceryl (Meth) acrylate; carboxyethyl-15-(12) 1358611. Esters such as vinyl acetate 'vinyl propionate, vinyl butyrate and benzoic acid* vinyl ester; unsaturated ethers such as vinyl methyl Ether, vinyl ethyl ether and allyl glyceryl ether; vinyl cyanide compounds such as (meth)acrylonitrile, α-chloro.acrylonitrile and vinylidene cyanide: unsaturated guanamine such as (methyl) Acrylamide ", α-chloropropenylamine and Ν-2·hydroxyethyl(meth)acrylamide; aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chlorine Butadiene; and macromonomers having a mono(meth)acrylinyl group at the end of the polymer molecular chain, such as polyφ styrene, poly(methyl) methacrylate, poly(meth)acrylic acid Butyl ester and polyoxyalkylene. Such copolymerizable unsaturated monomers may be used singly or in combination of two or more. The copolymer containing a carboxyl group in the present invention is preferably a copolymer (hereinafter referred to as "carboxyl group-containing copolymer (C1)"), which comprises the following three monomers: (cl) The unsaturated group containing a carboxyl group contains (meth)acrylic acid as a substantial component and, if necessary, a mono[2.(methyl)propenyl fluorenyloxy] succinate and/or an ω-carboxy group. Caprolactone mono(meth)acrylate '(c2) N-position substituted cis-butenedimide and (c3) to: less one of the following groups selected for other copolymerizable Unsaturated monomers: styrene, α-methylstyrene, p-hydroxy·α-methylstyrene, methyl (meth)acrylate, n-butyl (meth)acrylate, (meth)acrylic acid 2 · Ethylhexyl ester, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, glycerol mono (meth) acrylate vinegar, polystyrene giant Preferred specific examples of the thiol group-containing copolymer (C1) include: ( -16- (13) 1358611 : Methyl acrylate / N' phenyl cis - butylene diimide / styrene / (meth) propylene; benzyl acrylate copolymer, (meth) acrylate / N • m-Hydroxyphenyl cis-butenylene*imide/styrene/benzyl (meth)acrylate copolymer, (meth)acrylic acid/N-\p-phenylphenylcis-butane diimide/ Benzene bromide / (methyl) propionic acid vinegar copolymer, (meth)acrylic acid / N-cyclohexyl cis-butenylene diimide / styrene / (meth) acrylic acid; ester copolymer, (A Acrylic acid/N-phenyl cis-butene-imine / oxime: methyl styrene / benzyl (meth) acrylate copolymer, (meth) acrylate / hydrazine phenyl cis-butene Diimine/styrene: /(meth)acrylic acid n-butyl ester copolymer '(meth)acrylic acid / hydrazine _ phenyl cis-butenylene diimide, this B / (meth) acrylic acid 2 - Ethylhexyl ester copolymer, (meth)acrylic acid / fluorene-phenyl cis-butenylene imide / p-hydroxy-α-methyl styrene / benzyl (meth) acrylate copolymer, (methyl Acrylic acid/Ν-phenyl cis-butenylene diimide/styrene/(A) ) n-butyl acrylate copolymer, (meth)acrylic acid / hydrazine. phenyl cis-butenylene imide / styrene / (meth) acrylic acid 2-ethylhexyl vinegar copolymer, (meth) acrylic acid / Ν-phenyl cis-butenylene imide / styrene # methyl) 2-hydroxyethyl acrylate / benzyl (meth) acrylate copolymer, (meth) acrylate / hydrazine - phenyl cis-butene Diimine / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer, (meth) acrylate / hydrazine / p-hydroxyphenyl cis - butylene diimide / styrene Benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer, (meth) acrylate / Ν - phenyl cis - butylene diimide / styrene / phenyl (meth) acrylate / 2-Hydroxyethyl (meth)acrylate / polystyrene macromonomer copolymer, (meth)acrylic acid / fluorene-phenyl cis-butenylene imide / styrene / phenyl (meth) acrylate / 2-Hydroxyethyl (meth)acrylate / Polymethyl methacrylate macromonomer copolymer, (meth)acrylic acid / mono [2-(methyl-17-(14) 1358611.yl) propylene decyloxy Ethyl] succinate / N -Phenylcis butylenediamine.Amine/styrene/benzyl (meth)acrylate copolymer, (meth)acrylic acid/mono[2-(\methyl)propenyloxyethyl]amber Acid ester / N-p-hydroxyphenyl cis-butene dioxin / styrene / benzyl (meth) acrylate copolymer, (meth) acrylonitrile / single [2- (meth) acrylonitrile Oxyethyl]succinate / N-phenyl cis-butadiene diimine / styrene / allyl (meth) acrylate copolymer, (meth) acrylic acid / single [2- (methyl) Propylene decyloxyethyl] succinate / N_cyclohexyl φ cis-butenediamine / styrene / allyl (meth) acrylate copolymer, (meth) acrylate / single [2- (Meth) propylene decyloxy.ethyl] succinate / N-cyclohexyl cis-butenylene diimide / styrene / benzyl (meth) acrylate copolymer, (meth) acrylic acid / ω -carboxypolycaprolactone mono(meth)acrylate/N-m-hydroxyphenylcis-butenylenediamine/styrene/benzyl (meth)acrylate copolymer, (meth)acrylic acid / ω· Carboxy polycaprolactone mono(meth)acrylate/Ν-p-hydroxybenzene Cis-butenylene diimide/styrene/benzyl (meth)acrylate copolymer, (meth)acrylic acid/ω-carboxypolycaprolactone mono(meth)acrylic acid #ester/Ν·phenyl cis Butylenediamine/styrene/decyl (meth)acrylate/glycerol mono(meth)acrylate copolymer, and (meth)acrylic acid/ω-carboxypolycaprolactone mono(meth)acrylic acid Ester / hydrazine - p-hydroxyphenyl cis - butylene diimide / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer. Meanwhile, specific examples of the carboxyl group-containing copolymer other than the carboxyl group-containing copolymer (C1) include: (meth)acrylic acid/methyl (meth)acrylate copolymer, (meth)acrylic acid Benzyl (meth) acrylate copolymer, (meth)acrylic acid / 2 hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer, (meth) acrylate / (meth) acrylate Ester/polystyrene giant -18- (15) 1358611. bulk copolymer, (meth)acrylic acid / methyl (meth) acrylate / polymethyl methacrylate ~ methyl ester macromonomer copolymer, (methyl) Acrylic acid/benzyl (meth)acrylate/polystyrene macromonomer copolymer, (meth)acrylic acid/benzyl (meth)acrylate/polymethylmethacrylate macromonomer copolymer, (meth)acrylic acid /(Meth)acrylic acid• 2-Hydroxyethyl ester/Benzyl (meth)acrylate/polystyrene macromonomer copolymer, and (meth)acrylic acid/2-hydroxyethyl (meth)acrylate/(A) Benzyl acrylate/polymethyl methacrylate macromonomer copolymer. φ In the copolymer having a carboxyl group, the content of the copolymerizable carboxyl group-containing unsaturated monomer is preferably from 5 to 50% by weight, more preferably from 1 to 40% by weight. In this case, when the amount of copolymerization is less than 5 wt ° / Torr, the solubility of the resulting susceptibility-sensitive composition in an alkali developer is apt to deteriorate, and when the content is more than 50 wt%, in an alkaline developer The solubility becomes too high, and during development using an alkali developer, it is apt to occur that the pixel is detached from the substrate or the surface of the pixel is rough. The Mw of the alkali-soluble resin measured by gel permeation chromatography (GPC, solvent: tetrahydrofuran) is preferably 3,000 to 300,000, more preferably 5,000 Μ 100,000 〇 while passing through gel permeation chromatography (GPC) The solvent-soluble solvent: tetrahydrofuran) is preferably an alkali-soluble resin of from 3,000 to 60,000, more preferably from 5,000 to 25,000. Further, the ratio of Mw to Μη (Mw/Mn) of the soluble resin is preferably from 1 to 5, more preferably from 1 to 4. In the present invention, a radiation-sensitive composition having excellent developability can be obtained by using an alkali-soluble resin having the specific Mw and Μη, from -19-(16) 1358611. It can be formed with a sharp pattern edge. The pixel pattern is maintained on the substrate " unexposed portions and less residue on the light blocking layer when developing, ~ scum, film and the like. • In the present invention, the alkali-soluble resin may be used singly or as a blend of two or more. In the present invention, the alkali-soluble resin is preferably contained in an amount of from 10 to 1,000 parts by weight, more preferably from 20 to 500 parts by weight, based on 1 part by weight of the pigment φ (A). In this case, when the alkali-soluble resin content is less than 10 parts by weight, the alkali developability may be deteriorated or scum may occur, for example, or the film may remain on the unexposed portion and the light-blocking layer on the substrate. Meanwhile, when the content is more than 1, 〇 〇 〇 by weight, the concentration of the pigment is relatively lowered', which makes it difficult to achieve the color density required as a film. - (D) Polyfunctional Monomer - The polyfunctional monomer in the present invention is a monomer having two or more polymerizable non-saturation bonds. Illustrative examples of polyfunctional monomers include: dialkyl (meth) acrylates such as ethylene glycol or propylene glycol; polyalkylene glycols such as polyethylene glycol or polypropylene glycol Acrylate; poly(meth) acrylate having three or more hydroxyl groups such as glycerol, trimethylolpropane, pentaerythritol or dipentaerythritol, and poly(methyl) modified via dicarboxylic acid Acrylate: oligo(meth)acrylate such as polyester, epoxy resin 'urethane tree-20- (17) 1358611. Lipid, alkyd resin, anthrone resin or spiro resin; hydroxylated at both ends a polymer such as a hydroxy-1,3-1,3-butadiene, a hydroxy-polyisoprene or a hydroxy-caprolactone-terminated di(meth)acrylic acid ester; and *3 [ 2-(Meth)acryloyloxyethyl]phosphate. Among such polyfunctional monomers, poly(meth)acrylates of polyhydric alcohols having three or more hydroxyl groups and poly(φ-methyl)acrylates modified via dicarboxylic acids are preferred. Trimethylolpropane tris(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate And similar. Particularly preferred are trimethylolpropane triacrylate, pentaerythritol triacrylate and dipentaerythritol hexaacrylate because the pixel has excellent strength and surface smoothness, and because the scum is difficult to occur and the film is difficult to maintain on the substrate without exposure. Partially on the light barrier layer. The above polyfunctional monomers may be used singly or in combination of two or more. In the present invention, the amount of the polyfunctional monomer is preferably from 5 to 500 parts by weight, more preferably from 20 to 300 parts by weight based on 1 part by weight of the alkali-soluble resin (C). In this case, when