TWI271246B - Electrolytic processing apparatus and method - Google Patents

Electrolytic processing apparatus and method Download PDF

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Publication number
TWI271246B
TWI271246B TW092100219A TW92100219A TWI271246B TW I271246 B TWI271246 B TW I271246B TW 092100219 A TW092100219 A TW 092100219A TW 92100219 A TW92100219 A TW 92100219A TW I271246 B TWI271246 B TW I271246B
Authority
TW
Taiwan
Prior art keywords
electrode
processing
workpiece
substrate
electrolytic
Prior art date
Application number
TW092100219A
Other languages
English (en)
Chinese (zh)
Other versions
TW200301717A (en
Inventor
Yuzo Mori
Mitsuhiko Shirakashi
Masayuki Kumekawa
Hozumi Yasuda
Itsuki Kobata
Original Assignee
Yuzo Mori
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yuzo Mori, Ebara Corp filed Critical Yuzo Mori
Publication of TW200301717A publication Critical patent/TW200301717A/zh
Application granted granted Critical
Publication of TWI271246B publication Critical patent/TWI271246B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H3/00—Electrochemical machining, i.e. removing metal by passing current between an electrode and a workpiece in the presence of an electrolyte
    • B23H3/08—Working media
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H3/00—Electrochemical machining, i.e. removing metal by passing current between an electrode and a workpiece in the presence of an electrolyte
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H5/00—Combined machining
    • B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
    • B23H5/08—Electrolytic grinding
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
TW092100219A 2002-01-08 2003-01-07 Electrolytic processing apparatus and method TWI271246B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002001737A JP2003205428A (ja) 2002-01-08 2002-01-08 電解加工装置及び方法

Publications (2)

Publication Number Publication Date
TW200301717A TW200301717A (en) 2003-07-16
TWI271246B true TWI271246B (en) 2007-01-21

Family

ID=19190647

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092100219A TWI271246B (en) 2002-01-08 2003-01-07 Electrolytic processing apparatus and method

Country Status (4)

Country Link
US (1) US20050115838A1 (ko)
JP (1) JP2003205428A (ko)
TW (1) TWI271246B (ko)
WO (1) WO2003057948A1 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1453991A4 (en) * 2001-12-13 2007-12-05 Ebara Corp APPARATUS AND METHOD FOR ELECTROLYTIC PROCESSING
DE102006062037B4 (de) * 2006-12-29 2013-10-31 Advanced Micro Devices, Inc. Verfahren zum Steuern eines elektrochemischen Ätzprozesses und System mit einer elektrochemischen Ätzanlage
DE102006062031B3 (de) * 2006-12-29 2008-06-19 Advanced Micro Devices, Inc., Sunnyvale System zum Antreiben und Steuern einer bewegbaren Elektrodenanordnung in einer elektro-chemischen Prozessanlage
MD3808G2 (ro) * 2007-05-25 2009-08-31 Институт Прикладной Физики Академии Наук Молдовы Instalaţie de prelucrare electrică a metalelor
CN104400156B (zh) * 2014-09-12 2017-10-10 南京航空航天大学 非圆截面电解切割电极及其装置
CN106191946B (zh) * 2016-08-08 2018-10-09 江苏大学 一种多电位吸液电沉积3d打印的装置和方法
CN108385158A (zh) * 2018-03-16 2018-08-10 江西宏业铜箔有限公司 一种高延低峰值超薄铜箔的光面微蚀处理工艺及设备
TWI720548B (zh) * 2019-07-17 2021-03-01 逢甲大學 變脈寬定電流控制之電化學加工方法及其裝置
TWI742663B (zh) * 2020-05-15 2021-10-11 國立臺灣師範大學 電解加工設備及其方法
US20230390887A1 (en) * 2022-06-06 2023-12-07 Applied Materials, Inc. Face-up wafer electrochemical planarization apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5149405A (en) * 1991-05-28 1992-09-22 Lehr Precision Inc. Four-axis ECM machine and method of operation
JP3837783B2 (ja) * 1996-08-12 2006-10-25 森 勇蔵 超純水中の水酸基による加工方法
US6652658B1 (en) * 1998-12-07 2003-11-25 Japan Science And Technology Corporation Method for machining/cleaning by hydroxide ion in ultrapure water
JP2001064799A (ja) * 1999-08-27 2001-03-13 Yuzo Mori 電解加工方法及び装置
JP4513145B2 (ja) * 1999-09-07 2010-07-28 ソニー株式会社 半導体装置の製造方法および研磨方法
JP4141114B2 (ja) * 2000-07-05 2008-08-27 株式会社荏原製作所 電解加工方法及び装置
JP4043234B2 (ja) * 2001-06-18 2008-02-06 株式会社荏原製作所 電解加工装置及び基板処理装置
US7101465B2 (en) * 2001-06-18 2006-09-05 Ebara Corporation Electrolytic processing device and substrate processing apparatus
US7638030B2 (en) * 2001-06-18 2009-12-29 Ebara Corporation Electrolytic processing apparatus and electrolytic processing method

Also Published As

Publication number Publication date
WO2003057948A1 (en) 2003-07-17
US20050115838A1 (en) 2005-06-02
JP2003205428A (ja) 2003-07-22
TW200301717A (en) 2003-07-16

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