JPH0862850A - Proximity exposure device - Google Patents

Abstract

PURPOSE: To provide an inexpensive proximity exposure device which does not cause transfer defects due to contamination with dust and can be used for separated sequential exposure for a large-size workpiece. CONSTITUTION: A workpiece W is mounted on a work stage 15 and the work stage 15 is driven in the vertical direction. When the whole area of a mask M is in contact with the workpiece W, inclination of the workpiece W is made to coincide with inclination of the mask and both are aligned parallel to each other by an elastic mechanism of a space setting mechanism 13. At this point, a controlling section 18 stops rising of the work stage 15 and allows the space setting mechanism 13 to maintain this state. Then, a work stage moving mechanism 14 is driven to descend the work stage 15 to give a specified space between the workpiece W and the mask M. After the workpiece W and the mask are aligned, the mask M is irradiated with UV rays from a UV-ray emitting section 7 to expose the workpiece W. This procedure is repeated to perform separated sequential exposure of the workpiece W.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure device for irradiating a work with light passing through a mask, and more particularly to a proximity exposure device for exposing a work coated with a photoresist with ultraviolet light through the mask. is there.

[0002]

2. Description of the Related Art Micron-sized processing such as semiconductor devices, liquid crystal screens, inkjet printer heads, or multichip modules that produce a large number of electrical devices on a single substrate into one module The exposure process is used in the manufacturing process of various electric parts that require

In this exposure step, a mask having a pattern formed by vapor-depositing and etching a metal such as chrome on a transparent substrate such as glass is used, and the work is irradiated with ultraviolet rays through the mask to be applied on the work. The mask pattern is transferred to the existing photoresist. The exposure method is a projection exposure method in which the image of the mask is formed on the work with a projection lens or a mirror, a contact exposure method in which parallel light is emitted while the mask and the work are in close contact, and a slight gap between the mask and the work. It is roughly classified into a proximity exposure method in which parallel light is emitted in a state in which is provided.

The contact exposure method and the proximity exposure method have a lower resolution than the projection exposure method, but have the advantage that the exposure apparatus is inexpensive because an expensive projection lens is not used. Further, the proximity exposure method has an advantage over the contact exposure method in that the mask and the work are not in contact with each other, so that the mask is less likely to be contaminated and the mask has a long life.

In the conventional proximity exposure system, a mask having a size equal to or larger than the size of the work to be exposed is used to collectively expose the entire surface of the work.
In recent years, workpieces have become larger in size for the purpose of improving manufacturing efficiency, and accordingly, masks have also become larger. Generally, in the proximity exposure method, the smaller the gap between the mask and the work, the higher the resolution. Therefore, it is necessary to maintain the small gap over the entire exposure area. The width of the gap is several to several tens of microns. However, when the work and the mask are increased in size, there is a problem that the work and the mask are largely warped and bent, and it is difficult to maintain a small gap over the entire exposure area.

In order to solve this problem, a technique of exposing a single work by dividing it into a plurality of exposure areas by using a mask smaller than the work is disclosed in US Pat. No. 4,669,868.
No. In this technique, a mask that is half the size of the work or less is used, and the work stage moving mechanism sequentially moves the work stage in the XY directions for exposure. Since the mask can be small, it is unlikely to be affected by warping or bending, and a small gap can be easily maintained.

In the invention of the above-mentioned US Pat. No. 4,669,868, the width of the gap is measured by air gauges arranged at the four corners of the mask holder and adjusted by a piezo element mounted on the mask holder supporting member.

[0008]

By the way, when an air gauge is used, dust carried by the air leaking from the air gauge contaminates the mask and the work, and the light is blocked or attenuated at the contaminated site, resulting in exposure failure. It was the cause.
Due to the structure of the air gauge, air leakage cannot be avoided, which is a fatal defect in an exposure apparatus that transfers a micron-sized pattern. Further, there is a problem that the piezo element is very expensive and the control circuit is complicated.

Further, even if an attempt is made to use a conventional inexpensive vertical moving mechanism in place of the piezo element, the vertical moving mechanism has to be arranged above the mask, so that its arrangement and size are severely limited. As a result, there has been a problem that a conventional inexpensive vertical movement mechanism cannot be applied. The present invention has been made in order to solve the above-mentioned problems of the prior art, and a first object of the present invention is to provide a proximity exposure apparatus that is inexpensive and does not have transfer defects due to dust contamination. is there.

A second object of the present invention is to provide a proximity exposure apparatus which can use an inexpensive work stage moving mechanism and can be applied to divisional sequential exposure for a large work and which is free from transfer defects due to dust contamination. It is to be.

[0011]

In order to solve the above-mentioned problems, the invention of claim 1 of the present invention is directed to a light irradiation section for irradiating ultraviolet rays, a mask, a mask stage for holding the mask, and the mask stage. From a mask stage unit consisting of a base that supports the work, a work, a work stage that holds the work from the back side of the surface facing the mask, and a moving mechanism that rotates the work stage and moves in the horizontal and vertical directions. A workpiece stage moving unit, a mask-workpiece alignment mechanism for aligning the relative positions of the workpiece and the mask in a predetermined positional relationship, and a gap setting for setting the workpiece and the mask horizontally and at a constant interval. In a proximity exposure apparatus including a mechanism and a control unit that controls each mechanism, the gap setting mechanism includes a mask stage and a base. And at least three adjusting mechanisms provided so as to connect the workpiece and the mask, and the adjusting mechanism is configured so that the workpiece and the mask come into contact with each other when the workpiece stage moving unit moves in a direction in which the workpiece and the mask come into contact with each other. Still further, when the work stage moving unit is continuously driven in the direction, the work stage moving unit drives from the time when the work and the mask come into contact with each other and the relative movement cannot be further performed. It is configured to absorb force and start displacement, and the adjustment mechanism is configured to include detection means for detecting displacement by a desired amount and holding means for holding the displacement state at that time. is there.

According to a second aspect of the present invention, in the first aspect of the invention, the adjusting mechanism includes a casing, a shaft arranged in the casing, and a moving mechanism for restricting the movement of the shaft only in the vertical direction. , An elastic mechanism that is located in the casing and exerts a force on the shaft, a holding mechanism that holds the position of the shaft at a fixed position, a detection unit that detects the amount of displacement of the shaft, and is located between the tip of the shaft and the mask stage. It is composed of a sphere and an elastic mechanism that attracts the shaft and the mask stage with a constant force.

According to a third aspect of the present invention, in the first or second aspect of the invention, a mask whose area used for irradiation is less than half the area of the work is held on the mask stage, and the work stage is controlled by the controller. The moving unit is driven to sequentially move the relative positions of the mask and the work in the horizontal direction so that the same work is irradiated with ultraviolet rays a plurality of times through the mask.

[0014]

In FIG. 1, the work W is placed on the work stage 15.
After placing the work, the work stage moving mechanism 14 drives the work stage 15 in the vertical direction to move the work W.
Are moved so as to approach the lower part of the mask M. When the work W contacts the mask M, the mask stage 12
Is inclined by the shaft of the gap setting mechanism 13 and the elastic mechanism connected to the shaft so that the mask M and the work W are in a parallel state.

Further, when the work stage 15 is raised until a constant pressure is applied to the mask M by the elastic mechanism connected to the shaft, the detecting portion of the gap setting mechanism 13 detects this state and sends a signal, The control unit 18 that has received the signal stops the work stage 15 from rising. After that, a holding mechanism that holds the position of the shaft at a constant position stores this state, and the control unit 18 drives the work stage moving mechanism 14 again so that the work W becomes a predetermined gap from the lower portion of the mask M. Then, the work stage 15 is lowered.

By the above operation, the gap between the work W and the mask M is set, but since the work W and the mask M can be parallelized without using an air gauge as in the conventional example, they leak from the air gauge. The dust carried by the air will not contaminate the mask and the work, and the light will not be blocked or attenuated at the contaminated part, which will not cause defective exposure. Further, since the vertical movement mechanism of the work stage can be arranged below the work stage 15, that is, below the mask M, there is no strict limitation on the arrangement and the size thereof, and the conventional structure can be realized without using an expensive piezo element. Therefore, it is possible to obtain a proximity exposure apparatus which is inexpensive and does not have transfer defects due to dust contamination even for divisional sequential exposure of a large work.

[0017]

【Example】

(1) Overall Configuration FIG. 1 is a diagram showing the overall configuration of a proximity exposure apparatus according to an embodiment of the present invention. In the figure, 1 is an ultraviolet lamp composed of an ultra-high pressure mercury lamp, an ultra-high pressure xenon mercury lamp, etc., 2 is a condenser mirror, 3 is an integrator lens, 4 is a shutter, 5 is a mirror, and 6 is a collimator lens. 6 to 6 constitute the ultraviolet irradiation unit 7. Then, the ultraviolet rays emitted from the ultraviolet lamp 1 are condensed by the condenser mirror 2 and enter the integrator lens 3. The incident ultraviolet rays are made into a uniform intensity distribution by the integrator lens 3 and then collimated by the collimator lens 6 to be incident on the mask M.

M is a mask, W is a work, and the mask M
Is smaller than half of the work W, and the work W is divided into a plurality of exposure areas. As will be described later, while exposing the work W, each exposure area of the work W is sequentially exposed. Reference numeral 11 is a base for supporting the mask stage, 12 is a mask stage for holding the mask M, and the mask stage 12 is a positioning mechanism for setting the mask M at a predetermined position and a vacuum chuck for holding the mask by vacuum suction. It has and.

Reference numeral 13 denotes a gap setting mechanism. The gap setting mechanism 13 is provided at least at three positions between the base 11 and the mask stage, and as will be described later, the mask M and the work W are set in parallel and the gap is set constant. . 14 is a mask stage moving mechanism for moving the mask stage to a predetermined position,
Reference numeral 15 denotes a work stage, and the work stage 15 is configured to be movable in an XYZθ (horizontal, front-rear, vertical direction and rotation about an axis perpendicular to the stage surface) directions by a work stage moving mechanism 16. Similar to the mask stage, it is provided with a positioning mechanism for setting the work W at a predetermined position and a vacuum chuck for holding the work by vacuum suction.

Reference numeral 17 denotes an alignment microscope for matching the alignment mark printed on the mask M with the alignment mark printed on the work W. The alignment microscope 17 uses alignment light (usually, non-exposure light It is provided with a light source 17a for radiating (used) and a CCD sensor 17b. The light from the light source 17a is applied to the mask / workpiece, and the reflected light is received by the CCD sensor 17b. Match the alignment marks of.

Reference numeral 18 is a control unit, which is composed of a processor and the like, and the mask M and the work W are driven by the mask stage moving mechanism 14 and the work stage moving mechanism 16.
Control the position of and the gap setting mechanism 13,
Also, the ultraviolet irradiation unit 7 is controlled. In the figure, the exposure of the work W is performed as follows.

First, the mask M is set at a predetermined position on the mask stage 12 and held by vacuum suction. Next, the work stage moving mechanism 16 lowers the work stage 15, mounts the work W on the work stage 15, and holds it by vacuum suction. Then, the work stage 15 is moved in the XYθ directions to position the first exposure area of the work W under the mask M.

Next, the control unit 18 raises the work stage 15 by the work stage moving mechanism 16 to move the work W.
After contacting the mask M with the mask M, the work W is further raised. Here, a gap setting mechanism 13 is provided between the mask stage 12 and the base 11, and at least 3
As will be described later, the gap setting mechanism 13 provided at each location has a built-in compression coil and is independently displaced.

Therefore, even if the work W is inclined with respect to the mask M and the gap is not constant, when the work W is brought into contact with the mask M and further raised, the compression of the gap setting mechanism 13 is performed. The coils are displaced by different amounts, the entire surface of the mask M contacts the work W, and the inclinations of the mask M and the work W match. At this point, the controller 18
Holds the displacement state of each gap setting mechanism 13 and lowers the work stage 15 by a predetermined amount. Thereby, the mask M
And the work W are set in parallel and the gap therebetween is set to be constant.
In the proximity exposure method, the gap is about 20 μm, and the accuracy is required to have an error of 2 μm or less.

By providing the gap setting mechanism 13 as described above, even when the work W is not parallel to the mask M when the work W is placed on the work stage 15, the work W and the mask M are separated from each other. The gaps can be set parallel and constant. When the distance between the work W and the mask M is set to a constant value, the work stage moving mechanism 16 moves the work stage 15 in the XYθ directions to move the mask M.
The alignment mark printed on the workpiece W is aligned with the alignment mark printed on the work W.