the content of the polyfunctional monomer is less than 5 parts by weight, the strength and surface smoothness of the pixel are liable to be deteriorated, and when it is more than 500 parts by weight, alkali developability is liable to be deteriorated or scum is liable to occur or film It is easy to remain on the unexposed portion of the substrate and on the light blocking layer. Further, in the present invention, a part of the polyfunctional monomer may be substituted with a monofunctional monomer having a polymerizable unsaturated bond. -21 - (18) ” 1358611. Illustrative examples of the above monofunctional monomer include the same copolymerizable monomer containing a carboxyl group and copolymerizable with, for example, those which are exemplified for the alkali-soluble resin (C) Unsaturated monomer, N-(meth) propylene decyl porphyrin, N-vinyl pyrrolidone, N-vinyl-e-caprolactam, and commercial products such as φ trade name M-5600 (Toag〇 The product of sei company). Such monofunctional monomers may be used singly or as a blend of two or more. In the present invention, the amount of the monofunctional monomer is preferably not more than 90 wt ° /. More preferably, it is not more than 50% by weight based on the total amount of the polyfunctional monomer and the monofunctional monomer. In this case, when the content of the monofunctional monomer is more than 90% by weight, the strength and surface smoothness of the pixel may become unsatisfactory. In the present invention, the total amount of the polyfunctional monomer and the monofunctional monomer is preferably from 5 to 500 parts by weight, more preferably from 20 to 300 parts by weight, based on 100 parts by weight of the alkali-soluble resin ( C) meter. In this case, for example, when the total amount of this # is less than 5 parts by weight, the strength and surface smoothness of the pixel may be easily deteriorated', and when it is more than 500 parts by weight, the alkali developability is liable to be deteriorated or scum is liable to occur or The film tends to remain on the unexposed portion of the substrate and on the light blocking layer. - (E) Photopolymerization initiator - a photopolymerization initiator in the present invention, which is a compound of a species which is activated by exposure to radiation such as visible light ultraviolet rays, far ultraviolet rays, electron beams or x-rays, This activated species can initiate the polymerization of the above polyfunctional monomer (D) and can be used in the case of the mono--22-(19) 1358611. Illustrative examples of the photopolymerization initiator include a benzophenone-based compound, a diimidazole-based compound, a triazine-based compound, a diphenyl-ethanedione-based compound, and a benzoic acid. The ketone-based compound 'α-diketone is a m-based compound, a polycyclic (polynuclear)·quinone-based compound, a dibenzoquinone-based compound, and a diazo-based compound. The "photopolymerization initiator" in the present invention may be used singly or as a blend of two or more φ. The photopolymerization initiator in the present invention is preferably at least one selected from the group consisting of acetophenone-based compounds, diimidazole-based compounds, and triazine-based compounds. In the preferred photopolymerization initiator of the present invention, specific examples of the acetophenone-based compound include 2-hydroxy-2-methyl-1-phenylacetone-, 2·methyl -1-(.4-methyl-phenyl)-2-morpholine acetone_1,2-carbyl-2-dimethylamino-1-(4-morpholinophenyl)butanone -i,i-hydroxycyclohexyl phenyl ketone, and • 2,2-dimethoxy-1,2-biphenylethanone-1. Among such acetophenone-based compounds, 2-methyl-1-(4-methylthienyl)-2-morpholinylacetone·ι,2-; - Dimethylamino 1 (4-norfosylphenyl) butyl hydrazine 1 〇 The above acetophenone-based compound may be used singly or as a blend of two or more. In the present invention, 'when acetophenone-based compound is used as a photopolymerization initiator', the content thereof is preferably from 1 to 100 parts by weight, more preferably from 1 to 80 parts by weight, still more preferably from 5 to 5 parts by weight. Up to 60 parts by weight, based on 1 weight

-23- (20) 1358611 • 份之多官能基單體（D)與單官能基單體的總量計。在此案 . 例中’當乙醯苯酮爲主的化合物之含量小於〇.〇1重量份 ’經由曝光的熟化會不充分’而使可能將難以得到其中像 ' 素圖案依據一項給予排列而安排的彩色層，而當含量大於 100重量份，當顯影時所形成的像素會易於自基材上脫落 〇 此外，上述二咪唑爲主的化合物的特定實施例包括 • 2,2'-雙（2-氯苯基）-4,4’，5,5|-四（4-乙氧基羰基苯基）-1，2，-二 咪唑’ 2,2’ -雙（2 -溴苯基）-4,4'，5,5’ -四（4 -乙氧基羰基苯基）-1，2·-二咪唑、2,2’-雙（2-氯苯基）-4,4·，5,5·-四苯基-1，2、二 咪唑 ’ 2,2’-雙（2,4·二氯苯基）-4,4’，5,5·-四苯基-1，2，-二咪 唑，2,2’-雙（2,4,6-三氯苯基）-4,4'，5,5’-四苯基-1，2，-二咪唑 、2,2'-雙（2-溴苯基）-4,4·，5,5'-四苯基-1,2·-二咪唑，2,2、 雙（2,4-二溴苯基）·4,4ΐ，5,5'·四苯基-1，2'-二咪唑，及 2,2’-雙（2,4,6-三溴苯基）-4,4'，5,5、四苯基-1，2'-二咪唑。 φ 在此類二咪唑爲主的化合物之中，2,2’-雙（2-氯苯基）- 4,4’，5,5·-四苯基-1，2’-二咪唑、2,2·-雙（2,4-二氯苯基）-4,4’，5,5'-四苯基-1，2·-二咪唑、及2,2'-雙（2,4,6-三氯苯基）-4,4'，5,5’-四苯基-1，2'-二咪唑係更佳的，且特別較佳爲 2,2'-雙（2,4-二氯苯基）-4,4'，5,5'-四苯基-1，2|-二咪唑。 上述二咪唑爲主的化合物在溶劑之中具有卓越的溶解 度，不會有外來物質如未溶解物質及沈澱物，其具有高敏 感性，可經由低能量曝光進行完全的熟化反應，且在未曝 光部分不發生熟化反應。據此’於曝光之後’塗覆膜淸楚 -24- (21) 1358611 - 地分爲在顯影劑之中不溶的熟化部分，及在顯影劑之中具 . 有高溶解度之未熟化其部分，從而可形成依據一項給予排 列所安排的不含切去下部（undercut)像素圖案之高淸晰度 • 彩色層。 * 上述二咪唑爲主的化合物可單獨使用或以二或更多者 之摻合物使用。 本發明中’當二咪唑爲主的化合物用作爲光聚合起始 φ 劑’其含量宜在〇·〇1至40重量份，更佳爲1至30重量 份’又更佳者在1至20重量份，此係基於100重量份之 多官能基單體（D)與單官能基單體的總量計。在此案例中 ，當二咪唑爲主的化合物含量小於0 · 0 1重量份，經由曝 光的熟化會不充分，而使可能將難以得到其中像素圖案依 據一項給予排列而安排的彩色層，而當其大於40重量份 ，當顯影時所形成的像素會易於自基材上脫落。 Φ -氫氣供體· 本發明中，當二咪唑爲主的化合物用作爲光聚合起始 :劑’宜用以下氫供體與二咪唑爲主的化合物合倂使用，因 爲可進一步的改良敏感性。 如在此使用的術語||氫供體"意指可提供一個氫原子的 化合物，將氫原子提供予經由咪唑爲主的化合物曝光所產 生的自由基。 作爲在本發明中的氫供體，較佳爲如下定義的硫醇爲 主的化合物及胺爲主的化合物。 -25- (22) 1358611 上述硫醇爲主的化合物（以下稱爲"硫醇爲主的氫供 體"）爲包含苯環或雜環作爲主核，且有至少一個，宜有1 至3，更佳有1或2個氫硫基基團直接鍵結至主核上的化 .合物β * 此外，上述胺爲主的化合物（以下稱爲"胺爲主的氫 供體"），包含苯環或雜環作爲主核，且有至少一個，宜有 1至3，更佳有1或2個胺基直接鍵結至主核上的化合物 此類氫供體可同時帶有氫硫基基團及胺基。 以下，將進一步記述此類氫供體。 此硫醇爲主的氫供體可帶有一或更多苯環或一或更多 雜環基的環。此外，其可帶有苯環與雜環兩者。當其帶有 二或更多的此類環，可形成或不能形成稠環。 此外，在一項案例中當硫醇爲主的氫供體具有二或更 多氫硫基基團，只要至少保持一個自由氫硫基基團，一或 φ 更多的殘留的氫硫基基團可經取代爲烷基、芳烷基或芳基 基團，且只要至少保持一個自由氫硫基基團，其結構單元 中可有二種硫原子以二價有機基團如伸烷基基團相互鍵結 ，或其結構單元中有二個硫原子呈二硫化物的形式而相互 鍵結》 此外，此硫醇爲主的氫供體，在除了氫硫基基團之外 的位點可經取代爲羧基基團、烷氧基羰基基團、經取代的 烷氧基羰基基團、苯氧基羰基基團、經取代的苯氧基羰基 基團、腈基團或其類似者。 -26- (23) 1358611 . 該硫醇爲主的氫供體之特定實施例包括2-氫硫基苯并 噻唑、2 -氫硫基苯并噚唑、2 -氫硫基苯并咪唑、2,5 -二氫 " 硫基-1,3,4-噻二氮唑，及2-氫硫基-2,5-二甲胺基吡啶。 • 在此類硫醇爲主的氫供體之中’較佳爲2-氫硫基苯并 * 噻唑及2-氫硫基苯并哼唑較佳爲，且特別較佳爲氫硫基 苯并噻唑。 胺爲主的氫供體可帶有一或更多苯環或一或更多雜環基的 φ 環。此外，其可帶有苯環與雜環兩者。當其帶有二或更多 的此類環，可形成稠環或不能形成稠環。 此外，胺爲主的氫供體之一或更多胺基可經取代爲烷 基基團或經取代的烷基基團。此外，於除了胺基位點之外 的胺爲主的氫供體，可經取代爲羧基基團、烷氧基羰基基 團、經取代的烷氧基羰基基團、苯氧基羰基基團、經取代 的苯氧基羰基基團、腈基團或其類似者。 該胺爲主的氫供體的特定實施例包含4,4'-雙（二甲胺 • 基）苯甲酮、4,4’-雙（二乙胺基）苯甲酮、4-二乙胺基乙醯苯 酮、4-二甲胺基苯丙酮、乙基-4_二甲胺基苯甲酸鹽、4-二 甲胺基苯甲酸，及4-二甲胺基苯腈。 在此類之中胺爲主的氫供體，宜爲4,4·-雙（二甲胺基） 苯甲酮及4,4·-雙（二乙胺基）苯甲酮，且特別較佳者爲4,4i_ 雙（二乙胺基）苯甲酮。 胺爲主的氫供體可作爲敏化劑，甚至當使用除了二咪 唑爲主的化合物種之外的光聚合起始劑。 本發明中’氫供體可單獨使用或以二或更多者之摻合 -27- (24) 1358611 . 物使用。較佳合倂使用一或更多硫醇爲主的氫供體及一或 更多胺爲主的氫供體，因爲當顯影時所形成的像素難以自 基材上脫落’且像素有高的強度及敏感性。 •較佳的硫醇爲主的氫供體與胺爲主的氫供體之組合的 φ 特定實施例包括2-氫硫基苯并噻唑/4,4·-雙（二甲胺基）苯甲 .酮’ 2_氫硫基苯并噻唑M，4’-雙（二乙胺基）苯甲酮、2-氫硫 基苯并哼唑/4,4'-雙（二甲胺基）苯甲酮、及2·氫硫基苯并哼 φ 唑/4,4'·雙（二乙胺基）苯甲酮。更佳者組合爲2-氫硫基苯并 噻唑/4,4'-雙（二乙胺基）苯甲酮及2-氫硫基苯并噚唑/4,4，· 雙（二乙胺基）苯甲酮。特別較佳的組合爲2-氫硫基苯并噻 唑/4,4'·雙（二乙胺基）苯甲酮。在一項硫醇爲主的氫供體與 胺爲主的氫供體組合物之中，硫醇爲主的氫供體對胺爲主 的氫供體重量比宜在1:1至1:4，更佳爲1:1至1:3 〇 本發明中，當氫供體與二咪唑爲主的化合物合倂使用 # ，其含量宜在〇·〇1至40重量份，更佳爲1至30重量份 ’特別宜爲1至20重量份，此係基於100重量份之多官 能基單體（D)與單官能基單體的總量計。在此案例中，當 含量氫供體小於0.01重量份，改進敏感性之效應將易於 劣化，而當其大於40重量份，當顯影時所形成的像素會 易於自基材上脫落。 此外，上述三嗪爲主的化合物之特定實施例包括具有 鹵甲基基團的三嗪爲主之化合物，如2,4,6-三（三氯甲基）-s-三嗪、2-甲基-4,6-雙（三氯甲基）-s_三嗪、2-[2-(5-甲基呋 -28- (25) 1358611 ‘ 喃-2-基）乙烧基]-4,6 -雙（三氯甲基）-s-三嗪、2-[2-(咲喃- 2- . 基）乙烧基]-4,6-雙（三氯甲基）-3-三嗪、2-[2-(4-二乙胺基- 2 -甲基苯基）乙稀基]-4,6-雙（三氯甲基）-s·三嗪、2-[2-(3,4· •二甲氧基苯基）乙烯基]-4,6-雙（三氯甲基）_s_三嘻、2_(4_甲 參 氧基苯基）-4,6-雙（三氯甲基）-s-三嗪、2-(4 -乙氧基苯乙烯 基）-4,6-雙（三氯甲基）-s-三嗪、及2-(4-正丁氧基苯基）-4,6-雙（三氯甲基）-s-三嗪。 • 在此類三嗪爲主的化合物之中，2-[2-(3,4 -二甲氧基苯 基）乙焼基]-4,6 -雙（二氯甲基）-s -三嗪爲特別較佳者爲。 上述三嗪爲主的化合物可單獨使用或以二或更多者之 摻合物使用。 本發明中’當三嗪爲主的化合物用作爲光聚合起始劑 ’其含量宜在0.01至40重量份，更佳爲丨至3〇重量份 ’大幅更佳在1至20重量份，此係基於1〇〇重量份的多 官能基單體（D)與單官能基單體之總量。在此案例中，當 Φ 三嗪爲主的化合物含量小於〇 · 0 1重量份，經由曝光的熟 化會不充分’而使可能將難以得到像素圖案依據一項給予 排列而安排的彩色層，而當含量大於4 0重量份，形成像 素在顯影時易於自基材上脫落。 •添加劑成分- 視需要，在本發明中彩色濾光器用輻射敏感性組合物 可能含有各種添加劑成分。 上述添加劑成分的說明性實施例包含有機酸及有機胺 -29- (26) 1358611 . 基化合物（排除上述氫供體），而進一步改良輻射 •合物在鹼性顯影劑之中的溶解度，且展現進一步 之後抑制發生未溶解物質之效應。 9 • 作爲上述有機酸，較佳爲在分子中具有一或 * 基團的脂肪族羧酸或含有苯基基團的羧酸。 上述脂肪族羧酸的說明性實施例包括： 脂肪族單羧酸如甲酸、乙酸、丙酸、丁酸、 φ 戊酸、己酸、二乙基乙酸，庚酸及辛酸： 脂肪族二羧酸如草酸、丙二酸、琥珀酸、戊 二酸、庚二酸、軟木酸、壬二酸、癸二酸、巴西 基丙二酸、乙基丙二酸、二甲基丙二酸、甲基琥 甲基琥珀酸、環己烷二羧酸、分解烏頭酸、蒸餾 順丁烯二酸、反丁烯二酸及甲基反丁烯二酸：及 羧酸如丙三羧酸、烏頭酸及樟腦酸。 同時，上述含有苯基基團的羧酸說明性實施 φ 基基團直接鍵結至苯基基團的化合物，及經由二 羧基基團鍵結至苯基基團的化合物。 含有苯基基團的羧酸的特定實施例包含： t 芳族單羧酸如苯甲酸、甲苯酸、茴香酸、 酸及2,4,6-三甲苯酸：芳族二羧酸如酞酸、間酞 酸； 具有三或更多羧基基團的芳族多元羧酸如偏 苯三酸，苯偏四用酸及焦苯六羧酸：及苯基乙酸 酸、氫肉桂酸、扁桃酸、苯基琥珀酸、阿托酸、 敏感性組 的於顯影 更多羧基 戊酸、叔 二酸、己 基酸、甲 珀酸、四 檸檬酸、 脂肪族三 例包括羧 價碳鏈將 hemelitic 酸及對酞 苯三酸、 、氫阿托 肉桂酸、 -30- (27) 1358611 .肉桂叉酸、香豆酸及棕土酸。 在此類有機酸之中，脂肪族二羧酸爲較佳的，且丙二 酸、己二酸、分解烏頭酸、蒸餾檸檬酸、反丁烯二酸及甲 基反丁烯二酸係特別較佳地作爲脂肪族羧酸；芳族二羧酸 φ 較佳的且酞酸係特別較佳地作爲含有苯基基團的羧酸，此 係基於鹼溶解度，在以下溶劑中的溶解度，且預防在基材 未曝光部分上與阻光層上有浮渣及膜殘餘物。 φ 上述有機酸可單獨使用或以二或更多者之摻合物使用 〇 有機酸含量宜在15重量份或更低，更佳爲10重量份 或更低，此係基於1〇〇重量份的成分（A)至（E)及添加劑成 分之總量。在此案例中，當含量有機酸大於15重量份， 形成的圖元素對基材之黏合將易於劣化。 同時，作爲上述有機胺基化合物，較佳爲脂肪族胺或 在分子中帶有一或更多胺基的含有苯基基團的胺。 • 上述脂肪族胺說明性實施例包括： 單（環）烷胺類如正丙胺、異丙胺、正丁胺、異丁胺、 第二丁胺、第三丁胺 '正戊胺及正己胺； 二（環）烷胺類如甲基•乙胺、二乙胺、甲基•正丙胺 、乙基•正.丙胺、二-正丙胺、二-異丙胺、二-正丁胺、 二-異丁胺、二-第二丁胺及二-第三丁胺：三（環）烷胺類如 二甲基.乙胺、甲基•二乙胺、三乙胺、二甲基·正丙胺 、二乙基·正丙胺、甲基.二-正丙胺、乙基•二-正丙胺 、三正丙胺、三異丙胺、三正丁胺、三異丁胺、三-第二 -31 - (28) 1358611 . 丁胺及三-第三丁胺； 單（環）烷醇胺如2-胺基乙醇3-胺基-I-丙醇、1-胺基-2-丙醇及4-胺基·1-丁醇： •二（環）烷醇胺如二乙醇胺、二-正丙醇胺、二-異丙醇 胺 '二-正丁醇胺及二-異丁醇胺： 三（環）烷醇胺如三乙醇胺、三正丙醇胺、三異丙醇胺 、三正丁醇胺及三異丁醇胺：胺基（環）烷二元醇類如3-胺 φ 基-1，2 -丙二醇、2 -胺基-1，3·丙二醇、4 -胺基-1,2 -丁二醇、 4-胺基-1,3-丁二醇、3-二甲胺基-1，2-丙二醇、3-二乙胺基-1，2-丙二醇、2-二甲胺基-1，3-丙二醇及2-二乙胺基-1，3-丙 二醇；及胺基羧酸如0 -丙氨酸、2-胺基丁酸、3-胺基丁酸 、4-胺基丁酸、2-胺基異丁酸及3-胺基異丁酸。 同時，含有苯基基團的胺之說明性實施例包括其中胺 基直接鍵結至苯基基團的化合物及經由二價碳鏈將胺基鍵 結至苯基基團的化合物其中。 • 含有苯基基團的胺之特定實施例包括：芳族胺類如苯 胺、鄰-甲基苯胺、間-甲基苯胺、對-甲基苯胺、對-乙基 : 苯胺、1-萘基胺、2-萘基胺、Ν，Ν-二甲基苯胺、Ν，Ν-二乙 : 基苯胺、及對·甲基-Ν，Ν-二甲基苯胺；胺基苄醇類如鄰-胺 基苄醇、間-胺基苄醇、對-胺基苄醇、對-二甲基胺基苄醇 及對-二乙胺基苄醇；胺基酚如鄰-胺基酚、間-胺基酚、 對·胺基酚、對-二甲基胺基酚及對-二乙胺基酚；及胺基苯 甲酸如間-胺基苯甲酸、對-胺基苯甲酸、對-二甲基胺基苯 甲酸及對-二乙基胺基苯甲酸。 -32- (29) 1358611 .在此類有機胺基化合物之中’單（環）烷醇胺及胺基（環 )烷二醇爲較佳的，且2-胺基乙醇、3·胺基-1-丙醇、5-胺 '基-1-戊醇、3 -胺基-1，2 -丙二醇2 -胺基-1，3 -丙二醇及4 -胺 基-1，2 -丁二醇係特別較佳地作爲脂肪族胺：且胺基酚較佳 * 的且鄰-胺基酚、間-胺基酚及對-胺基酚係特別較佳地作爲 含有苯基基團的胺，此係基於在後續溶劑中的溶解度及預 防浮渣及膜殘餘物發生在基材未曝光部#上與阻光層上。 φ 上述有機胺基化合物可單獨使用或以二或更多者之摻 合物使用。 有機胺基化合物含量宜在15重量份或更低，更佳爲 10重量份或更低，此係基於100重量份的成分（A)至（E)及 添加劑成分之總量。