CN105093839B - Exposure platform of exposure machine - Google Patents
Exposure platform of exposure machine Download PDFInfo
- Publication number
- CN105093839B CN105093839B CN201410193770.2A CN201410193770A CN105093839B CN 105093839 B CN105093839 B CN 105093839B CN 201410193770 A CN201410193770 A CN 201410193770A CN 105093839 B CN105093839 B CN 105093839B
- Authority
- CN
- China
- Prior art keywords
- exposure
- light
- substrate
- air inlet
- microscope carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention discloses an exposure platform of an exposure machine. The exposure platform comprises an exposure frame, an objective table, a plurality of elevating units and a light-transmitting plate, wherein the objective table can approach to or keep away from the exposure frame; an accommodating region is formed in the upper surface of the objective table, and is used for putting a substrate and projecting incident light of an exposure light source to the substrate; the elevating units are arranged on the exposure frame; and the light-transmitting plate is combined with a clamp of each elevating unit, and is driven by the elevating units to move towards or away from the accommodating region of the objective table. The light-transmitting plate of the exposure platform disclosed by the invention is fixed to the bottom surface of the exposure frame through the clamps and the elevating units; and when vacuum pumping is carried out in the exposure step of a circuit board manufacture procedure, the light-transmitting plate can be driven by the elevating units, can be fitted to the substrate, and can deform along with the flatness of the substrate, so that the fitting tightness of the light-transmitting plate and the substrate is increased to improve the exposure resolution ratio.
Description
Technical field
The present invention relates to a kind of exposure stage of exposure machine, more particularly in a kind of exposure machine for circuit board process
Exposure stage.
Background technology
It is currently used in the exposure machine of circuit board process, is making exposure light source, substrate and light shield by an exposure stage
Para-position, being beneficial to makes exposure light source accurately be exposed to the uncovered region of light shield on substrate.Wherein, existing exposure stage tool
There are a microscope carrier and an exposure frame, the microscope carrier is used to carry the substrate, and the exposure frame has the framework of rectangle and is arranged at the framework
In light-passing board, the light-passing board be used for light shield is set and the substrate surface is pressed on, in circuit board process, using connect the load
The vacuum extractor of platform, to evacuation is carried out between the microscope carrier and the exposure frame, so that the exposure frame and the light-passing board bottom surface
After light shield is closely adhered to the substrate surface, it is then turned on exposure light source and is exposed.
However, during vacuum extractor will carry out evacuation between the microscope carrier and the exposure frame, the suction of evacuation
Power is gradually stepped up, and as the substrate surface is not substantially flat, and the light-passing board edge fixed by the framework, and this is saturating
Tabula rasa cannot be deformed with substrate surface flatness, cause the exposure frame and the light shield in the exposure frame closely cannot paste completely
Together in the substrate surface, and then make reduction exposure resolution ratio.
The content of the invention
Present invention is primarily targeted at a kind of exposure stage of exposure machine is provided, for making exposure light source, substrate and light
Cover para-position, the exposure stage can be deformed with substrate surface flatness so that light shield closely conforms to substrate surface, and has
It is improved effect of exposure resolution ratio.
It is that the present invention provides a kind of exposure stage of exposure machine, for carrying a substrate up to above-mentioned purpose and other purposes
And be pointed to below an exposure light source, comprising an exposure frame, a microscope carrier, multiple lifting units and a light-passing board；Wherein, the microscope carrier
Can be with respect to the exposure frame close to or away from the upper surface of the microscope carrier has an accommodating area, and the accommodating area is used to place the substrate simultaneously
The incident illumination of the exposure light source is made to be projected to the substrate；These lifting units are arranged in the exposure frame；The light-passing board and these
Lifting unit is combined, and the light-passing board is driven and moved towards or away from the accommodating area of the microscope carrier by these lifting units.
The exposure stage of above-mentioned exposure machine, wherein respectively the lifting unit has a pedestal, a piston and a fixture, the base
Seat is fixed in the exposure frame, and the piston is placed in a storage tank of the pedestal and has a reciprocal row with being reciprocally moveable
Journey, one end of the piston pass through the notch of the storage tank and are bound to the fixture, and the fixture clamps the light-passing board.
The notch of the storage tank of the exposure stage of above-mentioned exposure machine, the wherein pedestal has one first location division, and should
Fixture with to should the first location division one second location division.
The exposure stage of above-mentioned exposure machine, the wherein reciprocating stroke are 3.5 ± 0.5mm.
The exposure stage of above-mentioned exposure machine, the wherein exposure stage have a vacuum meter, for detecting the microscope carrier
The air pressure on surface.
The exposure stage of above-mentioned exposure machine, the wherein lifting unit are electrically connected with a main control computer, for true when this
When the air pressure that empty table is detected is up to a predetermined value, the main control computer controls these lifting unit starts is somebody's turn to do light-passing board direction
The accommodating area movement of microscope carrier and the substrate of the microscope carrier upper surface of fitting.
The exposure stage of above-mentioned exposure machine, the wherein piston have a sealing ring adjacent to end, have on the pedestal
One loosen air inlet and one clamping air inlet, the sealing ring this loosen move back and forth between air inlet and the clamping air inlet and
Make to be isolated in the storage tank of the pedestal and to form one and loosen inlet plenum and a clamping inlet plenum, this loosens air inlet and connect this and loosens
Inlet plenum, the clamping air inlet connect the clamping inlet plenum, and this loosens air inlet and the clamping air inlet and is used to be respectively connecting to
One air intake installation, and the air intake installation is electrically connected with the main control computer.
The quantity of the exposure stage of above-mentioned exposure machine, wherein these lifting units is more than at least four.
Accordingly, exposure stage of the invention is applied in the step of exposure of circuit board process, the printing opacity of the exposure stage
Plate is fixed on the exposure frame bottom surface by these fixtures and these lifting units, therefore is relatively close to the exposure frame in the microscope carrier
Afterwards and when carrying out evacuation, the light-passing board can drive and fit in the substrate surface, and the light-passing board by these lifting units
Can be deformed with the substrate flatness in vacuum, and then enhance the compactness of fitting of light-passing board and substrate,
And the shortcoming that the light-passing board that can improve exposure frame in prior art cannot be deformed with substrate flatness in evacuation, therefore this
The exposure stage of invention can be promoted the light-passing board and closely be fitted in evacuation with the substrate, and then improve exposure resolution
Rate.
Description of the drawings
Schematic diagrams of the Fig. 1 for the exposure stage of the embodiment of the present invention.
Structural representations of the Fig. 2 for exposure frame in the exposure stage of the embodiment of the present invention.
The structural representation of Fig. 3 A and 3B for lifting unit in the exposure stage of the embodiment of the present invention.
【Primary clustering symbol description】
1 exposure stage
10 exposure frames
20 microscope carriers
21 upper surfaces
30 lifting units
31 pedestals
31A upper cover bodies
31B lower covers
314 first location divisions
311 storage tanks
311A loosens inlet plenum
311B clamps inlet plenum
312 loosen air inlet
313 clamping air inlets
314 first location divisions
32 pistons
321 sealing rings
33 fixtures
331 second location divisions
40 light-passing boards
50 vacuum meters
100 substrates
200 exposure light sources
201 incident illuminations
Specific embodiment
To be fully understood by the purpose of the present invention, feature and effect, now by following specific embodiments, and coordinate accompanying drawing,
The present invention is described in detail, is illustrated as after：
The exposure stage 1 of the embodiment of the present invention is applied in the exposure machine for manufacture circuit board, and the exposure machine has internal empty
Between and be wherein configured with an exposure light source 200, referring initially to Fig. 1, the exposure stage 1 of the embodiment of the present invention is used to carry a base
Plate 100 is simultaneously pointed to below the exposure light source 200, and the exposure stage 1 is single comprising an exposure frame 10, a microscope carrier 20, multiple liftings
Unit 30 and a light-passing board 40；Coordinate shown in Fig. 2, the exposure frame 10 is a rectangular box；The microscope carrier 20 can be with respect to the exposure frame 10
Close to or away from the upper surface 21 of the microscope carrier 20 has an accommodating area, and the accommodating area is used to place the substrate 100 and make the exposure
The incident illumination 201 of light source 200 is projected to the substrate 100；These lifting units 30 are arranged in the exposure frame 20；The light-passing board 40
Combined with these lifting units 30, the light-passing board 40 is driven and housing towards or away from the microscope carrier 20 by these lifting units 30
Move in area.
The exposure stage 1 of the embodiment of the present invention is connected with a vacuum extractor (not shown), and which is used to make the exposure frame 10
Vacuum is formed between the microscope carrier 20, so that in the light shield (not shown) of 40 bottom of light-passing board and in 20 upper surface of microscope carrier
Substrate 200 closely can be fitted.Wherein, the microscope carrier 20 neighbouring can be provided with sealing joint strip around the accommodating area and (scheme not
Show), and an airtight space is formed after making the microscope carrier 20 and the 40 phase closing of light-passing board, caused with avoiding ambient atmos from entering true
Reciprocal of duty cycle is not enough.
Accordingly, when the microscope carrier 20 for carrying substrate 100 to be exposed and the light-passing board 40 for being provided with light shield are relatively close to simultaneously
After closing, the vacuum extractor carries out evacuation, and the lifting unit 30 drives accommodating area of the light-passing board 40 towards the microscope carrier 20
It is mobile, and make the light-passing board 40 conform to the substrate 200 of 20 upper surface of microscope carrier, therefore, different from light-passing board in prior art
Edge be fixed in exposure frame, in the exposure stage 1 of the embodiment of the present invention, the light-passing board 40 is by these fixtures 33
The exposure frame 10 is fixed to these lifting units 30, therefore in evacuation, the light-passing board 40 can produce change with substrate flatness
Shape, and then enhance the compactness of fitting of light-passing board 40 and substrate 100.
Fig. 3 A and 3B are refer to, which is the structure chart of lifting unit 30 in the embodiment of the present invention, in the present embodiment, respectively should
Lifting unit 30 has a pedestal 31, a piston 32 and a fixture 33, and the pedestal 31 is fixed in the exposure frame 10, the piston 32
It is placed in a storage tank 311 of the pedestal 31 and has a reciprocating stroke with being reciprocally moveable, one end of the piston 32 passes through
The notch of the storage tank 311 is simultaneously bound to the fixture 33, and the fixture 33 clamps the light-passing board 40, as illustrated, each lifting is single
The fixture 33 of unit 30 clamps the edge of the light-passing board 40.Wherein, the reciprocating stroke can for 3.5 ± 0.5mm, the i.e. piston 32 by
When the position of Fig. 3 A is moved to the position of Fig. 3 B, the light-passing board 40 is driven to decline 3.5 ± 0.5mm.
Specifically, in the lifting unit 30 of the present embodiment, as shown in Fig. 3 A and Fig. 3 B, the piston 32 has adjacent to end
There is a sealing ring 321, on the pedestal 31, loosen air inlet 312 and a clamping air inlet 313 with one, wherein, the pedestal 31 can
With upper cover body 31A and lower cover 31B, upper cover body 31A is formed with the storage tank 311 after covering assembling with lower cover 31B,
And this loosens air inlet 312 in upper cover body 31A and adjacent to the top of upper cover body 31A, the clamping air inlet 313 is located at
In upper cover body 31B and adjacent to upper cover body 31A and the joint of lower cover 31B.
The sealing ring 321 of the piston 32 loosens and move back and forth and make between air inlet 312 and the clamping air inlet 313 at this
It is isolated in the storage tank 311 of the pedestal 31 and forms one and loosen the clamping inlet plenum 311B of inlet plenum 311A and, this loosens air inlet
Hole 312 connects this and loosens inlet plenum 311A, and the clamping air inlet 313 connects clamping inlet plenum 311B, and this loosens air inlet 312
And the clamping air inlet 313 is used to be respectively connecting to an air intake installation (not shown), and the air intake installation can be electrically connected with exposure
The main control computer (not shown) of machine.When gas is sent into by air intake installation by the clamping air inlet 313, the piston 32 such as Fig. 3 A
It is shown to be pushed to neighbouring this and loosen the position of air inlet 312, and it is the top dead-centre of the reciprocating stroke, now, the clamping air inlet
The volume of room 311B loosens inlet plenum 311A more than this；When gas is loosened air inlet 312 by this by air intake installation to be sent into, the work
Plug 32 is pushed to the position of the neighbouring clamping air inlet 313 as shown in Figure 3 B, and is the bottom dead centre of the reciprocating stroke, now,
The volume for loosening inlet plenum 311A is more than clamping inlet plenum 311B.
In the present embodiment, the notch of the storage tank 311 of the pedestal 31 has one first location division 314, and the fixture 33
With to should the first location division 314 one second location division 331.As shown in Fig. 3 A and Fig. 3 B, first location division 314 is should
The scalene cone of 311 notch of storage tank,, by the storage tank 311 flaring from inside to outside, second location division 331 is 33 tool on the fixture for which
Have to should the first location division 314 scalene cone projection, in state of the piston 32 by Fig. 3 B to Fig. 3 A, make fixture 33 exist
When rising and be close to the pedestal 31 with piston 32, second location division 331 is conformably connivent on first location division 314,
Now, the fixture 33 and 31 relative localization of pedestal, the piston 32 return to the position of the top dead-centre of reciprocating stroke.
In the present embodiment, the exposure stage 1 can have a vacuum meter 50, for detecting the exposure stage 1 in the microscope carrier
Vacuum (also known as vacuum pressure) after 20 is relatively close with the exposure frame 10 and the light-passing board 40 the is fitted substrate 100, to supervise
Control the vacuum of the airtight space between the microscope carrier 20 and the exposure frame 10.
In the present embodiment, the exposure stage 1 is connected to the main control computer of the exposure machine, and the main control computer is according to this
The atmospheric pressure value of the detecting of vacuum meter 50 controlling the lifting unit 30, when the air pressure detected by the vacuum meter 50 is up to a predetermined value,
In the present embodiment, the predetermined value example is 200mmHg, and the main control computer controls these 30 starts of lifting unit and make the light-passing board
40 towards the microscope carrier 20 accommodating area movement and 20 upper surface 21 of microscope carrier of fitting substrate 100.Additionally, the exposure machine can have
One user interface, which is electrically connected with the main control computer and for setting process parameter (such as time of exposure, exposure intensity, true
Reciprocal of duty cycle etc.), user can be input into and set the predetermined value by the user interface, set according to the species of exposure target, size
The fixed predetermined value.
Accordingly, the embodiment of the present invention is applied in the automated procedures for manufacture circuit board, before start, the exposure stage 1
The initial position of light-passing board 40 be that piston 32 in these lifting units 30 is located at the upper dead center position of reciprocating stroke (as schemed
3A), i.e., the light-passing board 40 be located at whole reciprocating stroke near the exposure frame 10 position；When the para-position of substrate 100 is placed
Behind the accommodating area of 20 upper surface 21 of microscope carrier, the microscope carrier 20 is relatively close to (to pass through matching somebody with somebody for drive mechanism with the exposure frame 10
Putting rises the microscope carrier 20 to be close to the exposure frame 10, or makes the decline of exposure frame 10 be close to the microscope carrier 20, or makes while making this
Exposure frame 10 declines and the microscope carrier 20 rises) after, the vacuum extractor proceeds by evacuation, and the vacuum meter 50 detects the load
The air pressure of 20 upper surface of platform, when predetermined value of the air pressure for being detected up to 200mmHg, the main control computer control connects these
The air intake installation of lifting unit 30, so that gas is sent into by the air inlet 312 that loosens of each lifting unit 30, the piston 32 is by scheming
The position of the neighbouring clamping air inlet 313 is pushed to shown in 3A to Fig. 3 B, and reaches the bottom dead centre of reciprocating stroke, at the same time,
On the substrate 100 that the light-passing board 40 is close to towards the microscope carrier 20 and fits in 20 upper surface of microscope carrier.Therefore, in the vacuum means
During putting lasting evacuation, the light-passing board 40 is gradually close to 100 surface of substrate, until the light-passing board 40 and the substrate
After vacuum state is reached between 100 and fitting completely, begin to open the exposure light source 200 pairs substrate 100 being exposed step.
After the completion of step of exposure, the exposure machine inner space gradually returns back to atmospheric pressure state, and the main control computer is controlled
Connect the air intake installation of these lifting units 30, so that gas is sent into by the clamping air inlet 313 of each lifting unit 30, the work
Plug 32 is pushed to neighbouring this as shown in Fig. 3 B to Fig. 3 A and loosens the position of air inlet 312, and is the top dead-centre of the reciprocating stroke,
At the same time, the substrate 100 of the relative microscope carrier 20 of the light-passing board 40 and its upper surface away from, finally, the microscope carrier 20 and the exposure
Frame 10 is relatively distant from.
In the present embodiment, the quantity of these lifting units 30 be eight, its rectangle exposure frame 10 per on
Each configuration two, the quantity of right these lifting units 30 are not limited to the present embodiment and accompanying drawing, and which can be according to the chi of the exposure frame 10
Little progress row is configured, such as, suitable for the exposure machine of little plate face substrate, the quantity of these lifting units 30 can be four, i.e., in square
One is configured on every one side of the exposure frame 10 of shape, support force and the driving force for giving light-passing board 40 enough can be just provided.
In sum, the exposure stage 1 of the embodiment of the present invention is applied in the step of exposure of circuit board process, and the exposure is put down
The light-passing board 40 of platform 1 is fixed on 10 bottom surface of exposure frame, therefore in the microscope carrier with these lifting units 30 by these fixtures 33
After 20 are relatively close to the exposure frame 10 and when carrying out evacuation, the light-passing board 40 can be driven and be pasted by these lifting units 30
Together in the substrate 100, and the light-passing board 40 can be deformed with the flatness of substrate surface in vacuum, and then is promoted
Fit compactness of the light-passing board 40 with substrate 100, and can improve the light-passing board of exposure frame in prior art in evacuation without
The shortcoming that method is deformed and cannot be brought into close contact with 100 flatness of substrate, therefore the exposure stage 1 of the embodiment of the present invention can be promoted
The light-passing board 40 is closely fitted in evacuation with the substrate 100, and then improves exposure resolution ratio.
The present invention is hereinbefore disclosed with preferred embodiment, but it should be understood by those skilled in the art that, the reality
Apply example to be only used for describing the present invention, and be not construed as limiting the scope of the present invention.It should be noted that such as with the embodiment etc.
The change of effect and displacement, all should be set to be covered by scope of the invention.Therefore, protection scope of the present invention is when with claim
Defined person is defined.
Claims (8)
1. a kind of exposure stage of exposure machine, for carrying a substrate and being pointed to below an exposure light source, it is characterised in that bag
Contain：
One exposure frame；
One microscope carrier, can be with respect to the exposure frame close to or away from the upper surface of the microscope carrier has an accommodating area, and the accommodating area is used to put
Put the substrate and make the incident illumination of the exposure light source be projected to the substrate；
Multiple lifting units, are arranged in the exposure frame；And
One light-passing board, is combined with these lifting units, and the light-passing board is driven by these lifting units and towards or away from the microscope carrier
Accommodating area movement.
2. the exposure stage of exposure machine as claimed in claim 1, it is characterised in that respectively the lifting unit have a pedestal, one
Piston and a fixture, the pedestal are fixed in the exposure frame, and the piston is placed in a storage tank of the pedestal with being reciprocally moveable
One end that is interior and having a reciprocating stroke, the piston passes through the notch of the storage tank and is bound to the fixture, and fixture clamping should
Light-passing board.
3. the exposure stage of exposure machine as claimed in claim 2, it is characterised in that the notch of the storage tank of the pedestal has
First location division, and the fixture with to should the first location division one second location division.
4. the exposure stage of exposure machine as claimed in claim 2 or claim 3, it is characterised in that the reciprocating stroke is 3.5 ± 0.5mm.
5. the exposure stage of exposure machine as claimed in claim 2 or claim 3, it is characterised in that the exposure stage has a vacuum meter,
For detecting vacuum.
6. the exposure stage of exposure machine as claimed in claim 5, it is characterised in that the lifting unit is electrically connected with a master control meter
Calculation machine, for when the air pressure that the vacuum meter is detected is up to a predetermined value, the main control computer controls these lifting unit starts
Make accommodating area movement and the substrate of the fit microscope carrier upper surface of the light-passing board towards the microscope carrier.
7. the exposure stage of exposure machine as claimed in claim 6, it is characterised in that the piston is adjacent to end with a sealing
Circle, loosens air inlet and a clamping air inlet with one on the pedestal, and the sealing ring loosens air inlet and the clamping air inlet at this
Be isolated in the storage tank that the pedestal is moved back and forth and made between hole to be formed one loosen inlet plenum and one clamping inlet plenum, this loosens
Air inlet connects this and loosens inlet plenum, and the clamping air inlet connects the clamping inlet plenum, and this loosens air inlet and the clamping air inlet
Hole is used to be respectively connecting to an air intake installation, and the air intake installation is electrically connected with the main control computer.
8. the exposure stage of exposure machine as claimed in claim 1, it is characterised in that the quantity of these lifting units is at least four
More than individual.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410193770.2A CN105093839B (en) | 2014-05-08 | 2014-05-08 | Exposure platform of exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410193770.2A CN105093839B (en) | 2014-05-08 | 2014-05-08 | Exposure platform of exposure machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105093839A CN105093839A (en) | 2015-11-25 |
| CN105093839B true CN105093839B (en) | 2017-04-26 |
Family
ID=54574579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410193770.2A Expired - Fee Related CN105093839B (en) | 2014-05-08 | 2014-05-08 | Exposure platform of exposure machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105093839B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107908080A (en) * | 2017-12-21 | 2018-04-13 | 昆山乐邦印刷器材设备有限公司 | The vacuum exposure device of exposure machine |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0862850A (en) * | 1994-08-26 | 1996-03-08 | Ushio Inc | Proximity exposure device |
| JP2009134005A (en) * | 2007-11-29 | 2009-06-18 | Nsk Ltd | Proximity exposure device and proximity exposure method |
| CN102854752A (en) * | 2011-05-27 | 2013-01-02 | 恩斯克科技有限公司 | Proximity exposure device |
| CN203858451U (en) * | 2014-05-08 | 2014-10-01 | 川宝科技股份有限公司 | Exposure platform of exposure machine |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4164414B2 (en) * | 2003-06-19 | 2008-10-15 | キヤノン株式会社 | Stage equipment |
-
2014
- 2014-05-08 CN CN201410193770.2A patent/CN105093839B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0862850A (en) * | 1994-08-26 | 1996-03-08 | Ushio Inc | Proximity exposure device |
| JP2009134005A (en) * | 2007-11-29 | 2009-06-18 | Nsk Ltd | Proximity exposure device and proximity exposure method |
| CN102854752A (en) * | 2011-05-27 | 2013-01-02 | 恩斯克科技有限公司 | Proximity exposure device |
| CN203858451U (en) * | 2014-05-08 | 2014-10-01 | 川宝科技股份有限公司 | Exposure platform of exposure machine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105093839A (en) | 2015-11-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7905176B2 (en) | Automatic registration device | |
| US10065326B2 (en) | Pick-up tool with integrated light source | |
| CN107270816B (en) | Auxiliary material detection equipment for mobile phone and tablet personal computer | |
| US20180047937A1 (en) | Patch packaging device and method | |
| CN102184935B (en) | OLED (Organic Light Emitting Diode) display screen packaging equipment and compression packaging method | |
| CN216249850U (en) | Micro-display laminating system | |
| CN105093839B (en) | Exposure platform of exposure machine | |
| CN112008250A (en) | Green ceramic cutting device and cutting method | |
| CN111693542A (en) | Mobile phone screen detection device and detection method | |
| CN108544225A (en) | A kind of recognition of face camera module packaging technology and system | |
| CN103137502B (en) | Chip bonding device | |
| CN102581160A (en) | Intelligent rotary adsorption feeding and discharging device for anti-overflow cover plates of electric rice cooker covers | |
| CN103901736B (en) | The method that the film depth that worked in a kind of exposure machine is adjacent to | |
| CN203858451U (en) | Exposure platform of exposure machine | |
| WO2021196310A1 (en) | Repairing apparatus for display panel | |
| CN114694525B (en) | Micro display laminating system and method | |
| TWI524155B (en) | Exposure machine exposure platform | |
| TWM487460U (en) | Exposure platform of exposure machine | |
| CN1445588A (en) | Working platform structure of binding machine and its control method | |
| CN108437434A (en) | Applying method and make-up machine | |
| CN108527832B (en) | Bonding method and bonding machine | |
| CN216373718U (en) | Vacuum adsorption pressing device | |
| CN202498166U (en) | Feeding and discharging device for anti-overflow cover plate of electric rice cooker cover | |
| CN203880520U (en) | Backlight module for LED TV | |
| CN209927366U (en) | Product gas tightness detection tool |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170426 Termination date: 20200508 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |