TWI320952B - Sealing part and substrate processing apparatus - Google Patents

Sealing part and substrate processing apparatus Download PDF

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Publication number
TWI320952B
TWI320952B TW095120985A TW95120985A TWI320952B TW I320952 B TWI320952 B TW I320952B TW 095120985 A TW095120985 A TW 095120985A TW 95120985 A TW95120985 A TW 95120985A TW I320952 B TWI320952 B TW I320952B
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Taiwan
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sealing member
vacuum
sealing
radical
processing apparatus
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TW095120985A
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Chinese (zh)
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TW200719406A (en
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Daisuke Hayashi
Akira Muramatsu
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Nihon Valqua Kogyo Kk
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Gasket Seals (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Pressure Vessels And Lids Thereof (AREA)

Description

1320952 (1) 九、發明說明 【發明所屬之技術領域】 本發明有關一密封部件及一基材處理設備， 關一用於基材處理設備之密封部件，該基材處理 應活性氣體形成一電漿及使用該電漿處理一基材 【先前技術】 在如基材之半導體晶圓上施行諸如蝕刻的電 電漿處理設備具有一真空室，該真空室內側之壓 地減少至一真空。該蝕刻法係使用一在該真空室 漿的處理氣體在容置於該真空室中之半導體晶圓 於此一電漿處理設備中，一環形密封部件係用於 空室內側（該真空），並使其與該真空室外部（該） ，（譬如看見美國專利第6，6 6 9,2 2 1號）。特別地 一蝕刻設備當作該電漿處理設備，由於自該電漿 ，該半導體晶圓變熱，且因此一由耐熱之氟代橡 的〇型環被用作該密封部件。 近年來，包含反應活性氣體（例如CxFy氣 C4F8氣體）之混合氣體的蝕刻法已變成主流，該 被用作該處理氣體，以致該鈾刻速率係藉著反應 控制。於此蝕刻法中，當該反應活性氣體變成該 產生可沈積之活性種類、諸如氟自由基。 再者，於使用一反應活性氣體之蝕刻中，反 變得附著至該真空室之內壁。該等附著之反應副 且特別有 設備由反 漿處理之 力可實質 中變成電 上進行。 密封該真 t氣）隔離 是，用於 承接能量 膠所製成 體，諸如 混合氣體 副產物所 電漿時， 應副產物 產物被剝 -4 - (2) (2)1320952 離至變成微粒，該等微粒變得附著至該半導體晶圓上之半 導體裝置，造成該半導體裝置產量中之減少。如此進行乾 洗，以於該電漿處理設備中移去附著之反應副產物。譬如 ’可進行無晶圓乾洗（Wafer-Less Dry Cleaning，下文簡稱 WLDC),其係一乾洗型式。於該WLDC中，該等反應副產 物係藉著由氧氣所產生之氧離子所移去。然而，同時亦產 生氧自由基。 上面之氟代橡膠係藉著自由基（氟自由基及/或氧自由 基）輕易地變薄。於一使用反應活性氣體之電漿處理設備 中，如此使用雙重密封結構，其包括一由設置在該真空側 上之抗自由基的氟樹脂（特別是鐵弗龍（註冊商標））所製成 之0型環密封部件（自由基收集環（Radical Trap Ring，下 文簡稱RTR))，及一由設置在該大氣側上之氟代橡膠（特別 是二氟乙烯型橡膠（FKM)所製成之〇型環。該RTR包括一 鐵弗龍（註冊商標）管，且橡膠充塡進入該管。 根據此一雙重密封結構，該RTR在該等自由基中密 封，以致該等自由基不會由該真空側滲漏，且該氟代橡膠 0型環在該真空室中密封該真空，而與該真空室外部大氣 隔離。用於該雙重密封結構，需要分別用於容置該RTR 及該氟代橡膠◦型環之二密封溝槽，且因此需要一預定之 密封空間。 然而，傳統之電漿處理設備未被設計成可承擔雙重密 封結構之使用，且因此不能確保該預定之密封空間，及如 此於傳統之電漿處理設備中使用如上述的雙重密封結構係 -5- (3) (3)1320952 困難的。特別地是，以一用於接合二管子之KF凸緣接頭 結構（JIS G 5 5 26)，提供二密封溝槽在結構上係不可能的 ，且因此不能使用一如上述之雙重密封結構。 於不能使用雙重密封結構之案例中，使用一由抗自由 基之氟代橡膠（特別是四氟乙烯-全氟乙烯醚橡膠（FFK Μ)所 製成之0型環，但FFKM係很昂貴的，且再者比鐵弗龍（ 註冊商標）具有一較不佳之自由基阻抗性。特別地是，在 近年來，其已變得強烈要求電漿處理設備具有一長壽命， 且因此以FFKM不能確保滿足電漿處理設備使用者之需求 的耐用性。 【發明內容】 本發明之一目的係提供一不貴及能夠確保優異之耐用 性的密封部件及基材處理設備，而不需預定之密封空間， 如用於雙重密封結構將需要者。 爲達成上面之目的，於本發明之第一態樣中，在此於 基材處理設備中提供一密封部件，該基材處理設備具有一 減壓容器，在該減壓容器中存在有一高·彈性聚合材料-侵 蝕之侵蝕物質，且在一容置於該減壓容器中之基材上施行 預定處理，該密封部件密封該減壓容器之一內部，並使其 與該減壓容器外部隔離，該密封部件包含：一第一構件， 其係設置在該減壓容器之一內部側上，且係耐得住該侵鈾 物質：一第二構件，其由設置在該減壓容器的一外部側上 之高彈性聚合材料所製成；及至少一預定空間，其經過彼 -6 - (4) (4)1320952 此分開之至少部份該第一構件及至少部份該第二構件所形 成；其中該第一構件及該第二構件係裝在一起。 根據上面之密封部件’該密封部件具有第一構件，其 係設置在該減壓容器之內部側上，且係耐得住該高-彈性 聚合材料-侵蝕之侵蝕物質；一第二構件，其由設置在該 減壓容器的外部側上之高彈性聚合材料所製成。因此，可 藉著該第一構件防止該第二構件之侵蝕，由此消除使用一 耐得住該侵蝕物質的高彈性聚合材料之需求。再者，該密 封部件具有至少一預定空間，其經過彼此分開之至少部份 該第一構件及至少部份該第二構件所形成。因此，當該第 二構件遭受壓縮變形時’部份該第二構件可進入該預定空 間’由此該第二構件可輕易地遭受該壓縮變形。再者，該 第一構件及該第二構件係裝在一起。因此，該密封部件能 被當作單一本體處理，且再者其尺寸可製成小的。其結果 是，該密封部件不需要一預定密封空間，如用於雙重密封 結構將需要者，該密封部件係不貴的，並可確保絕佳之耐 用性。 較佳地是，該第一構件具有一在該外部側上打開之大 致U形橫截面，且至少部份該第二構件進入該u形橫截面 之開口。 根據上面之密封部件，該第一構件具有一在該外部側 上打開之大致U形橫截面，且至少部份該第二構件進入該 U形橫截面之開口。因此，縱使該第一構件之可恢復性經 過潛變或降伏而減少，可造成該第一構件經過一來自該進 (5) (5)1320952 入之第二構件的彈回力恢復。其結果是，遍及一長時期能 維持耐用性。 更佳地是’該第一構件之U形橫截面在其中具有至少 一彎曲部份。 根據上面之密封部件，該第一構件之u形橫截面在其 中具有至少一彎曲部份。因此’該第一構件能輕易地遭受 壓縮變形。其結果是，能改善該第一構件之以下能力，且 因此可確保絕佳之耐用性’及再者，可減少該第一構件及 該第二構件上之壓縮負載。 又更佳地是，該彎曲部份係一狹窄部份。 根據上面之密封部件’該彎曲部份係一狹窄部份。其 結果是，能可靠地達成上面之較佳態樣的效果。 亦較佳地是，該侵蝕物質係一由反應活性氣體所產生 之活性種類’且該第一構件係由氟樹脂所製成。 根據上面之密封部件’該侵蝕物質係一由反應活性氣 體所產生之活性種類’且該第一構件係由氟樹脂所製成。 此一氟樹脂幾乎不被此一活性種類所侵蝕。其結果是，能 可靠地防止構成該第二構件的高彈性聚合材料被該等活性 種類侵蝕，且因此可確保又更好之耐用性。 更佳地是，該氟樹脂係一選自由聚四氟乙烯、四氟乙 烯/全氟烷二乙烯醚共聚物、四氟乙烯/六氟丙烯共聚物、 四氟乙烯/乙烯共聚物、聚偏二氟乙烯、及聚氯四氟乙烯 所組成之族群者。 根據上面之密封部件’該氟樹脂係一選自由聚四氟乙 -8- (6)1320952 烯、四氟乙烯/全氟烷二乙烯醚共I 烯共聚物、四氟乙烯/乙烯共聚物 氯四氟乙烯所組成之族群者。其結 之材料可輕易及不貴地取得，且因 地製成。 亦更佳地是，該高彈性聚合材 乙烯型橡膠、及四氟乙烯-丙烯型_ 根據上面之密封部件，該高彈 1.1-二氟乙烯型橡膠、及四氟乙烯-群者。其結果是，構成該第二構件 取得，且因此該密封部件可較便宜 較佳地是，該侵蝕物質係一腐 件係由一抗腐蝕之金屬所製成。 根據上面之密封部件，該侵蝕 且該第一構件係由一抗腐蝕之金屬 金屬幾乎不被此一腐蝕性氣體所侵 地防止構成該第二構件的高彈性聚 侵餓，且因此可確保又更好之耐用 更佳地是，該抗腐蝕之金屬係 及鋁所組成之族群者。 根據上面之密封部件，該抗腐 銹鋼、鎳、及鋁所組成之族群者。 構件之材料可輕易及不貴地取得， 便宜地製成。 镜物、四氟乙烯/六氟丙 、聚偏二氟乙烯、及聚 果是，構成該第一構件 此該密封部件可較便宜 料係一選自由1.1-二氟 ;膠所組成之族群者》 性聚合材料係一選自由 丙烯型橡膠所組成之族 之材料可輕易及不貴地 地製成。 蝕性氣體，且該第一構 物質係一腐蝕性氣體， 所製成》此一抗腐鈾之 蝕。其結果是，能可靠 合材料被該腐蝕性氣體 性。 一選自由不銹鋼、鎳、 蝕之金屬係一選自由不 其結果是，構成該第一 且因此該密封部件可較 -9- (7) (7)1320952 亦更佳地是’該高彈性聚合材料係一選自由1.1-二氟 乙烯型橡膠 '及四氟乙烯-丙烯型橡膠所組成之族群者。 根據上面之密封部件’該高彈性聚合材料係一選自由 1.1-二氟乙烯型橡膠、及四讓乙稀-丙嫌型橡膠所組成之族 群者。其結果是’構成該第二構件之材料可輕易及不貴地 取得，且因此該密封部件可較便宜地製成。 較佳地是，該第二構件具有一頸部。 根據上面之密封部件，該第二構件具有一頸部。其結 果是’能改善該第二構件之以下能力，並可因此改善該屏 蔽性能。 爲達成上面之目的，於本發明之第二態樣中，在此提 供一基材處理設備’其包含一減壓容器，在該減壓容器中 存在有一高-彈性聚合材料-侵蝕之侵蝕物質；一處理設備 ，其在一容置於該減壓容器中之基材上施行預定處理；及 一密封部件，其密封該減壓容器之一內部並使其與該減壓 容器外部隔離；其中該密封部件具有一第一構件，其係設 置在該減壓容器之一內部側上，且係耐得住該侵鈾物質； 一第二構件’其由設置在該減壓容器的—外部側上之高彈 性聚合材料所製成；及至少一預定空間，其經過彼此分開 之至少部份該第一構件及至少部份該第二構件所形成，該 第一構件及該第二構件係裝在一起。 根據上面之基材處理設備，可達成關於該第一態樣之 效果。 較佳地是，該第一構件具有一在該外部側上打開之大 -10 - (8) (8)1320952 致U形橫截面，且至少部份該第二構件進入該U形橫截面 之開口。 根據上面之基材處理設備，該第一構件具有一在該外 部側上打開之大致U形橫截面，且至少部份該第二構件進 入該U形橫截面之開口。因此，縱使該第一構件之可恢復 性經過潛變或降伏而減少，可造成該第一構件經過一來自 該進入之第二構件的彈回力恢復。其結果是，遍及一長時 期能維持耐用性。 亦較佳地是，該侵蝕物質係一由反應活性氣體所產生 之活性種類，且該第一構件係由氟樹脂所製成。 根據上面之基材處理設備，該侵蝕物質係一由反應活 性氣體所產生之活性種類，且該第一構件係由氟樹脂所製 成。此一氟樹脂幾乎不被此一活性種類所侵蝕。其結果是 ，能可靠地防止構成該第二構件的高彈性聚合材料被該活 性種類所侵蝕，且因此可確保又更好之耐用性。 較佳地是，該侵蝕物質係一腐蝕性氣體，且該第一·構 件係由一抗腐蝕之金屬所製成。 根據上面之基材處理設備，該侵餓物質係腐融[性氣( 體，且該第一構件係由一抗腐触之金屬所製成。此—抗腐 蝕之金屬幾乎不被此一腐蝕性氣體所侵蝕。其結 可靠地防止構成該第二構件的高彈性聚合材料被胃胃 氣體侵蝕，且因此可確保又更好之耐用性。 本發明之上面之及其他目的、特色、及優點將由 之詳細敘述會同所附圖面變得更明顯。 -11 - 1320952 Ο) 【實施方式】 現在將參考該等圖面詳細敘述本發明，該等圖面顯示 本發明之較佳具體實施例。 首先’將敘述根據本發明之第一具體實施例的密封部 件及基材處理設備。製成該基材處理設備，以便使用一反 應活性氣體在基材上施行預定處理。 圖1係一剖視圖，其根據本發明之第一具體實施例槪 要地顯示一當作該基材處理設備的電漿處理設備之結構。 該電漿處理設備在當作基材的半導體晶圓W上施行反應 性離子軸刻（Reactive Ion Etch，下文簡稱RIE)，且再者製 成該電獎處理設備，使得亦可施行該WLDC。 如圖1所示’該電漿處理設備10具有一圓柱形真空 容器11(減壓容器），且該真空容器11在其中具有一處理 空間S。當作一架台之圓柱形襯托器（susceptor)12係設置 在該真空容器11中，一具有譬如3 00毫米直徑之半導體 晶圓W(下文僅只稱爲“晶圓W”）係安裝在該襯托器上。 該真空容器1 1之內部壁面係覆蓋著一側壁構件45。該側 壁構件45係由鋁所製成，其一表面面朝已塗以諸如氧化 釔（Y2〇3)之陶瓷的處理空間S。再者，該真空容器π電接 地，且該襯托器12係經由一絕緣構件29安裝在該真空容 器11之底部中。 於該電漿處理設備10中，一排氣路徑13係形成於該 真空容器11之內部壁面及該襯托器12的一側面之間，其 用作一流動路徑，而該襯托器12上方之氣體分子係經過 -12- (10) (10)1320952 該流動路徑排出至該真空容器11之外面。沿著該排氣路 徑13局部地設置一防止電漿滲漏之環狀擋板14。於該擋 板14下游，該排氣路徑13中之一空間在該襯托器12下 方迴旋轉向，並與一適應性壓力控制閥（下文稱爲“APC 閥”）15相通’該APC閥係一可變之蝶閥。該APC閥15 係連接至一渦輪分子幫浦（下文稱爲“TMP”）17，其係一 用於經由隔離器16排空之排氣泵，且該TMP 17係經由闕 門VI連接至一乾式幫浦（下文稱爲“ DP”）18，其亦爲一 排氣泵。包含該APC閥15、該隔離器16、該TMP 17、該 閥門VI、及該DP 18之排氣流動路徑（下文稱爲“主要排 氣路線”）’係使用該APC閥15，用於控制該真空容器11 中之高壓，且亦使用該TMP 17及該DP 18，用於將該真 空容器11中之壓力減少至大致真空狀態。 再者’管道19係由該隔離器16及該APC閥15之間 經由閥門V2連接至該DP 18。包含該管道19及該閥門 V2之排氣流動路徑（下文稱爲“旁通路線”）繞過該隔離器 16及該DP 17，且係使用該DP 18，用於粗軋該真空容器 1 1 〇 —下電極高頻電源20係經由一進料桿21及一匹配器 22連接至該襯托器12。該下電極高頻電源20供給預定之 高頻電力至該襯托器12。該襯托器12如此用作一下電極 。該匹配器22減少來自該襯托器的高頻電力之反射， 以便使進入該襯托器12的高頻電力之供給效率最大化。 一包含導電薄膜之盤形ESC電極板23係提供於該襯 -13- (11) (11)1320952 托器12之一上部中。一直流電源24係電連接至該ESC電 極板 23。一晶圓 W經過一莊臣-拉赫比克（Johnsen-Rahbek)力或一庫侖式力被吸引及固持在該襯托器12之一 上表面上，該電力藉著由該直流電源24施加至該ESC電 極板23之一直流電壓所產生。再者，一環狀焦環25係設 在該襯托器12之上部，以便圍繞被吸引及固持在該襯托 器12的上表面上之晶圓W。該焦環25係暴露至該處理空 間S，並使該處理空間S中之電漿集中朝向該晶圓W之表 面，如此改善該RIE之效率。 一環狀冷卻劑室26係設在該襯托器12內部，其譬如 於該襯托器12之一圓周方向中延伸。一冷卻劑、譬如冷 卻水或一 Galden(註冊商標）流體在一預定溫度下經由冷卻 劑管道27由一冷卻器單元（未示出）循環經過該冷卻劑室 26。被吸引及固持在該襯托器12的上表面上之晶圓W的 處理溫度係經過該冷卻劑之溫度所控制。 複數熱傳氣體供給孔洞28係提供於該襯托器12的上 表面之一部份中，該晶圓W被吸引及固持在該上表面（下 文稱爲“吸引表面”）上。該熱傳氣體供給孔洞28係藉著 一設在該襯托器12內側之熱傳送氣體供給管線30連接至 —熱傳氣體供給單元32。該熱傳氣體供給單元32經由該 熱傳氣體供給孔洞28供給當作熱傳氣體之氦氣，並進入 該襯托器1 2的吸引表面及該晶圓W的一背部表面間之間 隙。 複數推桿栓銷33係提供於該襯托器12之吸引表面中 -14- (12) (12)1320952 ，當作舉昇栓銷，並可製成由該襯托器12之上表面突出 。該推桿栓銷33係藉著滾珠螺桿（未示出）連接至一馬達（ 未示出），並可製成經過該馬達之旋轉運動由該襯托器12 之吸引表面突出，該旋轉運動藉著該滾珠螺桿被轉換成線 性運動。當一晶圓W被吸引至及固持在該襯托器12之吸 引表面上時，該推桿栓銷33被安置在該襯托器12內側， 以致該晶圓W可遭受該RIE，且係製成由該襯托器12之 上表面突出，以便當該晶圓W係在已遭受該RIE之後由 該真空容器11送出時，向上舉起該晶圓W離開該襯托器 12 ° 一氣體導入噴射頭34係設置在該真空容器11面朝該 襯托器12之頂板部份。一上電極高頻電源36係經由一匹 配器35連接至該氣體導入噴射頭34。該上電極高頻電源 36供給預定之高頻電力至該氣體導入噴射頭34。該氣體 導入噴射頭34如此用作一上電極。該匹配器35具有一與 稍早敘述的匹配器22類似之功能。 該氣體導入噴射頭34具有一頂板電極板38，在該電 極板中具有大量之氣體孔洞37;及一電極支座39，該頂 板電極板38係可分離地支撐在該電極支座上。一緩衝室 40係設在該電極支座39內部。一處理氣體導入管41係由 一處理氣體供給單元（未示出）連接至該緩衝室40。一管道 絕緣體42係局部地沿著該處理氣體導入管41設置。該管 道絕緣體42係由電絕緣材料所製成，且防止供給至該氣 體導入噴射頭34之高頻電力經由該處理氣體導入管41漏 -15- (13) (13)1320952 電進入該處理氣體供給單元。由該處理氣體導入管41供 給進入該緩衝室40之一處理氣體、譬如當作反應活性氣 體的CxFy氣體及氬（Ar)氣之混合氣體，係藉著該氣體導入 噴射頭34經由該氣體孔洞37供給進入該真空容器n(該 處理空間S)。 該電漿處理設備10具有一設在該真空容器11的上部 中之容器蓋子31。該等容器蓋子31蓋住該氣體導入噴射 頭34。爲由外部密封該真空容器11內部，一 〇型環密封 部件46係提供於該容器蓋子31及該真空容器U之間， 以便圍繞著該氣體導入噴射頭34。 —用於該等晶圓W之轉移通口 43係在該真空容器11 之一側壁中提供於一位置中’該位置在一已由該襯托器12 藉著該推桿栓銷33舉起的晶圓W之高度。一用於打開及 關閉該轉移通口 43之閘閥44係提供於該轉移通口 43中 〇 如上面所述，於供給高頻電力至該電漿處理設備10 的真空容器11中之襯托器12及氣體導入噴射頭34，且如 此施加高頻電力進入該襯托器12及該氣體導入噴射頭34 間之處理空間S時，由該氣體導入噴射頭34供給進入該 處理空間S之混合氣體係轉變成一電漿，且因此產生離子 ;該晶圓W係藉著該等離子遭受該RIE。在此時，該蝕刻 速率係藉著由該混合氣體中之CxFy氣體（該反應活性氣體） 所產生之反應副產物所控制。當產生該等離子時，氟自由 基係亦產生當作可沈積之活性種類。 -16 - (14) (14)1320952 藉著該電漿處理設備10之一控制單元（未示出）的中央 處理器，上述電漿處理設備10之構成元件的操作係按照 —用於該RIE之程式控制。 圖2係圖1中所出現之◦型環形密封部件46的放大 剖視圖。注意該氣體導入噴射頭3 4係位在該圖示之頂部 ，且因此該真空容器11之內部係至該紙張之頂部。下文 ，至該圖示頂部之區域將如此被稱爲“該內部（真空）側” ，且至該圖示底部之區域被稱爲“外部（大氣）側”。再者 ，該圖示中之上/下方向將被稱爲該“水平方向”，且該 圖示中之左/右方向將被稱爲該“垂直方向”。 如圖2所示，該密封部件46具有一在該大氣側上打 開之大致U形橫截面的自由基密封構件47，及一具有於該 水平方向中導向之大致葫蘆形橫截面的真空密封構件48, 亦即頸部係形成在該葫蘆中。該自由基密封構件47係設 置在該內部（真空）側上，且該真空密封構件48係設置在該 外部（大氣）側上。該自由基密封構件47係由聚四氟乙烯 (PTFE)所製成，該聚四氟乙烯係一氟樹脂，且該真空密封 構件48係由FKM所製成》 該密封部件46係安置在一由該容器蓋子31所界定之 空間中’且一具有長方形橫截面之密封溝槽49形成於該 真空容器11中。該容器蓋子31係設置在該密封部件46 上方’該容器蓋子31接觸該密封部件46之一上部。特別 地是’該密封溝槽49之一底面4 9b接觸該自由基密封構 件47及該真空密封構件48，且該容器蓋子31亦接觸該自 -17- (15) (15)1320952 由基密封構件47及該真空密封構件48。 該容器蓋子3 1及該密封溝槽49的底面49b間之距離 係設定爲比該自由基密封構件47於該垂直方向中之自然 長度及該真空密封構件48於該垂直方向中之自然長度較 短達一預定長度，由此當該密封部件46係安置在藉由該 密封溝槽49及該容器蓋子31所界定的空間中時，該自由 基密封構件47及該真空密封構件48之每一個係於該垂直 方向中壓縮。其結果是，該自由基密封構件47及該真空 密封構件48之每一個產生一彈回力，且因此由於該彈回 力造成該自由基密封構件47及該真空密封構件48之每一 個與該容器蓋子31及該密封溝槽49的底面49b兩者緊密 接觸。 於該自由基密封構件47接觸該容器蓋子31之部份及 該自由基密封構件47接觸該密封溝槽49之真空側側面 49a的一部份之間，該自由基密封構件47具有一自由基密 封狹窄部份47a ;且於該自由基密封構件47接觸該密封溝 槽49之真空側側面49a的部份及該自由基密封構件47接 觸該密封溝槽49之底面49b的部份之間，具有一自由基 密封狹窄部份4 7b。該自由基密封狹窄部份47a及4：7b具 有低剛性，且因此增進該自由基密封構件47之壓縮變形 。亦即，該等自由基密封狹窄部份47a及47b係彎曲部份 ;當該自由基密封構件47在該垂直方向中壓縮時，該自 由基密封構件47在該自由基密封狹窄部份47a及47b彎 曲，以便遭受壓縮變形。 -18- (16) (16)1320952 由於具有大致如上面所述之葫蘆形橫截面，該真空密 封構件48具有一真空側凸塊部份48a、一大氣側凸塊部份 48b、及一連接該真空側凸塊部份48a及該大氣側凸塊部 份48b之真空密封狹窄部份48c。部份該自由基密封構件 47及部份該真空密封構件48(具體地說，該真空側凸塊部 份48a之前面部份、該大氣側凸塊部份48b之後方部份、 及該真空密封狹窄部份48 c之上部與下部）係彼此分開， 以便形成二保護空間48d及48e。亦即，該真空密封狹窄 部份48c形成一於該真空密封構件48中之頸部。 該真空密封構件48之真空側凸塊部份48a係壓合進 入該自由基密封構件47之大致U形橫截面的開口。其結 果是，該自由基密封構件47及該真空密封構件48係裝在 '-起。再者，部份該真空密封構件48之真空側凸塊部份 48a係由該自由基密封狹窄部份47a分開，且部份該真空 密封構件48之真空側凸塊部份48a係由該自由基密封狹 窄部份47b分開，以便形成保護空間48 f及48 g。 當該真空密封構件48係於該垂直方向中壓縮時，由 該真空密封構件48突出之各部份進入位於如上面所述環 繞著該真空密封構件48之周邊的保護空間48d、48e、48f 及48g，由此該等保護空間48d、48e、48f及48g增進該 真空密封構件48之壓縮變形。 其次，將敘述該密封部件46之特定形狀。 圖3係一剖視圖，其顯示圖2所示密封部件46之特 定形狀。於圖3中，該密封部件46之每一部份係顯示在 -19 - (17) (17)1320952 一自然長度狀態中，除了該真空密封構件48之真空側凸 塊部份48a係由於壓合進入該自由基密封構件47之大致 U形橫截面的開口而變形以外。 如圖3所示，形成該真空密封構件48，使得於其自然 長度狀態中，該真空密封構件48於該水平方向中之長度 係L1，該真空密封構件48於該垂直方向中之長度（該大氣 側凸塊部份48b的垂直方向中之高度）係L2，且該真空密 封狹窄部份48c的垂直方向中之長度（亦即該寬度）係L3。 形成該自由基密封構件47，使得於其自然長度狀態中 ’該自由基密封構件47於該水平方向中之長度係L4，該 自由基密封構件47於該垂直方向中之長度係L5，及接觸 該容器蓋子31的接觸表面47c及接觸該密封溝槽49的底 面49b之接觸表面47d的每一個之長度係L6。再者，形 成該自由基密封構件47，使得該等自由基密封狹窄部份 47a及47b的每一個之厚度係W1。 再者，形成該真空密封構件48及該自由基密封構件 47，使得於該真空密封構件48之真空側凸塊部份48a已 壓合進入該自由基密封構件47之大致U形橫截面的開口 之狀態中’每一保護空間48 d及48e的水平方向中之寬度 係D1’且每一保護空間48f及48g之最小寬度係〇2。再 者，該容器蓋子31及該密封溝槽49的底面49b間之距離 係Dr。 相對該容器蓋子31及該密封溝槽49的底面49b間之 距離係Dr’該真空密封構件48之水平方向長度L1及垂 -20- (18) (18)1320952 直方向長度L2、與該自由基密封構件47之水平方向長度 L4及垂直方向長度L5被設定至最佳値。特別地是，該真 空密封構件 48之水平方向長度 L1係設定至一滿足 1 .8xDr>Ll >0.8xDr、較佳地是 1 · 5 x D r k L 1 > 1.2 x Dr 之値。該 真空密封構件48之垂直方向長度L2係設定至一滿足 1 .8xDr>L2>l .05xDr、較佳地是 1 . 5xDr>L2k 1 . 1 5xDr 之値。 再者，該自由基密封構件47之水平方向長度L4係設定至 —滿足（5/6)xL12L42(1/6)xL1、較佳地是 (2/3)xLl2L42(l/3)xLl之値。