TWI274786B - Cu-Ni-Si-Mg based copper alloy strip - Google Patents

Cu-Ni-Si-Mg based copper alloy strip Download PDF

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TWI274786B
TWI274786B TW94109548A TW94109548A TWI274786B TW I274786 B TWI274786 B TW I274786B TW 94109548 A TW94109548 A TW 94109548A TW 94109548 A TW94109548 A TW 94109548A TW I274786 B TWI274786 B TW I274786B
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mass
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copper
copper alloy
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TW200533769A (en
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Naofumi Maeda
Takatsugu Hatano
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Nikko Metal Mfg Co Ltd
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Abstract

The objective of the present invention is to provide a Cu-Ni-Si-Mg based alloy which has excellent strength, electrical conductivity, stress relaxation resistance, bending workability, etching properties, wettability and plating properties, and can be stably produced. The Cu-Ni-Si-Mg based copper alloy strip is composed of a copper based alloy having a composition containing 1.0 to 4.0 mass% Ni, Si in the content of 1/6 to 1/4 of the mass% concentration of Ni, and 0.05 to 0.3 mass% Mg, and the balance Cu with inevitable impurities, and is characterized in that, in the cross-section parallel to the rolling direction, Ni-Si based compounds have distributed conditions of the following (1) and (2). (1) The number of the Ni-Si based compound grains with a grain size of 10 to 20 mum is <= 2 PIECES/MM<2>. (2) The number of the Ni-Si based grain groups with a length of 0.05 to 1.0 mm is <= 2 PIECES/MM<2> among the Ni-Si based grain groups composed of the Ni-Si based compound grains with a grain size of 2 to 20 mum.

Description

1274786 九、發明說明: 【發明所屬之技術領域】 本發明係關於銅合金條,特別是關於適用於積體電路 (1C)等的半導體機器之導線架材、連接器、端子、繼電器、 開關等的導電性彈簧材之銅合金條。 【先前技術】 導線术、端子、連接器等所使用之電子材料用銅合金 條係I求同日夺具備合金基本特性中之高強度與高導電性 (傳熱性)。除這些特性以外,也要求彎曲加工性、耐應力 矛特r生耐熱性、與鍍層之密合性、焊料親和性、蝕刻 加工性、衝孔性、耐蝕性等等。 另方面’隨著近年來電子元件乏小型化、高集成化, 導線木糕子、連接器等方面,其引腳數持續增加且間 =斷乍π ’又70件形狀也變得複雜化。同時,組裝時盘 .^ 的要求也幵咼。基於這種背景,上述銅合 i材料在特性上的要求,也變得越來越高。 土於阿強度與咼導電性的觀點,纟電子材料用銅合金 人入’以往雖採“璘青銅、黃銅等為代表之固溶強化型 口盃但近年來時效硬化型銅合金的使用量 效硬化型銅合金,在收门 ㈣用里不斷增加。時 溶化處理後的過飽和固溶體實施 k效處理,以使微ό讲ψ …一 析出物均-地分散,而提高合金強度, 並減夕銅中的固溶元素 产、?1裝M W ^ 杈歼導電性。因此,可獲得強 度淨買特性等的機械性質優里3道士 k 貝饭異、且導電性、導熱性良好 5 1274786 的材料。 時效硬化型合金中之Cu-Nij彳么λ 糸鋼合金,乃羡高強 度與高導電率之代表性銅合金,ρ香砍 八冋強 u 1際運用於電子機哭用 材料。該銅合金,係在銅基質中析 免千機时用 何出倣細的Ni-Si系金屬 間化合物粒子,藉此提昇強度與導電率。 在Cu-Ni-Si系銅合金中,為 又善機械性質等,大多添 加Ni、Si以外之追加元素。特別是 g’其乃添加於Cu-Ni-Si 糸銅合金中之代表性元素。已知 的添加效果包含: (1)提昇強度及耐應力緩和特性 $、土、 行性(日本特開昭01-250134 唬公報) ⑺提昇熱加工性(日本特開平G5-345941號公報) (3)Mg會形成氣化物而補捉氧, 乳以阻止熱處理時Si氧 化物之生成或粗大化(日本特開 行開十09_2〇9〇62號公報)等。 然而,在WSU銅合金中添力〇Mg時,雖可提昇1274786 IX. OBJECTS OF THE INVENTION: TECHNICAL FIELD The present invention relates to copper alloy strips, and more particularly to lead frames, connectors, terminals, relays, switches, etc. for semiconductor devices suitable for integrated circuits (1C) and the like. A copper alloy strip of conductive spring material. [Prior Art] Copper alloys for electronic materials used in wirework, terminals, connectors, etc., are required to have high strength and high electrical conductivity (heat transfer) in the basic properties of the alloy. In addition to these characteristics, bending workability, stress resistance resistance, adhesion to a plating layer, solder affinity, etching workability, punching property, corrosion resistance, and the like are also required. On the other hand, with the recent miniaturization and high integration of electronic components, the number of pins of the wire, the connector, and the like have continued to increase, and the shape of the pin is gradually reduced by π ′ and 70 pieces are complicated. At the same time, the requirements for the disc . Based on this background, the above-mentioned requirements for the properties of the copper-based materials are also becoming higher and higher. From the viewpoint of the strength of the earth and the conductivity of the bismuth, the use of copper alloys for electronic materials has been used in the case of solid solution-reinforced cups represented by bismuth bronze and brass, but the use of age-hardened copper alloys in recent years. The hardening type copper alloy is continuously increased in the use of the door (4). The supersaturated solid solution after the melting treatment is subjected to k-effect treatment, so that the precipitates are uniformly dispersed, and the strength of the alloy is increased, and The solid solution element in the copper is reduced, and the MW ^ 杈歼 conductivity is used. Therefore, the mechanical properties such as the strength of the net purchase characteristics can be obtained, and the electrical conductivity and thermal conductivity are good. Material: Cu-Nij彳 λ 糸 steel alloy in age hardening alloy, which is a representative copper alloy with high strength and high electrical conductivity, ρ香砍八冋强 u 1 is used in electronic machine crying materials. The copper alloy is used to extract fine Ni-Si intermetallic compound particles in the copper matrix to improve the strength and electrical conductivity. In the Cu-Ni-Si copper alloy, it is good. For mechanical properties, etc., additional elements other than Ni and Si are added. In particular, g' is a representative element added to Cu-Ni-Si beryllium copper alloy. The known additive effects include: (1) Lifting strength and stress relaxation resistance characteristics, soil, and properties (Japanese special edition) (13) The hot workability is improved. (3) Mg forms a vapor to capture oxygen, and the milk prevents the formation or coarsening of Si oxide during heat treatment (Japan) Special opening of the 10th 09_2〇9〇62 bulletin), etc. However, when adding force to the WSU copper alloy, although it can be improved

強度與耐應力緩和特性,但因 A 物,% 金中备易產生粗大的夾雜 初’而有寫、曲加工性、蘇釗 ^ 、鍍敷性等變差之問題。若 在合金中出現夹雜物,將對 ^ 、 村對弓曲加工性、蝕刻性、鍍敷性 寻產生不良影響乃是已知者。Strength and stress relaxation characteristics, but due to the A, the gold is easy to produce coarse inclusions, and there are problems such as writing, curved workability, Susie ^, and plating properties. If inclusions are present in the alloy, it is known that it has an adverse effect on the processing of the bow, the etching property, and the plating property.

Cu-Ni-Si系銅合金之央 &quot; 辈的非八屈+ ”隹物係匕3 ’氧化物或硫化物 寺的非金屬夾雜物、粗大的 r χτ. 祖大的Nl_Sl糸化合物這2種。在The non-metallic inclusions of the Cu-Ni-Si-based copper alloys are not the non-metallic inclusions of the oxide or sulfide temples, the coarse r χτ. The Nl_Sl糸 compound of the ancestor 2 Kind

Cu_N卜Si_Mg系銅合全的产y 丄 在 ^ . Λ 的f月形,由於Μ§比Si容易受氧化, 故/、乳化物的組成為 為g ^化物的組成為Mgs。然而, 曰本特開平〇5-〇5946S妹八 降低至】s 、 8 5虎公報已揭示出,若將〇、s濃度 -PPm以下,即可抑制MgO及MgS的生成。 Ϊ274786 另一方面,依水野等的研究(水野正 倉哲造、^孝,伸銅技 、逸見義男、小 咖-297),若在一系鋼合全 處,含有15at%左右Mg之粗大Ni_柄/ g,則在晶界 亦即,若在CU-Ni-Si f、物會開始成長。 系化合物會明顯增加。 g貝丨粗大沁-Si 若粗大Ni_Si系化合 拗多,日#献^ 物0加,蝕刻時殘渣之產生量會 且鍍敷性、彎曲加工性 49369號公報中,針對〜 ^在日本特開2〇〇1- 化人榀榮a I 系銅s金,係將Ni-Si系 化a物專的夾雜物控制在1()&quot;m 雜物個數喟敕盔卢卫/ 且將5〜10 的夾 们數5周正為在平行於壓延方向的截面上為5〇個/匪2 ,糟此抑制NbSi系夾雜物造成的影響。 〔專利文獻1〕特開昭61_250134號公報 〔專利文獻2〕特開平號公報 〔專利文獻3〕特開平〇9-2〇9062號公報 〔專利文獻4〕特開平05_059468號公報 〔專利文獻5〕特開2001-49369號公報 〔非專利文獻1〕水野正隆、逸見義男、小倉哲造、 /兵本孝’伸銅技術研究會誌,vol.38(1999),p291_297 【發明内容】 特開2001-49369號公報中,雖揭示Cu_Ni_Si-Mg系銅 s i ’但其内容為對含有Zn、Sn、Fe等其他金屬成分之 eu_Wi-Si系銅合金也能適用、即僅記載一總括的情形,並 1274786 揭丁出Cu N卜S卜Mg系、銅合金個別之具體情況的條件。 ”針對Νΐ·〜系粗大粒子的著眼點,僅在於各粒子大 ::平均個數。再者,為了使合金中夹雜物的大小、個數 =發明所要求的範圍,製造時必須以高溫、長時間來 :仃熱愿延及溶體化處理,而產生Cu,,系銅合金 釭的製造成本上昇之問題。 , 及溶體化處理,可能造成r ,皿且長時間之熱壓延 坆成CulS卜Mg系銅合金條的結晶 …赶大化,而存在無法穩定製得既定特性(強度、彎曲加 工性)製品之問題。 丄因此,本發明之目的係為了解決上述課題。更具體而 二储供一 CU_Nl-Sl,系銅合金條,其不須經由高溫 、訏間之熱壓延及溶體化處理等導致製造成本上昇的原 因’且具備優異的強度、導電性、耐應力緩和特性、彎曲 加卫性'_性、親和性、鑛敷性,又能敎地製造出。 本發明人等為達成上述目的,首先,為了從不同於以 在之全新觀點來掌a Nl_Sl系粗大粒子而進行深入研究. 亦即’以往對Ni-Sl系粗大粒子的著眼點,僅著眼於各粒 子大小與平均個數,本發明打出以下所說明之「粒子群 :概念二同時著眼於Nl_Si系粗大粒子之分布狀態,並調 一 Ni-Si系粗大粒子群對特性的影響。 參照圖1 ’圖1係顯示可用FE_SEM(電解放射型掃描 電子顯微鏡:飛利浦公司製)以麵倍觀察之Ni_si系粗 大粒子集合體的代表形態。若從平行於壓延方向之截面或 直角截面加以觀點’可觀察到沿厚度方向的正交方向排列 I274786 之Ni-Si系粗大粒子集合體。該集合體可形成隨後定義之 系粗大粒子群。The production of Cu_N Bu Si_Mg is a y 丄 丄 丄 丄 丄 f f f f f f f f Μ Μ Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si However, 曰本特开平〇5-〇5946S sister eight reduced to s, 8 5 tiger bulletin has revealed that if the 〇, s concentration -PPm or less, can inhibit the formation of MgO and MgS. Ϊ 274786 On the other hand, according to the study of Mizuno (such as Mizuno Masao, filial piety, extension of copper technique, Yi see Yinan, Xiaojia-297), if a series of steels contain a coarse Ni_ of about 15at% Mg If the handle / g is in the grain boundary, that is, if it is in CU-Ni-Si f, the object will start to grow. The compound will increase significantly. g 丨 丨 丨 Si Si Si 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若 若2〇〇1-化人榀荣 a I is a copper s gold, which is controlled by Ni(Si) a substance-specific inclusions in 1()&quot;m debris number 喟敕 helmet Lu Wei / and 5 The number of clips of ~10 is 5 〇/匪2 in the cross section parallel to the rolling direction, which inhibits the influence of NbSi inclusions. [Patent Document 1] Japanese Laid-Open Patent Publication No. JP-A No. Hei. No. Hei. No. Hei. No. Hei. JP-A-2001-49369 (Non-Patent Document 1) Mizuno Masahiro, Yoshimi Yoshio, Ogura Tesaku, / Hyomoto Takashi's Research Institute of Copper Technology, vol. 38 (1999), p291_297 [Invention] Special Opening 2001- In the publication No. 49369, Cu_Ni_Si-Mg-based copper si' is disclosed, but the content thereof is applicable to an eu_Wi-Si-based copper alloy containing other metal components such as Zn, Sn, and Fe, that is, only one case is described, and 1274786 The conditions for the specific conditions of the Cu N Bu S Bu Mg system and the copper alloy are revealed. "The focus of the Νΐ·~ coarse particles is only the size of each particle: the average number. In addition, in order to make the size and number of inclusions in the alloy = the range required by the invention, it is necessary to manufacture high temperature. For a long time: 仃 愿 愿 愿 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶 溶The crystal of the CulS-Mg-based copper alloy strip is in a state of turbulence, and there is a problem that it is impossible to stably produce a product having a predetermined characteristic (strength, bending workability). Therefore, the object of the present invention is to solve the above problems. The second storage is provided with a CU_Nl-Sl, which is a copper alloy strip, which does not require high temperature, inter-turn hot rolling and solution treatment, etc., which causes an increase in manufacturing cost' and has excellent strength, electrical conductivity and stress resistance. The tempering property, the bending edging property, the _ sex, the affinity, the mineralization property, and the mineralization property can be manufactured in a smashing manner. The present inventors have, in order to achieve the above object, firstly, in order to differentiate from a new viewpoint, a Nl_Sl system Carrying out coarse particles In-depth study. That is, 'the focus of the Ni-Sl system coarse particles in the past, focusing only on the particle size and the average number, the present invention produces the following "particle group: Concept 2 while focusing on the Nl_Si system coarse particles Distribution state, and adjust the influence of a large particle group of Ni-Si system on the characteristics. Referring to Fig. 1 'Fig. 1 shows a collection of Ni_si coarse particles which can be observed by surface magnification using FE_SEM (electrolytic emission scanning electron microscope: manufactured by Philips) Representative form of the body. From the viewpoint of the cross section or the right-angle cross section parallel to the rolling direction, it is observed that the Ni-Si-based coarse particle aggregate of I274786 is arranged in the orthogonal direction of the thickness direction. The aggregate can form a subsequently defined system. Large particle group.

Ni-Si系粗大粒子群,會對特性造成以下的不良影響。 (1) 於焊接時,在粒子群上會產生焊料難以附著。 (2) 在餘刻加工時,會有粒子殘渣,而使蝕刻面失去平 滑性。 (3) 在進行鍍Ag、Ni等時,粒子群上會產生鍍層之針 孔。又,粒子群上無法獲得充分的鍍層密合強度,在此部 分會發生鍍層剝離、鍍層鼓起。 (4) 彎曲加工時,粒子群變成裂痕的起點,而造成彎曲 加工性變差。 (5) 於冷壓延時,粒子群乃傷痕產生的原因,而使表面 外觀變差。 另一方面,本發明人等同時獲得以下認知。 (1)關於粒徑10〜2〇#m之粒子,若形成分散分布,則 鲁會對特性造成不良影響,但只要控制在2個/麵2以下,則 其影響可忽略。 (2)關於粒徑2〜10//m之粒子,若形成分散分布,雖對 特性的影響較小,但若集合而以粒子群的 對特性產生不良影響。 予將 ⑺關於粒徑未達m之粒子,就算集合而以粒子群 的方式存在,其對特性的影響仍很小。 本發明係基於上述認知而完成者,係提供-CU-Ni-Si-Mg系銅合金條,係使用銅基合金,其含有u〜質量% 127478.6 之Ni、漠度僅Ni質量%濃度1/6〜1/4之Si、〇 〇5〜〇·3質量 %之Mg、及殘部之Cu及不可避免的雜質;在平行於^ 方向的截面上’ Ni_Sl纟化合物粒子具有條件⑴及 布狀態: ⑴粒徑H)〜之Ni-Si系化合物粒子為2個/_2 以下, ⑺粒捏2〜20# m的Nl_Si系化合物粒子所構成之m_si 系粒子群中,長度⑽〜以咖之犯七系粒子群的個數為 2個/mm2以下。 本發明之Cu-Ni-Si-Mg系銅合金條較佳為,進一步含 有總量為0.01〜2.0質量%之選自Sn、Zn、Ag中之至少— 種。 本發明之另一實施形態,係將上述合金條加工而製得 之電子機器用元件,其包含半導體機器之導線架,或連接 杰、端子、繼電器、開關等的導電性彈簧。 本發明之Cu-Ni-Si-Mg系銅合金條,並不須經由高溫 且長時間之熱壓延及溶體化處理等導致製造成本上昇的原 因,且具備優異的強度、導電性、耐應力緩和特性、彎曲 加工性、蝕刻性、親和性、鍍敷性,因此其技術價值及實 用性比習知技術高,而適用於導線架、端子、連接器等所 使用之銅合金。 【實施方式】 (l)Ni 及 Si 1274786 之The Ni-Si coarse particle group has the following adverse effects on the characteristics. (1) When soldering, solder is hard to adhere to the particle group. (2) During the machining of the remainder, there will be particle residue, which will make the etched surface lose its smoothness. (3) When Ag, Ni, etc. are plated, a pinhole of plating is formed on the particle group. Further, sufficient plating adhesion strength cannot be obtained on the particle group, and peeling of the plating layer and swelling of the plating layer occur in this portion. (4) When bending, the particle group becomes the starting point of the crack, and the bending workability is deteriorated. (5) In the case of cold pressing delay, the particle group is the cause of the flaw, and the surface appearance is deteriorated. On the other hand, the present inventors simultaneously obtained the following recognition. (1) Regarding the particles having a particle diameter of 10 to 2 Å#m, if a dispersion distribution is formed, Lu will adversely affect the characteristics. However, if the control is 2 or 2 or less, the influence is negligible. (2) Particles having a particle diameter of 2 to 10/m have a small influence on the characteristics when they are dispersed, but if they are aggregated, they adversely affect the characteristics of the particle group. (7) Regarding particles having a particle size of less than m, even if they are aggregated, they exist as a particle group, and their influence on properties is still small. The present invention is based on the above-mentioned cognition, and provides a -CU-Ni-Si-Mg-based copper alloy strip using a copper-based alloy containing U~mass% of 127478.6 Ni, and a degree of disparity of only Ni mass% of concentration 1/ 6 to 1/4 of Si, 〇〇5 to 〇·3 mass% of Mg, and residual Cu and unavoidable impurities; in the cross section parallel to the ^ direction, the 'Ni_Sl 纟 compound particles have the condition (1) and the cloth state: (1) The particle size H) to the Ni-Si-based compound particles are 2 / _2 or less, and (7) the m_si-based particle group composed of the Nl_Si-based compound particles of the granules 2 to 20 # m, the length (10) ~ The number of particle groups is 2/mm2 or less. The Cu-Ni-Si-Mg-based copper alloy strip of the present invention preferably further contains at least a selected from the group consisting of Sn, Zn, and Ag in a total amount of 0.01 to 2.0% by mass. According to still another embodiment of the present invention, an element for an electronic device obtained by processing the above-described alloy strip includes a lead frame of a semiconductor device or a conductive spring connected to a terminal, a relay, a switch, or the like. The Cu-Ni-Si-Mg-based copper alloy strip of the present invention does not require high temperature and long-term heat rolling and solution treatment, and the manufacturing cost is increased, and has excellent strength, electrical conductivity, and resistance. Since the stress relaxation property, the bending workability, the etching property, the affinity, and the plating property are high, the technical value and practicality are higher than those of the prior art, and it is suitable for a copper alloy used for a lead frame, a terminal, a connector, or the like. [Embodiment] (l) Ni and Si 1274786

Ni 電 質 延Ni electrical extension

Ni及Sl ’藉由進行時效處理,可形成主要為%si :屬間化合物的微細粒子。其結果,可顯著增加合金強度 同時使導電性提昇。Si之添加濃度(質量%),其範圍為 添加濃度(質量%)之1/6〜1/4。Si添加量超出此範圍時導 :降低。Νι之添加範圍為1〇〜4 〇質量%。Ni低於I·。 量%時無法獲得充分強度,Ni超過4 〇 #量%時在熱壓 時會發生裂痕。 (2) Mg 若在Cu-Ni-Si系銅合金中添加〇 〇5質量%以上的Mg, 拉伸強度及女全限應力會提昇,且耐熱性及應力緩和特 性也會提昇。另一方面,若Mg添加量超過〇·3質量%,則 製造性會差且導電率會大幅降低。 (3) 粒徑1〇〜20# m之Ni-Si粒子 關於粒徑10以上之粒子,若形成分散分布,則會對焊 料親和性、鍍敷性、彎曲加工性等造成不良影響,但只要 控制在與壓延方向平行之截面為2個/mm2以下,則其影塑 可忽略。在此所指的Ni-Si系粒子定義為,含有5〇at%^ 上Ni、且含有20at%以上Si之粒子。Ni_Si粒子之粒徑, 係定義為包圍粒子之最小圓的直徑(以下相同)。又粒徑超 過20/zm之粒子,不拘其個數多募均會對特性造成不良影 響,但一般Cu-Ni-Si系銅合金中不會存在超過2〇//m之粒 子。 (4) Ni-Si系粒子群 若粒徑2 // m以上的Ni-Si系粒子聚集成粒子群,則會 11 1274786 2顯Μ壓延平行截面觀察之犯⑻系粒子群之代表形能 (用FE-SEM(電解放射型掃描電子顯微鏡:飛利浦公 以、1〇00倍觀察)。在此,Ν^系粒子群係指,相鄰Ni_; 糸粒子間的距離⑷為1〇&quot;m以内之粒徑2〜的集合 體。Ni-Si系粒子若以㈣1〇心的間隔形成分散,只、: 粒位在1 0 # m以下,則其對特性的影響可忽視;但若以 1〇心以下的距離聚集’就算是粒徑心⑺以下的粒子群 只要粒徑未達2心就會對特性產生不良影響。在此,「粒 子群長度(L)」係指包圍i個粒子群之最小圓的直徑,長度 越大的粒子群、或粒子群數目越多,則其對特性的影響越 大。依本發明人之實驗結果,就算2心以上的系粒 子聚集成粒子群,當在壓延方向平行截面之粒子群長度⑸ 於0.05mm日守’不拘其個數均不致對焊料親和性、鑛敷 ί·生弓曲加工性等造成不良影響。當粒子群長度⑹為 0.0540mm時,只要粒子群個數為2個/麵2以下就不會 對特性造成影響。又長度(L)超過1〇咖之粒子群,不拘 其個數均會對特性造成料,但—般Cu_Ni_si系銅合金中 並不存在超過1.0mm之粒子群。 (5)Mg以外之添加元素 若在CU-Ni-Si-Mg系銅合金條中添加會和犯或以行 化學反應的元素’由於Ni_Sl系粒子的形態或分布會產生 變化,將無法獲得本發明之效果。另一方面,若基於提昇 強度之目的而添加Sn、Zn、Ag等(不會和川或si行化學 反應)的元素時,與未添加該等元素時同樣地,可獲得本發 12 1274786 ’故添加量之合計值 質量%以下俾獲得所 明之效果。然而,由於導電率會降低 以2·〇質量%以下為佳,更佳為0.01 希望的效果。 關於cU-Nl-Sl,系銅合金條之 用大氣炫煉爐在木炭被覆下炫煉電解銅、序:先 原料,獲得既定組成的炫 Sl、Mg專的 然後進行熱&gt;1延,再反覆η「 物W成麵錠。 且有既a戸痒《 進仃々壓延與熱處理,以加工成 ’、无疋厚度及特性之條或箔。埶虛採孫七人 與時效處理。n老 …、處理係包含固溶化處理Ni and Sl' can form fine particles mainly composed of %si: intergeneric compounds by aging treatment. As a result, the strength of the alloy can be remarkably increased while the conductivity is improved. The added concentration (% by mass) of Si is in the range of 1/6 to 1/4 of the added concentration (% by mass). When the amount of Si added exceeds this range, the lead is lowered. The range of addition of Νι is 1〇~4 〇质量%. Ni is lower than I·. When the amount is %, sufficient strength cannot be obtained, and when Ni exceeds 4 〇 #% by weight, cracks may occur during hot pressing. (2) When Mg is added to the Cu-Ni-Si-based copper alloy in an amount of 5% by mass or more of Mg, the tensile strength and the female full-limit stress are increased, and the heat resistance and the stress relaxation property are also improved. On the other hand, when the amount of addition of Mg exceeds 〇·3 mass%, the manufacturability is inferior and the electrical conductivity is largely lowered. (3) Ni-Si particles having a particle diameter of 1 〇 to 20 # m, if particles having a particle diameter of 10 or more are formed into a dispersion distribution, they may adversely affect solder affinity, plating property, bending workability, and the like, but When the cross section parallel to the rolling direction is controlled to be 2/mm 2 or less, the shadow is negligible. The Ni-Si-based particles referred to herein are defined as particles containing 5 at% of Ni and containing 20 at% or more of Si. The particle diameter of the Ni_Si particles is defined as the diameter of the smallest circle surrounding the particles (the same applies hereinafter). Further, particles having a particle diameter of more than 20/zm may adversely affect the characteristics regardless of the number of particles, but generally no particles of more than 2 Å/m are present in the Cu-Ni-Si-based copper alloy. (4) If the Ni-Si-based particles of the Ni-Si-based particle group are aggregated into a particle group with a particle size of 2 // m or more, the 11 1274786 2 is observed and the parallel cross-section is observed (8) is the representative shape of the particle group ( FE-SEM (electrolytic radiation scanning electron microscope: Philips public observation, 1 00 times observation). Here, the Ν^ system particle group means that the distance (4) between adjacent Ni_; 糸 particles is 1〇&quot;m The aggregate of particle diameters 2 to 2 is formed. When the Ni-Si particles are dispersed at intervals of (4) 1 〇, only when the particle position is below 10 # m, the influence on the characteristics can be ignored; If the particle size below the particle size (7) is less than 2, the particle size will have an adverse effect on the characteristics. Here, the "particle group length (L)" refers to the surrounding particle group. The diameter of the smallest circle, the larger the particle group, or the larger the number of particle groups, the greater the influence on the characteristics. According to the experimental results of the inventors, even if the particles above 2 cents are aggregated into the particle group, The length of the particle group in the parallel section of the rolling direction (5) is 0.05 mm, and the number of the particles does not affect the solder pro When the particle length (6) is 0.0540 mm, the particle length (6) is 0.0540 mm, and the particle size is not affected by the number of particles. The particle group of more than one 〇 , , , , , , 不 不 Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu Cu In the Ni-Si-Mg-based copper alloy strip, an element which reacts with or reacts chemically is changed. The shape or distribution of the Ni_Sl-based particles may change, and the effect of the present invention may not be obtained. For the purpose of adding an element such as Sn, Zn, Ag, or the like (which does not chemically react with Sichuan or Si), the total amount of the added amount of the amount of the present invention can be obtained in the same manner as in the case where the element is not added. The following effects are obtained. However, since the conductivity is lowered to 2% by mass or less, more preferably 0.01 is desired. Regarding cU-Nl-Sl, the copper alloy strip is used in an atmosphere smelting furnace. Charcoal covered with smelting electrolytic copper, order: first raw materials Obtaining a certain composition of the dazzling Sl, Mg, and then heat &gt; 1 extension, and then repeat η "object W into a surface ingot. And there is a itching "introduction and heat treatment, to process into", no flaw thickness And the characteristics of the strip or foil. 埶 采 孙 孙 与 与 与 与 与 与 与 n n n n n n n n n n n n n

文處理ϋ洛化處理時,係L1Q 而使Ν〗Ί· έ儿人a, ι〜π /皿加熱, 使Mi Sl系化合物固溶於&amp;基 進行再結晶。固 、’ β τ使Cu基體 處理有時能以熱壓延來兼任。時效處 Γ’係以350〜55°。。的溫度範圍加…時以上俾ΐ 固溶化處理所固溶之Ni盥 卑使 與Sl以微細粒子(主體為Ni2Si)的 析出。該時效處理可提昇強度與導電率。為獲得更古 強度’可在時效處理前及/或時效處理後進行冷壓延。又&quot; Μ效處理後進行冷壓延時,可在冷壓延後進行去應力退 火(低温退火)。 疋 上述步驟中,對產生Ni_Si系粗大粒子而言最重 步驟為鑄造。鑄造_ N“Si系粗大粒子之生成部位 口、、且、、我的aa界,其原因為Si及Mg在粒界之濃化(偏析 致。溶融物之冷卻過程中,㈣系粗大粒子會在晶界產 生(結晶化)。凝固後之冷卻過程中,粗大Ni_Si粒會成長而 變大,可能也會產生(析出)新的Ni-Si系、粗大粒子。Mg之 存在會顯著促進Ni-Si系粗大粒子在晶界的生成及成長。 13 1274786 當在晶界產生Ni-Si系粗大粒子,若將鑄造組織微細化而 使晶界面積加大,則Ni_Si系粗大粒子之分布變疏鬆。相 反地,若將鑄造組織粗大化,則晶界面積變小而使Ni_si , 系粗大粒子的分布變密,則圖1所示般之Ni_Si系粒子群 ' 的產生頻率增加。 本發明之Cu-Ni-Si—M§系銅合金條,不須昇高熱壓延 及/或固溶化處理的溫度而使粗大Ni_si系粒子固溶化,僅 藉由加快鑄造時的冷卻速度來控制鑄造組織,即可獲得所 •希望的特性。 以下,為了使本發明之特徵及最佳實施形態更加清楚, 係使用實施例作具體的說明。 使用咼頻感應爐,在内徑60rnm的石墨坩堝中使3kg ,電解銅熔融,添加Nl、Sl、Mg而調整成2·5質量%犯_〇.5 =里o/oSx(其濃度為Ni的1/5)_015質量%Mg之熔融物成 分。將熔融物調整成既定溫度後,澆鑄於圖3形狀的鑄模 φ中。為了使鑄造組織產生較大變化,係如以下般改變澆鑄 溫度及鑄模材質。 (1)洗鑄溫度:採用115(TC與125(TC兩條件。期待能 籍由降低’堯轉溫度使每造組織微細化,而使Ni_y系粒子 分散。 ’' 夂(2)鑄模材質:採用耐火磚、石墨、鑄鐵、純銅等四種 T件。依耐火磚、石墨、鑄鐵、純銅的順序加大冷卻速度。 期待能藉由加大冷卻速度使鑄造組織微細化,而使Ni_si 系粒子分散。 14 127478.6 系粒子分散。 ,又’為進行比較亦製作未添加Mg之合金,並調查Mg 對生成Ni-Si系夾雜物之影響等。 ’、 將忒鑄錠依以下順序進行加工熱處理,而獲得 厚度〇.15mm之試料。 ⑴將鑄加熱3小時後,熱壓延 熱壓延溫度為62〇。(:。When the treatment is carried out, the L1Q is used to heat the Sl Ί έ έ a a, ι 〜 π / dish, and the Mi Sl compound is dissolved in the &amp; base for recrystallization. The solid and 'β τ can sometimes be subjected to hot calendering in order to treat the Cu substrate. The aging department is 350~55°. . When the temperature range is increased by 俾ΐ, the Ni 盥 which is solid-solved by the solution treatment is precipitated with S1 as fine particles (mainly Ni 2 Si). This aging treatment increases strength and electrical conductivity. For greater strength, cold calendering can be carried out before and/or after aging treatment. Also, after the treatment, the cold pressing delay is performed, and the stress relief annealing (low temperature annealing) can be performed after the cold rolling.疋 In the above steps, the most important step for producing Ni_Si-based coarse particles is casting. Casting_ N "Si-based coarse particles are formed at the mouth, and, and my aa boundary. The reason is that Si and Mg are concentrated at the grain boundary (segregation. During the cooling of the melt, (4) is a coarse particle. Produced at the grain boundary (crystallization). During the cooling process after solidification, the coarse Ni_Si particles will grow and become larger, and new Ni-Si and coarse particles may also be formed (precipitated). The presence of Mg significantly promotes Ni- When the coarse particles of the Si system are formed and grown at the grain boundary. 13 1274786 When the Ni-Si coarse particles are generated at the grain boundaries, if the cast structure is made fine and the grain boundary area is increased, the distribution of the Ni_Si coarse particles becomes loose. On the other hand, when the cast structure is coarsened, the grain boundary area is reduced, and the distribution of Ni_si and coarse particles is increased, and the frequency of generation of the Ni_Si-based particle group 'as shown in Fig. 1 is increased. Cu-Ni of the present invention. -Si-M§ is a copper alloy strip, and the coarse Ni_si-based particles are solid-solved without increasing the temperature of hot rolling and/or solution treatment, and the cast structure can be controlled only by accelerating the cooling rate at the time of casting. • The desired characteristics. Below, in order to The features and preferred embodiments of the present invention will be more clearly described by way of specific examples. In a graphite induction crucible having an inner diameter of 60 rnm, 3 kg of electrolytic copper is melted, and Nl, Sl, and Mg are added and adjusted. 2·5 mass% _〇.5 = 里o/oSx (the concentration is 1/5 of Ni) _015 mass% Mg of the melt component. After the melt is adjusted to a predetermined temperature, it is cast in the shape of Fig. 3 In the mold φ. In order to make a large change in the cast structure, the casting temperature and the mold material are changed as follows: (1) Washing temperature: 115 (TC and 125 (TC two conditions. Expected to reduce the 'turning' The temperature makes each microstructure finer and the Ni_y particles are dispersed. '' 夂(2) Mold material: Four kinds of T parts, such as refractory brick, graphite, cast iron, and pure copper, in the order of refractory brick, graphite, cast iron, and pure copper. Increasing the cooling rate. It is expected that the Ni_si particles will be dispersed by increasing the cooling rate, and the Ni_si particles will be dispersed. 14 127478.6 The particles are dispersed. In addition, the alloy without Mg is prepared for comparison, and the Mg pair is investigated. Effect of generating Ni-Si inclusions Etc.. The tantalum ingot was subjected to processing heat treatment in the following order to obtain a sample having a thickness of 1515 mm. (1) After heating the casting for 3 hours, the hot rolling heat rolling temperature was 62 〇.

(2) 用研磨機除去熱壓延材表面之氧化皮。 (3) 冷壓延至板厚2mm。 ⑷貫施固溶化處理,係在78〇。〇加熱2〇秒後於水中急 卻。 〜 (5) 以化學研磨來除去表面氧化膜。 (6) 冷壓延至板厚〇 5ιηιη。 (7) 貝軛時效處理,係在氫中以4;3〇。〇加熱3小時 (8) 以化學研磨來除去表面氧化膜。 (9) 冷壓延至板厚〇15rnm。 (1〇)貫轭去應力退火(低溫退火),係在氫中以4⑻。◦加 熱1分鐘。 5對製作出的試料進行以下評價。任一試料均以氧濃度 5 質量ppm的範圍、硫濃度1〇〜15質量ppm的範圍 進行。 (1 )Ni-Si糸粒子及粒子群個數 將壓延方向平行截面,藉由使用直徑Ι/zm鑽石磨粒 之機械研磨而精加工成鏡面後,於2(rc、47ie之氯化鐵(2) The scale of the surface of the hot rolled material is removed by a grinder. (3) Cold rolling to a plate thickness of 2 mm. (4) The solution treatment was carried out at 78 Torr. After heating for 2 seconds, it is rushed in the water. ~ (5) Chemical polishing is used to remove the surface oxide film. (6) Cold rolling to a plate thickness 〇 5ιηιη. (7) The yoke aging treatment is 4; 3 在 in hydrogen. Heating for 3 hours (8) Chemical polishing to remove the surface oxide film. (9) Cold rolling to a plate thickness of 15rnm. (1〇) yoke stress relief annealing (low temperature annealing), which is 4 (8) in hydrogen. ◦ Heat up for 1 minute. 5 The following evaluations were performed on the prepared samples. Any of the samples was carried out in the range of an oxygen concentration of 5 ppm by mass and a sulfur concentration of 1 Torr to 15 ppm by mass. (1) Ni-Si 糸 particles and the number of particle groups The parallel cross section in the rolling direction is finished into a mirror surface by mechanical grinding using a diameter Ι/zm diamond abrasive grain, and then 2 (rc, 47ie ferric chloride)

15 ^74786 基體’而使Ni-Si系粒子溶出。用FE_SEM(電解放射型掃 4田包子顯微鏡:飛利浦公司製)以1 〇〇〇倍觀察該截面,測 疋1 〇 m以上的粒子個數與粒子群個數。在此,關於粒子 個數與粒子群個數,係從與試料之壓延方向平行的截面, 任$選出複數個觀察面積為2mm2之觀察視野進行觀察及 測疋。亚未觀察到超過2〇 # m之粒子。也沒有觀察到長度 超過1.0mm之粒子群。關於粒子及粒子群成分是否為 系粒子,係用FE-SEM^EDS(能量分散型χ射分析)分析 其代表形態者來作確認。 (2)彎曲加工性 w、如圖二示,以彎曲軸與塵延方向平行的方式(Bad /I作?I'曲:徑〇·ΐ5_之單側9〇度反覆彎曲,把往 =^斷裂為止的次數。重複進行5次試驗 並求取5次的平均值。 (3 )焊料親和性 取寬度1 0mm之短具士 f 4 長方形S式驗片,用丙酮將 以10VO1%硫酸水溶液進行 表面脫月曰 松脂-乙醇5秒後,於焊料挿中4,將試料浸潰於25% 段於知科槽甲浸漬1〇秒 質量%Sn-40質量%朴, 坏科組成為60 坪科/皿度為23〇。(:,智粗々、夺,主况 度為―。用立體顯微鏡察浸潰焊料後二之:: 試__察到點狀之焊料未附著部位。對:表面二 面積(5個試驗片之表面 于I000mm2的 數。 ^面),求取該”未附著部之個 (4)應力緩和特性 16 1274786 (4)應力緩和特性 如圖5所示,在寬1〇111111&gt;&lt;長loomm、厚度卜〇 15mm 之试驗片’使其負荷上標點距離l = 50mm、高y〇==2〇mm之 彎曲應力,以1 50°C加熱1 〇〇〇小時後,測定圖6所示之永 久變形量(高度)y,依此算出應力緩和率{〔(y_yi)(mm)/(^_ yamm)〕χΐ〇〇(%)}。yi代表負荷應力前之初期彎曲高度。15 ^ 74786 matrix ', and Ni-Si particles were eluted. The cross section was observed by FE_SEM (electrolytic radiation type sweeping bun microscope: manufactured by Philips) at a magnification of 1 ,, and the number of particles of 1 〇 m or more and the number of particle groups were measured. Here, the number of particles and the number of particle groups are observed and measured from a cross section parallel to the rolling direction of the sample, and a plurality of observation fields having an observation area of 2 mm 2 are selected. Asia has not observed more than 2 〇 # m particles. No particle group with a length exceeding 1.0 mm was observed. Whether or not the particles and the particle group components are systemic particles are analyzed by FE-SEM^EDS (energy dispersive spectroscopy). (2) Bending workability w, as shown in Fig. 2, the bending axis is parallel to the direction of the dust extension (Bad / I is made? I'm: the diameter of the 〇·ΐ5_ is 9 〇 反 反 反 , , , , ^Number of times of rupture. Repeat the test 5 times and obtain the average value of 5 times. (3) Solder affinity Take a short length of 10 mm, f 4 rectangular S-type test piece, and use 10 VO1% sulfuric acid aqueous solution with acetone. After the surface was removed from the rosin-ethanol for 5 seconds, the sample was immersed in the solder at 4%, and the sample was immersed in 25% of the section. The immersed in the Zhike tank was immersed for 1 〇 second by mass of Sn-40 mass%, and the bad section was composed of 60 pings. The degree of the dish/dish is 23〇. (:, the wisdom is rough, the robbing, the degree of the main condition is ―. After the dip solder is observed with a stereo microscope, the second:: Test __ to see the spot-like solder unattached parts. The surface area of the two surfaces (the surface of the five test pieces is the number of I000 mm2. ^ surface), and the "unattached portion" (4) stress relaxation characteristics are obtained. 16 1274786 (4) Stress relaxation characteristics are shown in Fig. 5, and are wide. 1〇111111&gt;&lt;long loomm, thickness dip 15mm test piece' to make the load on the punctuation point distance l = 50mm, high y 〇 == 2 〇 mm bending stress, add 1 50 ° C After 1 hour, the amount of permanent deformation (height) y shown in Fig. 6 was measured, and the stress relaxation rate {[(y_yi)(mm) / (^_ yamm)] χΐ〇〇 (%)} was calculated. Yi represents the initial bending height before the load stress.

由表1可知,依本發明之Cu_Ni_Si_Mg系銅合金條^實 施例1〜5),可獲得與比較例9、1〇(未添加河§的情开蓉 級或更佳之良好彎曲加工性、焊料親和性。 / 另一方面,比較例6〜8,雖與本發明採相同成分的合 金,但因鑄模材料、洗鑄溫度的影響而使禱鍵組織變得不 夠小,故粒徑心m以上的粒子及Ni_Si系粒子群的個數 均超過2個/mm2’而造成焊料親和性、f曲加工性之變差。 # m以上的粒子及Ni_Si系 以下,但也因未添加Mg 為差。 比較例9、1〇係未添加岣的以抓Si合金,若以例 5、7相同條件製作鑄錠並添加Mg,則可看出其直徑 &quot;以上的粒子及Ni_Si系粒子群之個數會增加。比較例9、 之彎曲加卫性及焊料親和性,由於未添加Mg故直徑ι〇 粒子群之個數可抑制在2個/mm2 ’故其耐應力緩和特性比實施例 ’係將全部粒子大小限 之夾雜物個數限定為50 熱溫度限定為8 0 0 °C以 且固溶化處理溫度較佳 又’特開2000_49369號公報中 定為10// m以下,將5〜10/z m大小 個/mm2。為獲得此狀態,熱壓延加 上’終了溫度限定為650°C以上, 17 1274786 上之Ni Si系粒子個數為i ·〇個/mm2,又經測定的結果得 知其5 10 &quot; m之粒子個數為6〇個/mm2。此乃因熱壓延溫 度與溶體化處理溫度較彳氏所&amp; 錄 又平乂低所致。然而,猎由將鑄造條件最 佳化以調整Mi-Si系粒子的分&amp; #戽 τ丨让丁的刀帀,儘官Ni-Si粒子個數稍多 仍能獲得良好的蟬料親和性與彎曲加工性。 〔表1〕As can be seen from Table 1, according to the Cu_Ni_Si_Mg-based copper alloy strip of the present invention, Examples 1 to 5), it is possible to obtain a good bending workability and solder with Comparative Example 9, No. 1 (without adding § Affinity. On the other hand, in Comparative Examples 6 to 8, although the alloy of the same composition is used in the present invention, the prayer structure is not sufficiently small due to the influence of the mold material and the casting temperature, so the particle diameter is m or more. The number of particles and the number of Ni—Si-based particles is more than two/mm 2′, which causes deterioration in solder affinity and f-curvature. The particles of # m or more and the Ni—Si-based or lower are also poor in the absence of Mg. In Comparative Example 9, the lanthanum was not added with yttrium to capture the Si alloy. If the ingot was produced under the same conditions as in Examples 5 and 7, and Mg was added, the diameter of the above particles and the number of Ni_Si-based particles were observed. In addition, in Comparative Example 9, the bending edging property and the solder affinity, since the number of the diameter ι〇 particle group can be suppressed to 2/mm2' without adding Mg, the stress relaxation property is higher than that of the embodiment. The number of inclusions of all particle size limits is limited to 50. The thermal temperature is limited to 800 °C and The melting treatment temperature is preferably set to 10/m or less in the publication of JP-A-2000-49369, and is 5 to 10/zm in size/mm2. To obtain this state, the hot rolling plus 'end temperature is limited to 650 ° C. Above, the number of Ni Si-based particles on 17 1274786 is i · 〇 / mm 2 , and the number of particles of 5 10 &quot; m is 6 / / mm 2 as a result of measurement. This is due to hot rolling The temperature and the solution treatment temperature are lower than those of the 彳 所 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Oh, it is still possible to obtain good tantalum affinity and bending workability when the number of Ni-Si particles is slightly larger. [Table 1]

【圖式簡單說明J 圖1係顯示Ni-Si系粗大粒子 示意圖 的集合體的代表形態之 圖2係顯示壓延平行截面所觀 处士 规奔您Nl_si系粒子群的 代表形態之示意圖。 圖3係顯示鑄模形狀 18 1274786 圖3係顯示鑄模形狀。 圖4係反覆彎曲試驗法之說明圖。 圖5係應力緩和試驗法的說明圖。 圖6係應力緩和試驗法之永久變形量之相關說明圖。 【主要元件符號說明】 L…粒子群長度 d···粒子間距離 1···彎曲應力之負荷(標點距離) t···試驗片厚度 y〇…彎曲應力之負荷(高度) y···永久變形量(高度)BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows a representative form of a collection of schematic diagrams of Ni-Si coarse particles. Fig. 2 is a schematic diagram showing the representative form of the Nl_si-based particle group. Figure 3 shows the shape of the mold 18 1274786 Figure 3 shows the shape of the mold. Fig. 4 is an explanatory view of a repeated bending test method. Fig. 5 is an explanatory diagram of a stress relaxation test method. Fig. 6 is an explanatory diagram showing the amount of permanent deformation of the stress relaxation test method. [Description of main component symbols] L...particle group length d···particle distance 1··· bending stress load (punctuation distance) t···test piece thickness y〇...bending stress load (height) y·· ·The amount of permanent deformation (height)

1919

Claims (1)

2006. 09 1、一種 Cu-Ni-Si-JVls &amp; Μ 人人 α s糸鋼合金條,係使用銅基合金, 其含有1.0〜4.0質量%之V ^ 、里之Nl、濃度僅Ni質量%濃度1/6〜1/4 之 Si、〇.〇5〜〇·3 皙晉 〇/n&gt; A, 、 之Mg、及殘部之cii及不可避免的 雜質;在平行於壓延方^ 向的截面上,Ni-Si系化合物粒子 具有條件(1)及(2)的分布狀態: (1)粒徑10〜20 // m夕\T· c •么儿人以 M m之Ni-Si糸化合物粒子為2個/mm2 以下, …(2)粒位2 20 // m的犯⑻系化合物粒子所構成之队⑴ 系粒子群中,長度G g5〜1g麵之系粒子群的個 2個/mm2以下。 两 2、如申請專利範4 圍弟1項之Cn-Ni-Si_Mg系銅合金侔 係進一步含有總量為〇 m 〇 a併曰。/ 诛’ 勺ϋ·〇1〜2.0質量%之選自Sn、z 中之至少一種。 n Ag 十一、圖式·· 如次頁 202006. 09 1. A Cu-Ni-Si-JVls &amp; Μ Renren α s 糸 steel alloy strip, using a copper-based alloy containing 1.0 to 4.0% by mass of V ^ , N1 in the middle, and a concentration of only Ni % concentration of 1/6 to 1/4 of Si, 〇.〇5~〇·3 皙晋〇/n&gt; A, , Mg, and the cii of the residue and inevitable impurities; in parallel with the calendering direction In the cross section, the Ni-Si-based compound particles have the distribution states of the conditions (1) and (2): (1) The particle size is 10 to 20 // m \ \T· c • The person is M-Ni-Si糸In the case where the number of the compound particles is 2/mm2 or less, ... (2) The group of the (8) compound particles composed of the particles (2) is a group of particles (1) in the particle group, and the particle group of the length G g5 to 1 g is two. /mm2 or less. 2. The Cn-Ni-Si_Mg-based copper alloy system of the patent application No. 4 is further contained in the total amount of 〇 m 〇 a and 曰. / 诛' Scoop 〇 〇 1 to 2.0% by mass of at least one selected from the group consisting of Sn and z. n Ag 十一,图·· 如次页 20
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CN110809805B (en) * 2017-07-10 2021-10-26 株式会社协成 Conductive member, contact pin, and device using copper-silver alloy

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