JP2007120738A - Sealing part and substrate processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an inexpensive sealing part securing excellent durability without needing a predetermined sealing space. <P>SOLUTION: The sealing part 46 has a radical sealing member 47 of approximately U-shaped cross-section opened on the atmosphere side; a vacuum sealing member 48 of approximately guitar-shaped cross section disposed along a horizontal direction; and refuge spaces 48d, 48e formed by partial separation of the radical sealing member 47 and vacuum sealing member 48. The radical sealing member 47 is disposed on the vacuum side, and the vacuum sealing member 48 is disposed on the atmosphere side. The radical sealing member 47 is formed of polytetrafluoroethylene (PTFE) which is fluororesin, and the vacuum sealing member 48 is formed of FKM. A vacuum side lump part 48a of the vacuum sealing member 48 is pressed into an opening of U-shaped cross section of the radical sealing member 47. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a seal component and a substrate processing apparatus, and more particularly to a seal component used in a substrate processing apparatus that converts a reactive active gas into plasma and processes a substrate with the plasma.

  2. Description of the Related Art A plasma processing apparatus that performs plasma processing, for example, etching processing, on a semiconductor wafer as a substrate includes a vacuum chamber that can be depressurized to almost vacuum, and is converted into plasma in the semiconductor wafer accommodated in the vacuum chamber. Etching is performed using the processed gas. In this plasma processing apparatus, a ring-shaped sealing component is used to seal the inside (vacuum) of the vacuum chamber from the outside (atmosphere) (see, for example, Patent Document 1). In particular, in an etching processing apparatus as a plasma processing apparatus, an O-ring made of fluororubber, which is a heat-resistant rubber, is used as a sealing component because a semiconductor wafer receives high energy from plasma and becomes high temperature.

  In recent years, an etching process in which a reactive active gas (for example, a CxFy gas-based mixed gas such as C4F8 gas) is used as a processing gas and an etching rate is controlled by a reaction byproduct has become mainstream. In this etching process, when reactive reactive gas is turned into plasma, depot active species such as fluorine radicals are generated.

  Further, in the etching process using a reactive active gas, reaction by-products adhere to the inner wall of the vacuum chamber. The adhering reaction by-products are peeled off to form particles, which adhere to the semiconductor devices on the semiconductor wafer and deteriorate the yield of the semiconductor devices. Therefore, in the plasma processing apparatus, a dry cleaning process is performed in order to remove the attached reaction by-products. For example, WLDC (Wafer Less Dry Cleaning) processing, which is a kind of dry cleaning processing, is performed. In the WLDC treatment, reaction by-products are removed by oxygen ions generated from oxygen gas. At this time, oxygen radicals are also generated at the same time.

  By the way, the above-mentioned fluororubber is easily consumed by radicals (fluorine radicals, oxygen radicals). Therefore, in a plasma processing apparatus using a reactive active gas, an O-ring seal part (RTR (Radical Trap Ring)) made of a fluororesin having radical resistance on the vacuum side (specifically, Teflon (registered trademark)) is used. A double seal structure in which an O-ring made of fluoro rubber (specifically, vinylidene fluoride rubber (FKM)) is disposed on the atmosphere side is used. The RTR is composed of a Teflon (registered trademark) tube and rubber filled in the tube.

In this double seal structure, the RTR seals radicals leaking from the vacuum side, and the fluororubber O-ring seals the vacuum in the vacuum chamber from the outside atmosphere. In addition, since this double seal structure requires two seal grooves in which the RTR and the O-ring made of fluororubber are respectively accommodated, a predetermined seal space is required.
US Pat. No. 6,689,221

  However, since the conventional plasma processing apparatus is not designed on the assumption that a double seal structure is used, a predetermined sealing space cannot be secured, and the above-described double seal structure is used in the conventional plasma processing apparatus. It is difficult to apply. In particular, in the KF flange joint structure (JIS standard G 5526) used for two pipe joints, the above-described double seal structure cannot be applied because two seal grooves cannot be provided due to the structure.

  When the double seal structure cannot be applied, an O-ring made of a fluoro rubber having a radical resistance (specifically, tetrafluoroethylene-purple chlorovinyl ether rubber (FFKM)) is used, but FFKM is very expensive. In addition, the radical resistance is inferior to that of Teflon (registered trademark). In particular, in recent years, there has been a strong demand for extending the life of plasma processing apparatuses. Therefore, FFKM cannot ensure durability that satisfies the requirements of users of plasma processing apparatuses.

  An object of the present invention is to provide a sealing component and a substrate processing apparatus that are inexpensive and can ensure excellent durability without requiring a predetermined sealing space.

  In order to achieve the above object, the seal component according to claim 1 includes a decompression vessel in which an erosion material that erodes a highly elastic polymer material is present, and performs a predetermined treatment on a substrate accommodated in the decompression vessel. A sealing part for sealing the inside of the decompression container from the outside in the substrate processing apparatus, the first member being disposed on the inside of the decompression container and having resistance to the erodible substance, and disposed on the outside of the decompression container. A second member made of the highly elastic polymer material, and a predetermined space formed by separating at least a part of the first member and at least a part of the second member, The first member and the second member are fitted to each other.

  The sealing component according to claim 2 is the sealing component according to claim 1, wherein the first member has a U-shaped cross section that is open to the outside, and at least a part of the second member is the U-shape. It is characterized by entering an opening of a cross section.

  The sealing component according to claim 3 is the sealing component according to claim 2, wherein the U-shaped cross section of the first member has at least one bent portion.

  A seal component according to a fourth aspect is the seal component according to the third aspect, wherein the bent portion is a narrow portion.

  The seal component according to claim 5 is the seal component according to any one of claims 1 to 4, wherein the erodible substance is an active species generated from a reactive active gas, and the first member is a fluororesin. It is characterized by comprising.

  The seal part according to claim 6 is the seal part according to claim 5, wherein the fluororesin is polytetrafluoroethylene, tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene / hexafluoropropylene copolymer. , Tetrafluoroethylene / ethylene copolymer, polyvinylidene fluoride, and polychlorotrifluoroethylene.

  The seal component according to claim 7 is the seal component according to claim 5 or 6, wherein the highly elastic polymer substance is one selected from the group consisting of vinylidene fluoride rubber and tetrafluoroethylene-propylene rubber. It is characterized by being.

  The seal component according to claim 8 is the seal component according to claim 1 or 2, wherein the erodible substance is a corrosive gas, and the first member is made of a corrosion-resistant metal.

  The sealing component according to claim 9 is the sealing component according to claim 8, wherein the corrosion-resistant metal is one selected from the group consisting of stainless steel, nickel and aluminum.

  The seal component according to claim 10 is the seal component according to claim 8 or 9, wherein the high elastic polymer substance is one selected from the group consisting of vinylidene fluoride rubber and tetrafluoroethylene-propylene rubber. It is characterized by being.

