JP1700778S - - Google Patents

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Publication number
JP1700778S
JP1700778S JPD2021-5259F JP2021005259F JP1700778S JP 1700778 S JP1700778 S JP 1700778S JP 2021005259 F JP2021005259 F JP 2021005259F JP 1700778 S JP1700778 S JP 1700778S
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2021-5259F
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to JPD2021-5259F priority Critical patent/JP1700778S/ja
Priority to TW110304574F priority patent/TWD225034S/zh
Priority to US29/807,745 priority patent/USD982537S1/en
Application granted granted Critical
Publication of JP1700778S publication Critical patent/JP1700778S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JPD2021-5259F 2021-03-15 2021-03-15 Active JP1700778S (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2021-5259F JP1700778S (ja) 2021-03-15 2021-03-15
TW110304574F TWD225034S (zh) 2021-03-15 2021-08-31 基板處理裝置用遮蔽具
US29/807,745 USD982537S1 (en) 2021-03-15 2021-09-14 Separator of substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2021-5259F JP1700778S (ja) 2021-03-15 2021-03-15

Publications (1)

Publication Number Publication Date
JP1700778S true JP1700778S (ja) 2021-11-29

Family

ID=78766339

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2021-5259F Active JP1700778S (ja) 2021-03-15 2021-03-15

Country Status (3)

Country Link
US (1) USD982537S1 (ja)
JP (1) JP1700778S (ja)
TW (1) TWD225034S (ja)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8028978B2 (en) * 1996-07-15 2011-10-04 Semitool, Inc. Wafer handling system
EP1006562A3 (en) * 1998-12-01 2005-01-19 Greene, Tweed Of Delaware, Inc. Two-piece clamp ring for holding semiconductor wafer or other workpiece
JP4506125B2 (ja) * 2003-07-16 2010-07-21 信越半導体株式会社 熱処理用縦型ボート及びその製造方法
US20090197424A1 (en) * 2008-01-31 2009-08-06 Hitachi Kokusai Electric Inc. Substrate processing apparatus and method for manufacturing semiconductor device
USD616392S1 (en) * 2009-03-06 2010-05-25 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
KR101760316B1 (ko) * 2015-09-11 2017-07-21 주식회사 유진테크 기판처리장치
JP6454425B2 (ja) * 2015-09-28 2019-01-16 株式会社Kokusai Electric 半導体装置の製造方法、基板処理装置およびプログラム
KR101731488B1 (ko) * 2015-10-27 2017-05-02 주식회사 유진테크 기판처리장치 및 튜브 조립체 조립방법
WO2018020733A1 (ja) * 2016-07-26 2018-02-01 株式会社日立国際電気 発熱体、基板処理装置、半導体装置の製造方法およびプログラム
JP6821788B2 (ja) * 2017-03-09 2021-01-27 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法およびプログラム
JP7023147B2 (ja) 2018-03-13 2022-02-21 東京エレクトロン株式会社 断熱構造体及び縦型熱処理装置
US20190330740A1 (en) * 2018-04-30 2019-10-31 Asm Ip Holding B.V. Substrate processing apparatus and method
JP1638504S (ja) 2018-12-06 2019-08-05
JP7391942B2 (ja) * 2019-03-18 2023-12-05 株式会社Kokusai Electric 半導体装置の製造方法、基板処理装置、プログラムおよび基板処理方法

Also Published As

Publication number Publication date
TWD225034S (zh) 2023-05-01
USD982537S1 (en) 2023-04-04

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