在此案例中，當有機胺基化合物的含 量大於15重量份，所形成像素對基材之黏合將易於劣化 〇 此外’除了那些上述者之外的添加劑成分之說明性實 φ 施例包括：分散助劑如藍色顏料衍生物及黃色顏料衍生物 ’例如鄰苯二甲醯青藍銅衍生物；塡料如玻璃及氧化鋁； 聚合物化合物如聚乙烯醇、聚乙二醇單烷基醚及聚（氟丙 烯酸烷酯）；界面活性劑如非離子型、陽離子型及陰離子 性界面活性劑；黏合促進劑如乙烯基三甲氧基矽烷 '乙烯 基三乙氧基矽烷、乙烯基三（2-甲氧基乙氧基）矽烷、N-(2-胺基乙基）·3-胺基丙基•甲基•二甲氧基矽烷、n-(2-胺基 乙基）-3 -胺基丙基三甲氧基矽烷、3·胺基丙基三乙氧基矽 烷、3 -縮水甘油氧基丙基三甲氧基矽烷、3_縮水甘油氧基 -33- (30) 1358611 # 丙基•甲基•二甲氧基矽烷、2-(3,4-環氧基環己基）乙基 . 三甲氧基矽烷、3-氯丙基•甲基•二甲氧基矽烷、3·氯丙 基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷， ' 及3_氫硫基丙基三甲氧基矽烷；抗氧化劑如2,2-硫雙（4- 甲基-6·第三丁基酚）及2,6-二·第三丁基酚；紫外線吸收劑 如2-(3-第三丁基-5·甲基-2-羥基苯基）-5-氯苯并三唑及烷 氧基苯甲酮：團聚抑制劑如聚丙烯酸鈉；及熱自由基產生 # 劑如1，1’-偶氮基雙（環己烷-1·腈）及2-苯偶氮基-4-甲氧基-2,4-二甲基戊腈。 (F)溶劑 作爲在本發明中的溶劑，可選擇的且合適使用一些溶 劑，其可分散或溶解構成輻射敏感性組合物的成分（A)至 (E)與添加劑成分，不與此類成分反應且具有中等的揮發 性。 # 該溶劑的說明性實施例包括：醇類如甲醇、乙醇及苯 甲醇；（聚）伸烷基二醇單烷基醚類如乙二醇單甲基醚、乙 : 二醇單乙醚、乙二醇單-正丙基醚、乙二醇單-正丁基醚、 二甘醇單甲基醚、二甘醇單乙醚、二甘醇單-正丙基醚、 二甘醇單-正丁基醚、三甘醇單甲基醚、三‘甘醇單乙醚、 丙二醇單甲基醚、丙二醇單乙醚、二丙二醇單甲基醚、二 丙二醇單乙醚、二丙二醇單-正丙基醚、二丙二醇單-正丁 基醚、三丙二醇單甲基醚、及三丙二醇單乙醚；（聚）伸烷 基二醇單烷基醚乙酸酯如乙二醇單甲基醚乙酸酯、乙二醇 -34- (31) 1358611 . 單乙醚乙酸酯 '乙二醇單-正丙基醚乙酸酯、乙二醇單-正 丁基醚乙酸酯、二甘醇單甲基醚乙酸酯、二甘醇單乙醚乙 " 酸酯、二甘醇單-正丙基醚乙酸酯、二甘醇單-正丁基醚乙 酸酯 '丙二醇單甲基醚乙酸酯、丙二醇單乙醚乙酸酯及乙 * 酸3 -甲氧基丁酯：其它醚類如二甘醇乙醚、二甘醇甲基乙 醚、二甘醇乙醚、及四氫呋喃； 酮如甲基乙基酮、環己酮、2·庚酮、3 -庚酮、二丙酮 φ 醇（4·羥基-4-甲基戊烷-2·酮）及4-羥基-4-甲基己烷-2-酮； 乳酸烷酯類如乳酸甲酯及乳酸乙酯；酯類如乙酸乙酯、乙 酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯 '原甲 酸戊酯、異乙酸戊酯、乙酸3 -甲基-3 -甲氧基丁酯、正丙 酸丁酯 '丙酸3 -甲基-3·甲氧基丁酯、丁酸乙酯、丁酸正 丙酯、丁酸異丙酯、正丁酸丁酯、羥乙酸乙酯、乙氧基乙 酸乙酯、3-甲氧基丙酸甲酯、3·甲氧基丙酸乙酯、3-乙氧 基丙酸甲酯、3 -乙氧基丙酸乙酯、丙酮酸甲酯、丙嗣酸乙 φ 酯、丙酮酸正丙酯，乙醯乙酸甲酯、乙醯乙酸乙酯、2-羥 基-2-甲基丙酸乙醋、甲基2 -經基-3-丁酸甲醋及乙基2 -嗣 :基丁酸鹽；芳族烴類如甲苯及二甲苯；醯胺類如N -甲基 D比略院酮、N，N -二甲基甲醯胺、及Ν,Ν -二甲基乙醯胺。 在此類溶劑之中，較佳爲苯甲醇、乙二醇單-正丁基 醚 '丙二醇單甲基醚、丙二醇單乙醚、乙二醇單甲基醚乙 酸酯、乙二醇單-正丁基醚乙酸酯、二甘醇單-正丁基醚乙 酸酯、丙二醇單甲基醚乙酸酯、丙二醇單乙醚乙酸酯、二 甘醇乙醚、二甘醇甲基乙醚、環己酮、2-庚酮、3-庚酮、 -35- (32) 1358611 = 乙酸正丁酯、乙酸異丁酯'原甲酸戊酯、異乙酸戊酯、乙 . 酸3·甲氧基丁酯、正丙酸丁酯、丁酸乙酯、丁酸異丙酯、 • 正丁酸丁酯、3 -甲氧基丙酸乙酯、3 -乙氧基丙酸甲酯、3· . 乙氧基丙酸乙酯、丙酸3-甲基-3-甲氧基丁酯及丙酮酸乙 ♦ 酯’此係基於溶解度，顏料分散性與可塗覆性。 上述溶劑可單獨使用或以二或更多者之摻合物使用。 此外，與上述溶劑合倂使用，可使用高沸點溶劑如苄 φ 基乙醚 '二己基醚、丙酮基丙酮、異佛爾酮，己酸、辛酸 、1-辛醇、1-壬醇’苄基乙酸酯、苯甲酸乙酯、草酸二乙 酯、順丁烯二酸二乙酯，7·-丁內酯、碳酸乙烯酯、碳酸 丙烯酯或乙二醇單苯基醚乙酸酯。 上述高沸點溶劑可單獨使用或以二或更多者之摻合物 使用。 溶劑含量未特別作限制》然而，此係基於得到的輻射 敏感性組合物之可塗覆性及貯存穩定性，溶劑含量宜使組 # 合物中排除溶劑之外所有成分之總濃度在5至50 wt%， 更佳爲10至40 wt%。-23- (20) 1358611 • The total amount of the polyfunctional monomer (D) and the monofunctional monomer. In this case, 'in the case where the content of the acetophenone-based compound is less than 〇.〇1 part by weight, the ripening by exposure may be insufficient', and it may be difficult to obtain a pattern in which the 'primary pattern' is arranged according to one Whereas the color layer is arranged, and when the content is more than 100 parts by weight, the pixels formed when developing may be easily detached from the substrate. Further, specific examples of the above diimidazole-based compound include • 2, 2'-double (2-Chlorophenyl)-4,4',5,5|-tetrakis(4-ethoxycarbonylphenyl)-1,2,-diimidazole '2,2'-bis(2-bromophenyl) )-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1,2·-diimidazole, 2,2'-bis(2-chlorophenyl)-4,4· ,5,5·-tetraphenyl-1,2, diimidazole '2,2'-bis(2,4·dichlorophenyl)-4,4',5,5·-tetraphenyl-1, 2,-diimidazole, 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2,-diimidazole, 2,2 '-Bis(2-bromophenyl)-4,4·,5,5'-tetraphenyl-1,2·-diimidazole, 2,2, bis(2,4-dibromophenyl)·4 , 4ΐ,5,5'·tetraphenyl-1,2'-diimidazole, and 2,2'-bis(2,4,6-tribromophenyl) )-4,4',5,5, tetraphenyl-1,2'-diimidazole. φ Among such diimidazole-based compounds, 2,2'-bis(2-chlorophenyl)-4,4',5,5-tetrakis-1,2'-diimidazole, 2 , 2·-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2·-diimidazole, and 2,2'-bis (2,4, 6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-diimidazole is more preferred, and particularly preferably 2,2'-bis (2,4- Dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2|-diimidazole. The above diimidazole-based compound has excellent solubility in a solvent, does not have foreign substances such as undissolved substances and precipitates, has high sensitivity, can be completely cured by low-energy exposure, and is not exposed. Some of the ripening reaction does not occur. According to this, after the 'exposure' coating film -2424-24(21) 1358611 - is divided into a mature portion which is insoluble in the developer, and a portion which is high in solubility and which is not matured, Thereby, a high-definition color layer without an undercut pixel pattern arranged according to a given arrangement can be formed. * The above diimidazole-based compounds may be used singly or in combination of two or more. In the present invention, 'diimidazole-based compound is used as a photopolymerization initiation φ agent', and its content is preferably from 1 to 40 parts by weight, more preferably from 1 to 30 parts by weight, and still more preferably from 1 to 20% by weight. The parts by weight are based on 100 parts by weight of the total of the polyfunctional monomer (D) and the monofunctional monomer. In this case, when the content of the diimidazole-based compound is less than 0.1 part by weight, the curing by exposure may be insufficient, and it may be difficult to obtain a color layer in which the pixel pattern is arranged according to an arrangement. When it is more than 40 parts by weight, the pixels formed when developing may be easily peeled off from the substrate. Φ - Hydrogen donor · In the present invention, when a diimidazole-based compound is used as a photopolymerization initiator: the following hydrogen donor is preferably used in combination with a diimidazole-based compound because the sensitivity can be further improved. . The term ||hydrogen donor" as used herein, means a compound which provides a hydrogen atom which provides a free radical generated by exposure of an imidazole-based compound. The hydrogen donor in the present invention is preferably a compound mainly composed of a thiol as defined below and an amine-based compound. -25- (22) 1358611 The above-mentioned thiol-based compound (hereinafter referred to as "thiol-based hydrogen donor") contains a benzene ring or a heterocyclic ring as a main nucleus, and has at least one, preferably 1 More preferably, one or two thiol groups are directly bonded to the main nucleus. The compound β (in addition to the above-mentioned amine-based compound (hereinafter referred to as "amine-based hydrogen donor) "), containing a benzene ring or a heterocyclic ring as the main nucleus, and having at least one, preferably 1 to 3, more preferably 1 or 2 amine groups directly bonded to the main nucleus such a hydrogen donor can simultaneously With a hydrogenthio group and an amine group. Hereinafter, such a hydrogen donor will be further described. This thiol-based hydrogen donor may carry one or more benzene rings or one or more heterocyclic ring. Further, it may have both a benzene ring and a hetero ring. When it has two or more such rings, it may or may not form a fused ring. Furthermore, in one case, when a thiol-based hydrogen donor has two or more thiol groups, as long as at least one free thiol group is maintained, one or φ more residual thiol groups The group may be substituted with an alkyl group, an aralkyl group or an aryl group, and as long as at least one free thiol group is maintained, two structural sulfur atoms may be present in the structural unit to form a divalent organic group such as an alkyl group. The groups are bonded to each other, or two sulfur atoms in the structural unit are bonded to each other in the form of a disulfide. In addition, the thiol-based hydrogen donor is at a site other than the thiol group. It may be substituted with a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, a phenoxycarbonyl group, a substituted phenoxycarbonyl group, a nitrile group or the like. -26- (23) 1358611. Specific examples of the thiol-based hydrogen donor include 2-hydrothiobenzothiazole, 2-hydrothiobenzoxazole, 2-hydrothiobenzimidazole, 2,5-Dihydro" thio-1,3,4-thiadiazole, and 2-hydrothio-2,5-dimethylaminopyridine. • Among such mercaptan-based hydrogen donors, preferably 2-hydrothiobenzoxazole and 2-hydrothiobenzoxazole are preferred, and particularly preferred is mercaptobenzene. And thiazole. The amine-based hydrogen donor may carry a φ ring of one or more benzene rings or one or more heterocyclic groups. Further, it may have both a benzene ring and a hetero ring. When it has two or more such rings, it forms a fused ring or does not form a fused ring. Further, one or more of the amine-based hydrogen donors may be substituted with an alkyl group or a substituted alkyl group. Further, an amine-based hydrogen donor other than an amine group may be substituted with a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, or a phenoxycarbonyl group. a substituted phenoxycarbonyl group, a nitrile group or the like. Specific examples of the amine-based hydrogen donor include 4,4'-bis(dimethylamine)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4-diethyl Aminoacetone, 4-dimethylaminopropiophenone, ethyl-4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, and 4-dimethylaminobenzonitrile. Among such amine-based hydrogen donors, 4,4·-bis(dimethylamino)benzophenone and 4,4·-bis(diethylamino)benzophenone are preferred. The best is 4,4i_bis(diethylamino)benzophenone. An amine-based hydrogen donor can be used as a sensitizer, even when a photopolymerization initiator other than dimazole-based compound species is used. In the present invention, the hydrogen donor may be used singly or in combination of two or more of -27-(24) 1358611. It is preferred to use one or more hydrogen donor-based hydrogen donors and one or more amine-based hydrogen donors because the pixels formed during development are difficult to fall off from the substrate and the pixels are high. Strength and sensitivity. • φ of a combination of a preferred thiol-based hydrogen donor and an amine-based hydrogen donor. Specific examples include 2-hydrothiobenzothiazole/4,4·-bis(dimethylamino)benzene Methyl ketone ' 2 - thiothiabenzothiazole M, 4'-bis(diethylamino)benzophenone, 2-hydrothiobenzoxazole / 4,4'-bis(dimethylamino) Benzophenone, and 2. thiolbenzoxanthazole/4,4'-bis(diethylamino)benzophenone. More preferably, the combination is 2-hydrothiobenzothiazole/4,4'-bis(diethylamino)benzophenone and 2-hydrothiobenzoxazole/4,4,·bis(diethylamine) Benzo). A particularly preferred combination is 2-hydrothiobenzothiazolium/4,4'-bis(diethylamino)benzophenone. In a thiol-based hydrogen donor and amine-based hydrogen donor composition, the thiol-based hydrogen donor to amine-based hydrogen donor weight ratio is preferably between 1:1 and 1: 4, more preferably 1:1 to 1:3 〇 In the present invention, when the hydrogen donor and the diimidazole-based compound are combined, # is preferably used in an amount of from 1 to 40 parts by weight, more preferably 1 To 30 parts by weight 'particularly preferably 1 to 20 parts by weight, based on 100 parts by weight of the total of the polyfunctional monomer (D) and the monofunctional monomer. In this case, when the content of the hydrogen donor is less than 0.01 part by weight, the effect of improving the sensitivity is liable to be deteriorated, and when it is more than 40 parts by weight, the pixel formed when developing is liable to fall off from the substrate. Further, specific examples of the above triazine-based compound include a triazine-based compound having a halomethyl group, such as 2,4,6-tris(trichloromethyl)-s-triazine, 2- Methyl-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(5-methylfur-28-(25) 1358611 'an-2-yl)ethenyl]- 4,6-bis(trichloromethyl)-s-triazine, 2-[2-(indolyl-2-yl)ethenyl]-4,6-bis(trichloromethyl)-3- Triazine, 2-[2-(4-diethylamino-2-methylphenyl)ethlyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2- (3,4·•dimethoxyphenyl)vinyl]-4,6-bis(trichloromethyl)_s_trisole, 2_(4-methyloxyphenyl)-4,6-double (trichloromethyl)-s-triazine, 2-(4-ethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(4-n-butyl) Oxyphenyl)-4,6-bis(trichloromethyl)-s-triazine. • Among such triazine-based compounds, 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(dichloromethyl)-s-three The azine is particularly preferred. The above triazine-based compounds may be used singly or in combination of two or more. In the present invention, when the triazine-based compound is used as a photopolymerization initiator, the content thereof is preferably from 0.01 to 40 parts by weight, more preferably from 3 to 3 parts by weight, and substantially more preferably from 1 to 20 parts by weight. It is based on 1 part by weight of the total amount of the polyfunctional monomer (D) and the monofunctional monomer. In this case, when the content of the Φ triazine-based compound is less than 0.1 part by weight, the curing by exposure may be insufficient, and it may be difficult to obtain a color layer in which the pixel pattern is arranged according to an arrangement. When the content is more than 40 parts by weight, the formed pixels are liable to fall off from the substrate at the time of development. • Additive component - The radiation-sensitive composition for a color filter in the present invention may contain various additive components as needed. Illustrative examples of the above additive components include an organic acid and an organic amine -29-(26) 1358611. a base compound (excluding the above hydrogen donor) to further improve the solubility of the radiation compound in the alkaline developer, and The effect of inhibiting the occurrence of undissolved substances after further development is exhibited. 9 • As the above organic acid, an aliphatic carboxylic acid having a mono- or * group in the molecule or a carboxylic acid having a phenyl group is preferred. Illustrative examples of the above aliphatic carboxylic acid include: aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, φ valeric acid, caproic acid, diethyl acetic acid, heptanoic acid and caprylic acid: aliphatic dicarboxylic acids Such as oxalic acid, malonic acid, succinic acid, glutaric acid, pimelic acid, softwood acid, azelaic acid, sebacic acid, branylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methyl Alkyl methyl succinic acid, cyclohexane dicarboxylic acid, decomposed aconitic acid, distilled maleic acid, fumaric acid and methyl fumaric acid: and carboxylic acids such as propylene tricarboxylic acid, aconitic acid and Camphor acid. Meanwhile, the above phenyl group-containing carboxylic acid illustratively carries out a compound in which a φ group is directly bonded to a phenyl group, and a compound which is bonded to a phenyl group via a dicarboxy group. Specific examples of carboxylic acid containing phenyl groups include: t aromatic monocarboxylic acids such as benzoic acid, toluic acid, anisic acid, acid and 2,4,6-tritoic acid: aromatic dicarboxylic acids such as citric acid , meta-acid; aromatic polycarboxylic acid having three or more carboxyl groups such as trimellitic acid, benzoic acid and pyromellitic acid: and phenylacetic acid, hydrogen cinnamic acid, mandelic acid, Phenyl succinic acid, atropic acid, sensitive group in the development of more carboxy valeric acid, tert-dicarboxylic acid, hexyl acid, captopril, tetracitric acid, aliphatic three cases including the carboxy valence carbon chain will hemelitic acid and Trimellitic acid, hydrogen ato-cinnamic acid, -30-(27) 1358611. Cinnamonic acid, coumaric acid and brown earth acid. Among such organic acids, aliphatic dicarboxylic acids are preferred, and malonic acid, adipic acid, aconitic acid, distilled citric acid, fumaric acid and methyl fumaric acid are particularly preferred. Preferred as an aliphatic carboxylic acid; an aromatic dicarboxylic acid φ is preferred and a citric acid is particularly preferred as the carboxylic acid having a phenyl group, which is based on alkali solubility, solubility in the following solvents, and Prevention of scum and film residue on the unexposed portion of the substrate and the light blocking layer. φ The above organic acid may be used singly or in combination of two or more. The organic acid content is preferably 15 parts by weight or less, more preferably 10 parts by weight or less, based on 1 part by weight. The total amount of ingredients (A) to (E) and additive ingredients. In this case, when the content of the organic acid is more than 15 parts by weight, the adhesion of the formed pattern element to the substrate will be easily deteriorated. Meanwhile, as the above organic amine-based compound, an aliphatic amine or a phenyl group-containing amine having one or more amine groups in the molecule is preferable. • Illustrative examples of the above aliphatic amines include: mono(cyclo)alkylamines such as n-propylamine, isopropylamine, n-butylamine, isobutylamine, second butylamine, tert-butylamine 'n-pentylamine, and n-hexylamine; Di(cyclo)alkylamines such as methyl ethylamine, diethylamine, methyl • n-propylamine, ethyl • n-propylamine, di-n-propylamine, di-isopropylamine, di-n-butylamine, di-iso Butylamine, di-second butanamine and di-tert-butylamine: tri(cyclo)alkylamines such as dimethyl.ethylamine, methyldiethylamine, triethylamine, dimethyl-n-propylamine, Diethyl n-propylamine, methyl.di-n-propylamine, ethyl•di-n-propylamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, triisobutylamine, tri-second-31 - (28 1358611 . Butylamine and tri-tert-butylamine; mono(cyclo)alkanolamines such as 2-aminoethanol 3-amino-I-propanol, 1-amino-2-propanol and 4-amino group 1-butanol: • Di(cyclo)alkanolamines such as diethanolamine, di-n-propanolamine, di-isopropanolamine 'di-n-butanolamine and di-isobutanolamine: three (ring) Alkanolamines such as triethanolamine, tri-n-propanolamine, triisopropanolamine, tri-n-butanolamine and triisobutanolamine : Amino (cyclo)alkanols such as 3-amine φ -1,2-propanediol, 2-amino-1,3·propanediol, 4-amino-1,2-butanediol, 4- Amino-1,3-butanediol, 3-dimethylamino-1,2-propanediol, 3-diethylamino-1,2-propanediol, 2-dimethylamino-1,3-propanediol and 2-diethylamino-1,3-propanediol; and aminocarboxylic acids such as 0-alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-amino group Isobutyric acid and 3-aminoisobutyric acid. Meanwhile, illustrative examples of the phenyl group-containing amine include a compound in which an amine group is directly bonded to a phenyl group and a compound in which an amine group is bonded to a phenyl group via a divalent carbon chain. • Specific examples of amines containing a phenyl group include: aromatic amines such as aniline, o-methylaniline, m-methylaniline, p-methylaniline, p-ethyl: aniline, 1-naphthyl Amine, 2-naphthylamine, hydrazine, hydrazine-dimethylaniline, hydrazine, hydrazine-diethyl phenylamine, and p-methyl-hydrazine, hydrazine-dimethylaniline; aminobenzyl alcohols such as o- Aminobenzyl alcohol, m-aminobenzyl alcohol, p-aminobenzyl alcohol, p-dimethylaminobenzyl alcohol and p-diethylaminobenzyl alcohol; aminophenols such as o-aminophenol, m- Aminophenol, p-aminophenol, p-dimethylaminophenol and p-diethylaminophenol; and aminobenzoic acid such as m-aminobenzoic acid, p-aminobenzoic acid, p-di Methylaminobenzoic acid and p-diethylaminobenzoic acid. -32- (29) 1358611. Among such organic amine-based compounds, 'mono(cyclo)alkanolamine and amino(cyclo)alkanediol are preferred, and 2-aminoethanol, 3-amino group 1-propanol, 5-amine 'yl-1-pentanol, 3-amino-1,2-propanediol 2-amino-1,3-propanediol and 4-amino-1,2-butanediol Particularly preferred as the aliphatic amine: and the aminophenol is preferably * and the ortho-aminophenol, the m-aminophenol and the p-aminophenol are particularly preferably used as the amine having a phenyl group. This is based on the solubility in the subsequent solvent and prevention of scum and film residue on the unexposed portion of the substrate and the light blocking layer. φ The above organic amine-based compound may be used singly or in combination of two or more. The content of the organic amine-based compound is preferably 15 parts by weight or less, more preferably 10 parts by weight or less, based on 100 parts by weight of the total of the components (A) to (E) and the additive component. In this case, when the content of the organic amine-based compound is more than 15 parts by weight, the adhesion of the formed pixel to the substrate will be liable to be deteriorated. Further, the