  The seal component according to claim 11 is the seal component according to any one of claims 1 to 10, wherein the second member has a constricted portion.

  In order to achieve the above object, a substrate processing apparatus according to claim 12 is provided with a decompression vessel in which an erosion substance that erodes a highly elastic polymer material is present, and performs a predetermined treatment on a substrate accommodated in the decompression vessel. In the substrate processing apparatus to be applied, a seal part for sealing the inside of the decompression container from the outside is provided, and the seal part is disposed on the inner side of the decompression container and has a resistance against the erodible substance, and the decompression A second member made of the highly elastic polymer material disposed on the outer side of the container, at least a part of the first member and at least a part of the second member being formed apart from each other; And the first member and the second member are fitted to each other.

  A substrate processing apparatus according to a thirteenth aspect of the present invention is the substrate processing apparatus according to the twelfth aspect of the present invention, wherein the first member has a U-shaped cross section that opens to the outside, and at least a part of the second member It enters into the opening part of a U-shaped cross section.

  The substrate processing apparatus according to claim 14 is the substrate processing apparatus according to claim 12 or 13, wherein the erodible substance is an active species generated from a reactive active gas, and the first member is made of a fluororesin. Features.

  A substrate processing apparatus according to a fifteenth aspect is the substrate processing apparatus according to the twelfth or thirteenth aspect, wherein the erodible substance is a corrosive gas, and the first member is made of a corrosion-resistant metal.

  According to the seal component of claim 1 and the substrate processing apparatus of claim 12, the seal component is disposed on the inner side of the decompression vessel and has resistance to an erosion substance that erodes the highly elastic polymer substance. Since the first member includes the member and the second member made of a highly elastic polymer material disposed on the outer side of the decompression container, the first member can prevent the second member from being eroded. Therefore, it is possible to eliminate the necessity of using a high-elasticity polymer material having resistance to eroding substances. In addition, since at least a part of the first member and at least a part of the second member have a predetermined space formed apart from each other, a part of the second member when the second member is compressed and deformed. Can enter the predetermined space, and thus the second member can be easily compressed and deformed. Furthermore, since the first member and the second member are fitted to each other, the seal component can be handled integrally and the size can be reduced. As a result, the sealing component is inexpensive and can ensure excellent durability without requiring a predetermined sealing space.

  According to the sealing component of claim 2 and the substrate processing apparatus of claim 13, the first member has a U-shaped cross section that opens to the outside, and at least a part of the second member has a U-shaped cross section. The first member can be restored by the repulsive force of the entered second member even if the restoring property of the first member is reduced due to creeping or yielding. As a result, durability can be maintained over a long period of time.

  According to the seal component of the third aspect, since the U-shaped cross section of the first member has at least one bent portion, the first member can also be easily compressed and deformed. Therefore, the followability of the first member can be improved, excellent durability can be ensured, and the compression load on the first member and the second member can be reduced.

  According to the seal component of the fourth aspect, since the bent portion is a narrow portion, the effect of the third aspect can be reliably achieved.

  According to the seal component of the fifth aspect and the substrate processing apparatus of the fourteenth aspect, the eroding substance is an active species generated from a reactive active gas, and the first member is made of a fluororesin. The fluororesin is hardly eroded by the active species. Therefore, it is possible to surely prevent the highly elastic polymer substance from being eroded by the active species, and thus it is possible to ensure better durability.

  According to the seal part of claim 6, the fluororesin is polytetrafluoroethylene, tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene / hexafluoropropylene copolymer, tetrafluoroethylene / ethylene copolymer. Since it is one selected from the group consisting of coalescence, polyvinylidene fluoride, and polychlorotrifluoroethylene, the material constituting the first member can be easily and inexpensively obtained, and thus the sealing component Can be made cheaper.

  According to the seal component of claim 7 and 10, since the high elastic polymer substance is one selected from the group consisting of vinylidene fluoride rubber and tetrafluoroethylene-propylene rubber, the second member Can be obtained easily and inexpensively, so that the sealing part can be made cheaper.

  According to the seal component of the eighth aspect and the substrate processing apparatus of the fifteenth aspect, the corrosive substance is a corrosive gas, and the first member is made of a corrosion-resistant metal. Corrosion resistant metals are hardly eroded by corrosive gases. Therefore, it is possible to reliably prevent the highly elastic high-molecular substance from being eroded by the corrosive gas, and thus it is possible to ensure better durability.

  According to the seal part of the ninth aspect, since the corrosion-resistant metal is one selected from the group consisting of stainless steel, nickel, and aluminum, the material constituting the first member is easily and inexpensively obtained. Thus, the sealing part can be made cheaper.

  According to the seal component of the eleventh aspect, since the second member has the constricted portion, the followability of the second member can be improved, and the shielding performance can be improved.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  First, the sealing component and the substrate processing apparatus according to the first embodiment of the present invention will be described. The substrate processing apparatus is configured to perform a predetermined process on a substrate using a reactive active gas.

  FIG. 1 is a cross-sectional view showing a schematic configuration of a plasma processing apparatus as a substrate processing apparatus according to the present embodiment. This plasma processing apparatus is configured to perform RIE (Reactive Ion Etching) processing on a semiconductor wafer W as a substrate and to perform WLDC processing.

  In FIG. 1, a plasma processing apparatus 10 has a cylindrical vacuum vessel 11 (decompression vessel), and the vacuum vessel 11 has a processing space S therein. Further, in the vacuum container 11, for example, a cylindrical susceptor 12 is disposed as a mounting table on which a semiconductor wafer W having a diameter of 300 mm (hereinafter simply referred to as “wafer W”) is mounted. The inner wall surface of the vacuum vessel 11 is covered with a side wall member 45. The side wall member 45 is made of aluminum, and the surface facing the processing space S is coated with a ceramic such as yttria (Y2O3). The vacuum vessel 11 is electrically grounded, and the susceptor 12 is installed on the bottom of the vacuum vessel 11 via an insulating member 29.

  In the plasma processing apparatus 10, an exhaust path 13 that functions as a flow path for discharging gas molecules above the susceptor 12 out of the vacuum container 11 is formed by the inner wall of the vacuum container 11 and the side surface of the susceptor 12. An annular baffle plate 14 is disposed in the middle of the exhaust passage 13 to prevent plasma leakage. In addition, the space downstream of the baffle plate 14 in the exhaust passage 13 wraps around the susceptor 12, and enters an automatic pressure control valve (hereinafter referred to as “APC valve”) 15 that is a variable butterfly valve. Communicate. The APC valve 15 is connected to a turbo molecular pump (hereinafter referred to as “TMP”) 17 which is an exhaust pump for evacuation through an isolator 16, and the TMP 17 is connected to the valve V 1. Are connected to a dry pump (hereinafter referred to as “DP”) 18 which is an exhaust pump. An exhaust passage (hereinafter referred to as “main exhaust line”) constituted by the APC valve 15, the isolator 16, TMP17, the valve V1 and the DP18 performs pressure control in the vacuum vessel 11 by the APC valve 15, and further includes TMP17 and The inside of the vacuum vessel 11 is depressurized by the DP 18 until it becomes almost vacuum.

  A pipe 19 is connected between the isolator 16 and the APC valve 15 to the DP 18 via the valve V2. A pipe 19 and a valve V <b> 2 (hereinafter referred to as “bypass line”) bypass the isolator 16 and the TMP 17 and roughen the vacuum vessel 11 by the DP 18.

  A high frequency power supply 20 for the lower electrode is connected to the susceptor 12 via a feeding rod 21 and a matcher 22, and the high frequency power supply 20 for the lower electrode supplies predetermined high frequency power to the susceptor 12. . Thereby, the susceptor 12 functions as a lower electrode. The matching unit 22 reduces the reflection of the high frequency power from the susceptor 12 to maximize the supply efficiency of the high frequency power to the susceptor 12.

  A disc-shaped ESC electrode plate 23 made of a conductive film is disposed above the susceptor 12. A DC power supply 24 is electrically connected to the ESC electrode plate 23. The wafer W is attracted and held on the upper surface of the susceptor 12 by a Coulomb force or a Johnson-Rahbek force generated by a DC voltage applied from the DC power source 24 to the ESC electrode plate 23. In addition, an annular focus ring 25 is disposed above the susceptor 12 so as to surround the wafer W attracted and held on the upper surface of the susceptor 12. The focus ring 25 is exposed to the processing space S and converges the plasma toward the surface of the wafer W in the processing space S, thereby improving the efficiency of the RIE processing.

  Further, for example, an annular refrigerant chamber 26 extending in the circumferential direction is provided inside the susceptor 12. A refrigerant having a predetermined temperature, for example, cooling water or a Galden (registered trademark) liquid, is circulated and supplied to the refrigerant chamber 26 via a refrigerant pipe 27 from a chiller unit (not shown), and the susceptor 12 is supplied depending on the temperature of the refrigerant. The processing temperature of the wafer W attracted and held on the upper surface is controlled.

  Further, a plurality of heat transfer gas supply holes 28 are opened in a portion of the upper surface of the susceptor 12 where the wafer W is adsorbed and held (hereinafter referred to as “adsorption surface”). The plurality of peripheral heat transfer gas supply holes 28 are connected to a heat transfer gas supply unit 32 via a heat transfer gas supply line 30 disposed inside the susceptor 12, and the heat transfer gas supply unit 32 serves as a heat transfer gas. The helium gas is supplied to the gap between the adsorption surface and the back surface of the wafer W through the heat transfer gas supply hole 28.

  A plurality of pusher pins 33 as lift pins that can protrude from the upper surface of the susceptor 12 are arranged on the suction surface of the susceptor 12. These pusher pins 33 are connected via a motor (not shown) and a ball screw (not shown), and freely protrude from the suction surface due to the rotational motion of the motor converted into a linear motion by the ball screw. To do. The pusher pin 33 is accommodated in the susceptor 12 when the wafer W is sucked and held on the suction surface to perform the RIE process on the wafer W, and the pusher pin 33 is unloaded when the wafer W subjected to the RIE process is unloaded from the vacuum vessel 11. Protrudes from the upper surface of the susceptor 12 and lifts the wafer W away from the susceptor 12 upward.

  A gas introduction shower head 34 is disposed on the ceiling of the vacuum vessel 11 so as to face the susceptor 12. A high-frequency power source 36 for the upper electrode is connected to the gas introduction shower head 34 via a matching unit 35, and the high-frequency power source 36 for the upper electrode supplies predetermined high-frequency power to the gas introduction shower head 34. The introduction shower head 34 functions as an upper electrode. The function of the matching unit 35 is the same as the function of the matching unit 22 described above.

  The gas introduction shower head 34 has a ceiling electrode plate 38 having a large number of gas holes 37 and an electrode support 39 that detachably supports the ceiling electrode plate 38. A buffer chamber 40 is provided inside the electrode support 39, and a processing gas introduction pipe 41 from a processing gas supply unit (not shown) is connected to the buffer chamber 40. A pipe insulator 42 is disposed in the middle of the processing gas introduction pipe 41. The pipe insulator 42 is made of an insulator and prevents the high-frequency power supplied to the gas introduction shower head 34 from leaking to the process gas supply section through the process gas introduction pipe 41. The gas introduction shower head 34 passes a process gas supplied from the process gas introduction pipe 41 to the buffer chamber 40, for example, a mixed gas of CxFy gas and argon (Ar) gas, which is a reactive active gas, via a gas hole 37. Then, it is supplied to the inside of the vacuum vessel 11 (processing space S).

  The plasma processing apparatus 10 includes a container lid 31 disposed on the upper part of the vacuum container 11. The container lid 31 covers the gas introduction shower head 34. In order to seal the inside of the vacuum vessel 11 from the outside, an O-ring shaped sealing component 46 is disposed between the vessel lid 31 and the vacuum vessel 11 so as to surround the gas introduction shower head 34.

  In addition, on the side wall of the vacuum vessel 11, a wafer W loading / unloading port 43 is provided at a position corresponding to the height of the wafer W lifted upward from the susceptor 12 by the pusher pin 33. A gate valve 44 for opening and closing the inlet 43 is attached.

  In the vacuum vessel 11 of the plasma processing apparatus 10, as described above, the high frequency power is supplied to the susceptor 12 and the gas introduction shower head 34, and the high frequency power is supplied to the processing space S between the susceptor 12 and the gas introduction shower head 34. , The mixed gas supplied from the gas introduction shower head 34 in the processing space S is turned into plasma, ions are generated, and the wafer W is subjected to RIE processing by ions or the like. At this time, the etching rate is controlled by the reaction by-product generated from the CxFy gas of the mixed gas, but simultaneously with the generation of ions, fluorine radicals that are depot active species are generated.

  The operation of each component of the plasma processing apparatus 10 described above is controlled by a CPU of a control unit (not shown) provided in the plasma processing apparatus 10 according to a program corresponding to the RIE process.

  FIG. 2 is an enlarged cross-sectional view of the O-ring-shaped sealing component in FIG. Since the gas introduction shower head 34 exists in the upper part in the figure, the upper part in the figure corresponds to the inside of the vacuum vessel 11. Therefore, hereinafter, the upper side in the figure is referred to as “inside (vacuum) side”, and the lower side in the figure is referred to as “outside (atmosphere) side”. Further, the vertical direction in the figure is referred to as “horizontal direction”, and the horizontal direction in the figure is referred to as “vertical direction”.

  In FIG. 2, the seal component 46 includes a radical seal member 47 having a substantially U-shaped cross-sectional shape that opens to the atmosphere side, and a vacuum seal member 48 having a substantially bowl-shaped cross-sectional shape arranged along the horizontal direction. . The radical seal member 47 is disposed on the inner (vacuum) side, and the vacuum seal member 48 is disposed on the outer (atmosphere) side. The radical seal member 47 is made of polytetrafluoroethylene (PTFE), which is a fluororesin, and the vacuum seal member 48 is made of FKM.

  The seal component 46 is accommodated in a space defined by a seal groove 49 having a rectangular cross-sectional shape formed in the vacuum vessel 11 and the vessel lid 31. A container lid 31 is disposed above the seal part 46, and the container lid 31 contacts the upper part of the seal part 46. Specifically, the bottom surface 49 b of the seal groove 49 contacts the radical seal member 47 and the vacuum seal member 48, and the container lid 31 contacts the radical seal member 47 and the vacuum seal member 48.

  The distance between the container lid 31 and the bottom surface 49b of the seal groove 49 is set shorter than the natural length in the vertical direction of the radical seal member 47 and the natural length in the vertical direction of the vacuum seal member 48 by a predetermined length. When the component 46 is accommodated in the space defined by the seal groove 49 and the container lid 31, the radical seal member 47 and the vacuum seal member 48 are compressed in the vertical direction. Thereby, the radical seal member 47 and the vacuum seal member 48 generate a repulsive force, and the radical seal member 47 and the vacuum seal member 48 are brought into close contact with the container lid 31 and the bottom surface 49 b of the seal groove 49 due to the repulsive force.

  The radical seal member 47 has a radical seal narrow portion 47a between a portion that contacts the container lid 31 and a portion that contacts the vacuum side surface 49a, and a portion that contacts the vacuum side surface 49a and a portion that contacts the bottom surface 49b. There is a radical seal narrow portion 47b in between. Since the rigidity of the radical seal narrow portions 47a and 47b is low, compressive deformation of the radical seal member 47 is promoted. That is, the radical seal narrow portions 47a and 47b are bent portions, and when the radical seal member 47 is compressed in the vertical direction, the radical seal member 47 is bent and compressively deformed at the radical seal narrow portions 47a and 47b.

  Since the vacuum seal member 48 has a substantially bowl-shaped cross-sectional shape as described above, the vacuum seal that connects the vacuum side lump portion 48a, the atmosphere side lump portion 48b, the vacuum side lump portion 48a, and the atmosphere side lump portion 48b. And a narrow portion 48c. A part of the radical seal member 47 and a part of the vacuum seal member 48, specifically, the vacuum side lump portion 48a, the atmosphere side lump portion 48b, and the vacuum seal narrow portion 48c are separated from each other to form two retreat spaces 48d and 48e. Form. That is, the vacuum seal narrow portion 48 c forms a constriction (constriction portion) in the vacuum seal member 48.

  The vacuum side lump portion 48 a of the vacuum seal member 48 is press-fitted into the opening portion of the radical seal member 47 having a U-shaped cross section. Thereby, the radical seal member 47 and the vacuum seal member 48 are fitted to each other. Further, a part of the vacuum side lump portion 48a of the vacuum seal member 48 is separated from the radical seal narrow portions 47a and 47b to form the retreat spaces 48f and 48g.

  Since the portions protruding from the vacuum seal member 48 compressed in the vertical direction enter the retreat spaces 48d, 48e, 48f, 48g existing around the vacuum seal member 48 described above, the retreat spaces 48d, 48e, 48f, 48 g promotes compressive deformation of the vacuum seal member 48.

  Next, a specific shape of the seal component 46 will be described.

  FIG. 3 is a cross-sectional view showing a specific shape of the sealing component in FIG. In FIG. 3, each part of the seal part 46 is in a natural length state except that the vacuum side lump portion 48 a of the vacuum seal member 48 is press-fitted into the opening of the U-shaped cross section of the radical seal member 47 and deformed. It is.

  As shown in FIG. 3, in the natural length state, the vacuum seal member 48 has a horizontal length of L1, a vertical length (vertical height of the atmosphere-side lump portion 48b) of L2, and a vacuum seal. The length (width) in the vertical direction of the narrow portion 48c is formed at L3.

  In the natural length state, the radical seal member 47 has a horizontal length of L4 and a vertical length of L5, which is in contact with the contact surface 47c that contacts the container lid 31 and the bottom surface 49b of the seal groove 49. The length of the contact surface 47d is formed at L6. In the radical seal member 47, the thickness of the radical seal narrow portions 47a and 47b is formed to be W1.

  Further, the vacuum seal member 48 and the radical seal member 47 are arranged so that the vacuum spaces 48d and 48e are horizontal when the vacuum side lump portion 48a of the vacuum seal member 48 is press-fitted into the opening of the U-shaped cross section of the radical seal member 47. The width in the direction is D1, and the minimum widths of the retreat spaces 48f and 48g are D2, respectively. The distance between the container lid 31 and the bottom surface 49b of the seal groove 49 is Dr.

  The horizontal length L1 and the vertical length L2 of the vacuum seal member 48 and the horizontal length L4 and the vertical length L5 of the radical seal member 47 are the distance Dr between the container lid 31 and the bottom surface 49b of the seal groove 49. Is set to an optimal value. Specifically, the horizontal length L1 of the vacuum seal member 48 satisfies 1.8 × Dr ≧ L1 ≧ 0.8 × Dr, preferably 1.5 × Dr ≧ L1 ≧ 1.2 × Dr. Is set to The vertical length L2 of the vacuum seal member 48 is set to a value satisfying 1.8 × Dr ≧ L2 ≧ 1.05 × Dr, preferably 1.5 × Dr ≧ L2 ≧ 1.15 × Dr. . The horizontal length L4 of the radical seal member 47 is (5/6) × L1 ≧ L4 ≧ (1/6) × L1, preferably (2/3) × L1 ≧ L4 ≧ (1/3). It is set to a value satisfying × L1. The vertical length L5 of the radical seal member 47 is set to a value satisfying 1.8 × Dr ≧ L5 ≧ 1.05 × Dr, preferably 1.5 × Dr ≧ L5 ≧ 1.15 × Dr. .

  The vertical length L3 of the vacuum seal narrow portion 48c is set corresponding to the vertical length L2 of the vacuum seal member 48, and preferably 0.95 × L2 ≧ L3 ≧ 0.3 × L2. It is set to a value satisfying 0.9 × L2 ≧ L3 ≧ 0.45 × L2. When the length L3 in the vertical direction of the vacuum seal narrow portion 48c is large, the rigidity of the vacuum seal member 48 in the vacuum seal narrow portion 48c increases, and the vacuum seal member 48 becomes easy to handle. On the other hand, when the vertical length L3 of the vacuum seal narrow portion 48c is small, the followability to the inclination of the container lid 31 of the vacuum seal member 48 and the bottom surface 49b of the seal groove 49 is improved.

