KR100883368B1 - Exhaust unit and method for controlling displacement volume of the exhaust unit, and apparatus for treating substrate with the exhaust unit - Google Patents

Abstract

The present invention relates to an exhaust unit, a method of adjusting an exhaust amount of the exhaust unit, and a substrate processing apparatus including the exhaust unit. According to the present invention, the exhaust unit has an actuator for installing a tube inside the housing installed on the exhaust line and for injecting and discharging fluid into / from the tube. The actuator injects and discharges fluid into and out of the tube to expand and contract the tube within the housing to adjust the opening ratio of the passages in the housing.

Substrate, exhaust, tube, expansion, shrinkage, actuator, aperture ratio,

Description

An exhaust unit, a method of adjusting an exhaust amount of the exhaust unit, and a substrate processing apparatus having the exhaust unit.

1 is a view showing the displacement control member according to the prior art.

2 is a view showing a substrate processing apparatus according to the present invention.

3 is a view showing the configuration of the exhaust member shown in FIG.

4 is a cross-sectional view taken along the line AA ′ of FIG. 3.

5a and 5b are views for explaining the operation of the displacement control member according to the present invention.

* Description of symbols on the main parts of the drawings *

10: substrate processing apparatus 200: exhaust unit

100: process unit 210: exhaust line

110: vessel 220: displacement control member

120: chuck 222: housing

130: drive unit 224: tube

140: injection nozzle 225: actuator

The present invention relates to an exhaust unit, a method of adjusting an exhaust amount of the exhaust unit, and a substrate processing apparatus, and more particularly, an exhaust unit for exhausting an apparatus in which a process is performed, and a method of adjusting an exhaust amount of the exhaust unit, and An apparatus for treating a substrate having the exhaust unit is provided.

The substrate processing apparatus is an apparatus for processing a substrate such as a wafer for manufacturing a semiconductor integrated circuit chip and a glass for manufacturing a flat panel display. A general substrate processing apparatus is provided with an exhaust unit for exhausting a space where a process is performed. The exhaust unit has an exhaust line and an exhaust amount adjusting member for adjusting the exhaust amount of the exhaust line.

1 is a view showing a typical displacement control members. As shown in FIG. 1, general displacement adjusting members 10a and 10b are provided inside the exhaust line 1. The displacement adjusting member 10a according to the exemplary embodiment installs a circular rotating plate 10a 'in the exhaust line 1 and adjusts the displacement of the exhaust line 1 by rotating the rotating plate 10a'. Alternatively, the displacement adjusting member 10b according to another example is disposed so as to face the two rotating plates 10b 'and 10b ″ in the exhaust line 1. Each of the rotating plates 10b 'and 10' 'is provided with a hole h provided to allow gas to be exhausted to pass therethrough. Therefore, the displacement adjusting member 10b adjusts the displacement of the exhaust line 1 by rotating at least one of the rotating plates 10b 'and 10b' 'to adjust the opening ratio of the hole h.

However, in the exhaust unit of the above-described structure, malfunction of the displacement adjusting member is caused by the fluid to be exhausted. For example, when the exhaust line 1 is a line for exhausting a fume from an apparatus for treating a substrate using acidic and alkaline chemicals, the exhaust amount adjusting members 10a and 10b are formed by the exhausted fume. Is contaminated. In particular, the exhausted fumes are adsorbed on the surfaces of the rotating plates 10a ', 10b', 10b '' of the displacement adjusting members 10a, 10b, thereby preventing mechanical operation of the rotating plates 10a ', 10b' 10b ''. In addition, malfunction of the displacement adjusting member is caused to reduce the exhaust efficiency.

An object of the present invention is to provide an exhaust unit for improving the exhaust efficiency, a method of adjusting the exhaust amount of the exhaust unit, and a substrate processing apparatus including the exhaust unit.

In addition, an object of the present invention is to provide an exhaust unit for preventing a malfunction due to the fluid to be exhausted, a method of adjusting the exhaust amount of the exhaust unit, and a substrate processing apparatus including the exhaust unit.

Exhaust unit according to the present invention for achieving the above object is to adjust the opening ratio of the exhaust line for exhausting the gas, the housing is installed on the exhaust line, the inside of the housing, and the passage in the housing An inflatable elastic tube and an actuator for supplying fluid to the tube.

According to an embodiment of the invention, the tube is provided annularly along the inner wall of the housing, and the actuator includes a body connected with the tube for supplying the fluid to the tube.

According to an embodiment of the present invention, the actuator further includes a piston installed inside the body, and a driver for moving the piston inside the body.

According to an embodiment of the invention, the diameter of the housing is larger than the diameter of the exhaust line.

A substrate processing apparatus according to the present invention for achieving the above object is a container for providing a space for performing a process for processing a substrate, a chuck for supporting the substrate inside the container during the process, and supported by the chuck during the process A jet nozzle for injecting a processing fluid to a substrate, and an exhaust unit for exhausting the gas in the container, wherein the exhaust unit includes an exhaust line for exhausting the gas, a housing provided on the exhaust line, and a housing of the housing. And a tubular tube of elastic material installed therein and expandable to adjust the opening ratio of the passage in the housing, and an actuator for supplying fluid to the tube.

According to an embodiment of the invention, the tube is provided annularly along the inner wall of the housing, and the actuator includes a body connected with the tube for supplying the fluid to the tube.

According to an embodiment of the present invention, the actuator further includes a piston installed inside the body, and a driver for moving the piston inside the body.

According to an embodiment of the invention, the diameter of the housing is larger than the diameter of the exhaust line.

The exhaust gas adjusting method according to the present invention for achieving the above object is connected to a device for performing a process for processing a substrate to adjust the exhaust amount of the exhaust line for exhausting the air in the device, the adjustment of the exhaust amount, the exhaust By expansion and contraction of the tube provided annularly along the inner wall of the line.

According to an embodiment of the invention, expansion and contraction of the tube is achieved by supplying and discharging fluid to / from the tube.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, one embodiment introduced herein is provided so that the disclosure will be thorough and complete, and will fully convey the spirit of the invention to those skilled in the art. In addition, in the present embodiment, the apparatus for wet processing the semiconductor substrate has been described as an example, but the present invention can be applied to any substrate processing apparatus for treating the substrate using the processing liquid.

(Example)

2 is a view showing the configuration of the substrate processing apparatus according to the present invention, Figure 3 is a view showing the configuration of the exhaust member shown in FIG. 4 is a cross-sectional view taken along the line AA ′ of FIG. 3.

2 to 4, the substrate processing apparatus 10 according to the present invention includes a process unit 100 and an exhaust unit 200. The process unit 100 performs a process of wet treating the substrate W, and the exhaust unit 200 performs exhaust of the process unit 100.

The process unit 100 includes a vessel 110, a chuck 120, a driving member 130, and an injection nozzle 140.

The container 110 provides a space for performing a process of cleaning the substrate W therein. The container 110 has a generally cylindrical shape. The upper portion of the container 110 is opened, and the opened upper portion is used as a passage for moving the substrate W into the space during the process. The inner walls of the container 110 are provided with recovery containers 112, 114, and 116 stacked up and down. Each of the recovery containers 112, 114, and 116 recovers the processing liquid scattered from the substrate W during the process. Recovery containers 112, 114, and 116 are provided such that openings for introducing the processing liquid are stacked up and down.

The chuck 120 supports the substrate W inside the container 110 during the process. The chuck 120 is installed to be rotatable inside the container 110. The chuck 120 is provided with fixing means for fixing the substrate W. As the fixing means, chucking pins that chuck a portion of the substrate W may be used. In addition, the chuck 120 is installed to be able to lift up and down.

The driver 130 drives the chuck 120. That is, the driving unit 130 rotates the chuck 120 during the process to rotate the substrate W supported by the chuck 120 at a predetermined rotation speed. In addition, the driving unit 130 adjusts the height of the chuck 120 to be introduced into any one of the recovery bins 112, 114, and 116 to recover the processing liquid scattered from the rotated substrate W during the process.

The injection nozzle 140 injects the processing fluid to the processing surface of the substrate W supported by the chuck 120 during the process. At least one injection nozzle 140 is provided. When a plurality of injection nozzles 140 are provided, the respective injection nozzles inject different treatment fluids. Various kinds of chemicals, chemically deionized water (DIW), and dry gas may be used as the treatment fluid. The chemical liquid may include a photoresist, a cleaning liquid, and an etching liquid.

The exhaust unit 200 performs exhaust of the process unit 100. The exhaust unit 200 includes an exhaust line 210 and a displacement volume control member 220.

