KR20070037295A - Sealing part and substrate processing apparatus - Google Patents

Abstract

Sealing parts that can ensure low cost and excellent durability without requiring a predetermined sealing space required for a double sealing structure. The sealing component seals the inside of the decompression vessel from the outside, in which the erosion material is eroded into the high elastic polymer material, and the decompression vessel performs a predetermined treatment on the substrate accommodated in the decompression vessel. Consists of The sealing part has a radical sealing member and a vacuum sealing member. The radical sealing member is disposed inside the pressure reducing vessel and is resistant to erosion material. The vacuum sealing member is made of a high elastic polymer material and is disposed outside the pressure reducing vessel. At least one evacuation space is formed by at least a portion of the radical sealing member and at least a portion of the vacuum sealing member being spaced from each other. The radical sealing member and the vacuum sealing member are fitted to each other.

Description

SEALING PART AND SUBSTRATE PROCESSING APPARATUS}

1 is a cross-sectional view schematically showing the configuration of a plasma processing apparatus as a substrate processing apparatus according to a first embodiment of the present invention;

2 is an enlarged cross-sectional view of an O-ring-shaped sealing component in FIG. 1, FIG.

3 is a cross-sectional view showing a specific shape of the sealing component shown in FIG. 2;

4 is a view showing an installation state of the sealing component shown in FIG.

5 is a view showing an installation state of a modification of the sealing component shown in FIG. 2;

6A to 6D are cross-sectional views showing modifications of the sealing component shown in FIG. 2;

7 is a cross-sectional view showing a case where the sealing component shown in FIG. 2 is applied to a KF flange joint;

8 is an enlarged cross-sectional view of a sealing component according to a second embodiment of the present invention.

<Explanation of symbols for main parts of drawing>

W: wafer 10: plasma processing apparatus

11: vacuum container 31: container lid

46, 55: sealing part 47: radical sealing member

47a, 47b: Radial sealing narrow part 48: Vacuum sealing member

48d, 48e, 48f, 48g, 48h, 48i: evacuation space

49: sealing groove 50: KF flange connection structure

51 pipe 51b circular flange

53 centering pipe 54 fastening member

54a: inner flange portion 56: corrosion gas sealing member

TECHNICAL FIELD The present invention relates to a sealing part and a substrate processing apparatus, and more particularly, to a sealing component used in a substrate processing apparatus for forming a plasma from a reactive active gas and treating the substrate using the plasma.

A plasma processing apparatus that performs plasma processing such as etching on a semiconductor wafer as a substrate includes a vacuum chamber capable of reducing the pressure to almost vacuum. An etching process is performed on the semiconductor wafer accommodated in the vacuum chamber using the processing gas which has been plasma-formed inside the vacuum chamber. In such a plasma processing apparatus, a ring-shaped sealing component is used to seal the inside (vacuum) of the vacuum chamber from the outside (atmosphere) (see, for example, US Pat. No. 6,689,221). In particular, in an etching processing apparatus as a plasma processing apparatus, an O-ring made of fluororubber, which is a heat-resistant rubber, is used as the sealing component because the semiconductor wafer is heated to high temperature by receiving energy from the plasma.

Recently, reactive active gases (e.g., C ₄ F ₈ as process gases) Since a mixed gas containing a CxFy gas system such as a gas is used, an etching process for controlling an etching rate by the reaction part product has become a mainstream. In this etching treatment, depositable active species such as fluorine radicals are generated when the reactive active gas is converted into plasma.

In addition, in the etching process using the reactive active gas, the reaction product is attached to the inner wall of the vacuum chamber. The attached reaction product is peeled off to form particles and adheres to the semiconductor device of the semiconductor wafer, thereby degrading the yield of the semiconductor device. Therefore, in the plasma processing apparatus, a dry laundering process is performed to remove the adhered reaction products. For example, a wafer-less dry cleaning (WLDC) process, which is a kind of dry cleaning process, is performed. In the WLDC treatment, the reaction by-products are removed by oxygen ions generated from oxygen gas, but at this time, oxygen radicals also occur.

The fluorine rubber is easily consumed by radicals (fluorine radicals and / or oxygen radicals). Therefore, in the plasma processing apparatus employing a reactive active gas, a fluorine resin (specifically, an O-ring-shaped sealing component (RTR (radical trap ring) made of Teflon (registered trademark)) having radical resistance on the vacuum side is used. Is used, and a double-sealed structure in which an O ring made of fluorine rubber (specifically, vinylidene fluoride rubber (FKM)) is disposed on the atmosphere side is used.RTR is a Teflon (registered trademark) tube. And rubber filled in the tube.

In such a double sealing structure, the RTR seals the radicals so that the radicals do not leak on the vacuum side, and the O-ring of the fluorine rubber seals the vacuum in the vacuum chamber from the outside atmosphere. In addition, since this double sealing structure requires two sealing grooves in which the O-rings of RTR and fluororubber are accommodated, respectively, a predetermined sealing space is required.

However, since the conventional plasma processing apparatus is not designed on the premise of using the double sealing structure, a predetermined sealing space cannot be secured, and the above-mentioned double sealing structure is applied to the conventional plasma processing apparatus. It is difficult. In particular, in the KF flange joining structure (JISG 5526) used for joining two pipes, since the two sealing grooves cannot be provided in structure, the above-mentioned double sealing structure cannot be applied.

When the double sealing structure cannot be applied, it is made of fluororubber (specifically, tetrafluoroethylene-perfluorofluorovinyl ether rubber (FFKM)) having radical (resistance) resistance I use O-rings, but FFKM is very expensive and my radical resistance is worse than Teflon®. In particular, recently, since it is strongly demanded that the plasma processing apparatus has a long life, FFKM cannot secure durability that satisfies the requirements of the plasma processing apparatus user.

An object of the present invention is to provide a sealing component and a substrate processing apparatus which can secure a low cost and excellent durability without requiring a predetermined sealing space required for a double sealing structure.

In order to achieve the above object, according to the first aspect of the present invention, there is provided a reduced pressure vessel in which an erosion material that erodes a high elastic polymer material is present, and a predetermined treatment is performed on a substrate accommodated in the pressure reduction container. In the substrate processing apparatus described above, the sealing component for sealing the inside of the pressure reduction container from the outside, the first member disposed on the inner side of the pressure reduction container and resistant to the erosion material, and the outer side of the pressure reduction container. And a second member made of the highly elastic polymer material, at least one predetermined space formed through at least a portion of the first member and at least a portion of the second member spaced apart from each other, wherein the first member and the second A sealing part is provided in which the members fit together.

According to the said sealing component, a sealing component consists of a 1st member which is arrange | positioned inside the pressure reduction container, and is resistant to the erosion material which corrodes a high elastic polymer material, and is arrange | positioned at the outer side of a pressure reduction container, and consists of a high elastic polymer material. A second member is provided. Therefore, the erosion of the second member can be prevented by the first member, thereby eliminating the need to use a high elastic polymer material having resistance to erosion materials. In addition, since it has a predetermined space formed through at least a part of the first member and at least a part of the second member spaced apart from each other, a part of the second member is a predetermined space when the second member is subjected to compression deformation. Can be entered, whereby the second member can be easily deformed in compression. In addition, since the first member and the second member are fitted to each other, the sealing component can be handled as a single body and can be downsized. As a result, the sealing component can be secured at low cost and excellent durability without requiring a predetermined sealing space.

Preferably, the first member has a substantially U-shaped cross section that is open to the outside and at least a portion of the second member enters the opening of the U-shaped cross section. As a result, even when the restorability of a 1st member falls by yielding, a 1st member can be restored by the repulsive force of the entered 2nd member. As a result, durability can be maintained for a long time.

More preferably, the U-shaped cross section of the first member has at least one bend.

According to the said sealing component, since the U-shaped cross section of a 1st member has at least 1 bending part, a 1st member can also be easily deformed compressionly. Therefore, the following ability of the first member can be improved, excellent durability can be ensured, and the compressive loads of the first component and the second component can be reduced.

More preferably, the bend is a narrow portion.

According to the said sealing part, since a curved part is a narrow part, the effect of the said preferable aspect can be reliably achieved.

Further, preferably, the erosion material is an active species generated from the reactive active gas, and the first member is made of fluororesin.

According to the sealing part, the erosion material is an active species generated from the reactive active gas, and the first member is made of fluororesin. Such fluororesins are hardly eroded by such active species. Therefore, it is possible to reliably prevent the high-elasticity polymer material constituting the second member from being eroded by the active phase, thereby ensuring more excellent durability.

More preferably, the fluororesin is polytetrafluoroethylene, tetrafluoroethylene / perfluoro alkyl vinyl ether copolymer, tetrafluoroethylene / hexafluoropropylene copolymer, tetrafluoroethylene / ethylene copolymer, Polyvinylidene fluoride and polychlorotrifluoroethylene.

According to the sealing component, the fluororesin is poly tetrafluoroethylene, tetrafluoroethylene / perfluoro alkyl vinyl ether copolymer, tetrafluoroethylene / hexafluoropropylene copolymer, tetrafluoroethylene / ethylene copolymer , Polyvinylidene fluoride and polychlorotrifluoroethylene, so that the material constituting the first member can be easily and inexpensively provided, thus making the sealing part more inexpensive. have.

Also preferably, since the high elastic polymer material is selected from the group consisting of vinylidene fluoride rubber and tetrafluoroethylene-propylene rubber, the material constituting the second member can be easily and inexpensively provided. Therefore, the sealing part can be made cheaper.

Preferably, the eroding material is a corrosive gas and the first member is made of a corrosion resistant metal.

According to the sealing part, the eroding material is a corrosive gas and the first member is made of a corrosion resistant metal. Such a corrosion resistant metal is hardly eroded by the corrosive gas. Therefore, it is possible to reliably prevent the high elastic polymer material from being eroded by the corrosive gas, thereby ensuring more excellent durability.

More preferably, the corrosion resistant metal is selected from stainless steel, nickel and aluminum.

According to the sealing part, since the corrosion-resistant metal is selected from the group consisting of stainless steel, nickel and aluminum, the material constituting the first member can be easily and inexpensively provided, thus providing a sealing part more. You can do it cheaply.

Further, more preferably, the high elastic polymer material is selected from the group consisting of vinylidene chloride rubber and tetrafluoroethylene-propylene rubber.

According to the sealing component, the high elastic polymer material is selected from the group consisting of vinylidene chloride rubber and tetrafluoroethylene-propylene rubber. As a result, the material constituting the second member can be manufactured more easily and inexpensively, and therefore, the sealing part can be manufactured at low cost.

Preferably, the second member has a neck portion.

According to the said sealing component, since a 2nd member has a neck, the followability of a 2nd member can be improved and therefore a shielding performance can be improved.

In order to achieve the above object, in the second aspect of the present invention, there is provided a reduced pressure vessel in which an erosion material that corrodes a high elastic polymer material is present, and a processing apparatus that performs a predetermined treatment on a substrate accommodated in the reduced pressure container. And a sealing component for sealing the inside of the pressure reduction container from the outside, wherein the sealing part is disposed on the inside of the pressure reduction container and is provided on the outside of the pressure reduction container. A second member made of a highly elastic polymer material to be disposed, and at least one predetermined space formed through at least a portion of the first member and at least a portion of the second member spaced apart from each other; Provided is a substrate processing apparatus having a space of and wherein the first member and the second member are fitted together.

According to the substrate processing apparatus, the same effects as in the first aspect can be achieved.

Preferably, the first member has a substantially U-shaped cross section open to the outside and at least a portion of the second member enters the opening of the U-shaped cross section.

According to the substrate processing apparatus, the first member has a substantially U-shaped cross section open to the outside, and at least a part of the second member enters the opening of the U-shaped cross section, thereby recovering the first member through yielding. Even if the possibility decreases, the first member can be returned through the repulsive force from the second member that has entered. As a result, durability can be maintained for a long time.

Also preferably, the erosion material is the active species produced from the reactive active gas, and the first member is made of chloride resin.

According to the substrate processing apparatus, the erosion material is an active species generated from a reactive active gas, and the first member is made of chloride resin. Such chlorides are difficult to erode by active species. As a result, since erosion of the highly elastic polymeric material which comprises a 2nd member by an active species can be prevented reliably, better durability can be ensured.

Preferably, the erosion material is an erosion gas and the first member is made of a corrosion resistant metal.

According to the substrate processing apparatus, the erosion material is a corrosive gas, and the first member is made of a corrosion resistant metal. Such corrosion resistant metals are hardly eroded by corrosive gases. As a result, since erosion of the highly elastic polymeric material which comprises a 2nd member by a corrosive gas can be prevented reliably, better durability can be ensured.

The above and other objects, features and advantages of the present invention will become more apparent from the following detailed description with reference to the accompanying drawings.

Hereinafter, the present invention will be described with reference to the drawings showing preferred embodiments of the present invention.

First, the sealing component and substrate processing apparatus which concern on 1st Embodiment of this invention are demonstrated. This substrate processing apparatus is comprised so that a predetermined process may be performed to a board | substrate using reactive active gas.

1 is a cross-sectional view showing a schematic configuration of a plasma processing apparatus as a substrate processing apparatus according to the present embodiment. This plasma processing apparatus is configured to perform a reactive ion etching (RIE) process on a semiconductor wafer W as a substrate and to perform WLDC.

As shown in Fig. 1, the plasma processing apparatus 10 has a cylindrical vacuum vessel 11 (decompression vessel), and the vacuum vessel 11 has a processing space S therein. Further, in the vacuum vessel 11, for example, a cylindrical susceptor 12 serving as a mounting table on which a semiconductor wafer W having a diameter of 300 mm (hereinafter simply referred to as "wafer W") is disposed is disposed. It is. The inner wall surface of the vacuum vessel 11 is covered with the side wall member 45. The side wall member 45 is made of aluminum, and the surface facing the processing space S is coated with a ceramic such as yttrium oxide (Y ₂ O ₃ ). In addition, the vacuum vessel 11 is completely grounded, and the susceptor 12 is provided at the bottom of the vacuum vessel 11 via an insulating member 29.

In the plasma processing apparatus 10, a gas flow path for discharging gas molecules above the susceptor 12 to the outside of the vacuum vessel 11 between the inner wall of the vacuum vessel 11 and the side surfaces of the susceptor 12. A functioning exhaust passage 13 is formed. An annular baffle plate 14 is disposed in the middle of the exhaust passage 13 to prevent the leakage of plasma. In addition, the space downstream of the baffle plate 14 in the exhaust path 13 is bent downward of the susceptor 12, and is an automatic pressure control valve which is a variable butterfly valve. control valve (hereinafter referred to as “APC valve”) 15. The APC valve 15 is connected to a turbo molecular pump (hereinafter referred to as "TMP") 17 which is an exhaust pump for vacuum via the insulator 16, and the TMP 17 is a valve. It connects to the dry pump (henceforth "DP") 18 which is an exhaust pump via V1. The exhaust passage (hereinafter referred to as "main exhaust line") composed of the APC valve 15, the insulator 16, the TMP 17, the valve V1, and the DP 18 uses the APC valve 15. It is used to control the pressure in the vacuum vessel 11, and the pressure is reduced until the inside of the vacuum vessel 11 is almost vacuumed by the TMP 17 and the DP 18.

In addition, a pipe 19 is connected to the DP 18 via the valve V2 between the insulator 16 and the APC valve 15. The pipe 19 and the valve V2 (hereinafter referred to as "bypass line") bypass the insulator 16 and the TMP 17 and roughly pass through the vacuum vessel 11 by the DP 18. It is used to

The high frequency power supply 20 for the lower electrode is connected to the susceptor 12 via a feed rod 21 and a matcher 22. The high frequency power supply 20 for the lower electrode supplies a predetermined high frequency power to the susceptor 12. As a result, the susceptor 12 functions as a lower electrode. The matching unit 22 also reduces the reflection of the high frequency power from the susceptor 12 and maximizes the supply efficiency of the high frequency power to the susceptor 12.

On the upper side of the susceptor 12, a disc shaped ESC electrode plate 23 made of an electrically conductive film is arranged. The DC power supply 24 is electrically connected to the ESC electrode plate 23. The wafer W is connected to the susceptor 12 by a coulomb force or Johnson-Rahbek force generated by a DC voltage applied from the DC power supply 24 to the ESC electrode plate 23. Adsorption is maintained on the upper surface. In addition, an annular focus ring 25 is disposed in the upper portion of the susceptor 12 to surround the wafer W adsorbed and held on the upper surface of the susceptor 12. The focus ring 25 is exposed to the processing space S, and the plasma is converged toward the surface of the wafer W in the processing space S, thereby improving the efficiency of the RIE process.

In addition, for example, an annular coolant chamber 26 extending in the circumferential direction is provided inside the susceptor 12. The refrigerant chamber 26 is circulated and supplied with a refrigerant having a predetermined temperature, for example, cooling water or a Galden (registered trademark) liquid, from a cooling unit (not shown) through a refrigerant pipe 27. The processing temperature of the wafer W adsorbed and held on the susceptor 12 upper surface is controlled by the temperature of the refrigerant.

Further, a plurality of heat conductive gas supply holes 28 are provided in the portion where the wafer W on the upper surface of the susceptor 12 is adsorbed and held (hereinafter, referred to as "adsorption surface"). These heat conduction gas supply holes 28 are connected to the heat conduction gas supply part 32 via the heat conduction gas supply line 30 arrange | positioned inside the susceptor 12. As shown in FIG. This heat conduction gas supply part 32 supplies helium gas as a heat conduction gas to the clearance gap between the adsorption surface and the back surface of the wafer W via the heat conduction gas supply hole 28.

In addition, on the suction surface of the susceptor 12, a plurality of pusher pins 33 are provided as lift pins that can protrude from the upper surface of the susceptor 12. These pusher pins 33 are connected via a motor (not shown) and a ball screw (not shown), and protrude freely from the suction surface through the rotational motion of the motor converted into linear motion by the ball screw. . When the wafer W is adsorbed and held on the adsorption surface to perform the RIE treatment on the wafer W, the pusher pin 33 is accommodated in the susceptor 12, and the wafer W subjected to the RIE treatment is vacuum chambered. When carrying out from (11), the pusher pin 33 protrudes from the upper surface of the susceptor 12, lifts the wafer W apart from the susceptor 12, and lifts it upwards.

At the ceiling of the vacuum container 11, a gas introduction shower head 34 facing the susceptor 12 is disposed. The upper electrode high frequency power supply 36 is connected to the gas introduction shower head 34 via a matching unit 35. The high frequency power supply 36 for the upper electrode supplies predetermined high frequency power to the gas introduction shower head 34, so that the gas introduction shower head 34 functions as the upper electrode. In addition, the function of the matching unit 35 is similar to that of the matching unit 22 described above.

The gas introduction shower head 34 has a ceiling electrode plate 38 having a plurality of gas holes 37, and an electrode support 39 for detachably supporting the ceiling electrode plate 38. A buffer chamber 40 is set inside the electrode support 39, and a processing gas introduction pipe 41 from a processing gas supply unit (not shown) is connected to the buffer chamber 40. The piping insulator 42 is arrange | positioned in the middle of this process gas introduction pipe 41. This piping insulator 42 is made of an electrical insulating material and prevents the high frequency electric power supplied to the gas introduction shower head 34 from leaking to the processing gas supply section by the processing gas introduction pipe 41. The gas introduction shower head 34 is a process gas supplied from the process gas introduction pipe 41 to the buffer chamber 40, for example, C _x F _y , which is a reactive active gas. The mixed gas of gas and argon (Ar) gas is supplied to the inside of the vacuum vessel 11 (process space S) via the gas hole 37.

The plasma processing apparatus 10 includes a container lid 31 disposed above the vacuum vessel 11. The container lid 31 covers the gas introduction shower head 34. In order to seal the inside of the vacuum vessel 11 from the outside, an O-ring-shaped sealing component 46 is disposed between the container lid 31 and the vacuum vessel 11 so as to surround the gas introduction shower head 34. .

Moreover, the wafer carry-out and exit 43 is provided in the side wall of the vacuum container 11 at the position corresponding to the height of the wafer W raised upward from the susceptor 12 by the pusher pin 33, The gate 43 is provided at the entrance and exit 43 to open and close the delivery port 43.

In the vacuum vessel 11 of the plasma processing apparatus 10, as described above, high frequency power is supplied to the susceptor 12 and the gas introduction shower head 34, and the susceptor 12 and the gas introduction shower are provided. By applying a high frequency power voltage to the processing space S between the heads 34, ions are generated by plasmalizing the mixed gas supplied from the gas introduction shower head 34 in the processing space S, RIE processing is performed on the wafer W by ions or the like. At this time, the H rate is controlled by the reaction byproduct generated from the C _x F _y gas of the mixed gas. In addition, when ions are generated, fluorine radicals are generated as active species that can be attached.

