TWI224409B - Surface-emitting semiconductor-laser-chip and its production method - Google Patents
Surface-emitting semiconductor-laser-chip and its production method Download PDFInfo
- Publication number
- TWI224409B TWI224409B TW092120645A TW92120645A TWI224409B TW I224409 B TWI224409 B TW I224409B TW 092120645 A TW092120645 A TW 092120645A TW 92120645 A TW92120645 A TW 92120645A TW I224409 B TWI224409 B TW I224409B
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor
- semiconductor laser
- crystal
- wafer
- laser chip
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000004065 semiconductor Substances 0.000 claims description 58
- 239000013078 crystal Substances 0.000 claims description 32
- 230000005855 radiation Effects 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 7
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 5
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 claims description 2
- 229910052770 Uranium Inorganic materials 0.000 claims 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 28
- 230000032683 aging Effects 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000008710 crystal-8 Substances 0.000 description 1
- 210000002257 embryonic structure Anatomy 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 210000001161 mammalian embryo Anatomy 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0201—Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3202—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures grown on specifically orientated substrates, or using orientation dependent growth
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10234976A DE10234976B4 (de) | 2002-07-31 | 2002-07-31 | Oberflächenemittierender Halbleiterlaserchip und Verfahren zu dessen Herstellung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200403907A TW200403907A (en) | 2004-03-01 |
| TWI224409B true TWI224409B (en) | 2004-11-21 |
Family
ID=30128567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092120645A TWI224409B (en) | 2002-07-31 | 2003-07-29 | Surface-emitting semiconductor-laser-chip and its production method |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7521723B2 (enExample) |
| JP (2) | JP4933718B2 (enExample) |
| DE (1) | DE10234976B4 (enExample) |
| TW (1) | TWI224409B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8351479B2 (en) | 2006-04-13 | 2013-01-08 | Osram Opto Semiconductors Gmbh | Optoelectronic semiconductor element |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005049830A (ja) * | 2003-07-14 | 2005-02-24 | Fuji Photo Film Co Ltd | 光信号伝送システム |
| FR3061605B1 (fr) * | 2016-12-29 | 2019-05-31 | Aledia | Dispositif optoélectronique à diodes électroluminescentes |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3901738A (en) * | 1973-12-20 | 1975-08-26 | Hughes Aircraft Co | Ion implanted junction laser and process for making same |
| US4990465A (en) * | 1985-01-22 | 1991-02-05 | Massachusetts Institute Of Technology | Method of forming a surface emitting laser |
| JPH04348579A (ja) * | 1991-05-27 | 1992-12-03 | Seiko Epson Corp | 半導体装置 |
| JP2674382B2 (ja) * | 1991-08-21 | 1997-11-12 | 日本電気株式会社 | 半導体レーザ |
| JP3123136B2 (ja) * | 1991-08-26 | 2001-01-09 | 日本電気株式会社 | 面発光型半導体レーザとそのアレー及び面発光型発光ダイオードとそのアレー及び面発光型pnpn素子 |
| JPH0856017A (ja) * | 1994-08-09 | 1996-02-27 | Omron Corp | 半導体素子及びその製造方法、並びに半導体素子製作用マスク |
| JPH0864901A (ja) * | 1994-08-24 | 1996-03-08 | Hitachi Ltd | 半導体レーザダイオードの構造 |
| JP2601218B2 (ja) * | 1994-10-13 | 1997-04-16 | 日本電気株式会社 | 面発光レーザ |
| US5778018A (en) * | 1994-10-13 | 1998-07-07 | Nec Corporation | VCSELs (vertical-cavity surface emitting lasers) and VCSEL-based devices |
| JPH104240A (ja) * | 1996-06-17 | 1998-01-06 | Furukawa Electric Co Ltd:The | 半導体光素子、ウエハ及びその製造方法 |
| JP3791193B2 (ja) * | 1998-07-17 | 2006-06-28 | 富士ゼロックス株式会社 | 面発光レーザ素子及び面発光レーザ素子アレイ |
| US20020109148A1 (en) * | 1998-12-29 | 2002-08-15 | Shveykin Vasily I. | Injection incoherent emitter |
| JP4010095B2 (ja) * | 1999-10-01 | 2007-11-21 | 富士ゼロックス株式会社 | 面発光型半導体レーザ及びレーザアレイ |
| DE10006738C2 (de) * | 2000-02-15 | 2002-01-17 | Osram Opto Semiconductors Gmbh | Lichtemittierendes Bauelement mit verbesserter Lichtauskopplung und Verfahren zu seiner Herstellung |
| JP4029538B2 (ja) * | 2000-03-01 | 2008-01-09 | 富士ゼロックス株式会社 | 半導体レーザ、光ヘッド、光ディスク装置、および半導体レーザの製造方法 |
| JP3770305B2 (ja) * | 2000-03-29 | 2006-04-26 | セイコーエプソン株式会社 | 面発光型半導体レーザおよびその製造方法 |
| DE10038235A1 (de) * | 2000-08-04 | 2002-02-21 | Osram Opto Semiconductors Gmbh | Oberflächenemittierender Laser mit seitlicher Strominjektion |
| DE10054966A1 (de) * | 2000-11-06 | 2002-05-16 | Osram Opto Semiconductors Gmbh | Bauelement für die Optoelektronik |
| KR100395492B1 (ko) * | 2000-12-30 | 2003-08-25 | 한국전자통신연구원 | 레이저 소자 |
| GB2377318A (en) * | 2001-07-03 | 2003-01-08 | Mitel Semiconductor Ab | Vertical Cavity Surface Emitting Laser |
| US6924511B2 (en) * | 2002-01-03 | 2005-08-02 | Arima Optoelectronics Corp. | Vertical cavity surface emitting semiconductor laser with triangle prism optical cavity resonator |
| US20030152125A1 (en) * | 2002-02-13 | 2003-08-14 | Junichi Kinoshita | Surface emitting laser and semiconductor light emitting device |
| US7173285B2 (en) * | 2004-03-18 | 2007-02-06 | Cree, Inc. | Lithographic methods to reduce stacking fault nucleation sites |
-
2002
- 2002-07-31 DE DE10234976A patent/DE10234976B4/de not_active Expired - Lifetime
-
2003
- 2003-07-29 TW TW092120645A patent/TWI224409B/zh not_active IP Right Cessation
- 2003-07-31 JP JP2003204627A patent/JP4933718B2/ja not_active Expired - Lifetime
- 2003-07-31 US US10/631,384 patent/US7521723B2/en not_active Expired - Lifetime
-
2010
- 2010-12-28 JP JP2010293095A patent/JP2011066457A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8351479B2 (en) | 2006-04-13 | 2013-01-08 | Osram Opto Semiconductors Gmbh | Optoelectronic semiconductor element |
Also Published As
| Publication number | Publication date |
|---|---|
| US7521723B2 (en) | 2009-04-21 |
| JP2011066457A (ja) | 2011-03-31 |
| JP2004072098A (ja) | 2004-03-04 |
| US20050098788A1 (en) | 2005-05-12 |
| DE10234976A1 (de) | 2004-02-12 |
| JP4933718B2 (ja) | 2012-05-16 |
| TW200403907A (en) | 2004-03-01 |
| DE10234976B4 (de) | 2012-05-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |