1233150 Α7 Β7 五、發明説明（ 一·發明所屬之技術領域 (請先閲讀背面之注意事項再填寫本頁} 本發明係關於在工件上形成形成於罩之配線等之圖案 (罩圖案）用的曝光裝置，特別是，關於使罩與工件接觸 以進行曝光之接觸型曝光裝置，或者以微小之間隔分離罩 與工件以進行曝光之近接型曝光裝置。 二·先前技術 第4圖係罩安裝於接觸型曝光裝置/近接型曝光裝置 之罩載台之說明圖，第5圖係顯示接觸型曝光裝置/近接 型曝光裝置的曝光順序。 如第4(a) 、（b)圖所示般地，罩載台1係被安裝 爲以軸10爲中心，可以180°旋轉，能夠開關工件載台2 上面而使之移動。 經濟部智慧財產局S工消費合作社印製 另外，如第5圖所示般地，工件載台2係透過間隙調 整機構5而被安裝在ΧΥ0載台3、Z載台4上，藉由工件 載台驅動機構11而驅動XY 0載台3，工件載台2在紙面 左右方向（X方向）、紙面前後方向（Y方向）以及0方 向（以垂直XY平面之軸爲中心而旋轉）移動。另外，藉 由驅動Z載台4，在紙面上下方向移動。 間隙調整機構（平行設定機構）5例如係由日本專利 第2889 126號公報所記載者構成，在使工件載台2向上方 移動時，罩Μ與工作W接觸，在罩Μ與工件W無法相對 移動之時間點開始，吸收工件載台2之驅動力而開始位移 ，在使工件載台2的移動停止後，保持信號一被輸入，保 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ 297公釐） -5- 1233150 Α7 Β7 五、發明説明（2) 持那時的位移狀態。 在罩載台1之上方設置具有燈管6a與反射鏡6b之光 照射部6，在曝光時，由光照射部6透過光罩Μ對工件W 照射曝光光，曝光形成在罩Μ上之罩圖案。 以下，依據第4圖、第5圖說明習知的接觸型或者近 接型曝光裝置之曝光順序。 (1 )如第4 ( a )圖所示般地，打開罩載台1，安裝 罩Μ。罩載台1係在中央部具有因應罩Μ之大小的開口 ，曝光時，由未圖示出之光照射部來之光透過該開口而照 射於罩Μ。 罩載台1在上述開口的周邊設置真空吸附溝la，對 該構la提供真空，吸附罩Μ之周邊部。藉由此，罩Μ被 固定保持在罩載台1。之後，如第4(b)圖所示般地，旋 轉關閉罩載台1。 (2 )如第5 ( a )圖所示般地，在工件載台2上載置 工件W。對設置在工件載台2之未圖示出的真空吸附溝提 供真空，將工件W固定保持在工件載台2。 (3)藉由工件載台驅動機構11，驅動Z載台4，如 第5(b)圖所示般地，使工件載台2往罩Μ方向上升。 工件W的上面抵接罩Μ之下面。使工件載台2更上升， 如第5 ( c )圖所示般地，使工件W之表面整面壓住罩Μ 之下面整面。 藉由間隙調整機構（平行設定機構）5，工件載台2 在罩Μ之下面的傾斜與工件表面的傾斜一致之狀態下被 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -6 - 1233150 Α7 Β7 五、發明説明（3) 固定。將此稱爲「工件對罩之平行取得（以下，也有稱爲 「平行取得」）。 (請先閱讀背面之注意事項再填寫本頁) 另外，關於藉由間隙調整機構5之平行取得，例如記 載在前述之日本專利第2889126號公報。 (4 )平行取得結束後，如第5 ( d )圖所示般地，藉 由工件載台驅動機構11，驅動Z載台4，使工件載台2下 降至校準間隔。 接著，藉由未圖示出之校準顯微鏡檢測出罩Μ之校 準標記與工件W之校準標記，藉由ΧΥ β載台，使工件載 台2在ΧΥ0方向移動，進行罩Μ與工件W之對位。 (5) 在接觸型曝光之情形，再度使工件載台2上升 ，使罩Μ與工件W密接，由光照射部6透過罩Μ對工件 W照射曝光光，對工件W進行罩圖案之曝光。 經濟部智慧財產局員工消費合作社印製 (6) 在近接型曝光之情形，使罩Μ與工件W成爲預 先設定的曝光間隔，使工件載台2在Ζ方向移動至曝光位 置。在上述（3 )中，已經進行工件W與罩Μ之平行取得 之故，罩Μ與工件W之間隔，在工件W整面中係成爲相 等。 (7 )在此狀態下，由光照射部6透過罩Μ對工件W 照射曝光光，在工件W進行罩圖案之曝光。 三·發明內容 [發明所欲解決之課題] 最近，由於工件W之基板的大型化、另外，整批曝 本紙張尺度適用中國國家標準（CNS > Α4規格（210Χ 297公釐〉 1233150 Α7 Β7 經濟部智慈財產局員工消費合作社印製 五、發明説明（4) 光之曝光面積的大型化，罩Μ大型化（例如’ 250mmX250mm)。通常，在將罩Μ固定於罩載台1之情 形，如前述般地，藉由真空吸附固定罩Μ之周圍。 罩Μ藉由其之周邊部被吸附，而被保持在罩載台1 ° 罩Μ如大型化，容易由於自重而產生彎曲’例如’如第6 圖所示般地，有罩在彎曲狀態下而被吸附保持之情形。 另外，罩Μ之材質爲藍板玻璃或硼矽酸鹽玻璃之情 形，有罩本身歪斜之情形。 如在此種狀態下保持罩Μ，有以下之問題： (1 )如第7 ( a )圖所示般地，在進行工件W與罩Μ 之平行取得之際，工件W由於罩Μ之自重和歪斜，紙在 彎曲部份相接，即使工件載台2更爲上升，罩與工件也無 法整面相接。在此狀態下，裝置無法完成平·行取得。 (2)在接觸型曝光之情形，如在此狀態下進行曝光， 在罩與工件相接之部份與不是相接之部份，曝光精度不同 ，成爲產品不良之原因。 另外，在近接型曝光之情形，在第7 ( a )之狀態下 ，即使可以進行平行取得，工件載台2如下降至曝光位置 ，如第7 ( b )圖所示般地，罩Μ與工件W之間隔因場所 而不同，與接觸型曝光之情形相同，對曝光精度產生影響 。例如，在250mmX250mm之曝光區域中，實際曝光設定 値爲20// m之L&S (線與間隔）之圖案，測量該圖案尺寸之 結果，產生1.6/zm之偏差。 另外，在第7圖中，雖係誇張描繪罩Μ與工件W之 — (請先閱讀背面之注意事項再填寫本頁) 訂 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐〉 -8- 1233150 A7 B7 五、發明説明（^ ) 〇 (請先閱讀背面之注意事項再填寫本頁) 間隔，實際上爲無法目視之程度的彎曲。因此，由於罩Μ 之彎曲，即使無法進行平行取得，實際顯像被曝光之圖案 ，如不藉由顯微鏡進行·線寬之測量等，並無法知悉。因此 ，在藉由顯像而發現不良爲止，會有產生很多的產品不良 之情形。 另外，罩Μ之彎曲係如第8圖所示般地，也有偏於 一方，在工件W之平行取得之際，爲了使工件W密接於 罩Μ而使之上升，對於罩Μ，工件W有變成大爲傾斜之 狀態。如此一來，在第7圖之情形，在工件之整面中，曝 光精度大爲偏差，無法獲得足夠的解析度。 本發明係爲了解決上述習知之問題點而完成者，本發 明之目的爲在接觸型曝光裝置或者近接型曝光裝置中，防 止由於大型的罩之歪斜和自重等所引起之彎曲，可以正確 進行工作對罩之平行取得。 [解決課題用之手段] 在本發明中，如下爲之而解決上述課題。 經濟部智慧財產局員工消費合作社印製 藉由真空吸附將罩固定保持在罩載台之下面。而且， 使工件、工件的代替品或者工件載台上升，使之與罩抵接 ，使罩與工件、工件的代替品或者工件載台橫跨整面密接 ，進行平行取得。此時，一度解除藉由罩載台之罩的真空 吸附。平行取得作業結束後，再度開始罩的吸附。 在工件或者工件的代替品對罩之平行取得中，由下側 由工件對於罩施加力量。如上述般地，罩的吸附一被解除 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ 297公釐） -9- 1233150 A7 _B7__ 五、發明説明（^ ) 6 ，藉由工件施加在罩之力量，罩的歪斜和彎曲被矯正。 (請先閲讀背面之注意事項再填寫本頁} 然後，在歪斜和彎曲被矯正之狀態下，罩的吸附如再 度開始，罩在被往外側拉伸之狀態下被保持在罩載台，歪 斜和彎曲不見或者減少。因此，接觸型曝光、近接型曝光 之任一者，在工件的整面中，罩與工件之間隔成爲一定， 可以使曝光精度的偏差減少。 四·實施方式 [發明之實施形態] 第1圖係顯示本發明之實施例的接觸型曝光裝置/近 接型曝光裝置之構成。在同圖中，工件載台2係透過前述 間隙調整機構5而被安裝在ΧΥ 0載台3、Ζ載台4上，如 前述般地，藉由工件載台驅動機構11驅動ΧΥ 0載台3， 工件載台2在紙面左右方向（X方向）、紙面前後方向（ Υ方向）以及β方向（以垂直ΧΥ平面之軸爲中心而旋轉 )移動。另外，藉由驅動Ζ載台4,在紙面上下方向移動 〇 經濟部智慈財產局員工消費合作社印製 在罩載台1之工件載台2側如前述般地，設置真空吸 附罩之真空吸附溝la，對該溝la提供真空，吸附罩Μ之 周邊部。設置進行對上述真空吸附溝la之真空的提供之 管路lb、及控制真空之提供之閥門VI、V2。 另外，在工件載台2也設置真空吸附罩用之真空吸附 溝，雖也設置對該真空吸附溝之真空的提供用之管路，但 是省略圖示。 本紙張尺度適用中國國家標準（CNS ) Μ規格（210X297公釐） -10- 經濟部智慧財產局員工消費合作社印製 1233150 Α7 Β7 五、發明説明（7) 在罩載台1之上方設置具備燈管6a與反射鏡6b之光 照射部6，在曝光時，由光照射部6透過罩Μ對工件W 照射曝光光，曝光形成在罩Μ上之罩圖案。 另外，設置控制上述工件載台驅動機構1 1、間隙調 整機構5、上述閥門lc、Id等用之控制部12。 以下，由第1圖、第2(a)〜（d)圖、第3(e) (f)圖 ，說明本發明之實施例。另外，在第2途中，第1圖所示 之XY 0載台3、Z載台4、間隙調整機構5等被省略。 (1)如前述第4 ( a) (b)圖所示般地，將罩Μ載置 於罩載台1，藉由真空吸附將罩Μ固定於罩載台1。罩Μ 係如第2 ( a )圖所示般地，被吸附固定在罩載台1之下 面。此時，如第2 ( a )圖所示般地，罩Μ歪斜，或者彎 曲。 另外，在工件載台2上載置工件W，如前述般地，將 工件W固定在工件載台2。 (2 )控制部1 2藉由工件載台驅動機構1 1驅動Ζ載 台4，使工件載台2往罩Μ方向上升。藉由此，如第2( b)圖所示般地，工件W之上面抵接罩Μ之下面。 (3 )控制部12關閉閥門V2，打開閥門V1，停止對 真空吸附溝la之真空的提供，解除罩載台1之罩Μ的吸 附保持。 與此同時，控制部12藉由工件載台驅動機構11驅動 Ζ載台4，爲了使工件W接接罩Μ，使工件載台2上升。 如第2 ( c )圖所示般地，罩Μ由下受到工件W之按 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ 297公釐）1233150 Α7 Β7 V. Description of the invention (1. The technical field to which the invention belongs (please read the precautions on the back before filling out this page) The present invention relates to the formation of patterns (cover patterns) on the workpiece, such as wiring formed on the cover. The exposure device is, in particular, a contact-type exposure device that exposes a cover to a workpiece for exposure, or a proximity-type exposure device that separates the cover from a workpiece for exposure at a minute interval. 2. The prior art. FIG. The explanatory diagram of the cover stage of the contact type exposure device / proximity type exposure device. Figure 5 shows the exposure sequence of the contact type exposure device / proximity type exposure device. As shown in Figures 4 (a) and (b) The hood carrier 1 is installed with the axis 10 as the center and can be rotated by 180 °. The work carrier 2 can be opened and closed to move it. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. As shown, the workpiece stage 2 is mounted on the XY0 stage 3 and the Z stage 4 through the gap adjustment mechanism 5. The XY 0 stage 3 is driven by the workpiece stage driving mechanism 11, and the workpiece stage 2 is Left and right direction of paper surface X direction), front and back direction (Y direction), and 0 direction (rotation around the axis of the vertical XY plane as the center). In addition, the Z stage 4 is driven to move up and down on the paper. Gap adjustment mechanism (parallel setting) The mechanism) 5 is constituted by, for example, those described in Japanese Patent No. 2889 126. When the workpiece stage 2 is moved upward, the cover M comes into contact with the work W, and starts when the cover M and the work W cannot move relative to each other. Absorb the driving force of workpiece stage 2 and start displacement. After stopping the movement of workpiece stage 2, keep the signal input as soon as possible. The guaranteed paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm) -5- 1233150 Α7 Β7 V. Description of the invention (2) Maintain the state of displacement at that time. A light irradiating part 6 with a lamp tube 6a and a reflecting mirror 6b is provided above the cover stage 1. During exposure, the light irradiating part 6 transmits light The cover M irradiates the workpiece W with exposure light to expose a cover pattern formed on the cover M. Hereinafter, the exposure sequence of a conventional contact-type or proximity-type exposure device will be described with reference to Figs. 4 and 5. (1) As in Fig. 4 (a) Figure Generally, the cover stage 1 is opened and the cover M is installed. The cover stage 1 has an opening corresponding to the size of the cover M at the center, and when exposed, light from a light irradiation unit (not shown) passes through the opening and is irradiated. In the cover M. The cover stage 1 is provided with a vacuum suction groove 1a around the opening to provide a vacuum to the structure 1a to adsorb the periphery of the cover M. With this, the cover M is fixedly held on the cover stage 1. Then, as follows As shown in Fig. 4 (b), the cover stage 1 is rotated and closed. (2) As shown in Fig. 5 (a), the workpiece W is placed on the workpiece stage 2. The workpiece stage 2 is placed on the workpiece stage 2. The vacuum suction groove (not shown) provides a vacuum, and holds the workpiece W on the workpiece stage 2 fixedly. (3) The Z stage 4 is driven by the workpiece stage driving mechanism 11 to raise the workpiece stage 2 in the direction of the cover M as shown in Fig. 5 (b). The upper surface of the work W abuts the lower surface of the cover M. As shown in FIG. 5 (c), the workpiece stage 2 is further raised, and the entire surface of the workpiece W is pressed against the entire surface of the lower surface of the cover M. With the gap adjustment mechanism (parallel setting mechanism) 5, the workpiece stage 2 is adapted to the Chinese national standard (CNS) A4 specification (210 × 297 mm) under the condition that the inclination under the cover M is consistent with the inclination of the workpiece surface. (Please read the precautions on the back before filling out this page) Order printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-6-1233150 Α7 Β7 5. Description of the invention (3) Fixed. This is referred to as "parallel acquisition of workpiece to cover (hereinafter, also referred to as" parallel acquisition "). (Please read the precautions on the back before filling in this page.) In addition, the parallel acquisition by the gap adjustment mechanism 5 is described in, for example, the aforementioned Japanese Patent No. 2889126. (4) After the parallel acquisition is completed, as shown in FIG. 5 (d), the Z stage 4 is driven by the workpiece stage driving mechanism 11 to lower the workpiece stage 2 to the calibration interval. Next, the calibration mark of the cover M and the calibration mark of the workpiece W are detected by a calibration microscope (not shown), and the workpiece stage 2 is moved in the XYZ direction by the XY β stage, so that the cover M and the workpiece W are aligned. Bit. (5) In the case of contact exposure, the workpiece stage 2 is raised again, the cover M is brought into close contact with the workpiece W, and the light irradiation unit 6 irradiates the workpiece W with the exposure light through the cover M to expose the workpiece W with a mask pattern. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs (6) In the case of proximity exposure, make the mask M and the workpiece W a preset exposure interval, and move the workpiece stage 2 to the exposure position in the Z direction. In the above (3), the parallel acquisition of the work W and the cover M has been performed, and the interval between the cover M and the work W is made equal over the entire surface of the work W. (7) In this state, the light irradiating section 6 irradiates the workpiece W with exposure light through the mask M, and exposes a mask pattern on the workpiece W. III. Summary of the Invention [Problems to be Solved by the Invention] Recently, due to the increase in the size of the substrate of the workpiece W, in addition, the size of the entire batch of paper is subject to Chinese national standards (CNS > Α4 specifications (210 × 297 mm) 1233150 Α7 Β7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention. (4) Larger exposure area of light and larger cover M (for example, '250mm × 250mm). Usually, when the cover M is fixed to the cover carrier 1 As described above, the periphery of the cover M is fixed by vacuum suction. The cover M is sucked by its peripheral portion, and is held on the cover stage 1 ° The cover M is easily enlarged due to its own weight if the cover M is enlarged. 'As shown in Fig. 6, the cover may be adsorbed and held in a bent state. In addition, when the material of the cover M is blue plate glass or borosilicate glass, the cover itself may be skewed. In this state, holding the cover M has the following problems: (1) As shown in FIG. 7 (a), when the workpiece W and the cover M are obtained in parallel, the work W is due to the weight of the cover M and Skewed, the paper meets at the curved part, The workpiece stage 2 is further raised, and the cover and the workpiece cannot be contacted on the entire surface. In this state, the device cannot achieve horizontal and linear acquisition. (2) In the case of contact exposure, such as exposure in this state, In the part where the cover is in contact with the workpiece and the part where it is not in contact, the exposure accuracy is different, which is the cause of product failure. In addition, in the case of proximity exposure, in the 7th (a) state, even parallel It is obtained that the workpiece stage 2 is lowered to the exposure position as shown in FIG. 7 (b). As shown in FIG. 7 (b), the interval between the cover M and the workpiece W differs depending on the location, which is the same as the case of the contact exposure, and affects the exposure accuracy. For example, in an exposure area of 250mmX250mm, the actual exposure setting is set to a pattern of L & S (line and space) of 20 // m, and the result of measuring the size of the pattern produces a deviation of 1.6 / zm. In addition, in Figure 7 Although it is an exaggerated depiction of the cover M and the workpiece W— (Please read the precautions on the back before filling this page) The size of the paper is applicable to China National Standard (CNS) A4 (210X297 mm> -8- 1233150 A7 B7 V. Description of the invention (^) (Please read the precautions on the back before filling in this page.) The interval is actually a degree of bending that cannot be seen visually. Therefore, due to the bending of the cover M, even if parallel acquisition is not possible, the pattern that is actually exposed is actually developed. It is impossible to know the measurement of line width and the like with a microscope. Therefore, until a defect is found by imaging, many product defects may occur. In addition, the bending system of the cover M is as shown in FIG. 8 In some cases, when the workpiece W is acquired in parallel, the workpiece W is lifted in order to make the workpiece W contact the cover M, and the workpiece W is inclined to the cover M. As a result, in the case of FIG. 7, the exposure accuracy is greatly deviated over the entire surface of the workpiece, and sufficient resolution cannot be obtained. The present invention was made in order to solve the above-mentioned conventional problems. The purpose of the present invention is to prevent the bending caused by the large-scale cover's skew and self-weight in a contact-type exposure device or a proximity-type exposure device, and can work correctly. Obtained in parallel to the hood. [Means for Solving the Problems] In the present invention, the above problems are solved as follows. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The cover is fixed under the cover carrier by vacuum suction. In addition, the workpiece, a substitute for the workpiece, or the workpiece stage is lifted up and brought into contact with the cover, and the cover is closely contacted with the workpiece, the substitute for the workpiece, or the workpiece stage across the entire surface, and obtained in parallel. At this time, the vacuum suction by the cover of the cover stage was released once. After the parallel acquisition operation is completed, the suction of the hood is resumed. In the parallel acquisition of a workpiece or a substitute for a workpiece, a force is applied to the mask from the lower side by the workpiece. As mentioned above, once the suction of the cover is lifted, the paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm) -9- 1233150 A7 _B7__ 5. Description of the invention (^) 6 is applied to the cover by the workpiece With the power, the skew and bending of the hood is corrected. (Please read the precautions on the back before filling in this page} Then, if the skew and bending are corrected, the suction of the cover will start again, and the cover will be held on the cover carrier when it is stretched outward, and it will be skewed. And the bending is not seen or reduced. Therefore, in any of the contact type exposure and the proximity type exposure, the gap between the cover and the workpiece is constant over the entire surface of the workpiece, which can reduce the deviation in exposure accuracy. Embodiment] FIG. 1 shows the configuration of a contact type exposure device / proximity type exposure device according to an embodiment of the present invention. In the same figure, the workpiece stage 2 is mounted on the XYZ stage through the gap adjustment mechanism 5 described above. 3. As described above, the XY stage 4 is driven by the workpiece stage driving mechanism 11 on the Z stage 4, and the workpiece stage 2 is in the left-right direction (X direction) of the paper surface, the front-back direction (纸 -direction), and β. It moves in the direction (rotating around the axis of the vertical XY plane). In addition, the Z carrier 4 is driven to move up and down on the paper. The employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed the work on the hood carrier 1. As described above, the vacuum suction groove la of the vacuum suction cover is provided on the stage 2 side, and a vacuum is provided to the groove la, and the peripheral portion of the suction cover M is provided. A pipeline lb, which provides the vacuum of the vacuum suction groove la, is provided. And valves VI and V2 for controlling the vacuum. In addition, a vacuum suction groove for a vacuum suction cover is also provided on the workpiece stage 2. Although a pipe for supplying a vacuum to the vacuum suction groove is also provided, the illustration is omitted. 。 This paper size applies the Chinese National Standard (CNS) M specification (210X297 mm) During exposure, the light irradiation section 6 of the lamp tube 6a and the reflector 6b is exposed to the work W through the cover M to expose the exposure light through the cover M, and the cover pattern formed on the cover M is exposed. In addition, the work stage Drive mechanism 11, clearance adjustment mechanism 5, control unit 12 for the above-mentioned valves lc, Id, etc. Hereinafter, referring to Figs. 1, 2 (a) to (d), and 3 (e) (f), An embodiment of the present invention will be described. In addition, on the second way The XY 0 stage 3, the Z stage 4, the gap adjustment mechanism 5 and the like shown in Fig. 1 are omitted. (1) As shown in Fig. 4 (a) (b), the cover M is placed. The cover M is fixed to the cover stage 1 by vacuum suction on the cover stage 1. The cover M is sucked and fixed below the cover stage 1 as shown in FIG. 2 (a). At this time, as shown in FIG. As shown in FIG. 2 (a), the cover M is skewed or bent. In addition, the workpiece W is placed on the workpiece stage 2, and the workpiece W is fixed to the workpiece stage 2 as described above. (2) Control unit 1 2 The ZE stage 4 is driven by the workpiece stage driving mechanism 11 to raise the workpiece stage 2 in the direction of the cover M. As a result, the upper surface of the workpiece W abuts as shown in FIG. 2 (b). Under the cover M. (3) The control unit 12 closes the valve V2, opens the valve V1, stops the supply of the vacuum to the vacuum suction groove la, and releases the suction holding of the cover M of the cover stage 1. At the same time, the control unit 12 drives the Z stage 4 by the workpiece stage driving mechanism 11, and raises the workpiece stage 2 in order to connect the workpiece W to the cover M. As shown in Figure 2 (c), the cover M is received by the workpiece W from the bottom. According to the paper size, the Chinese National Standard (CNS) A4 specification (210 × 297 mm) is applied.
-11 - 1233150 A7 B7 五、發明説明（8 ) (請先閲讀背面之注意事項再填寫本頁) 壓力量而往上。間隙調整機構5吸收工件載台之驅動力而 位移，罩Μ之歪斜和彎曲被矯正而成爲平面，罩μ與工 |件W整面密接。 (4 )在此狀態下，控制部12關閉前述閥門vi，打 開閥門V2。藉由此，罩載台1再度打開罩Μ之吸附保持 。罩Μ在被往外側拉伸之狀態下被保持在罩載台1。控制、 部12對於間隙調整機構5送出保持信號，間隙調整機構 5保持那時的位移狀態。藉由此，得到工件W對罩Μ之 平行。 (5 )平行取得結束後，如第2 ( d )圖所示般地，控 制部1 2藉由工件載台驅動機構11，驅動Z載台，使工件 · 載台2下降至校準間隔。 然後，如前述般地，藉由未圖示出之校準顯微鏡檢測 出罩Μ之校準標記與工件W之校準標記，進行罩M與工 件W之對位。 (6)接觸型曝光之情形，再度使工件載台2上升， 經濟部智慧財產局員工消費合作社印製 如第3(e)圖所示般地，使罩Μ與工件w密接，由光照 射部11透過罩Μ對工件W照射曝光光，於工件w曝光 罩圖案。 (7 )在近接型曝光之情形，使工件載台2下降，如 第3(f)圖所示般地，將罩Μ與工件W設定爲預先設定 的間隔（曝光間隔）。在上述（3 ) ( 4 )中，罩Μ已經 進行過歪斜和彎曲矯正而被保持在罩載台1。因此，罩Μ 與工件W之間隔在工件整面中爲相等。 本紙張尺度適用中國國家樣準（CNS ) Α4規格（210Χ297公釐） -12- A7 1233150 __ B7_ 五、發明説明（Q ) 9 在此狀態下，由光照射部6透過罩Μ對工件W照射 曝光光，對工件曝光罩圖案。 (請先閲請背面之注意事項再填寫表頁} 在本實施例中，如上述般地，使工件W抵接於罩Μ ，而進行平行取得時，一度解除介由罩載台1之罩Μ的 真空吸附，平行取得作業結束後，再度開始罩Μ之吸附 之故，對於在習知例所示之250mmX250mm之曝光區域的 20//m之L&S之1.6//m的偏差，變成小至0.6//m。 另外，在進行上述平行取得之際，也可以不使用工件 W，而利用具有所期望的平面度的僞工件或不載置工件之 工件載台。 另外，平行取得作業也非每一工件都需要進行，可以 每一預定的處理次數、工件的批次而進行。在那種情形下 ，使控制部1 2記憶進行平行取得動作之程序，因應預先 設定的處理次數或時間，而使之自動進行。另外，也可以 在控制部12等設置實施上述程序之開關，作業員介由按 壓開關而進行。 經濟部智慧財產局員工消費合作社印製 但是，平行取得在進行罩的更換之情形或處理不同厚 度的工件之情形，一定要進行。 [發明之效果] 如以上說明般地，在本發明中可以獲得以下之效果： 在平行取得之際，解除罩載台之罩的吸附保持之故， 介由將工件（或者僞工件和工件載台）壓住罩之力量，矯 正罩之歪斜和彎曲。因此，罩與工件整面密接，可以正確 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -13- 經濟部智慧財產局員工消費合作社印製 1233150 Α7 A 7 B7 五、發明説明（10) 進行工件對罩之平行取得。 然後，在此狀態下，再度開始罩載台的對罩的吸附保 持’罩在沒有或者很少歪斜和彎曲之狀態下，被保持在罩 載台。 因此，在接觸型曝光、近接型曝光中任一者，在工件 的整面中，罩與工件的間隔變成一定，可以使曝光精度之 偏差變小。 五·圖示簡單說明 第1圖係顯示本發明之實施例的曝光裝置之構成。 第2圖係顯示本發明之實施例的曝光順序之第（1 ·) m ° v · > 第3圖係顯示本發明之實施例的曝光順序之第（2 ) 圖。 第4圖係罩安裝於接觸型曝光裝置/近接型曝光裝置 之罩載台的說明圖。 ；第5圖係說明接觸型曝光裝置/近接型曝光裝置的曝 i 光:順序。 ;第6圖係說明罩彎曲之情形。 :第7圖係說明罩Μ與工件W之間隔因場所而不同之 情形。 第8圖係說明罩Μ偏向一方彎曲之情形。 [圖號說明] 本紙張尺度適用中.國國家標準（CNS ) Α4規格（210Χ 297公釐） (请先Μ請背面之注意事項再填寫衣頁)-11-1233150 A7 B7 V. Description of the invention (8) (Please read the precautions on the back before filling in this page) The amount of pressure goes up. The gap adjustment mechanism 5 absorbs the driving force of the workpiece stage and displaces it. The skew and bending of the cover M is corrected to become a flat surface, and the cover μ is in close contact with the entire surface of the work piece W. (4) In this state, the control unit 12 closes the aforementioned valve vi and opens the valve V2. Thereby, the cover stage 1 is opened again and the cover M is sucked and held. The cover M is held on the cover stage 1 while being stretched outward. The control unit 12 sends a hold signal to the gap adjustment mechanism 5, and the gap adjustment mechanism 5 maintains the displacement state at that time. Thereby, the parallelism of the workpiece W with the cover M is obtained. (5) After the parallel acquisition is completed, as shown in Fig. 2 (d), the control unit 12 drives the Z stage by the workpiece stage driving mechanism 11 to lower the workpiece · stage 2 to the calibration interval. Then, as described above, the alignment mark of the cover M and the work W is aligned by detecting the alignment mark of the cover M and the alignment mark of the workpiece W by a calibration microscope (not shown). (6) In the case of contact-type exposure, the workpiece stage 2 is raised again, and printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs as shown in FIG. 3 (e), so that the cover M is in close contact with the workpiece w and irradiated with light. The part 11 irradiates the work W with exposure light through the cover M, and exposes a cover pattern on the work w. (7) In the case of proximity exposure, the work stage 2 is lowered, and as shown in Fig. 3 (f), the cover M and the work W are set at a predetermined interval (exposure interval). In the above (3) (4), the cover M has been subjected to the skew and bending correction and is held on the cover stage 1. Therefore, the interval between the cover M and the workpiece W is equal over the entire surface of the workpiece. This paper size applies to China National Standard (CNS) A4 specification (210 × 297 mm) -12- A7 1233150 __ B7_ V. Description of the invention (Q) 9 In this state, the light irradiation unit 6 irradiates the workpiece W through the cover M The exposure light exposes the mask pattern to the workpiece. (Please read the precautions on the back before filling in the form page.) In this embodiment, as described above, the workpiece W is brought into contact with the cover M, and when parallel acquisition is performed, the cover through the cover stage 1 is once released. The vacuum suction of M, after the parallel acquisition operation is completed, the suction of the mask M is started again, and the deviation of L & S of 1.6 // m at 20 // m in the exposure area of 250mm × 250mm shown in the conventional example becomes As small as 0.6 // m. In addition, when performing the above-mentioned parallel acquisition, it is also possible to use a dummy workpiece having a desired flatness or a workpiece stage on which no workpiece is placed without using the workpiece W. In addition, the parallel acquisition operation It is not necessary to perform every workpiece, and it can be performed every predetermined number of processing times and batches of workpieces. In that case, the control unit 12 memorizes a program for performing parallel acquisition operations according to a preset number of processing times or It can be automatically performed by time. In addition, a switch for implementing the above procedure can be provided in the control unit 12 and the like, and the operator can perform the operation by pressing the switch. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs It must be done when changing the cover or when processing workpieces of different thicknesses. [Effects of the Invention] As described above, the following effects can be obtained in the present invention: When the cover is obtained in parallel, the cover is released. Due to the adsorption and holding of the cover of the stage, the skew and bending of the cover are corrected by the force of pressing the cover (or the pseudo-workpiece and the workpiece stage) against the cover. Therefore, the cover and the entire surface of the cover are tightly connected, and the paper size can be accurately adjusted Applicable to China National Standard (CNS) A4 specification (210X297 mm) -13- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 1233150 Α7 A 7 B7 V. Description of the invention (10) The workpiece is obtained in parallel to the cover. Then, in In this state, the adsorption and holding of the hood by the hood stage is started again. The hood is held on the hood stage without or with little or no skew and bending. Therefore, in either of the contact type exposure and the proximity type exposure, In the entire surface of the workpiece, the interval between the cover and the workpiece becomes constant, which can reduce the deviation in exposure accuracy. V. Simple illustration of the diagram The first diagram shows an embodiment of the present invention Structure of the exposure device. Fig. 2 is the (1 ·) m ° v · > showing the exposure sequence of the embodiment of the present invention. Fig. 3 is the (2) diagram showing the exposure sequence of the embodiment of the present invention. FIG. 4 is an explanatory diagram of a hood mounted on a contact type exposure device / proximity type exposure device; and FIG. 5 is a diagram illustrating exposure of a contact type exposure device / proximity type exposure device: sequence. FIG. 6 It illustrates the case where the cover is bent .: Figure 7 illustrates the case where the interval between the cover M and the workpiece W varies depending on the location. Figure 8 illustrates the case where the cover M is bent to one side. [Illustration of the drawing number] This paper standard is applicable .National Standards (CNS) Α4 specifications (210 × 297 mm) (please note the details on the back before filling in the clothing page)
-14- 1233150 A7 B7 五、發明説明（^) 1 :罩載台，1 a ··真空吸附溝，1 b :管路， lc、Id:閥門，2:工件載台，3: ΧΥ0載台，4: Z載台 ，5 :間隙調整機構，6 :光照射部，6a :燈管，6b :反射 鏡，11 :工件載台驅動機構，12 :控制部 (請先閎讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -15--14- 1233150 A7 B7 V. Description of the invention (^) 1: Cover stage, 1 a · vacuum suction groove, 1 b: pipeline, lc, Id: valve, 2: workpiece stage, 3: χΥ0 stage , 4: Z stage, 5: gap adjustment mechanism, 6: light irradiation section, 6a: lamp tube, 6b: reflector, 11: workpiece stage driving mechanism, 12: control section (please read the precautions on the back first) (Fill in this page again) The paper size printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs applies the Chinese National Standard (CNS) A4 (210X 297 mm) -15-