TWI312812B - - Google Patents
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- Publication number
- TWI312812B TWI312812B TW95107803A TW95107803A TWI312812B TW I312812 B TWI312812 B TW I312812B TW 95107803 A TW95107803 A TW 95107803A TW 95107803 A TW95107803 A TW 95107803A TW I312812 B TWI312812 B TW I312812B
- Authority
- TW
- Taiwan
- Prior art keywords
- coating
- film
- coating chamber
- line
- replaceable
- Prior art date
Links
- 238000000576 coating method Methods 0.000 claims description 48
- 239000011248 coating agent Substances 0.000 claims description 44
- 238000001816 cooling Methods 0.000 claims description 11
- 239000012528 membrane Substances 0.000 claims description 3
- 238000005121 nitriding Methods 0.000 claims description 3
- 238000005086 pumping Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 239000002826 coolant Substances 0.000 claims description 2
- 238000005065 mining Methods 0.000 claims description 2
- 230000008030 elimination Effects 0.000 claims 1
- 238000003379 elimination reaction Methods 0.000 claims 1
- 229910052500 inorganic mineral Inorganic materials 0.000 claims 1
- 239000011707 mineral Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095107803A TW200734474A (en) | 2006-03-08 | 2006-03-08 | Film-coating device with replaceable coating chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095107803A TW200734474A (en) | 2006-03-08 | 2006-03-08 | Film-coating device with replaceable coating chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200734474A TW200734474A (en) | 2007-09-16 |
| TWI312812B true TWI312812B (enExample) | 2009-08-01 |
Family
ID=45072654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095107803A TW200734474A (en) | 2006-03-08 | 2006-03-08 | Film-coating device with replaceable coating chamber |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200734474A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI486469B (zh) * | 2010-04-22 | 2015-06-01 | Hon Hai Prec Ind Co Ltd | 鍍膜系統 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI396760B (zh) * | 2008-06-13 | 2013-05-21 | Hon Hai Prec Ind Co Ltd | 自動鍍膜裝置 |
| TWI415967B (zh) * | 2008-11-28 | 2013-11-21 | Hon Hai Prec Ind Co Ltd | 鍍膜工件承載裝置及鍍膜方法 |
| TWI384085B (zh) * | 2009-05-07 | 2013-02-01 | Univ Kao Yuan | 往復式雙段噴射常壓電漿鍍膜系統 |
| TWI452168B (zh) * | 2010-06-21 | 2014-09-11 | Hon Hai Prec Ind Co Ltd | 電漿式鍍膜裝置 |
-
2006
- 2006-03-08 TW TW095107803A patent/TW200734474A/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI486469B (zh) * | 2010-04-22 | 2015-06-01 | Hon Hai Prec Ind Co Ltd | 鍍膜系統 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200734474A (en) | 2007-09-16 |
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