TWI304244B - - Google Patents

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Publication number
TWI304244B
TWI304244B TW91100124A TW91100124A TWI304244B TW I304244 B TWI304244 B TW I304244B TW 91100124 A TW91100124 A TW 91100124A TW 91100124 A TW91100124 A TW 91100124A TW I304244 B TWI304244 B TW I304244B
Authority
TW
Taiwan
Prior art keywords
metal
layer
etch stop
partial
stop layer
Prior art date
Application number
TW91100124A
Other languages
English (en)
Chinese (zh)
Inventor
Chun Sheng Chen
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW91100124A priority Critical patent/TWI304244B/zh
Application granted granted Critical
Publication of TWI304244B publication Critical patent/TWI304244B/zh

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
TW91100124A 2002-01-08 2002-01-08 TWI304244B (en:Method)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW91100124A TWI304244B (en:Method) 2002-01-08 2002-01-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW91100124A TWI304244B (en:Method) 2002-01-08 2002-01-08

Publications (1)

Publication Number Publication Date
TWI304244B true TWI304244B (en:Method) 2008-12-11

Family

ID=45070895

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91100124A TWI304244B (en:Method) 2002-01-08 2002-01-08

Country Status (1)

Country Link
TW (1) TWI304244B (en:Method)

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