  Thus, since the vacuum seal narrow portion 48c forms a constriction in the vacuum seal member 48, the followability of the vacuum seal member 48 with respect to the container lid 31 and the bottom surface 49b can be improved in cooperation with the retreat spaces 48d and 48e. , Sealing performance can be improved.

  The length L6 of the contact surfaces 47c and 47d of the radical seal member 47 has an upper limit value corresponding to the horizontal length L4, and 0.6 × L4 ≧ L6 ≧ 0.5 mm, preferably 0 It is set to a value satisfying 6 × L4 ≧ L6 ≧ 1 mm. Thus, by providing the contact surfaces 47c and 47d with a width (length L6), the shielding performance of the radical seal member 47 can be stabilized.

  The thickness W1 of the radical seal narrow portions 47a and 47b of the radical seal member 47 is such that the rigidity of the radical seal narrow portions 47a and 47b, that is, the rigidity of PTFE at the thickness W1 is at the opening of the U-shaped cross section of the radical seal member 47. The pressure is set so as to be deformed by the restoring force of the press-fitted vacuum side lump portion 48a, that is, the force below the recovery force of the FKM in the state of the press-fitted vacuum side lump portion 48a. This is because even if the contact surfaces 47c and 47d of the radical seal member 47 creep, the radical seal narrow portions 47a and 47b are pushed upward and downward by the restoring force of the vacuum side lump portion 48a, respectively, and the radicals of the radical seal member 47 are This is to maintain the shielding performance against the above. Specifically, the thickness W1 of the radical seal narrow portions 47a and 47b is set to a value satisfying 2.0 mm ≧ W1 ≧ 0.05 mm, preferably 1.5 mm ≧ W1 ≧ 0.1 mm. If the thickness of the radical seal narrow portions 47a and 47b is smaller than the thickness W1, the durability and workability of the radical seal narrow portions 47a and 47b are extremely reduced, and it is impossible to obtain good shielding performance against radicals. .

  By providing the radical seal narrow portions 47a and 47b in this way, the degree of freedom of deformation of the radical seal member 47 is increased, and the radical seal member 47 can be easily compressed and deformed. Accordingly, the followability of the radical seal member 47 during compression can be improved, the radical seal member 47 can have excellent durability, and the compression load on the radical seal member 47 can be reduced. Can do.

  The horizontal width D1 of the waiting spaces 48d and 48e is such that at least the atmospheric side end of the radical seal member 47 and the atmospheric side lump portion 48b of the vacuum seal member 48 are in contact with each other in the natural length state (the state of FIG. 3). And the value is set such that the atmosphere side end portion of the radical seal member 47 and the atmosphere side lump portion 48b of the vacuum seal member 48 do not come into contact with each other when the seal component 46 is attached (the state shown in FIG. 2). Preferably it is. By providing the retreat spaces 48d and 48e as described above, the radical seal member 47 and the vacuum seal member 48 can move independently of each other even when the seal component 46 is attached. Even when 48 falls, the radical seal member 47 does not follow the movement of the vacuum seal member 48, and the contact state between the container lid 31 and the bottom surface 49b of each of the contact surfaces 47c and 47d is improved. Can keep. Thereby, the shielding performance against radicals of the radical seal member 47 can be stabilized over a long period of time.

  The minimum width D2 of the waiting spaces 48f and 48g is set to a value that is larger than 0 in the natural length state (the state shown in FIG. 3), and preferably larger than 0 even in the attached state (the state shown in FIG. 2) of the seal part 46. Has been. By setting the minimum width D2 of the retreat spaces 48f and 48g in this manner, the rubber component (FKM) and the resin material (PTFE) are tightened in the seal component 46, so that the seal component consisting of a single rubber material is tightened. Although the compression load tends to increase, by providing the retracting spaces 48f and 48g, the reaction force of the resin material (radical seal member 47) can be suppressed and the tightening force required for tightening can be reduced. Further, as described above, by forming the retreat spaces 48f and 48g, a sufficient space can be secured when the radical seal member 47 is deformed, and the deformation of the radical seal member 47 can be stabilized, thereby providing a radical seal. The reaction force of the member 47 can be further reduced.

  In the plasma processing apparatus 10, fluorine radicals and oxygen radicals (hereinafter simply referred to as “radicals”) are generated inside the vacuum vessel 11. The radical easily consumes the FKM constituting the vacuum seal member 48. Here, radicals flow from the vacuum side to the atmosphere side in FIG. 2, but the radical seal member 47 is arranged on the vacuum side and is in close contact with the container lid 31 and the bottom surface 49 b of the seal groove 49. Prevents radicals from reaching the vacuum seal member 48 disposed on the atmosphere side. In particular, since PTFE constituting the radical seal member 47 has excellent resistance to radicals, the radical seal member 47 is not consumed. In addition, PTFE is reduced in its resilience due to creeping if it continues to be compressed for a long time. However, in the sealing component 46, the vacuum side lump portion 48a of the vacuum seal member 48 is formed in the opening of the U-shaped cross section of the radical seal member 47. Since the pressure is pressed in, the repulsive force of the vacuum side lump portion 48a compensates for the reduced resilience of the radical seal member 47. Therefore, the radical seal member 47 prevents radicals from reaching the vacuum seal member 48 arranged on the atmosphere side for a long time.

  Further, in the plasma processing apparatus 10, the vacuum seal member 48 is disposed on the atmosphere side and is in close contact with the container lid 31 and the bottom surface 49 b of the seal groove 49. Further, as described above, since radicals do not reach the vacuum seal member 48, the vacuum seal member 48 is not consumed, and the vacuum seal member 48 enters the inside of the vacuum container 11 for a long time. To prevent.

  According to the seal component 46 according to the present embodiment, a radical seal member 47 made of PTFE arranged on the vacuum side and having excellent resistance to radicals, and a vacuum seal member 48 made of FKM arranged on the atmosphere side. With. Since the radical seal member 47 prevents radicals from reaching the vacuum seal member 48, the vacuum seal member 48 can be prevented from being consumed by radicals, thereby eliminating the need to use FFKM having resistance to radicals. be able to. Further, since the radical seal member 47 and the vacuum seal member 48 are fitted to each other, the seal component 46 can be handled integrally and can be miniaturized. As a result, the sealing component 46 is inexpensive and can ensure excellent durability without requiring a predetermined sealing space.

  In the sealing component 46 described above, the radical seal member 47 has a U-shaped cross section that opens to the atmosphere side, and the vacuum side lump portion 48a of the vacuum seal member 48 is press-fitted into the opening portion of the U-shaped cross section. Even if the resilience of the radical seal member 47 is reduced by the leaping, the reduced resilience of the radical seal member 47 can be compensated by the repulsive force of the press-fitted vacuum side lump portion 48a. As a result, the radical seal member 47 can prevent the radicals from reaching the vacuum seal member 48 disposed on the atmosphere side for a long time and maintain the durability of the seal component 46 for a long time. .

  In the seal component 46, the radical seal member 47 is made of PTFE. PTFE has excellent resistance to radicals and is hardly consumed by radicals. Therefore, it is possible to reliably prevent the FKM of the vacuum seal member 48 from being consumed by radicals, and thus it is possible to secure a more excellent durability of the seal component 46.

  Further, the seal component 46 is provided in the surroundings 48d, 48e, 48f, 48g around the vacuum seal member 48, which is defined by the vacuum seal member 48 alone or in cooperation with the vacuum seal member 48 and the radical seal member 47. Therefore, when the vacuum seal member 48 is compressed in the vertical direction, the portions protruding from the vacuum seal member 48 can enter the retreat spaces 48d, 48e, 48f, and 48g, whereby the vacuum seal member 48 is It can be easily compressed and deformed. Further, since the radical seal member 47 has the radical seal narrow portions 47a and 47b in the U-shaped cross section, the radical seal member 47 can be easily compressed and deformed. Accordingly, it is possible to improve the followability of the bottom surface 49b of the radical seal member 47 and the container lid 31 in the seal groove 49, and thus it is possible to ensure excellent durability, and also the radical seal member 47 and the vacuum seal member 48. The compression weight on can be reduced.

  Further, in the seal component 46, the vacuum seal member 48 made of FKM realizes a vacuum seal. FKM can realize a vacuum seal even if the surface roughness of the surface to be adhered is large. Thereby, the sealing component 46 can implement | achieve the outstanding vacuum seal. Further, it is not necessary to reduce the surface roughness of the container lid 31 and the bottom surface 49b of the seal groove 49 as much as possible. As a result, since the surface roughness management of the container lid 31 and the seal groove 49 becomes easy, the manufacturing cost of the plasma processing apparatus 10 can be reduced.

  In the sealing component 46 described above, the radical seal member 47 is made of PTFE. However, the radical seal member 47 may be made of a material having resistance to radicals. For example, a tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer ( PFA), tetrafluoroethylene / hexafluoropropylene copolymer (FEP), tetrafluoroethylene / ethylene copolymer (ETFE), polyvinylidene fluoride (PVDF), and polychlorotrifluoroethylene (PCTFE) It may be configured. Since these materials can be obtained easily and inexpensively, the sealing component 46 can be made cheaper.

  Moreover, in the sealing component 46 described above, the vacuum seal member 48 is made of FKM. However, the vacuum seal member 48 may be made of a material having a vacuum sealing property, for example, tetrafluoroethylene-propylene rubber (FEPM). It may be constituted by. Since these materials can also be obtained easily and inexpensively, the sealing component 46 can be made cheaper.

  Next, a modified example of the seal part 46 will be described.

  As shown in FIGS. 2 and 3, in this embodiment, the radical seal member 47 of the seal component 46 has one radical seal narrow portion as a bent portion on one side portion of the symmetry plane (see FIG. 4) of the seal component 46. 47a and 47b, respectively. In this case, as shown in FIG. 4, when the seal part 46 is attached (the state shown in FIG. 2), the compression force of the container lid 31 or the bottom surface 49b and the restoring force of the vacuum seal member 48 are applied to the radical seal member 47. There are cases where the contact surfaces 47c and 47d do not come into surface contact with the corresponding surfaces. On the other hand, as shown in FIGS. 6A to 6D described later, the radical seal member 47 includes at least three or more bent portions disposed symmetrically with respect to the symmetry plane of the seal component 46. By adopting such a configuration, the contact surfaces 47c and 47d of the radical seal member 47 can be brought into surface contact with the respective surfaces of the container lid 31 or the bottom surface 49b in the attached state of the seal component 46 (the state shown in FIG. 2). And a good radical shielding effect can be obtained.

  In the case where the radical seal member 47 includes at least three bent portions arranged symmetrically with respect to the symmetry plane of the seal component 46, as shown in FIG. ) And the restoring force of the vacuum seal member 48 cause the moment generated in the radical seal member 47 to be distributed to each bent portion, and the contact surfaces 47c and 47d of the radical seal member 47 follow the mating material. .

  6A to 6D specifically show a modification of the seal component 46. FIG. As shown in FIGS. 6A and 6B, the radical seal member 47 may include one bent portion formed on a symmetrical plane in addition to the radical seal narrow portions 47a and 47b. As shown in FIGS. 6C and 6D, the radical seal member 47 includes two bent portions disposed symmetrically with respect to the symmetry plane in addition to the radical seal narrow portions 47a and 47b. It may be a thing.

  The bent portion is not limited to a narrow portion, and may be formed by a notch or a concave portion (see FIGS. 6A and 6C) or a corner portion (see FIG. 6 ( B) and (D)). The bent portion may have another shape.

  As described above, the case where the seal component 46 is accommodated in the space defined by the seal groove 49 and the container lid 31 has been described. However, the place where the seal component 46 is applied is not limited to this, and the vacuum is sealed from the atmosphere. It can be applied where needed. For example, the present invention can be applied to a joint of an exhaust system that exhausts gas or the like inside the vacuum vessel 11. As an exhaust system joint, a KF flange joint structure is frequently used.

  FIG. 7 is a cross-sectional view showing a case where the seal component in FIG. 2 is applied to a KF flange joint structure.

  In FIG. 7, the KF flange joint structure 50 includes a pipe 51 having a circular flange 51b coaxial with the hole 51a, a receiving part 52 having a hole 52a communicating with the hole 51a of the pipe 51, and the pipe 51 and the receiving part 52. A centering pipe 53 interposed therebetween, and a substantially ring-shaped fastening member 54 having an inner flange portion 54a.

  The pipe 51 has an insertion hole 51c that is coaxial with the hole 51a at the end surface and has a diameter larger than the hole 51a by a predetermined value, and the receiving portion 52 is also coaxial with the hole 52a at the end surface and has the same diameter as the insertion hole 51c. An insertion hole 52b is provided. The outer diameter of the centering pipe 53 is set smaller than the diameter of the insertion holes 51c and 52b by a predetermined value. Therefore, the hole 51a of the pipe 51 and the hole 52a of the receiving portion 52 can be centered by inserting the upper and lower ends of the centering pipe 53 into the insertion holes 51c and 52b, respectively.

  Further, the centering pipe 53 has a protruding portion 53a protruding in the horizontal direction in the drawing. The protruding portion 53a has a predetermined length in the vertical direction in the figure, the upper and lower end parts are shaped so as to be along the horizontal direction in the figure, and the side end parts are shaped in an arcuate cross section. The inner flange portion 54 a of the fastening member 54 presses the peripheral edge portion of the circular flange portion 51 b of the pipe 51 attached to the receiving portion 52 via the centering pipe 53. As a result, the upper and lower end portions of the protruding portion 53a abut against the end surface of the pipe 51 and the end surface of the receiving portion 52, respectively, and maintain the interval between the pipe 51 and the receiving portion 52 at a predetermined value.

  In the KF flange joint structure 50, the hole 51 a communicates with the inside of the vacuum vessel 11. Therefore, the internal pressure of the hole 51a and the hole 52a is substantially vacuum, and radicals flow through the hole 51a and the hole 52a. In FIG. 7, the hole 51a and the hole 52a correspond to the vacuum side, and the outside of the pipe 51 corresponds to the atmosphere side.

  Here, as described above, since the radical seal member 47 and the vacuum seal member 48 are miniaturized by fitting the seal component 46 with each other, the seal component 46 requires a predetermined sealing space. There is nothing. Therefore, the seal component 46 can be accommodated in a space defined by the end surface of the pipe 51, the end surface of the receiving portion 52, and the arcuate side end portion of the protruding portion 53 a of the centering pipe 53. That is, the seal component 46 can be applied without changing the structure of the KF flange joint structure 50.

  In the KF flange joint structure 50, the distance between the end surface of the pipe 51 and the end surface of the receiving portion 52, that is, the vertical length of the protruding portion 53 a is the natural length of the radical seal member 47 in the vertical direction and the vacuum seal member 48. Since the predetermined length is set shorter than the natural length in the vertical direction, the seal component 46 is defined by the end surface of the pipe 51, the end surface of the receiving portion 52, and the arcuate side end portion of the protruding portion 53a of the centering pipe 53. When accommodated in the space, the radical seal member 47 and the vacuum seal member 48 are compressed in the vertical direction. At this time, the radical seal member 47 and the vacuum seal member 48 generate a repulsive force, and the radical seal member 47 and the vacuum seal member 48 are in close contact with the end surface of the pipe 51 and the end surface of the receiving portion 52 due to the repulsive force. Therefore, the radical seal member 47 prevents radicals flowing through the holes 51a and 52a from reaching the vacuum seal member 48 for a long time. Further, the vacuum seal member 48 prevents the outside air from entering the holes 51a and 52a for a long time.

  Next, a sealing part according to a second embodiment of the present invention will be described.

  The present embodiment is basically the same in configuration and operation as the first embodiment described above, and the first embodiment described above in that a corrosive gas is used instead of a reactive active gas in the substrate processing apparatus. Only the form is different. Therefore, the description of the same configuration is omitted, and only the operation different from the first embodiment will be described below.

  FIG. 8 is an enlarged cross-sectional view of the seal component according to the present embodiment. Note that the upper part in the figure corresponds to a space where the pressure is reduced to almost vacuum and corrosive gas exists, and the lower part in the figure corresponds to an atmospheric space. Therefore, hereinafter, the upper part in the figure is referred to as “vacuum side” and the lower part in the figure is referred to as “atmosphere side”. Further, the vertical direction in the figure is referred to as “horizontal direction”, and the horizontal direction in the figure is referred to as “vertical direction”.

  In FIG. 8, the seal component 55 includes a corrosive gas seal member 56 having a substantially U-shaped cross-section that opens to the atmosphere side, and a vacuum seal member 48. The corrosive gas seal member 56 is disposed on the vacuum side, and the vacuum seal member 48 is disposed on the atmosphere side. The corrosive gas seal member 56 is made of austenitic stainless steel, and the vacuum seal member 48 is made of FKM.

  The seal component 55 is also accommodated in a space defined by, for example, a seal groove 49 having a rectangular cross-sectional shape formed in the vacuum container 11 and the container lid 31. A container lid 31 is disposed above the seal part 55, and the container lid 31 abuts on the upper part of the seal part 55. Specifically, the bottom surface 49 b of the seal groove 49 contacts the corrosive gas seal member 56 and the vacuum seal member 48, and the container lid 31 contacts the corrosive gas seal member 56 and the vacuum seal member 48.

  The distance between the container lid 31 and the bottom surface 49b of the seal groove 49 is set shorter by a predetermined length than the natural length in the vertical direction of the corrosive gas seal member 56 and the natural length in the vertical direction of the vacuum seal member 48. When the seal component 55 is accommodated in the space defined by the seal groove 49 and the container lid 31, the corrosive gas seal member 56 and the vacuum seal member 48 are compressed in the vertical direction. As a result, the corrosive gas seal member 56 and the vacuum seal member 48 generate a repulsive force, and the corrosive gas seal member 56 and the vacuum seal member 48 are brought into close contact with the container lid 31 and the bottom surface 49b of the seal groove 49 due to the repulsive force. To do.

  The vacuum side lump portion 48 a of the vacuum seal member 48 is press-fitted into the opening portion of the U-shaped cross section of the corrosive gas seal member 56. Thereby, the corrosive gas seal member 56 and the vacuum seal member 48 are fitted to each other. Further, a part of the vacuum side lump portion 48a of the vacuum seal member 48 is separated from a part of the corrosive gas seal member 56 to form the retreat spaces 48h and 48i.

  Since the portions protruding from the vacuum seal member 48 compressed in the vertical direction enter the retreat spaces 48d, 48e, 48h, 48i existing around the vacuum seal member 48 described above, the retreat spaces 48d, 48e, 48h, 48 i facilitates the compressive deformation of the vacuum seal member 48.

  In the drawing, the corrosive gas flowing from the vacuum side to the atmosphere side easily consumes the FKM constituting the vacuum seal member 48, but the corrosive gas seal member 56 is arranged on the vacuum side so that the container lid 31 and the seal groove 49 The corrosive gas seal member 56 prevents the corrosive gas from reaching the vacuum seal member 48 disposed on the atmosphere side in order to be in close contact with the bottom surface 49b. In particular, since the austenitic stainless steel constituting the corrosive gas seal member 56 has excellent resistance to the corrosive gas, the corrosive gas seal member 56 is not consumed. Therefore, the corrosive gas seal member 56 prevents the corrosive gas from reaching the vacuum seal member 48 disposed on the atmosphere side for a long time.

  According to the seal component 55 according to the present embodiment, the corrosive gas seal member 56 made of austenitic stainless steel which is arranged on the vacuum side and has excellent resistance to the corrosive gas, and the air gas side is made of FKM. And a vacuum seal member 48. Since the corrosive gas seal member 56 prevents the corrosive gas from reaching the vacuum seal member 48, the vacuum seal member 48 can be prevented from being consumed by the corrosive gas. The need to use can be eliminated. Further, since the corrosive gas seal member 56 and the vacuum seal member 48 are fitted to each other, the seal component 55 can be handled integrally and can be reduced in size. As a result, the sealing component 55 is inexpensive and can ensure excellent durability without requiring a predetermined sealing space.

  Further, in the seal component 55, the corrosive gas seal member 56 is made of austenitic stainless steel. Austenitic stainless steel has excellent resistance to corrosive gas and is hardly consumed by corrosive gas. Therefore, it is possible to surely prevent the FKM of the vacuum seal member 48 from being consumed by the corrosive gas, and thus it is possible to ensure the superior durability of the seal component 55.

  Further, the seal component 55 is provided around the vacuum seal member 48. The vacuum seal member 48 is defined as a stand-by space 48d, 48e, 48h, which is defined by the vacuum seal member 48 alone or in cooperation with the vacuum seal member 48 and the corrosive gas seal member 56. 48i, the portion projecting from the vacuum seal member 48 when the vacuum seal member 48 is compressed in the vertical direction can enter the retreat spaces 48d, 48e, 48h, 48i, and thereby the vacuum seal member 48. Can be easily compressed and deformed. Therefore, it is possible to prevent the vacuum seal member 48 from being crushed, and thus further excellent durability can be ensured.

  In the sealing component 55 described above, the corrosive gas seal member 56 is made of austenitic stainless steel. However, the corrosive gas seal member 56 may be made of a material having resistance to corrosive gas, for example, stainless steel other than austenitic, nickel, etc. And aluminum. Since these materials can be obtained easily and inexpensively, the sealing component 55 can be made cheaper.

  The case where the seal component 55 is accommodated in the space defined by the seal groove 49 and the container lid 31 has been described above, but the place where the seal component 55 is applied is not limited to this, and the vacuum is sealed from the atmosphere. It can be applied where needed. For example, it goes without saying that the present invention can also be applied to the KF flange joint structure 50 described above.

  In each of the above-described embodiments, the substrate to be processed is a semiconductor wafer. However, the substrate to be processed is not limited to this, and for example, a glass substrate such as an LCD (Liquid Crystal Display) or an FPD (Flat Panel Display). May be.

It is sectional drawing which shows schematic structure of the plasma processing apparatus as a substrate processing apparatus which concerns on the 1st Embodiment of this invention. FIG. 2 is an enlarged cross-sectional view of an O-ring seal component in FIG. 1. It is sectional drawing which shows the specific shape of the sealing component in FIG. It is a figure which shows the attachment state of the seal components in FIG. It is a figure which shows the attachment state of the modification of the seal components in FIG. FIG. 6 is a view showing a modification of the seal component in FIG. 2, and FIGS. 6A to 6D are cross-sectional views showing an example of a modification of the seal component. It is sectional drawing which shows the case where the seal components in FIG. 2 are applied to a KF flange joint structure. It is an expanded sectional view of the sealing component which concerns on the 2nd Embodiment of this invention.

Explanation of symbols

W Wafer 10 Plasma processing apparatus 11 Vacuum vessel 31 Container lid 46, 55 Seal component 47 Radical seal members 47a, 47b Radical seal narrow portion 48 Vacuum seal member 48a Vacuum side lump portion 48b Atmosphere side lump portion 48c Vacuum seal narrow portion 48d, 48e , 48f, 48g, 48h, 48i Retreat space 49 Seal groove 49a Vacuum side surface 49b Bottom surface 49c Atmosphere side surface 50 KF flange joint structure 51 Pipe 51a, 52a Hole 51b Circular flange portion 51c, 52b Insertion hole 52 Receiving portion 53 Centering pipe 53a Projection 54 Fastening member 54a Inner flange 56 Corrosion gas seal member

Claims (15)

A sealing component that includes a decompression vessel in which an erosion substance that erodes a highly elastic polymer substance is present, and seals the inside of the decompression vessel from the outside in a substrate processing apparatus that performs a predetermined process on a substrate accommodated in the decompression vessel. And
A first member disposed on the inner side of the vacuum vessel and having resistance to the erodible material;
A second member made of the highly elastic polymer material disposed on the outside of the decompression vessel;
A predetermined space formed by separating at least a part of the first member and at least a part of the second member;
The seal member, wherein the first member and the second member are fitted to each other.   2. The first member according to claim 1, wherein the first member has a U-shaped cross section that opens to the outside, and at least a part of the second member enters an opening of the U-shaped cross section. Seal parts.   The seal part according to claim 2, wherein the U-shaped cross section of the first member has at least one bent portion.   The seal part according to claim 3, wherein the bent portion is a narrow portion.   The seal part according to any one of claims 1 to 4, wherein the erosion substance is an active species generated from a reactive active gas, and the first member is made of a fluororesin.   The fluororesin includes polytetrafluoroethylene, tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene / hexafluoropropylene copolymer, tetrafluoroethylene / ethylene copolymer, polyvinylidene fluoride, and polychloro 6. The sealing part according to claim 5, wherein the sealing part is one selected from the group consisting of trifluoroethylene.   The seal part according to claim 5 or 6, wherein the high-elasticity polymer material is one selected from the group consisting of vinylidene fluoride rubber and tetrafluoroethylene-propylene rubber.   The sealing part according to claim 1 or 2, wherein the erodible substance is a corrosive gas, and the first member is made of a corrosion-resistant metal.   The seal component according to claim 8, wherein the corrosion-resistant metal is one selected from the group consisting of stainless steel, nickel, and aluminum.   The seal part according to claim 8 or 9, wherein the highly elastic polymer substance is one selected from the group consisting of vinylidene fluoride rubber and tetrafluoroethylene-propylene rubber.   The sealing part according to claim 1, wherein the second member has a constricted portion. In a substrate processing apparatus comprising a decompression vessel in which an erosion substance that erodes a highly elastic polymer material is present, and performing a predetermined treatment on a substrate accommodated in the decompression vessel,
A sealing part for sealing the inside of the vacuum container from the outside,
The seal part is disposed on the inner side of the decompression container and has a first member having resistance to the eroding substance, and the second member is disposed on the outer side of the decompression container and made of the highly elastic polymer substance. And a predetermined space formed by separating at least a part of the first member and at least a part of the second member, and the first member and the second member are mutually A substrate processing apparatus which is fitted.   The said 1st member has a U-shaped cross section which the said external side opens, At least one part of the said 2nd member penetrates into the opening part of the said U-shaped cross section. Substrate processing equipment.   14. The substrate processing apparatus according to claim 12, wherein the erodible substance is an active species generated from a reactive active gas, and the first member is made of a fluororesin.   14. The substrate processing apparatus according to claim 12, wherein the erodible substance is a corrosive gas, and the first member is made of a corrosion-resistant metal.

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