TWD239446S - 基板處理裝置用隔熱環之部分 - Google Patents

基板處理裝置用隔熱環之部分

Info

Publication number
TWD239446S
TWD239446S TW112304677F TW112304677F TWD239446S TW D239446 S TWD239446 S TW D239446S TW 112304677 F TW112304677 F TW 112304677F TW 112304677 F TW112304677 F TW 112304677F TW D239446 S TWD239446 S TW D239446S
Authority
TW
Taiwan
Prior art keywords
design
substrate processing
processing equipment
thermal insulation
insulation ring
Prior art date
Application number
TW112304677F
Other languages
English (en)
Chinese (zh)
Inventor
谷口大騎
西堂周平
Original Assignee
日商國際電氣股份有限公司 (日本)
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 (日本), 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司 (日本)
Publication of TWD239446S publication Critical patent/TWD239446S/zh

Links

TW112304677F 2023-03-13 2023-09-11 基板處理裝置用隔熱環之部分 TWD239446S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023004908F JP1755434S (enExample) 2023-03-13 2023-03-13
JP2023-004908 2023-03-13

Publications (1)

Publication Number Publication Date
TWD239446S true TWD239446S (zh) 2025-07-21

Family

ID=88328215

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112304677F TWD239446S (zh) 2023-03-13 2023-09-11 基板處理裝置用隔熱環之部分

Country Status (3)

Country Link
US (1) USD1134251S1 (enExample)
JP (1) JP1755434S (enExample)
TW (1) TWD239446S (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD214778S (zh) 2020-01-22 2021-10-21 日商東京威力科創股份有限公司 半導體製造裝置用保溫筒散熱片(四)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3205936A (en) * 1963-06-20 1965-09-14 Astro Dynamics Inc Stacked-fin heat sink
USD410438S (en) * 1997-01-31 1999-06-01 Tokyo Electron Limited Heat retaining tube for use in a semiconductor wafer heat processing apparatus
USD478556S1 (en) * 2002-01-10 2003-08-19 Nasser Abo Abdo Speaker heat sink
USD615937S1 (en) * 2009-03-06 2010-05-18 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
USD786201S1 (en) * 2015-10-19 2017-05-09 Tymphany Hk Limited Heat sink for woofer
KR101731488B1 (ko) * 2015-10-27 2017-05-02 주식회사 유진테크 기판처리장치 및 튜브 조립체 조립방법
JP1700778S (ja) * 2021-03-15 2021-11-29 基板処理装置用遮蔽具
JP1713190S (enExample) * 2021-10-01 2022-04-21
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD214778S (zh) 2020-01-22 2021-10-21 日商東京威力科創股份有限公司 半導體製造裝置用保溫筒散熱片(四)

Also Published As

Publication number Publication date
USD1134251S1 (en) 2026-07-14
JP1755434S (enExample) 2023-10-17

Similar Documents

Publication Publication Date Title
TW202006172A (zh) 用於SiC高溫氧化製程的製作腔室及熱處理爐
KR20140036978A (ko) 처리 시스템
JP2011142310A5 (ja) 半導体装置の作製方法
TWD183005S (zh) 半導體製造裝置之隔熱組件外罩
WO2011008456A3 (en) Methods of forming oxide layers on substrates
TW201007826A (en) Reaction tube and heat processing apparatus for a semiconductor process
JPH06295915A (ja) 半導体装置の製造装置及び半導体装置の製造方法
TWD225633S (zh) 半導體製造裝置用隔熱組件外罩
TWD242108S (zh) 半導體製造裝置用發熱體
TWD225634S (zh) 半導體製造裝置用隔熱組件外罩之部分
TWM585608U (zh) 水晶骨灰罈
TW201820475A (zh) 一種退火製程方法、製程腔室及退火裝置
JP6288323B2 (ja) 熱酸化異種複合基板の製造方法
TWD225036S (zh) 基板處理裝置用隔熱板
TWD241472S (zh) 半導體製造裝置用隔熱環之部分
CN219457538U (zh) 一种衬套结构和一种薄膜沉积设备
CN105502895A (zh) 一种石英玻璃铸锭生产装置
WO2019233063A1 (zh) 氧化炉
CN116429829A (zh) 适用于超高温加热下防隔热材料性能测试的隔热框组件
TWD241748S (zh) 基板處理裝置用隔熱單元外罩
JP2004228459A (ja) ウエーハの熱処理方法及び熱処理装置並びに熱処理用ボート
CN217973487U (zh) 直拉单晶炉用保温罩及直拉单晶炉
CN203855685U (zh) 热处理装置
JP2002100667A (ja) 熱処理用基板支持具
TWI716683B (zh) 一種常壓下的乙炔滲碳爐