illustrative embodiment of the additive component other than those described above includes: dispersion Auxiliaries such as blue pigment derivatives and yellow pigment derivatives such as phthalate blue copper derivatives; pigments such as glass and alumina; polymer compounds such as polyvinyl alcohol, polyethylene glycol monoalkyl ether And poly(alkyl fluoroacrylate); surfactants such as nonionic, cationic and anionic surfactants; adhesion promoters such as vinyl trimethoxy decane 'vinyl triethoxy decane, vinyl three (2 -methoxyethoxy)decane, N-(2-aminoethyl)-3-aminopropyl•methyl•dimethoxydecane, n-(2-aminoethyl)-3 Aminopropyltrimethoxydecane, 3:aminopropyltriethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidyloxy-33- (30) 1358611 #propyl • Methyl•dimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyl.trimethoxydecane, 3- Chloropropyl•methyl•dimethoxydecane, 3·chloropropyltrimethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane, 'and 3-hydrothiopropyltrimethoxy Decane; antioxidants such as 2,2-thiobis(4-methyl-6.t-butylphenol) and 2,6-di-t-butylphenol; UV absorbers such as 2-(3-third -5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole and alkoxybenzophenone: agglomeration inhibitors such as sodium polyacrylate; and thermal free radical generation #agents such as 1,1'- Azobis(cyclohexane-1.carbonitrile) and 2-phenylazo-4-methoxy-2,4-dimethylvaleronitrile. (F) Solvent As the solvent in the present invention, it is optional and suitable to use a solvent which can disperse or dissolve the components (A) to (E) and the additive component constituting the radiation-sensitive composition, and does not Reactive and moderately volatile. # Illustrative examples of the solvent include: alcohols such as methanol, ethanol, and benzyl alcohol; (poly)alkylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, B: glycol monoethyl ether, B Glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl Ethyl ether, triethylene glycol monomethyl ether, tri-glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, two Propylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, and tripropylene glycol monoethyl ether; (poly)alkylene glycol monoalkyl ether acetate such as ethylene glycol monomethyl ether acetate, ethylene Alcohol-34- (31) 1358611 . Monoethyl ether acetate 'ethylene glycol mono-n-propyl ether acetate, ethylene glycol mono-n-butyl ether acetate, diethylene glycol monomethyl ether acetate Ester, diethylene glycol monoethyl ether B " acid ester, diethylene glycol mono-n-propyl ether acetate, diethylene glycol mono-n-butyl ether acetate 'propylene glycol monomethyl ether acetate, propylene glycol single Ethyl ether Ester and 3-methoxybutyl acetate: other ethers such as diethylene glycol ethyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, and tetrahydrofuran; ketones such as methyl ethyl ketone, cyclohexanone, 2 · heptanone, 3-heptanone, diacetone φ alcohol (4·hydroxy-4-methylpentane-2·one) and 4-hydroxy-4-methylhexan-2-one; alkyl lactate such as Methyl lactate and ethyl lactate; esters such as ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate 'amyl formate, amyl acetate, 3-methyl acetate -3 - methoxybutyl ester, butyl n-propionate - propionate 3-methyl-3. methoxybutyl ester, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyric acid Butyl ester, ethyl hydroxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxyl Ethyl propionate, methyl pyruvate, ethyl phthalate, n-propyl pyruvate, methyl acetate, ethyl acetate, 2-hydroxy-2-methylpropionic acid, methyl 2 - mercapto-3-butyric acid methyl vinegar and ethyl 2- fluorene: butyl butyrate; aromatic hydrocarbons such as toluene and Toluene; guanamines such as N-methyl D piroxicam, N,N-dimethylformamide, and hydrazine, hydrazine-dimethylacetamide. Among such solvents, preferred are benzyl alcohol, ethylene glycol mono-n-butyl ether 'propylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol monomethyl ether acetate, and ethylene glycol mono-positive. Butyl ether acetate, diethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol ethyl ether, diethylene glycol methyl ether, cyclohexane Ketone, 2-heptanone, 3-heptanone, -35- (32) 1358611 = n-butyl acetate, isobutyl acetate 'amyl formate, amyl isophthalate, B. 3, methoxybutyl ester , n-propionic acid butyl ester, ethyl butyrate, isopropyl butyrate, • butyl butyrate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3 · ethoxy Ethyl propyl propionate, 3-methyl-3-methoxybutyl propionate and ethyl pyruvate 'based on solubility, pigment dispersibility and coatability. The above solvents may be used singly or as a blend of two or more. Further, in combination with the above solvent, a high boiling point solvent such as benzyl φ ethyl ether 'dihexyl ether, acetonyl acetone, isophorone, caproic acid, octanoic acid, 1-octanol, 1-nonanol 'benzyl group can be used. Acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, 7-butyrolactone, ethylene carbonate, propylene carbonate or ethylene glycol monophenyl ether acetate. The above high boiling point solvent may be used singly or in combination of two or more. The solvent content is not particularly limited. However, this is based on the coatability and storage stability of the resulting radiation-sensitive composition, and the solvent content is preferably such that the total concentration of all components excluding the solvent in the group is 5 to 50 wt%, more preferably 10 to 40 wt%.

I -彩色濾光器用輻射敏感性組合物之製備方法· 依據本發明的彩色濾光器用輻射敏感性組合物之製備 方法未特別地限制。此組合物較佳的製備法係透過一項的 步驟，將顏料（A)分散在一事先含有分散劑（B)、鹼可溶的 樹脂（C)及溶劑（F)的介質之中。 以下，將顏料（A)分散在上述預先介質的步驟將稱爲" -36- (33) 1358611 -初步的分散步驟"，且將顏料（A)分散在上述預先介質中所 _ 得分散液稱爲”預分散液”。 ^ 在初步的分散步驟中，鹼可溶的樹脂（C)含量宜在5 至1 0 0 w t %，更佳爲1 0至5 0 w t %，此係基於使用於彩色 * 濾光器用輻射敏感性組合物中鹼可溶的樹脂含量（C)。在 此案例中，當鹼可溶的樹脂含量（C)小於5 wt%，所得到組 合物之貯存穩定性易於劣化或殘餘物易於留在基材上。 φ 可經由使用混合裝置混合上述成分而進行初步的分散 步驟，混合裝置如溶解器，圓珠磨機或桿磨機。 在如此得到預分散液中顔料（A)的平均粒徑在宜在50 至400 nm，更佳爲50至150nme 於初步的分散步驟之後，將此預分散液與多官能基單 體（D)及光聚合起始劑（E)混合；且在一些案例中，可混合 在一般方法中所用額外的鹼可溶的樹脂含量（C)及溶劑（F) ，從而可得到依據本發明的彩色濾光器用輻射敏感性組合 鲁物。 形成彩色濾光器之方法 隨後，將記述經由使用依據本發明彩色濾光器用輻射 敏感性組合物（以下簡單地稱爲"輻射敏感性組合物"）而形 成本發明彩色濾光器之方法。 形成本發明彩色濾光器之方法至少包含以下步驟（1)至 (4)，即， (1)在基質上形成本發明膜輻射敏感性組合物的塗層之 -37- (34) 1358611 、 步驟， - (2)將至少一部分的塗層膜曝光於輻射線， _ (3)顯影曝光塗層膜之步驟，及 ' (4)後烘烤顯影塗覆膜之步驟。 參 以下，將依序敘述此類步驟。 •步驟（1)- Φ 首先’在基材表面上形成阻光層’使形成圖元素部分 視需要而分段，且將此基材塗覆以本發明輻射敏感性組合 物且然後預烘烤以揮發溶劑，從而形成塗層膜。 使用於此步驟的基材之說明性實施例包括玻璃〔矽、 聚碳酸酯、聚酯、芳族聚醯胺、聚醯胺醯亞胺、聚醯亞胺 、聚醚硕' 環烯烴之開環聚合物、及開環聚合物之氫化產 物。 此外，此類基材可視需要作合適的預處理如使用矽烷 Φ 耦合劑或其類似者的化學處理、電漿處理、離子電鍍、濺 射、氣相反應方法或真空沈積。 :此輻射敏感性組合物可經使用合適的塗覆方法而施於 基材，如旋轉塗覆、澆鑄塗覆或滾筒塗覆。以上所有方法 之中，使用旋轉塗覆器或狹縫壓模塗覆器的塗覆方法爲較 佳的。 預供烤宜在70至1 1 〇°C進行約2至4分鐘。 於乾燥膜之後，塗層之厚度膜宜在0」至8.0 um，更 佳爲0.2至6.0 um，大幅更佳爲0.2至4.0# m。 (35) 1358611 . -步驟（2)- 然後，將至少一部分的形成塗層膜曝光於輻射線。在 ' 此步驟中’部分的塗層膜宜經由具有預先決定圖案的光罩 ψ 而曝光於輻射線》 * 作爲用於曝光的輻射線，可合適的選擇且使用各種輻 射線如可見光、紫外線照射、遠紫外線照射、電子束或 X-射線。波長190至450 nm的輻射線爲較佳的。 g 輻射線的曝光劑量較佳約10至10,〇〇〇 J/m2。 -步驟（3)- 然後’使用顯影劑將曝光塗層膜顯影，較佳爲鹼性顯 影劑，以溶解且移除未曝光部分的塗層膜，從而形成預先 決定的圖案。 作爲上述鹼性顯影劑，較佳爲碳酸鈉、氫氧化鈉、氫 氧化鉀、四甲基氫氧化銨，膽鹼，1，8-重氮雙環-[5.4.0]· φ 7-十一烷烯及丨，5-重氮雙環-[4.3.0]-5-壬烯或其類似者之 水溶液。 在上述鹼性顯影劑中，可加入合適量的水溶性有機溶 劑如甲醇或乙醇，界面活性劑或其類似者。於使用鹼性顯 影劑作顯影之後，宜用水輕洗顯影塗覆膜。 作爲顯影方法，可使用沖洗顯影方法、噴灑顯影方法 、浸泡顯影方法、槳式顯影方法或其類似者。 顯影較佳在室溫下進行約5至3 00秒。 -39- (36) 1358611 • -步驟（4)- 然後，將顯影塗覆膜作後烘烤，從而可得到於其上依 ** 給予排列所安排像素圖案的基材。 • 例如，後烘烤宜在180至240°C進行約15至90分鐘 • 。如此形成像素的膜之厚度宜在〇」至6.0/zm，更佳爲 0.5 至 3.0/zmo 經由重複上述步驟（1)至（4)，經由使用其中分散有紅 φ ，綠色或藍色顏料的輻射敏感性組合物，在相同基材上形 成紅、綠及藍像素圖案，在基材上可形成其中三原色，即 紅、綠及藍色像素圖案，依所予排列而安排的彩色層。 本發明中，形成三顏色像素圖案之順序可任意地選擇 彩色濾光器 本發明彩色濾光器是依據本發明的彩色濾光器用輻射 φ 敏感性組合物所形成》 本發明彩色濾光器非常適用於透明或反射彩色液晶顯 示器、色彩擷取管元素、色彩感應器及其類似者。 彩色液晶顯示器 本發明的彩色液晶顯示器包含本發明彩色濾光器。 本發明的彩色液晶顯示器可使用任何合適的結構。例 如其可使用一種結構，在其上形成彩色濾光器的基材，與 其上配置有薄膜電晶體（TFT)的驅動基材，經由液晶層相 -40- (37) 互面對：或一種結構，其上配置有薄膜電晶體（TFT)且具 有彩色濾光器形成在其表面上的驅動基材，與其上面形成 有ITO(錫摻雜的氧化銦）電極的基材，經由液晶層相互面 對。後者結構的優點在孔徑比例可顯著地改良，且可得到 明亮、高淸晰度液晶顯示器。 實施例 以下’將進一步參照實施例而記述本發明的具體實施 例。然而，本發明不受限於以下實施例。Method of Producing Radiation-Sensitive Composition for I-Color Filters The preparation method of the radiation-sensitive composition for color filters according to the present invention is not particularly limited. The preferred preparation of the composition is carried out by a step of dispersing the pigment (A) in a medium previously containing a dispersing agent (B), an alkali-soluble resin (C) and a solvent (F). Hereinafter, the step of dispersing the pigment (A) in the above-mentioned pre-media will be referred to as "-36-(33) 1358611 - preliminary dispersion step ", and dispersing the pigment (A) in the above-mentioned pre-media The liquid is called a "predispersion". ^ In the preliminary dispersion step, the alkali-soluble resin (C) is preferably contained in an amount of from 5 to 100% by weight, more preferably from 10 to 50% by weight, based on radiation sensitivity for use in a color* filter. The content of the alkali-soluble resin in the composition (C). In this case, when the alkali-soluble resin content (C) is less than 5 wt%, the storage stability of the resulting composition is liable to be deteriorated or the residue is liable to remain on the substrate. φ The preliminary dispersion step can be carried out by mixing the above components using a mixing device such as a dissolver, a bead mill or a rod mill. In the thus obtained predispersion liquid, the average particle diameter of the pigment (A) is preferably from 50 to 400 nm, more preferably from 50 to 150 nm, after the preliminary dispersion step, the predispersion liquid and the polyfunctional monomer (D) And the photopolymerization initiator (E) is mixed; and in some cases, the additional alkali-soluble resin content (C) and solvent (F) used in the general method can be mixed, thereby obtaining the color filter according to the present invention. The light device is combined with radiation sensitivity. Method of Forming Color Filters Subsequently, the description will be made by forming a color filter of the present invention by using a radiation-sensitive composition for a color filter according to the present invention (hereinafter simply referred to as "radiation-sensitive composition"). method. The method of forming the color filter of the present invention comprises at least the following steps (1) to (4), that is, (1) forming a coating of the film radiation-sensitive composition of the present invention on the substrate -37-(34) 1358611, Steps, - (2) exposing at least a portion of the coating film to radiation, _ (3) developing a step of exposing the coating film, and '(4) post-baking developing the film. As will be described below, such steps will be described in sequence. • Step (1) - Φ First 'form a light-blocking layer on the surface of the substrate' such that the portion forming the pattern element is segmented as needed, and the substrate is coated with the radiation-sensitive composition of the invention and then pre-baked The solvent is volatilized to form a coating film. Illustrative examples of substrates used in this step include the opening of glass [矽, polycarbonate, polyester, aromatic polyamine, polyamidolimine, polyimine, polyether cycline] A hydrogenated product of a cyclic polymer, and a ring-opening polymer. Further, such a substrate may be suitably subjected to a pretreatment such as chemical treatment using a decane Φ couplant or the like, plasma treatment, ion plating, sputtering, gas phase reaction method or vacuum deposition. : The radiation-sensitive composition can be applied to a substrate by a suitable coating method such as spin coating, cast coating or roller coating. Among all the above methods, a coating method using a spin coater or a slit die coater is preferable. The pre-bake is preferably carried out at 70 to 1 1 ° C for about 2 to 4 minutes. After drying the film, the thickness of the coating film is preferably from 0" to 8.0 um, more preferably from 0.2 to 6.0 um, and most preferably from 0.2 to 4.0 #m. (35) 1358611. - Step (2) - Then, at least a portion of the formed coating film is exposed to radiation. The coating film in the 'this step' portion is preferably exposed to radiation through a mask 具有 having a predetermined pattern. * As a radiation for exposure, it can be suitably selected and irradiated with various radiation such as visible light or ultraviolet rays. , far ultraviolet radiation, electron beam or X-ray. Radiation at a wavelength of 190 to 450 nm is preferred. The exposure dose of the g radiation is preferably about 10 to 10, 〇〇〇 J/m 2 . - Step (3) - Then, the exposed coating film is developed using a developer, preferably an alkaline developer, to dissolve and remove the unexposed portion of the coating film, thereby forming a predetermined pattern. As the above alkaline developer, sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazobicyclo-[5.4.0]·φ 7- eleven is preferred. An aqueous solution of an alkene and a hydrazine, 5-diazobicyclo-[4.3.0]-5-decene or the like. In the above alkaline developer, a suitable amount of a water-soluble organic solvent such as methanol or ethanol, a surfactant or the like can be added. After development using an alkaline developer, it is preferred to lightly wash the developed coating film with water. As the developing method, a rinsing development method, a spray development method, a immersion development method, a paddle development method, or the like can be used. Development is preferably carried out at room temperature for about 5 to 300 seconds. -39- (36) 1358611 • - Step (4) - Then, the developed coating film is post-baked, whereby a substrate on which the arranged pixel pattern is arranged is given. • For example, post-baking should be carried out at 180 to 240 ° C for about 15 to 90 minutes. The film thus formed into a pixel preferably has a thickness of from 〇" to 6.0/zm, more preferably from 0.5 to 3.0/zmo, by repeating the above steps (1) to (4), by using a red φ, green or blue pigment dispersed therein. The radiation-sensitive composition forms red, green and blue pixel patterns on the same substrate, and a color layer in which three primary colors, that is, red, green and blue pixel patterns, are arranged on the substrate can be formed. In the present invention, the order of forming the three-color pixel pattern can be arbitrarily selected as the color filter. The color filter of the present invention is formed by the radiation φ-sensitive composition for the color filter according to the present invention. The color filter of the present invention is very Suitable for transparent or reflective color LCD displays, color capture tube elements, color sensors and the like. Color Liquid Crystal Display The color liquid crystal display of the present invention comprises the color filter of the present invention. The color liquid crystal display of the present invention can use any suitable structure. For example, it is possible to use a structure in which a substrate on which a color filter is formed, a driving substrate on which a thin film transistor (TFT) is disposed, and a liquid crystal layer 40-(37) face each other: or a kind a substrate on which a thin film transistor (TFT) is disposed and a color filter is formed on a surface thereof, and a substrate on which an ITO (tin-doped indium oxide) electrode is formed, via a liquid crystal layer face. The advantage of the latter structure is that the aperture ratio can be significantly improved, and a bright, high definition liquid crystal display can be obtained. EXAMPLES Hereinafter, specific examples of the present invention will be described with further reference to examples. However, the invention is not limited to the following examples.

實施例I 將15重量份的C.I·顏料紅色254/C.I.顏料紅色177 = 8 0/20(重量比）之混合物作爲顏料（A)，5重量份（約2.26重 量份’就固含量而言）的Disperbyk-2001(固體濃度：45.1 作爲分散劑（B)、6重量份的甲基丙烯酸/N_苯基順式 丁烯二醯亞胺/苯乙烯/甲塞丙烯酸苄酯共聚物（共聚合重量 比=20/30/20/30，Mw = 9,500，Μη = 5，000)作爲驗可溶的 樹脂（C)及37重量份的丙二醇單甲基醚乙酸酯及37重量 份的3 -乙氧基丙酸乙酯作爲溶劑（F)，以圓珠磨機處理， 以製備預分散液（R1)。 然後，爲100重量份的預分散液（R1)，5重量份的甲 基丙烯酸/單（2-甲基丙烯醯氧基乙基）琥珀酸酯/Ν_苯基順 式丁烯二醯亞胺/苯乙烯/甲基丙烯酸苄酯共聚物（共聚合重 量比=25/10/30/20/15，Mw = 12,000，Μη = 6,500)作爲驗 -41 - (38) 1358611 可溶的樹脂（C)，10重量份的六丙烯酸二季戊四醇酯作爲 多官能基單體（D)，5重量份的2-甲基-(4-甲基噻吩基）：2-嗎福啉基-1-丙酮-1作爲光聚合起始劑（E)及70重量份的 乙酸3-甲氧基丁酯作爲溶劑（F)，混合在一起’以製備輻 射敏感性組合物。 實施例2 B 取 15重量份的 C.I.顏料綠色 36/C.I.顏料黃色 138/C.I.顏料黃色1 5 0 = 5 0/40/ 1 0(重量比）之混合物作爲顏 料（A)，7.5重量份（約3.38重量份，就固含量而言）的 D.isperbyk-2 00 1作爲分散劑（B)、4重量份的甲基丙烯酸/ ω-羧基二己內酯單丙烯酸酯/N-苯基順式丁烯二醯亞胺/苯 乙烯/甲基丙烯酸苄酯/甘油單甲基丙烯酸酯共聚物（共聚合 重量比=15/10/20/10/35/10，Mw = 6,000，Μη = 3，000)作 爲鹼可溶的樹脂（C)及73.5重量份的丙二醇單甲基醚乙酸 φ 酯作爲溶劑（F)，採用如在實施例1中相同方法中的處理 以製備預分散液（G1)。 然後’取1〇〇重量份的預分散液（G1)，5重量份的甲 基丙烯酸/Ν-苯基順式丁烯二醯亞胺/苯乙烯/甲基丙烯酸苄 酯/甘油單甲基丙烯酸酯共聚物（共聚合重量比= 1 5/25/ 1 5/3 5/ 1 0，Mw= 1 3,5 00’ Μη = 6,〇〇〇)作爲鹼可溶的 樹脂（C)’ 10重量份的六丙嫌酸二季戊四醇醋作爲多官能 基單體（D) ’ 5重量份的2·苄基-2-二甲胺基-丨-㈠-嗎福啉基 苯基）丁酮-1作爲光聚合起始劑（Ε)及70重量份的3_乙氧 -42- (39) 1358611 - 基丙酸乙酯作爲溶劑（F)，將其混合在一起，以製備輻射 . 敏感性組合物。 ·· * 實施例3 取15重量份的 C.I.顏料藍15/C.I.顏料紫色23 = 90/10(重量比）作爲顏料（A)，10重量份（4.51重量份，就固 含量而言）的Disperbyk-2001作爲分散劑（B)、2重量份的 φ 丙烯酸/N-苯基順式丁烯二醯亞胺/苯乙烯/甲基丙烯酸苯酯 /2-甲基丙烯酸羥乙酯/聚甲基丙烯酸甲酯巨單體共聚物（共 聚合重量比=1 5/20/1 0/35/1 0/1 0，Mw = 23,000，Μη = 1 1，000)作爲鹼可溶的樹脂（c)及63重量份的丙二醇單甲基 醚乙酸酯及10重量份的丙二醇單甲基醚作爲溶劑（F)之混 合物，採用如在實施例1中相同方法中的處理以製備預分 散液（Β1)。 然後，取100重量份的the預分散液（Β1)，10重量 φ 份的甲基丙烯酸/N-苯基順式丁烯二醯亞胺/ α -甲基苯乙烯 /甲基丙烯酸苄酯共聚物（共聚合重量比=20/25/25/30，Mw ;=43,000，Μη = 21,000)作爲鹼可溶的樹脂（C)、20重量份 _ 的六丙烯酸二季戊四醇酯作爲多官能基單體（D)，5重量份 的2·甲基-(4-甲基苯硫基）-2-嗎福啉基-1丙酮-1作爲光聚 合起始劑（E)及30重量份的乙酸3-甲基-3·甲氧基丁酯及 80重量份的丙二醇單乙醚乙酸酯作爲溶劑（F)，混合在一 起，以製備輻射敏感性組合物。 ，43 - (40) 1358611 - 實施例4 - 採用如在實施例1中相同方法製備一種輻射敏感性組 、 合物’除了在初步分散步驟中使用6重量份的甲基丙烯酸 /N-苯基順式丁烯二醯亞胺/苯乙烯/甲基丙烯酸正丁酯共聚 ». 物（共聚合重量比=20/30/20/30，Mw = 8，000，Μη = 4，000)’而代替6重量份的鹼可溶的樹脂（C);且在預分散 液（R1)混合步驟中使用5重量份的甲基丙烯酸/N-苯基順式 φ 丁烯二醯亞胺/苯乙烯/甲基丙烯酸2 -乙基己酯共聚物（共聚 合重量比=20/30/20/30，Mw = 14,000，Μη = 6,500),代 替5重量份的鹼可溶的樹脂（〇。 比較例1 採用如在實施例1中相同方法製備一種輻射敏感性組 合物，除了使用2.5重量份的SOLSPARSE S24000(胺値= 50’酸値=25)，代替5重量份的Disperbyk-2001，作爲針 φ 對預分散液（R1)的分散劑（B)。 比較例2 採用如在實施例1中相同方法製備一種輻射敏感性組 合物’，除了使用甲基丙烯酸/甲基丙烯酸苄酯共聚物（共.聚 合重量比=25/75，Mw = 13,000，Μη = 6,500)，代替甲基 丙烯酸/Ν-苯基順式丁烯二醯亞胺/苯乙烯/甲基丙烯酸苄酯 之共聚物作爲針對預分散液（R1)的鹼可溶的樹脂（C)，且使 用甲基丙烯酸/2·甲基丙烯酸羥乙酯/甲基丙烯酸苄酯共聚 -44 - <：y (41) 1358611 物（共聚合重量比=15/15/70，Mw = 16,000，Μη = 7,500) ’代替甲基丙烯酸/單（2 -甲基丙烯醯氧基乙基）琥珀酸酯 /N·苯基順式丁烯二醯亞胺/苯乙烯/甲基丙烯酸苄酯之共聚 物作爲鹼可溶的樹脂（C)。 比較例3 採用如在實施例2中相同方法製備一種輻射敏感性組 # 合物’除了使用7.5重量份（約3.35重量份，就固含量而 言）的Disperbyk-182(胺値=14，酸値=〇，固體濃度=44.6 wt%) ’代替7.5重量份的Disperbyk-2001而作爲針對預分 散液（G1)的分散劑（B)。 比較例4 採用如在實施例2中相同方法製備一種輻射敏感性組 合物，除了使用甲基丙烯酸/ ω-羧基聚己內酯單丙烯酸酯/ # 苯乙烯/甲基丙烯酸苄酯/甘油單甲基丙烯酸酯共聚物（共聚 合重量比=1 5/ 1 5/20/3 5/ 1 5，Mw = 1 5,500，Μη = 6,5 00)， 代替甲基丙烯酸/ω-羧基二己內酯單丙烯酸酯/Ν-苯基順式 丁烯二醯亞胺/苯乙烯/甲基丙烯酸爷酯/甘油單甲基丙烯酸 酯之共聚物作爲針對預分散液（G1)之鹼可溶的樹脂（C); 且使用甲基丙烯酸/甲基丙烯酸苄酯共聚物（共聚合重量比= 25/75，Mw = 22,000，Μη = 10,000)，代替甲基丙烯酸 /Ν-苯基順式丁烯二醯亞胺/苯乙烯/甲基丙烯酸苄酯/甘油單甲 基丙烯酸酯之共聚物作爲鹼可溶的樹脂（C)。 -45- (42) 1358611 . 比較例5 . 採用如在實施例3中相同方法製備一種輻射敏感性組 " 合物，除了使用4·5重量份的AJISPER-PB-8 2 2(胺値=13 • • ，酸値=16)，代替10重量份的Disperbyk-2001而作爲針 對預分散液（B1)的分散劑（B)。 採用以下方法評估在實施例與比較例中所得到的輻射 敏感性組合物。評估之結果展示於表1。 黏合之評估 製備二片康寧公司的玻璃基材#1737。於使用旋轉塗 覆器將各輻射敏感性組合物施用在各基材表面上之後，將 已塗層的基材於70°C預烘烤3分鐘以形成膜厚在2.5/zm 的塗層。然後，於各基材冷卻至室溫之後，經由光罩，使 用高壓力汞蒸汽燈（亮度：2 5 0 w/m2)，將一片基材上的塗 層膜曝光於紫外線，包含波長3 65 nm、405 nm及43 6 nmExample I 15 parts by weight of a mixture of CI·Pigment Red 254/CI Pigment Red 177 = 8 0/20 (by weight) as pigment (A), 5 parts by weight (about 2.26 parts by weight 'in terms of solid content) Disperbyk-2001 (solid concentration: 45.1 as dispersant (B), 6 parts by weight of methacrylic acid / N_phenyl cis-butenylene imide / styrene / benzyl methacrylate copolymer (copolymerization) Weight ratio = 20/30/20/30, Mw = 9,500, Μη = 5,000) as a soluble resin (C) and 37 parts by weight of propylene glycol monomethyl ether acetate and 37 parts by weight of 3 - Ethyl ethoxypropionate was treated as a solvent (F) in a bead mill to prepare a predispersion (R1). Then, 100 parts by weight of the predispersion (R1), 5 parts by weight of methacrylic acid /mono(2-methylpropenyloxyethyl) succinate / Ν phenyl cis-butenylene diimide / styrene / benzyl methacrylate copolymer (copolymerization weight ratio = 25/10 /30/20/15, Mw = 12,000, Μη = 6,500) as test -41 - (38) 1358611 soluble resin (C), 10 parts by weight of dipentaerythritol hexaacrylate as polyfunctional monomer (D) , 5 parts by weight of 2-methyl-(4-methylthienyl): 2-morphobolinyl-1-propanone-1 as photopolymerization initiator (E) and 70 parts by weight of 3-methoxyacetic acid Butyl ester was mixed as a solvent (F) to prepare a radiation-sensitive composition. Example 2 B 15 parts by weight of CI pigment green 36/CI pigment yellow 138/CI pigment yellow 1 5 0 = 5 0/40 a mixture of /10 (weight ratio) as the pigment (A), 7.5 parts by weight (about 3.38 parts by weight, in terms of solid content) of D.isperbyk-2 00 1 as a dispersing agent (B), 4 parts by weight of A Acrylic acid / ω-carboxydicaprolactone monoacrylate / N-phenyl cis-butenylene diimide / styrene / benzyl methacrylate / glycerol monomethacrylate copolymer (copolymer weight ratio = 15/10/20/10/35/10, Mw = 6,000, Μη = 3,000) as the alkali-soluble resin (C) and 73.5 parts by weight of propylene glycol monomethyl ether acetate φ ester as the solvent (F), The pre-dispersion (G1) was prepared by the same treatment as in Example 1. Then, '1 〇〇 part by weight of the pre-dispersion (G1), 5 parts by weight of methacrylic acid/Ν-phenyl cis was taken. Butene醯imine/styrene/benzyl methacrylate/glycerol monomethacrylate copolymer (copolymerization weight ratio = 1 5/25/ 1 5/3 5/ 1 0, Mw = 1 3, 5 00' Μη = 6, 〇〇〇) as an alkali-soluble resin (C)' 10 parts by weight of hexa-propyl hexanoic acid dipentaerythritol vinegar as a polyfunctional monomer (D) '5 parts by weight of 2·benzyl-2-di Methylamino-fluorene-(I)-morpholinylphenyl)butanone-1 as photopolymerization initiator (Ε) and 70 parts by weight of ethyl 3-ethoxy-42-(39) 1358611-propionate As a solvent (F), they are mixed together to prepare a radiation. Sensitive composition. ·· * Example 3 15 parts by weight of CI Pigment Blue 15/CI Pigment Violet 23 = 90/10 (by weight) as the pigment (A), 10 parts by weight (4.51 parts by weight, in terms of solid content) of Disperbyk -2001 as dispersant (B), 2 parts by weight of φ acrylic acid / N-phenyl cis-butenimide / styrene / phenyl methacrylate / 2 - hydroxyethyl methacrylate / polymethyl Methyl acrylate macromonomer copolymer (copolymerization weight ratio = 15/20/1 0/35/1 0/1 0, Mw = 23,000, Μη = 1 1,000) as alkali-soluble resin (c) And a mixture of 63 parts by weight of propylene glycol monomethyl ether acetate and 10 parts by weight of propylene glycol monomethyl ether as a solvent (F), which was treated in the same manner as in Example 1 to prepare a predispersion liquid (Β1) ). Then, 100 parts by weight of the predispersion (Β1), 10 parts by weight of methacrylic acid/N-phenylcis butylenediamine/α-methylstyrene/benzyl methacrylate copolymerization (copolymerization weight ratio = 20/25/25/30, Mw; = 43,000, Μη = 21,000) as an alkali-soluble resin (C), 20 parts by weight of dipentaerythritol hexaacrylate as a polyfunctional monomer (D) 5 parts by weight of 2·methyl-(4-methylphenylthio)-2-morpholine-1-propanone-1 as a photopolymerization initiator (E) and 30 parts by weight of acetic acid 3 Methyl-3·methoxybutyl ester and 80 parts by weight of propylene glycol monoethyl ether acetate were mixed as a solvent (F) to prepare a radiation-sensitive composition. , 43 - (40) 1358611 - Example 4 - Preparation of a radiation-sensitive group, in the same manner as in Example 1, except that 6 parts by weight of methacrylic acid/N-phenyl group were used in the preliminary dispersion step Co-butenylene diimide/styrene/n-butyl methacrylate copolymerization». (copolymerization weight ratio = 20/30/20/30, Mw = 8,000, Μη = 4,000) Instead of 6 parts by weight of the alkali-soluble resin (C); and 5 parts by weight of methacrylic acid/N-phenyl cis φ butylenediimide/styrene in the pre-dispersion (R1) mixing step / 2-ethylhexyl methacrylate copolymer (copolymerization weight ratio = 20/30/20/30, Mw = 14,000, Μη = 6,500) instead of 5 parts by weight of an alkali-soluble resin (〇. Comparative Example 1 A radiation-sensitive composition was prepared in the same manner as in Example 1, except that 2.5 parts by weight of SOLSPARSE S24000 (amine 値 = 50' acid 値 = 25) was used instead of 5 parts by weight of Disperbyk-2001 as a needle φ. Dispersant (B) to pre-dispersion (R1). Comparative Example 2 A radiation-sensitive composition was prepared in the same manner as in Example 1, except Using methacrylic acid/benzyl methacrylate copolymer (copolymer weight ratio = 25/75, Mw = 13,000, Μη = 6,500) instead of methacrylic acid / fluorene-phenyl cis-butenylene diimide / Copolymer of styrene/benzyl methacrylate as alkali-soluble resin (C) for pre-dispersion (R1), and copolymerization of methacrylic acid/2·hydroxyethyl methacrylate/benzyl methacrylate -44 - <:y (41) 1358611 (copolymerization weight ratio = 15/15/70, Mw = 16,000, Μη = 7,500) 'Replaces methacrylic acid/mono(2-methylpropenyloxyethyl) a copolymer of succinate/N. phenyl cis-butenylene imide/styrene/benzyl methacrylate as the alkali-soluble resin (C). Comparative Example 3 was employed as in Example 2. Method A radiation-sensitive group #Compound' was used except that 7.5 parts by weight (about 3.35 parts by weight, in terms of solid content) of Disperbyk-182 (amine 値 = 14, acid 値 = 〇, solid concentration = 44.6 wt%) was used. 'As a dispersant (B) for the predispersion (G1) instead of 7.5 parts by weight of Disperbyk-2001. Comparative Example 4 The same method as in Example 2 was employed. Preparation of a radiation-sensitive composition, except that methacrylic acid / ω-carboxypolycaprolactone monoacrylate / # styrene / benzyl methacrylate / glycerol monomethacrylate copolymer (copolymer weight ratio = 1) 5/ 1 5/20/3 5/ 1 5, Mw = 1 5,500, Μη = 6,5 00), instead of methacrylic acid / ω-carboxydicaprolactone monoacrylate / Ν-phenyl cis-butene Copolymer of bis-imine/styrene/mythyl methacrylate/glycerol monomethacrylate as alkali-soluble resin (C) for pre-dispersion (G1); and using methacrylic acid/methacrylic acid Benzyl ester copolymer (copolymer weight ratio = 25/75, Mw = 22,000, Μη = 10,000) instead of methacrylic acid / fluorene-phenyl cis-butenylene diimide / styrene / benzyl methacrylate / A copolymer of glycerol monomethacrylate is used as the alkali-soluble resin (C). -45- (42) 1358611. Comparative Example 5. A radiation-sensitive group was prepared in the same manner as in Example 3 except that 4·5 parts by weight of AJISPER-PB-8 2 2 (amine oxime) was used. =13 • •, acid 値 = 16), instead of 10 parts by weight of Disperbyk-2001 as a dispersing agent (B) for the predispersion (B1). The radiation-sensitive compositions obtained in the examples and comparative examples were evaluated by the following methods. The results of the assessment are shown in Table 1. Evaluation of Adhesion Two glass Corning's glass substrate #1737 was prepared. After each radiation-sensitive composition was applied to the surface of each substrate using a spin coater, the coated substrate was prebaked at 70 ° C for 3 minutes to form a coating having a film thickness of 2.5 / zm. Then, after each substrate was cooled to room temperature, the coating film on one of the substrates was exposed to ultraviolet light using a high pressure mercury vapor lamp (brightness: 250 w/m 2 ) via a photomask, including a wavelength of 3 65 . Nm, 405 nm, and 43 6 nm

• ，在曝光劑量爲1，000 J/m2，且將另一基材上的塗層膜它 曝光於相同紫外線，曝光劑量爲5 00 J/m2。然後，於23°C ; 將各基材上的塗層膜沖洗顯影1分鐘，使用JSR公司的 • CD150CR顯影劑（含有〇.〇4 wt%氫氧化鉀）作爲顯影劑，採 Γ 用的顯影劑排放壓力在0.3 MPa(噴嘴直徑：1 .Ornm )，用 超純水輕洗且然後於200°C後烘烤30分鐘，以在各基材上 形成90/210 a m的線與空間條紋狀像素圖案。 經由光學顯微鏡觀察所得到像素圖案。當在像素圖案 之中未觀察到剝落與剝離，圖案評估爲"〇"，且當觀察到 f -46 - (43) 1358611 , 剝落與剝離，圖案評估爲"X"。 A 表面平滑度之評估 * 經由使用Digital Instruments公司的原子力顯微鏡’ 測量且評估上述黏合評估所得到的各像素圖案之上面部分 的的表面粗糙度，一般而言，當表面粗糙在60 A或更低 ，可謂有良好的表面平滑度。 顯影能力之評估 於經由使用旋轉塗覆器將各自輻射敏感性組合物施用 在康寧公司玻璃基材#1737的表面上之後，將此塗層的基 材於90 °C預烘烤3分鐘以形成膜厚在2.5 的塗層。然 後，於基材冷卻至室溫之後，經由光罩，使用高壓力汞蒸 汽燈（亮度：25 0 w/m2)，使用紫外線將塗層膜曝光，波長 包括 365 nm、405 nm 及 436 nm，曝光劑量在 1,000 J/m2 • 。然後，經由使用JSR Corporation的CD150CR顯影劑（ 含有0.04 wt%氫氧化鉀）作爲顯影劑，將塗層膜作沖洗顯 - 影1分鐘，顯影劑排出壓力在0.1 MPa(噴嘴直徑：0.3mm 9 . )，用超純水輕洗且然後於200eC後烘烤30分鐘以在基材 c 上形成90/2 1 0 /z m的線與空間條紋狀像素圖案。 經由光學顯微鏡觀察所得到像素圖案。當在基材上的 未曝光部分未觀察到殘餘物及浮渣，評估爲”〇"，且當有 觀察到殘餘物及浮渣，評估爲"X"。• At an exposure dose of 1,000 J/m2, and the coating film on the other substrate is exposed to the same ultraviolet light at an exposure dose of 500 J/m2. Then, the coating film on each substrate was rinsed and developed at 23 ° C for 1 minute, and the developer of the developer was used using JSR's CD150CR developer (containing 〇.〇4 wt% potassium hydroxide) as a developer. The discharge pressure was 0.3 MPa (nozzle diameter: 1. Ornm), lightly washed with ultrapure water and then baked at 200 ° C for 30 minutes to form a 90/210 am line and space stripe on each substrate. Pixel pattern. The obtained pixel pattern was observed through an optical microscope. When no peeling and peeling were observed in the pixel pattern, the pattern was evaluated as "〇", and when f -46 - (43) 1358611, peeling and peeling were observed, the pattern was evaluated as "X". A. Evaluation of Surface Smoothness* The surface roughness of the upper portion of each pixel pattern obtained by the above-mentioned adhesion evaluation was measured and evaluated by using an atomic force microscope of Digital Instruments, in general, when the surface roughness was 60 A or lower. It has a good surface smoothness. Evaluation of developing ability After applying the respective radiation-sensitive composition to the surface of Corning's glass substrate #1737 by using a spin coater, the coated substrate was prebaked at 90 ° C for 3 minutes to form A coating with a film thickness of 2.5. Then, after the substrate is cooled to room temperature, the coating film is exposed to ultraviolet light using a high pressure mercury vapor lamp (brightness: 25 0 w/m 2 ) via a photomask, and the wavelengths include 365 nm, 405 nm, and 436 nm. The exposure dose is at 1,000 J/m2 • . Then, the coating film was subjected to washing for 1 minute via using a CD150CR developer (containing 0.04 wt% potassium hydroxide) of JSR Corporation as a developer, and the developer discharge pressure was 0.1 MPa (nozzle diameter: 0.3 mm 9 ). ), lightly washed with ultrapure water and then post-baked at 200 eC for 30 minutes to form a line-and-space stripe-like pixel pattern of 90/2 1 0 /zm on the substrate c. The obtained pixel pattern was observed through an optical microscope. When no residue or scum was observed on the unexposed portion of the substrate, it was evaluated as "〇", and when residue and scum were observed, it was evaluated as "X".

-47- (44) 1358611 貯存穩定性之評估： 使用Tokyo Keiki公司的E型黏度計，測量各輻射敏 感性組合物的起始黏度。然後，於取50 g的各輻射敏感 性組合物注入不透明的玻璃容器且在密封的條件下於23 °C 靜置達14天之後，經使用Tokyo Keiki公司的E型黏度 計測量靜置後的組合物之黏度。然後，計算於靜置之後的 黏度對起始黏度改變之速率。當改變速率低於5 % ’評估 爲，，〇"，當改變速率不低於5%且低於1 〇% ’評估爲” △"’ 且當速率改變不低於1 〇%，評估爲"X" °-47- (44) 1358611 Evaluation of storage stability: The initial viscosity of each of the radiation-sensitive compositions was measured using a Tokyo Keiki E-type viscometer. Then, 50 g of each of the radiation-sensitive compositions was poured into an opaque glass container and allowed to stand at 23 ° C for 14 days under sealed conditions, and then measured by a Tokyo Keiki E-type viscometer. The viscosity of the composition. Then, the rate at which the viscosity after the standing is changed to the initial viscosity is calculated. When the rate of change is less than 5% 'evaluated as, 〇", when the rate of change is not less than 5% and less than 1 〇% 'evaluated as △"' and when the rate changes not less than 1 〇%, the evaluation For "X" °

表1Table 1

黏合 表面粗糙度(A) 顯影能力 貯存 曝光劑量 曝光劑量 穩定性 1000 J/m2 500 J/m2 1000 J/m2 500 J/m2 Ex.l 〇 〇 38 50 〇 〇 Ex.2 〇 〇 31 42 〇 〇 Ex.3 〇 〇 22 33 〇 〇 Ex.4 〇 〇 25 36 〇 〇 C.Ex.l 〇 X 65 88 X X C.Ex.2 X X 78 106 X X C.Ex.3 〇 X 67 92 X Δ C.Ex.4 X X 70 97 X X C.Ex.5 X X 45 64 X X E X .:實施例，C . E X ·:比較例 -48-Adhesive surface roughness (A) Developing capacity Storage exposure dose Exposure dose stability 1000 J/m2 500 J/m2 1000 J/m2 500 J/m2 Ex.l 〇〇38 50 〇〇Ex.2 〇〇31 42 〇〇 Ex.3 〇〇22 33 〇〇Ex.4 〇〇25 36 〇〇C.Ex.l 〇X 65 88 XX C.Ex.2 XX 78 106 XX C.Ex.3 〇X 67 92 X Δ C. Ex.4 XX 70 97 XX C.Ex.5 XX 45 64 XXEX .:Example, C. EX ·:Comparative Example-48-

Claims (1)

(1) (1)1358611 十、申請專利範圍 1. 一種彩色濾光器用輻射敏感性組合物，包含： (A) 顏料， (B) 分散劑， (C) 鹼可溶的樹脂，其含有下列各項之共聚物：（cl)含 有羧基基團的不飽和單體且包括（甲基）丙烯酸，（c2)N-位 置經取代的順式丁烯二醯亞胺及，（c3)由下列各者所組成 的類群中所選出的至少一種：苯乙烯、α -甲基苯乙烯、 對-羥基-α-甲基苯乙烯、（甲基）丙烯酸甲酯、（甲基）丙烯 酸正丁酯、（甲基）丙烯酸2-乙基己酯、（甲基）丙烯酸2-羥 乙酯、（甲基）丙烯酸烯丙酯、（甲基）丙烯酸苄酯、甘油單（ 甲基）丙烯酸酯、聚苯乙烯巨單體及聚甲基丙烯酸甲酯巨 單體， (D) 多官能基單體， (Ε)光聚合起始劑，及 (F)溶劑， 該分散劑（Β)包含經由活性陰離子聚合所得到的丙烯 酸系共聚物，且此丙烯酸系共聚物的胺値（單位： mgKOH/g)高於0、酸値（單位：mgKOH/g)高於〇。 2 .—種彩色濾光器用輻射敏感性組合物，包含： (A) 顏料， (B) 分散劑， (C) 鹼可溶的樹脂， (D) 多官能基單體， -49- (2) 1358611 (E) 光聚合起始劑，及 (F) 溶劑， 該分散劑（B)包含經由活性陰離子聚合所得到的丙嫌 酸系共聚物’且此丙嫌酸系共聚物的胺値（單位： mgKOH/g)高於〇、酸値（單位：mgK〇H/g)高於0，且該顏 料（A)係預先分散在含有分散劑（B)、鹼可溶的樹脂（c)及溶 劑（F)的介質中。 3 · 一種彩色濾光器’其係由如申請專利範圍第1或2 項之彩色濾光器用輻射敏感性組合物所形成。 4. 一種液晶顯示器’其具有申請專利範圍第3項之 彩色濾光器。 -50-(1) (1) 1358611 X. Patent application scope 1. A radiation-sensitive composition for a color filter comprising: (A) a pigment, (B) a dispersant, (C) an alkali-soluble resin, which contains the following Copolymers of the following: (cl) unsaturated monomers containing a carboxyl group and including (meth)acrylic acid, (c2) N-position-substituted cis-butenylene diimide, and (c3) by the following At least one selected from the group consisting of: styrene, α-methylstyrene, p-hydroxy-α-methylstyrene, methyl (meth)acrylate, n-butyl (meth)acrylate , 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, glycerol mono(meth)acrylate, Polystyrene macromonomer and polymethyl methacrylate macromonomer, (D) polyfunctional monomer, (Ε) photopolymerization initiator, and (F) solvent, the dispersant (Β) contains activity via An acrylic copolymer obtained by anionic polymerization, and the amine oxime (unit: mgKOH/g) of the acrylic copolymer is higher than 0, Value (unit: mgKOH / g) higher than the square. 2. A radiation-sensitive composition for a color filter comprising: (A) a pigment, (B) a dispersant, (C) an alkali-soluble resin, (D) a polyfunctional monomer, -49- (2 1358611 (E) a photopolymerization initiator, and (F) a solvent, the dispersant (B) comprising an acrylic acid copolymer obtained by living anionic polymerization and an amine oxime of the acrylic acid copolymer Unit: mgKOH/g) higher than hydrazine, acid hydrazine (unit: mgK〇H/g) higher than 0, and the pigment (A) is pre-dispersed in a resin containing a dispersing agent (B) and an alkali-soluble resin (c) And the solvent (F) in the medium. 3. A color filter' which is formed by a radiation-sensitive composition for a color filter as claimed in claim 1 or 2. A liquid crystal display which has the color filter of claim 3 of the patent application. -50-
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Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007163911A (en) * 2005-12-15 2007-06-28 Toyo Ink Mfg Co Ltd Colored composition and color filter
JP2007277502A (en) * 2006-03-13 2007-10-25 Soken Chem & Eng Co Ltd Yellowing-resistant resin and use thereof
JP4745110B2 (en) * 2006-04-19 2011-08-10 東京応化工業株式会社 Photosensitive composition and color filter formed with the photosensitive composition
KR100796517B1 (en) * 2006-07-18 2008-01-21 제일모직주식회사 Photosensitive resin composition for color filter of image sensor and color filter of image sensor using the same
EP2045629B1 (en) * 2006-07-25 2013-09-04 Hitachi Chemical Company, Ltd. Resin composition for optical waveguide, resin film for optical waveguide, and optical waveguide
JP4846484B2 (en) * 2006-08-11 2011-12-28 富士フイルム株式会社 Photocurable coloring composition and color filter using the same
WO2008056750A1 (en) * 2006-11-10 2008-05-15 Showa Highpolymer Co., Ltd. Photosensitive resin composition
JP5056025B2 (en) * 2007-01-22 2012-10-24 Ｊｓｒ株式会社 Radiation sensitive resin composition and color filter
JP2008242081A (en) * 2007-03-27 2008-10-09 Jsr Corp Radiation-sensitive resin composition for colored layer formation, color filter and color liquid crystal display element
KR101424509B1 (en) * 2007-05-22 2014-07-31 주식회사 동진쎄미켐 Organic passivation composition
JP2009025782A (en) * 2007-06-19 2009-02-05 Sakata Corp Pigment dispersed resist composition for color filter
JP2009025783A (en) * 2007-06-19 2009-02-05 Sakata Corp Pigment dispersed resist composition for color filter
JP5298653B2 (en) * 2007-07-06 2013-09-25 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP5638243B2 (en) * 2007-10-09 2014-12-10 昭和電工株式会社 Graft polymer and photosensitive resin composition containing the same
JP5109903B2 (en) * 2007-10-19 2012-12-26 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display device
JP5127651B2 (en) * 2008-09-30 2013-01-23 富士フイルム株式会社 Colored curable composition, color filter, method for producing the same, and solid-state imaging device
CN102875745B (en) * 2011-07-14 2014-07-09 京东方科技集团股份有限公司 Alkali soluble resin, photosensitive resin composition containing it and application thereof
CN102402119B (en) * 2011-11-15 2013-06-26 东南大学 Positive photoresist composition and preparation method thereof
JP6377898B2 (en) * 2013-10-23 2018-08-22 株式会社日本触媒 Resin composition for color filter
JP7203573B2 (en) 2017-11-16 2023-01-13 住友化学株式会社 Blue curable resin composition, blue color filter and display device containing the same
JP7216522B2 (en) * 2017-11-16 2023-02-01 住友化学株式会社 Blue curable resin composition, blue color filter and display device containing the same
JP7299069B2 (en) * 2019-05-29 2023-06-27 サカタインクス株式会社 Pigment dispersion composition for color filter and pigment dispersion resist composition for color filter
CN112210035A (en) * 2020-10-27 2021-01-12 江苏准信自动化科技股份有限公司 Photosensitive resin for color photoresist and preparation method thereof

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3922757B2 (en) 1997-04-24 2007-05-30 三菱化学株式会社 Resist composition for color filter
JP3867177B2 (en) 1997-04-30 2007-01-10 Ｊｓｒ株式会社 Radiation sensitive composition for color filter
JP2000155209A (en) * 1998-11-20 2000-06-06 Jsr Corp Radiation sensitive composition for color filter
JP3940535B2 (en) 1998-11-30 2007-07-04 Ｊｓｒ株式会社 Radiation sensitive composition for black resist
JP2001031900A (en) * 1999-05-20 2001-02-06 Hitachi Maxell Ltd Dispersion composition and its production
JP3726556B2 (en) 1999-05-24 2005-12-14 Ｊｓｒ株式会社 Preparation method of radiation sensitive composition for color filter
JP4805467B2 (en) * 2001-03-15 2011-11-02 日本ペイント株式会社 Ground treatment agent
JP2002365795A (en) 2001-06-06 2002-12-18 Jsr Corp Radiation sensitive composition for color liquid crystal display
WO2003027156A1 (en) * 2001-09-25 2003-04-03 Dainippon Printing Co., Ltd. Alkali-soluble maleimide copolymer and liquid crystal display comprising the same
JP4094857B2 (en) * 2002-01-30 2008-06-04 日本ペイント株式会社 Method for forming coating film using cationic electrodeposition coating composition for intermediate coating
JP4428911B2 (en) * 2002-07-05 2010-03-10 Ｊｓｒ株式会社 Radiation sensitive composition for color filter, color filter and color liquid crystal display element

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