TWI235025B - Circuit board structure and method for fabricating the same - Google Patents
Circuit board structure and method for fabricating the same Download PDFInfo
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1235025 五、發明說明(1) 【發明所屬之技術領域】 本發明係關於一種電路板結構及其製法,尤指一種於 多層電路板中利用電鍍導通孔結構以導電連接上、下声線 路層之電路板結構及其製法。 曰 【先前技術】 隨著電子產業的蓬勃發展,電子產品亦逐漸邁入 能、高性能的研發趨勢。為滿足半導體裝置高積集度( Integration)及微型化(MiniaturizaU〇n)的封裝需求 ’以供更多主、被動元件及線路載接,承載半導體晶片之 電路板結構亦逐漸由雙層板演變成多層板(Muiti i r board),俾在有限的空間下,運用層間連接技術(1235025 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a circuit board structure and a manufacturing method thereof, and more particularly to a method for electrically connecting upper and lower acoustic circuit layers in a multi-layer circuit board by using a plated through-hole structure to conduct conduction. Circuit board structure and manufacturing method thereof. [Previous technology] With the vigorous development of the electronics industry, electronic products have gradually entered the trend of energy and high performance research and development. In order to meet the packaging requirements of high integration and miniaturizaion of semiconductor devices, 'for more active and passive components and circuit connections, the circuit board structure carrying semiconductor wafers has gradually evolved from double-layer boards. Multi-layer board (Muiti ir board), in a limited space, the use of inter-layer connection technology (
Interlayer connection)來擴大電路板上可供利用的線路 佈局面積,藉此配合高線路密度之積體電路(ute circuit)需要,以在相同雷敗祐罝仞;接丁 — 的線路及元件。 η電路板早位面積下容納更多數量 為因應微處理器、晶片組與繪圖晶片等高效能曰片之 運算需要,佈有導線之電路板需提犯θ日片之 对盖相官-” *电略板办而徒计其傳遞晶片訊號、 改善頻宽、控制阻抗等功能,來成就高 展。…為符合半導體封裝件輕薄短小、多匕件的, j及:j化的開發方向,電路板已朝向 :: i寬;!L電路板,傳統1〇°微米之線路尺寸:= 線寬度jLlne Wldth)、線路間距(Space)及深 專,縮減至3〇微米以下,並持 度進行研發。 切V尺』、的綠路精Interlayer connection) to expand the available circuit layout area on the circuit board, to meet the needs of high circuit density integrated circuit (ute circuit), in order to defeat the same thunder; circuit and components. η The larger number of circuit boards in the early area is to meet the high-performance computing requirements of microprocessors, chip sets, and graphics chips, etc. Circuit boards with wires need to raise the cover of theta-day film- " * Electrical and electronic board office can only use functions such as transmitting chip signals, improving bandwidth, and controlling impedance to achieve high performance .... In line with the development direction of semiconductor packages, thin, short, and multi-dagger, The circuit board has been oriented to :: i wide;! L circuit board, traditional 10 ° micron circuit size: = line width jLlne Wldth), line spacing (space) and Shenzhen, reduced to less than 30 microns, R & D. Green Rule
17658 全懋.ptd 第10頁17658 懋 .ptd Page 10
1235025 --------------- 五、發明說明(2) ~~―― 為提高電路板之佈線精密度,業界發展出一種增層技 術(Build-up),亦即在一核心電路板(core circiJt board)表面利用線路增層技術交互堆疊多層絕緣層及線 路層’並於該絕緣層中開設導電盲孔(c〇nduct丨ve viak 供上下層線路之間電性連接。其中,線路增層製程係影2 電路板線路密度的關鍵,依照現行技術,業者多以增二丄 程來製作多層電路板。 曰曰 請參閱第1 A至1 C圖,係採用一例如半加成法(1235025 --------------- V. Description of the invention (2) ~~ —— In order to improve the wiring precision of the circuit board, the industry has developed a build-up technology. That is, on the surface of a core circuit board (core circiJt board), multiple layers of insulation layers and circuit layers are alternately stacked by using a line build-up technology, and conductive blind vias (conduct 丨 ve viak are provided in the insulation layer for power between upper and lower lines). Among them, the process of increasing the layer thickness of the circuit is the key to the circuit density of the circuit board. According to the current technology, the industry usually makes multilayer circuit boards by adding two processes. Please refer to Figures 1A to 1C. One such as semi-additive method (
Semi-additive process, SAP)之線路增層製程,首先, 提供一核心電路板1 0,並在其表面形成一絕緣層u,利用 雷射鑽孔(L a s e r d r i 1 1 i n g )技術於該絕緣層1 1上形成開孔 1 1 〇,以連通該核心電路板1 0之内層線路層1 2 (如第1 a圖所 示)。接著,於該絕緣層1 1上以無電解鍍銅方式形成一導 電晶種層13,在該晶種層1 3上施加一圖案化阻層1 4後進行 電鍍,以於該晶種層1 3表面形成圖案化線路層1 5 (如第1 β 圖所示)。之後,剝離該阻層1 4並進行蝕刻,以移除先前 覆蓋於阻層1 4下之晶種層1 3 (如第1 C圖所示);如此,運用 此等步驟重複形成絕緣層及增層線路層,即製成一具有多 層線路結構之電路板。 惟,按一般習用藉由增層方式所製作之多層電路板, 若晶片訊號欲由電路板上層傳送至下層時,該訊號必須從 上層增層線路,經上部增層線路層、上部線路層間之導電 盲孔、而至核心電路板上層線路層’再穿過該核心電路板 内部之電鍍導通孔(Plated through hole,ΡΤΗ)、核心電Semi-additive process (SAP). First, a core circuit board 10 is provided, and an insulating layer u is formed on the surface. The laser drilling (Laserdri 1 1 ing) technology is used in the insulating layer. An opening 1 1 0 is formed on 11 to communicate with the inner circuit layer 1 2 of the core circuit board 10 (as shown in FIG. 1 a). Next, a conductive seed layer 13 is formed on the insulating layer 11 by electroless copper plating, and a patterned resist layer 14 is applied on the seed layer 13 to perform electroplating on the seed layer 1 3 Patterned circuit layer 1 5 is formed on the surface (as shown in Fig. 1 β). After that, the resist layer 14 is peeled off and etched to remove the seed layer 1 3 previously covered under the resist layer 14 (as shown in FIG. 1C). In this way, using these steps to repeatedly form the insulating layer and Adding a circuit layer is to make a circuit board with a multilayer circuit structure. However, according to the conventional multi-layer circuit board produced by the build-up method, if the chip signal is to be transmitted from the upper layer of the circuit board to the lower layer, the signal must be added from the upper layer circuit, through the upper layer circuit layer, and between the upper circuit layers. The conductive blind hole, and the upper circuit layer on the core circuit board, then pass through the plated through hole (PTT), the core circuit
17658 全懋.ptd 第11頁 1235025 -S^------------ 五、發明說明(3)17658 全懋 .ptd Page 11 1235025 -S ^ ------------ V. Description of the invention (3)
路板下層線路層、下部增層線路層間之導電盲孔及下部增 層線路層’方抵達電路板下層。訊號傳遞路徑過長,易造 成電感增強而導致串擾(Cross-talk)或雜訊(Noise)產生 ’才貝及電性傳輸品質。另,由於核心電路板中形成有多數 電链導通孔,而於後續在該核心電路板上、下表面所形成 之增層線路層製作其圖案化線路層時,必須自電鍍導通孔 延伸出連接墊(Pad)空間,藉以形成導電盲孔(Conductive v 1 a)’如此不僅浪費電路板佈線面積,不利於微型化封裝 趨勢,更會因為線路佈局時要閃避電鍍導通孔位置而影響 到電路板空間運用的靈活度。The conductive blind holes between the lower circuit layer of the circuit board, the lower increased circuit layer and the lower increased circuit layer 'reach the lower layer of the circuit board. The signal transmission path is too long, which can easily lead to increased inductance and cause cross-talk or noise. In addition, since most of the electrical chain vias are formed in the core circuit board, when the patterned circuit layer is subsequently formed in the layered circuit layer formed on the core circuit board and the lower surface, the connection must be extended from the plated through hole. Pad space to form a conductive blind hole (Conductive v 1 a) 'This not only wastes the circuit board wiring area, is not conducive to the trend of miniaturized packaging, but also affects the circuit board because of the need to avoid the position of the plated vias in the circuit layout. Flexibility in the use of space.
再者,或有直接在電鍍導通孔上形成導電盲孔之方式 ’惟在該電鍍導通孔上欲直接形成導電盲孔時,必須先在 具電錢導通孔之整體電路板表面上形成^一金屬層,而為供 後續在該電鍍導通孔上形成導電盲孔,因而需在該電鍍導 通孔之塞孔樹脂上形成一足夠厚度之金屬層,以避免後續 製程中,金屬層受塞孔樹脂影響而產生裂損甚或分離,惟 ,由於該金屬層係同時形成於該電路板整體表面,因此, 常由於該金屬層之厚度過厚或厚度不均等問題,導致後續 藉由例如餘刻等圖案化製程中,形成導電線路及電性連接 墊之精度困擾,而無法形成一縝密之細線路結構。 而由於玎縮小積體電路(1C)面積且具有高密度與多接 腳化特性的等封裝件已日漸成為封裝市場上的主流,且電 路板製程佔有封裝成本的2 0 %至50%,因此在半導體晶片之 積體電路製程已縮小至〇· 09 // m且封裝尺寸亦不斷縮小至Furthermore, there may be a way to form conductive blind vias directly on the plated vias. However, if conductive blind vias are to be formed directly on the plated through vias, the entire circuit board surface with the conductive vias must be formed first. Metal layer, and in order to form conductive blind holes in the plated vias, a metal layer of sufficient thickness must be formed on the plug hole resin of the plated vias to prevent the metal layer from being subject to plug hole resin in subsequent processes The effect of cracks or even separation, but because the metal layer is formed on the entire surface of the circuit board at the same time, often due to the thickness of the metal layer is too thick or uneven thickness problems, resulting in subsequent patterns such as In the chemical process, the accuracy of forming conductive lines and electrical connection pads is troubled, and a dense and fine circuit structure cannot be formed. And because of the reduction of integrated circuit (1C) area, and other packages with high density and multi-pin characteristics have gradually become the mainstream in the packaging market, and the circuit board manufacturing process accounts for 20% to 50% of the packaging cost, so The integrated circuit manufacturing process on semiconductor wafers has been reduced to 0.09 // m and the package size has been continuously reduced to
17658 全懋.Ptd 第12頁 1235025 五、發明說明(4) ' 幾乎與晶片同大(約僅為晶片之h 2倍)時,如何開發可與 其搭配的細線路(Fine Circuit )與高線路密度之電路板結 構’同時不致提高過多製造成本,無疑是半導體產業乃至 其他相關電子產業進入下一世代技術之重要研發課題。 【發明内容】 鑒於以上所述習知技術之缺點,本發明之主要目的在 於提供一種電路板結構及其製法,係可直接在電鍍導通孔 上开> 成電性連接知’ &供電路板其餘電性連接端與導電線 路具縝密之細線路結構。 於提供一 佈局面積 佈局靈活 於提供一 空間,並 連接關係 於提供一 ,以避免 性品質。 的,本發 芯層板, 導通孔; 電層;選 阻層,該 端部之開 本發明之冉 ,藉以擴大電路板的線路 Interlayer circuits)之 本發明之又一目的在 ,藉以縮短導電盲孔佈線 鍍導通孔形成較佳之電性 本發明之又—目的在 ,藉以縮短訊號傳輸路徑 一步提昇半導體裝置之電 為達成上述及其他目 之製法,係包括:提供一 層,且形成有多數之電鑛 鍍導通孔端部表面形成導 金屬層上形成圖案化電鍍 少一外露出該電鍍導通孔 種電路板結構及其製法 ’並且提高層間線路( 性。 種電路板結構及其製法 供該導電盲孔鍍層與電 〇 種電路板結構及其製法 串擾、雜訊之產生而進 明揭露一種電路板結構 該芯層板表面具有金屬 於顯露出該芯層板之電 擇性於該芯層板表面之 圖案化電鍍阻層具有至 口;進行電鍍製程,以17658 Quan 懋 .Ptd Page 12 1235025 V. Description of the Invention (4) '' When it is almost the same size as a chip (about 2 times the size of the chip), how to develop a fine circuit and high circuit density that can be used with it At the same time, the circuit board structure does not increase excessive manufacturing costs, which is undoubtedly an important R & D issue for the semiconductor industry and other related electronics industries to enter the next generation of technology. [Summary of the Invention] In view of the shortcomings of the conventional technology described above, the main object of the present invention is to provide a circuit board structure and a manufacturing method thereof, which can be directly opened on a plated through hole > to form an electrical connection method & for a circuit The remaining electrical connection ends of the board and the conductive lines have a fine and thin circuit structure. In providing a layout area, the layout is flexible to provide a space, and the connection is related to providing a to avoid sexual quality. In the present invention, the core layer board, the vias; the electrical layer; the resistance layer, the end of the invention, to expand the circuit board circuit (Interlayer circuits), another purpose of the present invention is to shorten the conductive blind Hole wiring plating vias form better electrical properties. Another purpose of the present invention is to shorten the signal transmission path and increase the power of semiconductor devices in one step. To achieve the above and other objectives, the method includes: providing a layer and forming a majority of electricity. A patterned plating is formed on the conductive metal layer on the surface of the end of the plated via hole, and a patterned plating is exposed on the surface of the plating via hole. The circuit board structure and its manufacturing method are exposed and the interlayer circuit properties are improved. Hole plating and electrical circuit board structures and the production of crosstalk and noise have revealed a circuit board structure. The surface of the core board has metal to reveal the electrical selectivity of the core board on the surface of the core board. The patterned plating resist layer has an opening; a plating process is performed to
