TWI347811B - Method and apparatus for accurately applying structures to a substrate - Google Patents

Method and apparatus for accurately applying structures to a substrate

Info

Publication number
TWI347811B
TWI347811B TW099122827A TW99122827A TWI347811B TW I347811 B TWI347811 B TW I347811B TW 099122827 A TW099122827 A TW 099122827A TW 99122827 A TW99122827 A TW 99122827A TW I347811 B TWI347811 B TW I347811B
Authority
TW
Taiwan
Prior art keywords
substrate
provision
processing head
lighting
scanning
Prior art date
Application number
TW099122827A
Other languages
English (en)
Other versions
TW201038160A (en
Inventor
Marinus Franciscus Johanus Evers
Peter Brier
Pau Cornelis Du
Original Assignee
Otb Solar Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otb Solar Bv filed Critical Otb Solar Bv
Publication of TW201038160A publication Critical patent/TW201038160A/zh
Application granted granted Critical
Publication of TWI347811B publication Critical patent/TWI347811B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J11/00—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
    • B41J11/0015—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H10K71/611—Forming conductive regions or layers, e.g. electrodes using printing deposition, e.g. ink jet printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16—Inspection; Monitoring; Aligning
    • H05K2203/163—Monitoring a manufacturing process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Electroluminescent Light Sources (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW099122827A 2004-04-23 2005-04-25 Method and apparatus for accurately applying structures to a substrate TWI347811B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1026013A NL1026013C2 (nl) 2004-04-23 2004-04-23 Werkwijze en inrichting voor het nauwkeurig aanbrengen van structuren op een substraat.
NL1026880A NL1026880C1 (nl) 2004-04-23 2004-08-19 Werkwijze en inrichting voor het nauwkeurig aanbrengen van structuren op een substraat.

Publications (2)

Publication Number Publication Date
TW201038160A TW201038160A (en) 2010-10-16
TWI347811B true TWI347811B (en) 2011-08-21

Family

ID=34965607

Family Applications (2)

Application Number Title Priority Date Filing Date
TW099122827A TWI347811B (en) 2004-04-23 2005-04-25 Method and apparatus for accurately applying structures to a substrate
TW094113134A TWI332811B (en) 2004-04-23 2005-04-25 Method and apparatus for accurately applying structures to a substrate

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW094113134A TWI332811B (en) 2004-04-23 2005-04-25 Method and apparatus for accurately applying structures to a substrate

Country Status (11)

Country Link
US (1) US8231931B2 (zh)
EP (2) EP1757175B1 (zh)
JP (1) JP2007534170A (zh)
KR (1) KR101157286B1 (zh)
CN (2) CN1947479B (zh)
AT (2) ATE533340T1 (zh)
DE (1) DE602005019403D1 (zh)
ES (1) ES2339572T3 (zh)
NL (2) NL1026013C2 (zh)
TW (2) TWI347811B (zh)
WO (1) WO2005104637A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110148985A1 (en) * 2009-12-23 2011-06-23 Ulvac, Inc. Parallel motion system for industrial printing
CN102120387B (zh) * 2010-01-08 2013-05-08 广东正业科技股份有限公司 全印制电子及电路板喷墨打印设备
KR20140112605A (ko) * 2013-03-11 2014-09-24 삼성디스플레이 주식회사 유기 패턴 검사 방법
ES2927206T3 (es) 2017-04-28 2022-11-03 ACTEGA Schmid Rhyner AG Dispositivo y procedimiento para la generación de un revestimiento texturizado