That is, the focus of the alignment microscope 17 is adjusted so that the alignment marks of the mask M and the work W are received by the CCD sensor 17b, and the position of the work stage 15 is adjusted so that the two marks match.
This adjustment can be automatically performed by the control unit 18, but a person can also perform the adjustment manually while looking at the alignment microscope 17. When the alignment of the work W and the mask M is completed, the alignment microscope 17 retracts from above the mask M as shown by the arrow in the figure (when the alignment microscope 17 is located in the non-exposed portion on the mask). Does not need to retreat).

When the alignment marks of the mask M and the work W coincide with each other, the shutter 4 of the ultraviolet irradiation unit 7 opens,
The mask M is irradiated with parallel light from the collimator lens 6, and the first exposure area of the work W is exposed. When the first exposure area of the work W is exposed as described above, the control unit 18 causes the work stage moving mechanism 16 to lower the work stage 15 by a predetermined amount, and then, the next exposure area of the work W is masked by the mask M. Position below.

Then, similarly to the above, the work stage 1
5, the mask M and the work W are set parallel to each other and the gap is set to be constant by the gap setting mechanism 13, and then the alignment mark of the mask M and the alignment mark of the work W are matched. Then, the parallel light of the ultraviolet irradiation unit 7 is irradiated onto the mask M to expose the next exposure area of the work W.

All the exposure areas on the work W are exposed by the same procedure, and when the exposure is completed, the work stage 15 is lowered to stop the vacuum supply to the work stage 15 and the exposed work W is exposed. Is taken out from the work stage. The alignment operation of the mask and the work is performed at the time of positioning the work W in each exposure area, but when high-precision alignment is not required, it can be performed only before the exposure of the first exposure area.

Further, in the above description, the work stage 15
The case where the base 11 is moved in the Z direction to set the gap has been described, but means for moving the base 11 in the Z direction is provided,
The gap can be set by moving the base 11.
It is also possible to provide a gap setting mechanism between the work stage 15 and the work. Next, specific configurations of the gap setting mechanism 13 and the work stage 15 shown in FIG. 1 will be described. (2) Gap Setting Mechanism FIG. 2 is a diagram showing an example of a mounting mode of the gap setting mechanism to the mask stage shown in FIG. 1, in which 11 is a base, 12 is a mask stage, M is a mask, and 13 is a mask. Is a gap setting mechanism, W is a work, and three gap setting mechanisms 13 are erected vertically on the base 11 as shown in FIG. It is to be noted that at least three gap setting mechanisms are required to determine the position of the mask stage 12 as shown in the figure. For example, when the mask M has a rectangular shape, the gap setting mechanisms are provided at four corners. You can also Further, in this case, a gap setting mechanism may be provided at the three corners, and the other one may be an expandable / contractible support body having a built-in spring or the like.

FIG. 3 is an exploded perspective view showing an example of the structure of the gap adjusting mechanism, and the structure and operation of the gap setting mechanism of this embodiment will be described with reference to FIG. In the figure, 12 is a mask stage and 21 is a V-shaped receiver. The V-shaped receiver 21 is embedded in the upper surface of the mask stage 12 and is connected to a ball receiver 41 via a hard sphere 22. A conical recess 24 corresponding to the hard sphere 22 is provided in the center of the ball receiver 41. Therefore, when the mask stage 12 is pushed up from below, the mask stage 12 can freely move only in the direction of the groove of the V-shaped receiver.

Further, the mask stage 12 and the ball receiver 4
1 are attracted to each other by a tension spring 23, and support the mask stage 12 toward the base 11. A shaft 43 is connected above the ball receiver 41. The shaft 43 reaches a casing 46 through a spline 42 which is a guide member, penetrates the casing 46, and is connected to a plate spring 45 which is a plate-shaped elastic body. ing.

The shaft 43 slides in the spline 42, and the movement of the shaft 43 is restricted only in the vertical direction by the spline 42. Shaft 4 inside casing 46
A compression coil spring 44 that exerts a force on the shaft 43 is provided around the shaft 3. The leaf spring 45 is sandwiched by a suction block 47 which is a holding means, and a convex portion 49 is formed on a part of the leaf spring 45.
Is provided. The suction block 47 is provided with a sensor 48 that detects the position of the convex portion 49. The sensor 48 is, for example, an optical sensor including a light emitting unit and a light receiving unit, and detects an interruption of light by the convex portion 49 and generates an output.