該自由基密封構件47之垂直 方向長度L5係設定至一滿足1.8xDr^L52l.05xDr、較佳地 是 1 .5xDrkL5> 1 . 1 5xDr 之値。 該真空密封狹窄部份48c之垂直方向長度L3係相對 該真空密封構件48之垂直方向長度L2設定，設定至一滿 足 0.95xL2>L3>0.3xL2 ' 較佳地是 1 0 0.9 x L2 > L 3 > 0.4 5 x L2 之値。如果該真空密封狹窄部份48c之垂直方向長度L3 係高的，則該真空密封構件48在該真空密封狹窄部份48c 之剛性變高，且因此該真空密封構件48變得易於處理。 在另一方面，如果該真空密封狹窄部份48 c之垂直方向長 度L3係低的，則改善該真空密封構件48順著該容器蓋子 31或該密封溝槽49的底面49b之傾斜的能力。 因爲該真空密封狹窄部份48c形成一於該真空密封構 件48中之頸部，如上面所述，且亦由於該保護空間48 d 及48 e之存在，可改善該真空密封構件48順著該容器蓋 子31與該密封溝槽49的底面4 9b之能力，且因此可改善 -21 - (19) (19)1320952 該密封性能。 該自由基密封構件47的接觸表面47c及47d之每一 個的長度L6之一上限係相對該自由基密封構件47之水平 方向長度L4設定，L6是設定至一滿足0.6xL4kL6k0.5毫 米、較佳地是〇.6xL4kL621毫米之値。藉著造成該等接觸 表面47c及47d具有此一寬度（長度L6)，可造成該自由基 密封構件47之屏蔽性能爲穩定的。 設定該自由基密封構件47的自由基密封狹窄部份47 a 及4 7b之每一個的厚度W1，使得該等自由基密封狹窄部 份47a及47b之剛性、亦即該PTFE在該厚度W1之剛性 係在一程度，使得該等自由基密封狹窄部份47a及47b經 過一力量變形，該力量不超過來自已壓合進入該自由基密 封構件47之大致U形橫截面的開口之真空側凸塊部份48a 的回復力，亦即該FKM於該真空側凸塊部份48a已壓合 的狀態中之回復力。這是致使該等自由基密封狹窄部份 47a及47b由該真空側凸塊部份48a經過該回復力被分別 向上及往下推，以致維持該自由基密封構件47對自由基 之屏蔽性能，甚至於該等接觸表面47c及47d遭受潛變之 案例中。特別地是，每一自由基密封狹窄部份47a及47b 之厚度W1係設定至一滿足2.0毫米2W 120.05毫米、較佳 地是1.5毫米2W 120.1毫米之値。如果該等自由基密封狹 窄部份47a及47b之厚度係少於此厚度W1，則該等自由 基密封狹窄部份47a及47b之耐用性及加工性能急劇地降 低，且因此不再能夠獲得對自由基之良好屏蔽性能。 -22- (20) (20)1320952 藉著如上面所述提供該等自由基密封狹窄部份47a及 4 7b，該自由基密封構件47之變形自由度增加，且因此該 自由基密封構件47可輕易地遭受壓縮變形。該自由基密 封構件47於壓縮期間之以下能力可如此改善，且因此該 自由基密封構件47可製成爲具有絕佳之耐用性，及再者 可減少該自由基密封構件47上之壓縮負載。 每一保護空間48d及48e之水平方向寬度D1係設定 爲至少一値，使得於該自然長度狀態（圖3所示狀態）中、 及於該密封部件46之安裝狀態（圖2所示狀態）中，該自由 基密封構件47之一大氣側端部及該真空密封構件48之大 氣側凸塊部份48b不會彼此接觸。藉著如上面所述提供該 保護空間48d及48e，該自由基密封構件47及該真空密封 構件48彼此獨立地移動變得可能，甚至於該密封部件46 之安裝狀態中，且因此甚至於譬如該真空密封構件48已 由於不一致的繫緊而掉落之案例中，該自由基密封構件47 不會順應該真空密封構件48之移動，但可令人滿意地維 持該等接觸表面47c及47d分別與該容器蓋子31及該密 封溝槽49的底面4 9b接觸之狀態。其結果是，可造成該 自由基密封構件47對自由基之屏蔽性經過一長時期仍爲 穩定的。 每一保護空間48f及48g之最小寬度D2係設定至一 値，以便在該自然長度狀態（圖3所示狀態）、且較佳地是 亦於該密封部件46之安裝狀態（圖2所示狀態）中大於〇。 於該密封部件46中，由於橡膠材料（該FKM)及樹脂材料（ -23- (21) (21)1320952 該PTFE)係繫緊在一起，該壓縮負載傾向於大於繫緊—僅 只由橡膠材料所製成的密封部件之案例，但藉著提供該保 護空間48f與48g及如上面所述設定該保護空間48f與 48g之最小寬度，來自該樹脂材料（該自由基密封構件47) 之反作用力係保持低的，且因此可減少用於該繫緊所需之 繫緊力。再者，藉著形成如上面所述之保護空間48 f及 4 8g，可確保用於當該自由基密封構件47變形時之充分的 空間，且因此可造成該自由基密封構件47之變形爲穩定 的，及如此能進一步減少來自該自由基密封構件47之反 作用力。 在該電漿處理設備10之真空容器11中產生氟自由基 及/或氧自由基（下文僅只稱爲“自由基”）。構成該真空密 封構件48之FKM係藉著此等自由基輕易地變薄。於圖2 中’該等自由基由該真空側流向該大氣側，但因爲該自由 基密封構件47係設置在該真空側上，且係與該容器蓋子 31及該密封溝槽49的底面4 9b兩者緊密接觸，該自由基 密封構件47防止該等自由基抵達設置在該大氣側上之真 空密封構件48。特別地是，構成該自由基密封構件47之 PTFE對該等自由基具有絕佳之阻抗，且因此該自由基密 封構件47不會變薄。再者，雖然PTFE之可恢復性於長時 期連續地壓縮時經過潛變而減少，根據該密封部件46，因 爲該真空密封構件48之真空側凸塊部份48a係壓合進入 該自由基密封構件47之大致U形橫截面的開口，來自該 真空側凸塊部份48a之彈回力補償該自由基密封構件47 -24- (22) (22)1320952 之減少的可恢復性。該自由基密封構件47可如此長時期 防止該等自由基抵達設置在該大氣側上之真空密封構件48 〇 再者，根據該電漿處理設備1〇，該真空密封構件48 係設置在該大氣側上，且係與該容器蓋子31及該密封溝 槽49的底面4 9b兩者緊密接觸。再者，如上面所述，該 等自由基不會抵達該真空密封構件48，且因此該真空密封 構件48不會變薄。該真空密封構件48可如此長時期防止 外部空氣進入該真空容器11。 根據本具體實施例之密封部件46，該密封部件46具 有該自由基密封構件47，其係設置在該真空側上，且係由 對自由基具有絕佳之阻抗的PTFE所製成；及該真空密封 構件48，其係設置在該大氣側上，且係由FKM所製成。 該自由基密封構件47防止該等自由基抵達該真空密封構 件48，且因此能防止該真空密封構件48藉著該等自由基 而變薄，由此不需要使用抗自由基之FFKM。再者，該自 由基密封構件47及該真空密封構件48係裝在一起，且因 此該密封部件46可當作單一本體處理，及再者其尺寸可 製成小的。其結果是，該密封部件46不需要一預定之密 封空間，如用於雙重密封結構將需要者，該密封部件46 係不貴的，並可確保絕佳之耐用性。 根據上面所述之密封部件46，該自由基密封構件47 具有一在該大氣側打開之大致U形橫截面，且該真空密封 構件48之真空側凸塊部份48a係壓合進入該大致U形橫 -25- (23)1320952 復 恢 所 該 因 係 並 止 9 邊 間 封 ， 空 變 中 密 溝 49 絕 該 截面之開口。因此，縱使該自由基密封構件47之可恢 性經過潛變而減少，該自由基密封構件47之減少的可 復性能夠藉著來自該壓合真空側凸塊部份48a之彈回力 彌補。其結果是，該自由基密封構件47可長時期防止 等自由基抵達設置在該大氣側上之真空密封構件48，且 此可長時期維持該密封部件46之耐用性。 再者，根據該密封部件46，該自由基密封構件47 由PTFE所製成。PTFE對該等自由基具有絕佳之阻抗， 因此幾乎不會藉著該等自由基所變薄。如此能可靠地防 構成該真空密封構件48之FKM藉著該等自由基而變薄 且因此能夠對於該密封部件46確保又更好之耐用性。 再者，該密封部件46環繞該真空密封構件48之周 具有該等保護空間48d、48e、48f及48g，該等保護空 係藉著該真空密封構件48所獨自界定或藉著該真空密 構件48及該自由基密封構件47所合作界定。其結果是 當在該垂直方向中壓縮該真空密封構件48時，由該真 密封構件48突出之部份能進入該等保護空間48d、48e 48f及48g，由此該真空密封構件48可輕易地遭受壓縮 形。再者，該自由基密封構件47於該大致U形橫截面 具有該自由基密封狹窄部份47a及4 7b，由此該自由基 封構件47亦可輕易地遭受壓縮變形。因此’於該密封 槽49中，可改善該自由基密封構件47順著該密封溝槽 的底面49b與該容器蓋子31之能力，且因此能夠確保 佳之耐用性，及再者’能減少該自由基密封構件47及 -26- (24) (24)1320952 真空密封構件48上之壓縮負載。 再者，根據該密封部件46，由FKM所製成之真空密 封構件48實現一真空密封。縱使一與該FKM緊密接觸之 表面具有高表面粗糙度，可實現該真空密封。其結果是， 該密封部件46能實現一絕佳之真空密封。再者，在此不 需要造成該容器蓋子31及該密封溝槽49的底面4 9b之表 面粗糙度盡可能爲低的。其結果是，該容器蓋子31及該 密封溝槽49的表面粗糙度之控制變得容易，且因此能減 少該電漿處理設備10之製造成本。 於上面所述之密封部件46中，該自由基密封構件47 係由PTFE所製成。然而，該自由基密封構件47可爲由任 何抗自由基之材料所製成，譬如亦可由四氟乙烯/全氟垸 二乙烯醚共聚物（PFA)、四氟乙烯/六氟丙烯共聚物（FEP)、 四氟乙烯/乙烯共聚物（ETFE)、聚偏二氟乙烯（PVDF)、及 聚三氟氯乙烯（PCTFE)之任何一種所製成。這些材料可輕 易及不貴地取得，且因此可較便宜地製成該密封部件46。 再者，於上面所述之密封部件46中，該真空密封構 件48係由FKM所製成。然而，該真空密封構件48可由 任何具有真空密封能力之材料所製成，譬如亦可由四氟& 烯-丙烯型橡膠（FEPM)所製成。這些材料亦可輕易及不冑 地取得，且因此可較便宜地製成該密封部件46。 其次，將敘述該密封部件46之變異。 如圖2及3所示，於上面之具體實施例中，在繞著該 密封部件46之一對稱平面的每一側面上（看圖4)，該密封 -27- (25) 1320952 部件46之自由基密封構件47具有一當作彎曲部份 基密封狹窄部份47a或47b。於此案例中’如圖4 在該密封部件4 6之安裝狀態（圖2所示狀態）中’由 該容器蓋子31或該底面49b之壓縮力量、及來自 密封構件48之回復力，發生該自由基密封構件47 面47c或47d未與該相向之表面（該容器蓋子31或 49b)呈表面接觸的案例。爲除去此問題所作之努力 變異項中，如下文敘述之圖6A至6D所示，該自 封構件47可被製成具有三或更多彎曲部份，其對 供繞著該密封部件46之對稱平面，藉此於該密封若 之安裝狀態（圖2所示狀態）中，可造成該自由基密 47之接觸表面47c及47d分別與該容器蓋子31及 4 9b呈表面接觸，且因此可獲得一良好之自由基屏 c 這是因爲於該自由基密封構件47具有提供繞 封部件46之對稱平面的三或更多彎曲部份之案例 圖5所示，由於來自每一相向構件（該容器蓋子31 面49b)之壓縮力量及來自該真空密封構件48之回 在該自由基密封構件47上所發生之力矩係分佈進 曲部份，且因此該自由基密封構件47之每一接觸表 及4 7d順應該個別之相向構件。 該密封部件46之特定變異項係顯示於圖6A至 。如圖6A及6B所示’除了該自由基密封狹窄部份 4 7b以外，該自由基密封構件47可另具有—形成在 之自由 所示， 於來自 該真空 接觸表 該底面 ，在本 由基密 稱地提 ®件46 封構件 該底面 蔽效果 著該密 中，如 或該底 復力， 入該彎 面47c 6D中 47a及 對稱平 -28- (26) (26)1320952 面之彎曲部份。另一選擇係，如圖6C及6D所示，除了該 自由基密封狹窄部份47a及47b以外，該自由基密封構件 47可另具有形成在對稱平面之二彎曲部份。 該等彎曲部份之每一個不限於包含一狹窄部份，反之 該等彎曲部份之每一個可包含一刻槽或一壁凹（看見圖6A 及6C)，或可包含一有角部份（看見圖6B及6 D)，或可爲 另一形狀。 於上文中，已敘述該密封部件46係安置在由該密封 溝槽49及該容器蓋子31所界定的空間中之案例。然而， 使用該密封部件46之環境係不限於此，反之該密封部件 46可被用在任何環境，在此由該大氣隔離一真空之密封係 必需者。譬如，該密封部件46可被用於一將氣體排出該 真空容器11的排氣系統之接頭中。一 KF凸緣接頭結構被 廣泛地使用當作一排氣系統之此一接頭。 圖7係一剖視圖，其顯示圖2所示密封都件被用於一 KF凸緣接頭結構中之案例。 如圖7所示，該KF凸緣接頭結構50包含一管子51 ，其具有一孔洞51a及一與該孔洞51a同軸向之圓形凸緣 部份51b; —承接部份52，其具有一與該管子51之孔洞 51a相通的孔洞52a ; —中心管子53，其位於該管子51及 該承接部份52之間；及一大致環形之緊固構件54，其具 有一內部凸緣部份54a» 該管子51在其一端面中具有一插入孔洞51c，該插入 孔洞51c係與該孔洞51a同軸向，並具有一比該孔洞51a -29- (27) 1320952 之直徑較大達一預定數量的直徑，且該承接部份 一端面中同樣地具有一插入孔洞52b，其係與該 同軸向，及具有與該插入孔洞51c相同之直徑。 子53之外徑係設定成比該插入孔洞51c及52b 小達一預定數量。可如此藉著將該中心管子53 下端分別插入該等插入孔洞5 1 c及52b，進行該1 孔洞51a與該承接部份52的孔洞52a之中心定位 再者，該中心管子53具有一突出部份53a， 中之一水平方向中突出。該突出部份53a於圖7 方向中具有一預定長度，並設計該突出部份之形 其上端及下端沿著圖7中之水平方向中延伸，且 有一弓形橫截面。於該管子51已經由該中心管弓 至該承接部份52之狀態中，該緊固構件54之內 份54a壓抵靠著該管子51的圓形凸緣部份51b 份。其結果是，該突出部份53a之上端及下端分 管子51之端面及該承接部份52之端面，以致言 及該承接部份52間之一間距係維持在一預定値。 再者，以該KF凸緣接頭結構50，該孔洞5: 真空容器11內部相通。如此，該孔洞51a及該 內部之壓力大致係一真空，且再者自由基流入該 及該孔洞52a。於圖7中，該孔洞51a及52a如 該真空側，且該管子51之外部對應於該大氣側。 在此，因爲該密封部件46之尺寸係小的’ 由基密封構件47及該真空密封構件48係如稍早 52在其 孔洞52a 該中心管 之直徑較 之上端及 f子51的 〇 其在圖7 中之垂直 狀，使得 其側面具 :53附接 部凸緣部 之周邊部 別接觸該 突管子51 [a係與該 孔洞5 2 a 孔洞5 1 a 此對應於 由於該自 敘述地裝 -30 - (28) (28)1320952 (1) IX. INSTRUCTIONS OF THE INVENTION [Technical Field] The present invention relates to a sealing member and a substrate processing apparatus, and a sealing member for a substrate processing apparatus, which processes an active gas to form an electric Pulp and Treatment of a Substrate Using the Plasma [Prior Art] An electro-plasma processing apparatus such as etching performed on a semiconductor wafer such as a substrate has a vacuum chamber whose pressure is reduced to a vacuum. The etching method uses a processing gas in the vacuum chamber slurry in a semiconductor wafer housed in the vacuum chamber, and an annular sealing member is used for the inner side of the chamber (the vacuum). And with the outside of the vacuum chamber (the), (see, for example, U.S. Patent No. 6,6, 9, 2, 2 1). Specifically, an etching apparatus is used as the plasma processing apparatus, since the semiconductor wafer is heated from the plasma, and thus a heat-resistant fluoroelastomer type ring is used as the sealing member. In recent years, an etching method containing a mixed gas of a reactive gas (e.g., CxFy gas C4F8 gas) has become mainstream, and this is used as the processing gas, so that the uranium engraving rate is controlled by the reaction. In this etching method, when the reactive gas becomes the active species which can be deposited, such as fluorine radicals. Further, in the etching using a reactive gas, it becomes adhered to the inner wall of the vacuum chamber. These attached reaction pairs, and in particular the ability of the equipment to be treated by the counter-slurry, can be substantially electrically converted. Sealing the true gas) isolation is used to receive the body of the energy gel, such as the plasma of the by-product of the mixed gas, the byproduct product is stripped -4 (2) (2) 1320952 to become particles, The particles become attached to the semiconductor device on the semiconductor wafer, resulting in a reduction in the yield of the semiconductor device. The dry washing is carried out in such a manner that the attached reaction by-products are removed in the plasma processing apparatus. For example, 'Wafer-Less Dry Cleaning (hereinafter referred to as WLDC), which is a dry cleaning type. In the WLDC, the reaction by-products are removed by oxygen ions generated by oxygen. However, oxygen free radicals are also produced at the same time. The above fluororubber is easily thinned by a radical (a fluorine radical and/or an oxygen radical). In a plasma processing apparatus using a reactive gas, a double sealing structure is used which comprises a fluororesin (especially Teflon (registered trademark)) which is provided on the vacuum side and which is resistant to radicals. a 0-ring seal member (Radical Trap Ring (RTR)), and a fluororubber (especially a vinylidene fluoride rubber (FKM)) disposed on the atmosphere side 〇-ring. The RTR includes a Teflon (registered trademark) tube, and the rubber is filled into the tube. According to the double seal structure, the RTR is sealed in the radicals, so that the radicals are not The vacuum side leaks, and the fluoro rubber 0-ring seals the vacuum in the vacuum chamber and is isolated from the outside of the vacuum chamber. The double sealing structure needs to be used for accommodating the RTR and the fluorine, respectively. The second rubber-filled ring seals the groove and therefore requires a predetermined sealing space. However, the conventional plasma processing equipment is not designed to withstand the use of a double-sealed structure, and thus cannot ensure that the predetermined seal is empty. And the use of the double seal structure-5-(3)(3)1320952 as described above in a conventional plasma processing apparatus is difficult. In particular, a KF flange joint structure for joining two tubes is JIS G 5 5 26), it is structurally impossible to provide a two-sealing groove, and therefore a double-sealed structure as described above cannot be used. In the case where a double-sealed structure cannot be used, a fluorine-resistant anti-free radical is used. Replacement rubber (especially the 0-ring made of tetrafluoroethylene-perfluoroethylene ether rubber (FFK Μ), but FFKM is very expensive, and there is a lesser freedom than Teflon (registered trademark)) In particular, in recent years, it has become strongly demanded that the plasma processing apparatus has a long life, and thus the durability of the user of the plasma processing apparatus cannot be ensured by the FFKM. It is an object of the present invention to provide a sealing member and a substrate processing apparatus which are inexpensive and capable of ensuring excellent durability without requiring a predetermined sealing space, such as those required for a double sealing structure. In a first aspect of the invention, a sealing member is provided in the substrate processing apparatus, the substrate processing apparatus having a reduced pressure vessel in which a high-elastic polymeric material-erosion is present Etching the substance and performing a predetermined treatment on a substrate housed in the decompression container, the sealing member sealing the inside of one of the decompression containers and isolating from the outside of the decompression container, the sealing member comprising a first member disposed on an inner side of the decompression container and resistant to the invading uranium material: a second member which is disposed on an outer side of the decompression container An elastic polymeric material; and at least one predetermined space formed by at least a portion of the first member and at least a portion of the second member separated by a -6 - (4) (4) 1320952; wherein the A member and the second member are attached together. According to the above sealing member, the sealing member has a first member which is disposed on the inner side of the decompression container and is resistant to the high-elastic polymeric material-etching erosive substance; a second member It is made of a highly elastic polymeric material disposed on the outer side of the reduced pressure vessel. Therefore, the erosion of the second member can be prevented by the first member, thereby eliminating the need to use a highly elastic polymeric material that is resistant to the erosive material. Further, the sealing member has at least a predetermined space formed by at least a portion of the first member and at least a portion of the second member separated from each other. Therefore, when the second member is subjected to compression deformation, a portion of the second member can enter the predetermined space, whereby the second member can easily be subjected to the compression deformation. Furthermore, the first member and the second member are attached together. Therefore, the sealing member can be treated as a single body, and further, its size can be made small. As a result, the sealing member does not require a predetermined sealing space, as would be required for a double sealing structure, which is inexpensive and ensures excellent durability. Preferably, the first member has a generally U-shaped cross section that opens on the outer side and at least a portion of the second member enters the opening of the u-shaped cross section. According to the above sealing member, the first member has a substantially U-shaped cross section opened on the outer side, and at least a portion of the second member enters the opening of the U-shaped cross section. Thus, even if the recoverability of the first member is reduced by creeping or falling, the springback force of the first member through a second member from the inlet (5) (5) 1320952 can be restored. As a result, durability can be maintained over a long period of time. More preferably, the U-shaped cross section of the first member has at least one curved portion therein. According to the above sealing member, the u-shaped cross section of the first member has at least one curved portion therein. Therefore, the first member can be easily subjected to compression deformation. As a result, the following capabilities of the first member can be improved, and thus excellent durability can be ensured' and further, the compressive load on the first member and the second member can be reduced. More preferably, the curved portion is a narrow portion. According to the above sealing member, the curved portion is a narrow portion. As a result, the effect of the above preferred aspect can be reliably achieved. It is also preferred that the erosive material is an active species produced by a reactive gas and the first member is made of a fluororesin. According to the above sealing member 'the erosive substance is an active species produced by the reactive gas' and the first member is made of a fluororesin. This fluororesin is hardly eroded by this active species. As a result, it is possible to reliably prevent the highly elastic polymeric material constituting the second member from being eroded by the active species, and thus to ensure better durability. More preferably, the fluororesin is selected from the group consisting of polytetrafluoroethylene, tetrafluoroethylene/perfluoroalkane divinyl ether copolymer, tetrafluoroethylene/hexafluoropropylene copolymer, tetrafluoroethylene/ethylene copolymer, and polybutylene. A group of people consisting of difluoroethylene and polychlorotetrafluoroethylene. According to the above sealing member, the fluororesin is selected from the group consisting of polytetrafluoroethylene-8-(6)1320952 olefin, tetrafluoroethylene/perfluoroalkyl divinyl ether copolymer, and tetrafluoroethylene/ethylene copolymer chlorine. A group of people consisting of tetrafluoroethylene. The material of the knot can be easily and inexpensively produced and made in situ. More preferably, the highly elastic polymer material is a vinyl type rubber, and a tetrafluoroethylene-propylene type _ according to the above sealing member, the high elasticity 1. 1-Difluoroethylene type rubber, and tetrafluoroethylene-group. As a result, the second member is formed, and thus the sealing member can be made cheaper. Preferably, the erosive material is made of a corrosion-resistant metal. According to the above sealing member, the erosion and the first member are hardly invaded by the corrosive gas by a corrosion-resistant metal metal, thereby preventing high-elasticity of the second member, and thus ensuring More durable and better, the corrosion-resistant metal system and the group of aluminum. According to the above sealing member, the group consisting of corrosion resistant steel, nickel, and aluminum. The material of the component can be easily and inexpensively obtained and made inexpensively. The mirror, the tetrafluoroethylene/hexafluoropropene, the polyvinylidene fluoride, and the poly-ply are formed to constitute the first member. The sealing member is relatively inexpensive. 1-Difluoro; a group of people composed of gums. A polymeric material selected from the group consisting of propylene rubber can be easily and inexpensively produced. The corrosive gas, and the first constituent is a corrosive gas, which is made of this anti-corrosion uranium. As a result, the material can be reliably corroded by the corrosive gas. A metal selected from the group consisting of stainless steel, nickel, and etched is selected from the result that the first component is formed, and thus the sealing member can be more preferably -9-(7)(7)1320952. The material system is selected from 1. A group consisting of 1-difluoroethylene rubber and tetrafluoroethylene-propylene rubber. According to the above sealing member, the highly elastic polymeric material is selected from the group consisting of 1. A group consisting of 1-difluoroethylene rubber and four ethylene-propylene-type rubber. As a result, the material constituting the second member can be easily and inexpensively obtained, and thus the sealing member can be produced relatively inexpensively. Preferably, the second member has a neck. According to the above sealing member, the second member has a neck. The result is that the following capabilities of the second member can be improved and the shielding performance can be improved accordingly. In order to achieve the above object, in a second aspect of the present invention, there is provided a substrate processing apparatus comprising a reduced pressure vessel in which a high-elastic polymeric material-eroded erosive material is present. a processing apparatus for performing a predetermined treatment on a substrate housed in the decompression container; and a sealing member that seals an inside of one of the decompression containers and is isolated from the outside of the decompression container; The sealing member has a first member disposed on an inner side of the decompression container and is resistant to the invading uranium material; a second member 'which is disposed on the outer side of the decompression container a high elastic polymeric material; and at least one predetermined space formed by at least a portion of the first member and at least a portion of the second member separated from each other, the first member and the second member Together. According to the above substrate processing apparatus, the effect on the first aspect can be achieved. Preferably, the first member has a large -10 (8) (8) 1320952 U-shaped cross section open on the outer side, and at least a portion of the second member enters the U-shaped cross section. Opening. According to the above substrate processing apparatus, the first member has a substantially U-shaped cross section opened on the outer side, and at least a portion of the second member enters the opening of the U-shaped cross section. Thus, even if the recoverability of the first member is reduced by creep or fall, the first member can be restored by a springback force from the incoming second member. As a result, durability can be maintained over a long period of time. It is also preferred that the erosive material is an active species produced by a reactive gas, and the first member is made of a fluororesin. According to the above substrate processing apparatus, the erosive substance is an active species produced by a reactive gas, and the first member is made of a fluororesin. This fluororesin is hardly eroded by this active species. As a result, it is possible to reliably prevent the highly elastic polymeric material constituting the second member from being eroded by the active species, and thus ensuring better durability. Preferably, the erosive material is a corrosive gas and the first member is made of a corrosion resistant metal. According to the above substrate processing apparatus, the invading substance is smoldering [sexual gas, and the first component is made of a metal resistant to corrosion. This - the corrosion-resistant metal is hardly corroded by the corrosion. The gas is eroded. The knot reliably prevents the highly elastic polymeric material constituting the second member from being attacked by the stomach gas, and thus ensures better durability. The above and other objects, features, and advantages of the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will now be described in detail with reference to the accompanying drawings, which illustrate the preferred embodiments of the invention. First, the sealing member and the substrate processing apparatus according to the first embodiment of the present invention will be described. The substrate processing apparatus is fabricated to perform a predetermined treatment on the substrate using a reactive gas. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing the structure of a plasma processing apparatus as the substrate processing apparatus in accordance with a first embodiment of the present invention. The plasma processing apparatus performs Reactive Ion Etch (hereinafter referred to as RIE) on the semiconductor wafer W as a substrate, and further manufactures the credit processing apparatus so that the WLDC can also be performed. As shown in Fig. 1, the plasma processing apparatus 10 has a cylindrical vacuum vessel 11 (reduced pressure vessel), and the vacuum vessel 11 has a processing space S therein. A cylindrical susceptor 12 as a stand is disposed in the vacuum vessel 11, and a semiconductor wafer W having a diameter of, for example, 300 mm (hereinafter simply referred to as "wafer W") is mounted thereon. On the device. The inner wall surface of the vacuum vessel 1 is covered with a side wall member 45. The side wall member 45 is made of aluminum, one surface of which faces the processing space S which has been coated with a ceramic such as yttrium oxide (Y2〇3). Further, the vacuum vessel π is electrically connected, and the susceptor 12 is mounted in the bottom of the vacuum vessel 11 via an insulating member 29. In the plasma processing apparatus 10, an exhaust path 13 is formed between the inner wall surface of the vacuum vessel 11 and a side surface of the susceptor 12, which serves as a flow path, and the gas above the susceptor 12 The molecular system is discharged to the outside of the vacuum vessel 11 through the flow path of -12-(10)(10)1320952. An annular baffle 14 for preventing plasma leakage is partially disposed along the exhaust path 13. Downstream of the baffle 14, a space in the exhaust path 13 is rotated back under the susceptor 12 and communicates with an adaptive pressure control valve (hereinafter referred to as "APC valve") 15 which is a Variable butterfly valve. The APC valve 15 is connected to a turbo molecular pump (hereinafter referred to as "TMP") 17, which is an exhaust pump for evacuation via the isolator 16, and the TMP 17 is connected to the tuft via a gate VI. A dry pump (hereinafter referred to as "DP") 18, which is also an exhaust pump. The exhaust gas flow path (hereinafter referred to as "main exhaust route") including the APC valve 15, the isolator 16, the TMP 17, the valve VI, and the DP 18 is used to control the APC valve 15 The high pressure in the vacuum vessel 11 and the TMP 17 and the DP 18 are also used to reduce the pressure in the vacuum vessel 11 to a substantially vacuum state. Further, the conduit 19 is connected to the DP 18 via the valve V2 between the isolator 16 and the APC valve 15. An exhaust gas flow path (hereinafter referred to as a "side pass line") including the pipe 19 and the valve V2 bypasses the isolator 16 and the DP 17, and the DP 18 is used for rough rolling the vacuum vessel 1 1 The 〇-lower electrode high frequency power source 20 is connected to the susceptor 12 via a feed rod 21 and a matcher 22. The lower electrode high frequency power source 20 supplies predetermined high frequency power to the susceptor 12. The susceptor 12 is thus used as a lower electrode. The matcher 22 reduces the reflection of high frequency power from the susceptor to maximize the supply efficiency of the high frequency power entering the susceptor 12. A disk-shaped ESC electrode plate 23 containing a conductive film is provided in an upper portion of the lining -13-(11)(11)1320952 holder 12. A DC power source 24 is electrically coupled to the ESC panel 23. A wafer W is attracted and held on an upper surface of the susceptor 12 by a Johnsen-Rahbek force or a Coulomb force applied by the DC power source 24 to A DC voltage of one of the ESC electrode plates 23 is generated. Further, an annular focus ring 25 is provided on the upper portion of the susceptor 12 so as to surround the wafer W that is attracted and held on the upper surface of the susceptor 12. The focal ring 25 is exposed to the process space S, and the plasma in the process space S is concentrated toward the surface of the wafer W, thus improving the efficiency of the RIE. An annular coolant chamber 26 is provided inside the susceptor 12, for example, extending in a circumferential direction of the susceptor 12. A coolant, such as cooling water or a Galden (registered trademark) fluid, is circulated through the coolant chamber 26 via a coolant conduit 27 via a coolant unit (not shown) at a predetermined temperature. The processing temperature of the wafer W that is attracted and held on the upper surface of the susceptor 12 is controlled by the temperature of the coolant. A plurality of heat transfer gas supply holes 28 are provided in a portion of the upper surface of the susceptor 12, and the wafer W is attracted and held on the upper surface (hereinafter referred to as "suction surface"). The heat transfer gas supply hole 28 is connected to the heat transfer gas supply unit 32 via a heat transfer gas supply line 30 provided inside the susceptor 12. The heat transfer gas supply unit 32 supplies helium gas as a heat transfer gas through the heat transfer gas supply hole 28, and enters a gap between the suction surface of the susceptor 12 and a back surface of the wafer W. A plurality of pusher pins 33 are provided in the suction surface of the susceptor 12 - 14 - (12) (12) 1320952 as lift pins and can be made to protrude from the upper surface of the susceptor 12. The pusher pin 33 is coupled to a motor (not shown) by a ball screw (not shown) and can be made to protrude from the suction surface of the susceptor 12 by the rotational motion of the motor. The ball screw is converted into a linear motion. When a wafer W is attracted to and held on the attraction surface of the susceptor 12, the pusher pin 33 is placed inside the susceptor 12, so that the wafer W can be subjected to the RIE and is made Extending from the upper surface of the susceptor 12, when the wafer W is sent out by the vacuum container 11 after having been subjected to the RIE, the wafer W is lifted up to leave the susceptor 12°, and the gas is introduced into the ejection head 34. The vacuum vessel 11 is disposed facing the top plate portion of the susceptor 12. An upper electrode high frequency power source 36 is connected to the gas introduction head 34 via a adapter 35. The upper electrode high frequency power source 36 supplies predetermined high frequency power to the gas introduction jet head 34. The gas introduction ejection head 34 is used as an upper electrode. The matcher 35 has a function similar to that of the matcher 22 described earlier. The gas introduction ejection head 34 has a top plate electrode plate 38 having a large number of gas holes 37 therein, and an electrode holder 39 which is detachably supported on the electrode holder. A buffer chamber 40 is provided inside the electrode holder 39. A process gas introduction pipe 41 is connected to the buffer chamber 40 by a process gas supply unit (not shown). A duct insulator 42 is partially disposed along the process gas introduction pipe 41. The pipe insulator 42 is made of an electrically insulating material, and prevents high-frequency power supplied to the gas introduction injection head 34 from leaking through the process gas introduction pipe 41 -15-(13) (13) 1320952 into the process gas. Supply unit. The processing gas introduction pipe 41 supplies a mixed gas of a process gas, such as a CxFy gas and an argon (Ar) gas, which is a reactive gas, through the gas introduction hole 34 through the gas hole. 37 is supplied into the vacuum container n (the processing space S). The plasma processing apparatus 10 has a container lid 31 provided in an upper portion of the vacuum vessel 11. The container lids 31 cover the gas introduction jets 34. To seal the inside of the vacuum vessel 11 from the outside, a ring-shaped ring seal member 46 is provided between the container lid 31 and the vacuum vessel U so as to be introduced into the spray head 34 around the gas. - a transfer port 43 for the wafers W is provided in a position in one of the side walls of the vacuum vessel 11 'this position is lifted by the susceptor 12 by the pusher pin 33 The height of the wafer W. A gate valve 44 for opening and closing the transfer port 43 is provided in the transfer port 43 as described above for supplying the high frequency power to the susceptor 12 in the vacuum container 11 of the plasma processing apparatus 10. And the gas is introduced into the ejection head 34, and when the high-frequency power is applied to the processing space S between the susceptor 12 and the gas introduction ejection head 34, the gas is introduced into the processing space S by the gas introduction ejection head 34. Forming a plasma, and thus generating ions; the wafer W is subjected to the RIE by the plasma. At this time, the etching rate is controlled by the reaction by-products generated by the CxFy gas (the reactive gas) in the mixed gas. When the plasma is produced, the fluorine free radical also produces an active species that acts as a deposit. -16 - (14) (14) 1320952 By means of a central processing unit of a control unit (not shown) of the plasma processing apparatus 10, the operation of the constituent elements of the plasma processing apparatus 10 is as follows - for the RIE Program control. Figure 2 is an enlarged cross-sectional view of the ◦-shaped annular seal member 46 appearing in Figure 1. Note that the gas introduction jet head 34 is at the top of the figure, and thus the inside of the vacuum vessel 11 is tied to the top of the paper. Hereinafter, the area to the top of the figure will be referred to as "the inner (vacuum) side", and the area to the bottom of the figure is referred to as the "outer (atmosphere) side". Further, the upper/lower direction in the illustration will be referred to as the "horizontal direction", and the left/right direction in the illustration will be referred to as the "vertical direction". As shown in FIG. 2, the sealing member 46 has a radical sealing member 47 having a substantially U-shaped cross section opened on the atmospheric side, and a vacuum sealing member having a substantially gourd-shaped cross section guided in the horizontal direction. 48, that is, the neck system is formed in the gourd. The radical sealing member 47 is disposed on the inner (vacuum) side, and the vacuum sealing member 48 is disposed on the outer (atmospheric) side. The radical sealing member 47 is made of polytetrafluoroethylene (PTFE), which is a fluororesin, and the vacuum sealing member 48 is made of FKM. The sealing member 46 is disposed in a A sealing groove 49 having a rectangular cross section defined by the container cover 31 is formed in the vacuum vessel 11. The container lid 31 is disposed above the sealing member 46. The container lid 31 contacts an upper portion of the sealing member 46. Specifically, the bottom surface 49b of the sealing groove 49 contacts the radical sealing member 47 and the vacuum sealing member 48, and the container lid 31 also contacts the self--17-(15)(15)1320952 The member 47 and the vacuum sealing member 48. The distance between the container lid 31 and the bottom surface 49b of the sealing groove 49 is set to be greater than the natural length of the radical sealing member 47 in the vertical direction and the natural length of the vacuum sealing member 48 in the vertical direction. Shortly a predetermined length, whereby each of the radical sealing member 47 and the vacuum sealing member 48 is disposed when the sealing member 46 is disposed in a space defined by the sealing groove 49 and the container cover 31 It is compressed in this vertical direction. As a result, each of the radical sealing member 47 and the vacuum sealing member 48 generates a resilient force, and thus each of the radical sealing member 47 and the vacuum sealing member 48 and the container cover are caused by the resilient force. Both 31 and the bottom surface 49b of the seal groove 49 are in close contact. The radical sealing member 47 has a radical between a portion of the radical sealing member 47 contacting the container lid 31 and a portion of the radical sealing member 47 contacting the vacuum side surface 49a of the sealing groove 49. Sealing the narrow portion 47a; and between the portion of the radical sealing member 47 contacting the vacuum side surface 49a of the sealing groove 49 and the portion of the radical sealing member 47 contacting the bottom surface 49b of the sealing groove 49, It has a free radical seal narrow part 4 7b. The radical sealing narrow portions 47a and 4:7b have low rigidity and thus enhance the compression deformation of the radical sealing member 47. That is, the radical sealing narrow portions 47a and 47b are curved portions; when the radical sealing member 47 is compressed in the vertical direction, the radical sealing member 47 is in the radical sealing narrow portion 47a and 47b is bent to suffer compression deformation. -18-(16) (16) 1320952 The vacuum sealing member 48 has a vacuum side bump portion 48a, an atmospheric side bump portion 48b, and a connection due to a gourd-shaped cross section substantially as described above. The vacuum side bump portion 48a and the atmosphere side bump portion 48b are vacuum sealed to the narrow portion 48c. a portion of the radical sealing member 47 and a portion of the vacuum sealing member 48 (specifically, a front portion of the vacuum side bump portion 48a, a rear portion of the atmospheric side bump portion 48b, and the vacuum The seal narrow portions 48c upper and lower portions are separated from each other to form two protective spaces 48d and 48e. That is, the vacuum seal narrow portion 48c is formed in the neck portion of the vacuum sealing member 48. The vacuum side bump portion 48a of the vacuum sealing member 48 is press-fitted into the opening of the substantially U-shaped cross section of the radical sealing member 47. As a result, the radical sealing member 47 and the vacuum sealing member 48 are attached to each other. Further, part of the vacuum side bump portion 48a of the vacuum sealing member 48 is separated by the radical sealing narrow portion 47a, and part of the vacuum side bump portion 48a of the vacuum sealing member 48 is free. The base seal narrow portions 47b are separated to form protective spaces 48f and 48g. When the vacuum sealing member 48 is compressed in the vertical direction, portions protruding from the vacuum sealing member 48 enter the protective spaces 48d, 48e, 48f located around the periphery of the vacuum sealing member 48 as described above and 48 g, whereby the protective spaces 48d, 48e, 48f and 48g enhance the compression deformation of the vacuum sealing member 48. Next, the specific shape of the sealing member 46 will be described. Fig. 3 is a cross-sectional view showing a specific shape of the sealing member 46 shown in Fig. 2. In Fig. 3, each portion of the sealing member 46 is shown in a natural length state of -19 - (17) (17) 1320952 except that the vacuum side projection portion 48a of the vacuum sealing member 48 is pressed. The opening of the substantially U-shaped cross section of the radical sealing member 47 is incorporated and deformed. As shown in FIG. 3, the vacuum sealing member 48 is formed such that in its natural length state, the length of the vacuum sealing member 48 in the horizontal direction is L1, and the length of the vacuum sealing member 48 in the vertical direction (this The height in the vertical direction of the atmospheric side convex portion 48b is L2, and the length (i.e., the width) in the vertical direction of the vacuum sealed narrow portion 48c is L3. The radical sealing member 47 is formed such that in its natural length state, the length of the radical sealing member 47 in the horizontal direction is L4, the length of the radical sealing member 47 in the vertical direction is L5, and contact The length of each of the contact surface 47c of the container lid 31 and the contact surface 47d contacting the bottom surface 49b of the seal groove 49 is L6. Further, the radical sealing member 47 is formed such that the thickness of each of the radical sealing narrow portions 47a and 47b is W1. Further, the vacuum sealing member 48 and the radical sealing member 47 are formed such that the vacuum side bump portion 48a of the vacuum sealing member 48 has been pressed into the opening of the substantially U-shaped cross section of the radical sealing member 47. In the state, the width D1 in the horizontal direction of each of the protection spaces 48d and 48e and the minimum width of each of the protection spaces 48f and 48g are 〇2. Further, the distance between the container lid 31 and the bottom surface 49b of the seal groove 49 is Dr. The distance between the container cover 31 and the bottom surface 49b of the sealing groove 49 is Dr'. The horizontal length L1 of the vacuum sealing member 48 and the vertical length L2 of the vacuum -20-(18) (18) 1320952 and the freedom The horizontal direction length L4 and the vertical direction length L5 of the base sealing member 47 are set to the optimum enthalpy. Specifically, the horizontal length L1 of the vacuum sealing member 48 is set to a level of one. 8xDr>Ll >0. 8xDr, preferably 1 · 5 x D r k L 1 > 2 x Dr. The vertical direction length L2 of the vacuum sealing member 48 is set to satisfy one. 8xDr>L2>l. 05xDr, preferably 1 .  5xDr>L2k 1 .  1 after 5xDr. Further, the horizontal length L4 of the radical sealing member 47 is set to - satisfy (5/6) x L12L42 (1/6) x L1, preferably (2/3) x Ll2 L42 (l/3) x Ll . The length L5 of the radical sealing member 47 in the vertical direction is set to one to satisfy 1. 8xDr^L52l. 05xDr, preferably 1 . 5xDrkL5> 1 .  1 after 5xDr. The vertical length L3 of the vacuum seal narrow portion 48c is set with respect to the vertical direction length L2 of the vacuum sealing member 48, and is set to a fullness of 0. 95xL2>L3>0. 3xL2 ' is preferably 1 0 0. 9 x L2 > L 3 > 0. 4 5 x L2. If the vertical length L3 of the vacuum seal narrow portion 48c is high, the rigidity of the vacuum seal member 48 at the vacuum seal narrow portion 48c becomes high, and thus the vacuum seal member 48 becomes easy to handle. On the other hand, if the vertical length L3 of the vacuum seal narrow portion 48c is low, the ability of the vacuum sealing member 48 to incline along the container cover 31 or the bottom surface 49b of the seal groove 49 is improved. Since the vacuum seal narrow portion 48c forms a neck portion in the vacuum sealing member 48, as described above, and due to the presence of the protective spaces 48d and 48e, the vacuum sealing member 48 can be improved along the The ability of the container lid 31 to seal the bottom surface 49b of the groove 49, and thus improve the sealing performance of -21(19)(19)1320952. An upper limit of the length L6 of each of the contact surfaces 47c and 47d of the radical sealing member 47 is set with respect to the horizontal length L4 of the radical sealing member 47, and L6 is set to a value of 0. 6xL4kL6k0. 5 mm, preferably 〇. 6xL4kL 621 mm. By causing the contact surfaces 47c and 47d to have such a width (length L6), the shielding performance of the radical sealing member 47 can be stabilized. The thickness W1 of each of the radical sealing narrow portions 47a and 47b of the radical sealing member 47 is set such that the rigidity of the radical sealing narrow portions 47a and 47b, that is, the PTFE is at the thickness W1 The rigidity is such that the radically sealed narrow portions 47a and 47b are deformed by a force that does not exceed the vacuum side protrusion from the opening that has been pressed into the substantially U-shaped cross section of the radical sealing member 47. The restoring force of the block portion 48a, that is, the restoring force of the FKM in a state where the vacuum side bump portion 48a has been pressed. This causes the radical sealing narrow portions 47a and 47b to be pushed up and down by the restoring force by the vacuum side bump portion 48a, respectively, so as to maintain the shielding property of the radical sealing member 47 against free radicals. Even in the case where the contact surfaces 47c and 47d are subjected to creep. Specifically, the thickness W1 of each of the radical sealing narrow portions 47a and 47b is set to one to satisfy 2. 0 mm 2W 120. 05 mm, preferably 1. 5 mm 2W 120. 1 mm. If the thickness of the radical sealing narrow portions 47a and 47b is less than the thickness W1, the durability and processability of the radical sealing narrow portions 47a and 47b are drastically lowered, and thus the pair can no longer be obtained. Good shielding properties of free radicals. -22- (20) (20) 1320952 By providing the radical sealing narrow portions 47a and 47b as described above, the degree of freedom of deformation of the radical sealing member 47 is increased, and thus the radical sealing member 47 It can easily suffer from compression deformation. The ability of the radical sealing member 47 to be less than during compression can be improved as such, and thus the radical sealing member 47 can be made to have excellent durability, and the compressive load on the radical sealing member 47 can be reduced. The horizontal width D1 of each of the protective spaces 48d and 48e is set to at least one turn so that the natural length state (the state shown in Fig. 3) and the mounting state of the sealing member 46 (the state shown in Fig. 2) The atmospheric side end portion of the radical sealing member 47 and the atmospheric side convex portion 48b of the vacuum sealing member 48 are not in contact with each other. By providing the protective spaces 48d and 48e as described above, it is possible to move the radical sealing member 47 and the vacuum sealing member 48 independently of each other, even in the mounted state of the sealing member 46, and thus even In the case where the vacuum sealing member 48 has been dropped due to inconsistent tightening, the radical sealing member 47 does not conform to the movement of the vacuum sealing member 48, but the contact surfaces 47c and 47d can be satisfactorily maintained, respectively. The container 31 is in contact with the bottom surface 49b of the sealing groove 49. As a result, the shielding property of the radical sealing member 47 against the radicals can be made stable for a long period of time. The minimum width D2 of each of the protection spaces 48f and 48g is set to one 値 so as to be in the natural length state (the state shown in FIG. 3), and preferably also in the mounting state of the sealing member 46 (shown in FIG. 2). The state is greater than 〇. In the sealing member 46, since the rubber material (the FKM) and the resin material (the -23-(21) (21) 1320952 PTFE) are tied together, the compression load tends to be greater than the fastening - only the rubber material The case of the produced sealing member, but by providing the protective spaces 48f and 48g and setting the minimum width of the protective spaces 48f and 48g as described above, the reaction force from the resin material (the radical sealing member 47) The tie is kept low, and thus the tightening force required for the tie can be reduced. Further, by forming the protective spaces 48f and 48g as described above, a sufficient space for the deformation of the radical sealing member 47 can be ensured, and thus the deformation of the radical sealing member 47 can be caused to Stable, and thus can further reduce the reaction force from the radical sealing member 47. Fluorine radicals and/or oxygen radicals (hereinafter simply referred to as "free radicals") are generated in the vacuum vessel 11 of the plasma processing apparatus 10. The FKM constituting the vacuum sealing member 48 is easily thinned by these radicals. In FIG. 2, the radicals flow from the vacuum side to the atmosphere side, but because the radical sealing member 47 is disposed on the vacuum side, and is attached to the container lid 31 and the bottom surface 4 of the sealing groove 49. 