The operation of each component of the plasma processing apparatus 10 described above is controlled by a CPU of a controller (not shown) included in the plasma processing apparatus 10 in accordance with a program corresponding to the RIE process.

FIG. 2 is an enlarged cross-sectional view of the O-ring-shaped sealing component 46 in FIG. 1. Moreover, since the gas introduction shower head 34 is arrange | positioned above in the figure, the upper side in the figure corresponds to the inside of the vacuum container 11. Hereinafter, the upper region in the drawing is referred to as the "inner (vacuum) side", and the lower region in the drawing is referred to as the "outer (atmosphere) side". In addition, the up / down direction in the figure is called "horizontal direction", and the left and right directions in the figure is called "up-down direction".

As shown in Fig. 2, the sealing part 46 has a radical sealing member 47 having a substantially U-shaped cross-sectional shape of which the air side is opened, and a substantially gourd-shaped, ie, neck-oriented in a horizontal direction. A vacuum sealing member 48 having a formed cross section is provided. The radical sealing member 47 is disposed on the inner side (vacuum) side, and the vacuum sealing member 48 is disposed on the outer side (atmosphere) side. The radical sealing member 47 is made of polytetrafluoroethylene (PTFE), which is a fluororesin, and the vacuum sealing member 48 is made of FKM.

The sealing part 46 is accommodated in the space defined by the sealing groove 49 which has the rectangular cross-sectional shape formed in the vacuum container 11, and the container lid 31. As shown in FIG. A container lid 31 is disposed above the sealing component 46, and the container lid 31 is in contact with the top of the sealing component 46. Specifically, the bottom face 49b of the sealing groove 49 is in contact with the radical sealing member 47 and the vacuum sealing member 48, and the container lid 31 is the radical sealing member 47 and the vacuum sealing member 48. ) In contact with

The distance between the container lid 31 and the bottom face 49b of the sealing groove 49 is more than the original length in the vertical direction of the original length vacuum sealing member 48 in the vertical direction of the radical sealing member 47. Since it is set as short as the length, when the sealing part 46 is accommodated in the space defined by the sealing groove 49 and the container lid 31, the radical sealing member 47 and the vacuum sealing member 48 will move upwards and downwards. Is compressed. As a result, the radical sealing member 47 and the vacuum sealing member 48 generate a repulsive force, and due to this repulsive force, each of the radical sealing member 47 and the vacuum sealing member 48 is sealed with the container lid 31 and the sealing. It comes in close contact with the bottom face 49b of the groove 49.

The radical sealing member 47 has a radical sealing narrow portion 47a between the portion in contact with the container lid 31 and the portion in contact with the vacuum side side 49a, and the vacuum side side. The radical sealing narrow part 47b is provided between the part which contacts 49a and the part which contacts the bottom face 49b. Since the rigidity of the radical sealing narrow parts 47a and 47b is low, it promotes the compression deformation of the radical sealing member 47. As shown in FIG. That is, the radical sealing narrow parts 47a and 47b are a bend part, and when the radical sealing member 47 is compressed to an up-down direction, the radical sealing member 47 will bend by the radical sealing narrow parts 47a and 47b, and will be compressed. Transform.

Since the vacuum sealing member 48 has a substantially gourd-shaped cross section as described above, the vacuum-side lump portion 48a, the atmospheric-side lump portion 48b, and the vacuum-side lump portion 48a And a vacuum sealing narrow portion 48c which connects the atmospheric side mass portion 48b. A part of the radical sealing member 47 and a part of the vacuum sealing member 48 (specifically, the front part of the vacuum-side lump 48a, the rear part of the atmospheric-side lump 48b, and the vacuum sealing narrow portion ( Upper and lower portions of 48c) are spaced apart from each other to form two evacuation spaces 48d and 48e. That is, the vacuum sealing narrow part 48c forms a neck part in the vacuum sealing member 48. As shown in FIG.

The vacuum-side mass 48a of the vacuum sealing member 48 is press-fitted into the opening of the substantially U-shaped cross section of the radical sealing member 47. As a result, the radical sealing member 47 and the vacuum sealing member 48 are fitted to each other. In addition, a part of the vacuum-side mass 48a of the vacuum sealing member 48 is spaced apart from the radical sealing narrow portions 47a and 47b to form evacuation spaces 48f and 48g.

When the vacuum sealing member 48 is compressed in the constant perpendicular direction, the portions protruding from the vacuum sealing member 48 are evacuated spaces 48d, 48e, 48f, 48g disposed around the vacuum sealing member 48 described above. ), Evacuation spaces 48d, 48e, 48f, 48g promote compression deformation of the vacuum sealing member 48.

Next, the specific shape of the sealing component 46 is demonstrated.

3 is a cross-sectional view showing a specific shape of the sealing component 46 shown in FIG. 2. In Fig. 3, the sealing component 46 is deformed except that the vacuum lump 48a of the vacuum sealing member 48 is pressed into the opening of the substantially U-shaped cross section of the radical sealing member 47 and deformed. It is shown in its original length.

As shown in FIG. 3, in the natural length state, the vacuum sealing member 48 has a length in the horizontal direction as L1 and a length in the vertical direction (the height in the up and down direction of the air mass lump 48b) as L2. The length (width) of the vacuum sealing narrow portion 48c in the vertical direction is formed to be L3.

In the natural length state, the radical sealing member 47 has the length in the horizontal direction as L4, the length in the vertical direction as L5, and the bottom surface of the contact surface 47c and the sealing groove 49 in contact with the container lid 31. Each of the contact surfaces 47d in contact with 49b is formed so as to be L6. In addition, as for the radical sealing member 47, the thickness of the radical sealing clamping parts 47a and 47b is formed in W1.

In the vacuum sealing member 48 and the radical sealing member 47, the vacuum-side agglomerate portion 48a of the vacuum sealing member 48 is pressed into the opening of the substantially U-shaped cross section of the radical sealing member 47. In the press-fitted state, the horizontal widths of the evacuation spaces 48d and 48e are respectively D1, and the minimum widths of the evacuation spaces 48f and 48g are respectively D2. In addition, the distance between the container lid 31 and the bottom face 49b of the sealing groove 49 is Dr.

The horizontal length L1 and the vertical length L2 of the vacuum sealing member 48, and the horizontal length L4 and the vertical length L5 of the radical sealing member 47 are the container lids 31. The optimum value is set for the distance Dr between the bottom face 49b of the sealing groove 49. Specifically, the horizontal length L1 of the vacuum sealing member 48 is set to a value that satisfies 1.8xDr≥L1≥0.8xDr, preferably 1.5xDr≥L1≥1.2xDr. The up-down length L2 of the vacuum sealing member 48 is set to the value which satisfies 1.8xDr≥L2≥1.05xDr, Preferably 1.5xDr≥L2≥1.15xDr. In addition, the horizontal direction length L4 of the radical sealing member 47 is (5/6) × L1 ≧ L4 ≧ (1/6) × L1, and preferably (2/3) × L1 ≧ L4 ≧ It is set to a value satisfying (1/3) x L1. The longitudinal direction L5 of the radical sealing member 47 is set to a value which satisfies 1.8 × Dr ≧ L5 ≧ 1.05 × Dr, and preferably 1.5 × Dr ≧ L5 ≧ 1.15 × Dr.

The length L3 of the up-down direction of the vacuum sealing narrow part 48c is set corresponding to the up-down length L2 of the vacuum sealing member 48, and O.95 * L2≥L3≥0.3 * L2, Preferably, it is set to a value satisfying 0.9 x L2 &gt; L3 &gt; 0.45 x L2. When the length L3 of the vacuum sealing narrow portion 48c in the vertical direction is long, the rigidity of the vacuum sealing member 48 in the vacuum sealing narrow portion 48c becomes high, and the vacuum sealing member 48 is easy to handle. Lose. On the other hand, when the length L3 of the up-down direction of the vacuum sealing narrow part 48c is short, the ability of the vacuum sealing member 48 to follow the inclination of the bottom face 49b of the container lid 31 or the sealing groove 49 will be Is improved.

Thus, since the vacuum sealing narrow part 48c forms the neck part in the vacuum sealing member 48, the container lid 31 and the bottom face 49b of the vacuum sealing member 48 cooperate with the evacuation spaces 48d and 48e. Follow-up can be improved, and sealing performance can be improved.

The upper limit of the length L6 of the contact surfaces 47c and 47d of the radical sealing member 47 is set corresponding to the horizontal length L4, and 0.6 × L4 ≧ L6 ≧ 0.5mm, and preferably O. It is set to a value that satisfies 6 x L4? L6? By providing the contact surfaces 47c and 47d with the width (length L6), the shielding performance of the radical sealing member 47 can be stabilized.

The thickness W1 of the radical sealing narrow portions 47a and 47b of the radical sealing member 47 is characterized by the rigidity of the radical sealing narrow portions 47a and 47b, that is, the rigidity of PTFE in the thickness W1. The restoring force of the vacuum-side mass 48a pushed into the opening of the U-shaped cross section of 47, i.e., the level deformed by the force less than or equal to the restoring force of the FKM in the state in which the vacuum-side mass 48a is press-fitted. It is set. This is because even when the contact surfaces 47c and 47d of the radical sealing member 47 creep, the radical sealing clamping portions 47a and 47b are moved upward and downward, respectively, by the restoring force of the vacuum-side mass 48a. It is for pushing up and maintaining the shielding performance with respect to the radical of the radical sealing member 47. Specifically, the thickness W1 of the radical sealing sandwiching portions 47a and 47b is set to a value that satisfies 2.0 mm? W1? 0.05 mm, preferably 1.5 mm? W1? 0.1 mm. If the thickness of the radical sealing gripping portions 47a and 47b is thinner than the thickness W1, the durability and workability of the radical sealing gripping portions 47a and 47b are extremely degraded, so that good shielding performance against radicals is no longer obtained. Can not be.

By providing the radical sealing narrow portions 47a and 47b in this way, the degree of freedom of deformation of the radical sealing member 47 is improved, and the radical sealing member 47 can be easily deformed and compressed, and thus, during compression. The followability of the radical sealing member 47 can be improved, the radical sealing member 47 can be made to have excellent durability, and the compressive load on the radical sealing member 47 can be reduced.

The width D1 in the horizontal direction of the evacuation spaces 48d and 48e is, at least, in the natural length state (state of FIG. 3), in the atmosphere side end of the radical sealing member 47 and the atmosphere of the vacuum sealing member 48. In the state where the side lump portion 48b does not contact and the state in which the sealing component 46 is installed (the state in FIG. 2), the atmospheric side end portion of the radical sealing member 47 and the atmospheric side lump of the vacuum sealing member 48. It is preferable to set it to the value which prevents the part 48b from contacting. By providing the evacuation spaces 48d and 48e in this manner, the radical sealing member 47 and the vacuum sealing member 48 can move independently of each other even in the installation state of the sealing component 46, for example, uneven. Even when the vacuum sealing member 48 falls by a single tightening, the radical sealing member 47 remains in the container lid 31 and bottom of each of the contact surfaces 47c and 47d without following the movement of the vacuum sealing member 48. The state of contact with 49b can be maintained satisfactorily. Thereby, the shielding performance with respect to the radical of the radical sealing member 47 can be stabilized for a long time.

The minimum width D2 of the evacuation spaces 48f and 48g is greater than zero in the natural length state (state of FIG. 3), preferably 0 even in the installation state of the sealing component 46 (state of FIG. 2). It is set to the same value as it becomes larger. In the sealing part 46, the compressive load tends to increase as compared with the case of tightening the rubber part FKM and the resin material PTFE, so as to tighten the sealing part made of only the rubber material, but the evacuation spaces 48f and 48g. By setting the minimum width D2 of the evacuation spaces 48f and 48g as described above, the reaction force from the resin material (radical sealing member 47) can be suppressed to reduce the tightening force required for tightening. have. In addition, as described above, since the evacuation spaces 48f and 48g are formed, the space at the time of deformation of the radical sealing member 47 can be sufficiently secured, and the deformation of the radical sealing member 47 can be stabilized. The reaction force of the sealing member 47 can be further reduced.

Fluorine radicals and / or oxygen radicals (hereinafter simply referred to as “radicals”) are generated inside the vacuum vessel 11 of the plasma processing apparatus 10. By this radical, the FKM constituting the vacuum sealing member 48 is easily consumed. Here, although radical flows from the vacuum side to the atmospheric side of FIG. 2, since the radical sealing member 47 is arrange | positioned at the vacuum side, it adheres to the bottom face 49b of the container lid 31 and the sealing groove 49, The radical sealing member 47 prevents the radical from approaching the vacuum sealing member 48 arranged on the atmospheric side. In particular, since the PTFE constituting the radical sealing member 47 has excellent resistance to radicals, the radical sealing member 47 is not consumed. In addition, when PTFE continues to be compressed for a long time, the restorability decreases due to creeping. However, in the sealing part 46, the vacuum-side mass of the vacuum sealing member 48 is formed in the opening of the U-shaped cross section of the radical sealing member 47. Since 48a is press-fitted, the repulsive force of the vacuum-side mass 48a compensates for the reduced restorability of the radical sealing member 47. Therefore, the radical sealing member 47 prevents the radical from reaching the vacuum sealing member 48 arranged on the atmospheric side for a long time.

Moreover, in the plasma processing apparatus 10, the vacuum sealing member 48 is arrange | positioned at the atmospheric side, and comes in close contact with the bottom face 49b of the container lid 31 and the sealing groove 49. As shown in FIG. As described above, since the radical does not reach the vacuum sealing member 48, the vacuum sealing member 48 is not consumed. Therefore, the vacuum sealing member 48 can prevent the outside atmosphere from entering the inside of the vacuum container 11 for a long time.

According to the sealing part 46 which concerns on this embodiment, the radical sealing member 47 which consists of PTFE arrange | positioned at the vacuum side and has the outstanding resistance with respect to the radical, and the vacuum sealing member 48 which is arrange | positioned at the atmospheric side and consists of FKM It is provided. Since the radical sealing member 47 prevents radicals from approaching the vacuum sealing member 48, it is possible to prevent the vacuum sealing member 48 from being worn by the radicals, thereby preventing the radicals from being worn by the FFKM. You can eliminate the need to use In addition, since the radical sealing member 47 and the vacuum sealing member 48 are fitted together, the sealing component 46 can be handled integrally and can be miniaturized. As a result, the sealing component 46 can secure excellent durability and inexpensiveness without requiring a predetermined sealing space.

According to the sealing component 46 described above, the radical sealing member 47 has a U-shaped cross section in which the atmospheric side is open, and the vacuum vacuum-side lump 48a of the vacuum sealing member 48 has a U-shaped cross section. It is pressed into the opening. Therefore, even if the restorability of the radical sealing member 47 is reduced by creep ring, the restorability of the radical sealing member 47 can be compensated for by the repulsive force of the press-fitted vacuum-side mass 48a. As a result, the radical sealing member 47 can prevent the radical from approaching the vacuum sealing member 48 arranged on the atmospheric side for a long time, so that the durability of the sealing component 46 can be maintained for a long time.

In the sealing part 46, the radical sealing member 47 is made of PTFE. PTFE has excellent resistance to radicals and hardly consumes by radicals. Therefore, since the FKM of the vacuum sealing member 48 can be reliably prevented from being consumed by radicals, it is possible to ensure the durability of the more excellent sealing component 46.

Moreover, the sealing part 46 is the evacuation space 48d which only the said vacuum sealing member 48 circumferences around the vacuum sealing member 48, or the vacuum sealing member 48 and the radical sealing member 47 cooperate and define. 48e, 48f, 48g), the portion projecting from the vacuum sealing member 48 can enter the evacuation spaces 48d, 48e, 48f, 48g when the vacuum sealing member 48 is compressed in the up and down direction. Thus, the vacuum sealing member 48 can be easily deformed in compression. Further, since the radical sealing member 47 has the radical sealing sandwiching portions 47a and 47b in the U-shaped cross section, the radical sealing member 47 can also be easily deformed in compression. Therefore, the followability to the bottom face 49b of the radical sealing member 47 and the container lid 31 in the sealing groove 49 can be improved, and also excellent durability can be secured, and the radical sealing member ( 47) and the compressive load on the vacuum sealing member 48 can be reduced.

In addition, according to the sealing component 46, the vacuum sealing component 48 made of FKM realizes vacuum sealing. FKM can realize vacuum sealing even when the surface roughness of the surface to contact is large. Thereby, the sealing component 46 can realize the outstanding vacuum sealing. In addition, it is not necessary to make the surface roughness of the bottom face 49b of the container lid 31 and the sealing groove 49 extremely small. As a result, since the surface roughness management of the container lid 31 and the sealing groove 49 becomes easy, the manufacturing cost of the plasma processing apparatus 10 can be reduced.

In the sealing part 46 mentioned above, the radical sealing member 47 was manufactured from PTFE. However, the radical sealing member 47 may be composed of any material resistant to radicals, for example, tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer (PFA), tetrafluoro It may be composed of any of ethylene / hexafluoropropylene copolymer (FEP), tetrafluoroethylene / ethylene copolymer (ETFE), polyvinylidene fluoride (PVDF), and polychlorotrifluoroethylene (PCTFE). . Since these materials can be obtained easily and inexpensively, the sealing component 46 can be made more inexpensive.

Moreover, in the sealing component 46 mentioned above, the vacuum sealing member 48 was manufactured by FKM. However, the vacuum sealing member 48 may be made of any material as long as it has a vacuum sealing property, for example, may be made of tetrafluoroethylene-propylene rubber (FEPM). Since these materials can also be obtained easily and inexpensively, the sealing component 46 can be made more inexpensive.

Next, the modification of the said sealing component 46 is demonstrated.

2 and 3, in the present embodiment, the radical sealing member 47 of the sealing component 46 is formed as a bent portion on each side surface with respect to the symmetrical surface of the sealing component 46 (see FIG. 4). It has one radical sealing clamping part 47a, 47b, respectively. In this case, as shown in FIG. 4, in the installation state of the sealing component 46 (state of FIG. 2), the compression force of the container lid 31 or the bottom face 49b, and the restoring force of the vacuum sealing member 48. This causes a case where the contact surfaces 47c and 47d of the radical sealing member 47 do not have surface contact with the corresponding surface. On the other hand, in this modification, as shown in FIGS. 6 (A) to 6 (D) which will be described later, at least three bent portions in which the radical sealing member 47 is provided symmetrically with respect to the symmetry plane of the sealing component 46 are provided. The contact surface 47c, 47d of the radical sealing member 47 may be provided with the container lid 31 or the bottom surface () in the installation state (state of FIG. 2) of the sealing component 46 by this. Since surface contact can be made with respect to the surface of 49b), a favorable radical shielding effect can be obtained.

This is because when the radical sealing member 47 includes at least three bent portions arranged symmetrically with respect to the symmetry plane of the sealing component 46, as shown in FIG. 5, each opposing member (container lid 31) is provided. Or the moment generated in the radical sealing member 47 by the compressive force of the bottom surface 49b and the restoring force of the vacuum sealing member 48 are dispersed in each bent portion, so that the contact surfaces 47c and 47d of the radical sealing member 47 It is because it follows each opposing member.

6A to 6D show specific modifications of the sealing component 46. As shown to FIG.6 (A), (B), the radical sealing member 47 may be equipped with the one or more bending part formed in the symmetry plane in addition to the radical sealing clamping part 47a, 47b. As a variant, as shown in Figs. 6C and 6D, the radical sealing member 47 is provided in addition to the radial sealing sandwiching portions 47a and 47b, and two bent portions are disposed symmetrically with respect to the symmetrical plane. It may be provided with.

The bent portion is not limited to being constituted by the narrow portion, and may be constituted by notches or recesses (see Figs. 6 (A) and (C)), or may be constituted by angular parts (Fig. 6 (B), (D)), or other shapes.

As mentioned above, although the case where the sealing component 46 is accommodated in the space defined by the sealing groove 49 and the container lid 31 was demonstrated, the place where the sealing component 46 is applied is not limited to this, The vacuum It can be applied wherever it is necessary to seal the air from the atmosphere. For example, it is applicable to the connection part of the exhaust system which exhausts the gas etc. in the vacuum container 11, for example. As a connection part of an exhaust system, the KF flange connection structure is used widely.

FIG. 7: is sectional drawing which shows the case where the sealing component in FIG. 2 is used for a KF flange connection structure.

As shown in FIG. 7, the KF flange connection structure 50 communicates with the pipe 51 which has the circular flange part 51b coaxial with the hole 51a, and the hole 51a of this pipe 51. As shown in FIG. An approximately ring-shaped fastening member having a receiving portion 52 having a hole 52a to be formed, a central pipe 53 interposed between the pipe 51 and the receiving portion 52, and an inner flange portion 54a. 54 is provided.

