KR101120606B1 - Sealing unit and apparatus for processing a substrate having the sealing unit - Google Patents

Abstract

The sealing unit of the substrate processing apparatus includes a sealing member and a pressure regulating portion. The sealing member is disposed around the contact surface of the upper and lower containers and has a hollow inner space. The pressure regulator is connected to the inner space of the sealing member, and regulates the pressure of the sealing member by supplying fluid to or discharging fluid from the inner space.

Description

Sealing unit and apparatus for processing a substrate having the sealing unit

The present invention relates to a sealing unit and a substrate processing apparatus having the same, and more particularly, to a sealing unit and a substrate processing apparatus having the same for preventing leakage of the pressure vessel.

Generally, a substrate is dried by providing a mixed gas of isopropyl alcohol (IPA) and nitrogen (N 2) to a substrate treated with a chemical solution such as an etching solution or a cleaning solution. However, as the pattern formed on the substrate becomes finer, it is difficult to dry the chemical liquid between the patterns when the substrate is dried. Therefore, a drying technique using a supercritical fluid for effectively drying the chemical liquid between the patterns is proposed. In the drying technique using the supercritical fluid, a chemically treated substrate is introduced into a pressure vessel, liquid carbon dioxide is introduced into the device to replace the chemical liquid on the surface of the substrate, and the pressure is increased to make the carbon dioxide in a supercritical state, thereby supercritical drying treatment. After proceeding to reduce the pressure.

The pressure vessel consists of a lower vessel and an upper vessel, and is provided with a sealing member for preventing leakage of pressure between the upper and lower vessels. Since the pressure inside the pressure vessel is a high pressure, the sealing member is deformed in the outward direction of the pressure vessel by the pressure. When the sealing member is deformed, leakage of the pressure may occur in the pressure vessel. In addition, when the sealing member is replaced to prevent the pressure leakage, the drying process using the pressure vessel is stopped, so that the productivity of the drying process may be reduced.

The present invention provides a sealing unit that can prevent deformation of the sealing member.

The present invention provides a substrate processing apparatus including the sealing unit.

The sealing unit according to the present invention is disposed along the circumference of the contact surface of the upper and lower containers, is connected to the sealing member having a hollow inner space and the inner space of the sealing member, to supply fluid to the inner space or to the inner space It may include a pressure control unit for controlling the pressure of the sealing member by discharging the fluid from the.

According to one embodiment of the present invention, the sealing member may include a resin part including a resin material and a metal part for maintaining the rigidity of the resin part with respect to the pressure of the fluid.

A substrate processing apparatus according to the present invention includes a lower container for supporting a substrate, an upper container disposed to move up and down on the lower container, and combined with the lower container to form an inner space for drying the substrate; A sealing member connected to the container and having a supercritical fluid portion for supplying and discharging a supercritical fluid for drying the substrate to the inner space and a contact surface of the upper and lower containers and having a hollow inner space; It may be connected to the inner space of the sealing member, it may be made of a pressure regulator for adjusting the pressure of the sealing member by supplying a fluid to the inner space or discharge the fluid from the inner space.

According to one embodiment of the present invention, the sealing member may include a resin part including a resin material and a metal part for maintaining the rigidity of the resin part with respect to the pressure of the fluid.

According to one embodiment of the present invention, the substrate processing apparatus is disposed to be horizontally movable on the lower container in a state where the upper and lower containers are spaced apart, and provides a chemical liquid for treating the substrate with the substrate. The chemical liquid supply unit may further include.

According to one embodiment of the present invention, the substrate processing apparatus may further include a rotation driving unit connected to the lower container and rotating the lower container supporting the substrate so that the chemical liquid is uniformly provided to the substrate. .

The sealing unit according to the invention supplies the fluid to the interior space of the sealing member. The shape of the sealing member may be kept constant by using the pressure of the fluid, and when the shape of the sealing member is deformed, the shape of the sealing member may be restored to its original state. Thus, the sealing unit can effectively prevent leakage of the pressure vessel.

Hereinafter, a sealing unit and a substrate processing apparatus having the same according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. Like reference numerals are used for like elements in describing each drawing. In the accompanying drawings, the dimensions of the structures are shown in an enlarged scale than actual for clarity of the invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.