The suction block 47 is provided with a vacuum suction mechanism for sucking and holding the leaf spring 45, as will be described later. This vacuum suction mechanism can be operated by, for example, a rotary vacuum pump. The gap setting mechanism of the present embodiment has the above-mentioned configuration. As described above, the work W is raised and brought into contact with the mask, and then the work W is further raised so that the work W and the mask M are substantially moved. When it reaches the position where it cannot move relatively, the compression coil spring 44 starts to compress so as to absorb the driving force.

Due to this compression, the relative position of the leaf spring 45 with respect to the suction block 47 changes, the convex portion 49 provided on the leaf spring 45 also moves, and this movement is detected by the sensor 48. That is, the displacement amount of the mask stage 12 connected to the leaf spring 45 can be set by the positional relationship between the convex portion 49 and the sensor 48. As described above, the mask M
When each of the gap adjusting mechanisms 13 provided on the mask stage 12 is displaced as a result of the rise, the sensor 48 produces an output, and this output is sent to the control unit 18. Then, when the sensors 48 of all the gap setting mechanisms generate outputs, the control unit 18 stops the movement of the work stage 15 in the Z direction, and the vacuum suction mechanism provided in the suction block of each gap setting mechanism 13 (described later). ) Is operated to keep the compression state of the compression coil 44 of the gap setting mechanism 13.

As a result, the mask M and the work W are set in a parallel state, and in this state the work stage 15
Is lowered, the mask M and the work W are made parallel, and
The gap can be made constant. 4 to 6 are diagrams for explaining the operation of the gap setting mechanism described above, and the operation of the gap setting mechanism of the present embodiment will be described with reference to the same drawings.

4 (a), 5 (a), and 6 (a) are sectional views of the gap setting mechanism seen from the X direction in FIG.
(B), FIG. 5 (b), and FIG. 6 (b) are sectional views of the gap setting mechanism viewed from the Y direction in FIG. 3, and (a) and (b) of each figure show the same state. The state of the gap setting mechanism changes in this order. 4A and 4B show an initial state in which the exposure area of the work W is positioned under the mask M, and the work W and the mask M are not set in parallel yet.

When the work stage 15 is moved in the Z direction from this state, the distance between the mask M and the work W becomes shorter and the mask M and the work W come into contact with each other. When the work W is further moved in the Z direction from the state where the mask M and the work W are in contact with each other, the compression coil spring 44 of the gap setting mechanism 13 starts to be compressed so that the entire surface of the mask M is completely in contact with the work W. Become. At this time, the compression amount of the compression coil spring 44 in each gap setting mechanism 13 does not necessarily match.

5 (a) and 5 (b) show the state in which the entire surface of the mask M is in contact with the work W and the work stage 1
5 shows a state in which 5 is moved in the Z direction. In this state, the compression coil spring 44 is compressed, and the work stage 15 compresses the compression coil spring 44 via the shaft 43, the ball receiver 41, the hard sphere 22, and the V-shaped receiver 21. Receives force in the Z direction.

FIGS. 6A and 6B show a state in which the compression coil spring 44 is further compressed by further moving the work stage 15 in the Z direction, and the convex portion 49 of the leaf spring 45 is detected by the sensor 48. ing. As shown in the figure, when the sensor 48 detects a predetermined amount of compression of the compression coil spring 44, a detection output is generated, and this signal is sent to the control unit 18 described above.

As described above, the three gap setting mechanisms 13 are provided, and when the control unit 18 receives the detection signal from each of the gap setting mechanisms, the control unit 18 stops the movement of the work stage 15 in the Z direction and the gaps. The suction function of the suction block 43 of the setting mechanism 13 is activated to keep the compression coil springs 44 of all the gap setting mechanisms 13 in the compressed state. That is, a vacuum is supplied from the vacuum suction path in the same figure to vacuum-suck the leaf spring 45 and fix the position of the shaft 43.

From this state, the work stage 15 is moved downward to gradually move the work W away from the mask M.
Then, when the distance between the mask M and the work W becomes a predetermined distance (for example, 20 μm), the work stage 1
Stop the movement of 5. As a result, the mask M and the work W are set in parallel and at a constant gap. In the above embodiment, the displacement amount of the gap setting device 13 is detected by the convex portion attached to the leaf spring, but other known means can be used as the means for detecting the displacement amount.

Further, in the above embodiment, the position of the leaf spring 45 is held by vacuum suction, but as a means for holding the displacement amount of the gap setting mechanism, an electric means is used, and other well-known methods are used. Means can be used. (3) Work Stage FIGS. 7, 8 and 9 are views showing an example of a concrete configuration of the work stage and its drive mechanism in the present invention, and FIG. 7 shows the overall configuration of the work stage (a) is an upper surface Figure,
(B) is a side view.

FIG. 8 is a sectional view taken along the line AA in FIG. 7A showing an example of the drive mechanism of the θ stage. Figure 9
9A shows an example of a drive mechanism of the Z stage, and FIG.
(B) shows an example of the configuration of an eccentric cam that moves the stage up and down. In FIG. 7, 151 and 155 are the first and
It is a second mount, and a linear guide 152 is provided on the first mount 151, and a second mount 155 is movably attached on the linear guide 152. Further, a linear guide 156 is provided on the second mount 155,
The XY stage 150 is movably mounted on the linear guide 156.

The second mount 155 is replaced by the first mount 1
By moving on 51, the XY stage 150 moves in the Y-axis direction in the figure, and by moving the XY stage 150 on the second mount 155, the XY stage 150 moves in the X-axis direction in the figure. Move to. First pedestal 151
A motor D1 and an encoder EC1 are attached to
A ball screw 154 is attached to the shaft of the motor D1 via a coupling 153. Further, a screw (not shown) that engages with the ball screw 154 is attached to the back surface of the second pedestal 155, and the second pedestal 155 is moved in the Y-axis direction in the figure by the rotation of the motor D1. It moves and the amount of movement is detected by the encoder EC1.

Similarly, the second frame 155 has a motor D
2 and an encoder EC2 are attached, and a ball screw 158 is attached to the shaft of the motor D2 via a coupling 157. A screw (not shown) that engages with the ball screw 158 is provided on the back surface of the XY stage 150.
Are attached, and the motor D2 rotates to move the XY stage 150 in the X-axis direction in the figure, and the amount of movement is detected by the encoder EC2.

Further, as shown in FIG. 8, the XY stage 1
The θ stage 140 is rotatably mounted on the 50 by a bearing 141.
XY stage 1 via wire 143 and pulley 142
It is connected to a motor D3 attached to 50. Therefore, when the motor D3 rotates, the θ stage rotates. An encoder EC3 is attached to the motor D3, and the rotation amount of the motor D3 is detected by the encoder EC3.

Further, as shown in FIG.
As shown in (a), a Z stage 130 is provided. The Z stage 130 is a slide member 1 guided by a guide member 132 provided on the θ stage 140.
31 includes a slide member 131 and a guide member 1
A bearing 133 is provided between 32.

Further, D4 is a motor, EC4 is an encoder, 134 is an eccentric cam, and the eccentric cam 134 has a disc 134a on which the shaft 134d of the motor D4 is eccentrically mounted, as shown in FIG. Roller bearing 1
34b and ring 134c, the motor D
When 4 rotates, the disk 134a rotates and the eccentric cam 134 moves up and down as shown by the dotted line in the figure. Also, the motor D
4 has an encoder EC4 attached thereto, and the rotation amount of the motor D3 is the same as that of the θ stage.
Is detected by

At this time, the ring 134c provided on the outer side
Is mounted on the disc 134a via a bearing 134b and therefore does not rotate. Therefore, the eccentric cam 134
When is rotated, the tangential force does not act on the Z stage, and the Z stage can be smoothly moved up and down. Returning to FIG. 7, the Y-axis origin sensor S10 is attached to the first pedestal 151, and the passage of the sensor plate S11 attached to the second pedestal 155 is detected. Also,
An X-axis origin sensor S20 is attached to the second pedestal 155 and detects passage of the sensor plate S21 attached to the XY stage 150.

Therefore, the fact that the XY stage 150 has passed the origin position on the mechanism means that the Y-axis origin sensor S10 and X
It can be detected by the axis origin sensor S20. Figure 7
In, the work stage is controlled, for example, as follows, and the work is exposed. First, when mounting the work W on the work stage 15, an instruction is given to the control unit 18 shown in FIG. As a result, the control unit 18 causes the motor DC of the work stage 15 to move.
4 to rotate the eccentric cam 134 to move the Z stage 130
To lower. At this time, the output of the encoder EC4 is sent to the controller 18, and when the Z stage 130 descends to a predetermined position, the controller 18 stops driving the motor DC4.

In this state, the work W is placed on the work stage 15
Put it on top. The position of the work is positioned by a positioning member provided on the work stage 15. Then,
A vacuum is supplied to the work stage 15 and the work W is vacuum-sucked to the work stage 15 by a vacuum chuck (not shown). Then, as described above, the work stage 15 is set to X.
By moving in the Yθ direction, the first exposure area of the work W is positioned below the mask M.

This operation is performed as follows. First, the control unit 18 drives the motors DC1 and DC2 to move the X-axis origin sensor S20 and the Y-axis origin sensor S10 provided on the XY stage 150 to the origin position where the outputs are generated.
The Y stage 150 is moved. Then, the control unit 18 drives the motors DC1, DC2, DC3 by a predetermined amount based on the outputs of the encoders EC1, EC2, EC3 to move the XYθ stages 140, 150 from the origin position in the XYθ directions, and the first part of the work W is moved. The exposure area is positioned under the mask M. The position for positioning the work stage is programmed in advance and stored in the control unit 18.

When the first exposure area of the work W is positioned under the mask M, the control unit 18 drives the motor DC4 to raise the Z stage 130, and the work W is placed on the mask M as described above. After the contact, the work W is further raised to bring the entire surface of the mask M into contact with the work W. By this operation, the mask M and the work W are set in parallel by the gap setting mechanism 13 as described above.

Next, the controller 18 drives the motor DC4 to lower the Z stage 130 by a predetermined amount. As a result, the distance between the mask M and the work W is a predetermined value, for example 20 μm.
set to m. When the distance between the mask M and the work W is set to a predetermined value, the control unit 18 performs the alignment operation as described above.

That is, alignment light is emitted from the light source 17a of the alignment microscope 17, and the CCD sensor 1
7b receives the alignment marks of the work W and the mask M, and the motor D
Driving C1, DC2, DC3, XYθ stage 14
0 and 150 are moved in the XYθ directions. Note that this operation can be performed manually as described above.

When the above alignment operation is completed, the control unit 18 opens the shutter 4 of the ultraviolet irradiation unit 7, and the work W
Do the top exposure. When the first exposure area of the work W is exposed, the controller 18 drives the motor DC4 to lower the Z stage 130 by a predetermined amount, and then the motors DC1 and DC1.
The DC2 is driven to move the XY stage 150, and the next exposure area of the work W is positioned below the mask M.

Thereafter, the exposure of each exposure area of the work W is performed while positioning the work W in the same procedure as described above. When the exposure of all the exposure areas of the work W is completed, Z
The stage 130 is lowered, the supply of vacuum to the work stage is stopped, and the work W is taken out of the work stage W.

[0059]

As described above, according to the present invention, the light irradiation section for irradiating ultraviolet rays, the mask, the mask stage for holding the mask, and the mask stage section including the base for supporting the mask stage. A work stage that includes a work, a work stage that holds the work from the back side of the surface facing the mask, and a moving mechanism that rotates the work stage and moves the work stage in the horizontal and vertical directions; and the work. A mask-workpiece alignment mechanism for adjusting the relative position of the mask to a predetermined positional relationship, a gap setting mechanism for horizontally and fixedly setting the work and the mask, and a control for controlling each mechanism. In a proximity exposure system consisting of parts,
Since the gap setting mechanism is composed of at least three adjusting mechanisms provided so as to connect the mask stage and the base, and the work and the mask are arranged in parallel with each other by the adjusting mechanism, it is simple. By the mechanism, the distance between the mask and the work can be set parallel and constant, and the mask and the work are not contaminated by the dust carried by the air as in the case of using the air gauge.

Further, since the gap setting mechanism is provided between the mask stage and the work stage, the moving mechanism for moving the work stage can be arranged at the lower part of the work, and there is no strict restriction on the arrangement and size. . Therefore, the conventional inexpensive moving mechanism can be used as it is, and an inexpensive apparatus can be provided even for sequential division exposure for a large work.

[Brief description of drawings]

FIG. 1 is a diagram showing an overall configuration of a proximity exposure apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram showing an example of an attachment aspect of the gap setting mechanism in the embodiment of the present invention.

FIG. 3 is an exploded perspective view showing an example of the structure of the gap adjusting mechanism of the embodiment of the present invention.

FIG. 4 is a diagram for explaining the operation of the gap setting mechanism of the embodiment of the present invention.

FIG. 5 is a diagram illustrating the operation of the gap setting mechanism according to the embodiment of this invention.

FIG. 6 is a diagram for explaining the operation of the gap setting mechanism of the embodiment of the present invention.

FIG. 7 is a diagram showing an overall configuration of a work stage according to an embodiment of the present invention.

FIG. 8 is a diagram showing an example of a drive mechanism of a θ stage according to an embodiment of the present invention.

FIG. 9 is a diagram showing an example of a Z stage drive mechanism according to an embodiment of the present invention.

[Explanation of symbols]

1 UV Lamp 2 Condensing Mirror 3 Integrator Lens 4 Shutter 5 Mirror 6 Collimator Lens 7 UV Irradiation Unit 11 Base 12 Mask Stage 13 Gap Setting Mechanism 14 Mask Stage Moving Mechanism 15 Work Stage 16 Work Stage Moving Mechanism 17 Alignment Microscope 17a Light Source 17b CCD Sensor 18 Control part 21 V-shaped receiver 22 Hard ball 23 Extension spring 41 Ball receiver 42 Spline 43 Shaft 44 Compression coil spring 45 Leaf spring 46 Casing 47 Adsorption block 48 Sensor 130 Z stage 131 Slide member 132 Guide member 133 Bearing 133 134 134 Eccentric cam 140 θ Stage 141 Bearing 142 Pulley 143 Wire 150 XY Stage 151,155 Stage 152,156 Linear guy 153 and 157 coupling 154, 158 ball screw M Mask W workpiece D1, D2, D3, D4 motor EC1, EC2, EC3, EC4 encoder S10 Y-axis origin sensor S20 X-axis origin sensor S11, S21 sensor plate

Claims (3)

[Claims] 1. A light irradiation section for irradiating ultraviolet rays, a mask, a mask stage for holding the mask, a mask stage section composed of a base for supporting the mask stage, a work, and the work facing the mask. The work stage moving part, which includes a work stage that holds the work surface from the back side and a moving mechanism that rotates the work stage and moves the work stage in the horizontal and vertical directions, and a relative position of the work and the mask in a predetermined positional relationship. In the proximity exposure apparatus, which includes a mask-workpiece alignment mechanism for aligning, a gap setting mechanism that horizontally and uniformly sets the work and the mask, and a control unit that controls each mechanism, The setting mechanism includes at least three adjusting mechanisms provided so as to connect the mask stage and the base. In the case where the work stage moving unit is moved in the direction in which the work and the mask come into contact with each other, the adjusting mechanism continuously drives the work stage moving unit in the direction after the work comes in contact with the mask. In this case, when the work and the mask come into contact with each other and the relative movement cannot be performed any more, the driving force from the work stage moving unit is absorbed and the displacement is started. However, the proximity exposure apparatus includes a detection unit that detects that a desired amount of displacement has occurred, and a holding unit that holds the displacement state at that time. 2. The adjusting mechanism includes a casing, a shaft arranged in the casing, a moving mechanism for restricting the movement of the shaft only in the vertical direction, and an elastic mechanism located in the casing for exerting a force on the shaft. A holding mechanism that holds the position of the shaft at a fixed position, a detection unit that detects the amount of displacement of the shaft, a sphere located between the tip of the shaft and the mask stage, and an elastic mechanism that draws the shaft and the mask stage with a constant force. And consisting of:
Proximity exposure equipment. 3. A mask stage that holds a mask whose area used for irradiation is less than half the area of the work, and the control unit drives the work stage moving unit to move the relative position of the mask and the work in the horizontal direction. 3. The proximity exposure apparatus according to claim 1 or 2, wherein the ultraviolet light is irradiated onto the same work a plurality of times through the mask.