TWI292590B - Pattern reversal employing thick residual layers - Google Patents

Pattern reversal employing thick residual layers Download PDF

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Publication number
TWI292590B
TWI292590B TW094132119A TW94132119A TWI292590B TW I292590 B TWI292590 B TW I292590B TW 094132119 A TW094132119 A TW 094132119A TW 94132119 A TW94132119 A TW 94132119A TW I292590 B TWI292590 B TW I292590B
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TW
Taiwan
Prior art keywords
layer
pattern
substrate
valley
protrusions
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TW094132119A
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English (en)
Chinese (zh)
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TW200624996A (en
Inventor
Sidlgata V Sreenivasan
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Molecular Imprints Inc
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Publication of TW200624996A publication Critical patent/TW200624996A/zh
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Publication of TWI292590B publication Critical patent/TWI292590B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
TW094132119A 2004-09-21 2005-09-16 Pattern reversal employing thick residual layers TWI292590B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/946,566 US7547504B2 (en) 2004-09-21 2004-09-21 Pattern reversal employing thick residual layers

Publications (2)

Publication Number Publication Date
TW200624996A TW200624996A (en) 2006-07-16
TWI292590B true TWI292590B (en) 2008-01-11

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Family Applications (1)

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TW094132119A TWI292590B (en) 2004-09-21 2005-09-16 Pattern reversal employing thick residual layers

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US (1) US7547504B2 (US07547504-20090616-C00001.png)
TW (1) TWI292590B (US07547504-20090616-C00001.png)

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