JP4797140B2 - 荷電粒子線照射装置 - Google Patents
荷電粒子線照射装置 Download PDFInfo
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- JP4797140B2 JP4797140B2 JP2007009524A JP2007009524A JP4797140B2 JP 4797140 B2 JP4797140 B2 JP 4797140B2 JP 2007009524 A JP2007009524 A JP 2007009524A JP 2007009524 A JP2007009524 A JP 2007009524A JP 4797140 B2 JP4797140 B2 JP 4797140B2
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N5/00—Radiation therapy
- A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
- A61N5/1042—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy with spatial modulation of the radiation beam within the treatment head
- A61N5/1043—Scanning the radiation beam, e.g. spot scanning or raster scanning
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N5/00—Radiation therapy
- A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
- A61N5/1077—Beam delivery systems
- A61N5/1079—Sharing a beam by multiple treatment stations
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F5/00—Screening processes; Screens therefor
- G03F5/02—Screening processes; Screens therefor by projection methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Description
Claims (6)
- 荷電粒子線が照射される被照射体の回りに回転可能な荷電粒子線照射部を有する照射室を備えた荷電粒子線照射装置において、
前記被照射体を挟んで両側に配置されて、前記荷電粒子線が照射されることで前記被照射体にて生成された消滅γ線を検出する一対の検出部を備え、
前記荷電粒子線照射部の回転中心軸の延在する方向をX軸方向とし、
前記検出部は、前記X軸方向に移動可能とされていると共に、前記照射室を構成する背面パネルの背面側に収納可能とされていることを特徴とする荷電粒子線照射装置。 - 前記検出部は、前記X軸回りに回転可能とされていることを特徴とする請求項1記載の荷電粒子線照射装置。
- 前記検出部は、前記荷電粒子線照射部の回転に追従して回転することを特徴とする請求項2記載の荷電粒子線照射装置。
- 前記検出部は、前記荷電粒子線照射部と一体として回転することを特徴とする請求項3記載の荷電粒子線照射装置。
- 前記検出部は、互いに接近する方向に移動可能とされていることを特徴とする請求項1〜4の何れか一項に記載の荷電粒子線照射装置。
- 前記X軸方向と直交する方向をY軸方向とし、
前記検出部は、前記Y軸回りに回転可能とされていることを特徴とする請求項1〜5の何れか一項に記載の荷電粒子線照射装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007009524A JP4797140B2 (ja) | 2007-01-18 | 2007-01-18 | 荷電粒子線照射装置 |
TW097101237A TW200836792A (en) | 2007-01-18 | 2008-01-11 | Irradiation apparatus of charged particle ray |
KR1020080005786A KR100960823B1 (ko) | 2007-01-18 | 2008-01-18 | 하전입자선 조사장치 |
CN2008100035414A CN101224324B (zh) | 2007-01-18 | 2008-01-18 | 带电粒子线治疗装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007009524A JP4797140B2 (ja) | 2007-01-18 | 2007-01-18 | 荷電粒子線照射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008173297A JP2008173297A (ja) | 2008-07-31 |
JP4797140B2 true JP4797140B2 (ja) | 2011-10-19 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007009524A Active JP4797140B2 (ja) | 2007-01-18 | 2007-01-18 | 荷電粒子線照射装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4797140B2 (ja) |
KR (1) | KR100960823B1 (ja) |
CN (1) | CN101224324B (ja) |
TW (1) | TW200836792A (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010013346A1 (ja) * | 2008-08-01 | 2010-02-04 | 独立行政法人放射線医学総合研究所 | 放射線治療・pet複合装置 |
JP5360914B2 (ja) * | 2008-08-01 | 2013-12-04 | 独立行政法人放射線医学総合研究所 | 検出器シフト型放射線治療・pet複合装置 |
JP5286004B2 (ja) | 2008-09-12 | 2013-09-11 | 株式会社日立ハイテクノロジーズ | 基板の検査装置、および、基板の検査方法 |
JP5120459B2 (ja) * | 2008-10-23 | 2013-01-16 | 株式会社島津製作所 | 粒子線治療装置 |
JP5339592B2 (ja) * | 2009-01-28 | 2013-11-13 | 独立行政法人国立がん研究センター | 陽子線治療におけるポジトロン放出核種のアクティビティ分布のシミュレーション方法 |
KR101127680B1 (ko) * | 2009-09-08 | 2012-03-23 | 중앙대학교 산학협력단 | 도넛형 코일을 이용한 하전입자 빔 단층촬영 장치 및 방법 |
ES2605031T3 (es) | 2009-10-23 | 2017-03-10 | Ion Beam Applications | Pórtico que comprende un analizador de haz para su uso en terapia de partículas |
WO2012090614A1 (ja) * | 2010-12-27 | 2012-07-05 | 住友重機械工業株式会社 | エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム |
JP5726541B2 (ja) * | 2011-01-18 | 2015-06-03 | 住友重機械工業株式会社 | エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム |
CN103492026B (zh) * | 2011-04-25 | 2016-03-23 | 三菱电机株式会社 | 粒子射线能量变更装置、具备该粒子射线能量变更装置的粒子射线治疗装置、以及粒子射线能量变更方法 |
JP5701671B2 (ja) * | 2011-04-27 | 2015-04-15 | 住友重機械工業株式会社 | 荷電粒子線照射装置 |
JP5726644B2 (ja) * | 2011-06-06 | 2015-06-03 | 住友重機械工業株式会社 | エネルギーデグレーダ、及びそれを備えた荷電粒子線照射システム |
JP2012254146A (ja) * | 2011-06-08 | 2012-12-27 | Hitachi Ltd | 荷電粒子ビーム照射システム |
JP6587826B2 (ja) * | 2015-05-14 | 2019-10-09 | 株式会社日立製作所 | 粒子線照射システム |
CN105251138B (zh) * | 2015-11-13 | 2018-03-13 | 上海艾普强粒子设备有限公司 | 一种粒子照射装置以及包括该装置的粒子治疗系统 |
CN105797282B (zh) * | 2016-03-07 | 2018-09-04 | 上海艾普强粒子设备有限公司 | 一种粒子照射装置以及包括该装置的粒子治疗系统 |
CN109310380B (zh) * | 2016-06-15 | 2023-02-28 | 深圳市奥沃医学新技术发展有限公司 | 肿瘤位置的追踪方法及放射治疗设备 |
JP6594835B2 (ja) * | 2016-09-02 | 2019-10-23 | 住友重機械工業株式会社 | 荷電粒子線治療装置、及びリッジフィルタ |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
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NL8900575A (nl) * | 1989-03-09 | 1990-10-01 | Philips Nv | Roentgenonderzoek apparaat. |
JP3142612B2 (ja) | 1991-07-05 | 2001-03-07 | 栄胤 池上 | 固体の表面物性を探査する方法および走査クラスター顕微鏡 |
WO2002063638A1 (en) * | 2001-02-06 | 2002-08-15 | Gesellschaft für Schwerionenforschung mbH | Gantry system for transport and delivery of a high energy ion beam in a heavy ion cancer therapy facility |
EP1347309A3 (en) * | 2002-03-20 | 2012-04-18 | Hitachi, Ltd. | Radiological imaging apparatus and method |
JP3673791B2 (ja) * | 2002-05-22 | 2005-07-20 | キヤノン株式会社 | 放射線撮影装置及び放射線撮影方法 |
JP4464612B2 (ja) * | 2003-02-12 | 2010-05-19 | 株式会社島津製作所 | 放射線撮像装置 |
JP4352841B2 (ja) | 2003-10-02 | 2009-10-28 | 株式会社島津製作所 | 放射線検出器、および、riイメージング装置 |
JP2005185718A (ja) * | 2003-12-26 | 2005-07-14 | Ge Medical Systems Global Technology Co Llc | 放射線断層撮像装置および撮像方法 |
JP4071765B2 (ja) * | 2004-12-10 | 2008-04-02 | 株式会社東芝 | 核医学診断装置 |
JP2006021046A (ja) * | 2005-07-05 | 2006-01-26 | Mitsubishi Heavy Ind Ltd | 放射線治療装置 |
-
2007
- 2007-01-18 JP JP2007009524A patent/JP4797140B2/ja active Active
-
2008
- 2008-01-11 TW TW097101237A patent/TW200836792A/zh unknown
- 2008-01-18 KR KR1020080005786A patent/KR100960823B1/ko active IP Right Grant
- 2008-01-18 CN CN2008100035414A patent/CN101224324B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN101224324A (zh) | 2008-07-23 |
KR100960823B1 (ko) | 2010-06-07 |
CN101224324B (zh) | 2012-10-10 |
TW200836792A (en) | 2008-09-16 |
KR20080068594A (ko) | 2008-07-23 |
TWI352605B (ja) | 2011-11-21 |
JP2008173297A (ja) | 2008-07-31 |
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