1235025 五、發明說明(5) 在該電鍍阻層開口中形成電鍍金屬 以及圖案化該芯層板表面之金屬層 該電鍍導通孔端部表面上之導 式(Direct plating, DP)以在該電 分形成一例如纪之導電膜,或利用 鍍導通孔之塞孔絕緣部分形成一例 或可利用電鍍方式於該芯層板整體 俾於後績得以透過電錢方式而在言亥 接形成一電性連接端,復可利用金 pattern plating)製程方式以全面 案化線路結構(包含在電鍵導通孔 電性連接端)之表面上,形成一例 ’並進行圖案化線路結構製程,之 銲層,以外露出表面形成有金屬保 或可先進行圖案化線路結構製程, 後,經由電鍍導線或化學沈積等方 拒銲層之電性連接端上形成金屬保 其中,該電性連接端即可作為 件用。此外,在該電鍍導通孔之端 亦可作為後續線路增層結構中承接 直接在電鍍導通孔上形成導電盲孔 有效增加線路佈設空間,提升線路 可持續進行線路增層製程,俾形成 電路板。 層; 〇 電層 鍍導 化學 如鋼 表面 電錢 圖案 在電 上及 如鎳 後, 護層 再覆 式, 護層 電路 部形 導電 ,以 去除該電鍍阻層; 可透過直接鍍覆方 通孔之塞孔絕緣部 沈積方式以在該電 之導電膜。之後亦 形成一金屬薄層, 導通孔之端部上直 化電鍍GPP (Gold 路板表面欲形成圖 電路板其餘部分之 /金等金屬保護層 再覆蓋一圖案化拒 之電性連接端;亦 蓋一圖案化拒銲層 以在外露出圖案化 板後續接置導電元 成電性連接端後, 盲孔之用,俾得以 縮短導電途徑,且 佈局靈活度,之後,復 一具有多層線路結構之1235025 V. Description of the invention (5) Forming a plated metal in the opening of the plating resist layer and patterning the metal layer on the surface of the core layer board The direct plating (DP) on the surface of the end of the plated via hole is applied to the electrode. It can be formed into a conductive film such as Ji, or it can be formed by using a plug-hole insulation part of a plated-through hole or an electroplating method can be used on the core board as a whole. At the connection end, a gold pattern plating process can be used to form a case on the surface of the comprehensive circuit structure (including the electrical connection end of the key via), and the patterned circuit structure process is performed, and the solder layer is exposed outside. A metal shield is formed on the surface, or a patterned circuit structure process can be performed first, and then a metal shield is formed on the electrical connection end of the solder resist layer through electroplated wires or chemical deposition, and the electrical connection end can be used as a part. In addition, the end of the plated through hole can also be used as a layer in the subsequent layer build-up structure. A conductive blind hole is directly formed on the plated through hole to effectively increase the wiring layout space and enhance the line. The layer build-up process can be continued to form a circuit board. 〇 Electrical layer plating chemistry such as steel surface electricity pattern on electricity and after nickel, the protective layer is re-laminated, the protective layer circuit is conductive to remove the plating resist layer; can be directly plated through the square through hole The plug hole insulation is deposited in a way that is electrically conductive. After that, a thin metal layer is also formed, and the end of the via is straightened and electroplated GPP (the surface of the gold circuit board to form the rest of the circuit board / gold and other metal protective layer is covered with a patterned electrical connection terminal; also Covering a patterned solder mask to expose the patterned board and subsequently placing conductive elements to form electrical connections, the use of blind holes shortens the conductive pathway and allows for flexible layout. After that, a multi-layer circuit structure
17658 全懋.ptd 第14頁 1235025 五、發明說明(6) 亦即,透過上述製程,本發明係預先利用阻層覆蓋住 欲形成細線路之區域,再選擇性於部分電鍍導通孔之端部 形成金屬層,而不致影響其餘線路佈局空間與細線路之製 程,同時更可進一步應用在線路增層製程中,藉由在電鍍 導通孔上所形成之電性連接端,以減少承接導電盲孔所需 之電性連接端之設置與接線所佔電路板空間,俾有效提升 線路佈線之密度。 此外,經前述製程,本發明亦揭示出一種電路板結構 ,係包括:一芯層板,其表面形成有圖案化線路結構;以 及多數貫穿該芯層板之電鍍導通孔,其中,該圖案化線路 結構具有多數之電性連接端與導電線路,而至少一電性連 接端係形成於該電鍵導通孔上。其中,該芯層板另可為一 完成前段製程之多層電路板。 因此,藉由本發明之電路板結構及其製法,係可選擇 性在部分欲形成電性連接端之電鍍導通孔上直接形成該電 性連接端,以供後續接置有導電元件,俾提供該電路板與 其餘電子元件(半導體晶片或電路板)之電性導接,亦或 可於該電鍍導通孔上之電性連接端直接形成有線路增層結 構之導電盲孔,以減少習知形成導電盲孔 (C ο n d u c t i v e v i a )時,所需延伸出連接墊(Pad )之空間,藉以增加佈線 路密度與靈活性,並可縮短導電路徑,減少電感、串擾及 雜訊產生;此外,該電鍍導通孔上之電性連接端係於製程 中獨立形成,而不影響該電路板其餘電性連接端及導電線 路之製程,藉以避免習知技術中在電鍍導通孔上欲形成電17658 Quan 懋 .ptd Page 14 1235025 V. Description of the invention (6) That is, through the above process, the present invention uses a resistive layer to cover the area where a fine line is to be formed, and then selectively selects the end of a plated via hole Form a metal layer without affecting the rest of the layout space of the circuit and the process of fine lines. At the same time, it can be further applied in the process of layer buildup. The electrical connection end formed on the plated through hole reduces the number of conductive blind holes. The arrangement and wiring of the required electrical connection terminals occupy space on the circuit board, which effectively improves the density of the wiring. In addition, through the foregoing processes, the present invention also discloses a circuit board structure, which includes: a core board having a patterned circuit structure formed on its surface; and a plurality of plated through holes penetrating through the core board, wherein the patterning The circuit structure has a plurality of electrical connection ends and conductive lines, and at least one electrical connection end is formed on the key via. The core board may be a multi-layer circuit board that has completed the previous process. Therefore, with the circuit board structure and the manufacturing method of the present invention, the electrical connection terminal can be selectively formed directly on a part of the plated through-holes where the electrical connection terminal is to be formed for subsequent connection with a conductive element. The electrical connection between the circuit board and the rest of the electronic components (semiconductor wafer or circuit board), or a conductive blind hole of a circuit build-up structure can be directly formed on the electrical connection end of the plated through hole to reduce the conventional formation. When conducting blind vias (Connductivevia), it is necessary to extend the space of the connection pad (Pad) to increase the density and flexibility of the wiring, shorten the conductive path, reduce inductance, crosstalk and noise; in addition, the plating The electrical connection ends on the vias are formed independently in the manufacturing process, without affecting the process of the remaining electrical connection ends of the circuit board and the conductive lines, so as to avoid the formation of electricity on the plated through holes in the conventional technology.
17658 全懋.ptd 第15頁 1235025 五、發明說明(7) 性連接端時,必需在整體電路板上形成一厚度過厚或厚度 不均之金屬層,導致後續在圖案化製程中形成導電線路及 電性連接端之精度困擾,而無法形成一具細線路結構之電 路板等缺失,而得以提供一具細線路(F i n e c i r c u i t)與高 佈線密度之電路板結構。 【實施方式】 以下係藉由特定的具體實施例說明本發明之實施方式 ,熟習此技藝之人士可由本說明書所揭示之内容輕易地暸 解本發明之其他優點與功效。本發明亦可藉由其他不同的 具體實施例加以施行或應用,本說明書中的各項細節亦可 基於不同觀點與應用,在不悖離本發明之精神下進行各種 修飾與變更。 以下即以第2A圖至第2M圖詳細說明本發明之電路板結 構及其製法之較佳實施例。其中,須注意的是,該等圖式 均為簡化之示意圖,僅以示意方式說明本發明之電路板架 構。惟該等圖式僅顯示與本發明有關之元件,其所顯示之 元件非為實際實施時之態樣,其實際實施時之元件數目、 形狀及尺寸比例為一種選擇性之設計,且其元件佈局型態 可能更行複雜。 如第2A及2B圖所示,首先,提供一表面形成有金屬薄 層之芯層板2 0,該芯層板亦可為一完成前處理之多層電路 板。於本實施例之圖式中,該芯層板2 0係由一絕緣層2 0 0 及形成於該絕緣層2 0 0表面之金屬薄層2 0 1所構成;復以機 械或雷射鑽孔等方式於該芯層板2 0中鑽設多個貫穿孔2 0 217658 Quan 懋 .ptd Page 15 1235025 V. Description of the invention (7) When the connection is made, a metal layer with an excessively thick or uneven thickness must be formed on the overall circuit board, resulting in the subsequent formation of conductive lines in the patterning process. And the accuracy of the electrical connection end is troubled, and it is impossible to form a circuit board with a fine circuit structure, etc., and a circuit board structure with a fine circuit and a high wiring density can be provided. [Embodiment] The following is a description of specific embodiments of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied by other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the spirit of the present invention. Hereinafter, the preferred embodiments of the circuit board structure and the manufacturing method of the present invention will be described in detail with reference to FIGS. 2A to 2M. It should be noted that these drawings are simplified schematic diagrams, and the circuit board structure of the present invention is only illustrated schematically. However, the drawings only show the elements related to the present invention. The elements shown are not the actual implementation. The number, shape, and size ratio of the elements during actual implementation are an optional design. The layout pattern may be more complicated. As shown in Figs. 2A and 2B, first, a core board 20 having a thin metal layer formed on the surface is provided. The core board may also be a multilayer circuit board that has been pre-processed. In the drawing of this embodiment, the core layer board 20 is composed of an insulating layer 200 and a thin metal layer 2 01 formed on the surface of the insulating layer 200; further, a mechanical or laser drill is used. A plurality of through holes 2 0 2 are drilled in the core board 20
17658 全懋.ptd 第16頁 1235025 五、發明說明(8) (如第2 B圖所示)。其中,該絕緣層2 0 0可為環氧樹脂(17658 Quan 懋 .ptd Page 16 1235025 V. Description of the invention (8) (as shown in Figure 2B). The insulating layer 2 0 may be epoxy resin (
Epoxy resin)、聚乙酿胺(Polyimide)、氛 g旨(CyanateEpoxy resin), Polyimide, Cyanate
Ester)、玻璃纖維、雙順丁烯二酸醯亞胺/三氮阱( Bismaleimide Triazine,BT)或混合環氧樹脂與玻璃纖維 之F R 5材質所製成,該金屬薄層2 0 1—般係以導電性較佳之 銅(Cu)為主,以作為訊號傳遞的導線材料,且該金屬薄層 2 0 1可先壓合或沉積於該絕緣層2 0 0上,或使用樹脂壓合銅 箔(Resin coated copper, RCC)予以製作。本實施例採用 一樹脂壓合銅猪(RCC)為例進行說明。 如第2C圖所示,接著,利用物理氣相沈積(PVD)、 化學氣相沈積(CVD)、無電電鍍或化學沈積等方式,例 如濺鍍(Sputtering)、蒸鍍(Evaporation)、電弧蒸 氣沈積(Arc vapor deposition)、離子束錢鍍(Ion beam sputtering)、雷射溶散沈積(Laser ablation deposition)、電漿促進之化學氣相沈積或無電電鍍等, 以於該芯層板2 0及其貫穿孔2 0 2表面形成一導電層(未圖 示),俾藉由該導電層作為電流傳導路徑,以在該怒層板 2 0表面上以及於該貫穿孔2 0 2孔壁上電鍍形成有一具足夠 厚度之金屬層2 0 3。 如第2 D圖所示,復以一填充材2 〇 4 (如油墨樹脂等)填 滿該貫穿孔2 0 2之殘留空隙,俾形成一電鍍導通孔(PTH) 2 0 5,藉以電性導通該芯層板2 0上下表面之金屬層2 〇 3。 如第2E圖所示,於顯露出該芯層板20之電鍍導通孔 20 5端部表面形成一導電層。其可透過無電電鍍等方式先Ester), glass fiber, bismaleimide triazine (BT) or FR 5 material mixed with epoxy resin and glass fiber, the metal thin layer is 2-1 It is based on copper (Cu), which has better conductivity, as a conductor material for signal transmission, and the thin metal layer 201 can be first laminated or deposited on the insulating layer 200, or resin can be used to laminate copper. Foil (Resin coated copper, RCC). This embodiment uses a resin-compressed copper pig (RCC) as an example for illustration. As shown in Figure 2C, next, physical vapor deposition (PVD), chemical vapor deposition (CVD), electroless plating, or chemical deposition are used, such as sputtering, evaporation, and arc vapor deposition. (Arc vapor deposition), Ion beam sputtering, Laser ablation deposition, Plasma promoted chemical vapor deposition or electroless plating, etc. A conductive layer (not shown) is formed on the surface of the through-hole 202, and the conductive layer is used as a current conduction path to be electroplated on the surface of the multilayer board 20 and on the wall of the through-hole 202 There is a metal layer 2 0 3 of sufficient thickness. As shown in FIG. 2D, a filler material 2 0 4 (such as an ink resin) is used to fill the remaining voids of the through hole 2 0 2 to form a plated through hole (PTH) 2 0 5 for electrical properties. The metal layers 200 on the upper and lower surfaces of the core board 20 are conducted. As shown in FIG. 2E, a conductive layer is formed on the surface of the end of the plated-through hole 20 5 where the core board 20 is exposed. It can be made by electroless plating, etc.
17658 全懋.ptd 第17頁 1235025 ____ ______—-- ' — 五、發明說明(9) 在該芯層板2 0之表面形成一導電層(未圖示)’俾藉由該導 電層作為電流傳導路徑,以在該芯層板2 0表面(包含該電 鍍導通孔2 0 5之填充材2 0 4端部)上電鑛形成一例如銅(Cu) 之導電薄層21 (厚度通常可為3至1 〇// m)。此外,如第2E’ 圖所示,亦可於該芯層板2 〇上進行直接鍵覆方式(D i r e c 11 plat ing, DP)等製程,以在該芯層板之表面上形成一例如 I巴(P d)之導電膜2 0 3 a,再經化學剝除製程’以使該把金屬 層依附於該電鍍導通孔2 0 5之填充材2 0 4端部表面’亦或進 行化學銅等製程,以使該電鍍導通孔2 0 5之填充材2 0 4端部 表面覆蓋一導電膜203a。其中,該電鍍導通孔20 5之填充 材20 4端部表面所形成之導電薄層21或導電膜203a,主要 係作為電流傳導路徑,俾於後續進行電鍍製程時,得以選 擇性在該電鍍導通孔2 0 5上形成有電鍍金屬層。以下後續 製程說明,主要係以在該芯層板2 0上形成一例如銅(C u )之 導電薄層2 1加以說明,而於該電鍍導通孔2 0 5之填充材2 0 4 端部表面形成可如鈀或銅之導電膜2 0 3 a,其後續製程係相 近於以下所述之製程步驟,故於此不再多所贅述,合先敘 明。 如第2 F圖所示,於該芯層板2 0上形成第一阻層2 2,並 經過曝光(Exposure)、顯影(Development)等圖案化製程 ,以選擇性使該第一阻層2 2形成有至少一開口 2 2 0以外露 出該電錢導通孔2 0 5之端部導電薄層2 1。該第一阻層2 2之 材質可例為乾膜或光阻,以供後續進行電鍍製程時作為電 鍍阻層之用。17658 Quan 懋 .ptd Page 17 1235025 ____ ______—— '— V. Description of the invention (9) A conductive layer (not shown) is formed on the surface of the core board 20, and the conductive layer is used as a current A conductive path to form a conductive thin layer 21, such as copper (Cu), on the surface of the core board 20 (the end of the filler material 204 containing the plated through-holes 2 0 5) (the thickness may generally be 3 to 1 〇 // m). In addition, as shown in FIG. 2E ′, processes such as direct bonding (DPirec 11 plating, DP) can also be performed on the core board 20 to form a surface such as I on the surface of the core board. The conductive film 2 0 3 a of Bar (P d) is subjected to a chemical stripping process to make the metal layer adhere to the end surface of the filling material 2 0 4 of the plated through hole 2 0 5 or chemical copper. Wait until the end surface of the filling material 204 of the plated through-hole 250 is covered with a conductive film 203a. Among them, the conductive thin layer 21 or conductive film 203a formed on the end surface of the filling material 20 4 of the plated through hole 20 5 is mainly used as a current conduction path, and can be selectively conducted in the plated conductive during subsequent plating processes. A plated metal layer is formed on the holes 2 0 5. The following description of the subsequent process is mainly based on forming a conductive thin layer 21 such as copper (Cu) on the core layer board 20, and the end of the filling material 2 0 4 of the plated through hole 2 0 5 A conductive film 203a, such as palladium or copper, is formed on the surface. The subsequent process is similar to the process steps described below, so it will not be repeated here, and it will be described first. As shown in FIG. 2F, a first resistive layer 22 is formed on the core layer board 20, and is subjected to a patterning process such as exposure, development, etc. to selectively make the first resistive layer 2 2 is formed with at least one opening 2 2 0 and a conductive thin layer 21 at an end portion of the electric money via hole 2 05 is exposed. The material of the first resistive layer 22 can be, for example, a dry film or a photoresist, which can be used as an electroplating resistive layer in a subsequent electroplating process.
17658 全懋.ptd 第18頁 1235025 明說明(10) 如第2G圖所示,進行電錢 口 220中形成例如銅金屬之電錢二亥弟 該第 -阻層22移除(如第2Η圖所示、屬層23 之電鑛導通孔2G5上形成有;^如此,即可選擇性於部分 金屬層23僅係選擇性形成於電部錢八金屬層23,其中^電= 未形成在芯層#20其餘欲電鑛導通=20=\而 且該電鍍導通孔2 0 5上之電,八/案化細線路之區或上 M r ^ ^ ^ „ s 電鍍I屬層23係可經後續圖案化 I耘後作為電路板之電性連接端使用 如第2!圖所示,利用金圖案化電鍍Gpp(G〇id I at ing製程,以在該欲形成有圖案化線路結構之金屬層 表面形成一金屬保護層。首先,於該芯層板2〇上形成第二 阻層2 4 ’並透過圖案化製程以使該第二阻層2 4形成有多數 之開口 ,藉以外露出該芯層板20表面欲形成圖案化線路結 構之金屬層部分。該第二阻層2 4之材質可例為乾膜或光阻 ’以供後續進行電鍍製糕時作為電鍍阻層之用。 如第2 J圖所示,進行電鍍製程以在該第二阻層2 4之開 口中形成例如鎳/金之金屬保護層2 5,之後,將气第_阻 層24移除。如此,即在欲形成圖案化線路結構之°金屬一 & 形成一金屬保護層2 5 (如第2 K圖所示)。 i “ 如第2 L圖所示,利用該金屬保護層2 5 (如鎳八 層)作為蝕刻阻層,以進行蝕刻製程,俾移除夫金金屬 保護層2 5所覆蓋之部分金屬薄層2 〇 1、金屬;于為4金屬 層21,以形成一圖案化線路結構26,且該圖案與導電薄 表面上覆蓋有如鎳/金之金屬保護層2 5。复中 線路結構 中’該圖案化17658 Quan 懋 .ptd Page 18 1235025 Explanation (10) As shown in FIG. 2G, the electric money port 220 is formed in the electric money port 220, such as copper metal, and the first-resistance layer 22 is removed (as shown in FIG. 2Η). As shown, electrical vias 2G5 of layer 23 are formed on the metal layer; ^ In this way, it can be selectively formed on part of the metal layer 23 only on the metal layer 23 of the electrical department, where ^ electricity = not formed in the core Layer # 20 The remaining galvanic ore conduction = 20 = \ and the electroplated vias 2 0 5 are electrically charged, or the area of the thin line or the Mr ^ ^ ^ ^ s electroplated I metal layer 23 series can be followed by After patterning, it is used as the electrical connection end of the circuit board as shown in Figure 2. Using gold pattern plating Gpp (Goid I at ing process) to form a metal layer with a patterned circuit structure. A metal protective layer is formed on the surface. First, a second resistive layer 2 4 ′ is formed on the core layer board 20, and a patterning process is performed to form a plurality of openings in the second resistive layer 24 to expose the core. The metal layer portion of the patterned circuit structure is to be formed on the surface of the layer plate 20. The material of the second resistive layer 24 can be, for example, a dry film or a photoresist for later use. It is used as a plating resist when electroplating. As shown in FIG. 2J, a plating process is performed to form a metal protective layer 25 such as nickel / gold in the opening of the second resist layer 24, and then, The gas barrier layer 24 is removed. In this way, a metal protective layer 2 5 is formed at the metal 1 & where the patterned circuit structure is to be formed (as shown in FIG. 2K). I “As shown in FIG. 2L It is shown that the metal protective layer 25 (such as eight nickel layers) is used as an etching resistance layer to perform an etching process, so as to remove a part of the metal thin layer 201 covered by the metal protective layer 25 of fujin. 4 metal layer 21 to form a patterned circuit structure 26, and the pattern and the conductive thin surface are covered with a metal protective layer such as nickel / gold 2. 5. The pattern in Fuzhong circuit structure
17658 全懋.ptd 第19頁 1235025 五、發明說明(11) 線路結構26包 且至少有一電 如第2M圖 上覆盖一拒鲜 拒銲層2 7形成 構2 6中欲作為 成一電路板之 弟2 E ’圖所示 形成如把之導 形成電鍍金屬 形成金屬保護 已具有圖案化 進行圖案化製 為電性連接端 之製程。 含有多數之電性連接端2 6 〇與導電線路2 6 1, 性連接端2 6 0係形成在該電鍍導通孔2 0 5上。 所示,再於該完成圖案化製程之線路結構2 6 層2 7,並進行拒銲層2 7之圖案化製程以使該 有多數之開口 ,藉以外露出該圖案化線路結 電性連接端2 6 0部分之金屬保護層2 5,俾完 製程。此外,請參閱第2M,圖,其係如先前 在+該電鑛導通孔2 〇 5之填充材2 〇 4端部表面 電膜2 0 3 a時’復經過在該電鍍導通孔2 〇 5上 層2 3、在欲形成圖案化線路結構之金屬層上 層25、形成圖案化之線路結構26、以及在該 線路,構之電路板表面上覆蓋一拒銲層27並 私,藉以外露出該圖案化線路結構2 6中欲作 2 6 0部分之金屬保護層2 5,俾完成一電路板 因此,上述本發明之電路板結構之製法,主要係在該 電鍍導通孔之端部表面上透過直接鍍覆方式(Di『⑶七 Plating,DP)或化學沈積方式以使該電鍍導通孔之塞孔絕 緣部分覆蓋一例如鈀或銅之導電膜,亦或經由電鍍方式形 成一導電薄層,俾於後續得以透過電鍍方式以選擇性在該 電鑛導通孔之端部上直接形成電性連接端,復可利用金圖 案化電鍍GPP(Gold pattern plated)製程方式以全面在電 路板表面欲形成圖案化線路結構上,形成一例如鎳/金等 金屬保護層,並進行圖案化製程以形成有包含多數電性連17658 Quan 懋 .ptd Page 19 1235025 V. Description of the invention (11) 26 packages of circuit structure and at least one electricity as shown in Figure 2M covered with a fresh and solder resist layer 2 7 forming a structure 2 6 want to be a brother of a circuit board The process shown in the figure 2 E 'is as follows: it is formed into an electroplated metal to form a metal protection, and it has a process of patterning and patterning into electrical connection terminals. The electrical connection terminal 260 and the conductive circuit 2 61 are included in the majority, and the electrical connection terminal 260 is formed on the plated through hole 205. As shown in the figure, the circuit structure 2 6 layer 27 of the patterning process is completed, and the patterning process of the solder resist layer 27 is performed to make the openings open, and the patterned circuit junction electrical connection ends are exposed. The metal protective layer 25 of part 260 is finished. In addition, please refer to FIG. 2M, which is the same as that when the electric film 2 0 4 at the end surface of the filling material 2 0 5 of the electric mine through hole 2 0 3 a is passed through the plated through hole 2 0 5 Upper layer 2 3. The upper layer 25 of the metal layer on which the patterned circuit structure is to be formed, the patterned circuit structure 26, and the circuit, the surface of the circuit board is covered with a solder resist layer 27 and privately exposed to reveal the pattern. In the circuit structure 26, the metal protective layer 2 5 to be part 2 60 is used to complete a circuit board. Therefore, the method for manufacturing the circuit board structure of the present invention described above is mainly through the surface of the end of the plated through hole directly. A plating method (Di 『⑶ 七 Plating, DP) or a chemical deposition method so that the plug insulating part of the plated through hole is covered with a conductive film such as palladium or copper, or a conductive thin layer is formed by electroplating. Subsequently, an electrical connection end can be selectively formed directly on the end of the through hole of the electric mine through electroplating. The GPP (Gold pattern plated) process can be used to fully pattern the circuit board surface. Line knot On a form such as a nickel / gold metallic protective layer, and patterning process to form comprises a plurality of electrically connected with a
1235025 五 、發明說明(12) ' "" 接端^電t;?案化線路結,。之後,再覆蓋-圖案 化拒1曰二路出表面形成有金屬保護層之電性連接端 二;:! Γ蔓層之形成方式非以前述之Gpp製程為 限’任ΰ 、、、結構上形成金屬保護層之製程皆可加以 運用。 請及2Μ’圖所示,彡過前 揭示-種f反結構,係包括有—芯層板2 : 有圖=線λ結構26;以及多數貫穿該芯層板之電鑛i 接端=導Λ線路261,而至少-電性^ 於該電鍍¥通孔20 5上。亦即,本發 電鍍導通孔2 0 5上形成電性遠桩轳〇βη 、揮I"生於。丨刀 蓋住欲形成細線路Λ :而接上2= ^㈣用阻層覆 與細線路之製程。而該電性連接7 \餘線路佈局空間 續接置導電元件用。 ρ可作為電路板後 此外’如第3圖所示,少Μ β 之端部形成有電性連接#丄::層J 30中 < 電鑛導通孔305 結構31中承接導電盲後’亦可作為後續線路增層 3〇5上形成導電盲孔32八2用,俾得以直接在電鑛導通孔 電性連接端之設置與接線:此’即可減:承接導電盲孔之 ,且有效增加線路佈設外 二 工間,縮短導電途徑 ,復可持續進行線路辦:S ,提升線路佈局靈活度。之後 構之電路板。 層製程,俾形成-具有多層線路Ϊ 圖示係以雙層板作為說明,本發1235025 V. Description of the invention (12) '" " After that, cover-patterning again. Electrical connection terminals with a metal protective layer formed on the second surface. The formation method of the Γ diffusion layer is not limited to the aforementioned Gpp process, and any process of forming a metal protective layer on the structure can be used. Please refer to the 2M 'diagram, which has been revealed before-a kind of f inverse structure, including-core board 2: there is a picture = line λ structure 26; and most of the electrical ore i through the core board i The circuit 261 is at least -electrical ^ on the plated through hole 205. In other words, an electrical remote post βββη is formed on the plated through hole 205 of the present invention, and it is born on the "I".丨 The knife covers the process of forming a thin line Λ: and connects 2 = ^ ㈣ to cover the thin line with a resist. And this electrical connection is used to connect conductive components. ρ can be used as a circuit board. In addition, as shown in FIG. 3, an electrical connection is formed at the end of the Mβ # 丄 :: in layer J 30 < after the conductive blind hole is received in the structure 31 through the conductive hole 亦It can be used to form conductive blind holes 328 on the subsequent layer build-up layer 305, so that it can directly set and connect the electrical connection end of the via of the mine. This can reduce the number of conductive blind holes and is effective. Increase the layout of the outer two workshops, shorten the conductive pathway, and continue to carry out the line management: S to improve the flexibility of the line layout. Then construct the circuit board. Layer process, 俾 formation-with multi-layer wiringΪ
第21頁 另,雖本發明先前 17658 全懋.ptd 1235025 五、發明說明(13) 明之製程亦可應用於多層板中,亦即先前圖式之該芯層板 係可為一已完成前段製程之多層板,即可依前述製程形成 一具多層線路結構之電路板,如第4A圖及4B圖所示,係為 應用本發明前述製程所得之具四層線路結構之電路板結構 4 0 A,以及具六層線路結構之電路板結構4 0 B。當然本發明 之應用非侷限於前述之二層、四層、或六層電路板結構, 實際係可應用於任一具多層線路結構之電路板。 因此,藉由本發明之電路板結構及其製法,係可選擇 性在部分欲形成電性連接端之電鍍導通孔上直接形成該電 性連接端,以供後續接置有導電元件以提供該電路板與其 它電子元件(半導體晶片或電路板)之電性導接,亦或可 於該電鍍導通孔上之電性連接端直接形成有線路增層結構 之導電盲孔,以及減少習知形成導電盲孔(Conductive v i a )時,所需延伸出連接墊(Pad )之空間,藉以增加佈線 路密度與靈活性,並可縮短導電路徑,減少電感、串擾及 雜訊產生;此外,該電鍍導通孔上之電性連接端於製程中 係獨立形成,而不影響該電路板其餘電性連接端及導電線 路之製程,藉以避免習知技術中在電鍍導通孔上欲形成電 性連接端時,必需在整體電路板上形成一厚度過厚或厚度 不均之金屬層,導致後續在圖案化製程中形成導電線路及 電性連接端之精度困擾,而無法形成一細線路結構等缺失 ,俾提供一具細線路(F i n e c i r c u i t)與高線路密度之電路 板。 請參閱第5A至5 I圖,係為本發明之電路板結構製法之Page 21 In addition, although the previous 17658 of the present invention is complete. Ptd 1235025 V. Description of the invention (13) The process of the invention can also be applied to multilayer boards, that is, the core board of the previous diagram can be a completed front-end process The multilayer board can be used to form a circuit board with a multilayer circuit structure according to the foregoing process. As shown in Figures 4A and 4B, it is a circuit board structure with a four-layer circuit structure obtained by applying the foregoing process of the present invention. , And a circuit board structure 40 B with a six-layer circuit structure. Of course, the application of the present invention is not limited to the aforementioned two-layer, four-layer, or six-layer circuit board structure, but it can be applied to any circuit board with a multilayer circuit structure. Therefore, with the circuit board structure and the manufacturing method of the present invention, the electrical connection terminal can be selectively formed directly on the plated through-holes where electrical connection terminals are to be formed for subsequent connection with conductive elements to provide the circuit. The electrical connection between the board and other electronic components (semiconductor wafer or circuit board), or a conductive blind hole of a circuit build-up structure can be directly formed on the electrical connection end of the plated through hole, and the conventional conductive conduction can be reduced. For a blind via (Conductive via), it is necessary to extend the space of the connection pad (Pad) to increase the density and flexibility of the wiring, shorten the conductive path, reduce inductance, crosstalk and noise generation; in addition, the plated via The above electrical connection terminals are formed independently in the manufacturing process without affecting the process of the remaining electrical connection terminals and conductive lines of the circuit board. In order to avoid the formation of electrical connection terminals on the plated through holes in the conventional technology, it is necessary to A metal layer with an excessively thick or uneven thickness is formed on the overall circuit board, resulting in subsequent precision in the formation of conductive lines and electrical connections in the patterning process Disturbance, and can not form a fine wiring structure deletions serve to provide a fine line (F i n e c i r c u i t) and high-density wiring circuit boards. Please refer to FIGS. 5A to 5I, which are the method of manufacturing the circuit board structure of the present invention.
17658 全懋.ptd 第22頁 1235025 五、發明說明(14) 第二實施例示意圖。 如第5 A至5 D圖所示,提供至少一表面形成有金屬薄層 5 0 1之芯層板5 0,該芯層板5 0可為一完成前處理之多層電 路板。本實施例之圖式中,該芯層板5 0係由一絕緣層5 0 0 及形成於該絕緣層表面之金屬薄層5 0 1所構成,復以機械 鑽孔方式於該芯層板中鑽設多個之貫穿孔 5 0 2 (如第5 B圖 所示)。接著,於該芯層板5 0及其貫穿孔5 0 2表面形成一導 電層(未圖示),並在該芯層板5 0表面上以及於該貫穿孔 50 2孔壁上電鍍形成有一具足夠厚度之導電金屬層503(如 第5 C圖所示)。復形成一填充材5 0 4以填滿該貫穿孔之殘 留空隙,俾形成一電鍍導通孔(PTH) 5 0 5以電性導通該芯層 板5 0上下表面之金屬層503(如第5D圖所示)。之後,於 該芯層板50上進行直接鑛覆方式(Direct plating,DP) 或化學沈積等製程,再經化學剝除製程,以在該電鍍導通 孔之端部填充材表面形成一例如鈀(Pd)或銅(Cu)之導電膜 5 0 3 a 〇 如第5 E圖所示,於該芯層板上表面上形成一阻層5 2。 該阻層5 2之材質可例為乾膜或光阻,以供後續進行電鍍製 程時作為電鍍阻層之用。 如第5 F圖所示,進行電鍍製程以在該芯層板5 0之下表 面上形成例如銅金屬之電鍍金屬層5 3,之後,將該阻層5 2 移除。如此,即可選擇性於該芯層板5 0下表面(包含該芯 層板下表面之電鍍導通孔50 5部分)上形成有電鍍金屬層 53°17658 Quan 懋 .ptd Page 22 1235025 V. Description of the invention (14) Schematic diagram of the second embodiment. As shown in FIGS. 5A to 5D, at least one core board 50 with a metal thin layer 501 formed on the surface is provided, and the core board 50 may be a multi-layer circuit board with pre-processing completed. In the diagram of this embodiment, the core board 50 is composed of an insulating layer 500 and a thin metal layer 501 formed on the surface of the insulating layer, and the core board is mechanically drilled. A plurality of through holes 5 0 2 are set in the middle drill (as shown in Fig. 5B). Next, a conductive layer (not shown) is formed on the surface of the core board 50 and its through-holes 502, and an electroplated layer is formed on the surface of the core board 50 and the wall of the holes of the through-holes 50. A conductive metal layer 503 with sufficient thickness (as shown in Figure 5C). A filling material 5 0 4 is formed to fill the remaining gap of the through hole, and a plated-through hole (PTH) 5 0 5 is formed to electrically connect the metal layers 503 on the upper and lower surfaces of the core plate 5 0 (such as the 5D As shown). Thereafter, a process such as direct plating (DP) or chemical deposition is performed on the core layer plate 50, and then a chemical stripping process is performed to form a surface such as palladium (Pd) on the end filling material of the plating via hole. As shown in FIG. 5E, a conductive film 5 0 3 a of Pd) or copper (Cu) forms a resist layer 52 on the surface of the core layer board. The material of the resist layer 52 can be, for example, a dry film or a photoresist, which can be used as a plating resist layer in the subsequent plating process. As shown in FIG. 5F, an electroplating process is performed to form an electroplated metal layer 53 such as copper metal on the surface below the core layer board 50, and then the resist layer 5 2 is removed. In this way, an electroplated metal layer 53 ° can be selectively formed on the lower surface of the core board 50 (including the electroplated via hole 50 5 part of the lower surface of the core board).
17658 全懋.ptd 第23頁 1235025 五、發明說明(15) 如第5 G圖所示,進行圖案化製程以將該芯層板5 〇表面 之金屬層形成圖案化線路結構5 6。首先,係於該芯層板5 0 表面之金屬層上形成圖案化之餘刻阻層(未圖示),俾進 行餘刻製程以形成圖案化線路結構5 6後,再移除該阻層。 如第5H圖所示,於該已具有圖案化線路層之電路板表 面上覆蓋一拒銲層5 7,並進行拒銲層5 7之圖案化製程以使 該拒銲層5 7形成有多數之開口 ,藉以外露出部分該圖案化 線路結構56。其中,該圖案化線路結構56包含有多數之電 性連接端5 6 0與導電線路5 6 1,且至少有一電性連接端5 6 0 係形成在該先前具有電鍍金屬層5 3之電鍍導通孔5 〇 5上。 如第5 1圖所示,之後利用電鍍方式(如電鍍導線)或化 學沈積(如化鎳/金製程)等方式,以在顯露出該拒銲層5 7 開口之電性連接端5 6 〇表面形成一如鎳/金層之金屬保護層 5 5 ’俾完成一電路板之製程。其中,該具金屬保護層5 5之 電性連接端5 6 0即可供後續接置有導電元件,俾提供該電 路板與其它電子元件(如半導體晶片或電路板等)之電性 導接。 一電=述:;;,Π擇:生在芯層板之單-表面覆蓋 )上形成有電鑛ii:表:鑛導通孔之端部表面 形成具較粗線路之圖案化線路姓椹成有電鍵金屬層之表面 電路板之電性連接側,另在未开^攝’可供該電路板作為與 可形成具較細線路之圖案化電鍵金屬層之表面即 與半導體晶片之電性連接側。、、’。構’可供該電路板作為17658 Quan 懋 .ptd Page 23 1235025 V. Description of the Invention (15) As shown in Figure 5G, a patterning process is performed to form a patterned circuit structure on the surface of the core layer 50. First, a patterned unetched resist layer (not shown) is formed on the metal layer on the surface of the core layer board 50. After the uncut process is performed to form a patterned circuit structure 56, the resist layer is removed. . As shown in FIG. 5H, a solder resist layer 57 is covered on the surface of the circuit board having a patterned circuit layer, and a patterning process of the solder resist layer 57 is performed to form a majority of the solder resist layer 57. The patterned circuit structure 56 is exposed through an opening. Wherein, the patterned circuit structure 56 includes a plurality of electrical connection terminals 5 6 0 and conductive circuits 5 6 1, and at least one electrical connection terminal 5 6 0 is formed on the electroplated conductive layer having the previously plated metal layer 5 3. Hole 5 05. As shown in FIG. 51, a method such as electroplating (such as electroplated wire) or chemical deposition (such as nickel / gold process) is then used to expose the electrical connection end 5 6 of the solder resist 5 7 opening. A metal protective layer 5 5 'such as a nickel / gold layer is formed on the surface to complete a circuit board manufacturing process. Among them, the electrical connection end 5 6 0 with the metal protective layer 5 5 can be used for subsequent connection with conductive components, and the electrical connection between the circuit board and other electronic components (such as semiconductor wafers or circuit boards) is provided. . Electricity = Description: ;;, Π: Electricity ore is formed on the single-surface covering of the core board ii: Table: Patterned lines with thicker lines are formed on the end surface of the vias of the mine. The electrical connection side of the surface circuit board with the key metal layer, and the circuit board can be used as an electrical connection with the semiconductor wafer when the surface of the circuit board is not opened. side. ,, '.结构 ’Available for the circuit board as
1235025 五、發明說明(16) 同樣地,在該電鍍導通孔之端部形成電性連接端後, 亦可作為後續線路增層結構中承接導電盲孔用,俾得以直 接在電鍍導通孔上直接形成導電盲孔,以縮短導電途徑, 且有效增加線路佈設空間,提升線路佈局靈活度,之後, 復可持續進行線路增層製程,俾形成一具有多層線路結構 之電路板。 另,本發明之製程亦可應用於多層板中,即可參照前 述製程形成一具多層線路結構之電路板,如第6 A圖及6 B圖 所示,係為應用本發明前述製程所得之具四層及六層線路 結構之電路板結構6 0 A,6 0 B。當然本發明之應用非侷限於 前述之二層、四層、或六層電路板結構,實際係可應用於 任一具多層線路結構之電路板。 以上所述僅為本發明之較佳實施例而已,並非用以限 定本發明之實質技術内容範圍,本發明之實質技術内容係 廣義地定義於下述之申請專利範圍中,任何他人完成之技 術實體或方法,若是與下述之申請專利範圍所定義者係完 全相同,亦或為同一等效變更,均將被視為涵蓋於此申請 專利範圍中。1235025 5. Description of the invention (16) Similarly, after the electrical connection end is formed at the end of the plated through hole, it can also be used to accept conductive blind holes in the subsequent layer buildup structure, so that it can be directly directly on the plated through hole. The conductive blind holes are formed to shorten the conductive path, and effectively increase the wiring layout space, improve the flexibility of the layout of the circuit, and then continue the process of adding layers to the circuit to form a circuit board with a multilayer wiring structure. In addition, the process of the present invention can also be applied to multi-layer boards, that is, a circuit board with a multi-layer circuit structure can be formed by referring to the foregoing process. As shown in FIGS. 6A and 6B, it is obtained by applying the foregoing process of the present invention. Circuit board structure with 4 layers and 6 layers circuit structure 60 A, 60 B. Of course, the application of the present invention is not limited to the aforementioned two-layer, four-layer, or six-layer circuit board structure, but it can be applied to any circuit board with a multilayer circuit structure. The above is only a preferred embodiment of the present invention, and is not intended to limit the scope of the essential technical content of the present invention. The essential technical content of the present invention is broadly defined in the scope of patent applications described below, and any technology completed by others. Entities or methods that are completely the same as those defined in the scope of patent application described below, or the same equivalent changes, will be considered to be covered by this patent application scope.
17658 全懋.ptd 第25頁 1235025 圖式簡單說明 【圖式簡單說明】 第1 A圖至第1 C圖係習知之半加成法的電路板製作流程 不意圖, 第2A圖至第2M圖係本發明之電路板結構製法之製程剖 面不意圖, 第2E’圖及第2M’圖係本發明之電路板結構製法另一實 施態樣之剖面示意圖; 第3圖係本發明之電路板結構製法應用於增層結構之 剖面示意圖; 第4A圖及第4B圖係本發明之電路板結構製法應用於多 層板之剖面示意圖; 第5 A圖至第5 I圖係本發明之電路板結構製法另一實施 態樣之製程剖面示意圖;以及 第6A圖及第6B圖係本發明之電路板結構製法另一實施 態樣應用於多層板之剖面示意圖。 10 核 心 電 路 板 11 絕 緣 層 110 開 孔 12 内 層 線 路層 13 晶 種 層 14 阻 層 15 圖 案 化 線 路層 20 芯 層 板 200 絕 緣 層 201 金 屬 薄 層 202 貫 穿 孔 203 金 屬 層 2 0 3a 導 電 膜 204 填 充 材 205 電 鍍 導 通 孔 21 導 電 薄 層17658 Quan 懋 .ptd Page 25 1235025 Simple description of the drawings [Simplified illustration of the drawings] Figures 1 A to 1 C are the conventional semi-additive circuit board manufacturing process, which is not intended, Figures 2A to 2M FIG. 2E ′ and FIG. 2M ′ are schematic cross-sectional views of another embodiment of the circuit board structure manufacturing method of the present invention; FIG. 3 is a circuit board structure of the present invention. Sectional schematic diagram of the manufacturing method applied to the build-up structure; Figures 4A and 4B are schematic sectional diagrams of the manufacturing method of the circuit board structure of the present invention applied to the multilayer board; Figures 5A to 5I are the manufacturing method of the circuit board structure of the present invention FIG. 6A and FIG. 6B are schematic cross-sectional views of another embodiment of the method for manufacturing a circuit board structure according to the present invention, which are applied to a multilayer board. 10 Core circuit board 11 Insulation layer 110 Opening hole 12 Inner circuit layer 13 Seed layer 14 Resistance layer 15 Patterned circuit layer 20 Core board 200 Insulation layer 201 Metal layer 202 Through hole 203 Metal layer 2 0 3a Conductive film 204 Fill 205 Plating vias 21 Conductive thin layer
17658全懋.ptd 第26頁 123502517658 Full 懋 .ptd Page 26 1235025
圖式簡單說明 22 第 一 阻 層 220 開 α 23 電 鍍 金 屬 層 24 第 二 阻 層 25 金 屬 保 護 層 26 線 路 結 構 260 電 性 連 接 端 261 導 電 線 路 27 拒 銲 層 30 芯 層 板 305 電 鍍 導 通 孑L 31 線 路 增 層 結 構 32 導 電 盲 孔 360 電 性 連 接 端 40A 四 層 電 路 板結構 40B 層 電 路 板 結 構 50 芯 層 板 500 絕 緣 層 501 金 屬 薄 層 502 貝 穿 孔 503 金 屬 層 5 0 3a 導 電 膜 504 填 充 材 505 電 鍍 導 通 孔 52 阻 層 53 電 鍍 金 屬 層 55 金 屬 保 護 層 56 線 路 結 構 560 電 性 連 接 端 561 導 電 線 路 57 拒 銲 層 60A 四 層 電 路 板 結 構 60B 六 層 電 路 板結構 17658 全懋.ptd 第27頁Brief description of the drawing 22 First resistance layer 220 Open α 23 Electroplated metal layer 24 Second resistance layer 25 Metal protective layer 26 Circuit structure 260 Electrical connection terminal 261 Conductive circuit 27 Solder resist layer 30 Core board 305 Plating conduction L 31 Line buildup structure 32 conductive blind hole 360 electrical connection terminal 40A four-layer circuit board structure 40B layer circuit board structure 50 core board 500 insulation layer 501 metal thin layer 502 shell perforation 503 metal layer 5 0 3a conductive film 504 filling material 505 Plating vias 52 Resistive layer 53 Plating metal layer 55 Metal protective layer 56 Circuit structure 560 Electrical connection terminal 561 Conductive circuit 57 Solder resist layer 60A Four-layer circuit board structure 60B Six-layer circuit board structure 17658 Full 懋 .ptd page 27
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2004
- 2004-03-03 TW TW93105510A patent/TWI235025B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI406614B (en) * | 2009-07-06 | 2013-08-21 | Simpal Electronics Co Ltd | Printed wiring substrate and producing method thereof |
Also Published As
Publication number | Publication date |
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TW200531606A (en) | 2005-09-16 |
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