The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprises", "having", and the like are used to specify that a feature, a number, a step, an operation, an element, a part or a combination thereof is described in the specification, But do not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

1 is a cross-sectional view illustrating a sealing unit according to an exemplary embodiment of the present invention, and FIG. 2 is a cross-sectional view illustrating a state in which the sealing member illustrated in FIG. 1 is deformed.

1 and 2, the sealing unit 100 is disposed between the lower vessel 12 and the upper vessel 14 of the pressure vessel 10 to prevent pressure leakage of the pressure vessel 10. It includes a sealing member 110 and the pressure adjusting unit 120.

The sealing member 110 is disposed in the groove 12a formed along the upper circumference of the lower container 12. Thus, the sealing member 110 has a ring shape. One sealing member 110 may be disposed, or a plurality may be disposed.

The sealing member 110 has a hollow inner space, the fluid can be supplied to the inner space. The fluid includes air, inert gas, water and the like. Since the fluid is supplied to the inner space of the sealing member 110, the sealing member 110 may maintain a constant shape. Therefore, the pressure leakage prevention effect of the sealing member 110 can be improved.

The sealing member 110 is made of a composite material and includes a resin part 112 and a metal part 114.

The resin part 112 is made of a resin-based material, and has a ring shape having the inner space. The resin part 112 has elasticity. The resin-based material includes a synthetic resin, and examples of the synthetic resin include Teflon resin, epoxy resin, urethane resin, and the like. Therefore, the resin part 112 may be in close contact with the pressure vessel 10.

The metal part 114 is made of a metal material and has a ring shape having an internal space. Examples of the metal material include iron, iron alloys, and the like. The metal part 114 is inserted into the resin part 112. For example, as shown in FIG. 1, the resin part 112 may be disposed to surround the inner and outer surfaces of the metal part 114. As another example, the resin part 112 may be disposed to surround the outer surface of the metal part 114.

The metal part 114 reinforces the rigidity of the resin part 112. Accordingly, the metal part 114 reduces the degree of deformation of the resin part 112.

Meanwhile, the metal part 114 may be disposed to surround the outer surface of the resin part 112.

Although the sealing member 110 has been described as being made of a composite material, the sealing member 110 may be made of a single material. In this case, examples of the single material may include a resin-based material having elasticity. The resin-based material includes a synthetic resin, and examples of the synthetic resin include Teflon resin, epoxy resin, urethane resin, and the like.

The pressure adjusting unit 120 is for adjusting the pressure of the sealing member 110, and includes a fluid tank 122, a pipe 124, and a pump 126.

The fluid tank 122 stores the fluid to be supplied to the sealing member 110. The pipe 124 connects the fluid tank 122 and the inner space of the sealing member 110. The pump 126 is disposed on the pipe 124 and supplies the fluid of the fluid tank 122 to the interior space of the sealing member 110 or the fluid from the interior space of the sealing member 110. To the fluid tank 122.

When the lower container 12 and the upper container 14 are coupled or after the lower container 12 and the upper container 14 are coupled, the pressure regulating unit 120 seals the fluid with the sealing member. It may be supplied to the internal space of 110. In addition, when the lower container 12 and the upper container 14 are separated or after the lower container 12 and the upper container 14 are separated, the pressure adjusting unit 120 is configured to discharge the fluid. It can discharge from the inner space of the sealing member 110.

The sealing unit 100 supplies the fluid to the inner space of the sealing member 110. The shape of the sealing member 110 may be kept constant by using the pressure of the fluid, and when the shape of the sealing member 110 is deformed, the shape of the sealing member 110 may be restored to its original state. Therefore, the sealing unit 100 can effectively prevent the leakage of the pressure vessel 10.

3 is a cross-sectional view illustrating a substrate processing apparatus according to an embodiment of the present invention.

Referring to FIG. 3, the substrate processing apparatus 200 is for performing a chemical treatment process and a drying process for the substrate S, and includes a pressure vessel 210, a sealing unit 220, and a rotation driver 230. , A vertical driving part 240, a chemical liquid supply part 250, a critical fluid part 260, and a protection member 270. The substrate S may be a wafer for forming a semiconductor element or a glass substrate for forming a flat panel display element.

The pressure vessel 210 is to provide a space for drying the substrate S, and includes a lower vessel 212 and an upper vessel 214.

The lower container 212 supports the substrate (S). The upper surface of the lower container 212 may have a flat or concave shape, it is preferable to have a flat shape for the discharge of the chemical liquid to be described later.

The lower container 212 is fixed so that the substrate (S) supported on the upper surface does not move. For example, the lower container 212 may fix the substrate S by a mechanical force, an electrostatic force, or a vacuum force.

The lower container 212 has a first groove 212a. The first groove 212a is formed along an upper surface edge of the lower container 212. That is, the first groove 212a has a ring shape. The sealing member 221 described later is inserted into the first groove 212a.

On the other hand, a heater (not shown) may be provided inside the lower container 212. The heater may heat the substrate S supported by the lower container 212 to improve efficiency of the chemical treatment process and the drying process.

The upper container 214 is disposed on the lower container 212 and is provided to be movable up and down. The upper container 214 has a second groove 214a in the lower surface. The size of the second groove 214a is larger than the size of the substrate S. When the upper container 214 is coupled to the lower container 212, the second groove 214a forms an inner space for receiving the substrate S supported by the lower container 212.

The upper container 214 may be spaced apart from the lower container 212 so that the substrate S supported by the lower container 212 may be exposed to the outside. Therefore, the chemical liquid treatment process for the substrate S may be performed. In addition, the upper container 214 is combined with the lower container 212 to form an inner space for receiving the substrate (S). The drying process may be performed on the substrate S in the internal space.

The sealing unit 220 is disposed between the lower vessel 212 and the upper vessel 214 of the pressure vessel 210 to prevent pressure leakage of the pressure vessel 210, the sealing member 221 and And a pressure regulator 225.

The sealing member 221 is inserted into the first groove 212a. A detailed description of the pressure adjusting unit 225 including the sealing member 221 and the fluid tank 226, the pipe 227, and the pump 228 is provided with the sealing member 110 and the pressure referring to FIGS. 1 and 2. Since it is substantially similar to the description of the control unit 120 will be omitted.

Although the sealing member 221 has been described as being inserted into the first groove 212a, the sealing member 221 is formed in a groove (not shown) formed along the lower edge of the upper container 214. It may be inserted.

The sealing unit 220 supplies the fluid to the inner space of the sealing member 221. The shape of the sealing member 221 may be kept constant by using the pressure of the fluid, and when the shape of the sealing member 221 is deformed due to the pressure of the pressure vessel 210, the sealing member 110 You can restore the shape of. Therefore, the sealing unit 220 can effectively prevent the leakage of the pressure vessel 210.

The rotation driving unit 230 is connected to the lower surface of the lower container 212, and rotates the lower container 212. As the lower container 212 rotates, the substrate S also rotates.

The vertical driving unit 240 is connected to the upper surface of the upper container 214, and moves the upper container 210 up and down. When the vertical driver 240 raises the upper container 214, the upper container 214 and the lower container 212 are spaced apart from each other. Therefore, the chemical liquid treatment process for the substrate S may be performed. When the vertical drive unit 240 lowers the upper container 214, the upper container 214 and the lower container 212 are coupled to each other. Therefore, the drying process for the substrate S may be performed.

The chemical liquid supply unit 250 is disposed to be horizontally movable on the lower container 212 in a state where the upper container 214 and the lower container 212 are spaced apart from each other, and the substrate S is the substrate S. Provide a chemical solution for treatment. The chemical liquid supply unit 250 includes a nozzle 252, a horizontal drive unit 254, and a bowl 256.

The nozzle 252 is disposed above the lower container 212. The nozzle 252 sprays the chemical liquid onto the substrate S supported on the lower container 212. Examples of the chemical liquid include an etching liquid for etching the substrate S, a cleaning liquid for cleaning the substrate S, and the like. The nozzle 252 may spray the etching liquid or the cleaning liquid onto the substrate S. In addition, the nozzle 252 may sequentially spray the etching liquid and the cleaning liquid. In this case, the nozzle 252 may include an etching liquid spray nozzle for spraying the etching liquid and a cleaning liquid spray nozzle for spraying the cleaning liquid.

On the other hand, when the substrate S is rotated according to the driving of the rotation driver 230, the chemical liquid injected from the nozzle 252 may be uniformly provided to the substrate (S). Therefore, the substrate S may be uniformly etched or cleaned.

The horizontal driver 254 may be connected to the nozzle 252 and may horizontally move the nozzle 252 in a direction parallel to the upper surface of the lower container 212. For example, the horizontal driver 254 may move horizontally by linearly reciprocating the nozzle 252. For example, the horizontal driver 254 may move horizontally by rotating the nozzle 252.

In the chemical liquid treatment process, the nozzle 252 is positioned above the substrate S supported by the lower container 212, and in other cases, the nozzle 252 is positioned above one side of the lower container 212. Can be. Therefore, the horizontal driver 254 can easily change the position of the nozzle 252.

The bowl 256 is disposed along a side circumference of the lower container 212 and has a container shape open upward. The bowl 256 blocks the chemical liquid scattered from the substrate S as the substrate S rotates. Thus, it is possible to prevent other devices from being contaminated by the chemical liquid.

Meanwhile, in order to load the substrate S into the lower container 212 or to unload the lower container 212, the bowl 256 may be moved up and down by a separate vertical driving unit.

The supercritical fluid part 260 is connected to the upper container 214, and supplies and discharges a supercritical fluid for drying the substrate S to the internal space.

The supercritical fluid has a non-condensing characteristic that does not liquefy even when a pressure above the critical pressure is applied because the distinction between the gas and the liquid is ambiguous as a fluid in a region above the critical temperature Tc and the critical pressure Pc. That is, the physical properties of the supercritical fluid have both liquid and gaseous properties, and thus have the same diffusivity and viscosity as gas and dissolution ability as liquid. Examples of the supercritical fluid include supercritical carbon dioxide, supercritical oxygen, supercritical argon, supercritical krypton, supercritical xenon, supercritical ammonia, and the like.

For reference, the supercritical carbon dioxide has a critical temperature of 31 ° C., a critical pressure of 72.8 atm, and a viscosity of 0.03 cP and a surface tension of 0 dyne (S) / cm in the critical region (35 ° C., 75 atm). Density has physical properties of 300 kg / m 3.

The supercritical fluid portion 260 includes a supply pipe 262, a discharge pipe 264, a first valve 266, and a second valve 268.

The supply pipe 262 and the discharge pipe 264 respectively communicate with the second groove 214a through the upper container 214. For example, the supply pipe 262 is disposed on one side of the upper container 214, the discharge pipe 264 is disposed on the other side of the upper container 214 opposite to the one side.

The supply pipe 262 supplies the supercritical fluid to the internal space. The supercritical fluid supplied to the internal space replaces the chemical liquid on the surface of the substrate S to dry the substrate S. The discharge pipe 262 discharges the supercritical fluid from the internal space.

The first valve 266 is disposed on the supply pipe 262 to control the supply of the supercritical fluid by opening and closing the supply pipe 262. The second valve 268 is disposed on the discharge pipe 264 to control the discharge of the supercritical fluid by opening and closing the discharge pipe 262. For example, the first valve 266 and the second valve 268 may be opened and closed at the same time. As another example, the first valve 266 and the second valve 268 may be opened and closed sequentially. In detail, the second valve 268 may be opened after the first valve 266 is opened, and the second valve 268 may be blocked after the first valve 266 is blocked. .

The protection member 270 is provided on surfaces of the lower container 212 and the upper container 214. For example, the protection member 270 may be provided on an upper surface of the lower container 212 and a lower surface of the upper container 214, respectively.

For example, the protection member 270 may be a jacket detachable to the upper and lower containers 210 and 120. Since the jacket is detachable, periodic replacement of the jacket is easy.

As another example, the protection member 270 may be a coating film formed on the upper and lower containers 210 and 120. The coating film can be used semi-permanently without periodic replacement.

The protection member 270 may be made of a material having chemical resistance to the chemical liquid. Examples of the chemically resistant material include teflon.

Accordingly, the protection member 270 prevents the upper and lower containers 210 and 120 from being damaged by the chemical liquid.

The substrate processing apparatus 200 opens the lower container 212 to perform a chemical liquid treatment process on the substrate S, and combines the lower container 212 with the upper container 214 to form the substrate ( The drying process for S) can be carried out. The chemical liquid treatment process and the drying process may be continuously performed in the substrate processing apparatus 200 without moving the substrate S. FIG. Therefore, the substrate processing process time using the substrate processing apparatus 200 can be shortened, and the productivity of the substrate processing process can be improved.

In addition, the substrate processing apparatus 200 may prevent the pressure leakage of the pressure vessel 210 using the sealing unit 220. In addition, since the shape of the deformed sealing member may be restored, it is not necessary to stop the substrate processing apparatus 200 to replace the sealing member 221. Therefore, productivity of the substrate processing apparatus 200 may be prevented by preventing interruption.

Hereinafter, cross-sectional views for describing a substrate processing method using the substrate processing apparatus 200 will be described.

First, the upper container 214 moves upward according to the driving of the vertical driver 240, so that the upper container 214 and the lower container 212 are spaced apart from each other. At this time, the bowl 256 is located lower than the upper surface of the lower container (212). A transfer arm (not shown) loads the substrate S onto the upper surface of the lower container 212. The substrate S is fixed while being supported by the lower container 212.

The nozzle 252 moves above the substrate S supported by the lower container 212 according to the driving of the horizontal driver 254. The bowl 256 moves upwards so as to be higher than the upper surface of the lower container 212.

The lower container 212 and the substrate S are rotated according to the driving of the rotation driver 230, and the nozzle 252 sprays the chemical liquid onto the rotating substrate S to the substrate S. Perform chemical liquid treatment process. The nozzle 252 may spray an etching solution for etching the substrate S or a cleaning solution for cleaning the substrate S to the substrate S. In addition, the nozzle 252 may sequentially spray the etching liquid and the cleaning liquid. Since the substrate S rotates, the chemical liquid injected from the nozzle 252 may be uniformly provided to the substrate S. Therefore, the substrate S may be uniformly etched or cleaned.

When the chemical liquid treatment process for the substrate S is completed, the rotation of the lower container 212 and the injection of the nozzle 252 are stopped.

A substrate in which the nozzle 252 is supported by the lower container 212 according to the driving of the horizontal driver 254 while the bowl 256 is again moved downward to be lower than the upper surface of the lower container 212. Move above one side of the lower container 212 above (S).

Next, the upper container 214 is moved downward in accordance with the driving of the vertical drive unit 240 is coupled to the upper container 214 and the lower container 212. The inner space for accommodating the substrate S is formed between the upper and lower containers 210 and 120 according to the combination of the upper and lower containers 210 and 120.

When the lower container 212 and the upper container 214 are coupled or after the lower container 212 and the upper container 214 are coupled, the pressure regulator 225 causes the fluid to seal the fluid. Supply to the internal space of 221. Due to the pressure of the fluid, the shape of the sealing member 221 in which the sealing member 221 is maintained or deformed is restored. Thus, leakage of pressure between the lower container 212 and the upper container 214 can be prevented.

Next, the first valve 266 and the second valve 268 are opened to supply the supercritical fluid to the internal space through the supply pipe 262 and to discharge the supercritical fluid through the discharge pipe 264. The supercritical fluid supplied to the internal space replaces the chemical liquid on the surface of the substrate S to dry the substrate S.

When the drying process for the substrate S is completed, the first valve 266 and the second valve 268 are blocked to supply the supercritical fluid through the supply pipe 262 and through the discharge pipe 264. Stop discharging the supercritical fluid.

The first valve 266 and the second valve 268 may be opened and closed at the same time. As another example, the first valve 266 and the second valve 268 may be opened and closed sequentially.

The upper container 214 moves upward according to the driving of the vertical driver 240, so that the upper container 214 and the lower container 212 are spaced apart from each other.

When the lower container 212 and the upper container 214 are separated, or after the lower container 212 and the upper container 214 are separated, the pressure adjusting unit 225 is configured to seal the fluid to the sealing member. It discharges from the internal space of 221.

Next, the lower container 212 releases the fixing of the substrate S, and the transfer arm unloads the substrate S on which the drying process is completed from the upper surface of the lower container 212.

Thereafter, the processes are repeated for the new substrate S.

The substrate treating method as described above may continuously perform the chemical liquid treatment process and the drying process on the substrate S without the transfer process of the substrate S. Therefore, it is possible to shorten the time required for the substrate processing process to improve the productivity of the substrate processing process.

As described above, the sealing unit according to the present invention can maintain a constant shape of the sealing member or restore the shape of the deformed sealing member by using a fluid supplied to the inner space of the sealing member. Thus, the sealing unit can effectively prevent leakage of the pressure vessel.

In addition, since the shape of the deformed sealing member can be restored, interruption of the drying process using the pressure vessel for replacing the sealing member can be prevented. Therefore, productivity of the said drying process can be improved.

And the reliability of the substrate processing apparatus containing the said sealing unit can be improved.

While the foregoing has been described with reference to preferred embodiments of the present invention, those skilled in the art will be able to variously modify and change the present invention without departing from the spirit and scope of the invention as set forth in the claims below. It will be appreciated.

1 is a cross-sectional view illustrating a sealing unit according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view for describing a state in which the sealing member illustrated in FIG. 1 is deformed.

3 is a cross-sectional view for explaining a substrate processing apparatus having the sealing unit shown in FIG. 1.

Explanation of symbols on the main parts of the drawings

10: lower container 12: groove

20: upper container 100: sealing unit

110: sealing member 112: resin member

114: metal member 120: pressure regulator

122: fluid tank 124: supply line

200: substrate processing apparatus 210: pressure vessel

220: sealing unit 230: rotary drive unit

240: vertical drive portion 250: critical fluid portion

260: chemical supply portion 270: protective member

S: Substrate

Claims (6)

An annular first sealing member disposed around the contact surface of the upper and lower containers and having a hollow inner space; An annular second sealing member disposed inside the first sealing member with respect to the center of the upper and lower containers, disposed along a circumferential surface of the upper and lower containers, and having a hollow inner space; And A pressure regulator connected to the inner spaces of the first and second sealing members, the pressure adjusting part supplying fluid to the inner spaces or discharging fluid from the inner spaces to adjust the pressure of the sealing members; The sealing members may include a ring-shaped resin part including a resin material and sealing the material contained in the upper and lower containers so as not to flow out, and having a hollow inner space; And Sealing unit, characterized in that it comprises an annular metal portion formed on the inner surface side of the resin portion having a hollow inner space to maintain the rigidity of the resin portion against the pressure of the fluid. delete A lower container for supporting the substrate; An upper container disposed to move up and down on the lower container, the upper container forming an inner space for drying the substrate in combination with the lower container; A supercritical fluid portion connected to the upper container and supplying and discharging a supercritical fluid for drying the substrate into the inner space; And An annular first sealing member disposed in a groove formed around a contact surface of the lower container and having a hollow inner space, disposed inside the first sealing member with respect to the center of the upper and lower containers, Disposed along the contact surface of the upper and lower containers, and connected to the annular second sealing member having a hollow inner space and the inner spaces of the first and second sealing members, and drawing fluid into the inner spaces. A sealing unit comprising a pressure adjusting part for supplying or discharging fluid from the inner spaces to adjust the pressure of the sealing member, The sealing members may include a ring-shaped resin part including a resin material and sealing the material contained in the upper and lower containers so as not to flow out, and having a hollow inner space; And And a ring-shaped metal portion formed on the inner surface side of the resin portion and having a hollow inner space to maintain the rigidity of the resin portion with respect to the pressure of the fluid. The method of claim 3, wherein the sealing member comprises a resin portion comprising a resin material; And And a metal portion for maintaining the rigidity of the resin portion with respect to the pressure of the fluid. According to claim 3, wherein the upper and lower containers are disposed so as to be horizontally movable on the lower container, characterized in that it further comprises a chemical liquid supply unit for providing a chemical liquid for processing the substrate to the substrate Substrate processing apparatus. The substrate processing apparatus of claim 5, further comprising a rotation driving unit connected to the lower container and rotating the lower container supporting the substrate so that the chemical liquid is uniformly provided to the substrate.

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