TWI315452B - - Google Patents

Info

Publication number
TWI315452B
TWI315452B TW094129942A TW94129942A TWI315452B TW I315452 B TWI315452 B TW I315452B TW 094129942 A TW094129942 A TW 094129942A TW 94129942 A TW94129942 A TW 94129942A TW I315452 B TWI315452 B TW I315452B
Authority
TW
Taiwan
Application number
TW094129942A
Other languages
Chinese (zh)
Other versions
TW200619865A (en
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200619865A publication Critical patent/TW200619865A/zh
Application granted granted Critical
Publication of TWI315452B publication Critical patent/TWI315452B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094129942A 2004-08-31 2005-08-31 Exposure apparatus and device manufacturing method TW200619865A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004251877 2004-08-31

Publications (2)

Publication Number Publication Date
TW200619865A TW200619865A (en) 2006-06-16
TWI315452B true TWI315452B (OSRAM) 2009-10-01

Family

ID=36000058

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094129942A TW200619865A (en) 2004-08-31 2005-08-31 Exposure apparatus and device manufacturing method

Country Status (3)

Country Link
JP (1) JP5266641B2 (OSRAM)
TW (1) TW200619865A (OSRAM)
WO (1) WO2006025408A1 (OSRAM)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
SG143178A1 (en) * 2006-11-27 2008-06-27 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and computer program product
US7903234B2 (en) 2006-11-27 2011-03-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
KR101492287B1 (ko) 2007-03-27 2015-02-11 칼 짜이스 에스엠테 게엠베하 편평하게 조사된 보정광을 이용한 광학 소자의 보정
US7692766B2 (en) * 2007-05-04 2010-04-06 Asml Holding Nv Lithographic apparatus
WO2009026970A1 (en) * 2007-08-24 2009-03-05 Carl Zeiss Smt Ag Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
WO2010098299A1 (ja) * 2009-02-24 2010-09-02 株式会社ニコン 光学素子の保持装置、光学系、及び露光装置
WO2013156041A1 (en) * 2012-04-18 2013-10-24 Carl Zeiss Smt Gmbh A microlithographic apparatus and a method of changing an optical wavefront in an objective of such an apparatus
CN112965341B (zh) 2015-11-20 2024-06-28 Asml荷兰有限公司 光刻设备和操作光刻设备的方法
US11474439B2 (en) 2019-06-25 2022-10-18 Canon Kabushiki Kaisha Exposure apparatus, exposure method, and method of manufacturing article
JP6951498B2 (ja) * 2019-06-25 2021-10-20 キヤノン株式会社 露光装置、露光方法および物品製造方法
JP6924235B2 (ja) 2019-09-19 2021-08-25 キヤノン株式会社 露光方法、露光装置、物品製造方法、および半導体デバイスの製造方法
JP2023157300A (ja) 2022-04-14 2023-10-26 キヤノン株式会社 露光装置、露光方法、および物品製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3368091B2 (ja) * 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JPH09232213A (ja) * 1996-02-26 1997-09-05 Nikon Corp 投影露光装置
JPH11305419A (ja) * 1998-02-18 1999-11-05 Nikon Corp フォトマスク、収差補正板、及び露光装置
JPH11258498A (ja) * 1998-03-13 1999-09-24 Nikon Corp 投影レンズ及び走査型露光装置
JP3548464B2 (ja) * 1999-09-01 2004-07-28 キヤノン株式会社 露光方法及び走査型露光装置
DE19963587B4 (de) * 1999-12-29 2007-10-04 Carl Zeiss Smt Ag Projektions-Belichtungsanlage
DE10000193B4 (de) * 2000-01-05 2007-05-03 Carl Zeiss Smt Ag Optisches System
JP2003234276A (ja) * 2002-02-07 2003-08-22 Nikon Corp 露光装置及び光学装置、デバイス製造方法

Also Published As

Publication number Publication date
TW200619865A (en) 2006-06-16
JPWO2006025408A1 (ja) 2008-05-08
WO2006025408A1 (ja) 2006-03-09
JP5266641B2 (ja) 2013-08-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees