TWI265383B - Lithographic apparatus, device manufacturing method and variable attenuator - Google Patents

Lithographic apparatus, device manufacturing method and variable attenuator

Info

Publication number
TWI265383B
TWI265383B TW094108209A TW94108209A TWI265383B TW I265383 B TWI265383 B TW I265383B TW 094108209 A TW094108209 A TW 094108209A TW 94108209 A TW94108209 A TW 94108209A TW I265383 B TWI265383 B TW I265383B
Authority
TW
Taiwan
Prior art keywords
mirrors
intensity
projection
radiation
variable attenuator
Prior art date
Application number
TW094108209A
Other languages
English (en)
Other versions
TW200600977A (en
Inventor
Harm-Jan Voorma
Dijsseldonk Antonius Johan Van
Uwe Mickan
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200600977A publication Critical patent/TW200600977A/zh
Application granted granted Critical
Publication of TWI265383B publication Critical patent/TWI265383B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094108209A 2004-03-22 2005-03-17 Lithographic apparatus, device manufacturing method and variable attenuator TWI265383B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/805,526 US7145640B2 (en) 2004-03-22 2004-03-22 Lithographic apparatus, device manufacturing method and variable attenuator

Publications (2)

Publication Number Publication Date
TW200600977A TW200600977A (en) 2006-01-01
TWI265383B true TWI265383B (en) 2006-11-01

Family

ID=34862015

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094108209A TWI265383B (en) 2004-03-22 2005-03-17 Lithographic apparatus, device manufacturing method and variable attenuator

Country Status (8)

Country Link
US (1) US7145640B2 (zh)
EP (1) EP1580603B1 (zh)
JP (1) JP4313328B2 (zh)
KR (1) KR100714469B1 (zh)
CN (1) CN100498537C (zh)
DE (1) DE602005022957D1 (zh)
SG (1) SG115769A1 (zh)
TW (1) TWI265383B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100674959B1 (ko) * 2005-02-23 2007-01-26 삼성전자주식회사 비축상 프로젝션 광학계 및 이를 적용한 극자외선 리소그래피 장치
US7532308B2 (en) * 2005-09-13 2009-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7683300B2 (en) * 2006-10-17 2010-03-23 Asml Netherlands B.V. Using an interferometer as a high speed variable attenuator
US8116342B2 (en) * 2007-03-26 2012-02-14 Nikon Corporation Variable attenuator device and method
US9151881B2 (en) * 2012-11-12 2015-10-06 Kla-Tencor Corporation Phase grating for mask inspection system
WO2014202585A2 (en) 2013-06-18 2014-12-24 Asml Netherlands B.V. Lithographic method
KR102275466B1 (ko) * 2013-09-25 2021-07-13 에이에스엠엘 네델란즈 비.브이. 빔 전달 장치 및 방법
JP6388200B2 (ja) * 2013-12-13 2018-09-12 大日本印刷株式会社 照明装置、投射装置、光学素子及び、光学モジュール
US9575412B2 (en) 2014-03-31 2017-02-21 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for reducing pole imbalance by adjusting exposure intensity
CN107430348B (zh) * 2015-03-02 2021-09-24 Asml荷兰有限公司 辐射系统
CN105159080B (zh) * 2015-08-31 2017-10-24 武汉光迅科技股份有限公司 基于自动标定和智能学习的可调光衰减器控制方法及系统
CN108027567B (zh) * 2015-09-03 2020-12-01 Asml荷兰有限公司 衰减设备和方法
CN105842831B (zh) * 2016-04-24 2018-05-11 湖南戴斯光电有限公司 测量高功率激光聚焦光斑强度分布的衰减装置
WO2020141050A1 (en) * 2018-12-31 2020-07-09 Asml Netherlands B.V. Position metrology apparatus and associated optical elements

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4192573A (en) * 1977-02-14 1980-03-11 The United States Of America As Represented By The Secretary Of The Navy Variable power attenuator for light beams
US4778263A (en) * 1987-05-29 1988-10-18 The United States Of America As Respresented By The Department Of Energy Variable laser attenuator
JPH05251310A (ja) 1992-03-06 1993-09-28 Nikon Corp 露光制御装置
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP2000277421A (ja) * 1999-03-26 2000-10-06 Nikon Corp 照明装置
US6630984B2 (en) * 2000-08-03 2003-10-07 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US20020136939A1 (en) 2001-02-15 2002-09-26 Grieve M. James Fuel cell and battery voltage controlling method and system
KR100551209B1 (ko) 2001-09-07 2006-02-14 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
US6577379B1 (en) * 2001-11-05 2003-06-10 Micron Technology, Inc. Method and apparatus for shaping and/or orienting radiation irradiating a microlithographic substrate
TWI242690B (en) * 2002-08-15 2005-11-01 Asml Netherlands Bv Reflector assembly, lithographic projection apparatus, radiation system with the reflector assembly, and method of manufacturing an integrated structure by a lithographic process
US7016014B2 (en) * 2004-02-27 2006-03-21 Asml Netherlands B.V Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US7145640B2 (en) 2006-12-05
EP1580603A2 (en) 2005-09-28
SG115769A1 (en) 2005-10-28
JP2005277414A (ja) 2005-10-06
KR20060044471A (ko) 2006-05-16
CN100498537C (zh) 2009-06-10
CN1673875A (zh) 2005-09-28
EP1580603B1 (en) 2010-08-18
JP4313328B2 (ja) 2009-08-12
KR100714469B1 (ko) 2007-05-04
US20050206869A1 (en) 2005-09-22
DE602005022957D1 (de) 2010-09-30
EP1580603A3 (en) 2006-02-01
TW200600977A (en) 2006-01-01

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees