SG115803A1 - Radiation sensitive composition for color filter, color filter, and color liquid crystal display - Google Patents
Radiation sensitive composition for color filter, color filter, and color liquid crystal displayInfo
- Publication number
- SG115803A1 SG115803A1 SG200501868A SG200501868A SG115803A1 SG 115803 A1 SG115803 A1 SG 115803A1 SG 200501868 A SG200501868 A SG 200501868A SG 200501868 A SG200501868 A SG 200501868A SG 115803 A1 SG115803 A1 SG 115803A1
- Authority
- SG
- Singapore
- Prior art keywords
- color filter
- color
- liquid crystal
- crystal display
- radiation sensitive
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004097380 | 2004-03-30 | ||
JP2005016799A JP2005316388A (en) | 2004-03-30 | 2005-01-25 | Radiation sensitive composition for color filter, color filter and color liquid crystal display |
Publications (1)
Publication Number | Publication Date |
---|---|
SG115803A1 true SG115803A1 (en) | 2005-10-28 |
Family
ID=35049757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200501868A SG115803A1 (en) | 2004-03-30 | 2005-03-29 | Radiation sensitive composition for color filter, color filter, and color liquid crystal display |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2005316388A (en) |
KR (1) | KR100887096B1 (en) |
CN (1) | CN100376905C (en) |
SG (1) | SG115803A1 (en) |
TW (1) | TWI358611B (en) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007163911A (en) * | 2005-12-15 | 2007-06-28 | Toyo Ink Mfg Co Ltd | Colored composition and color filter |
JP2007277502A (en) * | 2006-03-13 | 2007-10-25 | Soken Chem & Eng Co Ltd | Yellowing-resistant resin and use thereof |
JP4745110B2 (en) * | 2006-04-19 | 2011-08-10 | 東京応化工業株式会社 | Photosensitive composition and color filter formed with the photosensitive composition |
KR100796517B1 (en) * | 2006-07-18 | 2008-01-21 | 제일모직주식회사 | Photosensitive resin composition for color filter of image sensor and color filter of image sensor using the same |
EP2045629B1 (en) * | 2006-07-25 | 2013-09-04 | Hitachi Chemical Company, Ltd. | Resin composition for optical waveguide, resin film for optical waveguide, and optical waveguide |
JP4846484B2 (en) * | 2006-08-11 | 2011-12-28 | 富士フイルム株式会社 | Photocurable coloring composition and color filter using the same |
CN101517486B (en) * | 2006-11-10 | 2012-06-27 | 昭和电工株式会社 | Photosensitive resin composition |
JP5056025B2 (en) * | 2007-01-22 | 2012-10-24 | Jsr株式会社 | Radiation sensitive resin composition and color filter |
JP2008242081A (en) * | 2007-03-27 | 2008-10-09 | Jsr Corp | Radiation-sensitive resin composition for colored layer formation, color filter and color liquid crystal display element |
KR101424509B1 (en) * | 2007-05-22 | 2014-07-31 | 주식회사 동진쎄미켐 | Organic passivation composition |
JP2009025782A (en) * | 2007-06-19 | 2009-02-05 | Sakata Corp | Pigment dispersed resist composition for color filter |
JP2009025783A (en) * | 2007-06-19 | 2009-02-05 | Sakata Corp | Pigment dispersed resist composition for color filter |
JP5298653B2 (en) * | 2007-07-06 | 2013-09-25 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
KR101473511B1 (en) * | 2007-10-09 | 2014-12-16 | 쇼와 덴코 가부시키가이샤 | Photosensitive graft polymer, and photosensitive resin composition comprising the same |
JP5109903B2 (en) * | 2007-10-19 | 2012-12-26 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display device |
JP5127651B2 (en) * | 2008-09-30 | 2013-01-23 | 富士フイルム株式会社 | Colored curable composition, color filter, method for producing the same, and solid-state imaging device |
CN102875745B (en) | 2011-07-14 | 2014-07-09 | 京东方科技集团股份有限公司 | Alkali soluble resin, photosensitive resin composition containing it and application thereof |
CN102402119B (en) * | 2011-11-15 | 2013-06-26 | 东南大学 | Positive photoresist composition and preparation method thereof |
JP6377898B2 (en) * | 2013-10-23 | 2018-08-22 | 株式会社日本触媒 | Resin composition for color filter |
JP7216522B2 (en) * | 2017-11-16 | 2023-02-01 | 住友化学株式会社 | Blue curable resin composition, blue color filter and display device containing the same |
JP7203573B2 (en) * | 2017-11-16 | 2023-01-13 | 住友化学株式会社 | Blue curable resin composition, blue color filter and display device containing the same |
JP7299069B2 (en) * | 2019-05-29 | 2023-06-27 | サカタインクス株式会社 | Pigment dispersion composition for color filter and pigment dispersion resist composition for color filter |
CN112210035A (en) * | 2020-10-27 | 2021-01-12 | 江苏准信自动化科技股份有限公司 | Photosensitive resin for color photoresist and preparation method thereof |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3922757B2 (en) | 1997-04-24 | 2007-05-30 | 三菱化学株式会社 | Resist composition for color filter |
JP3867177B2 (en) | 1997-04-30 | 2007-01-10 | Jsr株式会社 | Radiation sensitive composition for color filter |
JP2000155209A (en) * | 1998-11-20 | 2000-06-06 | Jsr Corp | Radiation sensitive composition for color filter |
JP3940535B2 (en) | 1998-11-30 | 2007-07-04 | Jsr株式会社 | Radiation sensitive composition for black resist |
JP2001031900A (en) * | 1999-05-20 | 2001-02-06 | Hitachi Maxell Ltd | Dispersion composition and its production |
JP3726556B2 (en) | 1999-05-24 | 2005-12-14 | Jsr株式会社 | Preparation method of radiation sensitive composition for color filter |
JP4805467B2 (en) * | 2001-03-15 | 2011-11-02 | 日本ペイント株式会社 | Ground treatment agent |
JP2002365795A (en) | 2001-06-06 | 2002-12-18 | Jsr Corp | Radiation sensitive composition for color liquid crystal display |
US7371783B2 (en) * | 2001-09-25 | 2008-05-13 | Nippon Shokubai Co., Ltd. | Alkali-soluble maleimide copolymer and liquid crystal display comprising the same |
JP4094857B2 (en) * | 2002-01-30 | 2008-06-04 | 日本ペイント株式会社 | Method for forming coating film using cationic electrodeposition coating composition for intermediate coating |
JP4428911B2 (en) * | 2002-07-05 | 2010-03-10 | Jsr株式会社 | Radiation sensitive composition for color filter, color filter and color liquid crystal display element |
-
2005
- 2005-01-25 JP JP2005016799A patent/JP2005316388A/en not_active Withdrawn
- 2005-03-29 KR KR1020050025907A patent/KR100887096B1/en active IP Right Grant
- 2005-03-29 TW TW094109806A patent/TWI358611B/en not_active IP Right Cessation
- 2005-03-29 SG SG200501868A patent/SG115803A1/en unknown
- 2005-03-30 CN CNB2005100627042A patent/CN100376905C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN100376905C (en) | 2008-03-26 |
TWI358611B (en) | 2012-02-21 |
CN1677138A (en) | 2005-10-05 |
JP2005316388A (en) | 2005-11-10 |
KR20060044916A (en) | 2006-05-16 |
TW200540566A (en) | 2005-12-16 |
KR100887096B1 (en) | 2009-03-04 |
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