TWI266959B - Device manufacturing method, device manufactured thereby and a mask for use in the method - Google Patents

Device manufacturing method, device manufactured thereby and a mask for use in the method

Info

Publication number
TWI266959B
TWI266959B TW091113258A TW91113258A TWI266959B TW I266959 B TWI266959 B TW I266959B TW 091113258 A TW091113258 A TW 091113258A TW 91113258 A TW91113258 A TW 91113258A TW I266959 B TWI266959 B TW I266959B
Authority
TW
Taiwan
Prior art keywords
radiation
projection
mask
device manufacturing
sensitive material
Prior art date
Application number
TW091113258A
Other languages
English (en)
Inventor
Der Werf Jan Evert Van
Erik Roelof Loopstra
Hans Meiling
Johannes Hubertus Joseph Moors
Martinus Hendrikus An Leenders
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Application granted granted Critical
Publication of TWI266959B publication Critical patent/TWI266959B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW091113258A 2001-06-20 2002-06-18 Device manufacturing method, device manufactured thereby and a mask for use in the method TWI266959B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01305341 2001-06-20

Publications (1)

Publication Number Publication Date
TWI266959B true TWI266959B (en) 2006-11-21

Family

ID=8182042

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091113258A TWI266959B (en) 2001-06-20 2002-06-18 Device manufacturing method, device manufactured thereby and a mask for use in the method

Country Status (4)

Country Link
US (2) US6879374B2 (zh)
JP (1) JP2003059827A (zh)
KR (1) KR100548713B1 (zh)
TW (1) TWI266959B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI407266B (zh) * 2008-12-31 2013-09-01 Asml Holding Nv 光學補償單方向性之主光罩扭曲器

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US6879374B2 (en) * 2001-06-20 2005-04-12 Asml Netherlands B.V. Device manufacturing method, device manufactured thereby and a mask for use in the method
US7042550B2 (en) * 2002-11-28 2006-05-09 Asml Netherlands B.V. Device manufacturing method and computer program
DE102004014766A1 (de) * 2003-04-02 2004-10-21 Carl Zeiss Smt Ag Verfahren zur Verzeichnungskorrektur in einer mikrolithographischen Projektionsbelichtungsanlage
JP4378109B2 (ja) * 2003-05-30 2009-12-02 キヤノン株式会社 露光装置、投影光学系、デバイスの製造方法
US7204944B2 (en) * 2003-09-23 2007-04-17 Pelican International Inc. Process and apparatus for creating color effects in extrudable material
JP4603814B2 (ja) * 2004-04-23 2010-12-22 キヤノン株式会社 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法
CN101002306A (zh) * 2004-12-22 2007-07-18 株式会社尼康 掩模表面的高度方向位置测定方法、曝光装置以及曝光方法
US7518706B2 (en) 2004-12-27 2009-04-14 Asml Netherlands B.V. Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly
US7834975B2 (en) * 2004-12-27 2010-11-16 Asml Netherlands B.V. Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
SG124407A1 (en) * 2005-02-03 2006-08-30 Asml Netherlands Bv Method of generating a photolithography patterningdevice, computer program, patterning device, meth od of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus
KR100919173B1 (ko) * 2005-07-26 2009-09-28 후지쯔 마이크로일렉트로닉스 가부시키가이샤 위치 맞춤 방법
US7573584B2 (en) * 2006-09-25 2009-08-11 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7894038B2 (en) * 2007-03-14 2011-02-22 Asml Netherlands B.V. Device manufacturing method, lithographic apparatus, and a computer program
JP5167050B2 (ja) * 2008-09-30 2013-03-21 ルネサスエレクトロニクス株式会社 半導体装置の製造方法およびマスクの製造方法
US20110174086A1 (en) * 2010-01-19 2011-07-21 Divyasimha Harish Capacitive sensor based structure and method with tilt compensation capability
DE102010056444A1 (de) 2010-12-28 2012-06-28 Carl Zeiss Smt Gmbh Verfahren zur mikrolithographischen Projektion einer Maske auf eine lichtempfindliche Schicht
JP5684168B2 (ja) * 2012-02-15 2015-03-11 株式会社東芝 フレア計測方法、反射型マスクおよび露光装置
NL2011592A (en) * 2012-10-31 2014-05-06 Asml Netherlands Bv Compensation for patterning device deformation.
US10580545B2 (en) * 2013-09-25 2020-03-03 Asml Netherlands B.V. Beam delivery apparatus and method
KR102395198B1 (ko) 2015-09-22 2022-05-06 삼성전자주식회사 마스크 패턴의 보정 방법 및 이를 이용하는 레티클의 제조 방법
WO2017153085A1 (en) 2016-03-10 2017-09-14 Asml Netherlands B.V. Measurement system, lithographic apparatus and device manufacturing method
JP7260959B2 (ja) * 2018-03-16 2023-04-19 キヤノン株式会社 リソグラフィ装置、照明装置及び物品の製造方法

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI407266B (zh) * 2008-12-31 2013-09-01 Asml Holding Nv 光學補償單方向性之主光罩扭曲器
US8553207B2 (en) 2008-12-31 2013-10-08 Asml Holdings N.V. Optically compensated unidirectional reticle bender

Also Published As

Publication number Publication date
US20030003383A1 (en) 2003-01-02
US6879374B2 (en) 2005-04-12
KR20020096984A (ko) 2002-12-31
JP2003059827A (ja) 2003-02-28
KR100548713B1 (ko) 2006-02-02
US20050146703A1 (en) 2005-07-07
US7492443B2 (en) 2009-02-17

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