TWI308770B - - Google Patents

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Publication number
TWI308770B
TWI308770B TW091116901A TW91116901A TWI308770B TW I308770 B TWI308770 B TW I308770B TW 091116901 A TW091116901 A TW 091116901A TW 91116901 A TW91116901 A TW 91116901A TW I308770 B TWI308770 B TW I308770B
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TW
Taiwan
Prior art keywords
film
forming material
material layer
photoresist
meth
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Application number
TW091116901A
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Chinese (zh)
Inventor
Katsumi Itoh
Original Assignee
Jsr Corp
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Publication of TWI308770B publication Critical patent/TWI308770B/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/40—Glass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0016—Plasticisers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C08K5/053—Polyhydroxylic alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/22—Electrodes, e.g. special shape, material or configuration
    • H01J11/24—Sustain electrodes or scan electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J11/36—Spacers, barriers, ribs, partitions or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J11/38—Dielectric or insulating layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J11/42—Fluorescent layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00—Details of television systems
    • H04N5/66—Transforming electric information into light information

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Materials Engineering (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Transforming Electric Information Into Light Information (AREA)

Description

1308770 A7 B7 五、發明説明（i ) 發明所屬的技術領域 (請先閱讀背面之注意事項再填寫本頁) 本發明係有關含無機粒子、轉印薄膜及電漿顯示面板 之製造方法。 習知技術 近年，以電漿顯示面板用作平板狀螢光顯示體係受人 矚目的。第1圖係表示交流型之電漿顯示面板（以下亦稱 作「P D P」）之截面形板的模式圖。於同圖，1及2係 經予對向配置的玻璃基板，3爲隔壁板，利用玻璃基板1 ’玻璃基板2及隔壁板3可予區劃形成小室。4係經予固 定於玻璃基板1之透明電極5爲在降低透明電極4之電阻 的目的下，經予形成於各該透明電極4上之總線（bus)電 極，6爲經予固定於玻璃基板2上的位址電極，7爲經予 保持於4室內的螢光物質8爲使能被覆透明電極4及總線 電極5至經予形成於玻璃基板1之表面上的介電體層，9 爲使能被覆位址電極6至經予形成於玻璃基板2之表面上 的介電體層，10爲例如由氧化鎂而成的保護膜。 經濟部智慧財4局員工消費合作社印製 又於彩色P D P方面，爲得對比較高的影像，於玻璃 基板及介電體層之間，設置有濾色片（紅色、綠色、藍色 )或黑色基質等。 至於此種P D P之介電體、間隔壁 '電極、螢光體、 濾色片及黑色條帶（基質）之製造方法，係（.i )於基板 上網版印刷含非感光性無機粒子之糊劑而得圖案’燒成此 圖案之網版印刷法，（2 )於基板上形成感光性之含無機 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -4 - 1308770 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（2 ) 粒子之樹脂層，介由光罩照射紫外線於此膜上並予顯影使 圖案殘存於基板上，燒成此樹脂層之微影法等係爲人所知 的。 發明欲解決的課題 然而，在前述網版印刷法，隨著面板之大型化及高精 細化，圖案精確度之要求變成非常嚴格，在通常的印刷有 未能對應的問題存在。 相對於此，在前述微影法，原理上圖案精確度優越， 尤其於採用轉印薄膜之方法，可形成膜厚之均句性及表面 之均勻性優越的圖案。然而，塗布含有丙烯酸酯樹脂之含 無機粒子組成物於支持薄膜上所形成的膜形成材料層，並 非具有足夠的可撓性。又於所得的面板材料上，則發現有 被稱作桔皮之表面的粗糙度之問題。 本發明係基於以上的事情而完成者。 本發明之第一目的，係提供可較合適形成表面平滑性 優越的P D P之構成要素（例如間隔壁、電極、電阻體、 介電體層、螢光體、濾色片、黑色基質）的含無機粒子組 成物。 本發明之第二目的，係提供可形成具有較高的透光率 之玻璃燒結體（例如構成PDP之介電體層）的含無機粒 子組成物。 本發明之第三目的，係提供可製造形成膜材料層之可 撓性優越的轉印薄膜之含無機粒子組成物。 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -5- 1308770 A7 B7 經濟部智葱財產局員工消費合作社印製 五、發明説明（3 ) 本發明之第四目的’係提供可製造膜形成材料層之轉 印性（對基板之加熱接著性）優越的轉印薄膜之含無機粒 子組成物。 本發明之弟五目的’係提供可有效的形成表面平滑性 優越的P D P之構成要素之轉印薄膜。 本發明之第六目的，係提供膜形成材料層之可撓性優 越的轉印薄膜。 本發明之第七目的，係提供膜形成材料層之轉印性（ 對基板之加熱接著性）優越的轉印薄膜。 本發明之第八目的，係提供可有效的形成表面平滑性 優越的P D P之構成要素的P D P之製造方法。 本發明之第九目的，係提供可有效的形成構成要素之 位置精確度較高的P D P之p D P之製造方法。 本發明之第十目的，係提供可有效的形成膜厚較大的 介電體層之PDP之製造方法。 本發明之第十一目的，係提供可有效的形成大型面板 所要求的介電體層之P D P之製造方法。 本發明之第十二目的，係提供具有膜厚之均勻性優越 的介電體層之P D P之製造方法。 本發明之第十三目的，係提供具有表面之平滑性優越 的介電體層之P D P之製造方法。 解決問題而採的手段 本發明之含無機粒子組成物，係以含有〔A〕無機粒 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS ) A4規格< 210X297公釐） -6- 1308770 A7 B7 五、發明説明（4 ) 子’ 〔B〕黏結樹脂，及〔c〕以下述構造式（I )表示 的化合物爲特徵。 (請先閱讀背面之注意事項再填寫本頁) C H2 — 〇 — r 11308770 A7 B7 V. INSTRUCTION DESCRIPTION (i) Technical Field to Which the Invention Alongs (Please read the following notes on the back side and fill out this page) The present invention relates to a method for producing inorganic particles, a transfer film, and a plasma display panel. Conventional technology In recent years, the use of a plasma display panel as a flat-panel fluorescent display system has attracted attention. Fig. 1 is a schematic view showing a cross-sectional shape of an AC type plasma display panel (hereinafter also referred to as "P D P"). In the same figure, 1 and 2 are glass substrates which are opposed to each other, and 3 is a partition plate. The glass substrate 1' glass substrate 2 and the partition plate 3 can be used to form a small chamber. The transparent electrode 5 which is fixed to the glass substrate 1 is a bus electrode which is formed on each of the transparent electrodes 4 for the purpose of reducing the electric resistance of the transparent electrode 4, and 6 is preliminarily fixed to the glass substrate. The address electrode on the second substrate, 7 is a phosphor material 8 held in the chamber 4, and is a dielectric layer that enables the transparent electrode 4 and the bus electrode 5 to be coated on the surface of the glass substrate 1. The address electrode 6 can be coated to a dielectric layer formed on the surface of the glass substrate 2, and 10 is a protective film made of, for example, magnesium oxide. The Ministry of Economic Affairs, Smart Finance, 4th Bureau, and the Consumer Cooperatives, printed on the color PDP, set a color filter (red, green, blue) or black between the glass substrate and the dielectric layer for higher contrast images. Matrix, etc. As for the manufacturing method of the dielectric body, the partition wall electrode, the phosphor, the color filter, and the black strip (matrix) of the PDP, the substrate is printed on the substrate to print a paste containing non-photosensitive inorganic particles. The pattern obtained by the agent 'burning the pattern is screen printing method, (2) the photosensitive inorganic paper is formed on the substrate. The Chinese National Standard (CNS) A4 specification (210×297 mm) -4 - 1308770 A7 B7 Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives, Printing 5, Inventions (2) The resin layer of the particles, which is irradiated with ultraviolet light on the film through a mask and developed to leave the pattern on the substrate, and the lithography of the resin layer is fired. The Department of Law is known. Problem to be Solved by the Invention However, in the above-described screen printing method, as the size of the panel is increased and the quality is refined, the requirements for pattern accuracy become very strict, and there is a problem that the conventional printing fails. On the other hand, in the above-described lithography method, the pattern precision is superior in principle, and in particular, a method of transferring a film can be used to form a pattern having uniform film thickness and uniformity of surface uniformity. However, coating the film-forming material layer formed on the support film by coating the inorganic particle-containing composition containing the acrylate resin does not have sufficient flexibility. Further, on the obtained panel material, there was a problem of roughness called a surface of orange peel. The present invention has been completed based on the above matters. A first object of the present invention is to provide an inorganic component which is suitable for forming a PDP component (for example, a partition wall, an electrode, a resistor, a dielectric layer, a phosphor, a color filter, a black matrix) which is superior in surface smoothness. Particle composition. A second object of the present invention is to provide an inorganic particle-containing composition which can form a glass sintered body having a high light transmittance (e.g., a dielectric layer constituting a PDP). A third object of the present invention is to provide an inorganic particle-containing composition which can produce a transfer film which is excellent in flexibility in forming a film material layer. (Please read the notes on the back and fill out this page.) The paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) -5- 1308770 A7 B7 Ministry of Economic Affairs Zhisong Property Bureau employee consumption cooperative printing 5, invention (4) The fourth object of the present invention is to provide an inorganic particle-containing composition of a transfer film which is excellent in transferability (heating adhesion to a substrate) of a film forming material layer. The fifth object of the present invention is to provide a transfer film which can effectively form a constituent element of P D P excellent in surface smoothness. A sixth object of the present invention is to provide a transfer film which is excellent in flexibility of a film forming material layer. A seventh object of the present invention is to provide a transfer film which is excellent in transferability (heating adhesion to a substrate) of a film forming material layer. An eighth object of the present invention is to provide a method for producing P P P which can effectively form a constituent element of P D P having excellent surface smoothness. A ninth object of the present invention is to provide a manufacturing method capable of efficiently forming a P D P of P D P having a high positional accuracy of constituent elements. A tenth object of the present invention is to provide a method for producing a PDP which can effectively form a dielectric layer having a large film thickness. An eleventh object of the present invention is to provide a method of manufacturing a P D P which can effectively form a dielectric layer required for a large panel. A twelfth object of the present invention is to provide a method for producing P D P having a dielectric layer having excellent film thickness uniformity. A thirteenth object of the present invention is to provide a method for producing a P D P having a dielectric layer having excellent surface smoothness. Means for Solving the Problems The inorganic particle-containing composition of the present invention contains [A] inorganic particles (please read the back of the back sheet and fill out this page). The paper size applies to the Chinese National Standard (CNS) A4 specification < 210×297 mm) -6- 1308770 A7 B7 V. Inventive Note (4) The sub-[B] binder resin, and [c] are characterized by the compound represented by the following structural formula (I). (Please read the notes on the back and fill out this page) C H2 — 〇 — r 1

I 广〇i2 . . . (1) CH2 R3 (式內，R 、R2及R3之中—者，係表示以_c〇 — A (惟A表示碳數5〜2 〇之烷基）表示的基，除此以外的 一者係各自獨立的表示氫原子、乙_或丙醯基）。 本發明之轉印薄膜’係以具有由前述含無機粒子組成 物而得的膜形成材料層爲特徵。 本發明之P D P之製造方法，係以包含將由含前述無 機粒子組成物而得的膜形成材料轉印至基板上，利用燒成 經予轉印的膜形成材料層，於前述基板上形成介電體層的 步驟爲特徵。 經濟部智慧財產局員工消費合作社印製 又，本發明之PDP之製造方法，係以包含將由含前 述無機粒子組成物而得的膜形成材料轉印至基板上，於經 予轉印的膜形成材料層上形成光阻膜，曝光處理各該光阻 膜並形成光阻圖案之潛影’顯影處理各該光阻膜並使光阻 圖案顯在化’蝕刻處理各該膜形成材料層並形成對應於光 阻圖案之圖案層，藉由燒成處理各該圖案層，形成由間隔 壁、電極、電阻體、介電體層、螢光體 '濾色片及黑色基 質選出的構成要素之步驟爲特徵。 本紙張尺度適用中國國家樣準（CNS ) A4規格（210X297公釐） 1308770 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（5 ) 再者’本發明之P D P之製造方法，係包含與由前述 含無機粒子組成物而得的膜形成材料層間之層合膜形成於 支持薄膜上，轉印經予形成於支持薄膜上的層合膜至基板 上’曝光處理構成各該層合膜之光阻膜並形成光阻圖案之 潛影，顯影處理各該光阻膜並使光阻圖案顯在化，蝕刻處 理各該膜形成材料層並形成對應於光阻圖案之圖案層，藉 由燒成處理各該圖案層，形成由間隔壁、電極、電阻體、 介電體層、螢光體、濾色片及黑色基質選出的構成要素之 步驟爲特徵。 〔發明之實施形態〕 以下詳細說明本發明之含無機粒子組成物（以下亦可 單單稱作「組成物」）。 本發明之組成物，係含有以無機粒子、黏結樹脂及特 定之構造表示的可塑劑爲必須成分。 <無機粒子> 至於構成本發明之組成物的無機粒子之無機物質，並 未予特別限定者，因應由各該組成物所形成的燒結體之用 途（PDP之構成要素之種類）可予適當選擇。 在此，至於爲形成構成PDP之「介電體層」或「間 隔壁」而用的組成物所含有的無機粒子，可舉出軟化溫度 在4 0 0〜6 0 0 °C之範圍內的玻璃粉末。於玻璃粉末之 軟化溫度未滿4 0 0 °C時，於由各該組成物而得的膜形成 --------— (請先閲讀背面之注意事項再填寫本頁) 訂 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -8 - 1308770 A7 B7 五、發明説明（6 ) (請先閱讀背面之注意事項再填寫本頁) 材料層之燒成步驟，在黏結樹脂等的有機物質完全未能分 角军去除的階段由於玻璃粉末會熔融，故於所形成的介電體 層中部分的有機物質會殘存結果，介電體層經予著色，其 透光率有降低的傾向。另一方面，於玻璃粉末之軟化溫度 超過6 0 0 °C時，固有在較6 0 0 t高溫燒成的必要，故 於坡璃基板上有較易發生變形。 至於較合適的玻璃粉末之具體例，可例示出有：①氧 化鉛、氧化硼、氧化矽（PbO — B2〇3— S i 02系） 之混合物，②氧化鋅、氧化硼、氧化矽（Ζ η ◦- B 2 0 3 一 S i 〇2系）之混合物，③氧化鉛、氧化硼、氧化矽、氧 化鋁（PbO-B2〇3— S i〇2 — A 12〇3系）之混合 物，④氧化鉛、氧化鋅、氧化硼、氧化矽（P b 0 -Z n〇一B2〇3 — S i 02系）之混合物等。 經濟部智慧財產局員工消費合作社印製 此等玻璃粉末係亦可含有（倂用）於爲形成介電體層 及間隔壁以外的構成要素（例如電極、電阻體、螢光體、 濾色片、黑色基質）而用的組成物中。爲得此等面板材料 而用的含無機粉體樹脂組成物中的彩色玻料之含有量，對 無機粉體全量，通常在9 0質量％以下，宜爲5 0〜9 0 質量％。 至於爲形成構成P D P之「電極」而用的組成物所含 有之無機粒子，可舉出由Ag、Au、Al 、Ni 、Ag 、Pd合金、Cu及C r等而成的金屬粒子。 此等的金屬粒子係於爲形成介電體層而用的組成物中 以與玻璃粉末合倂使用的形式予以含有亦可。於介電體層 -9- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 1308770 A7 B7 五、發明説明（7 ) 形成用組成物內的金屬粒子之含有量，對無機粉體全量， 通常爲10質量％以下，宜爲0.1〜5質量％。 (請先閲讀背面之注意事項再填寫本頁) 至於爲形成構成P D P之「電阻體」而用的組成物所 含有之無機粒子，可舉出由R u 〇2等而成的粒子。 