9b is in intimate contact with each other, and the radical sealing member 47 prevents the radicals from reaching the vacuum sealing member 48 disposed on the atmospheric side. In particular, the PTFE constituting the radical sealing member 47 has an excellent resistance to such radicals, and therefore the radical sealing member 47 does not become thin. Further, although the recoverability of PTFE is reduced by creeping when continuously compressed for a long period of time, according to the sealing member 46, since the vacuum side bump portion 48a of the vacuum sealing member 48 is press-fitted into the radical seal The substantially U-shaped cross-section opening of member 47, the resilient force from the vacuum side tab portion 48a compensates for the reduced recoverability of the radical sealing member 47-24-(22) (22) 1320952. The radical sealing member 47 can prevent the radicals from reaching the vacuum sealing member 48 disposed on the atmosphere side for a long period of time. According to the plasma processing apparatus 1 , the vacuum sealing member 48 is disposed in the atmosphere. On the side, and in close contact with both the container lid 31 and the bottom surface 49b of the sealing groove 49. Further, as described above, the radicals do not reach the vacuum sealing member 48, and thus the vacuum sealing member 48 does not become thin. The vacuum sealing member 48 can prevent outside air from entering the vacuum vessel 11 for such a long period of time. According to the sealing member 46 of the present embodiment, the sealing member 46 has the radical sealing member 47 disposed on the vacuum side and made of PTFE having excellent resistance to free radicals; A vacuum sealing member 48, which is disposed on the atmospheric side, is made of FKM. The radical sealing member 47 prevents the radicals from reaching the vacuum sealing member 48, and thus prevents the vacuum sealing member 48 from being thinned by the radicals, thereby eliminating the need to use an anti-free radical FFKM. Further, the free-standing sealing member 47 and the vacuum sealing member 48 are attached together, and thus the sealing member 46 can be handled as a single body, and further, the size can be made small. As a result, the sealing member 46 does not require a predetermined sealing space, as would be required for a double sealing structure, which is inexpensive and ensures excellent durability. According to the sealing member 46 described above, the radical sealing member 47 has a substantially U-shaped cross section opened on the atmospheric side, and the vacuum side projection portion 48a of the vacuum sealing member 48 is press-fitted into the substantially U Shape - 25 - (23) 1320952 The restoration of the system and the end of the 9-edge seal, the air-to-medium sulcus 49 the opening of the section. Therefore, even if the recoverability of the radical sealing member 47 is reduced by creeping, the reduced reproducibility of the radical sealing member 47 can be compensated by the springback force from the pressed vacuum side bump portion 48a. As a result, the radical sealing member 47 can prevent the radicals from reaching the vacuum sealing member 48 provided on the atmosphere side for a long period of time, and the durability of the sealing member 46 can be maintained for a long period of time. Further, according to the sealing member 46, the radical sealing member 47 is made of PTFE. PTFE has an excellent resistance to these free radicals and therefore hardly becomes thinner by these free radicals. Thus, it is possible to reliably prevent the FKM constituting the vacuum sealing member 48 from being thinned by the radicals and thus to ensure better durability for the sealing member 46. Furthermore, the sealing member 46 has the protective spaces 48d, 48e, 48f and 48g around the circumference of the vacuum sealing member 48, and the protective air systems are individually defined by or through the vacuum sealing member 48. 48 and the free radical sealing member 47 are cooperatively defined. As a result, when the vacuum sealing member 48 is compressed in the vertical direction, the portion protruded by the true sealing member 48 can enter the protective spaces 48d, 48e 48f and 48g, whereby the vacuum sealing member 48 can be easily Suffering from compression. Further, the radical sealing member 47 has the radical sealing narrow portions 47a and 47b in the substantially U-shaped cross section, whereby the radical sealing member 47 can also be subjected to compression deformation easily. Therefore, in the sealing groove 49, the ability of the radical sealing member 47 to follow the bottom surface 49b of the sealing groove and the container lid 31 can be improved, and thus the durability can be ensured, and the freedom can be reduced again. The base sealing members 47 and -26-(24) (24) 1320952 compressive loads on the vacuum sealing member 48. Further, according to the sealing member 46, the vacuum sealing member 48 made of FKM realizes a vacuum sealing. This vacuum sealing can be achieved even if the surface in close contact with the FKM has a high surface roughness. As a result, the sealing member 46 enables an excellent vacuum seal. Further, there is no need to cause the surface roughness of the container lid 31 and the bottom surface 49b of the sealing groove 49 to be as low as possible. As a result, the control of the surface roughness of the container lid 31 and the sealing groove 49 becomes easy, and thus the manufacturing cost of the plasma processing apparatus 10 can be reduced. In the sealing member 46 described above, the radical sealing member 47 is made of PTFE. However, the radical sealing member 47 may be made of any material resistant to radicals, such as tetrafluoroethylene/perfluorodecane divinyl ether copolymer (PFA), tetrafluoroethylene/hexafluoropropylene copolymer ( Made of FEP), tetrafluoroethylene/ethylene copolymer (ETFE), polyvinylidene fluoride (PVDF), and polychlorotrifluoroethylene (PCTFE). These materials can be obtained easily and inexpensively, and thus the sealing member 46 can be made relatively inexpensive. Further, in the sealing member 46 described above, the vacuum sealing member 48 is made of FKM. However, the vacuum sealing member 48 can be made of any material having a vacuum sealing ability, such as a tetrafluoro & propylene-acrylic rubber (FEPM). These materials can also be easily and unmistakably obtained, and thus the sealing member 46 can be made cheaper. Next, the variation of the sealing member 46 will be described. As shown in Figures 2 and 3, in the above specific embodiment, on each side of a plane of symmetry about the sealing member 46 (see Figure 4), the seal -27-(25) 1320952 member 46 The radical sealing member 47 has a narrow portion 47a or 47b sealed as a curved portion. In this case, as shown in Fig. 4, in the mounted state of the sealing member 46 (the state shown in Fig. 2), the compressive force of the container lid 31 or the bottom surface 49b and the restoring force from the sealing member 48 occur. The case where the surface 47c or 47d of the radical sealing member 47 is not in surface contact with the facing surface (the container lid 31 or 49b). In an effort variation to remove this problem, as shown in Figures 6A through 6D, as described below, the self-sealing member 47 can be made to have three or more curved portions that are symmetric about the sealing member 46. a plane, whereby in the mounted state (state shown in FIG. 2), the contact surfaces 47c and 47d of the radical seal 47 are in surface contact with the container covers 31 and 49b, respectively, and thus A good free radical screen c. This is because the radical sealing member 47 has three or more curved portions providing a plane of symmetry of the sealing member 46, as shown in Figure 5, due to each opposing member (the container) The compressive force of the cover 31 surface 49b) and the moment occurring on the radical sealing member 47 from the vacuum sealing member 48 are distributed into the curved portion, and thus each contact surface of the radical sealing member 47 and 4 7d conforms to individual opposing components. The specific variation of the sealing member 46 is shown in Figures 6A through. As shown in FIGS. 6A and 6B, in addition to the radical sealing narrow portion 47b, the radical sealing member 47 may have another shape formed freely from the bottom surface of the vacuum contact sheet. The bottom surface of the cover member 46 is used to cover the dense portion, such as the bottom force, into the curved surface 47c 6D 47a and the symmetrical flat -28- (26) (26) 1320952 surface of the curved portion Share. Alternatively, as shown in Figs. 6C and 6D, in addition to the radical sealing narrow portions 47a and 47b, the radical sealing member 47 may have two curved portions formed in a plane of symmetry. Each of the curved portions is not limited to include a narrow portion, and each of the curved portions may include a notch or a recess (see FIGS. 6A and 6C) or may include an angular portion (see FIGS. 6A and 6C). See Figures 6B and 6 D), or may be another shape. In the above, the case where the sealing member 46 is disposed in the space defined by the sealing groove 49 and the container cover 31 has been described. However, the environment in which the sealing member 46 is used is not limited thereto, and the sealing member 46 can be used in any environment where it is necessary to isolate a vacuum seal from the atmosphere. For example, the sealing member 46 can be used in a joint that discharges gas from the exhaust system of the vacuum vessel 11. A KF flange joint structure is widely used as one of the joints of an exhaust system. Figure 7 is a cross-sectional view showing the case where the seal member shown in Figure 2 is used in a KF flange joint structure. As shown in FIG. 7, the KF flange joint structure 50 includes a tube 51 having a hole 51a and a circular flange portion 51b axially opposite the hole 51a; a receiving portion 52 having a a hole 52a through which the hole 51a of the tube 51 communicates; a center tube 53 located between the tube 51 and the receiving portion 52; and a substantially annular fastening member 54 having an inner flange portion 54a» The tube 51 has an insertion hole 51c in one end surface thereof, the insertion hole 51c being coaxial with the hole 51a and having a diameter larger than the diameter of the hole 51a -29- (27) 1320952 by a predetermined number. And the insertion end portion has an insertion hole 52b which is the same axial direction and has the same diameter as the insertion hole 51c. The outer diameter of the sub-part 53 is set to be smaller than the insertion holes 51c and 52b by a predetermined amount. The center hole 53a and the hole 52a of the receiving portion 52 can be positioned by inserting the lower end of the center tube 53 into the insertion holes 5 1 c and 52b respectively. The center tube 53 has a protrusion. Part 53a, one of which protrudes in the horizontal direction. The projecting portion 53a has a predetermined length in the direction of Fig. 7, and is designed such that its upper end and lower end extend in the horizontal direction in Fig. 7 and have an arcuate cross section. In a state where the tube 51 has been bowed from the center tube to the receiving portion 52, the inner portion 54a of the fastening member 54 is pressed against the circular flange portion 51b of the tube 51. As a result, the upper end and the lower end of the protruding portion 53a are divided into the end surface of the tube 51 and the end surface of the receiving portion 52, so that the distance between one of the receiving portions 52 is maintained at a predetermined turn. Furthermore, with the KF flange joint structure 50, the hole 5: the inside of the vacuum vessel 11 communicates. Thus, the pressure of the hole 51a and the inside is substantially a vacuum, and further free radicals flow into the hole 52a. In Fig. 7, the holes 51a and 52a are on the vacuum side, and the outside of the tube 51 corresponds to the atmosphere side. Here, since the size of the sealing member 46 is small, the base sealing member 47 and the vacuum sealing member 48 are like the earlier 52 in the hole 52a, the diameter of the center tube is higher than the upper end and the f sub 51 is The vertical shape in Fig. 7 is such that the peripheral portion of the flange portion of the attachment portion 53 contacts the protruding tube 51. [a system and the hole 5 2 a hole 5 1 a corresponds to the self-narration -30 - (28) (28)

1320952 在一起，該密封部件46不需要—預定之密封空間。g 封部件46可如此安置在一藉著該管子51之端面、該淨 部份52之端面、及該中心管子53的突出部份53a之弓 側面所界定的空間中。亦即，能使用該密封部件46，而 會改變該KF凸緣接頭結構50之結構。 於該KF凸緣接頭結構5〇中，該管子5ι之端面及 承接部份52的端面間之距離、亦即該突出部份53a於 垂直方向中之長度，係設定爲比該自由基密封構件47 該垂直方向中之自然長度及該真空密封構件48於該垂 方向中之自然長度較短達一預定長度，藉此當該密封部 46係安置在藉由該管子51之端面、該承接部份52之端 、及該中心管子5 3的突出部份5 3 a之弓形側面所界定 空間中時，該自由基密封構件47及該真空密封構件48 每一個係於該垂直方向中壓縮。其結果是，該自由基密 構件47及該真空密封構件48之每一個產生一彈回力， 因此由於該彈回力造成該自由基密封構件47及該真空 封構件48之每一個與該管子51之端面及該承接部份 的端面兩者緊密接觸。該自由基密封構件47可如此長 期防止流入該等孔洞51a及52a之自由基抵達該真空密 構件48。再者，該真空密封構件48能長時期防止外部 氣進入該等孔洞51a及52a。 其次，將敘述一根據本發明之第二具體實施例的密 部件。 以結構及操作之觀點，本具體實施例係基本上類似 密 接 形 不 該 該 於 直 件 面 的 之 封 且 密 52 時 封 空 封 於 -31 - (29) (29)1320952 上述第一具體實施例，與上述第一具體實施例不同者僅只 在於該基材處理設備中使用一腐蝕性氣體，而非一反應活 性氣體。與該第一具體實施例相同之結構特色及操作的敘 述將如此被省略，下面敘述僅只與該第一具體實施例不同 之結構特色及操作。 圖8係根據本具體實施例的密封部件之一放大剖視圖 。注意該壓力已大致減少至一真空及該腐蝕性氣體係存在 之一區域係位於該圖面之頂部，且一打開至該大氣之區域 係位於該圖面之底部。下文，至該圖示之頂部的區域將如 此被稱爲“該真空側”，且至該圖示之底部的區域被稱爲 “該大氣側”。再者，該圖示中之上/下方向將被稱爲該 “水平方向”，且該圖示中之左/右方向將被稱爲該“垂 直方向”。 如圖8所示，該密封部件55具有一腐鈾性氣體密封 構件56，其具有一在該大氣側上打開之大致U形橫截面； 及該真空密封構件48。該腐蝕性氣體密封構件56係設置 在該真空側上，且該真空密封構件48係設置在該大氣側 上。該腐蝕性氣體密封構件56係由奧氏體型不銹鋼所製 成，且該真空密封構件48係由FKM所製成。 該密封部件55係譬如安置在由該容器蓋子31、及形 成於該真空容器11中之密封溝槽49所界定的空間中，該 密封溝槽49具有一長方形橫截面。該容器蓋子31係設置 在該密封部件55上方，該容器蓋子31接觸該密封部件55 之一上部。特別地是，該密封溝槽49的底面4 9b接觸該 -32- (30) (30)1320952 腐蝕性氣體密封構件56及該真空密封構件48，且該容器 蓋子31亦接觸該腐蝕性氣體密封構件56及該真空密封構 件48。 該容器蓋子31及該密封溝槽49的底面4 9b間之距離 係設定爲比該腐蝕性氣體密封構件56於該垂直方向中之 自然長度及該真空密封構件48於該垂直方向中之自然長 度較短達一預定長度，由此當該密封部件55係安置在藉 由該密封溝槽49及該容器蓋子31所界定的空間中時，該 腐蝕性氣體密封構件56及該真空密封構件48之每一個係 於該垂直方向中壓縮。其結果是，該腐蝕性氣體密封構件 56及該真空密封構件48之每一個產生一彈回力，且因此 由於該彈回力造成該腐蝕性氣體密封構件56及該真空密 封構件48之每一個與該容器蓋子31及該密封溝槽49的 底面49b兩者緊密接觸。 該真空密封構件48之真空側凸塊部份48a係壓合進 入該腐蝕性氣體密封構件56之大致U形橫截面的開口。 其結果是’該腐蝕性氣體密封構件56及該真空密封構件 48係裝在一起。再者，部份該真空密封構件48之真空側 凸塊部份48a係由部份該腐蝕性氣體密封構件56分開， 以便形成保護空間48h及48i。 當該真空密封構件48係於該垂直方向中壓縮時，由 該真空密封構件48突出之各部份進入位於如上面所述環 繞著該真空密封構件48之周邊的保護空間48d、48e、48h 及48i，由此該等保護空間48d、48e、48h及48i增進該 -33- (31)1320952 真空密封構件48之壓縮變形。 體 該 真 面 蝕 地 對 封 時 構 具 56 之 其 體 j 變 求 48 理 55 者 構成該真空密封構件48之FKM係藉著該腐蝕性氣 輕易地變薄，於圖8中，該腐蝕性氣體由該真空側流向 大氣側，但因爲該腐蝕性氣體密封構件56係設置在該 空側上，且係與該容器蓋子31及該密封溝槽49的底 49b兩者緊密接觸，該腐蝕性氣體密封構件56防止該腐 性氣體抵達設置在該大氣側上之真空密封構件48。特別 是，構成該腐蝕性氣體密封構件56之奧氏體型不銹鋼 該腐蝕性氣體具有絕佳之阻抗，且因此該腐蝕性氣體密 構件56不會變薄。該腐蝕性氣體密封構件56可如此長 期防止該腐蝕性氣體抵達設置在該大氣側上之真空密封 件48。 根據本具體實施例之密封部件55，該密封部件55 有該腐蝕性氣體密封構件56，該腐蝕性氣體密封構件 係設置在該真空側上，且係由對該腐蝕性氣體具有絕佳 阻抗的奧氏體型不銹鋼所製成；及該真空密封構件48, 係設置在該大氣側上及係由FKM所製成。該腐蝕性氣 密封構件56防止該腐蝕性氣體抵達該真空密封構件48 且因此可防止該真空密封構件48藉由該腐蝕性氣體而 薄，藉此能消除使用一抗腐蝕性氣體之彈性體材料的需 。再者，該腐蝕性氣體密封構件56及該真空密封構件 係裝在一起，且因此該密封部件55可當作單一本體處 ，及再者其尺寸可製成小的。其結果是，該密封部件 不需要一預定之密封空間，如用於雙重密封結構將需要 -34- (32) (32)1320952 ，該密封部件55係不貴的，並可確保絕佳之耐用性。 再者，根據該密封部件55，該腐蝕性氣體密封構件 56係由奧氏體型不銹鋼所製成。奧氏體型不銹鋼對該腐蝕 性氣體具有絕佳之阻抗，且因此幾乎不會藉著該腐蝕性氣 體而變薄。如此能可靠地防止構成該真空密封構件48之 FKM藉著該腐蝕性氣體而變薄，且因此能夠對於該密封部 件55確保又更好之耐用性。 再者，該密封部件55環繞該真空密封構件48之周邊 具有該等保護空間48d、48e、48h及48i，該等保護空間 係藉著該真空密封構件48所獨自界定或藉著該真空密封 構件48及該腐蝕性氣體密封構件56所合作界定。其結果 是，當在該垂直方向中壓縮該真空密封構件48時，由該 真空密封構件48突出之部份能進入該等保護空間48d、 48e、48h及Mi，由此該真空密封構件48可輕易地遭受 壓縮變形。如此可防止該真空密封構件48被壓破，且因 此能夠確保又更好之耐用性。 於上面所述之密封部件55中，該腐蝕性氣體密封構 件56係由奧氏體型不銹鋼所製成。然而，該腐触性氣體 密封構件56可由任何抗腐蝕性氣體之材料所製成，譬如 亦可由異於奧氏體、鎳、或鋁之型式的不銹鋼之任何一種 所製成。這些材料可輕易及不貴地取得，且因此可較便宜 地製成該密封部件5 5。 於上文中，已敘述該密封部件55係安置在由該密封 溝槽49及該容器蓋子31所界定的空間中之案例。然而， -35- (33) (33)1320952 使用該密封部件55之環境係不限於此，反之該密封部件 55可被用在任何環境，在此由該大氣隔離一真空之密封係 必需的。譬如，當然該密封部件55亦可被用於稍早敘述 之KF凸緣接頭結構50中。 於上面所述之具體實施例中，待處理之基材係半導體 晶圓。然而，該等待處理之基材不限於此，反之亦可譬如 爲LCD(液晶顯示器）或FPD(平板顯示器）玻璃基材。 【圖式簡單說明】 圖1係一剖視圖’其根據本發明之第一具體實施例槪 要地顯示一當作基材處理設備的電漿處理設備之結構； 圖2係圖1中所出現之〇型環形密封部件的放大剖視 圖； 圖3係一剖視圖，其顯示圖2所示密封部件的一特定 形狀； 圖4係一視圖，其顯示圖2所示密封部件的一安裝狀 態； 圖5係一視圖，其顯示圖2所示密封部件的一種變異 之安裝狀態； 圖6 A至6 D係剖視圖，其顯示圖2所示密封部件的 各種變異； 圖7係一剖視圖，其顯示圖2所示密封部件被用於一 KF凸緣接頭結構的案例；及 圖8係一根據本發明之第二具體實施例的密封部件之 -36- (34) (34)1320952 放大剖視圖。 【主要元件符號說明】 1 〇 :電漿處理設備 1 1 :真空容器 12 :襯托器 1 3 :排氣路徑 14 :擋板 1 5 :適應性壓力控制閥 16 :隔離器 1 7 :渦輪分子幫浦 18 :乾式幫浦 19 :管道 2 0 :局頻電源 21 :進料桿 22 :匹配器 23 :電極板 24 :直流電源 25 :焦環 26 :冷卻劑室 27 :冷卻劑管道 28 :氣體供給孔洞 29 :絕緣構件 3 0 :氣體供給管線 -37 (35) (35)1320952 31 :容器蓋子 3 2 :氣體供給單元 33 :推桿栓銷 3 4 :噴射頭 35 :匹配器 36 :高頻電源 3 7 :氣體孔洞 3 8 :電極板 3 9 :電極支座 40 :緩衝室 41 :處理氣體導入管 42 :管道絕緣體 43 :轉移通口 44 :閘閥 45 :側壁構件 46 :密封部件 47 :自由基密封構件 47a :自由基密封狹窄部份 47b :自由基密封狹窄部份 4 7 c :接觸表面 47d :接觸表面 48 :真空密封構件 4 8 a :真空側凸塊部份 48b :大氣側凸塊部份 (36) (36)1320952 48c:真空密封狹窄部份 48d :保護空間 48e :保護空間 48f :保護空間 48g :保護空間 48h :保護空間 48i :保護空間 49 :密封溝槽 49a :真空側側面 49b :底面 5 0 :凸緣接頭結構 51 :管子 5 1 a ·:孔洞 5 1 b :凸緣部份 5 1 c :插入孔洞 52 :承接部份 5 2 a :孔洞 5 2 b :插入孔洞 5 3 :中心管子 5 3 a :突出部份 54 :緊固構件 54a :內部凸緣部份 5 5 :密封部件 56:腐蝕性氣體密封構件 -39 (37) (37)13209521320952 Together, the sealing member 46 does not require a predetermined sealed space. The g-sealing member 46 can be disposed in a space defined by the end face of the pipe 51, the end face of the net portion 52, and the bow side of the projecting portion 53a of the center pipe 53. That is, the sealing member 46 can be used, and the structure of the KF flange joint structure 50 can be changed. In the KF flange joint structure 5, the distance between the end surface of the tube 5i and the end surface of the receiving portion 52, that is, the length of the protruding portion 53a in the vertical direction is set to be larger than the radical sealing member. 47 The natural length in the vertical direction and the natural length of the vacuum sealing member 48 in the vertical direction are shorter than a predetermined length, whereby the sealing portion 46 is disposed on the end surface of the tube 51, the receiving portion When the end of the portion 52 and the arcuate side of the protruding portion 5 3 a of the center tube 53 are defined, the radical sealing member 47 and the vacuum sealing member 48 are each compressed in the vertical direction. As a result, each of the radical sealing member 47 and the vacuum sealing member 48 generates a springback force, so that each of the radical sealing member 47 and the vacuum sealing member 48 and the tube 51 are caused by the springback force. Both the end face and the end face of the receiving portion are in close contact. The radical sealing member 47 can prevent the radicals flowing into the holes 51a and 52a from reaching the vacuum tight member 48 for a long period of time. Further, the vacuum sealing member 48 can prevent external air from entering the holes 51a and 52a for a long period of time. Next, a close-packed member according to a second embodiment of the present invention will be described. From a structural and operational point of view, the present embodiment is substantially similar to a close-fitting seal that should not be sealed on the straight face and is sealed at -52 - (29) (29) 1320952. For example, the difference from the first embodiment described above is only that a corrosive gas is used in the substrate processing apparatus instead of a reactive gas. The description of the same structural features and operation as the first embodiment will be omitted as such, and only the structural features and operations which are different from the first embodiment will be described below. Figure 8 is an enlarged cross-sectional view of one of the sealing members in accordance with the present embodiment. Note that the pressure has been substantially reduced to a vacuum and one of the areas of the corrosive gas system is at the top of the drawing, and the area that opens to the atmosphere is at the bottom of the drawing. Hereinafter, the area to the top of the figure will be referred to as "the vacuum side", and the area to the bottom of the figure will be referred to as "the atmosphere side". Further, the upper/lower direction in the illustration will be referred to as the "horizontal direction", and the left/right direction in the illustration will be referred to as the "vertical direction". As shown in Fig. 8, the sealing member 55 has a uranium gas sealing member 56 having a substantially U-shaped cross section opened on the atmospheric side; and the vacuum sealing member 48. The corrosive gas sealing member 56 is disposed on the vacuum side, and the vacuum sealing member 48 is disposed on the atmosphere side. The corrosive gas sealing member 56 is made of austenitic stainless steel, and the vacuum sealing member 48 is made of FKM. The sealing member 55 is disposed, for example, in a space defined by the container cover 31 and the sealing groove 49 formed in the vacuum container 11, the sealing groove 49 having a rectangular cross section. The container lid 31 is disposed above the sealing member 55, and the container lid 31 contacts an upper portion of the sealing member 55. In particular, the bottom surface 49b of the sealing groove 49 contacts the -32-(30)(30)1320952 corrosive gas sealing member 56 and the vacuum sealing member 48, and the container lid 31 also contacts the corrosive gas seal. Member 56 and vacuum sealing member 48. The distance between the container cover 31 and the bottom surface 49b of the sealing groove 49 is set to be greater than the natural length of the corrosive gas sealing member 56 in the vertical direction and the natural length of the vacuum sealing member 48 in the vertical direction. Shorter than a predetermined length, whereby the corrosive gas sealing member 56 and the vacuum sealing member 48 are disposed when the sealing member 55 is disposed in a space defined by the sealing groove 49 and the container cover 31 Each is compressed in this vertical direction. As a result, each of the corrosive gas sealing member 56 and the vacuum sealing member 48 generates a resilient force, and thus each of the corrosive gas sealing member 56 and the vacuum sealing member 48 is caused by the resilient force. Both the container lid 31 and the bottom surface 49b of the sealing groove 49 are in close contact. The vacuum side projection portion 48a of the vacuum sealing member 48 is press-fitted into the opening of the substantially U-shaped cross section of the corrosive gas sealing member 56. As a result, the corrosive gas sealing member 56 and the vacuum sealing member 48 are attached together. Further, part of the vacuum side bump portion 48a of the vacuum sealing member 48 is separated by a portion of the corrosive gas sealing member 56 to form the protective spaces 48h and 48i. When the vacuum sealing member 48 is compressed in the vertical direction, portions protruding from the vacuum sealing member 48 enter the protective spaces 48d, 48e, 48h located around the periphery of the vacuum sealing member 48 as described above and 48i, whereby the protective spaces 48d, 48e, 48h, and 48i enhance the compression deformation of the -33-(31) 1320952 vacuum sealing member 48. The FKM of the vacuum sealing member 48 is easily thinned by the corrosive gas in the body of the sealing member 56. In the case of FIG. 8, the corrosive property is obtained. The gas flows from the vacuum side to the atmosphere side, but since the corrosive gas sealing member 56 is disposed on the empty side and is in close contact with both the container lid 31 and the bottom 49b of the sealing groove 49, the corrosiveness The gas sealing member 56 prevents the corrosive gas from reaching the vacuum sealing member 48 disposed on the atmospheric side. In particular, the austenitic stainless steel constituting the corrosive gas sealing member 56 has an excellent corrosion resistance, and therefore the corrosive gas-tight member 56 does not become thin. The corrosive gas sealing member 56 can prevent the corrosive gas from reaching the vacuum seal 48 disposed on the atmosphere side for a long period of time. According to the sealing member 55 of the present embodiment, the sealing member 55 has the corrosive gas sealing member 56 disposed on the vacuum side and having excellent resistance to the corrosive gas. The austenitic stainless steel is formed; and the vacuum sealing member 48 is disposed on the atmosphere side and is made of FKM. The corrosive gas sealing member 56 prevents the corrosive gas from reaching the vacuum sealing member 48 and thus prevents the vacuum sealing member 48 from being thin by the corrosive gas, thereby eliminating the use of an elastomeric material of a corrosion resistant gas. Need. Further, the corrosive gas sealing member 56 and the vacuum sealing member are attached together, and thus the sealing member 55 can be regarded as a single body, and further, the size thereof can be made small. As a result, the sealing member does not require a predetermined sealing space, and if used for a double sealing structure, -34-(32) (32) 1320952 will be required, and the sealing member 55 is inexpensive and ensures excellent durability. Sex. Further, according to the sealing member 55, the corrosive gas sealing member 56 is made of austenitic stainless steel. The austenitic stainless steel has an excellent resistance to the corrosive gas, and thus is hardly thinned by the corrosive gas. Thus, it is possible to reliably prevent the FKM constituting the vacuum sealing member 48 from being thinned by the corrosive gas, and thus it is possible to ensure better durability for the sealing member 55. Furthermore, the sealing member 55 has the protective spaces 48d, 48e, 48h and 48i around the periphery of the vacuum sealing member 48, and the protective spaces are individually defined by or through the vacuum sealing member 48. 