TWI352605B - - Google Patents

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Publication number
TWI352605B
TWI352605B TW097101237A TW97101237A TWI352605B TW I352605 B TWI352605 B TW I352605B TW 097101237 A TW097101237 A TW 097101237A TW 97101237 A TW97101237 A TW 97101237A TW I352605 B TWI352605 B TW I352605B
Authority
TW
Taiwan
Prior art keywords
charged particle
proton
particle beam
irradiation
axis direction
Prior art date
Application number
TW097101237A
Other languages
English (en)
Chinese (zh)
Other versions
TW200836792A (en
Inventor
Teiji Nishio
Takashi Ogino
Kazuhiro Nomura
Toshiki Tachikawa
Original Assignee
Nat Cancer Ct
Sumitomo Heavy Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nat Cancer Ct, Sumitomo Heavy Industries filed Critical Nat Cancer Ct
Publication of TW200836792A publication Critical patent/TW200836792A/zh
Application granted granted Critical
Publication of TWI352605B publication Critical patent/TWI352605B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • A61N5/1042—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy with spatial modulation of the radiation beam within the treatment head
    • A61N5/1043—Scanning the radiation beam, e.g. spot scanning or raster scanning
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • A61N5/1077—Beam delivery systems
    • A61N5/1079—Sharing a beam by multiple treatment stations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G03F5/02—Screening processes; Screens therefor by projection methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
TW097101237A 2007-01-18 2008-01-11 Irradiation apparatus of charged particle ray TW200836792A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007009524A JP4797140B2 (ja) 2007-01-18 2007-01-18 荷電粒子線照射装置

Publications (2)

Publication Number Publication Date
TW200836792A TW200836792A (en) 2008-09-16
TWI352605B true TWI352605B (ja) 2011-11-21

Family

ID=39700797

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097101237A TW200836792A (en) 2007-01-18 2008-01-11 Irradiation apparatus of charged particle ray

Country Status (4)

Country Link
JP (1) JP4797140B2 (ja)
KR (1) KR100960823B1 (ja)
CN (1) CN101224324B (ja)
TW (1) TW200836792A (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8581196B2 (en) 2008-08-01 2013-11-12 National Institute Of Radiological Sciences Detector-shift type combined radiation therapy/PET apparatus
US8461539B2 (en) 2008-08-01 2013-06-11 National Institute Of Radiological Sciences Combined radiation therapy/pet apparatus
JP5286004B2 (ja) 2008-09-12 2013-09-11 株式会社日立ハイテクノロジーズ 基板の検査装置、および、基板の検査方法
JP5120459B2 (ja) * 2008-10-23 2013-01-16 株式会社島津製作所 粒子線治療装置
JP5339592B2 (ja) * 2009-01-28 2013-11-13 独立行政法人国立がん研究センター 陽子線治療におけるポジトロン放出核種のアクティビティ分布のシミュレーション方法
KR101127680B1 (ko) * 2009-09-08 2012-03-23 중앙대학교 산학협력단 도넛형 코일을 이용한 하전입자 빔 단층촬영 장치 및 방법
JP5748153B2 (ja) 2009-10-23 2015-07-15 イオンビーム アプリケーションズ， エス．エー． 粒子線治療で使用するビーム分析器を備えるガントリ
JP5638606B2 (ja) * 2010-12-27 2014-12-10 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム
JP5726541B2 (ja) * 2011-01-18 2015-06-03 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム
US8809815B2 (en) * 2011-04-25 2014-08-19 Mitsubishi Electric Corporation Particle-beam energy changing apparatus, particle beam therapy system including the same, and method of changing particle beam energy
JP5701671B2 (ja) * 2011-04-27 2015-04-15 住友重機械工業株式会社 荷電粒子線照射装置
JP5726644B2 (ja) * 2011-06-06 2015-06-03 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子線照射システム
JP2012254146A (ja) * 2011-06-08 2012-12-27 Hitachi Ltd 荷電粒子ビーム照射システム
JP6587826B2 (ja) * 2015-05-14 2019-10-09 株式会社日立製作所 粒子線照射システム
CN105251138B (zh) * 2015-11-13 2018-03-13 上海艾普强粒子设备有限公司 一种粒子照射装置以及包括该装置的粒子治疗系统
CN105797282B (zh) * 2016-03-07 2018-09-04 上海艾普强粒子设备有限公司 一种粒子照射装置以及包括该装置的粒子治疗系统
WO2017214902A1 (zh) * 2016-06-15 2017-12-21 深圳市奥沃医学新技术发展有限公司 肿瘤位置的追踪方法及放射治疗设备
JP6594835B2 (ja) * 2016-09-02 2019-10-23 住友重機械工業株式会社 荷電粒子線治療装置、及びリッジフィルタ

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8900575A (nl) * 1989-03-09 1990-10-01 Philips Nv Roentgenonderzoek apparaat.
JP3142612B2 (ja) 1991-07-05 2001-03-07 栄胤 池上 固体の表面物性を探査する方法および走査クラスター顕微鏡
EP1358657A1 (en) * 2001-02-06 2003-11-05 Gesellschaft für Schwerionenforschung mbH Gantry system for transport and delivery of a high energy ion beam in a heavy ion cancer therapy facility
EP1347309A3 (en) * 2002-03-20 2012-04-18 Hitachi, Ltd. Radiological imaging apparatus and method
JP3673791B2 (ja) * 2002-05-22 2005-07-20 キヤノン株式会社 放射線撮影装置及び放射線撮影方法
JP4464612B2 (ja) * 2003-02-12 2010-05-19 株式会社島津製作所 放射線撮像装置
JP4352841B2 (ja) 2003-10-02 2009-10-28 株式会社島津製作所 放射線検出器、および、ｒｉイメージング装置
JP2005185718A (ja) * 2003-12-26 2005-07-14 Ge Medical Systems Global Technology Co Llc 放射線断層撮像装置および撮像方法
JP4071765B2 (ja) * 2004-12-10 2008-04-02 株式会社東芝 核医学診断装置
JP2006021046A (ja) * 2005-07-05 2006-01-26 Mitsubishi Heavy Ind Ltd 放射線治療装置

Also Published As

Publication number Publication date
CN101224324A (zh) 2008-07-23
CN101224324B (zh) 2012-10-10
TW200836792A (en) 2008-09-16
JP2008173297A (ja) 2008-07-31
KR20080068594A (ko) 2008-07-23
JP4797140B2 (ja) 2011-10-19
KR100960823B1 (ko) 2010-06-07

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