The exhaust line 210 is connected to the vessel 110. The exhaust line 210 discharges the gas in the container 110 to the outside. The gas includes a fume generated from a chemical liquid used in the process. That is, since chemicals used in the process unit 100 are acidic and alkaline chemicals, toxic fumes generated from these chemicals are exhausted through the exhaust line 210. The exhaust line 210 communicates with the spaces in the respective recovery bins 112, 114, and 116. Therefore, the exhaust line 210 exhausts the fumes generated from the treatment liquids recovered to the recovery vessels 112, 114, and 116 during the process. In order to improve the displacement of the exhaust line 210, a vacuum pump (not shown) may be installed in the exhaust line 210. The vacuum pump provides a flow pressure to the exhaust line 210, so that the exhaust line 210 forcibly sucks gas in the process unit 100 during the process.

The displacement adjusting member 220 controls the flow rate of the process unit 100 by adjusting the flow rate of the gas moving inside the exhaust line 210. The displacement adjusting member 220 includes a housing 222, a tube 224, and an actuator 225.

The housing 222 is provided on the exhaust line 210. The interior of the housing 222 is provided with a space for the tube 224 is installed. The housing 222 has a ring shape. In the center of the housing 222, a passage for moving the fluid is formed. At this time, the diameter of the housing 222 is larger than the diameter of the exhaust line (210). This allows the inner surface 224a of the tube 224 installed in the housing 222 to substantially coincide with the inner surface 212 of the exhaust line 210 upon contraction of the tube 224, thereby reducing the displacement of the exhaust line 210. To maximize.

The tube 224 is annularly installed along the inner wall of the housing 222. Tube 224 is made of an elastic material that can expand and contract. The expansion and contraction of the tube 224 adjusts the opening ratio of the passageway in the housing 222. That is, when the tube 224 is expanded, the opening ratio of the passage in the housing 222 is reduced, and when the tube 224 is contracted, the opening ratio of the passage in the housing 222 is increased. In the present exemplary embodiment, the discharge amount of the exhaust line 210 is adjusted using the ring-shaped tube 224 as an example, but the shape of the tube 224 may be variously changed and modified.

Actuator 225 injects and discharges fluid into tube 224. Various kinds of liquids may be used as the fluid. For example, oil is used as the fluid. Alternatively, gas may be used as the fluid. Actuator 225 includes a body 226, a piston 228, and a driving part 229.

The body 226 provides a space in which the fluid is stored. Body 226 has a generally cylindrical shape. One end of the body 226 is connected to communicate with the inside of the tube 224 installed in the housing 222.

The piston 228 is installed inside the body 226. The piston 228 is installed to enable a straight reciprocating movement along the longitudinal direction of the body 226. That is, the piston 228 is positioned between the position for expanding the tube 224 (hereinafter referred to as 'first position') and the position for contracting the tube 224 (hereinafter referred to as 'second position'). Is moved.

The driver 229 drives the piston 228. That is, the driver 229 moves the piston 228 between the first position a and the second position b.

Hereinafter, the process of the substrate processing apparatus 10 described above will be described in detail. Here, the same reference numerals for the same components as the above-described components are the same, and detailed description of the components is omitted.

When the substrate treating process is started, a substrate transfer device (not shown) such as a robot arm mounts the substrate W on the chuck 120 of the process unit 100. When the substrate W is seated on the chuck 120, the driving unit 130 rotates the chuck 120 after adjusting the height of the chuck 120. Due to the rotation of the chuck 120, the substrate W is rotated at a predetermined process speed, and the injection nozzle 140 sprays the chemical liquid toward the center of the processing surface of the substrate W to be rotated. The injected chemical liquid spreads from the center region of the substrate W to the edge region by the centrifugal force of the substrate W being rotated. In addition, the chemical liquid moved to the edge region is scattered from the substrate W by the centrifugal force of the substrate W, and is recovered to the recovery container to be recovered among the recovery containers 112, 114, and 116.

When the processing of the substrate W by the chemical liquid is completed, the injection nozzle 140 sprays ultrapure water to the processing surface of the substrate W to rinse the chemical liquid remaining on the surface of the substrate W, and then sprays dry gas to the substrate. (W) is dried. When the drying process is completed, the substrate transfer apparatus unloads the substrate W placed on the chuck 120, and then transfers the substrate W to a facility where a subsequent process is performed.

In the process of performing the above-described process, the exhaust unit 200 performs exhaust of the process unit 100. In particular, the fume generated from the chemical liquid used in the process unit 100 during the cleaning process is discharged through the exhaust line 210, at this time, the exhaust amount adjusting member 220 adjusts the exhaust amount of the exhaust line 210. The displacement adjustment process of the displacement adjustment member 220 is as follows.

When increasing the displacement of the exhaust line 210, as shown in Figure 5a, the driver 229 is the piston 228 to move the piston 228 from the second position (b) to the first position (a) To drive. When the piston 228 is moved to the first position (a), fluid in the tube 224 is discharged to the body 226 and the tube 224 gradually contracts. As the tube 224 contracts, the opening ratio of the passage in the housing 222 is increased to increase the displacement of the exhaust line 210.

In addition, when reducing the displacement of the exhaust line 210, as shown in Figure 5b, the driver 229 is a piston (2) to move the piston 228 from the first position (a) to the second position (b) 228). When the piston 228 is moved to the second position (b), fluid in the body 226 is injected into the tube 224 and the tube 224 gradually expands. When the tube 224 is inflated, the opening ratio of the passage in the housing 222 is reduced to reduce the displacement of the exhaust line 210.

The above-described displacement control member 220 according to the present invention provides a tube 224 that can be expanded and contracted on the exhaust line 210, and the displacement of the exhaust line 210 by expansion and contraction of the tube 224. Adjust Compared to a method of adjusting the displacement of the exhaust line 1 by rotating the rotary plates 10a ', 10b', 10b '' inside the conventional exhaust line 1, the exhaust amount adjusting member 220 having such a structure is exhausted. Since it does not directly adjust the flow rate of the gas to be exhausted by colliding directly with the direction of movement of the gas, it reduces contamination by the exhausted fluid (fume).

In addition, the displacement control member 220 according to the present invention does not cause a problem in the control of the displacement even if the tube 224 is contaminated by the fume exhausted. That is, the exhausted fume is attached only to the outer surface of the tube 224, and thus does not cause a problem in the expansion and contraction operation of the tube 224. Therefore, the present invention prevents the malfunction of the exhaust amount adjusting member 220 from occurring due to the exhausted fumes.

The foregoing detailed description illustrates the present invention. In addition, the foregoing description shows and describes preferred embodiments of the present invention, and the present invention can be used in various other combinations, modifications, and environments. That is, changes or modifications may be made within the scope of the concept of the invention disclosed in this specification, the scope equivalent to the disclosed contents, and / or the skill or knowledge in the art. The foregoing embodiments illustrate the best state for implementing the technical idea of the present invention, the use of other inventions, such as the present invention, the implementation in other states known in the art, and the specific fields of application and uses of the invention. Many changes are also possible. Accordingly, the detailed description of the invention is not intended to limit the invention to the disclosed embodiments. Also, the appended claims should be construed to include other embodiments.

As described above, the exhaust unit according to the present invention, the method of adjusting the exhaust amount of the exhaust unit, and the substrate processing apparatus including the exhaust unit, the exhaust fume is exhausted by adjusting the exhaust amount of the exhaust line by using the expansion and contraction of the tube It prevents the malfunction of the displacement adjusting member due to the contamination caused by the air pollution, thereby improving the exhaust efficiency.

Claims (10)

delete An exhaust line for exhausting gas, A housing installed on the exhaust line; An elastic tube provided annularly along the inner wall of the housing and installed inside the housing, the tube being expandable to adjust the opening ratio of the passage in the housing; And an actuator having a body connected with the tube for supplying fluid to the tube. The method of claim 2, The actuator is A piston installed inside the body, and And an actuator for moving the piston inside the body. The method of claim 3, wherein The diameter of the housing, An exhaust unit, characterized in that larger than the diameter of the exhaust line. In the apparatus for processing a substrate, A container providing a space for performing a process of processing the substrate; A chuck supporting the substrate inside the vessel during the process; An injection nozzle for injecting a processing fluid to a substrate supported by the chuck during the process; It includes an exhaust unit for exhausting the gas in the container, The exhaust unit, An exhaust line for exhausting gas, A housing installed on the exhaust line; A tube of elastic material installed inside the housing and expandable to adjust an opening ratio of a passage in the housing; And a actuator for supplying fluid to the tube. The method of claim 5, wherein The tube, Provided in an annular shape along an inner wall of the housing, The actuator is And a body connected to the tube for supplying the fluid to the tube. The method of claim 6, The actuator is A piston installed inside the body, and And a driver for moving the piston inside the body. The method of claim 7, wherein The diameter of the housing, Substrate processing apparatus, characterized in that larger than the diameter of the exhaust line. Is connected to a device for performing a process for processing a substrate to adjust the displacement of the exhaust line for exhausting the air in the device, The adjustment of the displacement, And an expansion and contraction of the tube provided annularly along the inner wall of the exhaust line. The method of claim 9, Expansion and contraction of the tube, Discharge amount adjusting method characterized in that the supply and discharge of fluid from the tube.

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