48 and the corrosive gas sealing member 56 are cooperatively defined. As a result, when the vacuum sealing member 48 is compressed in the vertical direction, the portion protruded by the vacuum sealing member 48 can enter the protective spaces 48d, 48e, 48h, and Mi, whereby the vacuum sealing member 48 can be It is easily subjected to compression deformation. This prevents the vacuum sealing member 48 from being crushed, and thus can ensure better durability. In the sealing member 55 described above, the corrosive gas sealing member 56 is made of austenitic stainless steel. However, the rotatory gas sealing member 56 may be made of any material that is resistant to corrosive gases, for example, any of stainless steels other than austenitic, nickel, or aluminum. These materials can be easily and inexpensively obtained, and thus the sealing member 55 can be made relatively inexpensively. In the above, the case where the sealing member 55 is disposed in the space defined by the sealing groove 49 and the container cover 31 has been described. However, the environment in which the sealing member 55 is used is not limited thereto, and the sealing member 55 can be used in any environment where it is necessary to isolate a vacuum seal from the atmosphere. For example, the sealing member 55 can of course be used in the KF flange joint structure 50 described earlier. In the specific embodiment described above, the substrate to be processed is a semiconductor wafer. However, the substrate to be processed is not limited thereto, and may be, for example, an LCD (Liquid Crystal Display) or FPD (Flat Panel Display) glass substrate. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing a structure of a plasma processing apparatus as a substrate processing apparatus according to a first embodiment of the present invention; FIG. 2 is a view showing the appearance of FIG. Figure 3 is a cross-sectional view showing a specific shape of the sealing member shown in Figure 2; Figure 4 is a view showing a mounted state of the sealing member shown in Figure 2; Figure 1 is a cross-sectional view showing the various variations of the sealing member shown in Figure 2; Figure 7 is a cross-sectional view showing the Figure 2 A case where the sealing member is used for a KF flange joint structure; and Fig. 8 is an enlarged cross-sectional view of the sealing member - 36-(34) (34) 1320952 according to the second embodiment of the present invention. [Main component symbol description] 1 〇: plasma processing equipment 1 1 : vacuum vessel 12 : susceptor 1 3 : exhaust path 14 : baffle 1 5 : adaptive pressure control valve 16 : isolator 1 7 : turbo molecular help Pu 18: dry pump 19: pipe 2 0: local frequency power supply 21: feed rod 22: matcher 23: electrode plate 24: DC power supply 25: coke ring 26: coolant chamber 27: coolant pipe 28: gas supply Hole 29: Insulating member 3 0 : Gas supply line - 37 (35) (35) 1320952 31 : Container lid 3 2 : Gas supply unit 33 : Push rod pin 3 4 : Spray head 35 : Matcher 36 : High frequency power supply 3 7 : gas hole 3 8 : electrode plate 3 9 : electrode holder 40 : buffer chamber 41 : process gas introduction pipe 42 : pipe insulator 43 : transfer port 44 : gate valve 45 : side wall member 46 : sealing member 47 : free radical Sealing member 47a: radical seal narrow portion 47b: radical seal narrow portion 4 7 c : contact surface 47d: contact surface 48: vacuum sealing member 4 8 a : vacuum side bump portion 48b: atmosphere side bump portion Parts (36) (36) 1320952 48c: vacuum sealed narrow portion 48d: protective space 48e: protective space 48f: Protective space 48g: protective space 48h: protective space 48i: protective space 49: sealing groove 49a: vacuum side side 49b: bottom surface 50: flange joint structure 51: tube 5 1 a ·: hole 5 1 b: flange portion Parts 5 1 c : insertion hole 52 : receiving portion 5 2 a : hole 5 2 b : insertion hole 5 3 : center tube 5 3 a : protruding portion 54 : fastening member 54 a : inner flange portion 5 5 : Sealing member 56: Corrosive gas sealing member - 39 (37) (37) 1320952

S :處理空間 V1 :閥門 V2 :閥門 W :半導體晶圓S : Processing space V1 : Valve V2 : Valve W : Semiconductor wafer

Claims (1)

1320952 ⑴ 十、申請專利範困 1· 一種在基材處理設備中之密封部件，該基材處理設 備具有一減壓容器，在該減壓容器中存在有一高-彈性聚 合材料-侵蝕之.侵蝕物質，且在一容置於該減壓容器中之 s材上施行預定處理，該密封部件密封該減壓容器之一內 部’並使其與該減壓容器外部隔離，該密封部件包含： —第一構件，其係設置在該減壓容器之一內部側上， 且係耐得住該侵蝕物質； 一第二構件，其由設置在該減壓容器的一外部側上之 高彈性聚合材料所製成；及 至少一預定空間，其經過彼此分開之至少部份該第一 構件及至少部份該第二構件所形成； 其中該第一構件及該第二構件係裝在一起。 2·如申請專利範圍第1項之密封部件，其中該第一構 件具有一在該外部側上打開之大致U形橫截面，且至少部 份該第二構件進入該U形橫截面之該開口。 3. 如申請專利範圍第2項之密封部件，其中該第一構 件之該U形橫截面在其內具有至少一彎曲部份。 4. 如申請專利範圍第3項之密封部件，其中該彎曲部 份係一狹窄部份。 5. 如申請專利範圍第1項之密封部件，其中該侵蝕物 質係一由反應活性氣體所產生之活性種類，且該第一構件 係由氟樹脂所製成。 6. 如申請專利範圍第5項之密封部件，其中該氟樹脂 • 41 - (2) (2)iy2〇952 係一選自由聚四氟乙烯、四氟乙烯/全氟烷二乙烯醚共聚 物、四氟乙烯/六氟丙烯共聚物、四氟乙烯/乙烯共聚物、 聚偏二氟乙烯、及聚氯四氟乙烯所組成之族群者。 7·如申請專利範圍第5項之密封部件，其中該高彈性 聚合材料係一選自由1.1-二氟乙烯型橡膠、及四氟乙烯-丙Μ型橡膠所組成之族群者。 8 .如申請專利範圍第1項之密封部件，其中該侵蝕物 質係一腐蝕性氣體，且該第一構件係由一抗腐蝕之金屬所 製成。 9 ·如申請專利範圍第8項之密封部件’其中該抗腐蝕 之金屬係一選自由不銹鋼、鎳、及鋁所組成之族群者》 1 0 .如申請專利範圍第8項之密封部件，其中該高彈 性聚合材料係一選自由1.1-二氟乙烯型橡膠、及四氟乙 烯-丙烯型橡膠所組成之族群者。 11. 如申請專利範圍第1項之密封部件，其中該第二 構件具有一頸部。 12. ~種基材處理設備，包含： 一減壓容器，在該減壓容器中存在有一高-彈性聚合 材料-侵蝕之侵蝕物質； 一處理設備，其在一容置於該減壓容器中之基材上施 行預定處理；及 —密封部件，其密封該減壓容器之一內部並使其與該 減壓容器外部隔離； 其中該密封部件具有一第一構件，其係設置在該減壓 -42- (3) (3)1320952 容器之一內部側上，且係耐得住該侵蝕物質；一第二構件 ，其由設置在該減壓容器的一外部側上之高彈性聚合材料 所製成；及至少一預定空間，其經過彼此分開之至少部份 該第一構件及至少部份該第二構件所形成，該第一構件及 該第二構件係裝在一起。 13_如申請專利範圍第12項之基材處理設備，其中該 第一構件具有一在該外側上打開之大致U形橫截面，且至 少部份該第二構件進入該U形橫截面之該開口。 14. 如申請專利範圍第12項之基材處理設備，其中該 侵蝕物質係一由反應活性氣體所產生之活性種類，且該第 一構件係由氟樹脂所製成。 15. 如申請專利範圍第12項之基材處理設備，其中該 侵蝕物質係一腐蝕性氣體，且該第一構件係由一抗腐蝕之 金屬所製成。1320952 (1) X. Application for patents 1. A sealing member in a substrate processing apparatus, the substrate processing apparatus having a reduced pressure vessel in which a high-elastic polymeric material - eroded and eroded a substance, and performing a predetermined treatment on a material contained in the decompression container, the sealing member sealing the inside of one of the decompression containers and isolating from the outside of the decompression container, the sealing member comprising: a first member disposed on an inner side of the decompression container and resistant to the corrosive substance; a second member having a highly elastic polymeric material disposed on an outer side of the decompression container And at least one predetermined space formed by at least a portion of the first member and at least a portion of the second member separated from each other; wherein the first member and the second member are attached together. 2. The sealing member of claim 1, wherein the first member has a generally U-shaped cross section that opens on the outer side, and at least a portion of the second member enters the opening of the U-shaped cross section. . 3. The sealing member of claim 2, wherein the U-shaped cross section of the first member has at least one curved portion therein. 4. The sealing member of claim 3, wherein the curved portion is a narrow portion. 5. The sealing member of claim 1, wherein the erosive material is an active species produced by a reactive gas, and the first member is made of a fluororesin. 6. The sealing member of claim 5, wherein the fluororesin 41 - (2) (2) iy2 〇 952 is selected from the group consisting of polytetrafluoroethylene, tetrafluoroethylene/perfluoroalkyl divinyl ether copolymer A group consisting of tetrafluoroethylene/hexafluoropropylene copolymer, tetrafluoroethylene/ethylene copolymer, polyvinylidene fluoride, and polychlorotetrafluoroethylene. 7. The sealing member of claim 5, wherein the highly elastic polymeric material is selected from the group consisting of 1.1-difluoroethylene type rubber and tetrafluoroethylene-propylene type rubber. 8. The sealing member of claim 1, wherein the erosive material is a corrosive gas, and the first member is made of a corrosion resistant metal. 9. The sealing member of claim 8 wherein the corrosion-resistant metal is selected from the group consisting of stainless steel, nickel, and aluminum. 10 . The sealing member of claim 8 wherein The highly elastic polymeric material is selected from the group consisting of 1.1-difluoroethylene type rubber and tetrafluoroethylene-propylene type rubber. 11. The sealing member of claim 1, wherein the second member has a neck. 12. A substrate processing apparatus comprising: a reduced pressure vessel in which a high-elastic polymeric material-eroded erosive material is present; a processing apparatus disposed in the reduced pressure vessel Predetermined processing is performed on the substrate; and a sealing member that seals inside of one of the decompression containers and is isolated from the outside of the decompression container; wherein the sealing member has a first member disposed at the decompression - 42- (3) (3) 1320952 on one of the inner sides of the container and resistant to the erosive material; a second member consisting of a highly elastic polymeric material disposed on an outer side of the reduced pressure container And at least one predetermined space formed by at least a portion of the first member and at least a portion of the second member separated from each other, the first member and the second member being affixed together. The substrate processing apparatus of claim 12, wherein the first member has a substantially U-shaped cross section that opens on the outer side, and at least a portion of the second member enters the U-shaped cross section. Opening. 14. The substrate processing apparatus of claim 12, wherein the erosive material is an active species produced by a reactive gas, and the first member is made of a fluororesin. 15. The substrate processing apparatus of claim 12, wherein the erosive material is a corrosive gas, and the first member is made of a corrosion resistant metal. -43--43-
TW095120985A 2005-09-30 2006-06-13 Sealing part and substrate processing apparatus TWI320952B (en)

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DE102006029425B4 (en) 2019-09-19
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