TWI255850B - Slurry for chemical mechanical polishing - Google Patents
Slurry for chemical mechanical polishingInfo
- Publication number
- TWI255850B TWI255850B TW089128248A TW89128248A TWI255850B TW I255850 B TWI255850 B TW I255850B TW 089128248 A TW089128248 A TW 089128248A TW 89128248 A TW89128248 A TW 89128248A TW I255850 B TWI255850 B TW I255850B
- Authority
- TW
- Taiwan
- Prior art keywords
- chemical mechanical
- mechanical polishing
- slurry
- tantalum
- polishing
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 5
- 239000000126 substance Substances 0.000 title abstract 3
- 239000002002 slurry Substances 0.000 title abstract 2
- 229910052715 tantalum Inorganic materials 0.000 abstract 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 230000003628 erosive effect Effects 0.000 abstract 1
- 229910017053 inorganic salt Inorganic materials 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/7684—Smoothing; Planarisation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP37448699A JP2001187876A (ja) | 1999-12-28 | 1999-12-28 | 化学的機械的研磨用スラリー |
Publications (1)
Publication Number | Publication Date |
---|---|
TWI255850B true TWI255850B (en) | 2006-06-01 |
Family
ID=18503933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW089128248A TWI255850B (en) | 1999-12-28 | 2000-12-28 | Slurry for chemical mechanical polishing |
Country Status (4)
Country | Link |
---|---|
US (1) | US20010006224A1 (zh) |
JP (1) | JP2001187876A (zh) |
KR (1) | KR100402442B1 (zh) |
TW (1) | TWI255850B (zh) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3645129B2 (ja) * | 1999-06-25 | 2005-05-11 | Necエレクトロニクス株式会社 | 半導体装置の製造方法 |
WO2003008660A1 (en) * | 2001-07-19 | 2003-01-30 | Trikon Holdings Limited | Depositing a tantalum film |
KR100444307B1 (ko) * | 2001-12-28 | 2004-08-16 | 주식회사 하이닉스반도체 | 반도체소자의 금속배선 콘택플러그 형성방법 |
US7316603B2 (en) * | 2002-01-22 | 2008-01-08 | Cabot Microelectronics Corporation | Compositions and methods for tantalum CMP |
KR20030063763A (ko) * | 2002-01-24 | 2003-07-31 | 한국과학기술연구원 | 텅스텐 씨엠피용 슬러리 |
JP3749867B2 (ja) * | 2002-03-08 | 2006-03-01 | 株式会社東芝 | アルミニウム系金属用研磨液および半導体装置の製造方法 |
US7677956B2 (en) * | 2002-05-10 | 2010-03-16 | Cabot Microelectronics Corporation | Compositions and methods for dielectric CMP |
KR100496501B1 (ko) * | 2002-05-29 | 2005-06-22 | 동우 화인켐 주식회사 | 구리배선에서 탄탈 금속 또는 탄탈계 화합물로 된 확산방지재의 cmp용 연마 슬러리 조성물 |
US7799200B1 (en) | 2002-07-29 | 2010-09-21 | Novellus Systems, Inc. | Selective electrochemical accelerator removal |
JP4010903B2 (ja) | 2002-08-02 | 2007-11-21 | Necエレクトロニクス株式会社 | 化学的機械的研磨用スラリー |
KR100498814B1 (ko) * | 2002-10-18 | 2005-07-01 | 주식회사 동진쎄미켐 | 텅스텐 막에 대한 연마 속도가 우수하고 안정성이 뛰어난화학-기계적 연마 슬러리 조성물 |
WO2004101222A2 (en) * | 2003-05-12 | 2004-11-25 | Advanced Technology Materials, Inc. | Chemical mechanical polishing compositions for step-ii copper liner and other associated materials and method of using same |
KR101072342B1 (ko) * | 2003-06-30 | 2011-10-11 | 동우 화인켐 주식회사 | 구리의 화학적 기계적 연마를 위한 슬러리 조성물 |
US7186653B2 (en) * | 2003-07-30 | 2007-03-06 | Climax Engineered Materials, Llc | Polishing slurries and methods for chemical mechanical polishing |
US7485241B2 (en) * | 2003-09-11 | 2009-02-03 | Cabot Microelectronics Corporation | Chemical-mechanical polishing composition and method for using the same |
US8372757B2 (en) | 2003-10-20 | 2013-02-12 | Novellus Systems, Inc. | Wet etching methods for copper removal and planarization in semiconductor processing |
US8158532B2 (en) * | 2003-10-20 | 2012-04-17 | Novellus Systems, Inc. | Topography reduction and control by selective accelerator removal |
US8530359B2 (en) | 2003-10-20 | 2013-09-10 | Novellus Systems, Inc. | Modulated metal removal using localized wet etching |
US20050090106A1 (en) * | 2003-10-22 | 2005-04-28 | Jinru Bian | Method of second step polishing in copper CMP with a polishing fluid containing no oxidizing agent |
US6971945B2 (en) * | 2004-02-23 | 2005-12-06 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Multi-step polishing solution for chemical mechanical planarization |
US20050211950A1 (en) * | 2004-03-24 | 2005-09-29 | Cabot Microelectronics Corporation | Chemical-mechanical polishing composition and method for using the same |
US6997785B1 (en) * | 2004-12-23 | 2006-02-14 | 3M Innovative Properties Company | Wafer planarization composition and method of use |
US7803203B2 (en) * | 2005-09-26 | 2010-09-28 | Cabot Microelectronics Corporation | Compositions and methods for CMP of semiconductor materials |
US8211193B2 (en) * | 2005-09-26 | 2012-07-03 | Fujifilm Planar Solutions, LLC | Ultrapure colloidal silica for use in chemical mechanical polishing applications |
US7501346B2 (en) * | 2006-07-21 | 2009-03-10 | Cabot Microelectronics Corporation | Gallium and chromium ions for oxide rate enhancement |
US20080105652A1 (en) * | 2006-11-02 | 2008-05-08 | Cabot Microelectronics Corporation | CMP of copper/ruthenium/tantalum substrates |
US8541310B2 (en) | 2007-05-04 | 2013-09-24 | Cabot Microelectronics Corporation | CMP compositions containing a soluble peroxometalate complex and methods of use thereof |
FR2929609B1 (fr) * | 2008-04-07 | 2010-05-28 | Seppic Sa | Composition de depolissage de verre exempte d'ions ammonium et d'ions bifluorure |
CN102484061B (zh) | 2009-09-02 | 2015-08-19 | 诺发系统有限公司 | 降低的各向同性蚀刻剂材料消耗及废料产生 |
US8168540B1 (en) | 2009-12-29 | 2012-05-01 | Novellus Systems, Inc. | Methods and apparatus for depositing copper on tungsten |
MY165019A (en) * | 2011-03-31 | 2018-02-28 | Hoya Corp | Method of manufacturing a glass substrate for a magnetic disk and method of manufacturing a magnetic disk |
KR101955391B1 (ko) * | 2012-07-16 | 2019-03-08 | 주식회사 동진쎄미켐 | 구리막, 실리콘막 및 실리콘산화막 연마 슬러리 조성물 및 연마 방법 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5858813A (en) * | 1996-05-10 | 1999-01-12 | Cabot Corporation | Chemical mechanical polishing slurry for metal layers and films |
JP2000248264A (ja) * | 1999-03-02 | 2000-09-12 | Sumitomo Chem Co Ltd | 研磨用組成物及びそれを用いてなる金属材料の研磨方法 |
JP2000248265A (ja) * | 1999-03-02 | 2000-09-12 | Sumitomo Chem Co Ltd | 研磨用組成物及びそれを用いてなる金属材料の研磨方法 |
US6375693B1 (en) * | 1999-05-07 | 2002-04-23 | International Business Machines Corporation | Chemical-mechanical planarization of barriers or liners for copper metallurgy |
JP4657408B2 (ja) * | 1999-10-13 | 2011-03-23 | 株式会社トクヤマ | 金属膜用研磨剤 |
JP2001115146A (ja) * | 1999-10-18 | 2001-04-24 | Tokuyama Corp | バリア膜用研磨剤 |
JP2001152134A (ja) * | 1999-11-22 | 2001-06-05 | Speedfam Co Ltd | 酸化物単結晶ウェーハ用研磨用組成物及び酸化物単結晶ウェーハの研磨方法 |
JP2001223216A (ja) * | 1999-12-01 | 2001-08-17 | Tokuyama Corp | 半導体装置の製造方法 |
JP4500429B2 (ja) * | 1999-12-24 | 2010-07-14 | 株式会社トクヤマ | バリア膜用研磨剤 |
-
1999
- 1999-12-28 JP JP37448699A patent/JP2001187876A/ja active Pending
-
2000
- 2000-12-20 US US09/741,408 patent/US20010006224A1/en not_active Abandoned
- 2000-12-27 KR KR10-2000-0082567A patent/KR100402442B1/ko active IP Right Grant
- 2000-12-28 TW TW089128248A patent/TWI255850B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100402442B1 (ko) | 2003-10-22 |
US20010006224A1 (en) | 2001-07-05 |
KR20010062729A (ko) | 2001-07-07 |
JP2001187876A (ja) | 2001-07-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |