TWI297711B - Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers - Google Patents

Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers Download PDF

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Publication number
TWI297711B
TWI297711B TW092113544A TW92113544A TWI297711B TW I297711 B TWI297711 B TW I297711B TW 092113544 A TW092113544 A TW 092113544A TW 92113544 A TW92113544 A TW 92113544A TW I297711 B TWI297711 B TW I297711B
Authority
TW
Taiwan
Prior art keywords
composition
weight
styrene
polymer
allyl alcohol
Prior art date
Application number
TW092113544A
Other languages
English (en)
Chinese (zh)
Other versions
TW200426186A (en
Inventor
Gu Xu
Jimmy D Meador
Mandar R Bhave
Shreeram V Deshpande
Kelly A Nowak
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Publication of TW200426186A publication Critical patent/TW200426186A/zh
Application granted granted Critical
Publication of TWI297711B publication Critical patent/TWI297711B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/081—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts
    • H10W20/084—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts for dual-damascene structures
    • H10W20/085—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts for dual-damascene structures involving intermediate temporary filling with material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Drying Of Semiconductors (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Surface Treatment Of Optical Elements (AREA)
TW092113544A 2002-05-23 2003-05-20 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers TWI297711B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/154,338 US6894104B2 (en) 2002-05-23 2002-05-23 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers

Publications (2)

Publication Number Publication Date
TW200426186A TW200426186A (en) 2004-12-01
TWI297711B true TWI297711B (en) 2008-06-11

Family

ID=29548852

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092113544A TWI297711B (en) 2002-05-23 2003-05-20 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers

Country Status (10)

Country Link
US (2) US6894104B2 (https=)
EP (1) EP1554322B1 (https=)
JP (1) JP4489593B2 (https=)
KR (1) KR101036408B1 (https=)
CN (1) CN1310971C (https=)
AT (1) ATE368060T1 (https=)
AU (1) AU2003300771A1 (https=)
DE (1) DE60315177T2 (https=)
TW (1) TWI297711B (https=)
WO (1) WO2004040369A2 (https=)

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* Cited by examiner, † Cited by third party
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JP2004101794A (ja) * 2002-09-09 2004-04-02 Toray Ind Inc 半導体装置用平坦化組成物
US7691556B2 (en) * 2004-09-15 2010-04-06 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
JP2006128543A (ja) * 2004-11-01 2006-05-18 Nec Electronics Corp 電子デバイスの製造方法
JP4832955B2 (ja) * 2005-06-07 2011-12-07 信越化学工業株式会社 レジスト下層膜材料並びにそれを用いたパターン形成方法
US7553905B2 (en) * 2005-10-31 2009-06-30 Az Electronic Materials Usa Corp. Anti-reflective coatings
US20070142525A1 (en) * 2005-12-16 2007-06-21 Rogado Nyrissa S Low TCR polymeric resistors based on reduced metal oxide conductive phase systems
EP1829942B1 (en) * 2006-02-28 2012-09-26 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
US20090035704A1 (en) * 2007-08-03 2009-02-05 Hong Zhuang Underlayer Coating Composition Based on a Crosslinkable Polymer
US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
US8192642B2 (en) 2007-09-13 2012-06-05 Brewer Science Inc. Spin-on protective coatings for wet-etch processing of microelectronic substrates
US8039201B2 (en) * 2007-11-21 2011-10-18 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
CA2717886C (en) 2008-04-01 2015-02-10 Gambro Lundia Ab An apparatus and a method for monitoring a vascular access
US20090253081A1 (en) * 2008-04-02 2009-10-08 David Abdallah Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step
US20090253080A1 (en) * 2008-04-02 2009-10-08 Dammel Ralph R Photoresist Image-Forming Process Using Double Patterning
US20100015550A1 (en) * 2008-07-17 2010-01-21 Weihong Liu Dual damascene via filling composition
US20100040838A1 (en) * 2008-08-15 2010-02-18 Abdallah David J Hardmask Process for Forming a Reverse Tone Image
US8084186B2 (en) * 2009-02-10 2011-12-27 Az Electronic Materials Usa Corp. Hardmask process for forming a reverse tone image using polysilazane
JP6043693B2 (ja) * 2012-10-19 2016-12-14 富士フイルム株式会社 保護膜形成用の樹脂組成物、保護膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス

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US3407155A (en) * 1965-10-29 1968-10-22 American Cyanamid Co Aminotriazine decorative, dimensionally stable molding compound containing a polymerized aromatic monomer and hydroxyl-containing vinyl monomers copolymer
US3454418A (en) * 1967-04-17 1969-07-08 Lubrizol Corp Coating compositions containing styrene-allyl alcohol copolymer,epoxy resin,and phenol formaldehyde
US4090936A (en) * 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4921891A (en) * 1986-12-10 1990-05-01 Di Giorgio Corporation Wood coating composition and process of use thereof
US5089313A (en) * 1986-12-10 1992-02-18 Marley Mouldings Inc. Process for coating metal and plastic to impart wood-like appearances
US4808652A (en) * 1988-06-08 1989-02-28 Monsanto Company Crosslinker compositions comprising amino resins, epoxies and styrene allyl alcohol copolymers
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Also Published As

Publication number Publication date
JP4489593B2 (ja) 2010-06-23
DE60315177T2 (de) 2008-04-10
EP1554322A2 (en) 2005-07-20
JP2006504995A (ja) 2006-02-09
US6894104B2 (en) 2005-05-17
WO2004040369A2 (en) 2004-05-13
US20030220431A1 (en) 2003-11-27
KR20050013995A (ko) 2005-02-05
ATE368060T1 (de) 2007-08-15
AU2003300771A8 (en) 2004-05-25
CN1310971C (zh) 2007-04-18
AU2003300771A1 (en) 2004-05-25
TW200426186A (en) 2004-12-01
EP1554322A4 (en) 2005-10-05
WO2004040369A3 (en) 2004-07-08
DE60315177D1 (de) 2007-09-06
USRE40920E1 (en) 2009-09-22
CN1656132A (zh) 2005-08-17
EP1554322B1 (en) 2007-07-25
KR101036408B1 (ko) 2011-05-23

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