TWI268564B - Semiconductor device and fabrication method thereof - Google Patents
Semiconductor device and fabrication method thereofInfo
- Publication number
- TWI268564B TWI268564B TW094111288A TW94111288A TWI268564B TW I268564 B TWI268564 B TW I268564B TW 094111288 A TW094111288 A TW 094111288A TW 94111288 A TW94111288 A TW 94111288A TW I268564 B TWI268564 B TW I268564B
- Authority
- TW
- Taiwan
- Prior art keywords
- metallic
- dielectric layer
- layer
- redistribution
- opening
- Prior art date
Links
Classifications
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- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
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- H01L23/00—Details of semiconductor or other solid state devices
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- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3114—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW094111288A TWI268564B (en) | 2005-04-11 | 2005-04-11 | Semiconductor device and fabrication method thereof |
| US11/373,693 US7489037B2 (en) | 2005-04-11 | 2006-03-10 | Semiconductor device and fabrication method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW094111288A TWI268564B (en) | 2005-04-11 | 2005-04-11 | Semiconductor device and fabrication method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200636885A TW200636885A (en) | 2006-10-16 |
| TWI268564B true TWI268564B (en) | 2006-12-11 |
Family
ID=37082423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094111288A TWI268564B (en) | 2005-04-11 | 2005-04-11 | Semiconductor device and fabrication method thereof |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7489037B2 (zh) |
| TW (1) | TWI268564B (zh) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7547969B2 (en) | 2004-10-29 | 2009-06-16 | Megica Corporation | Semiconductor chip with passivation layer comprising metal interconnect and contact pads |
| KR100642643B1 (ko) * | 2005-03-18 | 2006-11-10 | 삼성전자주식회사 | 내부회로의 전원/접지선들과 직접 접속되는 재배치된전원/접지선들을 갖는 반도체 칩들 및 그 제조방법들 |
| US7397121B2 (en) * | 2005-10-28 | 2008-07-08 | Megica Corporation | Semiconductor chip with post-passivation scheme formed over passivation layer |
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| US10325853B2 (en) * | 2014-12-03 | 2019-06-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of forming semiconductor packages having through package vias |
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| KR102628861B1 (ko) | 2016-09-13 | 2024-01-25 | 삼성전자주식회사 | 반도체 패키지 및 재배선 패턴 형성 방법 |
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| JP2002110799A (ja) * | 2000-09-27 | 2002-04-12 | Toshiba Corp | 半導体装置及びその製造方法 |
| JP4260405B2 (ja) * | 2002-02-08 | 2009-04-30 | 株式会社ルネサステクノロジ | 半導体集積回路装置の製造方法 |
| TW543125B (en) | 2002-05-15 | 2003-07-21 | Advanced Chip Eng Tech Inc | Fan-out type wafer level package and the method of the same |
| TWI223882B (en) * | 2003-06-30 | 2004-11-11 | Advanced Semiconductor Eng | Bumping process |
| TWI225280B (en) * | 2003-06-30 | 2004-12-11 | Advanced Semiconductor Eng | Bumping process |
| US7122458B2 (en) * | 2004-07-22 | 2006-10-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for fabricating pad redistribution layer |
| TWI239594B (en) * | 2004-10-06 | 2005-09-11 | Advanced Semiconductor Eng | Redistribution layer structure of a wafer and the fabrication method thereof |
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| TW200636885A (en) | 2006-10-16 |
| US7489037B2 (en) | 2009-02-10 |
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