The pipe 51 has an insertion hole 51c which is coaxial with the hole 51a and has a diameter larger than this hole 51a by a predetermined value in the end face thereof, and the receiving portion 52 also has a hole in the cross section. It has the same axis as 52a, and has an insertion hole 52b of the same diameter as the insertion hole 51c. The outer diameter of the centering pipe 53 is set smaller by a predetermined value than the diameters of the insertion holes 51c and 52b. Therefore, the center of the hole 51a of the pipe 51 and the hole 52a of the accommodating part 52 can be set by inserting the upper and lower ends of the center pipe 53 into the insertion holes 51c and 52b, respectively. .

In addition, the center pipe 53 has a protrusion 53a which protrudes in the horizontal direction of FIG. The protruding portion 53a has a predetermined length in the vertical direction of FIG. 7, the upper and lower ends thereof extend along the horizontal direction of FIG. 7, and the side ends thereof are formed in a bow shape in cross section. The inner flange portion 54a of the fastening member 54 presses the periphery of the circular flange portion 51b of the pipe 51 in a state of being attached to the receiving portion 52 via the central pipe 53. Thus, the upper and lower ends of the protrusion 53a are in contact with the end face of the pipe 51 and the end face of the accommodating portion 52, respectively, to maintain the gap between the pipe 51 and the accommodating portion 52 at a predetermined value.

Moreover, in the KF flange connection structure 50, the hole 51a communicates with the inside of the vacuum container 11. As shown in FIG. Therefore, the internal pressures of the hole 51a and the hole 52a are almost vacuum, and radicals flow into the hole 51a and the hole 52a. 7, the hole 51a and the hole 52a correspond to the vacuum side, and the outer side of the pipe 51 corresponds to the atmospheric side.

Here, since the sealing component 46 becomes small in size by fitting the radical sealing member 47 and the vacuum sealing member 48 together as mentioned above, the sealing component 46 is a predetermined | prescribed thing. No sealing space is required. Therefore, the sealing part 46 can be accommodated in the space defined by the cross section of the pipe 51, the cross section of the accommodating part 52, and the bow side surface of the protrusion 53a of the center pipe 53. As shown in FIG. That is, the sealing component 46 can be applied without changing the structure of the KF flange connection structure 50.

In the KF flange connection structure 50, the distance between the end face of the pipe 51 and the end face of the receiving portion 52, that is, the length in the vertical direction of the protrusion 53a is in the vertical direction of the radical sealing member 47. Since the intrinsic length in relation to the intrinsic length and the intrinsic length in the vertical direction of the vacuum sealing member 48 are set to be shorter by a predetermined length, the sealing component 46 is the end face of the pipe 51, the end face of the receiving portion 52, and the center thereof. When accommodated in a space defined by the bow side of the projection 53a of the pipe 53, the radical sealing member 47 and the vacuum sealing member 48 are compressed to each other in the vertical direction. As a result, the radical sealing member 47 and the vacuum sealing member 48 generate a repulsive force, and due to this repulsive force, the radical sealing member 47 and the vacuum sealing member 48 have a cross section and a receiving portion of the pipe 51. It comes in close contact with the cross section of (52). Therefore, the radical sealing member 47 can prevent the radical flowing through the hole 51a and the hole 52a from reaching the vacuum sealing member 48 for a long time. In addition, the vacuum sealing member 48 can prevent the external atmosphere from entering the hole 51a and the hole 52a for a long time.

Next, the sealing component which concerns on 2nd Embodiment of this invention is demonstrated. The present embodiment is basically the same as the first embodiment described above, and differs from the first embodiment described above only in that the substrate processing apparatus employs a corrosive gas instead of a reactive active gas. Therefore, description of the same structure is abbreviate | omitted and only the operation different from 1st Embodiment is demonstrated below.

8 is an enlarged cross-sectional view of a sealing component according to the present invention. In addition, the pressure is reduced to a vacuum and a region where corrosive gas is present is arranged at the top of the figure, and a space open to the atmosphere is arranged at the bottom of the figure. Therefore, hereinafter, the upper part of the drawing is referred to as the "vacuum side" and the lower part of the drawing is referred to as the "waiting side". In addition, the up-down direction of drawing is called "horizontal direction", and the left-right direction of drawing is called "vertical direction".

As shown in FIG. 8, the sealing part 55 has the corrosion gas sealing member 56 which has the substantially U-shaped cross section open to the atmospheric side, and the vacuum sealing member 48. As shown in FIG. The corrosive gas sealing member 56 is disposed on the vacuum side, and the vacuum sealing member 48 is disposed on the atmospheric side. The corrosion gas sealing member 56 is made of austenitic stainless steel, and the vacuum sealing member 48 is made of FKM.

For example, the sealing part 55 is accommodated in the space defined by the sealing groove 49 and the container lid 31 which have a rectangular cross section formed in the vacuum container 11. A container lid 31 is disposed above the sealing component 55, and the container lid 31 is in contact with the upper portion of the sealing component 55. Specifically, the bottom face 49b of the sealing groove 49 is in contact with the corrosion gas sealing member 56 and the vacuum sealing member 48, and the container lid 31 is the corrosion gas sealing member 56 and the vacuum sealing member. Contact with (48).

The distance between the container lid 31 and the bottom face 49b of the sealing groove 49 is less than the intrinsic length of the corrosion gas sealing member 56 in the vertical direction and the intrinsic length of the vacuum sealing member 48 in the vertical direction. Since the sealing part 55 is accommodated in the space defined by the sealing groove 49 and the container lid 31, since it is set as short as the length of, the corrosion gas sealing member 56 and the vacuum sealing member 48 are Compressed in the vertical direction. As a result, the corrosion gas sealing member 56 and the vacuum sealing member 48 generate a repulsive force, and the corrosion gas sealing member 56 and the vacuum sealing member 48 cause the container lid 31 and the sealing groove to be caused by the repulsive force. It comes in close contact with the bottom face 49b of 49.

The vacuum-side mass 48a of the vacuum sealing member 48 is press-fitted into the opening of the substantially U-shaped cross section of the corrosion gas sealing member 56. As a result, the corrosion gas sealing member 56 and the vacuum sealing member 48 are fitted to each other. In addition, a part of the vacuum-side mass 48a of the vacuum sealing part jar 48 is spaced apart from a part of the corrosion gas sealing member 56 to form evacuation spaces 48h and 48i.

When the vacuum sealing member 48 is compressed in the vertical direction, a portion protruding from the vacuum sealing member 48 enters the evacuation spaces 48d, 48e, 48h, 48i disposed around the vacuum sealing member 48 described above. Thus, the evacuation spaces 48d, 48e, 48h, 48i encourage compression deformation of the vacuum sealing member 48.