至於爲形成構成之PDP之「螢光體」而用的組成物 所含有之無機粒子，可舉出Υ2〇3 : E U3 +， Y 2 S i 〇 3 ： EU3+，Y3Al5〇12: E U 3 + 1 Y V 0 4 ： E u 3 + ' ( Y ' G d ) B 0 3 ： Eu3+，Ζ η 3 (Ρ〇4)2:Μη等的紅色用螢光物質；Zn2Si〇4: Μη，BaAli2〇i9:Mn，BaMgAli4〇23: Μ η > L a P Ο 4 ·· (Ce，Tb)， Y3 (A 1 3Ga ) 5〇12 : Tb等的綠色用螢光物質； Y2Si〇5: Ce ，BaMgAli〇Oi7: Eu2+， B aMgA 1 i4〇23 : Eu2 + ’ (C a，Sr，Ba) i〇(P〇4)6Cl2: E u 2 + 5 (I 广〇i2 . . . (1) CH2 R3 (in the formula, R, R2 and R3, which means _c〇-A (but A represents an alkyl group having a carbon number of 5 to 2 〇) The other ones are independently represented by a hydrogen atom, a B- or a propyl group. The transfer film 'of the present invention' is characterized by having a film forming material layer obtained from the above-mentioned inorganic particle-containing composition. In the method for producing a PDP of the present invention, a film forming material obtained by transferring a film forming material containing the inorganic particle composition onto a substrate and forming a material layer by baking is used to form a dielectric layer on the substrate The steps of the body layer are characterized. The PDP manufacturing method of the present invention is a method for producing a PDP according to the present invention, which comprises transferring a film forming material obtained from the inorganic particle-containing composition onto a substrate and forming the film by transfer. Forming a photoresist film on the material layer, exposing each of the photoresist films to form a latent image of the photoresist pattern, developing and treating each of the photoresist films and visualizing the photoresist pattern, and etching and forming each of the film forming material layers The steps of forming the pattern layer by the firing of the pattern layer corresponding to the pattern of the photoresist pattern to form the spacer, the electrode, the resistor, the dielectric layer, the phosphor 'color filter, and the black matrix are feature. This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) 1308770 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (5) Further, the manufacturing method of the PDP of the present invention a laminate film comprising a layer of a film-forming material composed of the inorganic particle-containing composition is formed on a support film, and a laminate film formed on the support film is transferred onto the substrate. The exposure process constitutes each of the laminates. Forming a photoresist film and forming a latent image of the photoresist pattern, developing and processing each of the photoresist films, and etching the film forming material layer to form a pattern layer corresponding to the photoresist pattern, The step of firing each of the pattern layers to form constituent elements selected from the partition walls, the electrodes, the resistors, the dielectric layer, the phosphor, the color filter, and the black matrix is characterized. [Embodiment of the Invention] Hereinafter, the inorganic particle-containing composition of the present invention (hereinafter may be referred to simply as "composition") will be described in detail. The composition of the present invention contains a plasticizer represented by inorganic particles, a binder resin, and a specific structure as essential components. <Inorganic Particles> The inorganic substance constituting the inorganic particles of the composition of the present invention is not particularly limited, and the use of the sintered body formed of each of the compositions (the type of the constituent elements of the PDP) can be Appropriate choice. Here, as for the inorganic particles contained in the composition for forming the "dielectric layer" or the "partition wall" constituting the PDP, glass having a softening temperature in the range of 4,000 to 6,000 ° C is exemplified. powder. When the softening temperature of the glass powder is less than 40 ° C, the film formed from each of the compositions is formed -------- (please read the notes on the back and fill out this page) Paper scale applicable to China National Standard (CNS) A4 specification (210X 297 mm) -8 - 1308770 A7 B7 V. Invention description (6) (Please read the note on the back and fill in this page) The firing step of the material layer, When the organic substance such as the binder resin is completely removed from the corner, the glass powder is melted, so that some organic substances remain in the formed dielectric layer, and the dielectric layer is precolored, and its transmittance is high. There is a tendency to decrease. On the other hand, when the softening temperature of the glass powder exceeds 60 ° C, it is inherently necessary to be fired at a higher temperature than 600 °, so that it is more likely to be deformed on the glass substrate. As a specific example of a suitable glass powder, there may be exemplified one: a mixture of lead oxide, boron oxide, cerium oxide (PbO - B2 〇 3 - S i 02 system), 2 zinc oxide, boron oxide, cerium oxide (Ζ) a mixture of η ◦-B 2 0 3 -S i 〇 2 series), a mixture of 3 lead oxide, boron oxide, cerium oxide, aluminum oxide (PbO-B2 〇 3 - S i 〇 2 - A 12 〇 3 series), 4 A mixture of lead oxide, zinc oxide, boron oxide, cerium oxide (P b 0 -Z n〇-B2〇3 - S i 02 system), and the like. The glass powder system printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs may also contain components (such as electrodes, resistors, phosphors, color filters, etc.) for forming dielectric layers and partition walls. Black matrix) used in the composition. The content of the colored glass material in the inorganic powder-containing resin composition used for the above-mentioned panel material is usually 90% by mass or less, preferably 50 to 90% by mass based on the total amount of the inorganic powder. The inorganic particles contained in the composition for forming the "electrode" constituting P D P include metal particles of Ag, Au, Al, Ni, Ag, Pd alloy, Cu, and Cr. These metal particles may be contained in a form for use in forming a dielectric layer in combination with glass powder. Dielectric layer -9- This paper scale is applicable to China National Standard (CNS) A4 specification (210X297 mm) 1308770 A7 B7 V. Description of invention (7) Content of metal particles in the composition for formation, on inorganic powder The total amount is usually 10% by mass or less, preferably 0.1 to 5% by mass. (Please read the precautions on the back side and fill in this page.) The inorganic particles contained in the composition for forming the "resistance body" constituting P D P include particles of R u 〇 2 or the like. The inorganic particles contained in the composition for forming the "phosphor" of the PDP to be formed include Υ2〇3 : E U3 +, Y 2 S i 〇3 : EU3+, Y3Al5〇12: EU 3 + 1 YV 0 4 : E u 3 + ' ( Y ' G d ) B 0 3 : Eu3+, Ζ η 3 (Ρ〇4) 2: red fluorescent substance such as Μη; Zn2Si〇4: Μη, BaAli2〇i9 : Mn, BaMgAli4〇23: Μ η > L a P Ο 4 ·· (Ce, Tb), Y3 (A 1 3Ga ) 5〇12 : green fluorescent substance such as Tb; Y2Si〇5: Ce, BaMgAli 〇Oi7: Eu2+, B aMgA 1 i4〇23 : Eu2 + ' (C a,Sr,Ba) i〇(P〇4)6Cl2: E u 2 + 5 (

Zn，Cd) S : Ag等的藍色用螢光物質等而成的粒子 〇 經濟部智慧財產局員工消費合作社印製 至於爲形成構成PDP之「濾色片」而用的組成物所 含有之無機粒子，可舉出F e 2〇3，P b3〇4等的紅色用 物質，C r 2 ◦ 3等的綠色用物質， 2 (Al2Na2Si3〇i〇) ，Na2S4等的藍色用物質 等而成的粒子。 至於爲形成構成PDP之「黑色基質」而用的組成物 所含有之無機粒子，可舉出由Mn，F e ，C r等而成的 -10- 本紙張尺度適用中國國家標準（CNS ) A4規格（2丨〇><297公釐） 1308770 經 濟 部 智 慧 財 i. 局 消 f 合 杜 印 製 Α7 ________Β7五、發明説明（8 ) 粒子。 <黏結樹脂> 構成本發明之組成物的黏結樹脂宜爲丙烯酸酯樹脂。 至於黏結樹脂係藉由使丙烯酸酯樹脂含有，於所形成 的膜形成材料層內，使對基板之優越的（加熱）接著性發 揮。因此，塗布本發明之組成物於支持薄膜上並製造轉印 薄膜時，所得的轉印薄膜係成爲膜形成材料層之轉印性（ 對基板之加熱接著性）優越者。 至於構成本發明之組成物的丙烯酸酯樹脂，係具有適 度的黏著性且可使無機粒子黏結，藉由膜形成材料之燒成 處理（4 0 0°C〜6 0 0°C)由可予完全氧化去除的（共 )聚物之中選擇。 於相關的丙烯酸酯系樹脂內，含有以下述一般式（1 )表示的（甲基）丙烯酸酯化合物之均聚物，下述一般式 (1 )表示的（甲基）丙烯酸酯化合物之二種以上的共聚 物，及以下述一般式（1 )表示的（甲基）丙儲酸酯化合 物及共聚合性單體之共聚物。 R4 I h2 c = c-coor6 (1) (式內，R4表示氫原子或甲基，R5表示一價之有機基） 〇 至於以上述一般式（1 )表示的（甲基）丙烯酸酯化 -- (請先閲讀背面之注意事項再填寫本頁) 訂 本紙張尺度適用中國國家標準（CNS ) A4規格（210乂297公釐） -11 - 1308770 A7 B7 五、發明説明（9 ) (請先閱讀背面之注意事項再填寫本頁) 合物之具體例’可舉出（甲基）丙烯酸甲酯、（甲基）丙 嫌酸乙酯、（甲基）丙烯酸丙酯、（甲基）丙烯酸異丙酯 、（甲基）丙烯酸丁酯、（甲基）丙烯酸異丁酯、（甲基 )丙烧酸第二丁酯、（甲基）丙烧酸戊醋、（甲基）丙燃 酸戊酯、（甲基）丙烯酸異戊酯、（甲基）丙烯酸己酯、 (甲基）丙嫌酸庚酯、（甲基）丙烯酸辛酯、（甲基）丙 稀酸異辛酯、（甲基）丙烯酸乙己酯、（甲基）丙烯酸壬 酯、（甲基）丙烯酸癸酯、（甲基）丙烯酸異癸酯、（甲 基）丙烯酸十一酯、（甲基）丙烯酸十二酯 '(甲基）丙 烯酸月桂酯、（甲基）丙烯酸硬脂酯、（甲基）丙烯酸異 脂酯等（甲基）丙烯酸烷酯； (甲基）丙烯酸羥乙酯、（甲基）丙烯酸2 -羥丙酯 、（甲基）丙稀酸3 -經丙酯、（甲基）丙嫌酸2 -經丙 酯、（甲基）丙烯酸3-羥丁酯、（甲基）丙烯酸4一經 丁酯等（甲基）丙烯酸羥烷酯； (甲基）丙烯酸苯氧乙酯、（甲基）丙烯酸2 -淫一 3 -苯氧丙酯等的（甲基）丙烯酸苯氧烷酯； 經濟部智慧財產局員工消費合作社印製 (甲基）丙烯酸2 —甲氧基乙酯、（甲基）丙烯酸2 —乙氧基乙酯、（甲基）丙烯酸2-丙氧基乙酯、（甲基 )丙烯酸2 —丁氧基乙酯、（甲基）丙烯酸2 _甲氧基丁 酯等的（甲基）丙烯酸烷氧基烷酯； 聚單（甲基）丙烯酸乙二醇酯、（甲基）丙烯酸乙氧 基二乙二醇酯、（甲基）丙烯酸甲氧基聚乙二醇酯、（甲 基）丙烯酸苯氧基聚乙二醇酯、（甲基）丙烯酸壬基苯氧 本纸浪尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -12- 1308770 Α7 Β7 五、發明説明（10) 基聚乙二醇酯、單（甲基）丙烯酸聚丙二醇酯、（甲基） 丙燦酸甲氧基聚丙二醇酯、（甲基）丙烯酸乙氧基聚丙二 (請先閱讀背面之注意事項再填寫本頁) 醇酯、（甲基）丙烯酸壬基苯氧基聚丙二醇酯等（甲基） 丙烯酸聚伸烷二醇酯； (甲基）丙烯酸環己酯、（甲基）丙烯酸4一丁基環 己基酯、（甲基）丙烯酸二戊烷基酯、（甲基）丙烯酸二 環戊烯基酯、（甲基）丙烯酸二環戊二烯基酯、（甲基） 丙烯酸原冰片基酯、（甲基）丙烯酸異冰片基酯、（甲基 )丙烯酸三環癸基酯等（甲基）丙烯酸環烷基酯； (甲基）丙烯酸苄基酯、（甲基）丙烯酸四氫呋喃基 酯等。 此等之中，上述一般式（1 )中，R5表示的基宜爲含 有烷基或氧基伸烷基之基，尤宜的（甲基）丙烯酸酯化合 物，可舉出（甲基）丙烯酸丁酯、（甲基）丙烯酸乙己酯 、（甲基）丙烯酸月桂酯、（甲基）丙烯酸異癸酯及（甲 基）丙烯酸2 -乙氧基乙酯。 經濟部智慧財產局g(工消費合作社印製 至於其他的共聚合性單體，若爲上述（甲基）丙烯酸 酯化合物及可共聚合的化合物時，則並未予特別限定，惟 例如可舉出（甲基）丙烯酸、乙烯基苯甲酸、順丁烯二酸 、乙烯基苯二甲酸等的不飽和羧酸類；乙烯基苄基甲基醚 、乙烯基縮水甘油基醚、苯乙烯、α -甲基苯乙烯、丁二 烯、異戊二烯等含乙烯基之自由基聚合性化合物。 於構成本發明之組成物的丙烯酸酯系樹脂之以源自上 述一般式（1 )表示的（甲基）丙烯酸酯化合物之共聚合 -13- 本紙張尺度適用中國國家橾準（CNS ) A4規格（2】0X297公釐） 1308770 A7 B7 五、發明説明（U ) 成分，通常7 0重量％以上，宜爲9 0重量％以上。 在此，至於較宜的丙烯酸酯系樹脂之具體例，可例示 出聚甲基丙烯酸甲酯 '聚甲基丙烯酸丁酯、甲基丙烯酸甲 酯、甲基丙烯酸丁酯共聚物等。 又，於利用後述的光阻法之P D P的構成要素之形成 ’於膜形成材料層之蝕刻處理需要鹼可溶性時，宜爲含有 不飽和羧酸類作爲上述其他共聚合性單體（共聚合成分） 〇 至於構成本發明之組成物的丙烯酸酯系樹脂之分子量 ’由GP C而測得的聚苯乙烯換算之重量平均分子量（以 下亦單單稱作「重量平均分子量」）宜爲4，0 〇 〇〜 300， 000，更宜爲 1〇, 000 〜200，〇〇〇 〇 至於本發明之組成物的黏結樹脂之含有比例，對無機 粒·子1 0 0重量分，宜爲5〜8 0重量分，更宜爲1 0〜 5 0重量分，黏結樹脂之比例若過少時，未能確實的黏結 無機粒子，另一方面，此比例若過大時，則燒成步驟需要 較長的時間，未能成爲厚者經予形成的燒結體（例如介電 體層）具有足夠的強度或膜厚者。 <可塑劑> 以上述構造式（I )表示的化合物，係被使用作可塑 劑（以下稱作「特定可塑劑」）。若依由含有特定可塑劑 而成的本發明之組成物時，則可防止經予形成的膜形成材 本紙張尺度適用中國國家標準（CNS )八4規格（210X297公釐） _ 14 ---------- (請先聞讀背面之注意事項再填寫本頁jZn,Cd) S: A blue fluorescent material such as Ag is produced by a member of the Ministry of Economic Affairs, the Intellectual Property Office, and the Consumer Cooperative, which is used to form a "color filter" that constitutes a PDP. Examples of the inorganic particles include red materials such as F e 2〇3 and P b3〇4, green materials such as C r 2 ◦ 3, and blue materials such as 2 (Al2Na2Si3〇i〇) and Na2S4. Particles. The inorganic particles contained in the composition for forming the "black matrix" constituting the PDP include Mn, F e , C r , etc., and the paper size is applicable to the Chinese National Standard (CNS) A4. Specifications (2丨〇><297 mm) 1308770 Ministry of Economic Affairs wisdom i. Bureaufei f and Du printing Α7 ________Β7 V, invention description (8) particles. <Adhesive Resin> The binder resin constituting the composition of the present invention is preferably an acrylate resin. As for the binder resin, the acrylate resin is contained in the formed film forming material layer to impart superior (heating) adhesion to the substrate. Therefore, when the composition of the present invention is applied onto a support film and a transfer film is produced, the resulting transfer film is superior in transferability (heat adhesion to the substrate) of the film formation material layer. The acrylate resin constituting the composition of the present invention has a moderate adhesiveness and can bond the inorganic particles, and the baking treatment of the film forming material (400 ° C to 600 ° C) can be used. Among the (co)polymers that are completely oxidized and removed. The acrylate-based resin contains a homopolymer of a (meth) acrylate compound represented by the following general formula (1), and two kinds of (meth) acrylate compounds represented by the following general formula (1). The above copolymer and a copolymer of a (meth)propionate compound and a copolymerizable monomer represented by the following general formula (1). R4 I h2 c = c-coor6 (1) (wherein R4 represents a hydrogen atom or a methyl group, and R5 represents a monovalent organic group) 〇 as for the (meth) acrylate ester represented by the above general formula (1) - - (Please read the note on the back and fill out this page.) The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210乂297 mm) -11 - 1308770 A7 B7 V. Invention description (9) (Please first Read the precautions on the back page and fill out this page. Specific examples of the compound can be exemplified by methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, or (meth) acrylate. Isopropyl ester, butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)propionate, acetoacetate (methyl)propionate, (meth)propanoic acid Amyl ester, isoamyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)propionate, octyl (meth)acrylate, isooctyl (meth)acrylate, ( Ethyl ethyl acrylate, decyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, (A) a (meth)acrylic acid alkyl ester such as lauryl acrylate, dodecyl (meth)acrylate, stearyl (meth) acrylate or iso (meth) acrylate; Hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-propyl propyl (meth) acrylate, 2-propyl propyl methacrylate, (methyl) 3-hydroxybutyl acrylate, hydroxyalkyl (meth) acrylate such as butyl (meth) acrylate; phenoxyethyl (meth) acrylate, 2- benzo-3- phenoxy propyl (meth) acrylate Phenyl oxyalkyl (meth) acrylate such as ester; Ministry of Economic Affairs Intellectual Property Office employee consumption cooperative printing 2-methoxyethyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate, ( a (meth)acrylic acid alkoxyalkyl ester such as 2-propoxyethyl methacrylate, 2-butoxyethyl (meth) acrylate or 2-methoxybutyl (meth) acrylate; Poly(ethylene)(meth)acrylate, ethoxydiethylene glycol (meth)acrylate, methoxypolyethylene (meth)acrylate Ester, phenoxy polyethylene glycol (meth) acrylate, bismuth oxy phenoxy (meth) acrylate paper wave scale applicable to China National Standard (CNS) A4 specification (210X297 mm) -12- 1308770 Α7 Β7 5 , invention description (10) based polyethylene glycol ester, polypropylene (meth) acrylate, (methyl) propylene glycol methoxypolypropylene glycol, (meth) acrylate ethoxypolypropylene (please first Read the precautions on the back and fill out this page) Alcohol esters, (meth)acrylic acid poly(alkylene glycol) such as decylphenoxypolypropylene glycol (meth)acrylate; (cyclo)(meth)acrylate 4-butylcyclohexyl acrylate, dipentyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentadienyl (meth) acrylate, (methyl) a cycloalkyl (meth)acrylate, a cycloalkyl (meth)acrylate, a cycloalkyl (meth)acrylate such as tricyclodecyl (meth)acrylate; a benzyl (meth)acrylate, (methyl) ) tetrahydrofuranyl acrylate or the like. Among these, in the above general formula (1), the group represented by R5 is preferably a group containing an alkyl group or an alkyloxy group, and a particularly preferred (meth) acrylate compound is exemplified by (meth) acrylate. Ester, ethyl (meth)acrylate, lauryl (meth)acrylate, isodecyl (meth)acrylate and 2-ethoxyethyl (meth)acrylate. In the case of the above-mentioned (meth) acrylate compound and copolymerizable compound, it is not particularly limited as long as it is printed by the Ministry of Economic Affairs, and the other is a copolymerizable monomer. An unsaturated carboxylic acid such as (meth)acrylic acid, vinylbenzoic acid, maleic acid or vinyl phthalic acid; vinylbenzyl methyl ether, vinyl glycidyl ether, styrene, α- a vinyl group-containing radical polymerizable compound such as methyl styrene, butadiene or isoprene. The acrylate resin constituting the composition of the present invention is derived from the above general formula (1) (A) Copolymerization of acrylate compound-13- This paper scale is applicable to China National Standard (CNS) A4 specification (2) 0X297 mm) 1308770 A7 B7 V. Inventive Note (U) Composition, usually 70% by weight or more, It is preferable that it is 90% by weight or more. Here, as a specific example of a preferable acrylate-based resin, polymethyl methacrylate 'polybutyl methacrylate, methyl methacrylate, methacrylic acid butyl methacrylate can be exemplified. Ester copolymer In addition, when formation of a component of a PDP by a photoresist method to be described later is required, when the etching treatment of the film formation material layer requires alkali solubility, it is preferred to contain an unsaturated carboxylic acid as the above other copolymerizable monomer (copolymerization). Component) The molecular weight of the acrylate-based resin constituting the composition of the present invention 'the weight average molecular weight in terms of polystyrene measured by GP C (hereinafter also referred to simply as "weight average molecular weight") is preferably 4,0. 〇〇〜300, 000, more preferably 1 〇, 000 ～200, 含有 〇〇〇〇 〇〇〇〇 组成 组成 组成 组成 组成 组成 组成 组成 组成 组成 组成 组成 组成 组成 组成 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机 无机0 parts by weight, more preferably 10 0 to 50 parts by weight, if the ratio of the binder resin is too small, the inorganic particles are not surely bonded. On the other hand, if the ratio is too large, the firing step takes a long time. A sintered body (for example, a dielectric layer) which has not been formed into a thick portion has sufficient strength or film thickness. <Plasticizer> The compound represented by the above structural formula (I) is used as a plasticizer. (in It is called "specific plasticizer". If it is based on the composition of the present invention containing a specific plasticizer, it can prevent the preformed film forming material from being conformed to the Chinese National Standard (CNS) 8 4 specification ( 210X297 mm) _ 14 ---------- (Please read the notes on the back and fill out this page again)

、1T 經濟部智慧財產局員工消費合作社印製 1308770 A7 _ B7 五、發明説明（12 ) (請先聞讀背面之注意事項再填寫本頁} 料層之桔皮紋理發生，可使優越的表面平滑性顯現。又所 得的轉印薄膜，即使彎折此薄膜，於各該膜形成材料層之 表面上亦不致發生微小的龜裂，又各該轉印薄膜成爲柔軟 性優越者，亦可容易的進行捲取此薄膜成捲筒狀。 而且，各該特定可塑劑，由於利用熱可予容易的分解 去除，不使燒成各該膜形成材料層而得的介電體層之透光 率降低。 於表示特定可塑劑之上述構造式（I ) ，R1、R2及 R.3之中一者係表不以—C ◦_ A (惟A表示碳數5〜2 〇 之烷基）表示的基，該另二者係表示各自獨立的氫原子， 乙醯基或丙醯基。 至於具體的烷基，可舉出正戊基、正己基、正庚基、 正辛基、正壬基、正癸基、正十一基、正十二基、正十五 基、正十六基、正十七基、正十八基 '正十九基、正二十 基等。其中尤宜爲正十二基。 R1、R2及R3係任一者雖以一 CO — A表示的基， 惟以R1或R3係表示以一 C 0_A表示的基爲尤宜。又該 經濟部智慧財產局員工消費合作社印製 另二者係表示各自獨立的氣原子、乙醯基或丙醯基，惟此 等之中宜爲氫原子及乙醯基，含有至少一個乙醯基爲尤宜 〇 至於以上述構造式（I )表示的化合物之具體例，可 舉出丙三醇_ 1 _乙醯基一 3 -月桂酸酯、丙三醇一 2 — 乙醯基—1_月桂酸酯、丙三醇一 1 ，2 —二乙醯基一3 一月桂酸酯、丙三醇_ 1 _乙醯基一 3 —單油酸酯、丙三 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ~ 1308770 A7 B7 五、發明説明（13 ) 醇一 2 -乙醯基一 1_單油酸酯、丙三醇—1 ，2_二乙 (請先閲讀背面之注意事項再填寫本頁) 醯基一 3 -單油酸酯' 丙三醇_ 1 一乙醯基一 3 -硬脂酸 酯、丙三醇一 2 -乙醯基一 1—硬脂酸酯、丙三醇_1， 2 —二乙醯基一 3 -硬脂酸酯等。此等之中尤宜爲丙三醇 -1 ，2 -二乙醯基一 3 -月桂酸酯、丙三醇—1 ，2-二乙醯基一 3 -硬脂酸酯等。 至於本發明之組成物的特定可塑劑之含有比例，對無 機粒子100重量分，宜爲0 . 1〜20重量分，更宜爲 0 _ 5〜10重量分。對特定可塑劑之比例若過小時，採 用所得的組成物予以形成的膜形成材料層之表面平滑性及 可塑性則未能使足夠的提高。另一方面，於此比例若過大 時’則採用所得的組成物予以形成的膜形成材料層之黏著 性變成過大，具有該種膜形成材料層之轉印薄膜之處理性 有成爲低劣的情形。 <溶劑> 經濟部智慧財產局員工消費合作社印製 於本發明之組成物內，通常含有溶劑。至於上述溶劑 ’係與無機粒子間之親和性，黏結樹脂之溶解性良好，對 所得的組成物內可賦予適當的黏性，藉由經予乾燥可容易 的蒸發去除爲宜。 至於相關的溶劑之具體例，可例示出··二乙基酮、甲 丁基酮、二丙基酮、環己酮等的酮類；正戊醇、4_甲基 一 2 -戊醇、環己醇、二丙酮醇等的醇類；乙二醇單甲醚 、乙二醇單乙醚、乙二醇單丁醚、丙二醇單甲醚、丙二醇 本紙張尺度適用中國國家標準（CNs ) A4規格（210X297公釐） -16- 1308770 A7 B7 五、發明説明（ 14 經濟部智慧財產局8工消費合作社印製 單乙醚等醚系醇類；乙酸正丁酯、乙酸戊酯等的飽和脂肪 族單羧酸烷基酯類；乳酸乙酯、乳酸正丁酯等的乳酸酯類 :甲氧基乙醇乙酸酯、乙氧基乙醇乙酸酯、丙二醇單甲醚 乙酸酯、乙基- 3 -乙氧基丙酸酯等的醚系酯類等，此等 可單獨使用或合倂使用二種以上。 至於本發明之組成物的溶劑之含有比例，由維持組成 物之黏度於合適的範圍之觀點，對無機粒子1 0 0重量分 ，宜爲4 0重量分以下，更宜爲5〜3 0重量分。 於本發明之組成物內，除上述的必須成分之外，以含 有表面張力調整劑、安定劑、消泡劑等的各種添加劑作爲 任意成分亦可。尤其，在提高無機粒子之分散安定性的目 的，使含有含甲矽基化合物亦可。至於各該含甲矽基之化 合物，宜爲以下述一般式（2 )表示的含甲矽基化合物〔 含有飽和烷基之（烷基）烷氧基矽烷〕。 CpH2p+1-Si-(-0CmH2m+l)a ⑵ (CnH2n+l) 3.a (式內，P爲3〜20之整數，m爲1〜3之整數，η爲 1〜3之整數，a爲1〜3之整數）。 於上述一般式（2 )，表示飽和烷基之碳數的P係指 3〜20之整數，宜爲4〜16之整數。 即使使含有P未滿3之含飽和烷基之（烷基）烷氧基 矽烷，於所得的膜形成材料層亦無足夠的可撓性可予顯現 的情形。另一方面，P之値超過無2 0之含有飽和烷基之 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS > A4規格（210X297公釐） -17- 1308770 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（15) (院基）院氧基矽烷係分解溫度高’於由本發明之電漿顯 示器之製造方法的燒成步驟，在有機物質（前述矽烷衍生 物）7U全未予分解去除的狀態，於經予形成的介電體層等 的無機層中殘存有部分有機物質，結果於介電體層之情形 有透光率降低的情形。 至於以上述一般式（2 )表示的含甲矽基化合物之具 體例，可舉出：正丙基二甲基甲氧基矽烷、正丁基二甲基 甲氧基矽烷、正十二烷基甲基甲氧基矽烷、正十六烷基二 甲基甲氧基矽烷、正二十烷基二甲基甲烷基矽烷等飽和烷 基一甲基甲氧基砂院類（a = l，m=l，n = l); 正丙基二乙基甲氧基矽烷、正丁基二乙基甲氧基矽烷 、正癸基二乙基甲氧基矽烷、正十六烷基二乙基甲氧基矽 烷、正二十烷基二乙基甲氧基矽烷等飽和烷基二乙基甲氧 基石夕院類（a = l，m==l，n = 2); 正丁基二丙基甲氧基矽烷、正癸基丙基甲氧基矽烷、 正十六烷基二丙基甲氧基矽烷、正二十烷基二丙基甲氧基 矽烷等飽和烷基二丙基甲氧基矽烷類（a = 1 ，m = 1 ， η = 3 )； 正丙基二甲基乙氧基矽烷、正丁基二甲基乙氧基矽烷 、正癸基二甲基乙氧基矽烷、正十六烷基二甲基乙氧基矽 烷、正二十基二甲基乙氧基矽烷等飽和烷基二甲基乙氧基 ϊ 夕院類（a=l，m=2，n=l) > 正丙基二乙基乙氧基矽烷、正丁基二乙基乙氧基矽烷 、正癸基二乙基乙氧基矽烷、正十六烷基二乙基乙氧基矽 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS ) A4規格（210X29*7公釐） -18· 1308770 Δ7 Α7 Β7 五、發明説明（Μ) 烷、正二十烷基二乙基乙氧基矽烷等的飽和烷基二乙基乙 氧基矽烷類（a = l，m=2，n = 2); (請先閲讀背面之注意事項再填寫本頁) 正丁基二丙基乙氧基矽烷、正癸基丙基乙氧基矽烷、 正十六烷基二丙基乙氧基矽烷、正二十烷基二丙基乙氧基 矽烷等的飽和院基二丙基乙氧基矽烷類（a = 1，m= 2 ，η = 3 ); 正丙基二甲基丙氧基矽烷、正丙基二甲基丙氧基矽烷 、正癸基二甲基丙氧基矽烷、正十六烷基二甲基丙氧基矽 烷、正二十烷基二甲基丙氧基矽烷等飽和烷基二甲基丙氧 基石夕院類（a = l，m=3，n = l); 正丙基二乙基丙氧基矽烷、正丁基二乙基丙氧基矽烷 、正癸基二乙基丙氧基砂院、正十六院基一乙基丙氧基砂 烷、正二十烷基二乙基丙氧基矽烷等飽和烷基二乙基丙氧 基砂院類（a = l，m=3，n = 2); 經濟部智慧財產局員工消費合作社印製 正丁基二丙基丙氧基矽烷、正癸基丙基丙氧基矽烷、 正十六院基二丙基丙氧基砂院、正二十院基一丙基丙氧基 矽烷等的飽和烷基二丙基丙氧基矽烷類（a = 1 ，m = 3 ，η = 3 )； 正丙基甲基二甲氧基矽烷、正丁基甲基二甲氧基矽院 、正癸基甲基二甲氧基矽烷、正十六烷基甲基二甲氧基砂 烷、正二十烷基甲基二甲氧基矽烷等飽和烷基甲基二甲氧 基砂院類（a = 2，m=l，n = l); 正丙基乙基二甲氧基矽烷、正丁基乙基二甲氧基矽院 、正癸基乙基二甲氧基矽烷、正十六烷基乙基二甲氧基砂 -19- 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） 經濟部智慧財產局員工消費合作社印製 1308770 A7 A7 _B7_ 五、發明説明（17) 烷、正二十烷基乙基二甲氧基矽烷等的飽和烷基乙基二甲 氧基矽烷類（a = 2，m=l，n = 2); 正丁基丙基二甲氧基矽烷、正癸基丙基二甲氧基矽烷 、正十六烷基丙基二甲氧基矽烷、正二十烷基丙基二甲氧 基矽烷等的飽和烷基丙基二甲氧基矽烷類（a = 2 ’ m = 1，η = 3 ); 正丙基甲基二乙氧基矽烷、正丁基甲基二乙氧基矽烷 、正癸基甲基二乙氧基砂院、正十六院基甲基一乙氧基石夕 烷、正二十烷基甲基二乙氧基矽烷等的飽和烷基甲基二乙 氧基ΐ夕烷類（a = 2，m=2，n = l); 正丙基乙基二乙氧基矽烷、正丁基乙基二乙氧基矽烷 、正癸基乙基二乙氧基矽烷、正十六烷基乙基二乙氧基矽 烷、正二十烷基乙基二乙氧基矽烷等的飽和烷基乙基二乙 氧基砂院類（a = 2，m二2，n = 2); 正丁基丙基二乙氧基矽烷、正癸基丙基二乙氧基矽烷 、正十六烷基丙基二乙氧基矽烷'正二十烷基丙基二乙氧 基矽烷等的飽和烷基丙基二乙氧基矽烷類（a = 2，m = 2，η = 3 )； 正丙基甲基二丙氧基矽烷、正丁基甲基二丙氧基矽烷 、正癸基甲基二丙氧基矽烷、正十六烷基甲基二丙氧基矽 院、正二十烷基甲基二丙氧基矽烷等的飽和烷基甲基二丙 氧基砂院類（a = 2，m=3，n = l); 正丙基乙基二丙氧基矽烷、正丁基乙基二丙氧基矽烷 、正癸基乙基二丙氧基矽烷、正十六烷基乙基二丙氧基矽 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -20- ---------- (請先閲讀背面之注意事項再填寫本頁) 訂 1308770 7 A7 B7 五、發明説明（18 ) 烷、正二十烷基乙基二丙氧基矽烷等的飽和烷基乙基二丙 氧基矽烷類（a = 2，m=3，n = 2); 正丁基丙基二丙氧基矽烷、正癸基丙基二丙氧基矽院 、正十六院基丙基二丙氧基矽烷、正二十烷基丙基二丙氧 基矽烷等的飽和烷基丙基二丙氧基矽烷類（a = 2 ’ m = 3，η = 3 ); 正丙基三甲氧基矽烷、正丁基三甲氧基矽烷、正癸基 三甲氧基矽烷、正十六烷基三甲氧基矽烷、正二十烷基三 甲氧基矽烷等飽和烷基三甲氧基矽烷類（a = 3 ’ m = 1 )； 正丙基三乙氧基矽烷、正丁基三乙氧基矽烷、正癸基 三乙氧基矽烷、正十六烷基三乙氧基矽烷、正二十烷基三 乙氧基矽烷等的飽和烷基三乙氧基矽烷類（a = 3，m = 2 )； 正丙基三丙氧基矽烷、正丁基三丙氧基矽烷、正癸基 三丙氧基矽烷、正十六烷基三丙氧基矽烷、正二十烷基三 丙氧基矽烷等的飽和烷基三丙氧基矽烷類（a = 3，m = 3 )等，此等可單獨使用或合倂使用二種以上。 此等之中，尤宜爲正丁基三甲氧基矽烷、正癸三甲氧 基矽烷、正十六烷基三甲氧基矽烷、正癸基二甲基甲氧基 矽烷、正十六烷基二甲基甲氧基矽烷、正丁基三乙氧基矽 烷、正癸基三乙氧基矽烷、正十六烷基三乙氧基矽烷、正 癸基乙基二乙氧基矽烷、正十六烷基乙基二乙氧基矽烷、 正丁基三丙氧基矽烷、正癸基三丙氧基矽烷、正十六烷基 本紙張尺度適用中國國家橾準（CNS ) A4規格（210X297公釐） ---------— (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作杜印製 1308770 A7 B7 五、發明説明（19) 三丙氧基矽烷等。 (請先閲讀背面之注意事項再填寫本頁) 至於含甲矽基之化合物之含有比例，對無機粒子 1 0 0質量分，宜爲5質量分以下，更宜爲3質量分以下 。在含有甲矽基化合物之比例若過大時，則於保存所得的 含無機粒子組成物之際，黏度會隨時間經過而上升，含甲 矽基化合物相互間會引起反應，在燒成後成爲有機物質殘 存的原因之情形。 至於含無機粒子組成物之一例，若表示出較宜的介電 體層形成用之組成物之例時，可舉出含有以無機粒子（玻 璃粉末）之氧化鉛5 0〜8 0質量％，氧化硼5〜2 0重 量％，氧化砂1 0〜3 0重量％而成的混合物1 0 〇重量 分及黏結樹脂之聚對苯二甲酸丁二酯1 0〜3 0重量分及 特定可塑劑0 . 1〜1 〇重量分，溶劑之丙二醇單甲醚 1 0〜5 0重量分爲必須成分之組成物。 本發明之組成物係藉由採用輥輪混練機、混合機、均 質機等混練機混練上述無機粒子、黏結樹脂、特定可塑劑 及溶劑與任意成分予以製備。 經濟部智慧財產局員工消費合作社印製 上述經予製備的本發明之組成物，係具有適於塗布的 流動性之漿狀組成物，其黏度係指通常1，〇 〇 〇〜1T Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1308770 A7 _ B7 V. Invention Description (12) (Please read the back note first and then fill in this page) The orange peel texture of the layer occurs, which can make a superior surface The smoothness of the transfer film is obtained, and even if the film is bent, minute cracks do not occur on the surface of each of the film forming material layers, and each of the transfer films is excellent in flexibility and can be easily used. The film is wound into a roll shape. Further, each of the specific plasticizers can be easily decomposed and removed by heat, and the transmittance of the dielectric layer obtained by firing each of the film forming material layers is not lowered. In the above structural formula (I) representing a specific plasticizer, one of R1, R2 and R.3 is represented by -C ◦_ A (only A represents an alkyl group having a carbon number of 5 to 2 Å). And the other two represent a hydrogen atom independently, an ethyl fluorenyl group or a propyl fluorenyl group. Specific examples of the alkyl group include n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, and n-decyl group.正癸基,正十一基,正十二基,正十五基,正十六基Is a seventeen base, a positive eighteenth 'nine nine base, a positive twenty base, etc. Among them, it is particularly suitable for the positive twelve base. R1, R2 and R3 are either a base represented by a CO-A, but The R1 or R3 system indicates that the base represented by a C 0_A is particularly suitable. The Ministry of Economic Affairs' Intellectual Property Office employee consumption cooperative prints the other two to indicate their respective independent gas atoms, acetyl groups or propyl groups. And the like, and preferably a hydrogen atom and an ethylidene group, and at least one ethyl fluorenyl group is a specific example of the compound represented by the above structural formula (I), and glycerol _ 1 _ acetyl group 3 -lauric acid ester, glycerol 2- 2 -ethyl keto- 1 laurate, glycerol-1,2-diethyl fluorenyl 3-monolaurate, glycerol _ 1 _ acetyl group A 3-monooleate, C-paper scale applicable to China National Standard (CNS) A4 specification (210X297 mm) ~ 1308770 A7 B7 V. Description of invention (13) Alcohol 2-2-Ethyl- 1_mono oil Acid ester, glycerol-1, 2_2B (please read the back of the note first and then fill out this page) 醯基一3 - monooleate ' glycerol _ 1 醯 醯 一 a 3 - Fatty acid ester, glycerol 2- 2 - ethyl sulfonyl 1- stearate, glycerol _1, 2-diethyl fluorenyl 3- 3 - stearate, etc. Triol-1,2-diethylmercapto-3-laurate, glycerol-1,2-diethyldecyl-3-stearate, etc. As for the specific plasticizer of the composition of the present invention The ratio of the inorganic particles to 100 parts by weight is preferably 0.1 to 20 parts by weight, more preferably 0 to 5 to 10 parts by weight. If the ratio of the specific plasticizer is too small, the film is formed using the obtained composition. The surface smoothness and plasticity of the formed material layer failed to be sufficiently improved. On the other hand, when the ratio is too large, the adhesiveness of the film-forming material layer formed by using the obtained composition becomes excessively large, and the transfer film having such a film-forming material layer is inferior in rationality. <Solvent> The Intellectual Property Intellectual Property Office employee consumption cooperative is printed in the composition of the present invention and usually contains a solvent. The affinity between the above solvent and inorganic particles is good in the solubility of the binder resin, and it is preferable to impart appropriate viscosity to the obtained composition, and it is easy to evaporate and remove by predrying. Specific examples of the related solvent include ketones such as diethyl ketone, methyl butyl ketone, dipropyl ketone, and cyclohexanone; n-pentanol and 4-methyl-2-pentanol; Alcohols such as cyclohexanol and diacetone alcohol; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol. The paper scale is applicable to the Chinese National Standard (CNs) A4 specification. (210X297 mm) -16- 1308770 A7 B7 V. Description of invention (14 Ministry of Economic Affairs Intellectual Property Bureau 8 Workers' Consumption Cooperatives prints ether-based alcohols such as monoethyl ether; saturated aliphatics such as n-butyl acetate and amyl acetate Alkyl carboxylates; lactates such as ethyl lactate and n-butyl lactate: methoxyethanol acetate, ethoxyethanol acetate, propylene glycol monomethyl ether acetate, ethyl-3- Ethyl esters such as ethoxypropionate, etc., may be used singly or in combination of two or more kinds. The proportion of the solvent of the composition of the present invention is maintained in a suitable range by maintaining the viscosity of the composition. The viewpoint is that the inorganic particles are 10 parts by weight, preferably 40 parts by weight or less, more preferably 5 to 3 weights. In the composition of the present invention, various additives including a surface tension adjuster, a stabilizer, an antifoaming agent, and the like may be used as an optional component in addition to the above-mentioned essential components. In particular, the dispersion stability of inorganic particles is improved. For the purpose of the nature, the compound containing a mercapto group may be contained. The compound containing a mercapto group is preferably a mercapto group-containing compound represented by the following general formula (2) [(alkyl group) containing a saturated alkyl group. Alkoxydecane] CpH2p+1-Si-(-0CmH2m+l)a (2) (CnH2n+l) 3.a (In the formula, P is an integer from 3 to 20, m is an integer from 1 to 3, and η is An integer of 1 to 3, a is an integer of 1 to 3.) In the above general formula (2), P which represents the carbon number of the saturated alkyl group means an integer of 3 to 20, preferably an integer of 4 to 16. The (alkyl) alkoxy decane containing a saturated alkyl group having less than 3 is not sufficiently flexible in the obtained film-forming material layer. On the other hand, P is more than 2 0 contains saturated alkyl (please read the note on the back and fill out this page) This paper scale applies to Chinese national standards (CNS > A4 specification (210X297 mm) -17- 1308770 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (15) (hospital based) oxydecane decomposition temperature is high 'by the plasma display of the present invention In the baking step of the production method, in the state in which the organic substance (the decane derivative) is not decomposed and removed, a part of the organic substance remains in the inorganic layer such as the dielectric layer to be formed, and the dielectric layer is left in the dielectric layer. In the case where the light transmittance is lowered, specific examples of the mercapto group-containing compound represented by the above general formula (2) include n-propyldimethylmethoxydecane and n-butyldimethyl group. Saturated alkyl-methyl methoxy group such as methoxy decane, n-dodecylmethyl methoxy decane, n-hexadecyldimethyl methoxy decane, n-icosyl dimethyl methyl decane Base sands (a = l, m = l, n = l); n-propyl diethyl methoxy decane, n-butyl diethyl methoxy decane, n-decyl diethyl methoxy decane , n-hexadecyl diethyl methoxy decane, n-icosyl diethyl methoxy decane, etc. Saturated alkyl diethyl methoxy oxime (a = l, m == l, n = 2); n-butyldipropyl methoxy decane, n-decyl propyl methoxy decane, Zheng Shi a saturated alkyldipropylmethoxydecane such as hexaalkyldipropylmethoxydecane or n-eicosyldipropylmethoxydecane (a = 1 , m = 1 , η = 3 ); Propyl dimethyl ethoxy decane, n-butyl dimethyl ethoxy decane, n-decyl dimethyl ethoxy decane, n-hexadecyl dimethyl ethoxy decane, n- octadecyl Saturated alkyl dimethyl ethoxy oxime such as methyl ethoxy decane (a = l, m = 2, n = 1) > n-propyl diethyl ethoxy decane, n-butyl bis Ethyl ethoxy decane, n-decyl diethyl ethoxy decane, n-hexadecyl diethyl ethoxy fluorene (please read the back of this page and fill out this page) This paper scale applies to Chinese national standards. (CNS) A4 size (210X29*7 mm) -18· 1308770 Δ7 Α7 Β7 V. Description of invention (Μ) Saturated alkyl diethyl ethoxylate such as alkane, n-icosyl diethyl ethoxy decane Base decanes (a = l, m = 2, n = 2); Read the precautions on the back and fill out this page) n-butyl dipropyl ethoxy decane, n-decyl propyl ethoxy decane, n-hexadecyl dipropyl ethoxy decane, n-icosyl Saturated compound dipropyl ethoxy decane such as dipropyl ethoxy decane (a = 1, m = 2, η = 3); n-propyl dimethyl propoxy decane, n-propyl dimethyl Saturated alkyl dimethyl propyl groups such as propyl propoxy decane, n-decyl dimethyl propoxy decane, n-hexadecyl dimethyl propoxy decane, n-eicosyl dimethyl propoxy decane Oxygenstones (a = l, m = 3, n = l); n-propyldiethylpropoxydecane, n-butyldiethylpropoxydecane, n-decyldiethylpropoxy Saturated alkyl diethyl oxysilane sands such as triethylpropoxy squalane and n-hexadecyl diethylpropoxy decane in the sand courtyard, Zhengliuyuan (a = l, m=3 , n = 2); Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed n-butyl dipropyl propoxy decane, n-decyl propyl propoxy decane, hexadecanthyl dipropyl propoxy sand Orthodecyl propyl propoxy decane Saturated alkyldipropylpropoxydecanes (a = 1 , m = 3 , η = 3 ); n-propylmethyldimethoxydecane, n-butylmethyldimethoxy fluorene, n-decyl Saturated alkylmethyldimethoxy sands such as methyldimethoxydecane, n-hexadecylmethyldimethoxy sulphate, n-icosylmethyldimethoxydecane (a = 2, m = l, n = l); n-propyl ethyl dimethoxy decane, n-butyl ethyl dimethoxy fluorene, n-decyl ethyl dimethoxy decane, n-hexadecyl Ethyldimethoxy sand-19- This paper scale applies to China National Standard (CNS) Α4 specification (210Χ297 mm) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1308770 A7 A7 _B7_ V. Description of invention (17) a saturated alkylethyldimethoxydecane such as n-icosylethyldimethoxydecane (a = 2, m = 1, n = 2); n-butylpropyldimethoxydecane, Saturated alkylpropyl dimethoxydecanes such as n-propyl propyl dimethoxy decane, n-hexadecyl propyl dimethoxy decane, n-icosylpropyl dimethoxy decane a = 2 ' m = 1, η = 3 ); n-propylmethyldiethoxydecane, n-butylmethyldiethoxydecane, n-decylmethyldiethoxylate, hexamethylenemethyl-ethoxy oxacyclohexane, a saturated alkylmethyldiethoxy anthracene such as n-eicosylmethyldiethoxydecane (a = 2, m = 2, n = 1); n-propylethyldiethoxy Decane, n-butylethyldiethoxydecane, n-decylethyldiethoxydecane, n-hexadecylethyldiethoxydecane, n-icosylethyldiethoxydecane, etc. Saturated alkylethyl diethoxy sands (a = 2, m 2, n = 2); n-butyl propyl diethoxy decane, n-decyl propyl diethoxy decane, positive a saturated alkyl propyl diethoxy decane such as cetyl propyl diethoxy decane 'n-hexadecyl propyl diethoxy decane (a = 2, m = 2, η = 3 ) N-propylmethyldipropoxydecane, n-butylmethyldipropoxydecane, n-decylmethyldipropoxydecane, n-hexadecylmethyldipropoxyfluorene, n-icosane Saturated alkylmethyldipropoxy sand such as methyldipropoxydecane Class (a = 2, m=3, n = l); n-propylethyldipropoxydecane, n-butylethyldipropoxydecane, n-decylethyldipropoxydecane, Zhengshi Hexaalkylethyldipropoxy oxime is applicable to China National Standard (CNS) A4 specification (210X297 mm) -20- ---------- (Please read the notes on the back and fill in the form) This page) Book 1308770 7 A7 B7 V. Description of Invention (18) Saturated alkylethyldipropoxydecanes such as alkane, n-icosylethyldipropoxydecane (a = 2, m=3 , n = 2); n-butyl propyl dipropoxy decane, n-decyl propyl dipropoxy fluorene, hexadecanyl propyl dipropoxy decane, n-ecosyl propyl a saturated alkylpropyldipropoxydecane such as propoxydecane (a = 2 ' m = 3, η = 3 ); n-propyltrimethoxydecane, n-butyltrimethoxydecane, n-decyl a saturated alkyltrimethoxynonane such as trimethoxydecane, n-hexadecyltrimethoxydecane or n-icosyltrimethoxydecane (a = 3 ' m = 1 ); n-propyltriethoxy Decane, n-butyltriethoxydecane, ruthenium a saturated alkyl triethoxy decane such as triethoxy decane, n-hexadecyltriethoxy decane or n-icosyltriethoxy decane (a = 3, m = 2); Saturated alkane such as trisethoxypropane, n-butyltripropoxydecane, n-decyltripropoxydecane, n-hexadecyltripropoxydecane, n-icosyltripropoxydecane These are tris-propoxydecanes (a = 3, m = 3), etc., and these may be used alone or in combination of two or more. Among these, n-butyltrimethoxydecane, n-decyltrimethoxydecane, n-hexadecyltrimethoxydecane, n-decyldimethylmethoxydecane, n-hexadecyl Methyl methoxy decane, n-butyl triethoxy decane, n-decyl triethoxy decane, n-hexadecyl triethoxy decane, n-decyl ethyl diethoxy decane, positive hexa Alkylethyldiethoxydecane, n-butyltripropoxydecane, n-decyltripropoxydecane, n-hexadecyl-based paper scale applicable to China National Standard (CNS) A4 specification (210X297 mm) ---------- (Please read the notes on the back and fill out this page) Order the Ministry of Economic Affairs Intellectual Property Bureau staff consumption cooperation Du printing 1308770 A7 B7 V. Description of invention (19) Tripropoxydecane Wait. (Please read the precautions on the back and then fill out this page.) For the content of the compound containing a thiol group, the inorganic particles should be 5 parts by mass or less, more preferably 3 parts by mass or less. When the ratio of the mercapto group-containing compound is too large, the viscosity increases with time when the obtained inorganic particle-containing composition is preserved, and the mercapto group-containing compound causes a reaction with each other, and becomes organic after firing. The cause of the material remaining. When an example of a composition for forming a dielectric layer is used as an example of the composition of the inorganic particle-containing composition, the oxidation of the lead oxide containing the inorganic particles (glass powder) is 50 to 80% by mass. Boron 5~20% by weight, oxidized sand 10 0~3 0% by weight of the mixture 10 〇 by weight and the binder resin polybutylene terephthalate 1 0~3 0 weight points and the specific plasticizer 0 1~1 〇 Weight, solvent propylene glycol monomethyl ether 1 0~5 0 Weight is divided into the components of the essential components. The composition of the present invention is prepared by kneading the above inorganic particles, a binder resin, a specific plasticizer, a solvent, and an optional component by a kneader such as a roller mixer, a mixer, or a homomixer. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives. The composition of the present invention prepared as described above has a slurry composition suitable for coating fluidity, and its viscosity means usually 1, 〇 〇 〇~

30，OOOcP，宜爲 3，000 〜10，00〇cP 〇 本發明之組成物係可特別適用於製造以下詳述的轉印 薄膜（本發明之轉印薄膜）。 又’本發明之組成物，係藉由習用公知的膜形成材料 -22- 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X297公釐） 1308770 A7 ____B7 五、發明説明（20) (請先閲讀背面之注意事項再填寫本頁) 層之形成方法’亦即網版印刷法等可將各該組成物直接塗 布於基板之表面上由乾燥塗膜亦可較合適的使用於形成膜 形成材料層之方法上。 <轉印薄膜> 本發明之轉印薄膜，係較合適使用於P D P之構成要 素的形成步驟’尤其適於介電體層之形成步驟的複合薄膜 ’塗布本發明之組成物至支持薄膜上，具有由乾燥塗膜而 予形成的膜形成材料層而成。 亦即’本發明之轉印薄膜係含有無機粒子、黏結樹脂 及特定可塑劑之膜形成材料層經予形成於支持薄膜上予以 構成。 又’本發明之轉印薄膜係於支持薄膜上形成後述的光 阻膜’塗布本發明之組成物於其上，乾燥而成者亦可。 (1 )轉印薄膜之構成： 經濟部智慧財產局員工消費合作社印製 第2圖（甲）係表示經予捲成捲筒狀的本發明之轉印 薄膜之槪略截面圖，同圖（乙）係表示各該轉印薄膜之層 構成的截面圖〔（甲）之部分詳細圖〕。 第2圖所示的轉印薄膜，係以供形成構成P D P之介 電體層而予使用的複合薄膜作爲本發明之轉印薄膜之一例 ，通常由支持薄膜F 1 ，可予剝離的形成於此支持薄膜F 1之表面上的膜形成材料層F 2及可予容易剝離的設於此 膜形成材料層F 2之表面上的覆蓋薄膜F 3予以構成的。 -23- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 1308770 A7 A7 B7 五、發明説明（21 ) 覆蓋薄膜F 3亦有藉由膜形成材料層F 2之性質而不予使 用的情形。 (請先閱讀背面之注意事項再填寫本頁) 構成轉印薄膜之支持薄膜F 1 ，爲具有耐熱性及耐溶 劑性，同時具有可撓性之樹脂薄膜。由於支持薄膜F 1具 有可撓性，採用輥輪塗布器、刮刀塗布器等可塗布糊狀組 成物（本發明之組成物），由而可形成膜厚均勻的膜形成 材料層，同時以將經予形成的膜形成材料層捲成捲筒狀的 狀態下予以保存，可予供給。 至於形成支持薄膜F 1之樹脂，例如可舉出聚對苯二 甲酸乙二酯、聚酯、聚乙烯、聚丙烯、聚苯乙烯、聚醯亞 胺、聚乙烯醇、聚氯乙烯、聚氟乙烯等的含氟樹脂、耐綸 、纖維素等。至於支持薄膜F 1之厚度，例如可爲2 0〜 1 0 0 # m。 構成轉印薄膜之膜形成材料層F 2，係藉由經予燒成 而成玻璃燒結體（介電體層）之層，含有玻璃粉末（無機 粒子），黏結樹脂及特定可塑劑爲必須成分。 經濟部智慧財產局員工消費合作社印製 至於膜形成材料層F 2之厚度，雖依玻璃粉末之含有 率，面板之種類或尺度等而異，惟例如可爲5〜2 0 0 ，宜爲1 〇〜1 〇 〇 //m。於此厚度未滿5 //in時， 最後經予形成的介電體層之膜厚成爲過小者，未能確保所 期待的介電特性。通常，此厚度若爲10〜1OOym時 ’則可充分確保大型面板所要求的介電體層之膜厚。 構成轉印薄膜之覆蓋薄膜F 3，係爲保護膜形成材料 層F 2之表面（與玻璃基板間之接觸面）而設的薄膜。此 -24- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 1308770 A7 B7 五、發明説明（22) 覆蓋薄膜F 3亦宜爲具有可撓性之樹脂薄膜。至於形成覆 蓋薄膜F 3之樹脂，可舉出已例示作形成支持薄膜F 1者 之樹脂。至於覆蓋薄膜F 3之厚度，例如可爲2 0〜 1 0 0 /z m。 (2 )轉印薄膜之製造方法： 本發明之轉印薄膜，係於支持薄膜（F 1 )上形成膜 形成材料層（F2)，藉由於各該膜形成材料層（F2) 上設置（壓著）覆蓋薄膜（F 3 )可予製造。 至於膜形成材料層之形成方法，係塗布含有無機粒子 、黏結樹脂，特定可塑劑及溶劑之本發明之組成物於支持 薄膜上’乾燥塗膜，去除部分或全部的前述溶劑之方法。 至於塗布本發明之組成物至支持薄膜上的方法，由可 有效的形成膜厚較大（例如2 0 # m以上），膜厚之均句 性優越的塗膜之觀點，可舉出利用輥輪塗布器之方法，利 用刮刀等的刮刀塗布器之塗布方法，利用簾幕塗布器之塗 布方法，利用刮線塗布器之塗布方法等爲較宜的方法。 且’於本發明之組成物經予塗布的支持薄膜之表面上 經予施加脫模處理爲宜。由而，於已轉印薄膜形成材料層 之後，由各該膜形成材料層可容易剝離支持薄膜。 由經予形成於支持薄膜上的本發明之組成物的塗膜， 係藉由經予乾燥’可使部分或全部的溶劑予以去除，成爲 構成轉印薄膜之膜形成材料層。至於本發明之組成物而得 的塗膜之乾燥條件，例如可爲4 0〜1 5 0。(：，〇 . 1〜 本紙張尺度適财@國家標準（CNS ) A4規格（2跑297公釐) ~ ----- ---------— (請先閣讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 1308770 A7 A7 ___B7 五、發明説明（23) (請先閱讀背面之注意事項再填寫本頁) 3 0分鐘。於乾燥後的溶劑之殘存比率（膜形成材料層中 的溶劑之含有比例），通常被指1 〇重量％以下，由使對 基板之黏著性及適度的形狀保持性可予發揮至膜形成材料 層之觀點，宜爲1〜5重量％。 於如上述經予形成的膜形成材料層之上所設置（通常 ’經予熱壓著）的覆蓋薄膜之表面上亦予脫模處理爲宜。 由而在轉印薄膜形成材料層之前，由各該膜形成材料層可 容易剝離覆蓋薄膜。 (3 )膜形成材料層之轉印（轉印薄膜之使用方法） 支持薄膜上之膜形成材料層係全部予以轉印至基板之 表面上。若依本發明之轉印薄膜時，由此種簡單操作可確 的形成膜形成材料層於玻璃基板上，故可謀介電體層等的 P D P之構成要素的形成步驟之步驟改善（高效率化）， 同時可謀經予形成的構成要素之品質提高（例如於介電體 層之已安定的介電特性之顯現）。 經濟部智慧財產局員工消費合作社印製 <PDP之製造方法（介電體層之形成）> 本發明之製造方法，係包含將構成本發明之轉印薄膜 轉印至基板之表面上，藉由燒成經予轉印的膜形成材料層 ’於前述基板之表面上形成介電體層的步驟。 若表示出由第2圖所示的構成之轉印薄膜而得的膜形 成材料層之轉印步驟的一例時，則如下所示。 ①將經予捲成捲筒狀的狀態之轉印薄膜裁切成因應基 -26- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 經濟部智慧財產局員工消費合作社印製 1308770 A7 B7 五、發明説明（24 ) 板之面積的大小。 ② 由已裁切的轉印薄膜之膜形成材料層（F 2 )的表 面剝離覆蓋薄膜（F 3 )後，於基板之表面上使轉印薄膜 疊合至使膜形成材料層（F 2 )之表面頂住般。 ③ 使加熱輥輪移動於經予疊合至基板上之轉印薄膜上 並使熱壓著。 ④ 由藉熱壓著使予固定於基板上的膜形成材料層（ F2)剝離去除支持薄膜（F1)。 由上述的操作，可使支持薄膜（F 1 )上的膜形成材 料層（F 2 )轉印至基板上。在此，至於轉印條件，例如 可指爲加熱輥輪之表面溫度爲6 0〜1 2 0°C，利用加熱 輥輪之輥輪壓力爲1〜5 k g/cm2，加熱輥輪之移動速 度爲0 · 2〜1 0 · 〇m/分鐘。此種操作（轉印步騾） 係可依層合機裝置予以進行。且基板係予預熱亦可。至於 預熱溫度例如可設爲4 0〜1 0 。 經予轉印形成於基板之表面上的膜形成材料層（F 2 )係予以燒成並成爲無機燒結體（介電體層）。在此，至 於燒成方法，可舉出於高溫氣圍下配置膜形成材料層（ F 2 )經予轉印形成的基板之方法。由而，經予含有於膜 形成材料層（F 2 )的有機物質（例如黏結樹脂，殘存溶 劑’特定可塑劑，各種添加劑）經分解且可予去除，使無 機粒子熔融並燒結。在此’至於燒成溫度，雖依基板之熔 融溫度，膜形成材料層中的構成物質等不同而異，惟例如 被指有300〜800 °C，更宜爲4〇〇〜600 °C。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公楚） (請先閲讀背面之注意事項再填寫本頁)30, OOOcP, preferably 3,000 to 10,00 〇 cP 〇 The composition of the present invention is particularly suitable for the production of a transfer film (transfer film of the present invention) as described in detail below. Further, the composition of the present invention is a conventionally known film forming material-22- This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210 X297 mm) 1308770 A7 ____B7 V. Invention Description (20) (Please Read the back of the precautions and fill out this page. The method of forming the layer, that is, the screen printing method, etc., can directly apply the composition to the surface of the substrate. The dried coating film can also be suitably used to form a film. The method of material layer. <Transfer film> The transfer film of the present invention is preferably used in the formation step of the constituent elements of the PDP, and the composite film which is particularly suitable for the step of forming the dielectric layer is coated with the composition of the present invention onto the support film. It has a film forming material layer formed by drying a coating film. That is, the transfer film of the present invention is composed of a film forming material layer containing inorganic particles, a binder resin and a specific plasticizer, which is formed on a support film. Further, the transfer film of the present invention is formed by forming a photoresist film described later on a support film, onto which the composition of the present invention is applied, and dried. (1) Composition of transfer film: Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperative, Printing 2 (a) shows a schematic cross-sectional view of the transfer film of the present invention which is wound into a roll shape, the same figure ( B) is a cross-sectional view showing a layer structure of each of the transfer films [partial detailed view of (a)]. The transfer film shown in Fig. 2 is an example of a transfer film to be used for forming a dielectric layer constituting a PDP, and is usually formed of a support film F 1 and can be peeled off. The film forming material layer F 2 on the surface of the support film F 1 and the cover film F 3 provided on the surface of the film forming material layer F 2 which can be easily peeled off are formed. -23- This paper scale is applicable to China National Standard (CNS) A4 specification (210X297 mm) 1308770 A7 A7 B7 V. Invention description (21) Cover film F 3 also has the property of film forming material layer F 2 The situation of use. (Please read the precautions on the back side and fill out this page.) The support film F 1 constituting the transfer film is a resin film which has heat resistance and solvent resistance and has flexibility. Since the support film F 1 has flexibility, a paste composition (the composition of the present invention) can be applied by a roll coater, a knife coater or the like, whereby a film forming material layer having a uniform film thickness can be formed, and at the same time The formed film forming material layer is stored in a roll shape and can be stored. Examples of the resin forming the support film F 1 include polyethylene terephthalate, polyester, polyethylene, polypropylene, polystyrene, polyimine, polyvinyl alcohol, polyvinyl chloride, and polyfluoride. A fluorine-containing resin such as ethylene, nylon, cellulose, or the like. As for the thickness of the support film F 1 , for example, it may be 20 to 1 0 0 # m. The film forming material layer F 2 constituting the transfer film is a layer of a glass sintered body (dielectric layer) which is pre-fired to contain a glass powder (inorganic particles), and a binder resin and a specific plasticizer are essential components. The thickness of the film forming material layer F 2 printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs varies depending on the content of the glass powder, the type or scale of the panel, etc., but may be, for example, 5 to 200, preferably 1 〇~1 〇〇//m. When the thickness is less than 5 //in, the film thickness of the dielectric layer which is finally formed is too small, and the desired dielectric characteristics are not ensured. Generally, when the thickness is 10 to 100 μm, the film thickness of the dielectric layer required for a large panel can be sufficiently ensured. The cover film F 3 constituting the transfer film is a film provided on the surface (contact surface with the glass substrate) of the protective film forming material layer F 2 . This -24- This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) 1308770 A7 B7 V. Inventive Note (22) The cover film F 3 is also preferably a flexible resin film. As the resin for forming the cover film F 3 , a resin which has been exemplified as the support film F 1 can be exemplified. As for the thickness of the cover film F 3 , for example, it may be 20 to 1 0 0 /z m. (2) Manufacturing method of transfer film: The transfer film of the present invention is formed on the support film (F 1 ) to form a film forming material layer (F2), which is provided by each of the film forming material layers (F2) The cover film (F 3 ) can be manufactured. As for the method of forming the film-forming material layer, a method of coating a film of the present invention containing an inorganic particle, a binder resin, a specific plasticizer and a solvent onto the support film to dry the coating film and removing part or all of the solvent is applied. As for the method of applying the composition of the present invention to the support film, a roll having a large film thickness (for example, 20 #m or more) and a uniform film thickness can be effectively used. The method of the wheel coater is a coating method using a doctor blade such as a doctor blade, a coating method using a curtain coater, a coating method using a wire coater, or the like is a preferred method. Further, it is preferred to apply a release treatment to the surface of the support film to which the composition of the present invention is applied. Thus, after the film forming material layer has been transferred, the support film can be easily peeled off from each of the film forming material layers. The coating film of the composition of the present invention which is formed on the support film can be partially or completely removed by pre-drying to form a film forming material layer constituting the transfer film. The drying conditions of the coating film obtained by the composition of the present invention may be, for example, from 40 to 150. (:,〇. 1~ This paper scale is suitable for the price @国标准(CNS) A4 specification (2 runs 297 mm) ~ ----- ---------- (Please read the back of the cabinet Precautions and then fill out this page) Order Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1308770 A7 A7 ___B7 V. Invention Description (23) (Please read the note on the back and fill out this page) 3 0 minutes. After drying The residual ratio of the solvent (the ratio of the solvent in the film-forming material layer) is usually 1% by weight or less, and the adhesion to the substrate and the appropriate shape retention can be exhibited to the film-forming material layer. It is preferably 1 to 5% by weight. It is also preferred to release the coating on the surface of the cover film (usually 'pre-heated) on the film-forming material layer formed as described above. Before the film forming material layer, the cover film can be easily peeled off by each of the film forming material layers. (3) Transfer of film forming material layer (use method of transfer film) The film forming material layer on the supporting film is all transferred. To the surface of the substrate. If the transfer film according to the invention When the film formation material layer is formed on the glass substrate by such a simple operation, the steps of forming the constituent elements of the PDP such as the dielectric layer can be improved (high efficiency), and at the same time, it can be formed. The quality of the constituent elements is improved (for example, the appearance of the stabilized dielectric properties of the dielectric layer). The Ministry of Economic Affairs, the Intellectual Property Office, the employee consumption cooperative, the printing method (the formation of the dielectric layer) > The manufacturing method includes a step of transferring a transfer film constituting the present invention onto a surface of a substrate, and forming a dielectric layer on the surface of the substrate by firing the pre-transferred film forming material layer. When an example of the transfer step of the film forming material layer obtained by the transfer film having the configuration shown in Fig. 2 is shown, the following is shown: 1. The transfer film is rolled into a roll shape. Cut into the basis -26- This paper scale applies Chinese National Standard (CNS) A4 specification (210X297 mm) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 1308770 A7 B7 V. Invention description (24) 2 After the surface of the film-forming material layer (F 2 ) of the cut transfer film is peeled off from the cover film (F 3 ), the transfer film is laminated on the surface of the substrate to the film-forming material layer ( The surface of F 2 ) is held up. 3 The heating roller is moved to the transfer film which is superimposed on the substrate and is pressed by heat. 4 The film forming material is fixed on the substrate by heat pressing. The layer (F2) is peeled off to remove the support film (F1). By the above operation, the film forming material layer (F 2 ) on the support film (F 1 ) can be transferred onto the substrate. Here, as for the transfer conditions, for example It can be said that the surface temperature of the heating roller is 60 to 1 2 0 ° C, the roller pressure of the heating roller is 1 to 5 kg/cm 2 , and the moving speed of the heating roller is 0 · 2 to 1 0 · 〇 m/min. This operation (transfer step) can be carried out according to the laminator device. The substrate may be preheated. As for the preheating temperature, for example, it can be set to 40 to 1 0. The film forming material layer (F 2 ) which is formed by transfer onto the surface of the substrate is fired to form an inorganic sintered body (dielectric layer). Here, as for the firing method, a method of arranging a substrate formed by pre-transfer a film forming material layer (F 2 ) under a high temperature gas atmosphere can be mentioned. Thus, the organic substance (e.g., the binder resin, the residual solvent-specific plasticizer, various additives) contained in the film-forming material layer (F 2 ) is decomposed and removed, and the inorganic particles are melted and sintered. Here, the firing temperature varies depending on the melting temperature of the substrate, the constituent materials in the film forming material layer, and the like, but is, for example, 300 to 800 ° C, more preferably 4 to 600 ° C. This paper scale applies to China National Standard (CNS) A4 specification (210X297 public Chu) (please read the notes on the back and fill out this page)

-27- 1308770 A7 B7 五、發明説明（25) < P D P之製造方法（利用光阻法之構成要素的形成）> f請先閱讀背面之注意事項再填寫本頁) 本發明之製造方法，係包含將構成本發明之轉印薄膜 的膜形成材料層轉印至基板上，於經予轉印的膜形成材料 層上形成光阻膜，曝光處理各該光阻膜並形成光阻圖案之 潛影’顯影處理各該光阻膜並使光阻圖案顯在化，蝕刻處 理各該膜形成材料層並形成對應於光阻圖案之圖案層，藉 由燒成處理各該圖案層，形成由間隔壁、電極、電阻體、 介電體層' 螢光體、濾色片及黑色基質選出的構成要素之 步驟。 經濟部智慧財產局8工消費合作社印製 或含有於支持薄膜上形成光阻膜及由本發明之含無機 粒子組成物之膜形成材料層之層合膜上，轉印經予形成於 支持薄膜上的層合膜於基板上，曝光處理構成各該層合膜 之光阻膜並形成光阻圖案之潛影，顯影處理各該光阻膜並 使光阻圖案顯在化’蝕刻處理各該膜形成材料層並形成對 應於光阻圖案之圖案層，藉由燒成處理各該圖案層，形成 由間隔壁、電極、電阻體、介電體層、螢光體、濾色片及 黑色基質選出的構成要素之步驟。 或含有於支持薄膜上形成與由本發明之含無機粒子組 成物而得的膜形成材料層間之層合膜，將經予形成於支持 薄膜上的層合膜轉印至基板上，曝光處理構成各該層合膜 之光阻膜’並形成光阻圖案之潛影，顯影處理各該光阻膜 並使光阻圖案顯在化，蝕刻處理各該膜形成材料層並形成 對應於光阻圖案之圖案層，藉由燒成處理各該圖案層，形 本紙張尺度適用中國國家標準（CNS > A4規格（210X297公釐） -28- A7 B7 1308770 五、發明説明（26) 成由間隔壁、電極、電阻體、介電體層、螢光體、濾色片 及黑色基質選出的構成要件之步驟。 以下說明於背面基板上的表面上形成P D P之構成要 素的「間隔壁」之方法。於此方法，係藉由〔1〕膜形成 材料層之轉印步驟，〔2〕光阻膜之形成步驟，〔3〕光 阻膜之曝光步驟，〔4〕光阻膜之顯影步驟，〔5〕膜形 成材料層之蝕刻步驟，〔6〕間隔壁圖案之燒成步驟，於 基板之表面上可形成間隔壁。 第3圖及第4圖係表示爲形成間隔壁而用的一系列之 步驟的槪略截面圖。於第3圖及第4圖，11係玻璃基板 ’於此玻璃基板上爲使發生電漿而用的電極1 2係予等間 隔的排列，於玻璃基板1 1之表面上形成介電體層1 3至 使被覆電極1 2。 且於本發明，至於「轉印膜形成材料層至基板上」態 樣’除轉印至前述玻璃基板1 1之表面上的態樣之外，亦 設成包含有轉印至前述介電體層13之表面上的態樣。 (1)膜形成材料層之轉印步驟 若表示膜形成材料層之轉印步驟之一例時，例如下所 示0 剝離轉印薄膜之覆蓋薄膜（圖示省略）後，如第3圖 (乙）所示’於介電體層1 3之表面上使轉印薄膜1 〇層 合至使膜形成材料層2 1之表面頂住般，由加熱輥輪等熱 壓著此轉印薄膜2 0後，由膜形成材料層2 1剝離去除支 本紙張尺度適用中@@豕樣準（CNS ) ( 210X297公釐） ----------- (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -29 - 1308770 A7 I-----B7 五、發明説明（27 ) (請先閱讀背面之注意事項再填寫本頁) 持薄膜2 2。由而如第3圖（丙）所示，成爲使膜形成材 料層2 1轉印至介電體層1 3之表面上並予附著的狀態。 在此’至於轉印條件’例如可表示出加熱輥輪之表面溫度 爲8〇〜140 °C，利用加熱輥輪之輥輪壓力爲1〜5 kg/cm2,加熱輥輪之移動速度爲〇 . 1〜1〇 _ 〇m /分鐘。又’玻璃基板1 1係經予預熱亦可，至於預熱溫 度可爲例如40〜loot。 (2 )光阻膜之形成步驟： 於此步驟’如第3圖（丁）所示，於經予轉印的膜形 成材料層21之表面上形成光阻膜31。至於構成此光阻 膜3 1之光阻，亦可爲正片型光阻及負片型光阻之任一種 〇 光阻膜（3 1 )係藉由網版印刷法、輥輪塗布法、旋 轉塗布法、流展塗布法等各種方法塗布光阻後，由乾燥塗 膜可予形成。在此，塗膜之乾燥溫度係指通常6 0〜 1 3 0 t程度。 經濟部智慧財產局員工消費合作社印製 又，藉由轉印，經予形成於支持薄膜至膜形成材料層 (2 1 )之表面上亦可。若依此形成方法時，則可減少光 阻膜之形成步驟數，同時所得的光阻膜之膜厚均勻性係成 爲優越者，可使各該光阻膜之顯影處理及膜形成材料層之 蝕刻處理均勻進行，成爲經予形成的間隔壁之高度及形狀 者。 至於光阻膜（5 1 )之膜厚，通常係指0 . 1〜4 0 -30- 本紙張尺度適用中國國家樣準（CNS ) A4規格（2丨0X297公釐） 1308770 A7 _ B7 五、發明説明（28 )-27- 1308770 A7 B7 V. INSTRUCTION DESCRIPTION (25) <Production method of PDP (formation of constituent elements by photoresist method)> fPlease read the precautions on the back side and then fill in this page) Manufacturing method of the present invention And comprising transferring a film forming material layer constituting the transfer film of the present invention onto a substrate, forming a photoresist film on the pre-transferred film forming material layer, exposing each of the photoresist films and forming a photoresist pattern The latent image 'developing and processing each of the photoresist films and visualizing the photoresist pattern, etching each of the film forming material layers and forming a pattern layer corresponding to the photoresist pattern, and forming each of the pattern layers by firing A step of forming a component selected from the partition wall, the electrode, the resistor, the dielectric layer 'fluorescent body, the color filter, and the black matrix. The printed matter film printed on the supporting film and the film forming material layer of the inorganic particle-containing composition of the present invention is printed on the laminated film of the film forming material layer of the inorganic film composition of the present invention, and the transfer is formed on the supporting film. The laminated film is formed on the substrate, and the photoresist film of each of the laminated films is formed by exposure treatment to form a latent image of the photoresist pattern, and each of the photoresist films is developed and the photoresist pattern is visualized. Forming a material layer and forming a pattern layer corresponding to the photoresist pattern, and each of the pattern layers is formed by firing to form a partition wall, an electrode, a resistor, a dielectric layer, a phosphor, a color filter, and a black matrix. The steps to form the elements. Or a laminate film formed on the support film and formed between the layers of the film-forming material composed of the inorganic particle-containing composition of the present invention, and the laminate film formed on the support film is transferred onto the substrate, and the exposure treatment is performed. Forming a photoresist film of the film and forming a latent image of the photoresist pattern, developing and curing each of the photoresist films, and etching each of the film forming material layers to form a photoresist pattern corresponding to the photoresist pattern The pattern layer is processed by firing to form each of the pattern layers, and the paper size is applicable to the Chinese national standard (CNS > A4 specification (210×297 mm) -28- A7 B7 1308770. 5. Invention description (26) A step of forming a constituent element of an electrode, a resistor, a dielectric layer, a phosphor, a color filter, and a black matrix. Hereinafter, a method of forming a "partition wall" of a component of a PDP on a surface on a rear substrate will be described. The method comprises the steps of: [1] a film forming material layer transfer step, [2] a photoresist film forming step, [3] a photoresist film exposure step, [4] a photoresist film developing step, [5] Eclipse of film forming material layer In the engraving step, [6] the step of firing the partition pattern forms a partition on the surface of the substrate. Fig. 3 and Fig. 4 are schematic cross-sectional views showing a series of steps for forming the partition. In Fig. 3 and Fig. 4, an 11-type glass substrate is formed on the surface of the glass substrate 1 by placing an electrode 12 on the glass substrate at equal intervals on the surface of the glass substrate 1 3 to the coating electrode 1 2. In the present invention, the "transfer film forming material layer to the substrate" aspect is also included in addition to the aspect of being transferred onto the surface of the glass substrate 1 1 There is a pattern transferred onto the surface of the dielectric layer 13. (1) Transfer step of the film forming material layer When an example of a transfer step of the film forming material layer is shown, for example, a 0 peeling transfer film is shown below. After the cover film (not shown), as shown in FIG. 3(B), the transfer film 1 is laminated on the surface of the dielectric layer 13 to the surface of the film-forming material layer 2 1 After the transfer film 20 is heat-pressed by a heating roller or the like, the film forming material layer 2 1 is peeled off and removed. This paper size is applicable @@豕样准 (CNS) (210X297 mm) ----------- (Please read the notes on the back and fill out this page) Co-operative printing -29 - 1308770 A7 I-----B7 V. Invention description (27) (Please read the note on the back and fill out this page) Hold the film 2 2. As shown in Figure 3 (c) In the state where the film forming material layer 2 1 is transferred onto the surface of the dielectric layer 13 and adhered thereto, the 'transfer condition' can be expressed, for example, that the surface temperature of the heating roller is 8 〇 140 140 °C, the roller pressure of the heating roller is 1~5 kg/cm2, and the moving speed of the heating roller is 〇. 1~1〇_ 〇m / minute. Further, the glass substrate 11 may be preheated, and the preheating temperature may be, for example, 40 to loot. (2) Step of forming a photoresist film: In this step, as shown in Fig. 3 (d), a photoresist film 31 is formed on the surface of the film material layer 21 to be transferred. As for the photoresist constituting the photoresist film 31, any of the positive-type photoresist and the negative-type photoresist may be a photoresist film (3 1 ) by screen printing, roller coating, spin coating. After the photoresist is applied by various methods such as a method and a flow coating method, a dried coating film can be formed. Here, the drying temperature of the coating film means usually about 60 to 130 tons. The Ministry of Economic Affairs, the Intellectual Property Office, and the employee consumption cooperative are also printed on the surface of the support film to the film forming material layer (2 1 ) by transfer. According to this formation method, the number of steps of forming the photoresist film can be reduced, and the film thickness uniformity of the obtained photoresist film is superior, and the development process of each of the photoresist films and the film formation material layer can be performed. The etching treatment is performed uniformly, and becomes the height and shape of the partition walls to be formed. As for the film thickness of the photoresist film (5 1 ), it usually means 0. 1~4 0 -30- This paper size is applicable to China National Standard (CNS) A4 specification (2丨0X297 mm) 1308770 A7 _ B7 V. Description of invention (28)

Am，宜爲〇.5〜2〇#m。 (請先閱讀背面之注意事項再填寫本頁) (3)光阻膜之曝光步驟： 於此步驟，如第3圖（戊）所示於經予形成於膜形成 材料層2 1上的光阻膜3 1之表面上，介由曝光用光罩Μ ，選擇性的照射（曝光）紫外線等的放射線，形成光阻圖 案之潛影》於同圖，ΜΑ及MB各自係於曝光用光罩Μ之 透光部及遮光部。 在此，至於放射線照射裝置，係前述光微影法所使用 的紫外線照射裝置，製造半導體及液晶顯示裝置之際所使 用的曝光裝置等並未予特別限定者。 (4 )光阻膜之顯影步驟： 於此步驟，藉由顯影處理經予曝光的光阻膜，可使光 阻圖案（潛影）顯在化。 經濟部智慧財產局員工消費合作社印製 在此，至於顯影處理條件，因應光阻膜（3 1 )之種 類等，可適當選擇顯影液之種類、組成、濃度、顯影溫度 、顯影方法（例如浸漬法、搖動法、沖淋法、噴布法、漿 葉法），顯影裝置等。 藉由此顯影步驟，如第4圖（己）所示，形成著由光 阻殘留部3 5 A及光阻去除部3 5 B所構成的光阻圖案 3 5 (對應於曝光用光罩Μ之圖案）。 此光阻圖案3 5係作用成於下一步驟（餓亥[|步驟）之 蝕刻光罩者，光阻殘留部3 5 Α之構成材料（經予光硬化 -31 - 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） 1308770 A7 B7 29 五、發明説明（ 的光阻）係對蝕刻液之溶解度亦較膜形成材料層2 i之構 成材料小一事爲必需的。 (請先閲讀背面之注意事項再填寫本頁) (5)膜形成材料層之蝕刻步騾： 於此步驟’餓刻處理膜形成材料層，形成對應於光阻 圖案之間隔壁圖案層。 亦即’如第4圖（庚），膜形成材料層2 1之中，對 應於光阻圖案3 5之光阻去除（3 5 B )的部分係經予溶 解於餓刻液內並予選擇性的去除。在此，第4圖（庚）係 表示著蝕刻處理中的狀態。 因此，若再繼續蝕刻處理時，則如第4圖（辛）所示 於膜形成材料層（2 1 )之指定的部分經予完全去除並使 介電體層1 3露出。由而，由材料層殘留部2 5 A及材料 層去除部2 5 B所構成的間隔壁圖案層2 5可予形成。 經濟部智慧財產局員工消費合作社印製 在此’至於蝕刻處理條件，因應膜形成材料層（2 1 )之種類等，可適當的選擇蝕刻液之種類、組成、濃度、 處理時間、處理溫度、處理方法（例如浸漬法、搖動法、 沖淋法、噴布法、漿葉法）、處理裝置等。 且，至於蝕刻液藉由選擇光阻膜（3 1 )及膜形成材 料層（2 1 )之種類，至使用與在顯影步驟使用的顯影液 相同的溶液，使連續的實施顯影步驟，及蝕刻步驟成爲可 能，可謀提高由步驟之簡單化而得的製造效率。 在此，構成光阻圖案（3 5)之光阻殘留部（3 5A )，在蝕刻處理之際經予徐徐的溶解，在間隔壁圖案層（ -32- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 1308770 A7 B7 五、發明説明（3〇 ) 2 5 )經予形成的階段（蝕刻處理結束時）可予完全的去 除者爲宜。 (請先聞讀背面之注意事項再填寫本頁} 且，於蝕刻處理後，即使光阻殘留部（3 5 A )之一 部份或全部殘存著，各該光阻殘留部（3 5 A )亦以下述 的燒成步驟予以去除。 (6 )間隔壁圖案層之燒成步驟：Am, should be 〇.5~2〇#m. (Please read the precautions on the back and fill out this page.) (3) Exposure step of photoresist film: In this step, light which is formed on the film forming material layer 2 1 as shown in Fig. 3 (e) On the surface of the resist film 31, a latent image of a photoresist pattern is formed by selectively irradiating (exposing) radiation such as ultraviolet rays through a mask for exposure, in the same figure, and each of the MB is attached to the exposure mask. The light transmission part and the light shielding part of the Μ. Here, the radiation irradiation device is not particularly limited as long as it is an ultraviolet irradiation device used in the photolithography method and an exposure device used for manufacturing a semiconductor or a liquid crystal display device. (4) Developing step of the photoresist film: In this step, the photoresist pattern (latent image) can be made apparent by developing the pre-exposed photoresist film. The Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs is printed here. As for the development processing conditions, depending on the type of the photoresist film (31), the type, composition, concentration, development temperature, and development method (for example, impregnation) of the developer can be appropriately selected. Method, shaking method, shower method, spray method, pulp method), developing device, and the like. By this development step, as shown in FIG. 4, a photoresist pattern 35 composed of the photoresist residual portion 35A and the photoresist removal portion 35B is formed (corresponding to the exposure mask Μ) Pattern). The photoresist pattern 35 is applied to the next step (the etch mask of the hungry [|step], the constituent material of the photoresist residual portion 3 5 ( (pre-photohardened -31 - the paper scale applies to the Chinese country) Standard (CNS) Α4 size (210X297 mm) 1308770 A7 B7 29 5. The invention (resistance of photoresist) is necessary for the solubility of the etching solution to be smaller than the constituent material of the film forming material layer 2 i. (Note) The etching step of the film forming material layer: In this step, the film forming material layer is treated in a hungry manner to form a partition pattern layer corresponding to the photoresist pattern. In Fig. 4 (g), among the film-forming material layer 2 1, a portion corresponding to the photoresist removal (3 5 B ) of the photoresist pattern 35 is preliminarily dissolved in the stagnation liquid and selectively removed. Here, Fig. 4 (g) shows the state in the etching process. Therefore, when the etching process is resumed, the specified portion of the film forming material layer (2 1 ) is shown in Fig. 4 (Xin). Completely removed and exposed to the dielectric layer 13. Thus, the material layer remains The partition pattern layer 25 formed by the 2 5 A and the material layer removing portion 2 5 B can be formed. The Ministry of Economic Affairs Intellectual Property Office employee consumption cooperative prints here as to the etching processing conditions, in response to the film forming material layer (2 1 The type, composition, concentration, processing time, processing temperature, and treatment method (for example, dipping method, shaking method, shower method, spray method, pulp method), processing device, etc. of the etching solution can be appropriately selected. Further, as for the etching liquid, the developing step is continuously performed by selecting the type of the photoresist film (31) and the film forming material layer (2 1 ) to the same solution as the developing solution used in the developing step, and The etching step is possible, and the manufacturing efficiency obtained by the simplification of the steps can be improved. Here, the photoresist residual portion (35A) constituting the photoresist pattern (35) is slowly dissolved during the etching process. In the partition pattern layer (-32- This paper scale applies Chinese National Standard (CNS) A4 specification (210X297 mm) 1308770 A7 B7 V. Invention description (3〇) 2 5 ) Stage of formation (end of etching process) Time) It is advisable to remove it completely. (Please read the precautions on the back and fill out this page.) After the etching process, even if some or all of the photoresist residue (3 5 A ) remains, The photoresist residual portion (3 5 A ) is also removed by the following firing step. (6) The step of firing the partition pattern layer:

、1T 於此步驟’燒成處理間隔壁圖案層（2 5 )並形成間 隔壁。由而，材料層殘留部2 5 A中的有機物質燒失並可 予形成間隔壁，如第4圖（壬）所示的介電體層1 3之表 面上可得間隔壁4 0經予形成而成的面板材料5 0。於此 面板材料5 0，由間隔壁4 0可予劃分的空間（源自材料 層去除部2 5 B之空間）係成爲電漿作用空間。 在此，至於燒成處理之溫度’係以需爲材料層殘留部 (2 5 A )中的有機物質經予燒失的溫度爲必要，通常被 指爲4 0 0〜6 0 0 °C。又，燒成時間通常係指1 〇〜 9 0分鐘。 經濟部智慧財產局員工消費合作社印製 <利用光阻法之較宜的實施形態> 於本發明之PDP的形成方法，並非受第3圖及第4 圖所示的方法所限定者。 在此，至於爲形成P D P之構成要素而用的其他較宜 方法，可舉出下述（1)〜（3)之步驟的形成方法。 (1 )於支持薄膜上形成光阻膜後，藉由塗布、乾燥 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 33- 1308770 A7 B7 五、發明説明（31 ) (請先閱讀背面之注意事項再填寫本頁) 本發明之含無機粒子組成物於各該光阻膜上，層合形成膜 形成材料層。在此’於形成光阻膜及膜形成材料層之際， 可使用輕輪塗布器等，由而，於支持薄膜上可形成膜厚之 均勻性優越的層合膜。 (2 )將經予形成於支持薄膜上的光阻膜及膜形成材 料層之層合膜轉印至基板上。在此，轉印條件係以與於前 述「膜形成材料層之轉印步驟」之條件相同即可。 (3 )進行與前述「光阻膜之曝光步驟」、「光阻膜 之顯影步騾」、「膜形成材料層之蝕刻步驟」及「間隔壁 圖案層之燒成步騾」相同的操作。該時際如前述般以光阻 膜之顯影液及膜形成材料層之蝕刻液爲相同的溶液，連續 的實施「光阻膜之顯影步驟」及「膜形成材料層之蝕刻步 驟」爲宜。 若依以上的方法時，則膜形成材料層及光阻膜係全部 經予轉印至基板上，故藉由步驟之簡單化可使製造效率更 提高。 經濟部智慧財產局員工消費合作社印製 於以上，說明形成「間隔壁」作爲P D P之構成要素 之方法，惟依此方法爲準，亦可形成構成p D P之電極、 電阻體 '介電體層、螢光體、濾色片及黑色基質等。 〔實施例〕 以下說明本發明之實施例，惟本發明並非受此等所限 定者。' 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） A7 1308770 B7 五、發明説明（32 ) (實施例1 ) (1 )玻璃漿組成物（含無機粒子組成物）之製備： (請先間讀背面之注意事項再填寫本頁) 採用分散機藉由混練玻璃粉末（無機粒子）之具有氧 化鉛7 0重量％，氧化硼1 0重量％，二氧化矽2 0重量 %之組成的P b ◦ — B2〇3 — S i 〇2系之混合物（軟化 溫度500 °C) 100分，黏結樹脂之甲基丙烯酸丁酯. 甲基丙烯酸2 -乙己基酯/甲基丙烯酸羥丙基酯共聚物（ 重量比3 0/6 0/1 0，重量平均分子量： 1 0 0, 000) 17分，特定可塑劑之丙三醇一 1，2 -二乙醯基- 3 -單月桂酸酯4分，含甲矽基化合物之正 癸基三甲氧基矽烷0.5分，溶劑之丙二醇單甲醚 34.3分，製備黏度3000cP之本發明之組成物。 (2 )轉印薄膜之製造評估（可撓性•處理性）： 經濟部智慧財產局8工消費合作社印製 採用刮刀塗布器塗布上述（1 )製備的本發明之組成 物於事先已脫模處理的聚對苯二甲酸乙二酯（P E T )而 成的支持薄膜（寬度4 0 0mm，長度3 〇m ’厚度3 8 // m )上，藉由在1 〇 〇 °c乾燥經予形成的塗膜5分鐘’ 去除溶劑，由而於支持薄膜上形成厚度5 0 之膜形成 材料層。其次，藉由貼合由事先已脫模處理的P E T而成 之覆蓋薄膜（寬度400mm，厚度25//m) ’於各該 膜形成材料層上，製造具有第2圖所示的構成之本發明之 轉印薄膜。 所得的轉印薄膜係具有柔軟性，可容易的進行捲取成 -35- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 1308770 A7 B7 五、發明説明（33 ) (請先閱讀背面之注意事項再填寫本頁) 捲筒狀的操作。又即使彎折此轉印薄膜，於膜形成材料層 之表面上亦不生成罅隙（屈曲龜裂），各該膜形成材料層 係具有優越的可撓性者。 又由此轉印薄膜剝離覆蓋薄膜，在不加壓各該轉印薄 膜（支持薄膜及膜形成材料層之層合體）下使疊合至膜形 成材料層之表面頂住玻璃基板之表面上，其次由玻璃基板 之表面剝離各該轉印薄膜時，各該膜形成材料層對玻璃基 板顯示出適度的黏著性，而且可剝離對各該膜形成材料層 不引起凝集破壞的轉印薄膜，至於轉印薄膜之處理性係良 好者。 (3 )膜形成材料層之轉印 經濟部智慧財產局員工消費合作社印製 由利用上述（2 )而得的轉印薄膜剝離覆蓋薄膜後， 使各該轉印薄膜（支持薄膜及膜形成材料層之層合體）於 2 0英吋面板用的玻璃基板之表面（母線電極之固定面） 至使膜形成材料層之表面頂住，藉由加熱輥輪熱壓著此轉 印薄膜。在此，至於壓著條件，係以加熱輥輪之表面溫度 爲1 1 0°C，輥輪壓力爲3 k g/cm，加熱輥輪之移動 速度爲1 in /分鐘。 熱壓著處理結束後，由經予固定（加熱接著）至玻璃 基板之表面上的膜形成材料層剝離去除支持薄膜，結束各 該膜形成材料層之轉印。 於此轉印步驟，剝離支持薄膜時，在膜形成材料層不 引起凝集破壞下，各該膜形成材料層係具有足夠大的膜強 -36- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 1308770 A7 B7 五、發明説明（34 ) 度者。再者，經予轉印的膜形成材料層對玻璃基板之表面 係具有良好的黏著性者。 (請先閱讀背面之注意事項再填寫本頁) (4 )膜形成材料層之燒成（介電體層之形成） 將由上述（3)已轉印形成膜形成材料層之玻璃基板 配置於燒成爐內，以1 〇 r/分鐘之升溫速度由常溫升溫 爐內的溫度至5 9 0 T：，在5 9 Ot之溫度氣圍下經3 0 分鐘進行燒成處理，於玻璃基板之表面上形成由玻璃燒結 體而成之無色透明的介電體層。 在測定此介電體層之膜厚（平均膜厚及公差）時在 30//m±〇 · 4//m之範圍，爲膜厚之均勻性優越者。 又，對所得的介電體層之表面，採用非接觸膜厚計（ 菱光公司製造，NH - 3)實施三維測定，以J I S標準 (B0601)爲準求取表面粗糙度（Ra、Rb、Rc )時，爲 Ra = 〇 . 23vm，Rb = 0 . 90/zm， R c = 〇 . 5 5 /2 m，表面平滑性優越者。（滿足R a = 0 . 以下，Rb = l . 5//m 以下，Rc = l . 〇 經濟部智慧財產局員工消費合作社印製 // m以下的全部者作爲表面平滑性良好》 再者，如此製作出由具有介電體層之基板而成的面板 材料5份，測定經予形成的介電體層之透光率（測定波長 6 0 0 nm)時爲8 9%，被發現有良好的透明性者。 <實施例2 > 除玻璃粉末中含有鉛粉末2重量％外，以與實施例1 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ^ ' 1308770 A7 B7 五、發明説明（35 ) 相同組成，相同方法製備玻璃漿組成物。其後’與實施例 同法製造轉印薄膜，與實施例1同法形成介電體層。 測定此介電體層之膜厚（平均膜厚及公差）時’爲在 3 0 //m± 〇 . 5 之範圍，與實施例1同法形成介電 體層。 又，對所得的介電體層之表面，以與實施例1同法求 取表面粗糙度（Ra、Rb、Rc)時，爲Ra = 0 · 25;/m，Rb = 0 .94#m，Rc = 〇 . 57 // m，表面平滑性優越者。 再者，如此製作出由具有介電體層之基板而成的面板 材料5份，測定經予形成的介電體層之透光率（測定波長 6 0 0 n m )時爲8 9 %，被發現有良好的透明性者。 發明之功效 若依本發明之組成物時，則可達下述的功效。 (1) 可較合適的形成表面平滑性優越的PDP之構 成要素（例如間隔壁、電極、電阻體、介電體層、螢光體 、濾色片、黑色基質）。 (2) 可較合適的形成具有較高的透光率之玻璃燒結 體（例如構成P D P之介電體層、間隔壁）。 (3) 可製造出膜形成材料層之可撓性優越的轉印薄 膜。 (4 )可製造出膜形成材料層之轉印性（對基板之加 熱接著性）優越的轉印薄膜。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公楚 — (請先閱讀背面之注意事項再填寫本頁} 訂 經濟部智慧財產局員工消費合作社印製 -38 1308770 A7 ^__B7_ 五、發明説明（36 ) 若依本發明之轉印薄膜時，則可達下述的功效。 {請先閱讀背面之注項再填寫本頁} (1) 可有效的形成表面平滑性優越的PDP之構成 要素（尤指介電體層）。 (2 )膜形成材料層之可撓性優越，各該膜形成材料 層之表面上不致生成屈曲龜裂（罅隙）。 (3 )柔軟性優越，可容易的進行捲取或捲筒狀之操 作。 (4 )膜形成材料層表示出較合適的黏著性，處理性 亦良好。 (5 )膜形成材料層之轉印性（對基板之加熱黏著性 )優越。 若依本發明之製造方法時，則可達以下的功效。 (1 )可有效的形成表面平滑性優越的P D P之構成 要素（例如間隔壁、電極、電阻體、介電體層、螢光體、 濾色片、黑色基質）。 (2) 可有效的形成構成要素之位置精確度較高的 P D P。 經濟部智慧財產局員工消費合作社印製 (3) 可有效的形成膜厚較大的介電體層。 (4) 可有效的形成大型之面板所要求的介電體層。 C 5 )可有效的製造出具有膜厚之均勻性及表面之平 滑性優越的介電體層之P D P。 圖式之簡單說明 第1圖爲表示交流型之電漿顯示面板之截面形狀的模 -39- 本紙張尺度適用中國國家標準（CNS) Μ规格（210Χ297公麓） 1308770 A7 ___ ΒΊ 五、發明説明（37 ) 式圖。 第2圖（甲）爲表示本發明之轉印薄膜的槪略截面圖 ’（乙）爲表示各該轉印薄膜之層構成的截面圖。 第3圖爲表示本發明之 (轉印步驟、光阻膜之形成 略截面圖。 第4圖爲表示本發明之 (顯影步驟、蝕刻步驟、燒 製造方法的間隔壁之形式步驟 步驟、曝光步驟）之一例的槪 製造方法的間隔壁之形成步驟 成步驟）之一例的槪略截面圖 (請先閲讀背面之注意事項再填寫本頁) 圖號之說明 經濟部智慧財產局員工消費合作社印製 1 玻 璃 基 板 2 玻 璃 基 板 3 間 隔 壁 4 透 明 電 極 5 母 線 電 極 6 位 址 電 極 7 螢 光 物 質 8 介 電 體 層 9 介 電 體 層 1 0 保 護 層 F 1 支持 薄膜 F 2 膜 形成材料層 F 3 覆 蓋 薄膜 本紙張尺度適用中國國家標準（CNS ) A4規格（210Χ297公釐） -40- 1308770 Αν B7 五、發明説明（） 38 11 玻璃基板 12 電極 (請先閲讀背面之注意事項再填寫本頁) 13 介電體層 2 0 轉印薄膜 21 膜形成材料層 2 2 支持薄膜 25 間隔壁圖案層 2 5 A 材料層殘留部 2 5 B 材料層去除部 3 1 光阻膜 3 5 光阻圖案 3 5 A 光阻殘留部 3 5 B 光阻去除部 4 0 間隔壁 5 0 面板材料 Μ 曝光用光罩 Μ Α 光透過部 經濟部智慧財產局員工消費合作社印製 MB 遮光部 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -41 -1T is processed in this step to burn the partition pattern layer (25) to form a partition wall. Therefore, the organic substance in the material layer remaining portion 2 5 A is burned out and a partition wall can be formed, and the partition wall 40 is formed on the surface of the dielectric layer 13 as shown in FIG. 4 (壬). The panel material is 50. In the panel material 50, a space (a space derived from the material layer removing portion 2 5 B) which can be divided by the partition wall 40 serves as a plasma working space. Here, as for the temperature at which the firing treatment is carried out, it is necessary to use a temperature at which the organic substance in the residual portion (25 A) of the material layer is burned out, and is usually referred to as 4 0 0 to 60 °C. Also, the firing time usually means 1 〇 to 90 minutes. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, Employees' Consumption Cooperatives <Preferred Embodiments Using Photoresist Method> The method of forming the PDP of the present invention is not limited by the methods shown in Figs. 3 and 4. Here, as another preferable method for forming the constituent elements of P D P , the following methods for forming the steps (1) to (3) can be mentioned. (1) After forming a photoresist film on the support film, apply the Chinese National Standard (CNS) A4 specification (210X297 mm) by coating and drying the paper. 33- 1308770 A7 B7 V. Invention Description (31) (Please Note on the back side of the page. The inorganic particle-containing composition of the present invention is laminated on each of the photoresist films to form a film forming material layer. Here, when a photoresist film and a film forming material layer are formed, a light wheel coater or the like can be used, whereby a laminated film having excellent film thickness uniformity can be formed on the supporting film. (2) The laminated film of the photoresist film and the film-forming material layer formed on the support film is transferred onto the substrate. Here, the transfer conditions may be the same as those of the "transfer step of the film forming material layer" described above. (3) The same operation as the above-mentioned "exposure step of the photoresist film", "development step of the photoresist film", "etching step of the film forming material layer", and "baking step of the partition pattern layer" are performed. In this case, the etching solution of the photoresist film and the film forming material layer are the same solution as described above, and the "developing step of the photoresist film" and the "etching step of the film forming material layer" are preferably carried out continuously. According to the above method, since the film forming material layer and the photoresist film are all transferred onto the substrate, the manufacturing efficiency can be further improved by simplification of the steps. The Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives Co., Ltd., printed on the above, explains the method of forming the "partition wall" as a component of the PDP. However, according to this method, the electrode forming the p DP and the dielectric layer of the resistor body may be formed. Fluorescent body, color filter, black matrix, etc. [Examples] The examples of the invention are described below, but the invention is not limited thereto. ' This paper scale applies to China National Standard (CNS) A4 specification (210X 297 mm) A7 1308770 B7 V. Inventive Note (32) (Example 1) (1) Preparation of glass paste composition (containing inorganic particle composition) : (Please read the back of the note first and then fill out this page) Using a dispersing machine by mixing glass powder (inorganic particles) with 70% by weight of lead oxide, 10% by weight of boron oxide, 20% by weight of cerium oxide The composition of P b ◦ — B2 〇 3 — S i 〇 2 system mixture (softening temperature 500 ° C) 100 minutes, bonding resin butyl methacrylate. 2-ethylhexyl methacrylate / methacrylate Propyl ester copolymer (weight ratio 3 0/6 0/1 0, weight average molecular weight: 1 000 000) 17 points, specific plasticizer glycerol-1,2-diethyl fluorenyl- 3 - single The composition of the present invention having a viscosity of 3000 cP was prepared by adding 4 parts of lauric acid ester, 0.5 parts of n-decyltrimethoxydecane containing a mercapto compound, and 34.3 parts of a solvent of propylene glycol monomethyl ether. (2) Evaluation of the production of the transfer film (flexibility and handling): The composition of the present invention prepared by the above (1) was coated with the blade applicator by the Ministry of Economic Affairs, Intellectual Property Office, and the consumer cooperative. Supported polyethylene terephthalate (PET) support film (width 400 mm, length 3 〇m 'thickness 3 8 // m), formed by drying at 1 〇〇 °c The coating film was removed for 5 minutes to form a film forming material layer having a thickness of 50 on the supporting film. Next, a cover film (width: 400 mm, thickness: 25/m) formed of PET which has been previously released from the mold is bonded to each of the film forming material layers to produce a composition having the structure shown in Fig. 2 . The transfer film of the invention. The resulting transfer film is flexible and can be easily wound into -35- This paper scale is applicable to China National Standard (CNS) A4 specification (210X297 mm) 1308770 A7 B7 V. Invention description (33) (Please first Read the notes on the back and fill out this page) Roll-up operation. Further, even if the transfer film is bent, no crevices (buckling cracks) are formed on the surface of the film-forming material layer, and each of the film-forming material layers has superior flexibility. Further, the transfer film is peeled off from the cover film, and the surface of the film-forming material layer is placed on the surface of the glass substrate without pressing the transfer film (the laminate of the support film and the film-forming material layer). When the transfer film is peeled off from the surface of the glass substrate, each of the film forming material layers exhibits an appropriate adhesiveness to the glass substrate, and the transfer film which does not cause aggregation damage to each of the film forming material layers can be peeled off. The rationality of the transfer film is good. (3) Transfer of the film-forming material layer, Ministry of Commerce, Intellectual Property Office, Employees' Consumer Cooperative, printing the transfer film by using the transfer film obtained in the above (2), and then transferring the film (support film and film forming material) The laminate of the layers is placed on the surface of the glass substrate for the 20-inch panel (the fixing surface of the bus bar electrode) until the surface of the film-forming material layer is held up, and the transfer film is heat-pressed by a heating roller. Here, as for the pressing condition, the surface temperature of the heating roller was 1 10 ° C, the roller pressure was 3 k g/cm, and the moving speed of the heating roller was 1 in / min. After the hot pressing treatment is completed, the support film is peeled off by the film forming material layer which is fixed (heated) to the surface of the glass substrate, and the transfer of each of the film forming material layers is completed. In the transfer step, when the support film is peeled off, the film forming material layer has a sufficiently large film strength when the film forming material layer does not cause aggregation failure-36- This paper size is applicable to the Chinese National Standard (CNS) A4 specification. (210X297 mm) 1308770 A7 B7 V. Inventive Note (34) Degree. Further, the pre-transferred film-forming material layer has good adhesion to the surface of the glass substrate. (Please read the precautions on the back side and fill out this page.) (4) The film formation material layer is fired (formation of the dielectric layer). The glass substrate which has been transferred and formed into the film formation material layer by the above (3) is placed in the firing. The furnace is heated at a temperature of 1 〇r/min from the temperature in the normal temperature furnace to 590 T: and is fired at a temperature of 5 9 Ot for 30 minutes on the surface of the glass substrate. A colorless and transparent dielectric layer formed of a glass sintered body is formed. When the film thickness (average film thickness and tolerance) of the dielectric layer is measured, it is in the range of 30//m ± 〇 · 4 / / m, and the film thickness uniformity is superior. Further, the surface of the obtained dielectric layer was subjected to three-dimensional measurement using a non-contact film thickness meter (NH-3 manufactured by Ryoden Co., Ltd.), and the surface roughness (Ra, Rb, Rc was determined based on JIS standard (B0601)). When it is Ra = 〇. 23vm, Rb = 0. 90/zm, R c = 〇. 5 5 /2 m, the surface smoothness is superior. (Rah = 0. Below, Rb = l. 5//m or less, Rc = l. 〇Ministry of Economic Affairs, Intellectual Property Bureau, Staff Cooperatives, etc. / / m below all as surface smoothness is good. Thus, 5 parts of the panel material obtained from the substrate having the dielectric layer was produced, and when the transmittance of the dielectric layer formed (measurement wavelength of 600 nm) was measured, it was 8 9%, and it was found to be transparent. <Example 2 > In addition to the glass powder containing 2% by weight of lead powder, the paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) ^ 1308770 A7 B7 (Invention) (35) A glass paste composition was prepared in the same manner by the same method. Thereafter, a transfer film was produced in the same manner as in the example, and a dielectric layer was formed in the same manner as in Example 1. The film thickness of the dielectric layer was measured ( The average film thickness and the tolerance) were in the range of 30 //m± 〇.5, and a dielectric layer was formed in the same manner as in Example 1. Further, the surface of the obtained dielectric layer was the same as in Example 1. When the surface roughness (Ra, Rb, Rc) is obtained by the method, it is Ra = 0 · 25; / m, Rb = 0 .94#m, Rc = 〇. 57 // m, superior in surface smoothness. Further, 5 parts of the panel material made of the substrate having the dielectric layer was fabricated in this manner, and the dielectric layer formed was measured. When the light transmittance (measurement wavelength is 600 nm) is 89%, it is found to have good transparency. The efficacy of the invention according to the composition of the present invention can achieve the following effects. (1) More suitable components for forming a PDP having excellent surface smoothness (for example, a partition wall, an electrode, a resistor, a dielectric layer, a phosphor, a color filter, and a black matrix). (2) A suitable formation is higher A glass sintered body having a light transmittance (for example, a dielectric layer and a partition wall constituting a PDP). (3) A transfer film having excellent flexibility in a film forming material layer can be produced. (4) A film forming material can be produced. The transferability of the layer (heating adhesion to the substrate) is superior to the transfer film. The paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 public Chu - (please read the note on the back and fill out this page) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed -38 1308 770 A7 ^__B7_ V. Inventive Note (36) If the transfer film according to the present invention achieves the following effects, {Please read the back item and then fill in the page} (1) Effective surface formation The constituent elements of the PDP having excellent smoothness (especially the dielectric layer). (2) The flexibility of the film forming material layer is excellent, and no buckling cracks (creases) are formed on the surface of each of the film forming material layers. It has excellent flexibility and can be easily wound or rolled. (4) The film forming material layer shows a suitable adhesive property and is also excellent in handleability. (5) The transfer property of the film forming material layer (heating adhesion to the substrate) is excellent. According to the manufacturing method of the present invention, the following effects can be achieved. (1) It is possible to effectively form constituent elements of P D P having excellent surface smoothness (for example, a partition wall, an electrode, a resistor, a dielectric layer, a phosphor, a color filter, and a black matrix). (2) P D P with high positional accuracy of the constituent elements can be effectively formed. Printing by the Intellectual Property Office of the Ministry of Economic Affairs and the Consumer Cooperatives (3) It is effective to form a dielectric layer with a large film thickness. (4) Effectively form the dielectric layer required for large panels. C 5 ) can effectively produce P D P of a dielectric layer having uniform film thickness and excellent smoothness of the surface. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a diagram showing the cross-sectional shape of an AC-type plasma display panel. -39- This paper scale is applicable to China National Standard (CNS) ΜSpecifications (210Χ297 mm) 1308770 A7 ___ ΒΊ V. Invention Description (37) Formula. Fig. 2(a) is a schematic cross-sectional view showing a transfer film of the present invention. (B) is a cross-sectional view showing a layer configuration of each of the transfer films. Figure 3 is a cross-sectional view showing the formation of the transfer film and the photoresist film of the present invention. Fig. 4 is a view showing the steps of the step of forming the partition wall of the present invention, the etching step, the etching step, and the exposure step. A case of the step of forming the partition wall of the crucible manufacturing method is a schematic cross-sectional view of one of the steps (please read the note on the back side and then fill in the page). The description of the figure number is printed by the Ministry of Economic Affairs, Intellectual Property Bureau, and the employee consumption cooperative. 1 Glass substrate 2 Glass substrate 3 Partition wall 4 Transparent electrode 5 Bus electrode 6 Address electrode 7 Fluorescent substance 8 Dielectric layer 9 Dielectric layer 1 0 Protective layer F 1 Support film F 2 Film forming material layer F 3 Covering film Paper scale applicable to China National Standard (CNS) A4 specification (210Χ297 mm) -40- 1308770 Αν B7 V. Invention description () 38 11 Glass substrate 12 electrode (please read the back note before filling this page) 13 Dielectric Body layer 2 0 transfer film 21 film forming material layer 2 2 support film 25 partition pattern layer 2 5 A material layer residue Retaining portion 2 5 B material layer removing portion 3 1 photoresist film 3 5 photoresist pattern 3 5 A photoresist residual portion 3 5 B photoresist removing portion 4 0 partition wall 5 0 panel material 曝光 exposure mask Μ Α light transmission Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperatives Printed MB Shading Department This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) -41 -

Claims (1)

«II «II Ή Λ Α8 D8 六、申請專利範圍 第91 1 1 690 1號專利申請案 中文申請專利範圍修正本 民國97年5月27日修正 1 . 一種含無機粒子組成物，其特徵在於含有〔A〕 無機粒子，〔B〕黏結樹脂，及〔C〕以下述構造式（I 請 先 聞 面 注 CH2 -O-R1 鼻 % 寫 本 t (I) 經濟部智慧財產局員工消費合作社印製 CH-O-R: ch2 -o-r3 (式內，R1、R2及R3之中—者，係表示以—c〇 — A (惟A表示碳數5〜2 0之烷基）表示的基，除此以外的 二者係各自獨立表示氫原子、乙醯基或丙醯基）表示的化 合物’其中對於〔A〕無機粒子1〇〇重量份時，〔b〕 黏結樹脂含有5〜80重量份，〔C〕構造式〔I〕表示 的化合物含有0·1〜20重量份。 2 .如申請專利範圍第1項之含無機粒子組成物，其 中〔A〕無機粒子爲玻璃粉末。 3 .如申請專利範圍第1項之含無機粒子組成物，其 中〔B〕黏結樹脂爲選自以下述一般式（1 )表示之（甲 基）丙烯酸酯化合物之單獨聚合物，二種以上之共聚物及 (甲基）丙嫌酸酯化合物與共聚合性單體之共聚物之丙烯 本纸張尺度適用中國國家標準（CNS ) A4規格（210X297公釐）-1 _ !308770 A8 B8 C8 D8 六、申請專利範圍 酸樹脂， R4 (請先聞嘴背面之注意事項再填寫本頁) I Ha C = C-CO〇R5 ( ι ) (式中’ R4係表示氫原子或甲基，R5係表示烷基或殘基 院基）。 4 .如申請專利範圍第1項之含無機粒子組成物，其 中〔C〕上述構造式（I )表示的化合物爲選自丙三醇_ 4 1 ~~乙醯基一 3 —月桂酸酯、丙三醇一 2 —乙醯基~ i 一 月桂酸酯、丙三醇一 1 ，2 —二乙醯基一 3 —月桂酸醋、 丙三醇—1 一乙醯基—3 —單油酸酯、丙三醇—2 —乙醯 基一單油酸酯、丙三醇一 1 ’ 2 —二乙醯基一3 —單 油酸酯、丙三醇一 1 一乙醯基一 3 -硬脂酸酯、丙三醇一 2 —乙醯基一1 一硬脂酸酯、丙三醇一1 ，2 —二乙醯基 —3 -硬脂酸酯的化合物。 經濟部智慧財產局員工消費合作社印製 5 . —種轉印薄膜，其特徵在於具有由申請專利範圍 第1項之含無機粒子組成物所得的膜形成材料層。 6 . —種電漿顯示面板之製造方法，其特徵在於含有 將由申請專利範圍第i項之含無機粒子組成物所得的膜形 成材料層轉印至基板上，被轉印的膜形成材料層藉由燒成 在該基板上形成介電體層的步驟。 7 . —種電漿顯示面板之製造方法，其特徵在於包含 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐）-2 - 1308770 A8 BS C8 D8 六、申請專利範圍 :將由含申請專利範圍第1項之含無機粒子組成物所得的 膜形成材料層轉印至基板上，被轉印的膜形成材料層上形 成光阻膜’該光阻膜經曝光處理，形成光阻圖案的潛影， 該光阻膜經顯影處理使光阻圖案顯在化，該膜形成材料層 進行蝕刻處理形成對應於光阻圖案之圖案層，該圖案層藉 由燒成處理，形成選自間隔壁、電極、電阻體、介電體層 、螢光體、濾色片及黑色基質的構成要素的步驟。 8 . —種電漿顯示面板之製造方法，其特徵在於包含 :在支持薄膜上形成光阻膜與申請專利範圍第1項之含無 機粒子組成物所得之膜形成材料層之層合膜，將形成於$ 持薄膜上的層合膜轉印至基板上，構成該層合膜之光阻膜 進行曝光處理形成光阻圖案之潛影，顯影處理該光阻膜並 使光阻圖案顯在化，餓刻處理各該膜形成材料層並形成對 應於光阻圖案之圖案層，藉由燒成處理各該圖案層，形成 選自間隔壁、電極、電阻體、介電體層、螢光體、爐色片 及黑色基質的構成要素之步驟。 IK -- (請先閲讀背面之注意事項再填寫本頁) 、1T d 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標隼（CNS ) A4规格（210X297公釐）-3-«II «II Ή Λ Α8 D8 VI. Patent application scope 91 1 1 690 Patent application No. 1 Patent application revision of the patent application date of May 27, 1997. 1. A composition containing inorganic particles, characterized by [A] Inorganic particles, [B] Adhesive resin, and [C] with the following structural formula (I Please first note CH2 -O-R1 Nasal% write t (I) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed CH -OR: ch2 -o-r3 (wherein, among R1, R2 and R3, a group represented by -c〇-A (only A represents an alkyl group having a carbon number of 5 to 20), The other two are each a compound represented by a hydrogen atom, an ethyl sulfonyl group or a propyl fluorene group, wherein the (b) binder resin contains 5 to 80 parts by weight, [b] C] The compound of the formula [I] is contained in an amount of from 0.1 to 20 parts by weight. 2. The inorganic particle-containing composition according to claim 1, wherein the [A] inorganic particles are glass powder. The inorganic particle-containing composition of the first item of the range, wherein [B] the binder resin is selected a propylene paper of a copolymer of a (meth) acrylate compound represented by the following general formula (1), a copolymer of two or more kinds, and a copolymer of a (meth) propyl acrylate compound and a copolymerizable monomer Zhang scale applies to China National Standard (CNS) A4 specification (210X297 mm)-1 _ !308770 A8 B8 C8 D8 VI. Patent application range acid resin, R4 (please note the back of the mouth before filling in this page) I Ha C = C-CO〇R5 ( ι ) (wherein R 4 represents a hydrogen atom or a methyl group, and R 5 represents an alkyl group or a residue group). 4. The inorganic particle-containing composition of claim 1 Wherein [C] the compound represented by the above structural formula (I) is selected from the group consisting of glycerol _ 4 1 ~~ acetyl ketone 3- laurate, glycerol -2-ethyl hydrazide ~ i monolaurate Glycerol-1,2-diethylhydrazine-3-lauric acid vinegar, glycerol-1 monoethylidene-3-monooleate, glycerol-2-ethenyl-monooleic acid Ester, glycerol-1'2-diethylhydrazine-3-monooleate, glycerol-1-1-ethenyl-3-stearate, C3 a compound of 2-ethyl phthalate- 1 stearyl ester, glycerol-1,2-diethyl decyl 3-stearate. Printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives. A transfer film characterized by having a film forming material layer obtained from the inorganic particle-containing composition of the first application of the patent application. 6. A method for producing a plasma display panel, characterized in that it contains a patent application scope The film forming material layer obtained by containing the inorganic particle composition is transferred onto a substrate, and the transferred film forming material layer is formed by firing a dielectric layer on the substrate. 7. A method for manufacturing a plasma display panel, characterized in that the paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm)-2 - 1308770 A8 BS C8 D8 VI. Patent application scope: The film-forming material layer obtained by the inorganic particle-containing composition of the first aspect of the patent is transferred onto a substrate, and a photoresist film is formed on the transferred film-forming material layer. The photoresist film is exposed to light to form a photoresist pattern. a latent image, the photoresist film is developed to form a photoresist pattern, and the film forming material layer is etched to form a pattern layer corresponding to the photoresist pattern, and the pattern layer is formed by a firing process to form a partition wall The steps of the constituent elements of the electrode, the resistor, the dielectric layer, the phosphor, the color filter, and the black matrix. 8. A method of manufacturing a plasma display panel, comprising: forming a photoresist film on a support film and a film forming material layer of the film-forming material layer obtained by the inorganic particle-containing composition of claim 1; The laminated film formed on the film is transferred onto the substrate, and the photoresist film constituting the laminated film is subjected to exposure treatment to form a latent image of the photoresist pattern, and the photoresist film is developed and the photoresist pattern is developed. And processing each of the film forming material layers to form a pattern layer corresponding to the photoresist pattern, and processing each of the pattern layers by firing to form a partition wall, an electrode, a resistor, a dielectric layer, a phosphor, The steps of the components of the furnace color film and the black matrix. IK -- (Please read the note on the back and fill out this page), 1T d Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the consumer cooperative. This paper scale applies the Chinese National Standard (CNS) A4 specification (210X297 mm)-3-
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