SG115769A1 - Lithographic apparatus, device manufacturing method and variable attenuator - Google Patents

Lithographic apparatus, device manufacturing method and variable attenuator

Info

Publication number
SG115769A1
SG115769A1 SG200501615A SG200501615A SG115769A1 SG 115769 A1 SG115769 A1 SG 115769A1 SG 200501615 A SG200501615 A SG 200501615A SG 200501615 A SG200501615 A SG 200501615A SG 115769 A1 SG115769 A1 SG 115769A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
variable attenuator
attenuator
variable
Prior art date
Application number
SG200501615A
Other languages
English (en)
Inventor
Harm-Jan Voorma
Dijsseldonk Antonius Johan Van
Uwe Mickan
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG115769A1 publication Critical patent/SG115769A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200501615A 2004-03-22 2005-03-17 Lithographic apparatus, device manufacturing method and variable attenuator SG115769A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/805,526 US7145640B2 (en) 2004-03-22 2004-03-22 Lithographic apparatus, device manufacturing method and variable attenuator

Publications (1)

Publication Number Publication Date
SG115769A1 true SG115769A1 (en) 2005-10-28

Family

ID=34862015

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200501615A SG115769A1 (en) 2004-03-22 2005-03-17 Lithographic apparatus, device manufacturing method and variable attenuator

Country Status (8)

Country Link
US (1) US7145640B2 (zh)
EP (1) EP1580603B1 (zh)
JP (1) JP4313328B2 (zh)
KR (1) KR100714469B1 (zh)
CN (1) CN100498537C (zh)
DE (1) DE602005022957D1 (zh)
SG (1) SG115769A1 (zh)
TW (1) TWI265383B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100674959B1 (ko) * 2005-02-23 2007-01-26 삼성전자주식회사 비축상 프로젝션 광학계 및 이를 적용한 극자외선 리소그래피 장치
US7532308B2 (en) * 2005-09-13 2009-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7683300B2 (en) * 2006-10-17 2010-03-23 Asml Netherlands B.V. Using an interferometer as a high speed variable attenuator
US8116342B2 (en) * 2007-03-26 2012-02-14 Nikon Corporation Variable attenuator device and method
US9151881B2 (en) * 2012-11-12 2015-10-06 Kla-Tencor Corporation Phase grating for mask inspection system
WO2014202585A2 (en) 2013-06-18 2014-12-24 Asml Netherlands B.V. Lithographic method
KR102275466B1 (ko) * 2013-09-25 2021-07-13 에이에스엠엘 네델란즈 비.브이. 빔 전달 장치 및 방법
JP6388200B2 (ja) * 2013-12-13 2018-09-12 大日本印刷株式会社 照明装置、投射装置、光学素子及び、光学モジュール
US9575412B2 (en) 2014-03-31 2017-02-21 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for reducing pole imbalance by adjusting exposure intensity
CN107430348B (zh) * 2015-03-02 2021-09-24 Asml荷兰有限公司 辐射系统
CN105159080B (zh) * 2015-08-31 2017-10-24 武汉光迅科技股份有限公司 基于自动标定和智能学习的可调光衰减器控制方法及系统
CN108027567B (zh) * 2015-09-03 2020-12-01 Asml荷兰有限公司 衰减设备和方法
CN105842831B (zh) * 2016-04-24 2018-05-11 湖南戴斯光电有限公司 测量高功率激光聚焦光斑强度分布的衰减装置
WO2020141050A1 (en) * 2018-12-31 2020-07-09 Asml Netherlands B.V. Position metrology apparatus and associated optical elements

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4192573A (en) * 1977-02-14 1980-03-11 The United States Of America As Represented By The Secretary Of The Navy Variable power attenuator for light beams
US4778263A (en) * 1987-05-29 1988-10-18 The United States Of America As Respresented By The Department Of Energy Variable laser attenuator
JPH05251310A (ja) 1992-03-06 1993-09-28 Nikon Corp 露光制御装置
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP2000277421A (ja) * 1999-03-26 2000-10-06 Nikon Corp 照明装置
US6630984B2 (en) * 2000-08-03 2003-10-07 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US20020136939A1 (en) 2001-02-15 2002-09-26 Grieve M. James Fuel cell and battery voltage controlling method and system
KR100551209B1 (ko) 2001-09-07 2006-02-14 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
US6577379B1 (en) * 2001-11-05 2003-06-10 Micron Technology, Inc. Method and apparatus for shaping and/or orienting radiation irradiating a microlithographic substrate
TWI242690B (en) * 2002-08-15 2005-11-01 Asml Netherlands Bv Reflector assembly, lithographic projection apparatus, radiation system with the reflector assembly, and method of manufacturing an integrated structure by a lithographic process
US7016014B2 (en) * 2004-02-27 2006-03-21 Asml Netherlands B.V Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US7145640B2 (en) 2006-12-05
EP1580603A2 (en) 2005-09-28
JP2005277414A (ja) 2005-10-06
KR20060044471A (ko) 2006-05-16
CN100498537C (zh) 2009-06-10
CN1673875A (zh) 2005-09-28
TWI265383B (en) 2006-11-01
EP1580603B1 (en) 2010-08-18
JP4313328B2 (ja) 2009-08-12
KR100714469B1 (ko) 2007-05-04
US20050206869A1 (en) 2005-09-22
DE602005022957D1 (de) 2010-09-30
EP1580603A3 (en) 2006-02-01
TW200600977A (en) 2006-01-01

Similar Documents

Publication Publication Date Title
HK1243226B (zh) 曝光裝置、曝光方法以及器件製造方法
SG115769A1 (en) Lithographic apparatus, device manufacturing method and variable attenuator
EP1821338A4 (en) EXPOSURE DEVICE, EXPOSURE METHOD AND MANUFACTURING METHOD FOR THE DEVICE
SG116611A1 (en) Lithographic apparatus and device manufacturing method.
TWI315454B (en) Stage apparatus, lithographic apparatus and device manufacturing method
SG10201802153XA (en) Exposure apparatus, exposure method, and method for manufacturing device
SG120267A1 (en) Lithographic apparatus and device manufacturing method
SG114712A1 (en) Lithographic apparatus and device manufacturing method
SG131107A1 (en) Lithographic apparatus and device manufacturing method
SG117565A1 (en) Lithographic apparatus and device manufacturing method
SG115818A1 (en) Lithographic apparatus and device manufacturing method
SG117591A1 (en) Lithographic apparatus and device manufacturing method
SG115816A1 (en) Lithographic apparatus and device manufacturing method
SG118329A1 (en) Lithographic apparatus and device manufacturing method
SG118391A1 (en) Lithographic apparatus and device manufacturing method
SG121969A1 (en) Lithographic apparatus and device manufacturing method
EP1808884A4 (en) EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
SG123749A1 (en) Lithographic apparatus and device manufacturing method
SG123713A1 (en) Lithographic apparatus and device manufacturing method
SG121967A1 (en) Lithographic apparatus and device manufacturing method
SG123687A1 (en) Lithographic apparatus and device manufacturing method
SG123752A1 (en) Lithographic apparatus and device manufacturing method
SG118419A1 (en) Lithographic apparatus and device manufacturing method
SG121968A1 (en) Lithographic apparatus and device manufacturing method
SG115813A1 (en) Lithographic apparatus and device manufacturing method