TWI319838B - Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties - Google Patents

Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties

Info

Publication number
TWI319838B
TWI319838B TW92127924A TW92127924A TWI319838B TW I319838 B TWI319838 B TW I319838B TW 92127924 A TW92127924 A TW 92127924A TW 92127924 A TW92127924 A TW 92127924A TW I319838 B TWI319838 B TW I319838B
Authority
TW
Taiwan
Prior art keywords
bottom anti
reflective coatings
small core
core molecules
epoxy moieties
Prior art date
Application number
TW92127924A
Other languages
English (en)
Other versions
TW200422768A (en
Inventor
Charles J Neef
Mandar Bhave
Michelle Fowler
Michelle Windsor
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW200422768A publication Critical patent/TW200422768A/zh
Application granted granted Critical
Publication of TWI319838B publication Critical patent/TWI319838B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y10T428/31515—As intermediate layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
TW92127924A 2002-10-08 2003-10-08 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties TWI319838B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US41721402P 2002-10-08 2002-10-08
US10/679,521 US7323289B2 (en) 2002-10-08 2003-10-06 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties

Publications (2)

Publication Number Publication Date
TW200422768A TW200422768A (en) 2004-11-01
TWI319838B true TWI319838B (en) 2010-01-21

Family

ID=32096187

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92127924A TWI319838B (en) 2002-10-08 2003-10-08 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties

Country Status (8)

Country Link
US (1) US7323289B2 (zh)
EP (1) EP1573785B1 (zh)
JP (1) JP4559228B2 (zh)
KR (1) KR101027606B1 (zh)
CN (1) CN1739063B (zh)
AU (1) AU2003282554A1 (zh)
TW (1) TWI319838B (zh)
WO (1) WO2004034435A2 (zh)

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US20050163714A1 (en) * 2003-10-02 2005-07-28 Sukhishvili Svetlana A. Capsules of multilayered neutral polymer films associated by hydrogen bonding
JP4697464B2 (ja) * 2004-10-12 2011-06-08 日産化学工業株式会社 含窒素芳香環構造を含むリソグラフィー用反射防止膜形成組成物
US20060147491A1 (en) * 2005-01-05 2006-07-06 Dewitt David M Biodegradable coating compositions including multiple layers
US20060198868A1 (en) * 2005-01-05 2006-09-07 Dewitt David M Biodegradable coating compositions comprising blends
WO2007036982A1 (ja) 2005-09-27 2007-04-05 Nissan Chemical Industries, Ltd. イソシアヌル酸化合物と安息香酸化合物との反応生成物を含む反射防止膜形成組成物
CN103838086B (zh) * 2005-09-27 2017-10-20 日产化学工业株式会社 含有异氰脲酸化合物与苯甲酸化合物的反应生成物的形成防反射膜的组合物
KR101423056B1 (ko) * 2006-06-19 2014-07-25 닛산 가가쿠 고교 가부시키 가이샤 수산기 함유 축합계 수지를 함유하는 레지스트 하층막 형성조성물
US8383320B2 (en) * 2007-10-31 2013-02-26 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and method of forming resist pattern using the same
US20090253080A1 (en) * 2008-04-02 2009-10-08 Dammel Ralph R Photoresist Image-Forming Process Using Double Patterning
US20090253081A1 (en) * 2008-04-02 2009-10-08 David Abdallah Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step
KR100894218B1 (ko) * 2008-04-11 2009-04-22 금호석유화학 주식회사 흡광제 및 이를 포함하는 유기 반사 방지막 조성물
US20100040838A1 (en) * 2008-08-15 2010-02-18 Abdallah David J Hardmask Process for Forming a Reverse Tone Image
JP5282917B2 (ja) * 2008-11-12 2013-09-04 日産化学工業株式会社 レジスト下層膜形成組成物及びそれを用いたパターニング方法
WO2010083350A1 (en) * 2009-01-16 2010-07-22 Fujifilm Electronic Materials U.S.A., Inc. Nonpolymeric binders for semiconductor substrate coatings
US8084186B2 (en) * 2009-02-10 2011-12-27 Az Electronic Materials Usa Corp. Hardmask process for forming a reverse tone image using polysilazane
JP5794228B2 (ja) * 2010-03-31 2015-10-14 Jsr株式会社 レジスト下層膜形成用組成物
WO2013109748A1 (en) * 2012-01-19 2013-07-25 Brewer Science Inc. Nonpolymeric antireflection compositions containing adamantyl groups
WO2013163100A1 (en) * 2012-04-23 2013-10-31 Brewer Science Inc. Photosensitive, developer-soluble bottom anti-reflective coating material
JP6196194B2 (ja) * 2014-08-19 2017-09-13 信越化学工業株式会社 紫外線吸収剤、レジスト下層膜形成用組成物、及びパターン形成方法
WO2016159358A1 (ja) * 2015-04-03 2016-10-06 日産化学工業株式会社 光架橋基を有する段差基板被覆組成物
KR20190028651A (ko) 2016-07-15 2019-03-19 닛산 가가쿠 가부시키가이샤 히단토인환을 갖는 화합물을 포함하는 레지스트 하층막형성 조성물
JP7348210B2 (ja) 2018-06-13 2023-09-20 ブルーワー サイエンス アイ エヌ シー． Ｅｕｖリソグラフィ用接着層
CN115698857A (zh) * 2020-06-12 2023-02-03 日产化学株式会社 包含二醇结构的抗蚀剂下层膜形成用组合物

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Also Published As

Publication number Publication date
KR101027606B1 (ko) 2011-04-06
KR20050062606A (ko) 2005-06-23
CN1739063A (zh) 2006-02-22
WO2004034435A2 (en) 2004-04-22
US7323289B2 (en) 2008-01-29
JP2006502448A (ja) 2006-01-19
CN1739063B (zh) 2011-12-07
EP1573785B1 (en) 2013-02-13
AU2003282554A8 (en) 2004-05-04
AU2003282554A1 (en) 2004-05-04
TW200422768A (en) 2004-11-01
WO2004034435A3 (en) 2005-07-28
US20040110089A1 (en) 2004-06-10
JP4559228B2 (ja) 2010-10-06
EP1573785A4 (en) 2010-11-10
EP1573785A2 (en) 2005-09-14

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