TWI302163B - Polishing composition for noble metals - Google Patents

Polishing composition for noble metals Download PDF

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Publication number
TWI302163B
TWI302163B TW094123058A TW94123058A TWI302163B TW I302163 B TWI302163 B TW I302163B TW 094123058 A TW094123058 A TW 094123058A TW 94123058 A TW94123058 A TW 94123058A TW I302163 B TWI302163 B TW I302163B
Authority
TW
Taiwan
Prior art keywords
polishing
polishing composition
acid
group
salt
Prior art date
Application number
TW094123058A
Other languages
English (en)
Chinese (zh)
Other versions
TW200613534A (en
Inventor
Rege Thesauro Francesco De
Vlasta Brusic
Christopher C Thompson
Benjamin P Bayer
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of TW200613534A publication Critical patent/TW200613534A/zh
Application granted granted Critical
Publication of TWI302163B publication Critical patent/TWI302163B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00—Brightening metals by chemical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW094123058A 2004-07-28 2005-07-07 Polishing composition for noble metals TWI302163B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/901,420 US7161247B2 (en) 2004-07-28 2004-07-28 Polishing composition for noble metals

Publications (2)

Publication Number Publication Date
TW200613534A TW200613534A (en) 2006-05-01
TWI302163B true TWI302163B (en) 2008-10-21

Family

ID=34973040

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094123058A TWI302163B (en) 2004-07-28 2005-07-07 Polishing composition for noble metals

Country Status (9)

Country Link
US (1) US7161247B2 (https=)
EP (2) EP2431434B1 (https=)
JP (2) JP4516119B2 (https=)
KR (1) KR101201063B1 (https=)
CN (1) CN1993437B (https=)
IL (1) IL179941A (https=)
MY (1) MY143678A (https=)
TW (1) TWI302163B (https=)
WO (1) WO2006023105A1 (https=)

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Also Published As

Publication number Publication date
KR20070049185A (ko) 2007-05-10
IL179941A0 (en) 2007-05-15
EP2431434B1 (en) 2017-11-01
US20060024967A1 (en) 2006-02-02
EP1797152A1 (en) 2007-06-20
JP2009006469A (ja) 2009-01-15
WO2006023105A1 (en) 2006-03-02
US7161247B2 (en) 2007-01-09
EP1797152B1 (en) 2015-09-16
KR101201063B1 (ko) 2012-11-14
TW200613534A (en) 2006-05-01
CN1993437B (zh) 2013-07-31
JP2008518427A (ja) 2008-05-29
CN1993437A (zh) 2007-07-04
MY143678A (en) 2011-06-30
IL179941A (en) 2011-04-28
JP4516119B2 (ja) 2010-08-04
EP2431434A1 (en) 2012-03-21

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