Although the FKM constituting the vacuum sealing member 48 is easily consumed by the corrosive gas flowing from the vacuum side to the atmospheric side in FIG. 8, the corrosive gas sealing member 56 is disposed on the vacuum side to provide the container lid 31. And close contact with the bottom face 49b of the sealing groove 49, the corrosion gas sealing member 56 prevents the corrosion gas from reaching the vacuum sealing member 48 disposed at the atmospheric side. In particular, the austenitic stainless steel constituting the corrosion gas sealing member 56 has excellent resistance to corrosion gas, so that the corrosion gas sealing member 56 is not worn. Therefore, the corrosive gas sealing member 56 prevents the corrosive gas from reaching the vacuum sealing member 48 disposed on the atmosphere side for a long time.

According to the sealing part 55 of this embodiment, the corrosion gas sealing member 56 which consists of the austenitic stainless steel which is arrange | positioned at the vacuum side and has the outstanding resistance with respect to corrosion gas, and the vacuum arrange | positioned at the atmospheric side and manufactured by FKM The sealing member 48 is provided. The corrosive gas sealing member 56 prevents the corrosive gas from approaching the vacuum sealing member 48, thereby preventing the vacuum sealing member 48 from being worn by the corrosive gas, thereby preventing the corrosive gas from being corroded. The need to use resistant elastomeric materials can be eliminated. In addition, since the corrosion gas sealing member 56 and the vacuum sealing member 48 are fitted together, the sealing component 55 can be handled integrally and can be miniaturized. As a result, the sealing component 55 can be secured at low cost and excellent durability without requiring a predetermined sealing space.

In addition, according to the sealing component 55, the corrosion gas sealing member 56 is made of austenitic stainless steel. Since austenitic stainless steels have excellent resistance to corrosive gases, they are hardly worn by corrosive gases. Therefore, it is possible to reliably prevent the FKM of the vacuum sealing member 48 from being worn by the corrosive gas, thereby ensuring the durability of the better sealing component 55.

In addition, the sealing part 55 is an evacuation space defined around the vacuum sealing member 48 only by the vacuum sealing member 48 or by the cooperation of the vacuum sealing member 48 and the corrosion gas sealing member 56 ( 48d, 48e, 48h, 48i). As a result, the portion projecting from the vacuum sealing member 48 can enter the evacuation spaces 48d, 48e, 48h, 48i when the vacuum sealing member 48 is compressed in the vertical direction, whereby the vacuum sealing member ( 48) can easily compressively deform. Therefore, the vacuum sealing member 48 can be prevented from being crushed, and accordingly, better durability can be ensured.

In the above-mentioned sealing part 55, although the corrosive gas sealing member 56 was made of austenitic stainless steel, the corrosive gas sealing member 56 is a material having any corrosion gas resistance to corrosive gas, for example, austenitic stainless steel. It may be composed of any of stainless, nickel and aluminum. Since these materials can be obtained easily and inexpensively, the sealing part 55 can be made more inexpensive.

In the above, the case where the sealing component 55 is accommodated in the space defined by the sealing groove 49 and the container lid 31 was demonstrated. However, the place where the sealing component 55 is used is not limited to this, It can use in any place as long as it is a place which needs to seal a vacuum from air | atmosphere. For example, needless to say, also applicable to the KF flange connection structure 50 described above.

In the above-described embodiment, the substrate to be processed is a semiconductor wafer. However, the substrate to be treated is not limited to this, and may be, for example, a liquid crystal display (LCD) or a flat panel display (FPD) glass substrate.

According to the present invention, a sealing member is formed of a first member having a resistance to an eroding material disposed on an inner side of the pressure reducing container to erode the high elastic polymer material, and a material made of a high elastic polymer material disposed on the outer side of the pressure reducing container. Since the second member is provided, the second member can be prevented from being eroded by the first member, thereby eliminating the need to use a high elastic polymer material having resistance to the erosion material. In addition, since it has a predetermined space formed through at least a part of the first member and at least a part of the second member spaced apart from each other, a part of the second member is a predetermined space when the second member is subjected to compression deformation. Can be entered, whereby the second member can be easily deformed in compression. In addition, since the first member and the second member are fitted to each other, the sealing component can be handled as a single body and can be downsized. As a result, the sealing component can be secured at low cost and excellent durability without requiring a predetermined sealing space.

Claims (15)

A sealing component for a substrate processing apparatus, comprising a pressure reducing container in which an eroding material that erodes a high elastic polymer material is present, and performing a predetermined treatment on a substrate accommodated in the pressure reducing container, wherein the sealing part seals the inside of the pressure reducing container from the outside. To A first member disposed inside the decompression vessel and resistant to the erosion material; A second member disposed on an outer side of the decompression vessel and made of the high elastic polymer material; At least one predetermined space formed by at least a portion of the first member and at least a portion of the second member spaced from each other, The first member and the second member is fitted to each other Sealing parts. The method of claim 1, The first member has a U-shaped cross section with an outer side opening, and at least a portion of the second member enters the opening of the U-shaped cross section. Sealing parts. The method of claim 1, The U-shaped cross section of the first member has at least one bend Sealing parts. The method of claim 1, The bent part is a narrow part Sealing parts. The method of claim 1, The erosion material is an active species generated from a reactive active gas, and the first member is made of fluororesin. Sealing parts. The method of claim 5, The fluororesin is polytetrafluoroethylene, tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene / hexafluoropropylene copolymer, tetrafluoroethylene / ethylene copolymer, polyvinylidene fluoro Ride, and selected from the group consisting of polychlorotrifluoroethylene Sealing parts. The method of claim 5, The high elastic polymer material is selected from the group consisting of vinylidene fluoride rubber and tetrafluoroethylene-propylene rubber Sealing parts. The method of claim 1, The erosion material is a corrosive gas and the first member is made of a corrosion resistant metal. Sealing parts. The method of claim 8, The corrosion resistant metal is selected from the group consisting of stainless steel, nickel and aluminum Sealing parts. The method of claim 8, The high elastic polymer material is selected from the group consisting of vinylidene fluoride rubber and tetrafluoroethylene-propylene rubber Sealing parts. The method of claim 1, The second member has a neck Sealing parts. In the substrate processing apparatus, A reduced pressure vessel in which an erosion material that erodes the high elastic polymer material is present; A processing apparatus for performing a predetermined process on the substrate accommodated in the pressure-sensitive vessel; A sealing component for sealing the inside of the pressure reducing container from the outside, The sealing component is a first member disposed on the inner side of the decompression vessel and resistant to the erosion material, a second member disposed on the outer side of the decompression vessel and made of the high elastic polymer material, and the first member. At least a portion of the and at least a portion of the second member having at least one predetermined space formed by being spaced from each other, wherein the first member and the second member are fitted to each other Substrate processing apparatus. The method of claim 12, The first member has a U-shaped cross section with an outer side opening, and at least a portion of the second member enters the opening of the U-shaped cross section. Substrate processing apparatus. The method of claim 12, The erosion material is an active species generated from a reactive active gas, and the first member is made of fluororesin Substrate processing apparatus. The method of claim 12, The erosion material is a corrosive gas and the first member is made of a corrosion resistant metal. Substrate processing apparatus.

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