TWI346371B - Sb-based cmos devices - Google Patents

Sb-based cmos devices

Info

Publication number
TWI346371B
TWI346371B TW096140447A TW96140447A TWI346371B TW I346371 B TWI346371 B TW I346371B TW 096140447 A TW096140447 A TW 096140447A TW 96140447 A TW96140447 A TW 96140447A TW I346371 B TWI346371 B TW I346371B
Authority
TW
Taiwan
Prior art keywords
cmos devices
based cmos
devices
cmos
Prior art date
Application number
TW096140447A
Other languages
English (en)
Other versions
TW200834819A (en
Inventor
Mantu K Hudait
Suman Datta
Jack Kavalieros
Mark L Doczy
Robert Chau
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Publication of TW200834819A publication Critical patent/TW200834819A/zh
Application granted granted Critical
Publication of TWI346371B publication Critical patent/TWI346371B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/8252—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/762—Charge transfer devices
    • H01L29/765—Charge-coupled devices
    • H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Thin Film Transistor (AREA)
TW096140447A 2006-11-16 2007-10-26 Sb-based cmos devices TWI346371B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/560,494 US7429747B2 (en) 2006-11-16 2006-11-16 Sb-based CMOS devices

Publications (2)

Publication Number Publication Date
TW200834819A TW200834819A (en) 2008-08-16
TWI346371B true TWI346371B (en) 2011-08-01

Family

ID=39416062

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096140447A TWI346371B (en) 2006-11-16 2007-10-26 Sb-based cmos devices

Country Status (8)

Country Link
US (1) US7429747B2 (zh)
JP (1) JP5112445B2 (zh)
KR (1) KR101061682B1 (zh)
CN (1) CN101536167B (zh)
DE (1) DE112007002737B4 (zh)
RU (1) RU2419916C2 (zh)
TW (1) TWI346371B (zh)
WO (1) WO2008063824A1 (zh)

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US7713803B2 (en) * 2007-03-29 2010-05-11 Intel Corporation Mechanism for forming a remote delta doping layer of a quantum well structure
US7687799B2 (en) * 2008-06-19 2010-03-30 Intel Corporation Methods of forming buffer layer architecture on silicon and structures formed thereby
US20100148153A1 (en) * 2008-12-16 2010-06-17 Hudait Mantu K Group III-V devices with delta-doped layer under channel region
US8115235B2 (en) * 2009-02-20 2012-02-14 Intel Corporation Modulation-doped halo in quantum well field-effect transistors, apparatus made therewith, and methods of using same
US8080820B2 (en) * 2009-03-16 2011-12-20 Intel Corporation Apparatus and methods for improving parallel conduction in a quantum well device
GB2469450A (en) * 2009-04-14 2010-10-20 Qinetiq Ltd Uniaxial Tensile Strain in Semiconductor Devices
GB2469448A (en) * 2009-04-14 2010-10-20 Qinetiq Ltd Strain Control in Semiconductor Devices
KR20120081072A (ko) * 2009-09-07 2012-07-18 스미또모 가가꾸 가부시키가이샤 전계 효과 트랜지스터, 반도체 기판, 전계 효과 트랜지스터의 제조 방법, 및 반도체 기판의 제조 방법
US8440998B2 (en) 2009-12-21 2013-05-14 Intel Corporation Increasing carrier injection velocity for integrated circuit devices
US7892902B1 (en) 2009-12-22 2011-02-22 Intel Corporation Group III-V devices with multiple spacer layers
US8283653B2 (en) 2009-12-23 2012-10-09 Intel Corporation Non-planar germanium quantum well devices
US8368052B2 (en) 2009-12-23 2013-02-05 Intel Corporation Techniques for forming contacts to quantum well transistors
US8633470B2 (en) * 2009-12-23 2014-01-21 Intel Corporation Techniques and configurations to impart strain to integrated circuit devices
US8193523B2 (en) 2009-12-30 2012-06-05 Intel Corporation Germanium-based quantum well devices
US8253167B2 (en) * 2010-01-26 2012-08-28 Taiwan Semiconductor Manufacturing Company, Ltd. Method for forming antimony-based FETs monolithically
US8461664B2 (en) 2010-06-02 2013-06-11 The United States Of America, As Represented By The Secretary Of The Navy N- and p-channel field-effect transistors with single quantum well for complementary circuits
US8933488B2 (en) * 2010-12-03 2015-01-13 The Board Of Trustees Of The Leland Stanford Junior Univerity Heterostructure field effect transistor with same channel and barrier configuration for PMOS and NMOS
US20120292663A1 (en) * 2011-05-19 2012-11-22 National Central University Structure and Method for Monolithically Fabrication Sb-Based E/D Mode MISFETs
CN102931193A (zh) * 2012-11-23 2013-02-13 中国科学院微电子研究所 一种高迁移率cmos集成单元
US20140158976A1 (en) * 2012-12-06 2014-06-12 Sansaptak DASGUPTA Iii-n semiconductor-on-silicon structures and techniques
US9412871B2 (en) 2013-03-08 2016-08-09 Taiwan Semiconductor Manufacturing Company, Ltd. FinFET with channel backside passivation layer device and method
US8884265B2 (en) 2013-03-13 2014-11-11 The United States Of America, As Represented By The Secretary Of The Navy Strained InGaAs quantum wells for complementary transistors
US9236444B2 (en) * 2013-05-03 2016-01-12 Samsung Electronics Co., Ltd. Methods of fabricating quantum well field effect transistors having multiple delta doped layers
US9337109B2 (en) 2013-05-24 2016-05-10 Taiwan Semiconductor Manufacturing Company, Ltd. Multi-threshold voltage FETs
US9385224B2 (en) * 2014-08-13 2016-07-05 Northrop Grumman Systems Corporation Method of forming an integrated multichannel device and single channel device structure
US9240454B1 (en) * 2014-10-22 2016-01-19 Stmicroelectronics, Inc. Integrated circuit including a liner silicide with low contact resistance
KR101959378B1 (ko) 2016-08-26 2019-03-19 한국과학기술연구원 3족-5족 화합물 반도체 소자 제조 방법 및 그 반도체 소자
US11251270B2 (en) * 2017-08-02 2022-02-15 Faquir Chand Jain Quantum dot channel (QDC) quantum dot gate transistors, memories and other devices
KR102060383B1 (ko) 2018-02-23 2019-12-30 한국과학기술연구원 3족-5족 화합물 반도체 장치
CN113193041A (zh) * 2021-04-30 2021-07-30 陕西科技大学 一种锑化物量子阱cmos器件的结构及其制备方法

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Also Published As

Publication number Publication date
TW200834819A (en) 2008-08-16
JP5112445B2 (ja) 2013-01-09
WO2008063824A1 (en) 2008-05-29
KR20090076972A (ko) 2009-07-13
RU2419916C2 (ru) 2011-05-27
JP2010509787A (ja) 2010-03-25
KR101061682B1 (ko) 2011-09-01
CN101536167B (zh) 2011-03-30
US20080116485A1 (en) 2008-05-22
RU2009122707A (ru) 2010-12-27
DE112007002737B4 (de) 2017-06-08
DE112007002737T5 (de) 2009-11-19
CN101536167A (zh) 2009-09-16
US7429747B2 (en) 2008-09-30

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