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3832176A (en) 1973-04-06 1974-08-27 Eastman Kodak Co Novel photoresist article and process for its use
US4674174A (en) 1984-10-17 1987-06-23 Kabushiki Kaisha Toshiba Method for forming a conductor pattern using lift-off
US5932012A (en) * 1995-06-23 1999-08-03 Hitachi Techno Engineering Co., Ltd. Paste applicator having positioning means
US6354700B1 (en) * 1997-02-21 2002-03-12 Ncr Corporation Two-stage printing process and apparatus for radiant energy cured ink
JP4003273B2 (ja) * 1998-01-19 2007-11-07 セイコーエプソン株式会社 パターン形成方法および基板製造装置
GB2350321A (en) * 1999-05-27 2000-11-29 Patterning Technologies Ltd Method of forming a masking or spacer pattern on a substrate using inkjet droplet deposition
US6165658A (en) * 1999-07-06 2000-12-26 Creo Ltd. Nonlinear image distortion correction in printed circuit board manufacturing
JP2001337461A (ja) 2000-05-25 2001-12-07 Dainippon Screen Mfg Co Ltd 描画装置
EP1223615A1 (en) * 2001-01-10 2002-07-17 Eidgenössische Technische Hochschule Zürich A method for producing a structure using nanoparticles
AU2002314894A1 (en) * 2001-06-01 2002-12-16 Oleg Gratchev Temperature controlled vacuum chuck
US20020192577A1 (en) * 2001-06-15 2002-12-19 Bernard Fay Automated overlay metrology system
JP2003156853A (ja) * 2001-11-20 2003-05-30 Pentax Corp 露光装置および露光方法
ITUD20010220A1 (it) * 2001-12-27 2003-06-27 New System Srl Sistema per la realizzazione di una stratificazione di materiale elettronicamente interattivo
JP2004012902A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 描画装置及びこの描画装置を用いた描画方法
JP2004126181A (ja) 2002-10-02 2004-04-22 Fuji Photo Film Co Ltd 露光システム

Also Published As

Publication number Publication date
EP2178352A2 (en) 2010-04-21
NL1026013C2 (nl) 2005-10-25
TW200610465A (en) 2006-03-16
US20080158282A1 (en) 2008-07-03
ES2339572T3 (es) 2010-05-21
DE602005019403D1 (de) 2010-04-01
ATE533340T1 (de) 2011-11-15
KR20070046026A (ko) 2007-05-02
NL1026880C1 (nl) 2005-10-25
US8231931B2 (en) 2012-07-31
CN102933038A (zh) 2013-02-13
CN102933038B (zh) 2016-08-31
TW201038160A (en) 2010-10-16
ATE458388T1 (de) 2010-03-15
EP2178352B1 (en) 2011-11-09
CN1947479A (zh) 2007-04-11
CN1947479B (zh) 2013-04-03
TWI332811B (en) 2010-11-01
KR101157286B1 (ko) 2012-06-15
EP2178352A3 (en) 2010-09-08
EP1757175A1 (en) 2007-02-28
WO2005104637A1 (en) 2005-11-03
EP1757175B1 (en) 2010-02-17
JP2007534170A (ja) 2007-11-22

Similar Documents

Publication Publication Date Title
ATE433134T1 (de) Imprint-lithographieverfahren, gerät hierfür, sowie verfahren zur herstellung eines halbleiterchips
DE50214678D1 (de) Verfahren zum herstellen von lumineszensdioden mit lichtleitenden körpern in zwei zeitlich getrennten stufen
AU2003265308A1 (en) Method and apparatus for using light emitting diodes for curing
EP2584408A3 (en) Imprint method and imprint apparatus
WO2004093141A3 (en) Methods for producing light emitting device
AU2003298561A1 (en) Method and apparatus for using light emitting diodes
TWI256139B (en) Method and apparatus for fabricating flat panel display
AU2003270334A1 (en) Method for producing steel with retained austenite
AU2003211027A1 (en) Method and apparatus for aligning patterns on a substrate
EP1385052A3 (en) Orientation dependent shielding for use with dipole illumination techniques
AU2003205402A1 (en) Method and device for moving and positioning glass plates
EP1295649A3 (en) Repair coating method
TWI347811B (en) Method and apparatus for accurately applying structures to a substrate
AU2003296495A1 (en) Method and apparatus for composing an illumination pattern
ATE553407T1 (de) Vorrichtung und verfahren zum erzeugen eines bildes eines objektes
ATE526176T1 (de) Verfahren zum veredeln einer holzwerkstoffplatte
DK1310381T3 (da) Fremgangsmåde til fremstilling af baneformede materialer med overfladestruktur og et apparat dertil
DE60322391D1 (de) Verfahren zum aufbringen einer haftgrundierung auf ein fenster
DE602005020717D1 (de) Verfahren zur Beschichtung von nanostrukturierte Elektroden
ATE506488T1 (de) Vorrichtung, verfahren und einrichtung zum anheben einer eisenbahnschiene
GB0125133D0 (en) Methods of patterning a monlayer
WO2003107454A3 (de) Material für eine dünne und niedrig leitfähige funktionsschicht für eine oled und herstellungsverfahren dazu
DE10394070D2 (de) Nanooptisches Farbprägen
TW200607752A (en) A method of creating a patterned monolayer on a surface
TW200619689A (en) Apparatus and methods for curing ink on a substrate using an electron beam

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees